JPH064921A - Production of magneto-optical recording medium and device therefor - Google Patents

Abstract

PURPOSE:To obtain the production method and the production device of a magneto-optical disk high in productivity. CONSTITUTION:The a turntable 89 fixed with plural sputtering cathodes 81, 82 on which targets 83, 84 made of prescribed raw materials are respectively mounted by the prescribed arranging mode is always rotated in a sputtering room A in a vacuum enclosure. A substrate 1 on which target materials are to be sputtered is fitted to a substrate holding body C in an atmosphere and then moved to the prescribed position in the sputtering room A via a preliminary evacuating room B. At this position, to the substrate 1 in a standstill condition, films are formed by sputtering with the materials of targets 83, 84 provided on the rotating cathodes 81, 82. Consequently, loading/unloading mechanism of the substrate 1 to/from the substrate holding body C is simple, the loading/unloading time of the substrate 1 is shortened, further the member having simple constitution can be used as the masking member for forming an exposing part of the substrate provided on an inner and outer periphery of the substrate and the production efficiency of the magneto-optical disk is remarkably improved.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for manufacturing a magneto-optical recording medium.

[0002]

2. Description of the Related Art Information is recorded on a magnetic layer of a magnetic recording medium by utilizing a change in magnetic characteristics of a magnetic material due to heat, and information is recorded on the magnetic layer of the above-mentioned magnetic recording medium. The magneto-optical recording / reproducing method in which the state of the change in magnetization corresponding to the recorded information that has been recorded is read out by using an optical effect associated with magnetism such as the Faraday effect or Kerr effect is described in the above-mentioned magnetic field. Since a high density recording and reproduction is possible by using a perpendicular magnetization film as a layer, many methods using various magneto-optical recording media have been proposed, and a disc-shaped magneto-optical recording medium (magneto-optical disc). The optical disc memory using) has been actively researched and developed as a large-capacity file that can be attached to and detached from a recording / reproducing device and can be rewritten, and some examples have been commercialized. .

By the way, the above-mentioned magneto-optical disk is constructed by using the perpendicularly magnetized film as the magnetic layer as described above, but the magneto-optical disk proposed hitherto directly performs overwriting. In addition to the configuration that cannot be performed, a magnetic disk that can be directly overwritten can be used as a heavy rare earth metal as disclosed in, for example, Japanese Patent Laid-Open No. 62-175948 and other documents. A first magnetic layer having a high coercive force and a low Curie temperature due to an amorphous alloy with a transition metal and functioning as a recording layer for recording and reproduction, and an amorphous alloy with a heavy rare earth metal and a transition metal lower A two-layer type magneto-optical disk having a coercive force and a high Curie temperature and a second magnetic layer having a function as an auxiliary layer for assisting writing. Click and, for example, JP 63 over 268
As disclosed in Japanese Patent Application Laid-Open No. 103, Japanese Patent Application Laid-Open No. 1-241051, and other documents, a recording layer made of an amorphous alloy of a heavy rare earth metal and a transition metal in the above-mentioned two-layer type magneto-optical disk, It is well known that a three-layer type or a four-layer type magneto-optical disk, which is configured to include at least an initialization layer in addition to an auxiliary layer, is proposed, and it is well known that the magneto-optical disk described above is used. A single-layer or multiple-layer magnetic layer (magnetic film) to be formed on a substrate (for example, a substrate made of a polycarbonate resin) at the time of manufacturing, for example, Tb
When an amorphous alloy film of FeCo, a heavy rare earth metal and a transition metal, an artificial lattice film such as PtCo, or another film is used, a vacuum film forming method such as a sputtering method or a vapor deposition method is used. There is.

By the way, using the sputtering method,
When a magneto-optical disk is manufactured by depositing a predetermined magnetic layer on a substrate, the magneto-optical disk is mounted on the cathode 3 fixed to the support 5 as shown in FIG. The upper space of the magnetic alloy target 4 having the same composition as that of the magnetic film to be formed on the substrate 1 is passed through the substrates 1, 1 ... A magnetic film having a predetermined composition is formed on top. As illustrated in FIG. 5, in the space above the plurality of targets 4a and 4b of the raw material (magnetic material) of the magnetic layer to be formed on the substrate 1, the rotation fixed to the rotation shaft 17 is performed. Substrates 1, 1 attached to the support plate 16 ...
Is rotated by the rotation support plate 16 described above, and the amount of power supplied to the cathodes 15a and 15b to which the plurality of targets 4a and 4b are individually attached and the energization time are adjusted, and the substrate 1 , 1 ... A magnetic film having a predetermined composition is formed on the substrates 1, 1 ... by a so-called co-sputtering method. Various manufacturing methods have been adopted.

In FIG. 4 mentioned above, 6 is a bottom plate of the fuselage,
7 is a top plate of the body, 12 is a preparation room (stocker room), 1
3 is a sputtering chamber, 14 is an extraction chamber,
Movable partition walls 8 to 11 are configured so that airtightness can be secured as partition walls of the chambers 12 to 14 and can communicate with each other between the chambers 12 to 14 or a space outside the machine. Is. Each of the above-mentioned chambers 12 to 14 is provided with an exhaust means (not shown) that can independently achieve a predetermined degree of vacuum. A predetermined atmosphere gas (eg, argon gas) is introduced into the sputtering chamber 13, and a predetermined power is supplied to the cathode 3 from the outside. The material (the pallet 2 to which the substrates 1, 1 ... To be sputtered are attached) is supplied to the charging chamber 12 while the movable partition 9 between the charging chamber 12 and the sputtering chamber 13 is closed. 8 is opened and it is performed from outside the aircraft.

The charging chamber 12 to which the material is supplied is exhausted after closing the movable partition wall 8. Material for sputtering chamber 13 (substrates 1, 1 to be sputtered)
The pallet 2) to which is attached is supplied from the charging chamber 12 to the sputtering chamber 13 by opening the movable partition wall 9, and the sputtering chamber 13 passes through the space above the target 4 from the charging chamber 12 described above. Then, a film is formed by sputtering a target material on the substrates 1, 1 ... Attached to the pallet 2 moving toward the unloading chamber 14. The product is taken out from the take-out chamber 14 by closing the movable partition wall 10 between the sputtering chamber 13 and the take-out chamber 14 and then opening the movable partition wall 11 provided between the take-out chamber 14 and the outside of the machine. Be done.

In FIG. 5, 19 is a bottom plate of the machine body, 20 is a top plate of the machine body, 23 is a sputtering chamber, and 21, 22 are the above-mentioned sputtering chambers 23.
The partition wall is a movable partition wall configured so as to ensure airtightness and to connect the sputtering chamber and a space outside the machine. The above-mentioned sputtering chamber 23 is provided with exhaust means (not shown) capable of achieving a predetermined degree of vacuum, and is designed to introduce a predetermined atmosphere gas (for example, argon gas), as well as the cathode 15a. , 15b is supplied with a predetermined power independently adjusted for each cathode from the outside for a predetermined time length. 18 is from the outside air to the sputtering chamber 23
A member for maintaining the airtightness of the passage portion of the rotating shaft 17 which is penetrated in the housing 19 is, for example, a rubber packing.

When a magnetic film having a predetermined composition is formed on the substrates 1, 1 ... Using the apparatus shown in FIG. 5, the rotation of the rotary shaft 17 is stopped. In this state, the substrates 1, 1, ... Are attached to the rotating support plate 16 in the open sputtering chamber 23, the movable partition walls 21, 22 are closed, and the sputtering chamber 23 is evacuated, after which the rotary shaft 17 is rotated. At the same time, a predetermined atmosphere gas (eg, argon gas) is introduced into the sputtering chamber 23, and predetermined electric power is supplied to the cathodes 15a and 15b from the outside for a predetermined time period. The target materials 4a and 4b are sputtered on the substrates 1, 1 ... After the film formation is completed, the rotating shaft 17 is stopped, the partition walls 21 and 22 provided between the sputtering chamber 23 and the outside are opened, and the substrates 1, 1 ... Take out.

[0009]

In the above-described manufacturing method described as a conventional example of a method for manufacturing a magneto-optical disk, when the composition of the alloy used as the target 4 is inappropriate, the above-mentioned target is used. Unless substrate 4 is changed to a target having a predetermined alloy composition, substrate 1,
1 ... has a drawback that a magnetic film having a predetermined composition cannot be formed on it, and in the co-sputtering method described above, the amount of electric power supplied to individual cathodes in a plurality of cathodes and the energization time are set. Since each of the substrates can be adjusted independently, there is no drawback as in the above-mentioned manufacturing method, but since the substrates 1, 1 ... Since the number of processed sheets is limited, there is a problem that the production efficiency is low.

By the way, when the sputtering method is applied at the time of film formation required for manufacturing an optical disk, in order to increase the production efficiency, film formation processing by sputtering is performed at high speed on each substrate. The so-called single-wafer optical disc manufacturing method
For example, it is practically used when forming an aluminum reflective film on a compact disc. The single-wafer film formation described above does not cause any problems when the film-forming substance is a single metal as in the case of the aluminum reflective film in the compact disc described above, but the film to be formed on the substrate. However, it is used as a target in the case of a magneto-optical disk which needs to be formed by an amorphous alloy film of TbFeCo or other heavy rare earth metal and a transition metal, or an artificial lattice film such as PtCo. If the composition of the alloy is not appropriate, a magneto-optical disk with the specified characteristics cannot be manufactured,
Unless the target is changed to a target having a predetermined alloy composition, a magnetic film having a predetermined composition cannot be formed on the substrate, which is the same as the above-described conventional manufacturing method. Become.

Therefore, it has been attempted to apply the above-mentioned defect-free co-sputtering method to the manufacture of a single-wafer type magneto-optical disk. However, in the case where the co-sputtering method is used, it is provided for each cathode. Since it is necessary to rotate the substrate at a high speed so that any of the target substances present can be evenly attached to the substrate, even if the above-mentioned single-wafer type is adopted, each substrate Since it is necessary to start and stop the rotary drive system for each time, it takes a lot of time to attach the substrate to the sputtering apparatus and remove the substrate from the sputtering apparatus, resulting in low production efficiency. The substrate mounted on the substrate is required to have good adhesion between the rotating member and the substrate even at high speed rotation. In addition to the complicated mounting mechanism, it is used to form an exposed portion of the substrate, which is required to be provided on the inner and outer circumferences of the substrate, in order to provide a protective film on the magnetic layer of the magneto-optical disk. The mask body (mask member) is required to have a complicated structure and a mounting structure, so that a solution has been demanded.

[0012]

A rotary support, to which a plurality of sputtering cathodes, each of which has a target of a predetermined material mounted thereon, is fixed in a predetermined arrangement, is constantly rotated in a sputtering chamber in a vacuum envelope. And the preliminary exhaust chamber provided adjacent to the sputtering chamber via the airtight holding member that can be opened and closed, and the sputtering chamber and the preliminary exhaust chamber are blocked by the airtight holding member. In the state, the preliminary exhaust chamber is opened to the outside air, the step of exposing the mounting portion of the substrate in the substrate holder to the outside air, and the step of mounting the substrate in the mounting portion of the substrate in the substrate holder in the outside air, A step of evacuating the preliminary exhaust chamber so that the substrate mounted on the substrate holder has a predetermined degree of vacuum in a state where the substrate is housed in the preliminary exhaust chamber; The step of moving the substrate to make the sputtering chamber and the preliminary exhaust chamber communicate with each other, then displacing the substrate holder to hold the substrate stationary at a predetermined position in the sputtering chamber, and the power supplied to each of the above-mentioned sputtering cathodes. The size and the supply time length are controlled independently for each sputtering cathode, and sputtering is performed on the substrate. After the substrate is moved to the outside of the sputtering chamber by the substrate holder, the sputtering chamber and the preliminary evacuation are performed by the airtight holding member. A method for manufacturing a magneto-optical recording medium, which comprises a step of disconnecting the chamber from the chamber, a step of opening the preliminary exhaust chamber to the outside air, and removing the substrate mounted on the substrate holder, and a predetermined method for each. Vacuum the rotary support with multiple sputtering cathodes attached to the material target in a fixed arrangement. A means for driving and rotating in the sputtering chamber in the enclosure, a means for independently controlling the magnitude of the electric power supplied to each of the above-mentioned sputtering cathodes and a supply time length for each individual sputtering cathode, and the substrate can be detachably mounted. The position of the substrate mounted on the substrate holder is the first position set in the sputtering chamber so as to have a predetermined distance from the surface of the target mounted on the sputtering cathode, and the position described above. The sputtering chamber and the preliminary exhaust chamber are isolated from each other by the second position set in the preliminary exhaust chamber formed by separating the open / close airtight holding member from the sputtering chamber and the openable / closable airtight holding member. In this state, the preliminary exhaust chamber is selectively moved to three positions including the third position in the outside air when it is opened to the outside air. And means for removing the substrate from the substrate holder and attaching a new substrate to the substrate holder when the substrate mounted on the substrate holder is in the third position described above. Means, a means for exhausting the preliminary exhaust chamber when the substrate mounted on the substrate holder is in the second position, and a sputtering chamber and preliminary exhaust when the preliminary exhaust chamber has a predetermined vacuum degree. Means for moving the substrate mounted on the substrate holder to the first position described above by removing the airtight holding member between the chamber and the chamber, and sputtering on the substrate in the stationary state at the first position. And a device for producing a magneto-optical recording medium.

[0013]

A rotary support, to which a plurality of sputtering cathodes, each of which has a target of a predetermined material mounted thereon, is fixed in a predetermined arrangement, is constantly rotated in a sputtering chamber in a vacuum envelope. After mounting the substrate to be sputtered on the substrate holder in the open air, it is moved to a predetermined position in the sputtering chamber through the preliminary exhaust chamber and is rotating with respect to the stationary substrate at that position. Since the target material provided in the cathode is sputtered, the substrate attachment / detachment mechanism with respect to the substrate holder may be simple, the substrate attachment / detachment time is short, and the exposed portion of the substrate provided on the inner and outer peripheries of the substrate A mask member with a simple structure can also be used as a mask member for forming the optical disk, which can significantly improve the manufacturing efficiency of the magneto-optical disk. To become.

[0014]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The concrete contents of the method and apparatus for manufacturing a magneto-optical recording medium of the present invention will be described in detail below with reference to the accompanying drawings. 1 to 3 are longitudinal sectional views showing a schematic configuration of a magneto-optical disk manufacturing apparatus used in a method of manufacturing a magneto-optical recording medium according to the present invention. In the magneto-optical disk manufacturing apparatus used in the method of manufacturing the magneto-optical recording medium of the present invention shown in each of FIGS. 1 to 3, in FIG. 1, the sputtering chamber A and the preliminary exhaust chamber B are openable and closable. When the preliminary exhaust chamber B is opened to the outside air while being separated by the airtight holding member 68, that is, the substrate 1
FIG. 2 is a diagram showing a state in which the substrate can be attached to or removed from the substrate holder C in the open air, and FIG.
And the preliminary exhaust chamber B are separated from each other by the airtight holding member 68 which can be opened and closed, and the substrate mounted on the substrate holder is placed in the preliminary exhaust chamber B. FIG. 3 is a view showing a state in which the air inside can be exhausted. Further, FIG. Board 1 mounted on
However, a predetermined portion of the outer periphery of the substrate 1 is masked by an outer peripheral mask body 57 provided at a predetermined position in the sputtering chamber A, and an inner peripheral mask body 58 forms a central hole 1a of the substrate 1 and FIG. 6 is a diagram showing a state in which a predetermined portion of the periphery of the substrate 1 is masked and kept stationary, and the substrate 1 can be sputtered.

In each of the above-mentioned drawings, reference numeral 24 denotes a machine board, and a motor 25 is fixed to the machine board 24. A gear 30 is fixed to the rotary shaft 26 of the motor 25, and a gear 31 meshing with the gear 30 is fixed to the rotary shaft 32. So, the motor 2
When 5 rotates, the rotational force of the motor 25 causes the gear 3 described above to rotate.
It is transmitted to the rotary shaft 32 via 0 and 31 to rotate the rotary shaft 32. As a result, the turntable 89 made of an insulating material and integrally formed with the rotating shaft 32 is rotated, and the cathode assembly D fixed to the turntable 89 is rotated. Reference numeral 33 denotes a rotary feedthrough fixed to a top plate 34 of the vacuum envelope, and the rotary feedthrough 33 shuts off the inside and outside of the vacuum envelope so that the inside of the vacuum envelope is predetermined. It is a member that rotatably supports the rotating shaft 32 in a state of being maintained at the degree of vacuum.
Reference numeral 34a is a hole provided in the top plate 34 of the vacuum envelope, and 27 is a rotary joint fixed to the machine plate 24 described above. The rotary joint 27 has a function of connecting a water supply pipe connecting portion 28 and a drain pipe connecting portion 29 which are connected to the rotary joint 27, and a water supply and drain pipe formed inside the rotating shaft 32. It is configured.

The cooling water supplied into the rotary joint 27 from the connection portion 28 of the water supply pipe described above passes through the water supply passages 74 and 75 provided in the rotary shaft 32 and then flows through the pipes 79 and 80. It flows and is supplied into the cathodes 81 and 82 provided in the cathode structure D. And
The cooling water supplied into the cathodes 81 and 82 passes through the pipes 77 and 78 and then flows into the drainage channel 7 in the rotary shaft 32.
6 through the rotary joint 27 to be drained from the drain pipe connecting portion 29. Thereby, the cathode 8
Electrodes (targets) 83, 8 provided on the cathode structure D even when large electric power is supplied to the electrodes 1, 82.
4, a permanent magnet for magnetron sputtering, etc., can be prevented from excessively rising in temperature, and the rubber packing 47 to 47 used for keeping the vacuum envelope airtight.
The deterioration of 56 can be prevented.

A plurality of cathodes 81, 8 fixed to the above-mentioned turntable 89 and provided on a cathode structure D which rotates integrally with the above-mentioned turntable 89.
2, the power supplied to the power supply terminals 35 and 36 provided on the top plate 34 of the vacuum envelope described above is
It is given to individual cathodes 81 and 82 via slip rings 37 and 38 connected via connecting lines 45 and 46, and sliders 39 and 40 that individually slide on the slip rings 37 and 38, respectively. . The slip rings 37 and 38 described above are provided on the insulating mounting members 41 and 43, and the insulating mounting members 41 and 43 are mounted on the top plate 34 of the vacuum envelope by screws 42 and 44, respectively. Is stuck to. Therefore, the above-mentioned power supply terminals 35, 3
In the control circuit (not shown) connected to 6, the magnitude of supply current and energization time (including energization timing)
By controlling the film thickness, it is possible to form a film in which the composition of the magnetic film formed on the substrate 1 during the sputtering operation is precisely controlled.

Reference numeral 87 denotes a member which is connected to the top plate 34 of the vacuum envelope and the bottom plate 88 of the sputtering chamber A, and which constitutes the sputtering chamber A together with the top plate 34 and the bottom plate 88, 71 Is an argon gas supply port, 72
Is an outlet for argon gas. An outer peripheral portion mask body 57 for masking a predetermined portion of the outer peripheral portion of the substrate is fixed to the outer peripheral portion of the opening portion 90 provided in the bottom plate 88 of the sputtering chamber A. An inner peripheral mask body 58 for masking the central hole 1a of the substrate 1 and a predetermined portion around the central hole 90 is provided in the central portion of the substrate 90.
The illustration of the supporting body is omitted. Reference numeral 59 is a plunger fixed to the bottom plate 88 of the sputtering chamber A, and a wall plate 61 forming a part of the movable portion of the preliminary exhaust chamber B is fixed to the tip of the operating rod 60 of the plunger 59. The wall plate 61 is provided with a hole 91.
Further, one end of a box body 62 is fixed to the wall plate 61.

A plunger 63 is fixed to the other end 62a of the box 62. Reference numeral 66 is an operating rod of the plunger 63 described above, and this operating rod 66 is the box 6 described above.
The bottom plate 64 of the substrate holder C is fixedly attached to the tip of the protrusion. A support 92 for the substrate mounting portion is planted in the center of the bottom plate 64 of the substrate holder C, and the support 92 for the substrate mounting portion is attached to the wall plate 61 of the preliminary exhaust chamber B. Hole 6 that has been drilled
The substrate mounting portion 67 of the substrate holder C described above is provided at the front end portion of the support body 92 of the substrate mounting portion, which penetrates through 1. Further, each one end of a bellows 65 is fixed to the bottom plate 64 of the substrate holder C and the wall plate 61 of the preliminary exhaust chamber B.

Reference numeral 70 denotes a bottom member of the vacuum envelope which is connected and fixed to the bottom plate 88 of the sputtering chamber A and constitutes a part of the vacuum envelope. The airtight holding member 6 which can be opened and closed is already provided on each member 70.
A moving passage portion 93 in which 8 can move according to the movement of the operating rod 69, a space portion 94 for communicating the above-described sputtering chamber A and the preliminary exhaust chamber B, and a space portion 95 forming a part of the preliminary exhaust chamber B. It is provided with an exhaust port 73 and the like used when the preliminary exhaust chamber B is evacuated.
The operating rod 69 for moving the airtight holding member 68 which can be freely opened and closed is performed by the operation of a plunger (not shown), and the exhaust operation from the preliminary exhaust chamber B is performed by the auxiliary exhaust chamber B and the exhaust. This is done through the moving passage portion 93 existing between the mouth 3.

FIG. 1 shows a magneto-optical disk manufacturing apparatus used in the method for manufacturing a magneto-optical recording medium according to the present invention, in which an openable / closable airtight holding member 68 is inserted between a sputtering chamber A and a preliminary exhaust chamber B. By doing so, in a state in which the open / closed airtight holding member 68 interrupts the communication between the sputtering chamber A and the preliminary exhaust chamber B, the plunger 59 is operated so that the operating rod 60 projects, and the preliminary exhaust is performed. The wall plate 61 forming a part of the movable portion of the chamber B is separated from the bottom members 70 of the vacuum envelope, the preliminary exhaust chamber B is opened to the outside air, and the substrate 1 is held in the outside air. The state which can be attached or detached to the body C is shown. In this state, the airtight holding member 68, which can be opened and closed, has its tip end near the end 93a of the moving passage portion 93, and the packings 53, 5 provided on the upper surface 68a side thereof.
The airtightness of the sputtering chamber A is completely maintained by the airtight holding member 68 which can be opened and closed by closely contacting the upper surface of the moving passage portion 93 provided in the bottom member 70 of the vacuum envelope. The attachment / detachment operation of the substrate 1 and the substrate holder C can be extremely easily performed by using, for example, a so-called magnet chuck.

Next, as shown in FIG. 2, the sputtering chamber A and the preliminary exhaust chamber B are mounted on the substrate holder in the preliminary exhaust chamber B which is formed by being separated by the airtight holding member 68 which can be opened and closed. 1 shows a magneto-optical disk manufacturing apparatus in the case where a substrate is placed and the air in the pre-evacuation chamber B is ready to be exhausted. The magneto-optical disk manufacturing apparatus is shown in FIG. The state shown in FIG. 2 is changed to the state shown in FIG. 2 by moving the operating rod 60 of the plunger 59 from the projecting state shown in FIG. 1 to the retracted state. In the magneto-optical disk manufacturing apparatus shown in FIG. 2, the preliminary exhaust chamber B is
The packings 53 and 54 provided on the upper surface 61a side of the wall plate 61 forming a part of the movable part of the above are in close contact with the lower surface 70a of the bottom members 70 of the vacuum envelope, and the preliminary exhaust chamber B The airtightness of is obtained. In the magneto-optical disk manufacturing apparatus in the state shown in FIG. 2, the preliminary exhaust chamber B is evacuated by a vacuum pump (not shown) connected to the preliminary exhaust port 73 to bring the preliminary exhaust chamber B to a predetermined degree of vacuum.

Then, a plunger (not shown) is operated to move the airtight holding member 68 which can be opened and closed by its operating rod 69 from the position shown in FIG. 2 to the position shown in FIG. Then, the sputtering chamber A and the preliminary exhaust chamber B are in communication with each other via the opening 90 provided in the bottom plate 88 of the sputtering chamber A and the space 94. Then, when the plunger 63 is operated and the operating rod 66 thereof is projected, the substrate mounting attached to the central portion of the bottom plate 64 of the substrate holder C fixed to the tip end of the operating rod 66 is mounted. 1 mounted on the substrate mounting portion 67 formed at the end of the supporting body 92
Is moved from the space portion 95 of the preliminary exhaust chamber B to the sputtering chamber A through the space portion 94 and the opening 90 provided in the bottom plate 88 of the sputtering chamber A, and the substrate 1 is placed in the sputtering chamber A. A state in which a predetermined portion of the outer periphery of the substrate 1 is masked by the outer peripheral mask body 57 provided on the inner surface of the substrate 1 and a predetermined portion around the hole 1a in the center of the substrate 1 is masked by the inner peripheral mask body 58. It is positioned by and is fixed stationary at that position.
In this state, the sputtering chamber A and the preliminary exhaust chamber B
However, the airtightness of the entire vacuum envelope including the sputtering chamber A and the preliminary exhaust chamber B is determined by the presence of the bellows 65 due to the movement of the substrate holder C. Is completely retained by.

Next, a power supply terminal 35 provided on the top plate 34 of the vacuum envelope from a control circuit (not shown),
When the operating power is supplied to the slip ring 36, the slip rings 37 and 38 connected to the power supply terminals 35 and 36 via the connection lines 45 and 46 and the slip rings 37 and 38 are individually connected. The cathodes 81 and 82 in the cathode structure D fixed to the turntable 89 made of an insulating material that rotates integrally with the rotary shaft 32 through the sliders 39 and 40 that come into sliding contact with The operating power of the target 8 is supplied to the targets 8 of the cathodes 81 and 82.
The respective target materials ejected from the respective targets of 3, 84 are the hoods 8 of the respective cathodes 81, 82.
Films are formed on the substrate 1 by jumping to the substrate 1 through the openings 85a and 86a provided in the substrates 5 and 86. In the control circuit (not shown) described above, the top plate 3 of the vacuum envelope is used.
4 is formed on the substrate 1 during the sputtering operation by controlling the magnitude of the operating current supplied to the power supply terminals 35 and 36 provided in FIG. 4 and the energizing time (including the energizing timing). The composition of the magnetic film is formed in a precisely controlled state.

After the film formation on the substrate 1 is completed by sputtering, the plunger 63 is operated to retract the operating rod 66 thereof. Thereby, the above-mentioned operating rod 6
6 is a support 92 for a substrate mounting portion, which is planted in the central portion of the bottom plate 64 of the substrate holder C fixed to the tip of the substrate 6.
The substrate 1 mounted on the substrate mounting portion 67 formed at the end of the
Through the opening 90 provided in the bottom plate 88 and the space 94, and is moved to the position of the space 95 of the preliminary exhaust chamber B. Then, by operating a plunger (not shown), the operating rod 69 of the plunger is projected, the openable / closable airtight holding member 68 is advanced in the moving passage portion 93, and the open / closed airtight holding member 68 is used for sputtering. The state as shown in FIG. 2 in which the chamber A and the preliminary exhaust chamber B are shut off is set. Then, the outside air is introduced into the preliminary exhaust chamber B from the exhaust port 73, and then the plunger 59 is operated,
By projecting its operating rod 60, the wall plate 61 forming a part of the movable portion of the preliminary exhaust chamber B is separated from the bottom members 70 of the vacuum envelope, and the preliminary exhaust chamber B is exposed to the outside air. In the open state, the substrate 1 can be attached to or removed from the substrate holder C in the open air. According to the method of manufacturing a magneto-optical disk in each of the above-mentioned steps, which is performed by a single-wafer method using the above-mentioned magneto-optical disk manufacturing apparatus, it is possible to manufacture one by one in a short time.

In the above-described embodiment, the number of cathodes is two. However, it is needless to say that the present invention can be satisfactorily implemented even if the number of cathodes is three or more. It is needless to say that the present invention can be favorably applied not only to the case of forming the magnetic layer of layers but also to the case of forming the multilayer magnetic layer on the substrate.

[0027]

As is clear from the above description, the method and apparatus for manufacturing a magneto-optical recording medium according to the present invention has a plurality of sputtering cathodes each having a target of a predetermined material mounted thereon. The rotary support fixed in the arrangement mode is constantly rotated in the sputtering chamber in the vacuum envelope, and the substrate on which the target material is to be sputtered is mounted on the substrate holder in the open air, and then the substrate is held. It moves to a predetermined position in the sputtering chamber through the pre-evacuation chamber, and at that position, the target material provided on the cathode rotating with respect to the substrate in a stationary state is sputtered, so that the substrate for the substrate holder is sputtered. The attachment / detachment mechanism is simple, and the attachment / detachment time of the substrate is short, and the exposed parts of the substrate are formed on the inner and outer circumferences of the substrate. Also can be used as simple construction as a mask member, the manufacturing efficiency of the magneto-optical disk makes it possible to Silurian properly improved.

[Brief description of drawings]

FIG. 1 is a longitudinal sectional view showing a schematic configuration of a magneto-optical disk manufacturing apparatus used in a method of manufacturing a magneto-optical recording medium of the present invention.

FIG. 2 is a vertical cross-sectional view showing a schematic configuration of a magneto-optical disk manufacturing apparatus used in the method of manufacturing the magneto-optical recording medium of the present invention.

FIG. 3 is a vertical cross-sectional view showing a schematic configuration of a magneto-optical disk manufacturing apparatus used in the method of manufacturing the magneto-optical recording medium of the present invention.

FIG. 4 is a vertical cross-sectional view showing a schematic configuration of a magneto-optical disk manufacturing apparatus for explaining a conventional manufacturing method of a magneto-optical recording medium.

FIG. 5 is a vertical sectional view showing a schematic configuration of a magneto-optical disk manufacturing apparatus for explaining a conventional manufacturing method of a magneto-optical recording medium.

[Explanation of symbols]

1 ... Substrate, 2 ... Support plate (pallet), 3, 15a, 15
b ... Cathode, 4, 4a, 4b ... Target, 6, 19
… Bottom plate of the fuselage, 7,20… Top plate of the fuselage, 8 to 11,
1, 22 ... Movable partition wall, 12 ... Preparation chamber (stocker chamber), 13, 23 ... Sputtering chamber, 14 ... Extraction chamber, 24 ... Machine plate, 25 ... Motor, 26 ... Motor rotation shaft, 27 ... Rotary joint, 28 ... Connection of water supply pipe, 29 ... Connection of drainage pipe, 30, 31 ... Gear, 32 ...
Insulator rotating shaft, 33 ... Rotating feedthrough, 34 ...
Top plate of vacuum envelope, 35, 36 ... Power supply terminal, 37,
38 ... Slip ring, 39, 40 ... Slider, 57 ... Outer peripheral mask body, 58 ... Inner peripheral mask body, 62 ... Box body, 6
4 ... Bottom plate of substrate holder C, 65 ... Bellows, 66 ... Operating rod of plunger 63, 67 ... Substrate mounting portion of substrate holder C, 68 ... Airtight holding member that can be opened and closed, 71 ... Argon gas supply port, 72 … Argon gas outlets, 74, 75
... Water supply channel provided in the rotary shaft 32, 76 ... Drainage channel in the rotary shaft 32, 77-80 ... Tubes, 81, 82 ... Cathode, 83, 84 ... Target, 88 ... Bottom plate of sputtering chamber A, 89 ... Turntable made of insulator, 92 ... Support for substrate mounting portion, A ... Sputtering chamber, B ... Pre-evacuation chamber, C ... Substrate holder, D ... Cathode assembly,

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[Procedure amendment]

[Submission date] July 15, 1993

[Procedure Amendment 1]

[Document name to be amended] Statement

[Correction target item name] 0010

[Correction method] Change

[Correction content]

By the way, when the sputtering method is applied at the time of film formation required for manufacturing an optical disk, in order to increase the production efficiency, film formation processing by sputtering is performed at high speed on each substrate. The so-called single-wafer optical disc manufacturing method
For example, it is practically used when forming an aluminum reflective film on a compact disc. The single-wafer film formation described above does not cause any problems when the film-forming substance is a single metal as in the case of the aluminum reflective film in the compact disc described above, but the film to be formed on the substrate. However, in the case of a magneto-optical disk in which an amorphous alloy film of TbFeCo or other heavy rare earth metal and a transition metal is required, if the composition of the alloy used for the target is not appropriate, the predetermined characteristics will be obtained. A magneto-optical disk having the same cannot be manufactured, and a magnetic film having a predetermined composition cannot be formed on the substrate unless the target is changed to a target having a predetermined alloy composition. The same drawbacks as described above will occur. Also,
In the case of a magneto-optical disk using an artificial lattice film such as PtCo, it is extremely difficult to stack because of a single target.

[Procedure Amendment 2]

[Document name to be amended] Statement

[Correction target item name] 0018

[Correction method] Change

[Correction content]

Reference numeral 87 denotes a member which is connected to the top plate 34 of the vacuum envelope and the bottom plate 88 of the sputtering chamber A, and which constitutes the sputtering chamber A together with the top plate 34 and the bottom plate 88, 71 Is an argon gas supply port, 72
Is an outlet for argon gas. An outer peripheral portion mask body 57 for masking a predetermined portion of the outer peripheral portion of the substrate is fixed to the outer peripheral portion of the opening portion 90 provided in the bottom plate 88 of the sputtering chamber A. An inner peripheral mask body 58 for masking the central hole 1a of the substrate 1 and a predetermined portion around the central hole 90 is provided in the central portion of the substrate 90.
The illustration of the supporting body is omitted. Reference numeral 59 is a plunger fixed to the bottom plate 88 of the sputtering chamber A, and a wall plate 61 forming a part of the movable part of the preliminary exhaust chamber B is fixed to the tip of the operating rod 60 of the plunger 59. The wall plate 61 is provided with a hole 91. Further, one end of a box body 62 is fixed to the wall plate 61.

[Procedure 3]

[Document name to be amended] Statement

[Correction target item name] 0019

[Correction method] Change

[Correction content]

A plunger 63 is fixed to the other end 62a of the box 62. Reference numeral 66 is an operating rod of the plunger 63 described above, and this operating rod 66 is the box body 6 described above.
The bottom plate 64 of the substrate holder C is fixedly attached to the tip of the protrusion. A support 92 for the substrate mounting portion is planted in the center of the bottom plate 64 of the substrate holder C, and the support 92 for the substrate mounting portion is attached to the wall plate 61 of the preliminary exhaust chamber B. Hole 9 that has been drilled
The substrate mounting portion 67 of the substrate holder C described above is provided at the front end portion of the support body 92 of the substrate mounting portion, which penetrates through 1. Further, each one end of a bellows 65 is fixed to the bottom plate 64 of the substrate holder C and the wall plate 61 of the preliminary exhaust chamber B.

[Procedure amendment 4]

[Document name to be amended] Statement

[Correction target item name] 0020

[Correction method] Change

[Correction content]

Reference numeral 70 denotes a bottom member of the vacuum envelope which is connected and fixed to the bottom plate 88 of the sputtering chamber A and constitutes a part of the vacuum envelope. The airtight holding member 6 which can be opened and closed is already provided on each member 70.
A moving passage portion 93 in which 8 can move according to the movement of the operating rod 69, a space portion 94 for communicating the above-described sputtering chamber A and the preliminary exhaust chamber B, and a space portion 95 forming a part of the preliminary exhaust chamber B. It is provided with an exhaust port 73 and the like used when the preliminary exhaust chamber B is evacuated.
The operating rod 69 for moving the airtight holding member 68 which can be freely opened and closed is performed by the operation of a plunger (not shown), and the exhaust operation from the preliminary exhaust chamber B is performed by the auxiliary exhaust chamber B and the exhaust. This is done through the moving passage portion 93 existing between the mouth 73 and the mouth.

Claims (2)

[Claims] 1. A step of constantly rotating a rotary support, to which a plurality of sputtering cathodes, each of which has a target made of a predetermined material, fixed in a predetermined arrangement, in a sputtering chamber of a vacuum envelope. And a preliminary exhaust chamber provided adjacent to the sputtering chamber through an airtight holding member that can be opened and closed, in a state where the sputtering chamber and the preliminary exhaust chamber are blocked by the airtight holding member. Opening the chamber to the outside air to expose the substrate mounting portion of the substrate holder to the outside air; mounting the substrate to the substrate mounting portion of the substrate holder described above in the outside air; The step of evacuating the pre-evacuation chamber so that the mounted substrate is housed in the pre-evacuation chamber to a predetermined degree of vacuum, and the airtight holding member is moved to move the space. After the puttingter chamber and the preliminary exhaust chamber are communicated with each other, the step of displacing the substrate holder to hold the substrate stationary at a predetermined position in the sputtering chamber, and the magnitude of the power supplied to each of the sputtering cathodes described above. The step of performing sputtering on the substrate by independently controlling the supply time length for each individual sputtering cathode, and after moving the substrate holder to the outside of the sputtering chamber, the airtight holding member separates the sputtering chamber and the preliminary exhaust chamber. A method of manufacturing a magneto-optical recording medium, which comprises a step of making a shut-off state and a step of opening a preliminary exhaust chamber to the outside air and removing the substrate mounted on the substrate holder. 2. A means for driving and rotating a rotary support, in which a plurality of sputtering cathodes, each having a target of a predetermined material mounted thereon, are fixed in a predetermined arrangement, in a sputtering chamber in a vacuum envelope, The means for independently controlling the magnitude of the power supplied to each sputtering cathode and the supply time length for each individual sputtering cathode and the position of the substrate mounted on the substrate holder on which the substrate can be detachably mounted are described above. With respect to the first position set in the above-mentioned sputtering chamber so as to have a predetermined distance with respect to the surface of the target attached to the sputtering cathode, and the above-mentioned sputtering chamber,
A second position set in a preliminary exhaust chamber formed by separating an openable / closable airtight holding member, and a spare state in which the sputtering chamber and the preliminary exhaust chamber are shut off by the openable / closable airtight holding member. Means for selectively moving the exhaust chamber to three positions, that is, a third position in the outside air when the exhaust chamber is opened to the outside air, and the substrate mounted on the substrate holder at the above-mentioned third position. And a substrate attaching / detaching means for removing the substrate from the substrate holder to attach a new substrate to the substrate holder, and the substrate attached to the substrate holder is in the second position described above. A means for evacuating the preliminary exhaust chamber, and when the preliminary exhaust chamber reaches a predetermined vacuum degree, the airtight holding member between the sputtering chamber and the preliminary exhaust chamber is removed to remove the substrate mounted on the substrate holder. Means for moving to the above-mentioned first position , Fabrication apparatus of a magneto-optical recording medium comprising a means for sputtering the substrate being a quiescent first position described above.