JP3348468B2 - Internal atmosphere adjustment device for portable closed containers - Google Patents

Internal atmosphere adjustment device for portable closed containers

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Publication number
JP3348468B2
JP3348468B2 JP16247793A JP16247793A JP3348468B2 JP 3348468 B2 JP3348468 B2 JP 3348468B2 JP 16247793 A JP16247793 A JP 16247793A JP 16247793 A JP16247793 A JP 16247793A JP 3348468 B2 JP3348468 B2 JP 3348468B2
Authority
JP
Japan
Prior art keywords
container
portable
internal atmosphere
atmosphere
internal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP16247793A
Other languages
Japanese (ja)
Other versions
JPH0766273A (en
Inventor
哲平 山下
正直 村田
等 河野
幹 田中
日也 森田
博之 及部
Original Assignee
神鋼電機株式会社
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Publication date
Application filed by 神鋼電機株式会社 filed Critical 神鋼電機株式会社
Priority to JP16247793A priority Critical patent/JP3348468B2/en
Publication of JPH0766273A publication Critical patent/JPH0766273A/en
Application granted granted Critical
Publication of JP3348468B2 publication Critical patent/JP3348468B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、半導体ウェーハ、液晶
表示板、レチクル、ディスク類を製造するシステムに用
いられる可搬式密閉容器の内部雰囲気調整装置に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a device for adjusting the internal atmosphere of a portable airtight container used in a system for manufacturing semiconductor wafers, liquid crystal display panels, reticles and disks.

【0002】[0002]

【従来の技術】半導体ウェーハ、液晶表示板、レチク
ル、ディスク類の製造は、内部雰囲気を清浄化したクリ
ーンルームにおいて行なわれるが、半導体ウェーハの搬
送を、塵埃の付着を防止するために、図3、図4に示す
如き可搬式の密閉容器(以下、コンテナという)に収納
して行なう場合がある。
2. Description of the Related Art Semiconductor wafers, liquid crystal display panels, reticles, and disks are manufactured in a clean room where the internal atmosphere is cleaned. In order to prevent the attachment of dust, the semiconductor wafer is transported as shown in FIG. In some cases, the storage is performed in a portable closed container (hereinafter, referred to as a container) as shown in FIG.

【0003】両図において、8は底蓋型の可搬式密閉コ
ンテナ、Wはウエハである。10は密閉コンテナ8のコ
ンテナ本体であって、開口12にフランジ13が形成さ
れている。20は中空の底蓋であって、上面はカセット
載置部21となっており、内部には、図5に示すような
施錠・解錠機構を内蔵し、この施錠・解錠機構は側壁2
2のラッチ棒進退用窓23からロッド(ラッチ棒)24
をコンテナ本体10のフランジ13の内周面に形成され
た凹部14へ進退させて施錠・解錠する。底蓋20は上
記施錠時、フランジ13の底にシール材15を介して圧
接し、コンテナ本体10内を外気に対して気密に遮断す
る。16は把手である。なお、底蓋20の底の周部に
は、偏平な脚部21Bが形成されている。
In both figures, reference numeral 8 denotes a portable closed container of a bottom cover type, and W denotes a wafer. Reference numeral 10 denotes a container body of the closed container 8, and a flange 13 is formed in the opening 12. Reference numeral 20 denotes a hollow bottom cover, the upper surface of which is a cassette mounting portion 21, and a locking / unlocking mechanism as shown in FIG.
From the latch rod advance / retreat window 23, the rod (latch rod) 24
Is advanced and retracted into a concave portion 14 formed on the inner peripheral surface of the flange 13 of the container body 10 to lock and unlock. At the time of the locking, the bottom cover 20 is pressed against the bottom of the flange 13 via the sealing material 15 to hermetically shut off the inside of the container body 10 from the outside air. Reference numeral 16 is a handle. Note that a flat leg portion 21B is formed around the bottom of the bottom cover 20.

【0004】図5において、板状のラッチ棒24は転動
子24aを有し、長手方向進退可能かつ傾動可能に片持
ち支持されている。25は転動子24aが転動するカム
面を有するカム、26は支点部材、27はばねである。
カム軸28は後述する昇降台31の上壁中央から底蓋2
0内に伸び、昇降台31上に底蓋20が同心に載置され
た時に、カム25とスプライン係合する。昇降台31は
カム軸28を所定角度だけ回動するカム軸駆動機構29
を内蔵している。
In FIG. 5, a plate-like latch bar 24 has a rolling element 24a, and is supported in a cantilever manner so as to be able to advance and retreat in the longitudinal direction and to be tiltable. 25 is a cam having a cam surface on which the rolling element 24a rolls, 26 is a fulcrum member, and 27 is a spring.
The camshaft 28 extends from the center of the upper wall of the elevator 31 to be described later to the bottom lid 2.
When the bottom cover 20 is concentrically mounted on the elevating table 31, the cam 25 is spline-engaged with the cam 25. The elevating table 31 is provided with a cam shaft driving mechanism 29 for rotating the cam shaft 28 by a predetermined angle.
Built-in.

【0005】ところで、従来より、ウエハWのパーティ
クル汚染が問題になっていたが、半導体集積回路の高密
度化が進むに従い、空気中の酸素によるウエハ表面の自
然酸化膜や空気中の有機ガスの影響が問題となり始め、
この自然酸化膜の成長や有機ガス汚染を防止するため、
ウエハWの移動、搬送、処理等を特定の雰囲気例えばO
2 またはH2 Oあるいは必要な場合両方の濃度が10p
pm以下であるガス雰囲気中で行なうことが、要求され
ている。
Conventionally, particle contamination of the wafer W has been a problem. However, as the density of semiconductor integrated circuits has increased, a natural oxide film on the wafer surface and organic gas in the air due to oxygen in the air have increased. The impact started to matter,
To prevent the growth of this natural oxide film and organic gas contamination,
The movement, transfer, and processing of the wafer W are performed in a specific atmosphere, for example, O.
2 or H 2 O or, if necessary, both concentrations
It is required to be performed in a gas atmosphere that is not more than pm.

【0006】そこで、クリーンルーム内の表面処理装置
等の処理装置あるいはウェーハ保管庫等に、図6に示す
ようなガスパージ機構(ガスパージステーション)を設
けて上記要求に応えるようにしている。
Therefore, a gas purging mechanism (gas purging station) as shown in FIG. 6 is provided in a processing apparatus such as a surface processing apparatus in a clean room or a wafer storage to meet the above demand.

【0007】図6において、32はガスパージ機構の本
体ケース1の上壁の適所(台部)1Aに設けられたポー
ト、30は昇降装置、31は昇降装置30の昇降台であ
って、台部1Aに形成されたポート32を気密に閉鎖す
るポートドアを兼ねている。33はシール材である。3
4は台部1Aに形成された給気路であって、一端はポー
32の内周面に開口し、他端は管路35を介し図示し
ない不活性ガスボンベに接続されている。36は台部1
Aに形成された排気路であって、一端はポート32の内
周面に開口し、他端は本体ケース1外へ伸びる管路37
に接続されている。38、39は開閉弁である。
In FIG. 6, reference numeral 32 denotes a port provided at an appropriate place (base) 1A on the upper wall of the main body case 1 of the gas purge mechanism, 30 denotes an elevating device, and 31 denotes an elevating platform of the elevating device 30. It also serves as a port door for hermetically closing the port 32 formed in 1A. 33 is a sealing material. 3
Reference numeral 4 denotes an air supply passage formed in the base 1A, one end of which is a port.
The other end is connected to an inert gas cylinder (not shown) through a conduit 35. 36 is the base 1
A is an exhaust passage formed at one end, and one end is opened on the inner peripheral surface of the port 32, and the other end is a conduit 37 extending outside the main body case 1.
It is connected to the. 38 and 39 are on-off valves.

【0008】カセット9を収納したコンテナ8が図示し
ない移載装置により台部1A上へ移載され、底蓋20が
昇降台31上に位置決めされると、前記施錠・解錠機構
が作動して、底蓋20は解錠される。この解錠が終わる
と、昇降台31が下降し、コンテナ本体10内部と本体
ケース1内部が連通する。この状態で、開閉弁38、3
9が開弁し、ガスパージが行なわれる。ガスパージが終
わると、昇降台31が元の位置まで上昇し、底蓋20が
開口12を気密に閉鎖し、施錠・解錠機構が作動して底
蓋20はコンテナ本体10に固定される。
When the container 8 accommodating the cassette 9 is transferred onto the base 1A by a transfer device (not shown) and the bottom cover 20 is positioned on the elevating platform 31, the locking / unlocking mechanism operates. , The bottom lid 20 is unlocked. When the unlocking is completed, the lift 31 is lowered, and the inside of the container body 10 and the inside of the main body case 1 communicate with each other. In this state, the on-off valves 38, 3
9 is opened, and gas purging is performed. When the gas purging is completed, the lift 31 is raised to the original position, the bottom lid 20 hermetically closes the opening 12, and the locking / unlocking mechanism operates to fix the bottom lid 20 to the container body 10.

【0009】[0009]

【発明が解決しようとする課題】このように、密閉コン
テナ8内を特定のガス雰囲気にして、搬送・保管する
が、極めてわずかづつではあるが、ガスの出入りがあ
り、保管中に、酸素濃度が増えたり、コンテナ器壁から
水分が滲み出たりして、コンテナ内水素濃度が上記規定
値以上に増加してしまう場合が生じる。
As described above, the inside of the closed container 8 is transported and stored in a specific gas atmosphere, but the gas flows in and out very slightly, and the oxygen concentration increases during storage. In some cases, moisture may ooze out of the container wall, and the hydrogen concentration in the container may increase above the specified value.

【0010】これを防ぐためには、クリーンルーム内の
複数の適所にガスパージステーションを配設し、一定期
間毎に、密閉コンテナを再パージすればよいが、このパ
ージ機構は、図6に示すように大がかりの機構であるの
で、スペースを取り、価格も高いので、クリーンルーム
内のあちこちに配置することは難しい上、再パージのた
めの搬送・移載のために、システムの効率が低下する。
In order to prevent this, a gas purge station may be provided at a plurality of appropriate locations in the clean room, and the closed container may be re-purged at regular intervals. This purge mechanism is, as shown in FIG. Because of this mechanism, it takes up space and is expensive, so it is difficult to place it everywhere in a clean room, and the efficiency of the system is reduced due to transport and transfer for repurging.

【0011】また、例えば特願平3−050985号公
報に開示されたているようなパージ機構を搭載した自走
式の搬送車(図7に示す)を用い、カセットWを不活性
ガス雰囲気中に収めて搬送する場合もあるが、大形化・
重量化を余儀なくされ、搭載している窒素ガスボンベ等
のガス源へのガス自動注入のためのステーションも必要
になる。
Further, for example, using a self-propelled carrier (shown in FIG. 7) equipped with a purge mechanism as disclosed in Japanese Patent Application No. 3-050985, the cassette W is placed in an inert gas atmosphere. May be transported in
The weight must be increased, and a station for automatically injecting gas into a gas source such as a mounted nitrogen gas cylinder is also required.

【0012】図7において、40は無人搬送車であっ
て、台車枠40A、天板40B上の一方端寄りに移載ロ
ボット41を搭載し、他部に搬送ボックス42を載せて
固定している。43は駆動輪、44はキャスタである。
50は不活性ガスボンベであり、当該不活性ガスボンベ
の口と搬送ボックス42のガス注入口45とは減圧弁5
1と給ガス弁53とを設けた配管52で接続され、排気
口46からは、排気弁54を有する排気管55が天板を
貫通して台車枠40A内に伸びている。56は制御器
で、センサ類の検知信号を入力するとともに、無人搬送
車40及び移載ロボット41を制御する主制御装置との
で所要のタイミング信号の授受を行い、給ガス弁5
3、排気弁54に対する開閉信号を出力する他、搬送ボ
ックス42の蓋42Aを開閉する為の信号を出力する。
In FIG. 7, reference numeral 40 denotes an automatic guided vehicle, on which a transfer robot 41 is mounted near one end on a bogie frame 40A and a top plate 40B, and a transfer box 42 is mounted and fixed on another portion. . 43 is a drive wheel, 44 is a caster.
Numeral 50 denotes an inert gas cylinder, and the port of the inert gas cylinder and the gas injection port 45 of the transfer box 42 are connected to the pressure reducing valve 5.
1 and a gas supply valve 53 are connected by a pipe 52 , and an exhaust pipe 55 having an exhaust valve 54 extends from the exhaust port 46 into the bogie frame 40A through the top plate. Reference numeral 56 denotes a controller, which inputs a detection signal of a sensor and the like, and has a main controller that controls the automatic guided vehicle 40 and the transfer robot 41.
The required timing signal is transmitted and received between the
3. In addition to outputting an open / close signal for the exhaust valve 54, a signal for opening / closing the cover 42A of the transport box 42 is output.

【0013】搬送ボックス42は在荷センサ47を備え
ており、蓋42Aは図示しない開閉駆動機構により開閉
される。
The transport box 42 has a presence sensor 47, and the lid 42A is opened and closed by an open / close drive mechanism (not shown).

【0014】本発明はこの種の問題を解消するためにな
されたもので、ボンベ等のガス源を使用することなく、
また、ガスの給排気系統を設けることなく、密閉容器の
内部雰囲気を特定のガス雰囲気に調整することができ、
内部雰囲気の調整に要していた費用や手間を大幅に低減
することができる可搬式密閉容器の内部雰囲気調整装置
を提供することを目的とする。
The present invention has been made to solve this kind of problem, and without using a gas source such as a cylinder.
Also, without providing a gas supply / exhaust system, the internal atmosphere of the closed container can be adjusted to a specific gas atmosphere,
An object of the present invention is to provide an internal atmosphere adjusting device for a portable hermetic container that can significantly reduce the cost and labor required for adjusting the internal atmosphere.

【0015】[0015]

【課題を解決するための手段】本発明は上記目的を達成
するため、請求項1では、内部空所を有し可搬式密閉容
器を気密に載置可能な台部と上記内部空所に連通するポ
ートを形成された本体ケースと、上記ポートを上記内部
空所に対して気密に遮断可能な部材と、上記可搬式密閉
容器の蓋を開閉する開閉機構と、上記内部空所に交換可
能に収納された内部雰囲気成分調整剤ユニットとを備
え、上記可搬式密閉容器は、容器本体と、この容器本体
の開口部を気密に閉鎖可能な蓋を備え、内部雰囲気が不
活性ガス雰囲気である密閉容器であって、当該蓋の開
時、上記容器本体が上記ポートを通して、上記内部と連
通する構成とした。
In order to achieve the above object, according to the present invention, according to the first aspect, a base having an internal space and capable of airtightly mounting a portable closed container is communicated with the internal space. a main body case which the ports are formed to be a member capable of interrupting hermetically the port with respect to the internal space, an opening and closing mechanism for opening and closing the lid of the friendly transportable closed container interchangeably in the inner space The portable hermetic container comprises a container main body, and a lid capable of airtightly closing an opening of the container main body, wherein the internal atmosphere is an inert gas atmosphere. a container, at the opening of the lid through the container body said port and configured to the communication with the interior.

【0016】請求項2では、上記可搬式密閉容器は、ク
リーンルーム内で搬送・保管に用いられる可搬式密閉容
器であり、上記可搬式密閉容器の内部雰囲気調整装置
は、クリーンルームにおける当該可搬式密閉容器の再パ
ージ装置に代えて用いられることを特徴とする。
In claim 2,the abovePortable closed containers
Portable closed container used for transportation and storage in the lean room
VesselDevice for adjusting the internal atmosphere of the portable closed container
Is required to repack the portable closed container in the clean room.
It is used in place of a storage device.

【0017】請求項3では、地上設備から上記可搬式密
閉容器を搭載して目的地まで自走する無人搬送装置に搭
載されることを特徴とする。
[0017] According to claim 3, characterized in that it is mounted on the unmanned conveying device for free-running from the ground equipment to the destination by mounting the friendly transportable closed container.

【0018】[0018]

【作用】本発明では、密閉容器の容器本体内を装置の内
部空所と連通させるだけで、内部雰囲気成分調整剤が容
器本体の内部雰囲気中の例えば、水分や酸素を吸着して
内部雰囲気を調整する。
According to the present invention, the internal atmosphere component adjusting agent adsorbs, for example, moisture and oxygen in the internal atmosphere of the container body, and thereby changes the internal atmosphere only by communicating the inside of the container body of the closed container with the internal space of the apparatus. adjust.

【0019】[0019]

【実施例】以下、本発明の1実施例を図面を参照して説
明する。
An embodiment of the present invention will be described below with reference to the drawings.

【0020】図1において、60は内部雰囲気調整装置
の本体ケース、61は本体ケース60の上壁に設けられ
た台部、62はこの台部61に設けられたポート、63
は本体ケース60の側壁に設けられた気密扉、64はコ
ンテナ固定用の自動ロック機構、65は昇降台、66は
昇降台65を昇降駆動する駆動機構、昇降台65は、前
記昇降台31と同じ構造の昇降台で、ポート62に遊嵌
可能な大きさを有し、当該ポート62をシール材67を
介し本体ケース60内部側より閉鎖するフランジ65A
を備えている。68はガスパージ装置の制御装置であ
る。
In FIG. 1, reference numeral 60 denotes a main body case of the internal atmosphere adjusting device, 61 denotes a base provided on the upper wall of the main body case 60, 62 denotes a port provided in the base 61, 63
Is an airtight door provided on the side wall of the main body case 60, 64 is an automatic lock mechanism for fixing the container, 65 is an elevating platform, 66 is a driving mechanism for driving the elevating platform 65 up and down, and the elevating platform 65 is A flange 65A having the same structure and having a size that allows it to be loosely fitted to the port 62 and that closes the port 62 from the inside of the main body case 60 via the sealing material 67.
It has. Reference numeral 68 denotes a control device of the gas purge device.

【0021】70は内部雰囲気成分調整剤ユニットであ
って、本体ケース71内部空所Aの気密扉63近くに
配置されている。このユニット70の本体71内には、
乾燥剤や酸素吸収剤の如き内部雰囲気成分調整剤80が
充填されている。ユニット70の蓋72にはフィルタ機
能を備える
Reference numeral 70 denotes an internal atmosphere component adjusting agent unit. The main body case 71 is disposed near the airtight door 63 in the internal space A. In the main body 71 of this unit 70,
An internal atmosphere component regulator 80 such as a desiccant or an oxygen absorber is filled. The lid 72 of unit 70 comprises a filter function.

【0022】図1のガスパージ装置が、クリーンルーム
内のウェーハ保管庫内に設けられているものとする。
It is assumed that the gas purging apparatus shown in FIG. 1 is provided in a wafer storage in a clean room.

【0023】このウェーハ保管庫内に保管されて一定時
間が経過したコンテナ8が図1に示すように本体ケース
60の台部61に載置されると、底蓋20内の前記カム
25に昇降台65からの前記カム軸28が係合する。次
いで、自動ロック機構64が作動して、コンテナ本体1
0のフランジ13を上から押さえてコンテナ本体10を
台部61上に固定する。この固定が終わると、昇降台6
5に内蔵されているカム軸駆動機構29が作動してカム
25が所定角度だけ回動し、この回動に伴い底蓋20の
ラッチ棒が底蓋内方へ退避し、底蓋20はコンテナ本体
10から離間可能となる。底蓋20のこの解錠が終わる
と、駆動機構66が作動して昇降台65が所定距離だけ
下降する。これにより、コンテナ本体10の内部と本体
ケース60の内部空所Aとがポート62を通して連通
し、コンテナ本体10の内部雰囲気ガスと本体ケース
の内部の雰囲気ガスとが混合する。コンテナ8はウェ
ーハ保管庫内に保管されて一定時間が経過しているの
で、この一定時間中に、コンテナ器壁から放出された水
分があると、その分、内部雰囲気ガス中の水分濃度が増
えている。乾燥剤80は、上記混合した雰囲気ガス中の
水分を吸着し、水分濃度を低下させる。
When the container 8 which has been stored in the wafer storage and has passed for a certain period of time is placed on the base 61 of the main body case 60 as shown in FIG. The camshaft 28 from the base 65 is engaged. Next, the automatic lock mechanism 64 is operated, and the container body 1 is operated.
The container body 10 is fixed on the pedestal 61 by pressing the 0 flange 13 from above. When this fixing is completed, the elevator 6
The cam shaft drive mechanism 29 incorporated in the camera 5 operates to rotate the cam 25 by a predetermined angle. With this rotation, the latch rod of the bottom cover 20 is retracted into the bottom cover. It can be separated from the main body 10. When the unlocking of the bottom cover 20 is completed, the drive mechanism 66 is operated, and the lift 65 is lowered by a predetermined distance. As a result, the inside of the container body 10 communicates with the internal space A of the body case 60 through the port 62, and the internal atmosphere gas of the container body 10 and the body case 6
0 and the atmosphere gas inside. Since the container 8 has been stored in the wafer storage for a certain period of time, if there is water released from the container wall during the certain period of time, the water concentration in the internal atmosphere gas increases accordingly. ing. The desiccant 80 adsorbs moisture in the mixed atmosphere gas and lowers the moisture concentration.

【0024】昇降台65を下降させてから、所定時間が
経過すると、駆動機構66により、昇降台65は図1に
示す元の位置まで駆動され、底蓋20コンテナ本体1
0の開口に嵌合する。次いで、昇降台65に内蔵されて
いるカム軸駆動機構29が作動してカム25が上記とは
逆方向へ所定角度だけ回動し、この回動に伴い底蓋20
のラッチ棒がコンテナ本体10側へ変位し、凹所14に
係合し、コンテナ8の施錠が完了する。施錠が完了した
コンテナ8の内部雰囲気は、水分の濃度が規定値以下に
低下しており、ウエーハ保管庫内の元の場所へ保管され
る。
[0024] After lowering the lifting table 65, a predetermined time has elapsed, the drive mechanism 66, the elevation frame 65 is driven to the original position shown in FIG. 1, the bottom lid 20 container body 1
0 is fitted into the opening. Next, the cam shaft drive mechanism 29 built in the lift 65 is operated to rotate the cam 25 by a predetermined angle in a direction opposite to the above, and with this rotation, the bottom cover 20 is rotated.
Is displaced toward the container body 10 and engages with the concave portion 14, and the locking of the container 8 is completed. The internal atmosphere of the container 8 in which the locking is completed has a water concentration lower than a specified value, and is stored in the original place in the wafer storage.

【0025】本実施例の装置は、図6に示したパージス
テーションとは異なり、N2 ガスボンベのようなガス
源、給排気系統を設ける必要がないので、その分、小形
化、コストダウンすることができるので、クリーンルー
ム内のあちこちに配設することが容易に可能である。
Unlike the purge station shown in FIG. 6, the apparatus of this embodiment does not need to provide a gas source such as an N 2 gas cylinder and a supply / exhaust system, so that the size and cost can be reduced accordingly. Therefore, it is possible to easily dispose them everywhere in the clean room.

【0026】図2は、内部雰囲気調整装置60を無人搬
送車に搭載した例を示したものである。
FIG. 2 shows an example in which the internal atmosphere adjusting device 60 is mounted on an automatic guided vehicle.

【0027】本実施例では、何らかの原因で、当該無人
搬送車がスケジュール通り稼働しなくなり、密閉容器
が、無人搬送車に長時間放置されるような自体が発生し
ても、自然酸化膜の成長を防止することができる。
In this embodiment, even if the automatic guided vehicle stops operating according to the schedule for some reason and the sealed container itself is left in the automatic guided vehicle for a long time, the growth of the natural oxide film may occur. Can be prevented.

【0028】上記例では、保管中の密閉容器や搬送途中
の密閉容器の内部雰囲気の調整について説明したが、即
ち、一度調整した密閉容器の内部雰囲気に調整について
述べたが、大気中で、密閉容器内にウェーハを収納した
場合も、乾燥剤の如き内部雰囲気成分調整剤80の調整
容量を大きくしておけば、例えば、水分濃度を規定値以
下に下げることができる。
In the above example, the adjustment of the internal atmosphere of the closed container during storage or the closed container during transportation was described. That is, the adjustment of the internal atmosphere of the closed container once adjusted was described. Even when a wafer is stored in a container, for example, the moisture concentration can be reduced to a specified value or less by increasing the adjusting capacity of the internal atmosphere component adjusting agent 80 such as a desiccant.

【0029】[0029]

【発明の効果】本発明は以上説明した通り、窒素ボンベ
等の不活性ガス源を用いることなく、簡便に、内部雰囲
気の調整を行なうことができるので、当該内部雰囲気の
調整に要していた費用や手間を大幅に低減することがで
き、特に、保管途中や搬送途中の密閉容器内部雰囲気の
調整に、極めて好適である。
As described above, according to the present invention, since the internal atmosphere can be easily adjusted without using an inert gas source such as a nitrogen cylinder, it is necessary to adjust the internal atmosphere. The cost and labor can be significantly reduced, and it is particularly suitable for adjusting the atmosphere inside the closed container during storage or transportation.

【図面の簡単な説明】[Brief description of the drawings]

【図1】第1の発明の実施例を示す縦断面図である。FIG. 1 is a longitudinal sectional view showing an embodiment of the first invention.

【図2】第2の発明の実施例を示す縦断面図である。FIG. 2 is a longitudinal sectional view showing an embodiment of the second invention.

【図3】従来の可搬式密閉コンテナの外観図である。FIG. 3 is an external view of a conventional portable closed container.

【図4】従来の可搬式密閉コンテナの縦断面である。FIG. 4 is a longitudinal section of a conventional portable closed container.

【図5】従来の可搬式密閉コンテナの施錠/解錠機構を
説明するための図である。
FIG. 5 is a view for explaining a locking / unlocking mechanism of a conventional portable closed container.

【図6】従来の可搬式密閉コンテナのガスパージ機構を
説明するための図である。
FIG. 6 is a diagram for explaining a gas purging mechanism of a conventional portable closed container.

【図7】従来の可搬式密閉を搬送するための無人搬送装
置を示す図である。
FIG. 7 is a diagram showing a conventional unmanned transport device for transporting a portable hermetic seal.

【符号の説明】[Explanation of symbols]

8 可搬式密閉コンテナ 10 コンテナ本体 20 底蓋 24 ラッチ棒 60 内部雰囲気調整装置の本体ケース 61 台部 62 ポート 63 気密扉 65 昇降台 66 駆動機構 68 制御装置 70 内部雰囲気調整剤ユニット 80 内部雰囲気調整剤 Reference Signs List 8 Portable closed container 10 Container body 20 Bottom lid 24 Latch rod 60 Body case of internal atmosphere adjusting device 61 Base 62 Port 63 Airtight door 65 Lifting table 66 Drive mechanism 68 Control device 70 Internal atmosphere adjusting agent unit 80 Internal atmosphere adjusting agent

───────────────────────────────────────────────────── フロントページの続き (72)発明者 森田 日也 三重県伊勢市竹ケ鼻町100番地 神鋼電 機株式会社伊勢製作所内 (72)発明者 及部 博之 三重県伊勢市竹ケ鼻町100番地 神鋼電 機株式会社伊勢製作所内 (56)参考文献 特開 昭62−222625(JP,A) 実開 平2−82042(JP,U) 実開 平5−25731(JP,U) 実開 昭60−39237(JP,U) (58)調査した分野(Int.Cl.7,DB名) H01L 21/68 H01L 21/02 H01L 21/30 A23L 3/34 - 3/3598 B65D 77/00 - 79/02 B65D 81/18 - 81/28 B65D 85/38 B65D 85/50 - 85/52 B65D 85/60 B65D 85/72 - 85/86 ──────────────────────────────────────────────────の Continuing on the front page (72) Inventor, Moriya Hiya 100, Takegahanacho, Ise-shi, Mie Prefecture Inside Kobe Electric Machinery Co., Ltd. (72) Inventor Hiroyuki Obebe 100, Takegahanacho, Ise-shi, Mie Prefecture (56) References JP-A-62-222625 (JP, A) JP-A-2-82042 (JP, U) JP-A-5-25731 (JP, U) JP-A 60-39237 ( (JP, U) (58) Fields investigated (Int. Cl. 7 , DB name) H01L 21/68 H01L 21/02 H01L 21/30 A23L 3/34-3/3598 B65D 77/00-79/02 B65D 81 / 18-81/28 B65D 85/38 B65D 85/50-85/52 B65D 85/60 B65D 85/72-85/86

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 内部空所を有し可搬式密閉容器を気密に
載置可能な台部と上記内部空所に連通するポートを形成
された本体ケースと、上記ポートを上記内部空所に対し
て気密に遮断可能な部材と、上記可搬式密閉容器の蓋を
開閉する開閉機構と、上記内部空所に交換可能に収納さ
れた内部雰囲気成分調整剤ユニットとを備え、 上記可搬式密閉容器は、容器本体と、この容器本体の開
口部を気密に閉鎖可能な蓋を備え、内部雰囲気が不活性
ガス雰囲気である密閉容器であって、当該蓋の開時、
記容器本体が上記ポートを通して、上記内部と連通する
ことを特徴とする可搬式密閉容器の内部雰囲気調整装
置。
And 1. A body case formed a port communicating with the interior cavity of a friendly transportable sealed container can be placed base portion and the inner space airtight, the port to the internal space A member that can be closed airtightly, an opening / closing mechanism for opening and closing the lid of the portable airtight container, and an internal atmosphere component adjusting agent unit that is exchangeably housed in the internal space, and the portable airtight container is a container body, a lid capable of closing the opening of the container body in an airtight manner, the internal atmosphere is a sealed container is an inert gas atmosphere, when open the lid, the upper
An interior atmosphere adjusting device for a portable closed container, wherein the container body communicates with the inside through the port.
【請求項2】 上記可搬式密閉容器は、クリーンルーム
内で搬送・保管に用いられる可搬式密閉容器であり、
記可搬式密閉容器の内部雰囲気調整装置は、クリーンル
ームにおける当該可搬式密閉容器の再パージ装置に代え
て用いられることを特徴とする請求項1記載の可搬式密
閉容器の内部雰囲気調整装置。
Wherein said Allowed transportable closed container is a portable sealed container used to transport and storage in a clean room, the upper
The internal atmosphere adjusting device for a portable closed container according to claim 1, wherein the internal atmosphere adjusting device for the portable closed container is used in place of a repurge device for the portable closed container in a clean room.
【請求項3】 地上設備から上記可搬式密閉容器を搭載
して目的地まで自走する無人搬送装置に搭載されること
を特徴とする請求項1記載の可搬式密閉容器の内部雰囲
気調整装置。
3. The apparatus for adjusting the internal atmosphere of a portable hermetic container according to claim 1, wherein said portable hermetic container is mounted on an unmanned transfer device which is self-propelled to a destination by mounting said portable hermetic container from ground equipment .
JP16247793A 1993-06-30 1993-06-30 Internal atmosphere adjustment device for portable closed containers Expired - Lifetime JP3348468B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16247793A JP3348468B2 (en) 1993-06-30 1993-06-30 Internal atmosphere adjustment device for portable closed containers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16247793A JP3348468B2 (en) 1993-06-30 1993-06-30 Internal atmosphere adjustment device for portable closed containers

Publications (2)

Publication Number Publication Date
JPH0766273A JPH0766273A (en) 1995-03-10
JP3348468B2 true JP3348468B2 (en) 2002-11-20

Family

ID=15755367

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16247793A Expired - Lifetime JP3348468B2 (en) 1993-06-30 1993-06-30 Internal atmosphere adjustment device for portable closed containers

Country Status (1)

Country Link
JP (1) JP3348468B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11214479A (en) 1998-01-23 1999-08-06 Tokyo Electron Ltd Apparatus and method of treating substrate and apparatus for transporting substrate
US6547953B2 (en) 2000-01-28 2003-04-15 Ebara Corporation Substrate container and method of dehumidifying substrate container
JP2002299427A (en) * 2001-03-29 2002-10-11 Mitsubishi Electric Corp Substrate cassette, substrate contamination prevention apparatus, manufacturing method of semiconductor device
JP5425656B2 (en) * 2010-02-15 2014-02-26 東京エレクトロン株式会社 Substrate processing apparatus and load lock apparatus

Also Published As

Publication number Publication date
JPH0766273A (en) 1995-03-10

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