JPH0648508A - Gas purging method of sealed container - Google Patents
Gas purging method of sealed containerInfo
- Publication number
- JPH0648508A JPH0648508A JP20266092A JP20266092A JPH0648508A JP H0648508 A JPH0648508 A JP H0648508A JP 20266092 A JP20266092 A JP 20266092A JP 20266092 A JP20266092 A JP 20266092A JP H0648508 A JPH0648508 A JP H0648508A
- Authority
- JP
- Japan
- Prior art keywords
- container
- gas
- closed container
- closed
- box
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Vacuum Packaging (AREA)
- Warehouses Or Storage Devices (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、クリーンルームに用い
られる可搬式密閉コンテナ等のガスパージ方法に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas purging method for a portable closed container used in a clean room.
【０００２】[0002]
【従来の技術】例えば、半導体の製造は、内部雰囲気を
清浄化したクリーンルーム内において行なわれるが、ク
リーンルーム内での搬送や保管は、半導体ウエハへの塵
埃の付着を防ぐために当該半導体ウエハや液晶基板等を
収納したウエハカセットを可搬式の密閉コンテナに収納
して行なう。2. Description of the Related Art For example, a semiconductor is manufactured in a clean room in which the internal atmosphere is cleaned, and the semiconductor wafer and the liquid crystal substrate are transported and stored in the clean room in order to prevent dust from adhering to the semiconductor wafer. The wafer cassette containing the above items is stored in a portable, sealed container.
【０００３】更に、近年、半導体ウエハの自然酸化によ
る酸化膜の成長を防止するために、上記密閉コンテナの
内部雰囲気を窒素Ｎ2 ガスや乾燥空気等のウエハにとっ
て不活性なガスで置換するようにしている。Further, in recent years, in order to prevent the growth of an oxide film due to natural oxidation of a semiconductor wafer, the inside atmosphere of the closed container is replaced with a gas such as nitrogen N 2 gas or dry air which is inert to the wafer. ing.
【０００４】このＮ2 ガスパージ機能を備えた密閉コン
テナの１例を図６に示す。同図において、１０は可搬式
の密閉コンテナ（ＰＯＤ）１の本体、１１は本体１０の
開口部１２に設けられたフランジ、１３、１３Ａはシー
ル材、１４は把手、２０は密閉コンテナの蓋、３０は半
導体ウエハＷを収納したウエハカセットである。４０は
半導体の表面処理装置の密閉型のケースであって、図示
しない表面処理用の反応炉や昇降装置を含む搬送機構等
を収納している。４２はウエハカセット出し入れ用の開
口であって、ケース４０の上壁４１の一部に設けられて
いる。この上壁４１には、一端が開口４２の周面に開口
し、他端が不活性ガスボンベ（この例ではＮ2 ガスボン
ベ）５０に接続される給ガス管４４Ａが設けられるとと
もに、一端が開口４２の周面に開口し、他端がボツクス
外に開口する排ガス管４４Ｂが設けられている。４５Ａ
は給気弁、４５Ｂは排気弁である。４６は上記昇降装置
１００の昇降台であって、開口４２内に、当該開口４２
の周面との間に隙間Ｇを残して嵌入可能な大きさを有し
ている。４０Ａは密閉コンテナ１のフランジ１１を押さ
えるロック機構である。なお、密閉型のケース４０内
は、窒素Ｎ2 ガス雰囲気であり、わずかに大気圧以上に
予圧されている。FIG. 6 shows an example of the closed container having the N 2 gas purging function. In the figure, 10 is a main body of a portable closed container (POD) 1, 11 is a flange provided in an opening 12 of the main body 10, 13 and 13A are sealing materials, 14 is a handle, 20 is a lid of the closed container, A wafer cassette 30 stores the semiconductor wafer W. Reference numeral 40 denotes a hermetically-sealed case of a semiconductor surface treatment apparatus, which accommodates a reaction mechanism (not shown) for surface treatment, a transfer mechanism including an elevating device, and the like. 42 is an opening for loading / unloading the wafer cassette, and is provided in a part of the upper wall 41 of the case 40. The upper wall 41 is provided with a gas supply pipe 44A having one end opened to the peripheral surface of the opening 42 and the other end connected to an inert gas cylinder (N 2 gas cylinder in this example) 50, and one end is opened 42. An exhaust gas pipe 44B having an opening on the peripheral surface of the exhaust gas and an opening on the other end outside the box is provided. 45A
Is an air supply valve, and 45B is an exhaust valve. Reference numeral 46 denotes an elevating table of the elevating device 100, which is provided in the opening 42.
It has a size such that it can be fitted in with a gap G left between it and the peripheral surface. 40A is a lock mechanism for pressing the flange 11 of the closed container 1. The inside of the hermetically sealed case 40 is in a nitrogen N 2 gas atmosphere and is slightly pre-pressurized to atmospheric pressure or higher.
【０００５】上記密閉コンテナの蓋２０は中空体であっ
て、例えば図７に示すような錠機構を有している。２４
はカムで、２５は板状のロックアームであって、転動子
２５ａを有し、長手方向進退可能かつ傾倒可能に片持ち
支持されている。２６は支点部材、２７はばねである。
カム軸２８は昇降台４６の上壁中央から蓋２０内に伸
び、昇降台４６上に蓋２０が同心に載置された時にカム
４４とスプライン係合する。昇降台４６はカム軸２８を
所定角度だけ回動するカム軸駆動機構２９を内蔵してお
り、このカム軸駆動機構２９とカム軸２８は解錠／施錠
機構を構成している。なお、本体１０の開口部１２の内
周面には、ロックアーム２５が係合する凹所１２Ａが形
成されている。The lid 20 of the closed container is a hollow body and has a locking mechanism as shown in FIG. 7, for example. 24
Is a cam, and 25 is a plate-shaped lock arm, which has a rolling element 25a and is supported by a cantilever so as to be capable of advancing and retracting in the longitudinal direction and tilting. 26 is a fulcrum member, and 27 is a spring.
The cam shaft 28 extends from the center of the upper wall of the lifting table 46 into the lid 20, and spline-engages with the cam 44 when the lid 20 is concentrically placed on the lifting table 46. The lift table 46 incorporates a cam shaft drive mechanism 29 for rotating the cam shaft 28 by a predetermined angle, and the cam shaft drive mechanism 29 and the cam shaft 28 constitute an unlocking / locking mechanism. A recess 12A with which the lock arm 25 is engaged is formed on the inner peripheral surface of the opening 12 of the main body 10.
【０００６】[0006]
【発明が解決しようとする課題】このように、近年で
は、窒素Ｎ2 ガスを充満した密閉コンテナに上記ウエハ
カセットを入れて搬送・保管するようにしているが、密
閉コンテナ内を窒素Ｎ2 ガス等の不活性ガスで置換する
だけでは、当該密閉コンテナの内表面や、ウエハカセッ
ト、このウエハカセットに収納したカセットの表面に付
着したＨ2 ＯやＯ2（以下、吸着・吸蔵気体や液体）を
充分に除去することができないので、時間の経過ととも
にこれらが密閉コンテナ内へ出てきて、密閉コンテナ内
のＨ2 ＯやＯ2 の濃度が上昇し、ウエハに自然酸化によ
る酸化膜の形成が生じ、歩留りが低下する。As described above, in recent years, the wafer cassette is transferred and stored in a closed container filled with nitrogen N 2 gas. However, the inside of the closed container is filled with nitrogen N 2 gas. H 2 O or O 2 (hereinafter, adsorbed / occluded gas or liquid) attached to the inner surface of the closed container, the wafer cassette, or the surface of the cassette housed in the wafer cassette is simply replaced by an inert gas such as Since they cannot be removed sufficiently, they come out into the closed container with the lapse of time, the concentration of H 2 O and O 2 in the closed container rises, and an oxide film is formed on the wafer by natural oxidation. Occurs and the yield is reduced.
【０００７】これを防ぐために本発明者等は、可搬式密
閉コンテナ内を真空引きしたのちに不活性ガスでガスパ
ージする方法を提案した。In order to prevent this, the present inventors have proposed a method of evacuating the inside of a portable closed container and then purging it with an inert gas.
【０００８】すなわち、図４に示すように、配管６８、
６９を通してそれぞれ真空源９０と不活性ガス源５０に
連絡された密閉ボックス６０の上壁６０Ｕ上に密閉コン
テナ１を載置し、底蓋２０を解錠したのち昇降台４６を
例えば鎖線で示す位置まで下げて（底蓋２０も鎖線で示
す位置まで下がる）、密閉コンテナ１内を密閉ボックス
６０内と連通させ、真空引きしたのちに不活性ガスでガ
スパージする。９１、９２は開閉弁である。図４では、
前記ロック機構４０Ａの図示は省いてある。That is, as shown in FIG.
The closed container 1 is placed on the upper wall 60U of the closed box 60, which is connected to the vacuum source 90 and the inert gas source 50 through 69, and the bottom lid 20 is unlocked, and then the elevating table 46 is placed at a position indicated by a chain line, for example. (The bottom lid 20 is also lowered to the position shown by the chain line), the inside of the closed container 1 is communicated with the inside of the closed box 60, and after evacuating, the gas is purged with an inert gas. Reference numerals 91 and 92 are open / close valves. In Figure 4,
The lock mechanism 40A is not shown.
【０００９】この方法では、コンテナ１の内部を、一
旦、真空にするので、コンテナ１や底蓋２０の内表面部
に付着している水分や酸素、コンテナ１内の図示されて
いないウエハやウエハカセットの表面部に付着している
水分や酸素がこれら内表面部や表面部からに蒸発して内
表面や表面から離脱し、外部へ排気され、その後、コン
テナ１はＮ2 ガスで置換されることになる。In this method, the inside of the container 1 is once evacuated, so that moisture and oxygen adhering to the inner surface portions of the container 1 and the bottom lid 20 and unillustrated wafers and wafers in the container 1 Moisture and oxygen adhering to the surface portion of the cassette are evaporated from the inner surface portion and the surface portion to be separated from the inner surface and the surface portion and exhausted to the outside, and then the container 1 is replaced with N 2 gas. It will be.
【００１０】図５の（ａ）は上記真空引き後にガスパー
ジを行なった後の密閉容器内のＨ2Ｏ濃度の変化を示
し、（ｂ）は前記従来のガスパージを行なった後の密閉
容器内のＨ2 Ｏ濃度の変化を示す。また、同図の（ｃ）
は上記真空引き後にガスパージを行なった後の密閉容器
内のＯ2 濃度の変化を示し、同図の（ｄ）は前記従来法
によりＯ2 濃度を０ｐｐｍまで下げたのちのＯ2 濃度の
変化を示している。なお、この実験に用いた密閉容器の
容積は５４０リットルで、当該密閉容器内には２５枚入
りのウエハカセットを４箇収納して実験した。FIG. 5A shows a change in the H 2 O concentration in the closed container after performing the gas purging after the evacuation, and FIG. 5B shows in the closed container after the conventional gas purging. The change in H 2 O concentration is shown. In addition, (c) of the figure
The represents the change in O 2 concentration in the sealed container after performing the purge after the evacuation, in FIG (d) shows the change in O 2 concentration after down to 0ppm the O 2 concentration by the conventional method Shows. The volume of the closed container used in this experiment was 540 liters, and four wafer cassettes each containing 25 wafers were stored in the closed container for the experiment.
【００１１】この実験結果から明らかなように、真空引
きしたのち不活性ガスパージを行なった場合には、容器
内表面や、ウエハ、ウエハカセットから出てくるＨ2 Ｏ
やＯ2 の量が従来の場合に比して、著しく低減するか
ら、長期に亘ってコンテナに収納したままでも、自然酸
化膜の成長を抑制することができる。As is clear from the results of this experiment, when the vacuum is evacuated and then the inert gas is purged, H 2 O coming out from the inner surface of the container, the wafer, and the wafer cassette is discharged.
Since the amount of or O 2 is remarkably reduced as compared with the conventional case, the growth of the natural oxide film can be suppressed even if it is stored in the container for a long period of time.
【００１２】コンテナ内部を真空引きする図４の場合、
コンテナ１の内部と外部との間に圧力差が生じるため、
コンテナ１の本体１０はその圧力差に耐える必要があっ
た。そこで、コンテナを肉厚にして負圧耐力を増加させ
るか、負圧に耐える特殊構造にする必要があるが、これ
らはコストの上昇を招くと同時に重量が増加し持ち運び
し難いという問題がある。In the case of FIG. 4 in which the inside of the container is evacuated,
Due to the pressure difference between the inside and the outside of the container 1,
The body 10 of the container 1 had to withstand the pressure difference. Therefore, it is necessary to increase the negative pressure resistance by increasing the thickness of the container, or to provide a special structure capable of withstanding the negative pressure. However, these increase the cost, and at the same time, increase the weight and make it difficult to carry.
【００１３】本発明はこの問題を解消するためになされ
たもので、真空引きしたのちに不活性ガスでガスパージ
する場合に、上記圧力差を問題にする必要のない密閉コ
ンテナのガスパージ方法を提供することを目的とする。The present invention has been made in order to solve this problem, and provides a gas purging method for a hermetically sealed container which does not require the pressure difference to be a problem when the gas is purged with an inert gas after evacuation. The purpose is to
【００１４】[0014]
【課題を解決するための手段】本発明は上記目的を達成
するため、請求項１では、密閉コンテナ内を真空引きし
たのちコンテナ収納物にとって不活性ガスでガスパージ
する場合において、配管を通して真空源と不活性ガス源
に連絡される密閉ボックス内を壁で本体部と当該本体部
とは連通孔を通して連通するコンテナ収納部とに区画
し、上記壁上に上記密閉コンテナを載置し、密閉コンテ
ナの底蓋を上記密閉ボックス内へ開くことにより当該密
閉コンテナ内を前記密閉ボックスの本体内に連通して真
空引きおよび不活性ガスによるガスパージを行なう構成
とした。In order to achieve the above object, the present invention provides a vacuum source through a pipe in claim 1 when a vacuum is applied to the sealed container and then the container is to be purged with an inert gas. The inside of the closed box connected to the inert gas source is partitioned by a wall into a main body and a container storage part communicating with the main body through a communication hole, and the closed container is placed on the wall, By opening the bottom lid into the closed box, the closed container is communicated with the main body of the closed box to perform vacuuming and gas purging with an inert gas.
【００１５】請求項２では、本体部は箱体であり、コン
テナ収納部はこの箱体上にかぶせられた半球形状のカバ
ー体で当該箱体上に区画される構成とした。According to a second aspect of the present invention, the main body portion is a box body, and the container accommodating portion is partitioned by the hemispherical cover body that is covered on the box body.
【００１６】請求項３では、連通孔にはフィルタが設け
られている構成とした。In claim 3, a filter is provided in the communication hole.
【００１７】請求項４では、連通孔は、孔開閉機構が設
けられ、この孔開閉機構は、真空引きに際して連通孔を
開く構成とした。In the fourth aspect, the communication hole is provided with a hole opening / closing mechanism, and the hole opening / closing mechanism is configured to open the communication hole when vacuuming.
【００１８】[0018]
【作用】本発明では、密閉ボックスの本体部内とコンテ
ナ収納部であるパージ室内およびコンテナ内が全て同圧
になるので、コンテナに前記した内外圧力差が作用しな
い。In the present invention, since the pressure inside the main body of the closed box is the same as the pressure inside the purge chamber and the inside of the container, which are the container accommodating portions, the above-mentioned pressure difference between the inside and outside does not act on the container.
【００１９】[0019]
【実施例】以下、本発明の１実施例を図面を参照して説
明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.
【００２０】図１において、密閉ボックス８０は仕切り
壁８０Ａで本体部Ａとコンテナ収納部であるパージ室Ｂ
とに区画されている。８３は密閉ボックス８０の蓋であ
って、図示しないヒンジ機構で開閉可能に取り付けられ
ている。本体部Ａと収納部Ｂとは仕切り壁８０Ａに形成
した通孔（連通孔）８１を通して連通し、この通孔８１
の下端開口はフィルタ８２で覆われている。仕切り壁８
０Ａはコンテナ１が載置される台座として利用され、こ
の仕切り壁８０Ａに開口８２が形成されている。昇降台
４６は、開口８５内に、当該開口８５の周面との間に隙
間Ｇを残して嵌入可能な大きさを有している。他の構成
は図４のものと同じであるので、同一符号を付してあ
る。In FIG. 1, a closed box 80 is a partition wall 80A, which is a main body portion A and a purge chamber B which is a container storage portion.
It is divided into and. Reference numeral 83 denotes a lid of the closed box 80, which is attached to be openable / closable by a hinge mechanism (not shown). The main body portion A and the storage portion B communicate with each other through a through hole (communication hole) 81 formed in the partition wall 80A.
The lower end opening of the is covered with a filter 82. Partition wall 8
0A is used as a pedestal on which the container 1 is placed, and an opening 82 is formed in this partition wall 80A. The elevating table 46 has a size that can be fitted into the opening 85 with a gap G left between the opening 85 and the peripheral surface of the opening 85. The other structure is the same as that of FIG. 4, and thus the same reference numerals are given.
【００２１】本実施例では、密閉ボックス８０の本体部
Ａ内とコンテナ収納部であるパージ室Ｂ内とが通孔８１
を通して連通するので、本体部Ａ、パージ室Ｂおよびコ
ンテナ１内が全て同圧になる。従って、コンテナ１に前
記した内外圧力差が作用せず、コンテナ１を肉厚にした
り特殊構造にしたりする必要がない。In this embodiment, a through hole 81 is provided between the inside of the main body A of the closed box 80 and the inside of the purge chamber B which is the container storage portion.
Since the fluid is communicated with each other, the pressure inside the main body portion A, the purge chamber B, and the inside of the container 1 are all the same. Therefore, the above-mentioned pressure difference between the inside and the outside does not act on the container 1, and it is not necessary to make the container 1 thick or have a special structure.
【００２２】また、フィルタ８２がない場合には、コン
テナ１の外周面に塵埃等が付着していた場合、この塵埃
は通孔８１を通って本体部Ａに入り、コンテナ１の本体
１０内に侵入してウエハＷを汚染する恐れがあるが、本
実施例では、通孔８１をフィルタ８２で塞いでいるの
で、この恐れはない。If there is no filter 82, and dust or the like adheres to the outer peripheral surface of the container 1, this dust enters the main body portion A through the through hole 81 and enters the main body 10 of the container 1. There is a possibility that it may enter and contaminate the wafer W, but in the present embodiment, this is not a concern because the through hole 81 is blocked by the filter 82.
【００２３】また、本実施例では、真空排気用の配管６
８の一端、給ガス用の配管６９の一端ともに密閉ボック
ス８０の本体部Ａに開口しているが、パージ室Ｂに開口
させてもよく、また、例えば、真空排気用の配管６８の
一端はパージ室Ｂに開口させ、給ガス用の配管６９の一
端は本体部Ａに開口させてもよい。Further, in this embodiment, the pipe 6 for evacuation is used.
8 and one end of the gas supply pipe 69 are both open to the main body portion A of the closed box 80, but may be opened to the purge chamber B. For example, one end of the vacuum exhaust pipe 68 is The purge chamber B may be opened, and one end of the gas supply pipe 69 may be opened to the main body portion A.
【００２４】図２は、本発明の他の実施例を示したもの
で、コンテナ収納部であるパージ室Ｂを半球形状のカバ
ー体８４で区画し、半球形状にすることにより、薄肉で
強度を持たせ、簡便にパージ室Ｂを形成し得るようにし
たものである。即ち、本体部は箱体からなり、コンテナ
収納部はこの箱体上にかぶせられた半球形状のカバー体
で当該箱体上に区画されている。FIG. 2 shows another embodiment of the present invention, in which the purging chamber B, which is a container storage portion, is partitioned by a hemispherical cover body 84 and is formed into a hemispherical shape, so that it is thin and strong. This is provided so that the purge chamber B can be easily formed. That is, the main body portion is formed of a box body, and the container storage portion is partitioned on the box body by a hemispherical cover body that is placed on the box body.
【００２５】密閉ボックス８０の本体部Ａとコンテナ収
納部であるパージ室Ｂとは、真空引きを行なう場合に、
互いに連通すればよいので、図３に示すように、孔開閉
機構、例えば、電磁弁８１Ａを有する管８１Ｂを通孔８
１に通し、真空引きを行なっている間だけ、電磁弁８１
Ａを開弁して本体部Ａとパージ室Ｂとが連通するように
してもよい。真空引き後は、コンテナ収納部であるパー
ジ室Ｂは蓋を開けるために常圧に戻すことは勿論であ
る。The main body portion A of the closed box 80 and the purge chamber B which is the container storage portion are
Since it suffices to communicate with each other, as shown in FIG. 3, a hole opening / closing mechanism, for example, a pipe 81B having an electromagnetic valve 81A
1 through the solenoid valve 81 only while vacuuming
The valve A may be opened so that the main body A and the purge chamber B communicate with each other. After the evacuation, it goes without saying that the purge chamber B, which is the container storage unit, is returned to normal pressure in order to open the lid.
【００２６】[0026]
【発明の効果】本発明は以上説明した通り、コンテナの
内外圧力差が無い状態で、真空引きおよびガス置換が行
なわれるから、コンテナとしては従来のままのコンテナ
を使用することができる利点がある。As described above, the present invention has an advantage that the conventional container can be used as the container because the evacuation and the gas replacement are performed in the state where there is no pressure difference between the inside and the outside of the container. .
【図１】本発明の実施例を示す概略縦断面図である。FIG. 1 is a schematic vertical sectional view showing an embodiment of the present invention.
【図２】本発明の他の実施例を示す概略縦断面図であ
る。FIG. 2 is a schematic vertical sectional view showing another embodiment of the present invention.
【図３】上記実施例における通孔の他の例を説明するた
めの部分図である。FIG. 3 is a partial view for explaining another example of the through hole in the above embodiment.
【図４】真空引きしたのちガスパージする方法を説明す
るための概略縦断面図である。FIG. 4 is a schematic vertical sectional view for explaining a method of performing gas purging after evacuation.
【図５】上記図３と図４の方法によるパージ後の容器内
のＨ2 ＯやＯ2 濃度の時間経過と、従来のガスパージ後
の容器内のＨ2 ＯやＯ2 濃度の時間経過とを対比して示
した線図である。5 is a graph showing the time course of the H 2 O and O 2 concentrations in the container after purging according to the methods shown in FIGS. 3 and 4, and the time course of the H 2 O and O 2 concentrations in the container after the conventional gas purging. It is the diagram which compared and was shown.
【図６】従来の可搬式密閉コンテナを示す図でる。FIG. 6 is a view showing a conventional portable closed container.
【図７】上記可搬式密閉コンテナの解錠／施錠機構を示
す図である。FIG. 7 is a view showing an unlocking / locking mechanism of the portable closed container.
１ 密閉コンテナ １０ 密閉コンテナの本体 ２０ 密閉コンテナの底蓋 ３０ ウエハカセット ４６ 昇降台 ５０ 不活性ガスボンベ ８０ 密閉ボックス ８０Ａ 仕切り壁 ８１ 通孔 ８２ フィルタ ８３ 蓋 ８４ カバー体 ８５ 開口 ９０ 真空源 ９１、９２ 開閉弁 １００ 昇降装置 Ｗ ウエハ 1 Closed Container 10 Main Body of Closed Container 20 Bottom Lid of Closed Container 30 Wafer Cassette 46 Lifting Table 50 Inert Gas Cylinder 80 Closed Box 80A Partition Wall 81 Through Hole 82 Filter 83 Lid 84 Cover Body 85 Opening 90 Vacuum Source 91, 92 Open / close Valve 100 Lifting device W wafer
───────────────────────────────────────────────────── フロントページの続き (72)発明者 森田 日也 三重県伊勢市竹ケ鼻町100番地 神鋼電機 株式会社伊勢製作所内 (72)発明者 河野 等 三重県伊勢市竹ケ鼻町100番地 神鋼電機 株式会社伊勢製作所内 (72)発明者 林 満弘 三重県伊勢市竹ケ鼻町100番地 神鋼電機 株式会社伊勢製作所内 (72)発明者 奥野 敦 三重県伊勢市竹ケ鼻町100番地 神鋼電機 株式会社伊勢製作所内 (72)発明者 中村 昭生 三重県伊勢市竹ケ鼻町100番地 神鋼電機 株式会社伊勢製作所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hiya Morita 100 Takegahana-cho, Ise-shi, Mie Shinko Electric Co., Ltd.Ise Works (72) Inventor Kono, 100 Takegahana-cho, Ise-shi, Mie Shinko Electric Co., Ltd. Ise In-house (72) Inventor Mitsuhiro Hayashi 100, Takegahana-cho, Ise-shi, Mie Shinko Electric Co., Ltd.In Ise Works (72) Inventor Atsushi Okuno 100, Takegahana-cho, Ise-shi, Mie Shinko Electric Co., Ltd. (72) Invention Akio Nakamura 100, Takegahana-cho, Ise City, Mie Prefecture Shinko Electric Co., Ltd.
Claims (4)
搬式密閉コンテナ内を真空引きしたのちコンテナ収納物
にとって不活性なガスでガスパージする場合において、 配管を通して真空源と不活性ガス源に連絡される密閉ボ
ックス内を壁で本体部と当該本体部とは連通孔を通して
連通するコンテナ収納部とに区画し、上記壁上に上記密
閉コンテナを載置し、密閉コンテナの底蓋を上記密閉ボ
ックス内へ開くことにより当該密閉コンテナ内を前記密
閉ボックスの本体内に連通して真空引きおよび不活性ガ
スによるガスパージを行なうことを特徴とする密閉コン
テナのガスパージ方法。1. A vacuum source and an inert gas source are connected through a pipe in the case of evacuating the inside of a portable closed container for storing and transporting substrates of electronic equipment and then purging with a gas inert to the container contents. The inside of the sealed box to be communicated is partitioned by a wall into a main body part and a container storage part that communicates with the main body part through a communication hole, and the closed container is placed on the wall, and the bottom lid of the closed container is sealed. A gas purging method for a closed container, which comprises opening the inside of the box so that the inside of the closed container communicates with the inside of the main body of the closed box to perform vacuuming and gas purging with an inert gas.
この箱体上にかぶせられた半球形状のカバー体で当該箱
体上に区画されていることを特徴とする請求項１記載の
密閉コンテナのガスパージ方法。2. The container according to claim 1, wherein the main body is a box body, and the container storage portion is partitioned by a hemispherical cover body over the box body. Gas purging method for closed containers.
とを特徴とする請求項１または２記載の密閉コンテナの
ガスパージ方法。3. The gas purging method for a closed container according to claim 1, wherein a filter is provided in the communication hole.
孔開閉機構は、真空引きに際して連通孔を開くことを特
徴とする請求項１または２または３記載の密閉コンテナ
のガスパージ方法。4. The method of purging gas in a closed container according to claim 1, wherein the communication hole is provided with a hole opening / closing mechanism, and the hole opening / closing mechanism opens the communication hole when vacuuming.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20266092A JP3252456B2 (en) | 1992-07-29 | 1992-07-29 | Method and apparatus for purging gas in closed container |
| KR1019930014385A KR100304127B1 (en) | 1992-07-29 | 1993-07-28 | Electronic-substrate treatment system using portable sealed container and apparatus thereof |
| US08/329,904 US5621982A (en) | 1992-07-29 | 1994-10-27 | Electronic substrate processing system using portable closed containers and its equipments |
| US08/803,818 US5746008A (en) | 1992-07-29 | 1997-02-24 | Electronic substrate processing system using portable closed containers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20266092A JP3252456B2 (en) | 1992-07-29 | 1992-07-29 | Method and apparatus for purging gas in closed container |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0648508A true JPH0648508A (en) | 1994-02-22 |
| JP3252456B2 JP3252456B2 (en) | 2002-02-04 |
Family
ID=16461037
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20266092A Expired - Fee Related JP3252456B2 (en) | 1992-07-29 | 1992-07-29 | Method and apparatus for purging gas in closed container |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3252456B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5730573A (en) * | 1994-02-22 | 1998-03-24 | Tdk Corporation | Clean transfer method and apparatus therefor |
| US6261044B1 (en) * | 1998-08-06 | 2001-07-17 | Asyst Technologies, Inc. | Pod to port door retention and evacuation system |
| JP2003168727A (en) * | 2001-11-30 | 2003-06-13 | Dainichi Shoji Kk | Exchanger and gas replacing method |
| JP2006202654A (en) * | 2005-01-21 | 2006-08-03 | Horon:Kk | Stage |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106092711B (en) * | 2016-06-02 | 2019-08-06 | 中国工程物理研究院材料研究所 | A kind of save set and store method of high active substance |
| JP6817757B2 (en) * | 2016-09-16 | 2021-01-20 | 東京エレクトロン株式会社 | Substrate processing equipment and substrate transfer method |
| CN107235178B (en) * | 2017-05-17 | 2020-12-29 | 李天俊 | Electronic element package protection method |
-
1992
- 1992-07-29 JP JP20266092A patent/JP3252456B2/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5730573A (en) * | 1994-02-22 | 1998-03-24 | Tdk Corporation | Clean transfer method and apparatus therefor |
| US6062808A (en) * | 1994-02-22 | 2000-05-16 | Tdk Corporation | Clean transfer method and apparatus therefor |
| US6261044B1 (en) * | 1998-08-06 | 2001-07-17 | Asyst Technologies, Inc. | Pod to port door retention and evacuation system |
| JP2003168727A (en) * | 2001-11-30 | 2003-06-13 | Dainichi Shoji Kk | Exchanger and gas replacing method |
| JP2006202654A (en) * | 2005-01-21 | 2006-08-03 | Horon:Kk | Stage |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3252456B2 (en) | 2002-02-04 |
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