JPH0786370A - Gas purge device - Google Patents
Gas purge deviceInfo
- Publication number
- JPH0786370A JPH0786370A JP22903793A JP22903793A JPH0786370A JP H0786370 A JPH0786370 A JP H0786370A JP 22903793 A JP22903793 A JP 22903793A JP 22903793 A JP22903793 A JP 22903793A JP H0786370 A JPH0786370 A JP H0786370A
- Authority
- JP
- Japan
- Prior art keywords
- exhaust
- gas
- valve
- gas purging
- lid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、半導体ウェーハ、液晶
表示板、レチクル、ディスク類の製造システムにおい
て、これらを可搬式密閉容器に収納して搬送する場合の
当該可搬式密閉容器のガスパージ装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas purging apparatus for a semiconductor wafer, a liquid crystal display panel, a reticle, a disk, etc., in a portable hermetically-sealed container, when these are housed and conveyed in the portable hermetically-sealed container. .
【０００２】[0002]
【従来の技術】半導体ウェーハ、液晶表示板、レチク
ル、ディスク類の製造は、内部雰囲気を清浄化したクリ
ーンルームにおいて行なわれるが、半導体ウェーハ等の
搬送・保管を、塵埃の付着を防止するために、可搬式の
密閉容器（以下、コンテナという）に収納して行なう場
合がある。2. Description of the Related Art Semiconductor wafers, liquid crystal display panels, reticles, and disks are manufactured in a clean room with a clean internal atmosphere. However, in order to prevent the adhesion of dust during the transportation and storage of semiconductor wafers, etc. It may be stored in a portable airtight container (hereinafter referred to as a container).
【０００３】また、半導体集積回路の高密度化が進むに
伴い、空気中の酸素によるウエハ表面の自然酸化膜や空
気中の有機ガスの影響が問題となり始め、この自然酸化
膜の成長や有機ガス汚染を防止するため、ウエハＷの移
動、搬送、処理等を特定の雰囲気例えばＯ2 またはＨ2
Ｏあるいは必要な場合両方の濃度が１．０ｐｐｍ以下で
あるガス雰囲気中で行なうことが、要求されるようにな
り、この要求に応えるために、クリーンルーム内の表面
処理装置等の処理装置あるいはウェーハ保管庫等に、図
８に示すようなガスパージ機構（ガスパージユニット）
を設けるようにしている。As the density of semiconductor integrated circuits increases, the influence of a natural oxide film on the wafer surface and an organic gas in the air due to oxygen in the air begins to become a problem, and the growth of the natural oxide film and the organic gas. In order to prevent contamination, the movement, transfer, processing, etc. of the wafer W are performed in a specific atmosphere such as O 2 or H 2
It has become necessary to carry out in a gas atmosphere in which the concentration of O or both of them is 1.0 ppm or less if necessary, and in order to meet this demand, processing equipment such as surface treatment equipment in a clean room or wafer storage. A gas purging mechanism (gas purging unit) as shown in FIG.
Is provided.
【０００４】図８において、１はウェーハ、２はウェー
ハ１を収納したウェーハカセット、１０は底蓋型の可搬
式密閉コンテナである。１１は密閉コンテナ１０のコン
テナ本体であって、開口１２にフランジ１３が形成され
ている。２０は中空の底蓋であって、上面はカセット載
置部２１となっており、内部には、図９に示すような施
錠・解錠機構を内蔵し、この施錠・解錠機構は側壁２２
のラッチ棒進退用窓２３からロッド（ラッチ棒）２４を
コンテナ本体１１のフランジ１３の内周面に形成された
凹部１４へ進退させて施錠・解錠する。底蓋２０は上記
施錠時、フランジ１３の底にシール材１５を介して圧接
し、コンテナ本体１０内を外気に対して気密に遮断す
る。１６は把手である。In FIG. 8, 1 is a wafer, 2 is a wafer cassette containing the wafer 1, and 10 is a bottom lid type portable airtight container. Reference numeral 11 denotes a container body of the closed container 10, and a flange 13 is formed in the opening 12. Reference numeral 20 denotes a hollow bottom lid, the upper surface of which serves as a cassette mounting portion 21, and a locking / unlocking mechanism as shown in FIG.
The rod (latch rod) 24 is moved forward and backward through the latch rod advance / retreat window 23 into the recess 14 formed in the inner peripheral surface of the flange 13 of the container body 11 to lock / unlock. When the bottom lid 20 is locked, the bottom lid 20 is pressed against the bottom of the flange 13 via the sealing material 15 to hermetically shut off the inside of the container body 10 from the outside air. 16 is a handle.
【０００５】図９において、板状のラッチ棒２４は転動
子２４ａを有し、長手方向進退可能かつ傾動可能に片持
ち支持されている。２５は転動子２４ａが転動するカム
面を有するカム、２６は支点部材、２７はばねである。
カム軸２８は後述する昇降台３３の上壁中央から底蓋２
０内に伸び、昇降台３３上に底蓋２０が同心に載置され
た時に、カム２５とスプライン係合する。昇降台３３は
カム軸２８を所定角度だけ回動するカム軸駆動機構２９
を内蔵している。In FIG. 9, a plate-shaped latch bar 24 has a rolling element 24a, and is supported by a cantilever so as to be movable in the longitudinal direction and tiltable. Reference numeral 25 is a cam having a cam surface on which the rolling element 24a rolls, 26 is a fulcrum member, and 27 is a spring.
The cam shaft 28 moves from the center of the upper wall of the lift 33, which will be described later, to the bottom cover 2
When the bottom cover 20 is concentrically placed on the lift table 33, the cam 25 is spline-engaged. The lift table 33 includes a cam shaft drive mechanism 29 for rotating the cam shaft 28 by a predetermined angle.
Built in.
【０００６】３０はガスパージユニットであり、その本
体ケース３１の上壁（ポートプレート）３１ａにはポー
ト（開口部）３１Ａが設けられている。３２は昇降装
置、３３は昇降装置３２の昇降台であって、ポート３１
Ａを気密に閉鎖するポートドアを兼ねている。３４はシ
ール材である。３５はポートプレート３１ａに形成され
た給気路であって、一端はポート３１Ａの内周面に開口
し、他端（給気口）は管路３６を介し図示しない不活性
ガスボンベ３９に接続されている。３７はポートプレー
ト３１ａに形成された排気路であって、一端はポート３
１Ａの内周面に開口し、他端（排気口）は本体ケース３
１外へ伸びる管路３８に接続されている。４０はＯＮ／
ＯＦＦ給気弁、４１はＯＮ／ＯＦＦ排気弁である。Reference numeral 30 is a gas purging unit, and an upper wall (port plate) 31a of the main body case 31 thereof is provided with a port (opening) 31A. 32 is a lifting device, 33 is a lifting platform of the lifting device 32,
It also serves as a port door that air-tightly closes A. 34 is a sealing material. Reference numeral 35 denotes an air supply passage formed in the port plate 31a, one end of which is opened to the inner peripheral surface of the port 31A, and the other end (air supply port) is connected to an inert gas cylinder 39 (not shown) via a pipe passage 36. ing. 37 is an exhaust passage formed in the port plate 31a, one end of which is the port 3
1A is open to the inner peripheral surface, and the other end (exhaust port) is the main body case 3
1 is connected to a pipe line 38 extending to the outside. 40 is ON /
An OFF air supply valve, 41 is an ON / OFF exhaust valve.
【０００７】ウェーハカセット２を収納したコンテナ１
０が図示しない移載装置によりポートプレート３１ａ上
へ移載され、底蓋２０が昇降台３３上に位置決めされる
と、図示しない自動ロック機構により、コンテナ本体１
１がポートプレート３１ａ上に固定される。次いで、前
記施錠・解錠機構が作動して、底蓋２０は解錠される。
この解錠が終わると、昇降台３３が下降し、コンテナ本
体１１内部と本体ケース３１内部が連通する。この状態
で、ＯＮ／ＯＦＦ給気弁４０、ＯＮ／ＯＦＦ排気弁４１
が開弁し、ガスパージが行なわれる。すなわち、不活性
ガスボンベ３９からの不活性ガス（この例では、Ｎ2 ガ
ス）が管路３６、ＯＮ／ＯＦＦ給気弁４０、給気路３
５、を通って、例えば、７０リットル／分の流量で、本
体ケース３１内に流入し、コンテナ１０内および本体ケ
ース３１内の空気を排気路３７、排気弁４１、管路３８
を通して追い出し、コンテナ本体１１内および本体ケー
ス３１内に充満する。A container 1 containing a wafer cassette 2
When 0 is transferred onto the port plate 31a by a transfer device (not shown) and the bottom lid 20 is positioned on the elevating table 33, the container body 1 is moved by an automatic lock mechanism (not shown).
1 is fixed on the port plate 31a. Then, the locking / unlocking mechanism is activated to unlock the bottom lid 20.
When this unlocking is completed, the elevating table 33 descends, and the inside of the container body 11 and the inside of the body case 31 communicate with each other. In this state, the ON / OFF air supply valve 40 and the ON / OFF exhaust valve 41
Is opened and gas purge is performed. That is, the inert gas (N 2 gas in this example) from the inert gas cylinder 39 is supplied to the conduit 36, the ON / OFF air supply valve 40, and the air supply passage 3.
5, and flows into the main body case 31 at a flow rate of, for example, 70 liters / minute, and the air in the container 10 and the main body case 31 is exhausted through the exhaust passage 37, the exhaust valve 41, and the pipe 38.
The container main body 11 and the main body case 31 are filled.
【０００８】このガスパージが終わると、昇降台３３が
元の位置まで上昇し、底蓋２０が開口１２を気密に閉鎖
し、施錠・解錠機構が作動して底蓋２０はコンテナ本体
１１に固定される。コンテナ本体１１を底蓋２０で閉蓋
し終わると、上記図示しない自動ロック機構が外れ、コ
ンテナ１０は移載装置により所定の場所へ移載される。When the gas purging is completed, the lifting table 33 rises to its original position, the bottom lid 20 hermetically closes the opening 12, and the locking / unlocking mechanism operates to fix the bottom lid 20 to the container body 11. To be done. When the container main body 11 is completely closed with the bottom cover 20, the above-mentioned automatic locking mechanism is released, and the container 10 is transferred to a predetermined place by the transfer device.
【０００９】[0009]
【発明が解決しようとする課題】このように、密閉コン
テナ１０内を特定のガスでパージし、コンテナ内部雰囲
気を例えばＯ2 またはＨ2 Ｏあるいは必要な場合両方の
濃度が１ｐｐｍ以下であるガス雰囲気にして、搬送・保
管するが、従来は、上記濃度までガスパージするのに、
かなり長い時間を必要とし、その結果、高価である不活
性ガスの消費量も多く、また、場合によっては目標値ま
で濃度が下がらないという問題があった。本発明はこの
種の問題を解消するためになされたもので、簡便な手段
を用いるだけで、濃度をより低濃度の目標値まで下げる
ことができ、かつパージに要する時間を大幅に短縮する
ことができ、パージガスの消費量も低減することができ
る経済的なガスパージ装置を提供することを目的とす
る。In this way, the inside of the closed container 10 is purged with a specific gas, and the atmosphere inside the container is, for example, O 2 or H 2 O or a gas atmosphere in which the concentration of both is 1 ppm or less if necessary. Then, it is transported and stored, but in the past, to purge the gas to the above concentration,
It takes a considerably long time, and as a result, the amount of expensive inert gas consumed is large, and in some cases, the concentration does not fall to the target value. The present invention has been made in order to solve this kind of problem, and it is possible to reduce the concentration to a target value of a lower concentration and to greatly shorten the time required for purging only by using a simple means. Therefore, it is an object of the present invention to provide an economical gas purging device that can reduce the consumption of purge gas.
【００１０】[0010]
【課題を解決するための手段】本発明は上記目的を達成
するため、請求項１では、定圧力の不活性ガス源、密閉
空間、当該密閉空間内部を前記不活性ガス源と連絡する
ガス供給管路、当該密閉空間内部を外部と連絡する排気
管路、ガス供給管路に設けられた給気弁、排気管路に設
けられた排気弁を備え、これら給気弁と排気弁を開閉し
て上記密閉空間内部をガスパージするガスパージ装置に
おいて、パージ時の上記密閉空間内圧が増加する向きに
上記排気管路の排気抵抗を調整する加圧手段を有する構
成とした。In order to achieve the above object, the present invention provides a constant pressure inert gas source, a closed space, and a gas supply for connecting the inside of the closed space with the inert gas source. A pipe line, an exhaust pipe line that connects the inside of the enclosed space to the outside, an air supply valve provided in the gas supply pipe line, an exhaust valve provided in the exhaust pipe line, and these air supply valve and exhaust valve are opened and closed. The gas purging device for purging the inside of the closed space with a gas has a pressurizing means for adjusting the exhaust resistance of the exhaust pipe line in a direction in which the internal pressure of the closed space increases during purging.
【００１１】請求項２では、密閉空間は、ガスパージに
際して密閉性の函体に載置される蓋付の可搬式密閉容器
と上記函体がつくる空間であって、当該函体は、上記蓋
の開時に前記密閉容器の開口と連通するポートを設けた
台部を有するとともに当該ポートを気密に閉鎖可能な昇
降台を含む上記蓋の蓋開閉機構を内蔵し、給気口および
排気口を備える構成とした。According to a second aspect of the present invention, the hermetically sealed space is a space formed by the portable hermetically-sealed container with a lid placed on a hermetically sealed box for gas purging, and the box, which is the lid. A structure having a base portion provided with a port communicating with the opening of the closed container at the time of opening and incorporating a lid opening / closing mechanism of the lid including an elevating table capable of airtightly closing the port, and including an air supply port and an exhaust port And
【００１２】請求項３では、密閉空間は、ガスパージに
際して密閉性の函体に載置される蓋付の可搬式密閉容器
と上記函体および当該函体内に設けられた仕切りがつく
る空間であって、当該函体は、上記蓋の開時に前記密閉
容器の開口と連通するポートを設けた台部を有するとと
もに当該ポートを気密に閉鎖可能な昇降台を含む上記蓋
の蓋開閉機構を内蔵し、上記仕切りは、上開口部が上記
台部下面のポート周部に離間可能に圧接する有底筒状も
しくは下開口部が昇降台で閉鎖可能な筒状をなす構成と
した。In the third aspect, the hermetically sealed space is a space formed by a portable hermetically sealed container with a lid placed on a hermetically sealed box for gas purging, the box and a partition provided in the box. , The box has a lid opening / closing mechanism of the lid including a platform portion provided with a port communicating with the opening of the closed container when the lid is opened and including a lifting platform capable of hermetically closing the port, The partition has a bottomed cylindrical shape whose upper opening is press-contacted to the port peripheral portion on the lower surface of the base so as to be separable, or a lower opening which can be closed by an elevator.
【００１３】請求項４では、上記排気抵抗を調整する加
圧手段は、排気管路に設けられた開度可変の弁であるこ
とを特徴とする。According to a fourth aspect of the present invention, the pressurizing means for adjusting the exhaust resistance is a valve having a variable opening degree provided in the exhaust pipe line.
【００１４】請求項５では、上記排気抵抗を調整する加
圧手段は、逆止弁であることを特徴とする。According to a fifth aspect of the present invention, the pressurizing means for adjusting the exhaust resistance is a check valve.
【００１５】請求項６では、排気抵抗を調整する加圧手
段は、複数の分岐管路を備える排気管路と当該分岐管路
の各々に介装された弁であることを特徴とする。According to a sixth aspect of the present invention, the pressurizing means for adjusting the exhaust resistance is an exhaust pipe having a plurality of branch pipes and a valve provided in each of the branch pipes.
【００１６】請求項７では、排気抵抗を調整する加圧手
段は、主管から分岐する複数の分岐管路を備える排気管
路と当該分岐管路の各々に介装された弁であることを特
徴とする。According to a seventh aspect of the present invention, the pressurizing means for adjusting the exhaust resistance is an exhaust pipe having a plurality of branch pipes branched from the main pipe and a valve interposed in each of the branch pipes. And
【００１７】請求項８では、上記排気抵抗を調整する加
圧手段は、排気抵抗自動制御機能を備えることを特徴と
する。In the eighth aspect, the pressurizing means for adjusting the exhaust resistance has an exhaust resistance automatic control function.
【００１８】[0018]
【作用】本発明では、コンテナ内を加圧しながら、ガス
パージを行なう。In the present invention, gas purging is performed while pressurizing the inside of the container.
【００１９】[0019]
【実施例】以下、本発明の１実施例を図面を参照して説
明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.
【００２０】図１において、５０はガスパージユニット
３０における本体ケース３１の排気路３７の出口に設け
られた流量調整弁であって、排気路３７は流量調整弁５
０を介し、管路３８に接続されている。６０は排気抵抗
自動制御装置（弁開度制御装置）である。６１は圧力セ
ンサであり、弁開度制御装置６０は、圧力センサ６１の
検出値が設定圧力（例えば、１．０３〜１．０５気圧）
になるように、流量調整弁０の弁開度を絞る。他の構成
は、図７のものと同じであるので、同一符号を付して示
してある。In FIG. 1, reference numeral 50 denotes a flow rate adjusting valve provided at the outlet of the exhaust passage 37 of the main body case 31 of the gas purging unit 30, and the exhaust passage 37 includes the flow rate adjusting valve 5.
It is connected to the conduit 38 via 0. Reference numeral 60 denotes an exhaust resistance automatic control device (valve opening control device). Reference numeral 61 is a pressure sensor, and the valve opening control device 60 detects that the pressure sensor 61 detects a set pressure (for example, 1.03 to 1.05 atmospheric pressure).
The valve opening of the flow rate adjusting valve 0 is narrowed so that The other configurations are the same as those in FIG. 7, and are therefore denoted by the same reference numerals.
【００２１】本実施例によるコンテナ本体のガスパージ
について、以下に説明する。The gas purging of the container body according to this embodiment will be described below.
【００２２】ウェーハカセット２を収納したコンテナ１
０が図示しない移載装置によりポートプレート３１上へ
移載され、底蓋２０が昇降台３３上に位置決めされる
と、図示しない自動ロック機構により、コンテナ本体１
１がポートプレート３１上に固定される。次いで、前記
施錠・解錠機構が作動して、底蓋２０は解錠される。こ
の解錠が終わると、昇降台３３が下降し、コンテナ本体
１１内部と本体ケース３０内部が連通する。Container 1 containing wafer cassette 2
When 0 is transferred onto the port plate 31 by a transfer device (not shown) and the bottom lid 20 is positioned on the elevating table 33, the container body 1 is moved by an automatic locking mechanism (not shown).
1 is fixed on the port plate 31. Then, the locking / unlocking mechanism is activated to unlock the bottom lid 20. When this unlocking is completed, the elevating table 33 descends, and the inside of the container body 11 and the inside of the body case 30 communicate with each other.
【００２３】この状態で、ＯＮ／ＯＦＦ給気弁４０と流
量調整弁５０が開弁されるが、流量調整弁５０の弁開度
は、弁開度制御装置６０により、圧力センサ６１の検出
値が設定圧力になるように制御される。In this state, the ON / OFF air supply valve 40 and the flow rate adjusting valve 50 are opened. The valve opening degree of the flow rate adjusting valve 50 is detected by the valve opening degree control device 60 by the pressure sensor 61. Is controlled to reach the set pressure.
【００２４】不活性ガスボンベ３９からの不活性ガス
（この例では、Ｎ2 ガス）は給気路３５、ＯＮ／ＯＦＦ
給気弁４０を通って（例えば、７０リットル／分の流
量）、本体ケース３１内に流入し、コンテナ１０内およ
び本体ケース３１内の空気を排気路３７、流量調整弁５
０を通して追い出すが、流量調整弁５０が上記のように
絞られているので、コンテナ本体１１と本体ケース３１
が区画する密閉空間内が、前記図７の場合よりも、高く
加圧される。The inert gas (N 2 gas in this example) from the inert gas cylinder 39 is turned on / off in the air supply passage 35.
The air in the container 10 and the main body case 31 flows into the main body case 31 through the air supply valve 40 (for example, a flow rate of 70 liters / minute), and the exhaust passage 37 and the flow rate adjusting valve 5 are provided.
0, but since the flow control valve 50 is throttled as described above, the container body 11 and the body case 31
The inside of the closed space defined by is pressurized higher than in the case of FIG. 7.
【００２５】図５および図６は、ガスパージ時における
上記密閉空間内の圧力の大きさと酸素濃度の低減割合
（時間）との関係を示す線図である。FIGS. 5 and 6 are graphs showing the relationship between the magnitude of the pressure in the closed space and the oxygen concentration reduction rate (time) during gas purging.
【００２６】図２は上記密閉空間内の圧力がほぼ大気圧
に等しい場合、図５は本実施例の場合であり、上記密閉
空間内の圧力が１．０３〜１．０５気圧である。FIG. 2 shows the case where the pressure in the closed space is substantially equal to the atmospheric pressure, and FIG. 5 shows the case of the present embodiment. The pressure in the closed space is 1.03 to 1.05 atm.
【００２７】本実施例の場合、ガスパージ開始後、短時
間Ｔ１でで、残留酸素濃度が１．０ｐｐｍまで低減して
いるが、図５の場合は、時間Ｔ１が経過しても、残留酸
素濃度は１０ｐｐｍ以上である。In the case of the present embodiment, the residual oxygen concentration is reduced to 1.0 ppm in a short time T1 after the start of the gas purging, but in the case of FIG. 5, the residual oxygen concentration is decreased even after the time T1 has elapsed. Is 10 ppm or more.
【００２８】このように、本実施例では、ガスパージの
間、上記密閉空間内を大気圧よりも高い圧力に加圧する
ので、ガスパージに要する時間（ウェーハに好ましくな
い成分の濃度が規定値以下に低下するまでの時間）が大
幅に低減する。この結果、不活性ガスを長時間にわた
り、上記密閉空間内に供給する必要がないので、不活性
ガスの使用量も少なくて済む。As described above, in the present embodiment, since the inside of the closed space is pressurized to a pressure higher than the atmospheric pressure during the gas purging, the time required for the gas purging (the concentration of the component unfavorable to the wafer is reduced to the specified value or less). The time to do) is significantly reduced. As a result, it is not necessary to supply the inert gas into the closed space for a long time, so that the amount of the inert gas used can be small.
【００２９】ガスパージに要する時間（ウェーハに好ま
しくない成分の濃度が規定値以下に低下するまでの時
間）が大幅に低減するのは、内部加圧により、排気系を
含む容器内部への外部からの洩れや拡散作用による空気
の侵入を妨げる加圧シール作用が働くためであると考え
られる。The time required for the gas purging (the time until the concentration of the undesired component in the wafer falls below the specified value) is greatly reduced by the internal pressurization from the outside into the container including the exhaust system. It is considered that this is because the pressure sealing action works to prevent the invasion of air due to the leakage or diffusion action.
【００３０】本実施例では、この加圧を、複雑な加圧手
段を用いるのではなく、排気側に設けた弁５０を絞り、
上記密閉空間への給気側からの給気量に比し、排気量を
制限することにより行なうから、簡便に行なえる利点が
ある。In the present embodiment, this pressurization is performed by restricting the valve 50 provided on the exhaust side without using a complicated pressurizing means.
Since it is performed by limiting the exhaust gas amount as compared with the air supply amount from the air supply side to the closed space, there is an advantage that it can be performed easily.
【００３１】上記実施例では、加圧手段として、流量調
整弁５０を用いているが、この流量調整弁５０に代え
て、可変ＯＮ／ＯＦＦ弁を用いてもよい。この場合、配
管を含む排気系の抵抗がＯＮ／ＯＦＦ給気弁４０の配管
を含む流入系の抵抗よりも小さいものを使用する。Although the flow rate adjusting valve 50 is used as the pressurizing means in the above embodiment, a variable ON / OFF valve may be used instead of the flow rate adjusting valve 50. In this case, the resistance of the exhaust system including the pipe is smaller than the resistance of the inflow system including the pipe of the ON / OFF air supply valve 40.
【００３２】また、加圧手段としては、流量調整弁５０
に代えて、図２に示すように、逆止弁５１を用いること
ができる。この場合、上記密閉空間内の圧力が、逆止弁
５１の図示しない弁体の受圧面積と弁ばねのばね力で決
る所定の圧力に達すると、当該逆止弁５１が開弁し、簡
便に内部圧力をほぼ一定にすることができる。As the pressurizing means, a flow rate adjusting valve 50
Alternatively, a check valve 51 may be used as shown in FIG. In this case, when the pressure in the closed space reaches a predetermined pressure that is determined by the pressure receiving area of the valve body (not shown) of the check valve 51 and the spring force of the valve spring, the check valve 51 is opened, and the check valve 51 is simply opened. The internal pressure can be made almost constant.
【００３３】上記密閉空間内の圧力の調整は、図３に示
すように、主管である管路３８のコンダクタンスを可変
にする構成にしてもよい。図３において、３８ａ〜３８
ｂは分岐管であり、各々に、ＯＮ／ＯＦＦ弁３８Ｖ１〜
３８Ｖ３が設けられている。この場合も、必要に応じ、
弁３８Ｖ１〜３８Ｖ３で所望の配管長を選ぶことによ
り、排気系の所要抵抗を得る。圧力センサ６１の検出値
と設定圧力とにより、ＯＮ／ＯＦＦ弁３８Ｖ１〜３８Ｖ
３のＯＮ／ＯＦＦを制御する制御装置を設ければよい。The pressure in the closed space may be adjusted by changing the conductance of the conduit 38, which is the main pipe, as shown in FIG. In FIG. 3, 38a to 38
b is a branch pipe, and each has an ON / OFF valve 38V1
38V3 is provided. Again, if necessary,
The required resistance of the exhaust system is obtained by selecting the desired pipe length with the valves 38V1 to 38V3. ON / OFF valves 38V1 to 38V depending on the detected value of the pressure sensor 61 and the set pressure.
A control device for controlling ON / OFF of No. 3 may be provided.
【００３４】また、図４に示す如く、本体ケース３１に
複数の排気路３７Ａ〜３７Ｃを形成し、各排気路３７Ａ
〜３７Ｃと管路３８Ａ〜３８Ｃとの間に、ＯＮ／ＯＦＦ
弁３８Ｖ１〜３７Ｖ３を介装し、このＯＮ／ＯＦＦ弁３
７Ｖ１〜３７Ｖ３のＯＮ／ＯＦＦの組合わせにより、上
記密閉空間内の圧力の調整を行なうようにしてもよい。
本例では、排気路３７Ａ〜３７Ｃの径を異ならせること
により、上記密閉空間内の圧力の圧力を７段階に調整す
ることができる。Further, as shown in FIG. 4, a plurality of exhaust passages 37A to 37C are formed in the main body case 31, and each exhaust passage 37A is formed.
ON / OFF between ~ 37C and conduits 38A-38C
This ON / OFF valve 3 is equipped with valves 38V1 to 37V3.
The pressure in the closed space may be adjusted by a combination of ON / OFF of 7V1 to 37V3.
In this example, the pressure of the pressure in the closed space can be adjusted in seven stages by making the diameters of the exhaust passages 37A to 37C different.
【００３５】前記したように、パージユニットは、コン
テナ本体１１をポートプレート３１上に固定するための
自動ロック機構を備えているが、本発明例では、上記し
たように、上記密閉空間内を加圧するので、コンテナ本
体１１を傷めないで、この圧力によりコンテナ１０がポ
ートプレート３１ａから浮き上がらないよう充分大きな
ロック力を発揮する自動ロック機構を用いる必要があ
る。As described above, the purge unit is provided with the automatic lock mechanism for fixing the container body 11 on the port plate 31, but in the example of the present invention, as described above, the inside of the closed space is added. Since the pressure is applied, it is necessary to use an automatic locking mechanism that exerts a sufficiently large locking force so that the container 10 is not lifted from the port plate 31a by this pressure without damaging the container body 11.
【００３６】なお、不活性ガスの供給量が一定である場
合には、前記した圧力の自動調整は不要で、排気系の弁
の開度を制御する必要はない。When the supply amount of the inert gas is constant, the above-mentioned automatic pressure adjustment is unnecessary, and it is not necessary to control the opening degree of the exhaust system valve.
【００３７】前記したガスパージユニット３０は、ユニ
ットとして独立しているが、例えば表面処理装置の一部
を構成している場合には、コンテナ１０から取り出した
カセット２を表面処理装置の処理路へ移送し、また処理
済みのウェーハをいれたカセット２をコンテナ１０に戻
す必要から、図７に示すような構成を採る場合がある。The above-mentioned gas purging unit 30 is independent as a unit, but when it constitutes, for example, a part of the surface treatment apparatus, the cassette 2 taken out from the container 10 is transferred to the treatment path of the surface treatment apparatus. In addition, since it is necessary to return the cassette 2 containing the processed wafers to the container 10, the configuration shown in FIG. 7 may be adopted.
【００３８】すなわち、図７の場合、本体ケース３１は
表面処理装置の本体ケース１００の一部として形成す
る。本体ケース１００の鎖線で示す部分は、表面処理炉
や移載機等を収納している。本体ケース３１となる分に
は、仕切り７０を設け、この仕切り７０と、コンテナ１
０、昇降台３３で囲まれる密閉空間内でガスパージを行
なう。この仕切り７０は、本例では、筒状をなす本体部
分７０Ａとその底を塞ぐ底部分７０Ｂ部分からなり、こ
の底部分７０Ｂ部分は蛇腹で構成されており、この底部
分７０Ｂ部分を昇降台３３の昇降軸３３ａが気密に貫通
している。仕切り７０の上開口部７１Ｕはポートプレー
ト３１ａ下面のポート３２の周部に、ばね７５のばね力
により圧設し、下開口部７１Ｄは昇降台３３で閉鎖可能
になっている。７３ａ、７３ｂはガイド杆である。ばね
７５は昇降台３３の内部から仕切り７０の下部の内向き
フランジまで伸びているガスパージに際しては、昇降台
３３を若干下降させ、仕切り７０とポート３２とコンテ
ナ１０が作る密閉空間内をガスパージする。That is, in the case of FIG. 7, the main body case 31 is formed as a part of the main body case 100 of the surface treatment apparatus. A portion indicated by a chain line of the main body case 100 accommodates a surface treatment furnace, a transfer machine, and the like. A partition 70 is provided for the main body case 31, and the partition 70 and the container 1
0, gas purging is performed in a closed space surrounded by the lifting table 33. In this example, the partition 70 is composed of a main body portion 70A having a cylindrical shape and a bottom portion 70B portion that closes the bottom of the main body portion 70A. The bottom portion 70B portion is formed of a bellows. The elevating shaft 33a of the is penetrated airtightly. The upper opening 71U of the partition 70 is pressed against the peripheral portion of the port 32 on the lower surface of the port plate 31a by the spring force of the spring 75, and the lower opening 71D can be closed by the lift 33. 73a and 73b are guide rods. The spring 75 extends from the inside of the lift table 33 to the inward flange of the lower portion of the partition 70, and when the gas is purged, the lift table 33 is slightly lowered to purge the inside of the closed space formed by the partition 70, the port 32 and the container 10.
【００３９】なお、上記仕切り７０は、本体部分７０Ａ
とその底を塞ぐ底部分７０Ｂ部分からなるが、本体部分
７０Ａだけであっても、ガスパージに際して、昇降台３
３を下降して下開口部７１Ｄを閉鎖し、仕切り７０と、
コンテナ１０および昇降台３３で囲まれる密閉空間内を
作るようにすれはよい。The partition 70 is composed of a main body portion 70A.
And a bottom portion 70B that closes the bottom of the lift table 3 when only the main body portion 70A is used for gas purging.
3, the lower opening 71D is closed, and the partition 70 and
It is advisable to create an enclosed space surrounded by the container 10 and the lift 33.
【００４０】貫通している。It penetrates.
【００４１】[0041]
【発明の効果】本発明は以上説明した通り、コンテナ内
を加圧しながら、ガスパージを行なうことにより、ガス
パージに要する時間を大幅に短縮するもので、排気路側
の管路抵抗を調整するだけの手段で上記加圧を行なうか
ら、簡便な手段で、上記効果を得ることができ、パージ
ガスの消費量も従来に比し大幅に低減することができ
る。As described above, the present invention significantly shortens the time required for gas purging by performing gas purging while pressurizing the inside of the container, and it is a means for merely adjusting the line resistance on the exhaust passage side. Since the above-mentioned pressurization is performed, the above effect can be obtained by a simple means, and the consumption amount of the purge gas can be significantly reduced as compared with the conventional case.
【図１】本発明の第１の実施例を示す縦断面図である。FIG. 1 is a vertical cross-sectional view showing a first embodiment of the present invention.
【図２】本発明の第２の実施例を示す縦断面図である。FIG. 2 is a vertical cross-sectional view showing a second embodiment of the present invention.
【図３】本発明の第３の実施例を示す縦断面図である。FIG. 3 is a vertical sectional view showing a third embodiment of the present invention.
【図４】本発明の第４の実施例を示す要部の平面図であ
る。FIG. 4 is a plan view of an essential part showing a fourth embodiment of the present invention.
【図５】ガスパージ時における残留酸素濃度の低減割合
を示す線図である。FIG. 5 is a diagram showing a reduction ratio of residual oxygen concentration during gas purging.
【図６】ガスパージ時における残留酸素濃度の低減割合
を示す線図である。FIG. 6 is a diagram showing a reduction ratio of residual oxygen concentration during gas purging.
【図７】本発明の第５の実施例を示す要部の平面図であ
る。FIG. 7 is a plan view of an essential part showing a fifth embodiment of the present invention.
【図８】従来の可搬式密閉コンテナのガスパージ機構を
説明するための図である。FIG. 8 is a diagram for explaining a gas purging mechanism of a conventional portable closed container.
【図９】従来の可搬式密閉コンテナの施錠／解錠機構を
説明するための図である。FIG. 9 is a view for explaining a conventional locking / unlocking mechanism of a portable airtight container.
１０ 可搬式密閉コンテナ １０ 可搬式密閉コンテナのコンテナ本体 ２０ 可搬式密閉コンテナの底蓋 ３０ ガスパージユニット ３１ ガスパージユニットの本体ケース ３５ 給気路 ３６ 管路 ３７ 排気路 ３８ 管路 ３７Ａ〜３７Ｃ 排気路 ３７Ｖ１〜３７Ｖ３ ＯＮ／ＯＦＦ弁 ３８ａ〜３８ｂ 分岐管４０ ３８Ｖ１〜３８Ｖ３ ＯＮ／ＯＦＦ弁 ３９ 不活性ガスボンベ ４０ 給気弁 ５０ 流量調整弁 ５１ 逆止弁 ６０ 制御装置 ６１ 圧力センサ 10 Portable Closed Container 10 Container Main Body of Portable Closed Container 20 Bottom Lid of Portable Closed Container 30 Gas Purge Unit 31 Main Body Case of Gas Purge Unit 35 Air Supply Line 36 Pipeline 37 Exhaust Line 38 Pipeline 37A to 37C Exhaust Line 37V1 37V3 ON / OFF valve 38a-38b Branch pipe 40 38V1-38V3 ON / OFF valve 39 Inert gas cylinder 40 Air supply valve 50 Flow rate adjustment valve 51 Check valve 60 Control device 61 Pressure sensor
───────────────────────────────────────────────────── フロントページの続き (72)発明者 森田 日也 三重県伊勢市竹ケ鼻町100番地 神鋼電機 株式会社伊勢製作所内 (72)発明者 及部 博之 三重県伊勢市竹ケ鼻町100番地 神鋼電機 株式会社伊勢製作所内 (72)発明者 河野 等 三重県伊勢市竹ケ鼻町100番地 神鋼電機 株式会社伊勢製作所内 (72)発明者 奥野 敦 三重県伊勢市竹ケ鼻町100番地 神鋼電機 株式会社伊勢製作所内 (72)発明者 中村 昭生 三重県伊勢市竹ケ鼻町100番地 神鋼電機 株式会社伊勢製作所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hiya Morita 100 Takegahana-cho, Ise-shi, Mie Shinko Electric Co., Ltd. (72) Hiroyuki Oibe 100 Taketakena-cho, Ise-shi, Mie Shinko Electric Co., Ltd. In Ise Works (72) Inventor Kono et al. 100 Takegahana-cho, Ise-shi, Mie Shinko Electric Co., Ltd.In Ise Works (72) Inventor Atsushi Okuno 100, Takegahana-cho, Ise-shi, Mie Shinko Electric Co., Ltd.Ise Works (72) Inventor Akio Nakamura 100 Taketakehanacho, Ise City, Mie Prefecture Shinko Electric Co., Ltd.
Claims (8)
密閉空間内部を前記不活性ガス源と連絡するガス供給管
路、当該密閉空間内部を外部と連絡する排気管路、ガス
供給管路に設けられた給気弁、排気管路に設けられた排
気弁を備え、これら給気弁と排気弁を開閉して上記密閉
空間内部をガスパージするガスパージ装置において、パ
ージ時の上記密閉空間内圧が増加する向きに上記排気管
路の排気抵抗を調整する加圧手段を有することを特徴と
するガスパージ装置。1. An inert gas source having a constant pressure, a closed space, a gas supply line connecting the inside of the closed space to the inert gas source, an exhaust line connecting the inside of the closed space to the outside, and a gas supply pipe. In the gas purging device, which is provided with an air supply valve provided in the passage and an exhaust valve provided in the exhaust pipe, opens and closes the air supply valve and the exhaust valve to purge the inside of the closed space with gas, the internal pressure of the closed space at the time of purging A gas purging device having a pressurizing means for adjusting the exhaust resistance of the exhaust pipe line in a direction in which
の函体に載置される蓋付の可搬式密閉容器と上記函体が
つくる空間であって、当該函体は、上記蓋の開時に前記
密閉容器の開口と連通するポートを設けた台部を有する
とともに当該ポートを気密に閉鎖可能な昇降台を含む上
記蓋の蓋開閉機構を内蔵し、給気口および排気口を備え
ることを特徴とする請求項１記載のガスパージ装置。2. The closed space is a space formed by a portable closed container with a lid placed on a hermetically sealed box during gas purging and the box, and the box is opened when the lid is opened. A lid opening / closing mechanism for the lid, which has a base portion provided with a port communicating with the opening of the closed container and includes an elevator that can airtightly close the port, is provided with an air supply port and an exhaust port. The gas purging device according to claim 1.
の函体に載置される蓋付の可搬式密閉容器と上記函体お
よび当該函体内に設けられた仕切りがつくる空間であっ
て、当該函体は、上記蓋の開時に前記密閉容器の開口と
連通するポートを設けた台部を有するとともに当該ポー
トを気密に閉鎖可能な昇降台を含む上記蓋の蓋開閉機構
を内蔵し、上記仕切りは、上開口部が上記台部下面のポ
ート周部に離間可能に圧接する有底筒状もしくは下開口
部が昇降台で閉鎖可能な筒状をなすことを特徴とする請
求項１記載のガスパージ装置。3. The closed space is a space formed by a portable closed container with a lid placed on a hermetically sealed box for gas purging, the box and a partition provided in the box. The body has a lid opening / closing mechanism of the lid including a platform portion having a port that communicates with the opening of the closed container when the lid is opened, and a lid opening / closing mechanism including an elevating platform that can hermetically close the port. 2. The gas purging apparatus according to claim 1, wherein the upper opening has a bottomed cylindrical shape that is press-contacted with a port peripheral portion on the lower surface of the base so as to be separable from the bottom, or the lower opening has a cylindrical shape that can be closed by an elevating table. .
路に設けられた開度可変の弁であることを特徴とする請
求項１記載のガスパージ装置。4. The gas purging apparatus according to claim 1, wherein the pressurizing means for adjusting the exhaust resistance is a valve having a variable opening degree provided in the exhaust pipe line.
であることを特徴とする請求項１記載のガスパージ装
置。5. The gas purging apparatus according to claim 1, wherein the pressurizing means for adjusting the exhaust resistance is a check valve.
分岐管路を備える排気管路と当該分岐管路の各々に介装
された弁であることを特徴とする請求項１記載のガスパ
ージ装置。6. The pressurizing means for adjusting the exhaust resistance is an exhaust pipe having a plurality of branch pipes and a valve interposed in each of the branch pipes. Gas purging device.
ら分岐する複数の分岐管路を備える排気管路と当該分岐
管路の各々に介装された弁であることを特徴とする請求
項１記載のガスパージ装置。7. The pressurizing means for adjusting the exhaust resistance is an exhaust pipe having a plurality of branch pipes branched from a main pipe and a valve interposed in each of the branch pipes. Item 1. The gas purging device according to item 1.
抗自動制御機能を備えることを特徴とする請求項４〜７
記載のガスパージ装置。8. The pressurizing means for adjusting exhaust resistance has an exhaust resistance automatic control function.
The gas purging device described.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22903793A JP3331693B2 (en) | 1993-09-14 | 1993-09-14 | Gas purge device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22903793A JP3331693B2 (en) | 1993-09-14 | 1993-09-14 | Gas purge device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0786370A true JPH0786370A (en) | 1995-03-31 |
| JP3331693B2 JP3331693B2 (en) | 2002-10-07 |
Family
ID=16885760
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22903793A Expired - Fee Related JP3331693B2 (en) | 1993-09-14 | 1993-09-14 | Gas purge device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3331693B2 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006074033A (en) * | 2004-08-30 | 2006-03-16 | Alcatel | Vacuum interface between mini-environment pod and apparatus |
| US7360346B2 (en) | 2003-09-25 | 2008-04-22 | Tdk Corporation | Purging system and purging method for the interior of a portable type hermetically sealed container |
| JP2009129529A (en) * | 2007-11-28 | 2009-06-11 | Hitachi Global Storage Technologies Netherlands Bv | Method of manufacturing magnetic disk apparatus |
| JP2010087171A (en) * | 2008-09-30 | 2010-04-15 | Jss Co Ltd | Continuous low oxygen-concentration atmosphere treatment chamber |
| JP2014112631A (en) * | 2012-10-31 | 2014-06-19 | Tdk Corp | Load port unit and EFEM system |
| CN107004620A (en) * | 2014-12-01 | 2017-08-01 | 瓦里安半导体设备公司 | The system and method that load lock gate valve is opened under pressure needed for after exhaust |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4027837B2 (en) | 2003-04-28 | 2007-12-26 | Ｔｄｋ株式会社 | Purge apparatus and purge method |
| JP4012190B2 (en) | 2004-10-26 | 2007-11-21 | Ｔｄｋ株式会社 | Closed container lid opening and closing system and opening and closing method |
-
1993
- 1993-09-14 JP JP22903793A patent/JP3331693B2/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7360346B2 (en) | 2003-09-25 | 2008-04-22 | Tdk Corporation | Purging system and purging method for the interior of a portable type hermetically sealed container |
| JP2006074033A (en) * | 2004-08-30 | 2006-03-16 | Alcatel | Vacuum interface between mini-environment pod and apparatus |
| JP2009129529A (en) * | 2007-11-28 | 2009-06-11 | Hitachi Global Storage Technologies Netherlands Bv | Method of manufacturing magnetic disk apparatus |
| JP2010087171A (en) * | 2008-09-30 | 2010-04-15 | Jss Co Ltd | Continuous low oxygen-concentration atmosphere treatment chamber |
| JP2014112631A (en) * | 2012-10-31 | 2014-06-19 | Tdk Corp | Load port unit and EFEM system |
| CN107004620A (en) * | 2014-12-01 | 2017-08-01 | 瓦里安半导体设备公司 | The system and method that load lock gate valve is opened under pressure needed for after exhaust |
| CN107004620B (en) * | 2014-12-01 | 2020-06-05 | 瓦里安半导体设备公司 | Method of venting a load lock chamber, load lock system, and computer readable storage medium |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3331693B2 (en) | 2002-10-07 |
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