JPH0654642B2 - Method for homogenizing dose distribution of electron beam irradiation device - Google Patents
Method for homogenizing dose distribution of electron beam irradiation deviceInfo
- Publication number
- JPH0654642B2 JPH0654642B2 JP60024019A JP2401985A JPH0654642B2 JP H0654642 B2 JPH0654642 B2 JP H0654642B2 JP 60024019 A JP60024019 A JP 60024019A JP 2401985 A JP2401985 A JP 2401985A JP H0654642 B2 JPH0654642 B2 JP H0654642B2
- Authority
- JP
- Japan
- Prior art keywords
- dose distribution
- electron beam
- distribution
- linear
- extraction grid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
- G21K5/04—Irradiation devices with beam-forming means
Description
【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、複数本が並設された線状カソードから引出
しグリッドを通して電子線を引き出す電子線照射装置に
おける線量分布の均一化方法に関する。Description: TECHNICAL FIELD The present invention relates to a method for homogenizing a dose distribution in an electron beam irradiation apparatus that extracts an electron beam from a linear cathode in which a plurality of linear cathodes are arranged in parallel through an extraction grid.
第４図は、電子線照射装置の一例を示す概略図である。
低電位の真空容器４内に高電位（負の高電位）の円筒状
のシールド電極２が設けられていて、シールド電極２内
には複数本の同一仕様の線状カソード１が均等に並設さ
れており、当該線状カソード１からシールド電極２と同
電位の引出しグリッド３を通して電子線ＥＢが引き出さ
れる。引出しグリッド３は、例えば、開口率の高いメッ
シュまたはパンチングメタル等である。そして、上記電
子線ＥＢは、例えばアルミニウム、チタン等から成って
いて、真空側ＶＳと照射雰囲気側（例えば大気側）ＡＳ
とを分離する箔５を通して照射雰囲気側ＡＳにある被照
射物（図示省略）に照射される。FIG. 4 is a schematic diagram showing an example of the electron beam irradiation apparatus.
A high-potential (negative high-potential) cylindrical shield electrode 2 is provided in a low-potential vacuum container 4, and a plurality of linear cathodes 1 having the same specifications are evenly arranged in the shield electrode 2. The electron beam EB is extracted from the linear cathode 1 through the extraction grid 3 having the same potential as the shield electrode 2. The extraction grid 3 is, for example, a mesh having a high aperture ratio, punching metal, or the like. The electron beam EB is made of, for example, aluminum, titanium, etc., and has a vacuum side VS and an irradiation atmosphere side (for example, atmosphere side) AS.
An object to be irradiated (not shown) on the irradiation atmosphere side AS is irradiated through the foil 5 for separating the and.
上述のような電子線照射装置においては、各線状カソー
ド１は同一仕様（同一の形状、寸法等）及び同一配置で
あり、しかもカソード加熱電流を各々の線状カソード１
に対して同一としているけれども、その周辺雰囲気の
差、ロット差、取付け誤差等により、各線状カソード１
間における温度分布が不均一になる。しかも引出しグリ
ッド３の開口状態が均一であるため、そこから引き出さ
れる電子線ＥＢの線量分布も、例えば第５図あるいは第
６図に示すように不均一になってしまう。そのようにな
ると被照射物に対して均一な電子線照射を行うことはで
きない。In the electron beam irradiation apparatus as described above, the linear cathodes 1 have the same specifications (the same shape, size, etc.) and the same arrangement, and the cathode heating current is applied to each linear cathode 1.
However, due to differences in the surrounding atmosphere, lot differences, mounting errors, etc., each linear cathode 1
The temperature distribution between the two becomes uneven. Moreover, since the opening state of the extraction grid 3 is uniform, the dose distribution of the electron beam EB extracted from the extraction grid 3 also becomes nonuniform as shown in FIG. 5 or FIG. 6, for example. In such a case, it is impossible to perform uniform electron beam irradiation on the object to be irradiated.
従ってこの発明は、簡単な方法によって、上述のように
不均一な線量分布を均一化する方法を提供することを目
的とする。Therefore, an object of the present invention is to provide a method for uniformizing the non-uniform dose distribution as described above by a simple method.
第１の発明の線量分布均一化方法は、線状カソード相互
間で線径に差をつけることによって各線状カソード間に
おける温度分布を調整し、それによって引出しグリッド
から引き出される電子線量の分布を均一化することを特
徴とする。The dose distribution equalizing method according to the first aspect of the invention adjusts the temperature distribution between the linear cathodes by making the diameters of the linear cathodes different from each other, thereby making the distribution of the electron dose extracted from the extraction grid uniform. It is characterized by
第２の発明の線量分布均一化方法は、線状カソードの並
設ピッテに差をつけることによって各線状カソード間に
おける温度分布を調整し、それによって引出しグリッド
から引き出される電子線量の分布を均一化することを特
徴とする。The dose distribution equalizing method according to the second aspect of the invention adjusts the temperature distribution between the linear cathodes by making a difference between the parallel pits of the linear cathodes, and thereby makes the distribution of the electron dose extracted from the extraction grid uniform. It is characterized by doing.
第３の発明の線量分布均一化方法は、各線状カソード間
における温度分布を調整すると共に引出しグリッドの開
口割合を部分的に調整することによって、引出しグリッ
ドから引き出される電子線量の分布を均一化することを
特徴とする。The dose distribution equalizing method according to the third aspect of the present invention equalizes the distribution of the electron dose extracted from the extraction grid by adjusting the temperature distribution between the linear cathodes and partially adjusting the opening ratio of the extraction grid. It is characterized by
上記第１の発明の線量分布均一化方法によれば、線状カ
ソード相互間で線径に差をつけることによって、線量分
布が相対的に高い所に相当する線状カソードの温度を相
対的に下げることにより、あるいは逆に線量分布が相対
的に低い所に相当する線状カソードの温度を相対的に上
げることにより、線量分布が均一化（平坦化）される。According to the dose distribution equalizing method of the first aspect of the present invention, the temperature of the linear cathode corresponding to a place where the dose distribution is relatively high is relatively increased by making the wire diameter different between the linear cathodes. The dose distribution is made uniform (flattened) by lowering it, or conversely, by relatively raising the temperature of the linear cathode corresponding to the place where the dose distribution is relatively low.
上記第２の発明の線量分布均一化方法によれば、線状カ
ソードの並列ピッチに差をつけることによって、線量分
布が相対的に高い所に相当する線状カソードの温度を相
対的に下げることにより、あるいは逆に線量分布が相対
的に低い所に相当する線状カソードの温度を相対的に上
げることにより、線量分布が均一化（平坦化）される。According to the dose distribution equalizing method of the second aspect of the invention, the temperature of the linear cathode corresponding to a place where the dose distribution is relatively high is relatively lowered by making a difference in the parallel pitch of the linear cathodes. Alternatively, or conversely, the temperature of the linear cathode corresponding to a place where the dose distribution is relatively low is relatively increased, so that the dose distribution is made uniform (flattened).
上記第３の発明の線量分布均一化方法によれば、各線状
カソード間における温度分布を調整することに加えて、
線量分布が相対的に高い所に相当する部分の引出しグリ
ッドの開口割合を相対的に小さくすることにより、ある
いは逆に線量分布が相対的に低い所に相当する部分の引
出しグリッドの開口割合を相対的に大きくすることによ
り線量分布はより均一化される。According to the dose distribution equalizing method of the third invention, in addition to adjusting the temperature distribution between the linear cathodes,
By making the opening ratio of the extraction grid in the part corresponding to the relatively high dose distribution relatively small, or conversely, the opening ratio of the drawing grid in the part corresponding to the relatively low dose distribution is set relatively. The dose distribution is made more uniform by increasing the size.
第１図は、この発明に係る線量分布の均一化方法の一例
を説明をするための図である。この図において点線で示
した線量分布は元の（即ち、調整前の）ものを示し、実
線で示した線量分布は調整後のものを示す（第２図及び
第３図においても同様である）。この実施例は、線状カ
ソード１相互間で線径に差をつけることにより、各線状
カソード１間における温度分布を均一化し、これによっ
て線量分布の均一化を図るものである。即ち、元の線量
分布が相対的に高い所に相当する線状カソード１の線径
を相対的に太くする、あるいは逆に線量分布が相対的に
低い所に相当する線状カソード１の線径を相対的に細く
する（これは複数本の線状カソード１を電源に直列に接
続する場合の例であり、並列に接続する場合にはその逆
とする）。例えば、調整しようとする電子線照射装置の
元の線量分布が第５図に示したようなものの場合、線量
分布の高い位置の線状カソード１ａの線径を他の線状カ
ソード１ｂの線径より太くする。このとき、各線状カソ
ード１ａ、１ｂ間の加熱電流は同一であるため、太くさ
れて抵抗が下がった線状カソード１ａの加熱温度は下が
る。これによって線状カソード１ａからの発生電子線量
が低下し、その結果第１図の実線で示すように線量分布
が均一化（平坦化）される。FIG. 1 is a diagram for explaining an example of a method of equalizing the dose distribution according to the present invention. In this figure, the dose distribution shown by the dotted line shows the original (that is, before adjustment), and the dose distribution shown by the solid line shows that after adjustment (the same applies to FIGS. 2 and 3). . In this embodiment, the diameters of the linear cathodes 1 are made different from each other, so that the temperature distributions among the linear cathodes 1 are made uniform, thereby making the dose distribution uniform. That is, the wire diameter of the linear cathode 1 corresponding to the place where the original dose distribution is relatively high is made relatively thick, or conversely, the wire diameter of the linear cathode 1 corresponding to the place where the dose distribution is relatively low. Is relatively thin (this is an example of connecting a plurality of linear cathodes 1 to a power supply in series, and vice versa when connecting in parallel). For example, when the original dose distribution of the electron beam irradiation apparatus to be adjusted is as shown in FIG. 5, the wire diameter of the linear cathode 1a at the position where the dose distribution is high is changed to that of the other linear cathode 1b. Make it thicker. At this time, since the heating currents between the linear cathodes 1a and 1b are the same, the heating temperature of the linear cathode 1a, which has been thickened and whose resistance has decreased, decreases. As a result, the electron dose generated from the linear cathode 1a is reduced, and as a result, the dose distribution is made uniform (flattened) as shown by the solid line in FIG.
第２図は、この発明に係る線量分布の均一化方法の他の
例を説明するための図である。この実施例は、線状カソ
ード１の並設ピッチに差をつけることにより、即ち線状
カソード１の並設間隔に差をつけることにより、各線状
カソード１間における温度分布を均一化し、これによっ
て線量分布の均一化を図るものである。即ち、元の線量
分布が相対的に高い所に相当する部分のピッチを相対的
に大きくする、あるいは逆に線量分布が相対的に低い所
に相当する部分のピッチを相対的に小さくする。例え
ば、調整しようとする電子線照射装置の元の線量分布が
第５図に示したようなものの場合、他の部分のピッチＬ
に対して線量分布が高い位置のピッチを例えば２Ｌとす
る。これによって、ピッチが大きい部分の温度分布が低
下して電子線密度が低下し、その結果第２図の実線で示
すように線量分布が均一化される。FIG. 2 is a diagram for explaining another example of the dose distribution uniformizing method according to the present invention. In this embodiment, the temperature distribution between the linear cathodes 1 is made uniform by making a difference in the arrangement pitch of the linear cathodes 1, that is, by making a difference in the arrangement intervals of the linear cathodes 1. This is intended to make the dose distribution uniform. That is, the pitch of the portion corresponding to the place where the original dose distribution is relatively high is made relatively large, or conversely, the pitch of the portion corresponding to the place where the dose distribution is relatively low is made relatively small. For example, when the original dose distribution of the electron beam irradiation apparatus to be adjusted is as shown in FIG. 5, the pitch L of other portions is adjusted.
For example, the pitch at the position where the dose distribution is high is set to 2L. As a result, the temperature distribution in the portion where the pitch is large is reduced, the electron beam density is reduced, and as a result, the dose distribution is made uniform as shown by the solid line in FIG.
第３図は、この発明に係る線量分布の均一化方法の更に
他の例を説明するための図である。この実施例は、引出
しグリッド３の開口割合（即ち、開口部分の面積とそう
でない部分の面積との割合）を部分的に調整することに
よって線量分布の均一化を図るものである。即ち、元の
線量分布が相対的に高い所に相当する部分の開口割合を
相対的に大きくする、あるいは逆に線量分布が相対的に
低い所に相当する部分の開口割合を相対的に小さくす
る。例えば、調整しようとする電子線照射装置の元の線
量分布が第６図に示したようなものであって、引出しグ
リッド３がメッシュの場合、線量分布が高い所のメッシ
ュの一部を取り去り（第３図のＡ部参照）その部分の開
口割合を大きくする。開口割合が大きい方が開口部に電
界が入り込んで電子線が良く引き出されるので、第３図
の実線のように線量分布は均一化される。この場合、こ
の開口割合を調整する方法においては線量分布を細かく
調整することができるので、この方法を上述した線状カ
ソード１の線径を調整する方法または線状カソード１の
ピッチを調整する方法と併用すれば、線量分布をより均
一に（より平坦に）することができる。FIG. 3 is a diagram for explaining still another example of the dose distribution uniformizing method according to the present invention. In this embodiment, the dose distribution is made uniform by partially adjusting the opening ratio (that is, the ratio of the area of the opening portion to the area of the other portion) of the extraction grid 3. That is, the opening ratio of the portion corresponding to the place where the original dose distribution is relatively high is made relatively large, or conversely, the opening ratio of the portion corresponding to the place where the dose distribution is relatively low is made relatively small. . For example, when the original dose distribution of the electron beam irradiation apparatus to be adjusted is as shown in FIG. 6 and the extraction grid 3 is a mesh, a part of the mesh where the dose distribution is high is removed ( (See part A in FIG. 3) Increase the opening ratio of that part. When the aperture ratio is larger, the electric field enters the aperture and the electron beam is well extracted, so that the dose distribution becomes uniform as shown by the solid line in FIG. In this case, since the dose distribution can be finely adjusted in the method of adjusting the opening ratio, this method is used to adjust the wire diameter of the linear cathode 1 or the method of adjusting the pitch of the linear cathode 1. When used in combination with, the dose distribution can be made more uniform (flatter).
以上のように第１の発明によれば、線状カソード相互間
で線径に差をつけて各線状カソード間における温度分布
を調整するという簡単な方法によって、電子線照射装置
における線量分布を均一化することができ、しかも余分
な部品や装置等を設けなくて済むので、電子線照射装置
の構造を複雑化せずに済み、コスト的にも安くできる。As described above, according to the first aspect of the invention, the dose distribution in the electron beam irradiation apparatus is made uniform by a simple method of adjusting the temperature distribution between the linear cathodes by making the diameters of the linear cathodes different from each other. Moreover, since it is possible to make the structure of the electron beam irradiating device simple, and it is not necessary to provide extra parts and devices, the structure of the electron beam irradiating device is not complicated, and the cost can be reduced.
また、第２の発明によれば、線状カソードの並設ピッチ
に差をつけて各線状カソード間における温度分布を調整
するという簡単な方法によって、電子線照射装置におけ
る線量分布を均一化することができ、しかも余分な部品
や装置等を設けなくて済むので、電子線照射装置の構造
を複雑化せずに済み、コスト的にも安くできる。According to the second invention, the dose distribution in the electron beam irradiation apparatus is made uniform by a simple method of adjusting the temperature distribution between the linear cathodes by making a difference in the arrangement pitch of the linear cathodes. Moreover, since it is not necessary to provide extra parts and devices, the structure of the electron beam irradiation device is not complicated and the cost can be reduced.
また、第３の発明によれば、各線状カソード間における
温度分布を調整すると共に引出しグリッドの開口割合を
部分的に調整するという簡単な方法によって、電子線照
射装置における線量分布をより均一化することができ、
しかも余分な部品や装置等を設けなくて済むので、電子
線照射装置の構造を複雑化せずに済み、コスト的にも安
くできる。Further, according to the third invention, the dose distribution in the electron beam irradiation apparatus is made more uniform by the simple method of adjusting the temperature distribution between the linear cathodes and partially adjusting the opening ratio of the extraction grid. It is possible,
Moreover, since it is not necessary to provide extra parts or devices, the structure of the electron beam irradiation device is not complicated, and the cost can be reduced.
第１図は、この発明に係る線量分布の均一化方法の一例
を説明するための図である。第２図は、この発明に係る
線量分布の均一化方法の他の例を説明するための図であ
る。第３図は、この発明に係る線量分布の均一化方法の
更に他の例を説明するための図である。第４図は、電子
線照射装置の一例を示す概略図である。第５図は、不均
一な線量分布の一例を示す図である。第６図は、不均一
な線量分布の他の例を示す図である。 １，１ａ，１ｂ……線状カソード、３……引出しグリッ
ド。FIG. 1 is a diagram for explaining an example of a method of equalizing the dose distribution according to the present invention. FIG. 2 is a diagram for explaining another example of the dose distribution uniformizing method according to the present invention. FIG. 3 is a diagram for explaining still another example of the dose distribution uniformizing method according to the present invention. FIG. 4 is a schematic diagram showing an example of the electron beam irradiation apparatus. FIG. 5 is a diagram showing an example of a non-uniform dose distribution. FIG. 6 is a diagram showing another example of the non-uniform dose distribution. 1, 1a, 1b ... Linear cathode, 3 ... Extraction grid.
Claims (3)
しグリッドを通して電子線を引き出す電子線照射装置に
おいて、線状カソード相互間で線径に差をつけることに
よって各線状カソード間における温度分布を調整し、そ
れによって引出しグリッドから引き出される電子線量の
分布を均一化することを特徴とする線量分布均一化方
法。1. An electron beam irradiation apparatus for extracting an electron beam from a plurality of linear cathodes arranged side by side through an extraction grid, and the temperature distribution between the linear cathodes is made different by making the diameters of the linear cathodes different from each other. Is adjusted so that the distribution of the electron dose extracted from the extraction grid is uniformed.
しグリッドを通して電子線を引き出す電子線照射装置に
おいて、線状カソードの並設ピッチに差をつけることに
よって各線状カソード間における温度分布を調整し、そ
れによって引出しグリッドから引き出される電子線量の
分布を均一化することを特徴とする線量分布均一化方
法。2. An electron beam irradiation apparatus for extracting an electron beam from a plurality of linear cathodes arranged side by side through an extraction grid so as to obtain a temperature distribution between the linear cathodes by making a difference in the arrangement pitch of the linear cathodes. A method of uniformizing a dose distribution, which comprises adjusting and homogenizing a distribution of an electron dose extracted from the extraction grid.
しグリッドを通して電子線を引き出す電子線照射装置に
おいて、各線状カソード間における温度分布を調整する
と共に引出しグリッドの開口割合を部分的に調整するこ
とによって、引出しグリッドから引き出される電子線量
の分布を均一化することを特徴とする線量分布均一化方
法。3. An electron beam irradiation device for extracting an electron beam from a plurality of linear cathodes arranged side by side through an extraction grid, and adjusting the temperature distribution between the linear cathodes and partially adjusting the opening ratio of the extraction grid. A uniform dose distribution method characterized by making the distribution of the electron dose extracted from the extraction grid uniform.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60024019A JPH0654642B2 (en) | 1985-02-09 | 1985-02-09 | Method for homogenizing dose distribution of electron beam irradiation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60024019A JPH0654642B2 (en) | 1985-02-09 | 1985-02-09 | Method for homogenizing dose distribution of electron beam irradiation device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61183859A JPS61183859A (en) | 1986-08-16 |
| JPH0654642B2 true JPH0654642B2 (en) | 1994-07-20 |
Family
ID=12126822
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60024019A Expired - Lifetime JPH0654642B2 (en) | 1985-02-09 | 1985-02-09 | Method for homogenizing dose distribution of electron beam irradiation device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0654642B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5962995A (en) † | 1997-01-02 | 1999-10-05 | Applied Advanced Technologies, Inc. | Electron beam accelerator |
| US6407399B1 (en) * | 1999-09-30 | 2002-06-18 | Electron Vision Corporation | Uniformity correction for large area electron source |
| JP4910819B2 (en) * | 2007-03-26 | 2012-04-04 | 澁谷工業株式会社 | Electron beam sterilizer |
| JP2010287387A (en) * | 2009-06-10 | 2010-12-24 | Nhv Corporation | Cathode structure of electron beam irradiation device |
| CN103069533B (en) * | 2010-08-26 | 2017-11-17 | 利乐拉瓦尔集团及财务有限公司 | Control mesh design for electron beam generating device |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4835300A (en) * | 1971-09-10 | 1973-05-24 | ||
| JPS5920957A (en) * | 1982-07-26 | 1984-02-02 | Nisshin Haiboruteeji Kk | Electron beam irradiator |
-
1985
- 1985-02-09 JP JP60024019A patent/JPH0654642B2/en not_active Expired - Lifetime
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| Publication number | Publication date |
|---|---|
| JPS61183859A (en) | 1986-08-16 |
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