JPS61194399A - Electron-ray projector - Google Patents
Electron-ray projectorInfo
- Publication number
- JPS61194399A JPS61194399A JP3495085A JP3495085A JPS61194399A JP S61194399 A JPS61194399 A JP S61194399A JP 3495085 A JP3495085 A JP 3495085A JP 3495085 A JP3495085 A JP 3495085A JP S61194399 A JPS61194399 A JP S61194399A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- foil
- cathode
- electron
- curved
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、線状カソードから引き出された電子線を箔
を通して被照射物に照射する電子線照射装置に関し、特
に、当該線状カソードの改良に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an electron beam irradiation device that irradiates an object to be irradiated with an electron beam extracted from a linear cathode through a foil, and particularly relates to an improvement of the linear cathode. Regarding.
第3図は従来の電子線照射装置の一例を示す概略断面図
であり、第4図は第3図のカソード回りを拡大して示す
概略斜視図である。低電位の真空容器4内に高電位(負
の高電位)の円筒状のシールド電極3が設けられていて
、当該シールド電極3内には複数本の線状カソードlが
長軸方向りに並設されており、当該線状カソード1から
シールド電極3と同電位の引出しグリッド2を通して電
子線Eが引き出される。そして、当該電子線Eは、例え
ばアルミニウム、チタン等から成っていて、真空側VS
と照射雰囲気側(例えば大気側)ASとを分離する箔6
を通して照射雰囲気側Asにある被照射物(図示省略)
に照射される。FIG. 3 is a schematic sectional view showing an example of a conventional electron beam irradiation device, and FIG. 4 is a schematic perspective view showing an enlarged view of the area around the cathode in FIG. 3. A cylindrical shield electrode 3 with a high potential (negative high potential) is provided in a vacuum container 4 with a low potential, and inside the shield electrode 3, a plurality of linear cathodes 1 are lined up in the longitudinal direction. An electron beam E is extracted from the linear cathode 1 through an extraction grid 2 having the same potential as the shield electrode 3. The electron beam E is made of aluminum, titanium, etc., and the electron beam E is made of, for example, aluminum, titanium, etc.
A foil 6 that separates AS from the irradiation atmosphere side (for example, the atmosphere side)
Object to be irradiated on the irradiation atmosphere side As (not shown)
is irradiated.
線状カソード1から引き出された電子線(ビーム)Eは
、はぼ線状カソード1の短軸方向Sの長さに等しい幅で
箔6や被照射物に当たる。従って、電子線電流を大電流
化する場合、箔6は短軸方向Sに十分幅広くても、電子
線Eが正味透過する幅は線状カソード1の長さに依って
しまい、箔6における透過ロスによる熱ロスが集中し、
遂には箔6が破損されてしまう。従って、電子線電流が
箔6によって制限されて、大電流化することはできない
という問題がある。The electron beam (beam) E extracted from the linear cathode 1 hits the foil 6 or the object to be irradiated with a width equal to the length of the short axis direction S of the linear cathode 1. Therefore, when increasing the electron beam current, even if the foil 6 is sufficiently wide in the short axis direction S, the net transmission width of the electron beam E depends on the length of the linear cathode 1. Heat loss due to loss is concentrated,
Eventually, the foil 6 will be damaged. Therefore, there is a problem that the electron beam current is limited by the foil 6 and cannot be increased to a large current.
従ってこの発明は、箔6における電子線密度を分散して
大電流を許容することができる電子線照射装置を提供す
ることを目的とする。Therefore, an object of the present invention is to provide an electron beam irradiation device that can disperse the electron beam density in the foil 6 and allow a large current.
この発明の電子線照射装置は、線状カソードを電子線引
出し方向に湾曲させている。In the electron beam irradiation device of the present invention, the linear cathode is curved in the electron beam extraction direction.
線状カソードが電子線引出し方向に湾曲しているため、
当該線状カソードの長さ方向に広がって電子線が引き出
される。これによって箔における電子線の密度が分散さ
れるので、大電流を許容することができる。Because the linear cathode is curved in the electron beam extraction direction,
The electron beam is drawn out by spreading in the length direction of the linear cathode. This disperses the electron beam density in the foil, making it possible to tolerate large currents.
第1図はこの発明の電子線照射装置の一例を示す概略断
面図であり、第2図は第1図のカソード回りを拡大して
示す概略斜視図である。第3図及び第4図と同等部分に
は同一符号を付してその説明を省略する。FIG. 1 is a schematic cross-sectional view showing an example of the electron beam irradiation apparatus of the present invention, and FIG. 2 is a schematic perspective view showing an enlarged view of the area around the cathode in FIG. 1. Components equivalent to those in FIGS. 3 and 4 are designated by the same reference numerals and their explanations will be omitted.
この発明の電子線照射装置においては、線状カソードを
電子線Eの引出し方向に湾曲させた湾曲カソード5を用
いている。そしてこの例では、複数本の湾曲カソード5
をシールド電極3内に長軸方向りに並設している。In the electron beam irradiation apparatus of the present invention, a curved cathode 5 in which a linear cathode is curved in the direction in which the electron beam E is extracted is used. In this example, a plurality of curved cathodes 5
are arranged in parallel in the longitudinal direction within the shield electrode 3.
湾曲カソード5からは、当該カソードの長さ方向に(即
ち短軸方向Sに)広がって電子線Eが引き出される。従
って、短軸方向Sに従来例の線状カソードlの場合と同
じ長さの湾曲カソード5の場合でも、箔6での電子線E
の密度が分散されるので、熱ロスによる箔6の破損は、
電子線電流を更に大電流にしないと生じないことになる
。即ち、この発明によれば、従来例に比べて大電流を許
容することができる。また、同じ電子線電流で比較する
と、電子線の密度が下がる分だけ、従来例の場合よりも
箔6の寿命が伸びることになる。An electron beam E is drawn out from the curved cathode 5, spreading in the length direction of the cathode (ie, in the short axis direction S). Therefore, even if the curved cathode 5 has the same length in the short axis direction S as the linear cathode l of the conventional example, the electron beam E in the foil 6
Since the density of the foil 6 is dispersed, damage to the foil 6 due to heat loss is
This will not occur unless the electron beam current is made even larger. That is, according to the present invention, a larger current can be tolerated than in the conventional example. Furthermore, when compared with the same electron beam current, the life of the foil 6 is extended compared to the conventional example by the amount that the density of the electron beam is reduced.
以上のようにこの発明によれば、線状カソードを湾曲さ
せることによって箔の熱ストレスが緩和されるので、大
きな電子線電流を許容することができる。また、箔の長
寿命化を図ることもできる。As described above, according to the present invention, the thermal stress of the foil is alleviated by curving the linear cathode, so that a large electron beam current can be tolerated. Furthermore, it is possible to extend the life of the foil.
第1図は、この発明の電子線照射装置の一例を示す概略
断面図である。第2図は、第1図のカソード回りを拡大
して示す概略斜視図である。第3図は、従来の電子線照
射装置の一例を示す概略断面図である。第4図は、第3
図のカソード回りを拡大して示す概略斜視図である。
5・・・湾曲カソード、6・・・箔、As・・・照射雰
囲気側、E・・・電子線FIG. 1 is a schematic sectional view showing an example of an electron beam irradiation device of the present invention. FIG. 2 is an enlarged schematic perspective view showing the area around the cathode in FIG. 1. FIG. 3 is a schematic cross-sectional view showing an example of a conventional electron beam irradiation device. Figure 4 shows the third
It is a schematic perspective view which expands and shows the cathode area of a figure. 5... Curved cathode, 6... Foil, As... Irradiation atmosphere side, E... Electron beam
Claims (1)
て被照射物に照射する電子線照射装置において、線状カ
ソードを電子線引出し方向に湾曲させたことを特徴とす
る電子線照射装置。(1) An electron beam irradiation device that irradiates an object to be irradiated with an electron beam drawn from a linear cathode through a foil, characterized in that the linear cathode is curved in the electron beam extraction direction.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3495085A JPS61194399A (en) | 1985-02-22 | 1985-02-22 | Electron-ray projector |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3495085A JPS61194399A (en) | 1985-02-22 | 1985-02-22 | Electron-ray projector |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61194399A true JPS61194399A (en) | 1986-08-28 |
Family
ID=12428443
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3495085A Pending JPS61194399A (en) | 1985-02-22 | 1985-02-22 | Electron-ray projector |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61194399A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0337588A2 (en) * | 1988-04-14 | 1989-10-18 | The Regents Of The University Of California | MRI compensated for spurious NMR frequency/phase shifts caused by spurious changes in magnetic fields during NMR data measurement processes |
-
1985
- 1985-02-22 JP JP3495085A patent/JPS61194399A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0337588A2 (en) * | 1988-04-14 | 1989-10-18 | The Regents Of The University Of California | MRI compensated for spurious NMR frequency/phase shifts caused by spurious changes in magnetic fields during NMR data measurement processes |
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