JPH0649673A - 凹凸基板の表面を選択的に露出する方法及び装置 - Google Patents

凹凸基板の表面を選択的に露出する方法及び装置

Info

Publication number
JPH0649673A
JPH0649673A JP5076778A JP7677893A JPH0649673A JP H0649673 A JPH0649673 A JP H0649673A JP 5076778 A JP5076778 A JP 5076778A JP 7677893 A JP7677893 A JP 7677893A JP H0649673 A JPH0649673 A JP H0649673A
Authority
JP
Japan
Prior art keywords
substrate
substrate surface
prism
photosensitive material
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5076778A
Other languages
English (en)
Japanese (ja)
Inventor
Francis J Mcfadden
フランシス・ジェイムズ・マクファデン
Michael F Weber
マイケル・フランシス・ウェーバー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of JPH0649673A publication Critical patent/JPH0649673A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/948—Radiation resist
    • Y10S438/949—Energy beam treating radiation resist on semiconductor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • ing And Chemical Polishing (AREA)
JP5076778A 1992-04-03 1993-04-02 凹凸基板の表面を選択的に露出する方法及び装置 Pending JPH0649673A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US863402 1992-04-03
US07/863,402 US5292625A (en) 1992-04-03 1992-04-03 Method for selectively exposing an uneven substrate surface

Publications (1)

Publication Number Publication Date
JPH0649673A true JPH0649673A (ja) 1994-02-22

Family

ID=25341038

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5076778A Pending JPH0649673A (ja) 1992-04-03 1993-04-02 凹凸基板の表面を選択的に露出する方法及び装置

Country Status (4)

Country Link
US (1) US5292625A (enExample)
EP (1) EP0564364A2 (enExample)
JP (1) JPH0649673A (enExample)
KR (1) KR930022146A (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5365356A (en) * 1992-08-11 1994-11-15 Minnesota Mining And Manufacturing Company Method of fabricating an encapsulated liquid crystal display
US5629784A (en) * 1994-04-12 1997-05-13 Ois Optical Imaging Systems, Inc. Liquid crystal display with holographic diffuser and prism sheet on viewer side
US6077560A (en) * 1997-12-29 2000-06-20 3M Innovative Properties Company Method for continuous and maskless patterning of structured substrates
US5963284A (en) * 1998-04-01 1999-10-05 Ois Optical Imaging Systems, Inc. LCD with diffuser having diffusing particles therein located between polarizers
EP1001311A1 (en) * 1998-11-16 2000-05-17 International Business Machines Corporation Patterning device
US7354519B1 (en) 2003-02-03 2008-04-08 Hutchinson Technology Incorporated Method and apparatus for fabricating a stent
US8097400B2 (en) * 2005-02-22 2012-01-17 Hewlett-Packard Development Company, L.P. Method for forming an electronic device
US8803028B1 (en) 2005-04-13 2014-08-12 Genlyte Thomas Group, Llc Apparatus for etching multiple surfaces of luminaire reflector

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA827832A (en) * 1969-11-18 E. Clark Harold Image formation and projection
DE1252061B (enExample) * 1962-07-02
NL7808899A (nl) * 1978-08-30 1980-03-04 Philips Nv Weergeefinrichting met vloeibaar kristal.
US4218302A (en) * 1979-08-02 1980-08-19 U.S. Philips Corporation Electrophoretic display devices
JPS60230601A (ja) * 1984-05-01 1985-11-16 Masayasu Negishi 膜処理方法
JPS61156003A (ja) * 1984-12-27 1986-07-15 Sharp Corp 回折格子の製造方法
CA1270934A (en) * 1985-03-20 1990-06-26 Masataka Shirasaki Spatial phase modulating masks and production processes thereof, and processes for the formation of phase-shifted diffraction gratings
GB8629223D0 (en) * 1986-12-06 1987-01-14 Emi Plc Thorn Replication of carriers

Also Published As

Publication number Publication date
US5292625A (en) 1994-03-08
EP0564364A3 (enExample) 1995-01-18
KR930022146A (ko) 1993-11-23
EP0564364A2 (en) 1993-10-06

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