JPH1056050A - Clean transfer method, clean box, and clean transfer device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To realize a clean transfer method capable of transferring a work not only in a vacuum sealed state but also in the sealed state of the work in a clean gas such as nitrogen without using a mechanical seal where a spring or the like is used. SOLUTION: A clean box 11 which is equipped with a box main body 12 with an closable opening, a shutter/lid 13 that closes the opening of the box main body 12, and a lid chuck 14 that is sucked to both the box main body 12 and the lid 13 by vacuum suction to keep the shutter/lid 13 closed and a clean device 30 equipped with an opening which can be freely opened or closed by a shutter 45 are hermetically joined together keeping the lid 13 and the shutter 45 closed, wherein a hermetic space where both the shutter 45 and the lid 13 front and the lid chuck 14 is contained inside is formed, the hermetic space is exhausted, then the lid chuck 14 is unlocked, and the lid 13 is opened.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is capable of transferring conveyed objects required for processing and assembling semiconductors, electronic component-related products, optical disks, etc. in a clean state free of contaminants, and particularly for cleaning nitrogen and the like. The present invention relates to a clean transfer method, a clean box, and a clean transfer device that can be transferred in a state sealed with gas.

[0002]

2. Description of the Related Art Japanese Patent Application Laid-Open No. Hei 7-235580 has been disclosed by the present applicant.
In Japanese Patent Application Laid-Open No. H11-260, a clean transfer method for transferring a transferred object by vacuum sealing it in a vacuum clean box has been proposed. FIG. 6 shows an example of a vacuum clean box used in this case.

A vacuum clean box 1 shown in FIG. 6 comprises a box main body 2 and a lid 3 also serving as a shutter for hermetic sealing, and a pressure difference between the inside and outside of the box (the inside of the box is vacuum, the outside is atmospheric pressure). As a result, the lid 3 is pressed to maintain the closed state. Therefore, when a clean gas such as nitrogen is to be transferred in a state of being sealed in a vacuum clean box, there is no pressure difference between the inside and the outside of the box, so that the closed state of the lid 3 cannot be maintained as it is.

At present, a mechanically-sealed transfer box (for example, a so-called “Smift box” (trade name)) having a nitrogen purge specification for local cleaning is used in a semiconductor manufacturing site. It is used for the purpose of preventing adhesion of fine particles (particles) such as particles to a transferred object, (2) preventing oxidation of the transferred object, and (3) preventing organic substance contamination.

[0005]

However, these transport boxes require (1) a complicated mechanism because of the mechanical seal, so that sufficient reliability cannot be guaranteed. (2)
Since a mechanical holding force such as a spring is used, there remains a problem that a practically sufficient holding force cannot be obtained.

[0006] A first object of the present invention is to solve the above problems,
By adding a lid chuck that can hold the lid in an airtight seal state to the clean box using the force of vacuum suction (atmospheric pressure), the mechanical seal using a spring or the like is unnecessary, and vacuum sealing is performed. It is an object of the present invention to provide a clean transfer method and apparatus capable of transferring not only a state but also a state in which an object to be transferred is sealed with a clean gas such as nitrogen.

A second object of the present invention is to provide a mechanical seal using a conventional spring or the like, which can be transported not only in a vacuum-sealed state but also in a state in which a conveyed object is sealed with a clean gas such as nitrogen. An object of the present invention is to provide a clean box having a simple structure that is unnecessary.

[0008] Other objects and novel features of the present invention will be clarified in embodiments described later.

[0009]

In order to achieve the above object, a clean transfer method according to the present invention comprises a box body having an opening / closing opening, a shutter / lid cover for hermetically closing the opening / closing opening, and the box body. And a lid chuck that holds the lid in a closed state by vacuum suction on the lid,
A clean box without exhaust means and transfer means,
A clean device having an opening and closing opening that can be opened and closed with a shutter is hermetically coupled with the lid and the shutter closed so that the lid and the shutter face and the lid chuck is included inside. A closed space is formed, the closed space is evacuated, the lid chuck is removed, and the lid is opened.

In the above-described clean transfer method, after opening the lid of the clean box, the closed space surrounded by the clean box and the shutter is set to a clean atmosphere similar to that in the clean device, and then the shutter is opened. The shutter and the lid may be drawn into the inside of the clean device.

The clean box according to the present invention comprises a box body having an opening and closing opening, a shutter and a lid for hermetically closing the opening and closing, and closing the lid by vacuum suction on the box body and the lid. A lid chuck for holding the state is provided, and no exhaust means and no transfer means are provided.

According to the present invention, there is provided a clean transfer apparatus comprising: a box body having an opening and closing port; a shutter / lid body for hermetically closing the opening / closing port; and a vacuum suction unit for closing the lid body with the box body and the lid body. A clean box having a lid chuck for holding the lid in a stationary state, and having no exhaust means and transfer means, a lid receiving / elevating platform for receiving the lid, a chuck receiving / elevating platform for receiving the lid chuck, A shutter and a clean device having an opening and closing opening that can be opened and closed by the shutter, wherein the clean device has the lid and the shutter facing each other and the lid chuck facing inward when the clean box is connected. A vacuum exhaust means for evacuating the enclosed space included therein is provided.

[0013]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the clean transfer method, clean box and clean transfer device according to the present invention will be described below with reference to the drawings.

FIGS. 1 to 5 show the structure of a clean box and a clean device according to an embodiment of the present invention. FIGS. 1 to 5 illustrate the operation of sequentially transferring objects (such as semiconductor wafers). is there.

In these figures, a clean box 1
Reference numeral 1 denotes a box main body 12 having an opening and closing opening, a shutter / lid 13 for closing the opening / closing in an airtight manner, and an annular holding the lid 13 in a closed state by vacuum-sucking the box main body 12 and the lid 13. And a lid chuck 14 having an L-shaped cross section, and has a hermeticity that can maintain a vacuum state or a clean state when the lid 13 is closed, and has no vacuum exhaust means and transfer means. In order to secure airtightness, an annular groove 13a is formed on the upper surface of the lid 13 which abuts on the flange portion 12a of the box body 12, and an O-ring 13b for airtight sealing (airtight sealing) is formed in the annular groove 13a. Are arranged. Lid chuck 1 abutting on the flange portion 12a
In order to ensure airtightness, the annular groove 14
a is formed, and an O-ring 14b for hermetic sealing is provided in the annular groove 14a. Similarly, an annular groove 14c is formed in the annular inner bottom surface of the lid chuck 14 that is in contact with the lower surface of the lid 13, and an O-ring 14d for hermetic sealing is provided in the annular groove 14c. I have.

A holder 15 for supporting an object 20 such as a semiconductor wafer is mounted on the upper surface of the lid 13. The holder 15 has a structure in which, for example, a large number of transported objects 20 can be stored in a horizontal state at equal intervals.
A positioning pin 16 is integrally fixed to the lower surface of the lid 13.

A vacuum changer section 40 of a clean apparatus 30 for transferring the transported objects in various processing apparatuses or processes in which the clean box 11 can be combined (however, the clean apparatus 30 has a mechanism other than the vacuum changer section 40). The airtight container 43 in which a connection block 42 having an opening / closing opening 41 is integrated at the upper part;
An elevating shutter 45 that contacts the lower surface of the connecting block 42 to close the opening / closing opening 41, a lid receiving / elevating base 46 for receiving and supporting the shutter / lid 13 on the clean box 11 side from below, and a lid chuck 14. And a chuck receiving and lowering table 47 for receiving and supporting the sheet from below. The shutter 45 is driven up and down by a center lifting shaft 48, and the lid receiving and lifting base 46 is driven to be raised and lowered relative to the shutter 45 by a lifting and lowering part 49. Similarly, the chuck receiving and lifting base 47 is also a cylinder around the lifting and lowering part 49. The vertical raising and lowering section 50 is driven to move up and down relatively to the shutter 45. An annular groove 4 is provided on the surface of the shutter 45 facing the connection block 42.
5a are formed, and an O-ring 45b for hermetic sealing is provided here.
Are arranged. In addition, on the upper surface of the lid receiving / lowering platform 46, a positioning concave portion 51 for fitting with the positioning pin 16 on the lower surface of the shutter / lid 13 is formed.

The thickness of the connecting block 42 is set to be sufficiently larger than the sum of the thicknesses of the shutter / lid 13 and the lid receiving / lowering platform 46.

The joint between the clean box 11 and the clean device 30 has a double hermetic seal structure (hermetic seal structure), and a joint surface of the vacuum changer section 40 which is in contact with the clean box 11, ie, an airtight container. 43
Airtight seal P is provided on the upper surface of the connecting block
1, P2 are provided. Specifically, double annular grooves 61 and 62 are formed on the upper surface of the connecting block 42 so as to surround the opening / closing opening 41, and the O-ring 6 for hermetic sealing is formed in these grooves.
3 and 64 are fitted, the hermetic seal P1 is formed between the outer annular groove 61 and the O-ring 63, and the inner annular groove 62 and the O-ring 63 are sealed.
The hermetic seal P2 is constituted by the ring 64, respectively. Further, the connecting block 4 between the annular grooves 61 and 62
An annular groove 65 for evacuating the hermetic seals P1 and P2 is formed on the upper surface of the second block 2. The annular groove 65 communicates with a vacuum exhaust path 66 formed in the connection block 42. The evacuation path 66 is connected to the clean device 30.
Is connected via a vacuum exhaust opening / closing valve 71 to vacuum exhaust means such as a vacuum pump provided outside the airtight container 43. However, when necessary, the leak opening / closing valve 72 connected to the vacuum evacuation path 66 is opened to release the vacuum state, and the internal clean gas (nitrogen or the like) is introduced from the clean device 30 so that the airtight seals P1 and P2 are closed. Can be returned to atmospheric pressure.

When the clean box 11 is connected to the vacuum changer portion 40 of the clean device 30 and combined, the inner surface of the connecting block 42 (the inner surface of the opening / closing opening 41), the shutter lid 13 and the flange portion 12a are formed. Area S surrounded by the lower surface of the shutter 45 and the upper surface of the shutter 45
Is a hermetically closed space, but a vacuum evacuation path 80 penetrating in the lateral direction is formed in the connecting block 42 so that the intermediate area S can be evacuated. The vacuum evacuation path 80 is provided when the clean device 30
The vacuum pump 3 is connected to a vacuum pumping means such as a vacuum pump provided outside the vacuum pump 3 via a vacuum pumping opening / closing valve 81. However, when necessary, the open / close valve 82 for leak connected to the vacuum exhaust path 80 is opened to release the vacuum state and the clean device 30 is opened.
A clean gas (nitrogen or the like) inside can be introduced from, and returned to atmospheric pressure.

The clean device 30 includes an airtight container 43.
There is provided a transfer means for transferring the transported object 20 drawn into the inside to various processing portions.

In this embodiment, as shown in FIG.
In the state before the clean box 11 is combined, the inside of the clean box 11 is previously brought to a vacuum state by the vacuum changer section 40 of another clean device 30 (for example, the degree of vacuum is preferably 0.1 Torr or less in order to greatly reduce dust). After that, a desired clean gas such as nitrogen is sealed in, the inside is closed with the shutter / lid 13, and the lid 13 is held in a sealed state by the vacuum suction force of the lid chuck 14. That is, in the vacuum changer section 40, the inner space T of the lid chuck 14 (the lid chuck 14
The inner surface of the housing, the space surrounded by the flange portion 12a and the outer surface of the lid 13) are evacuated, and the lid chuck 14 is in close contact with the box body 12 and the lid 13, and the clean box 11 is taken out to the atmosphere. After that, the lid chuck 14 can securely hold the lid 13 in a closed state by the pressure difference between the inside and outside of the lid chuck 14 (the pressure difference between the high vacuum in the inner space T and the outside atmospheric pressure). No mechanical seal using such as is required.

As described above, since the lid chuck 14 is added to the clean box 11, the lid 13 is moved by the lid chuck 14 so that the flange portion 1 on the opening / closing side of the box body 12 is opened.
2a, the opening / closing opening can be securely hermetically sealed, the shutter / lid 13 does not move, the clean gas is sealed therein, and the clean box 11 is accommodated in a state in which the transported object 20 such as a semiconductor wafer is accommodated. Can be transported.

Note that, as shown in FIG.
1 is not mounted, the opening / closing opening 41 of the vacuum changer unit 40 of the clean device 30 is
5, the shutter outer surface is exposed to the normal factory atmosphere.

The clean box 11 and the clean device 30
The connection of the box body 12 with the shutter / cover 13 of the clean box 11 facing downward, as shown in FIG. 2, on the connection block 42 constituting the opening edge of the opening / closing opening 41 of the vacuum changer section 40. This is performed by placing the flange portion 12a in abutment. At this time, the positioning pin 16 on the side of the shutter and lid 13 is connected to the lid receiving and lowering platform 4.
The positioning recesses 51 on the sixth side are fitted to each other to perform mutual positioning. Further, since the elevating shaft 48 is in the up state, the shutter 45 on the side of the vacuum changer unit 40 abuts on the inner surface (lower surface) of the connection block 42 constituting the opening edge of the opening / closing opening 41 to hermetically close the opening / closing opening 41. Sealed.

As described above, as a result of connecting the clean box 11 to the vacuum changer portion 40 of the clean device 30, the inner surface of the connecting block 42 (the inner surface of the opening / closing opening 41), the shutter lid 13 and the flange portion 12a are formed. Intermediate area S surrounded by the lower surface and the upper surface of shutter 45
Is an airtight closed space. In other words, the shutter / lid 13 and the shutter 45 face the intermediate area S, which is a closed space, and the lid chuck 14 is included inside the intermediate area S. Since the intermediate area S is initially at atmospheric pressure, it is evacuated by the vacuum exhaust means on the clean device 30 side through the evacuation path 80 and the evacuation opening / closing valve 81 (for example, a degree of vacuum of 0.1 Torr or less). At this time, dust on the lid receiving and lowering platform 46, the chuck receiving and lowering platform 47, the upper surface of the shutter 45, and the like that have been exposed to the normal factory atmosphere in FIG.

After the intermediate area S is evacuated (actually, since the lid chuck 14 is vacuum-adsorbed to the flange portion 12a and the shutter / lid 13), only a portion of the intermediate area S is evacuated. Since there is no pressure difference between the inside and outside of the lid chuck 14, the holding of the lid chuck 14 is released, and the lid is moved with the lowering operation of the chuck receiving / lowering table 47 as shown in FIG. The body chuck 14 descends by its own weight. In the state of FIG. 3,
The shutter / lid 13 is still supported at the raised position by the lid receiving / lowering platform 46 and does not descend.

In the next step, the internal clean gas (nitrogen or the like) is introduced into the intermediate area S and the clean box 11 from the clean device 30. At an earlier timing (from immediately after the connection of the clean box 11 to the intermediate area). The vacuum between the hermetic seals P1 and P2 may be evacuated through the annular groove 65, the vacuum exhaust path 66, and the vacuum exhaust opening / closing valve 71.

While the space between the hermetic seals P1 and P2 is evacuated and the flange portion 12a of the box body 12 is vacuum-adsorbed on the upper surface of the connecting block 42 on the clean device 30, the clean gas (from the clean device 30) is removed. Nitrogen or the like) to open the on-off valve 82
0 to the intermediate area S (leakage), and the lid receiving / lowering platform 46 is lowered by the lifting / lowering unit 49 as shown in FIG. 4 in a state where the pressure difference between the inside and outside of the shutter 13 is substantially eliminated. Open 13. However, the shutter 45 still maintains the closed state. When the lid 13 is opened, the intermediate area S communicates with the internal space of the clean box 11, and the internal space of the clean box 11 is also replaced with the clean gas from the clean device 30.

As described above, after the intermediate area S and the inside of the clean box 11 are replaced by the clean gas (nitrogen or the like) from the clean device 30 (at this time, the gas on the upper and lower surfaces of the shutter 45 is the same, and the pressure difference is FIG. 5 shows that the elevating shaft 48 is largely retracted (lowered).
As described above, the shutter 45 interlocked with the elevating shaft 48 is widely opened to communicate (continuously) the vacuum changer section 40, that is, the space in the clean device 30 and the space in the clean box 11. At this time, the lid receiving elevating table 46 and the chuck receiving elevating table 47 are also mounted so as to be moved up and down relative to the shutter 45 by the elevating units 49 and 50, respectively. , Because of the weight of the shutter / lid 13 and the weight of the holder 15 and the transported object 20 held by the holder 15,
The shutter and lid 13 is pulled into the clean device 30 together with the shutter and lid 13 placed on the lid receiving and lifting platform 46. Similarly, the lid chuck 14 is also attached to the chuck receiving / lowering table 47.
It is drawn into the clean device 30 while being placed on the top. In this state, necessary processing (for example, processing in a clean gas at atmospheric pressure, inspection, and the like) is performed on the transferred object 20 held by the holder 15.

The evacuation between the hermetic seals P1 and P2 needs to be continued at least until a stable state is established after the clean gas is introduced into the intermediate area S and the clean box 11 after the clean gas is introduced. These hermetic seals P1, P
By performing the vacuum evacuation between the two, even if the inside of the clean box 11 becomes the atmospheric pressure, the flange portion 12a of the clean box 11 is pressed against the upper surface of the connection block 42, and the clean box 11 Leakage of non-clean air from the outside to the inside does not occur, and it is possible to avoid a situation in which fine particles of dust enter and float in the clean box, which is generated when only a single hermetic seal is used.

On the contrary, the transferred object 20 after the processing is
5, the airtight seal P is previously set in the state of FIG.
The clean box side flange portion 12a is vacuum-adsorbed on the upper surface of the connection block 42 by performing vacuum evacuation between 1 and P2, and the elevating shaft 48 is raised from the state of FIG. Closed (however, the shutter and lid 13 is opened as shown in FIG. 4). In this state shown in FIG. 4, the intermediate area S and the inside of the clean box 11 are evacuated through the evacuation path 80 and the evacuation opening / closing valve 81 (for example, the vacuum degree is set to 0.degree.
1 Torr or less).

Thereafter, a clean gas (nitrogen or the like) to be sealed in the clean box 11 is introduced (leaked) into the intermediate area S and the clean box 11 through the leak opening / closing valve 82 and the vacuum exhaust path 80, and furthermore, as shown in FIG. As described above, the lid receiving / elevating base 46 is raised by the elevating unit 49 with respect to the shutter 45, and the shutter / cumulative lid 13 is moved to the box body 12
To the side flange portion 12a.

When the shutter / lid 13 is closed as shown in FIG. 3, the intermediate area S including the lid chuck 14 separated from the clean box 11 is evacuated to the evacuation path 80 and the evacuation opening / closing valve. 2, the chuck receiving elevating table 47 is raised by the elevating unit 50 with respect to the shutter 45 as shown in FIG. 2, and the lid chuck 14 is moved to the flange 12a on the box body 12 side and the outer edge of the lower surface of the lid 13. Press against the part.

As shown in FIG. 2, while maintaining the state in which the lid chuck 14 is pressed against the clean box 11, the inside of the intermediate area S is leaked to the atmospheric pressure through the leak opening / closing valve 82 and the airtight seals P1, P2 are leaked. The evacuation is stopped, and the gas leaks to the atmospheric pressure through the leak on-off valve 72. Thereafter, the box body 12 and the shutter / lid 13 are used.
1 is detached from the clean device 30 as shown in FIG. 1 as a clean box 11 in which the closed state of the lid 13 is held by the lid chuck 14 while the conveyed object 20 is accommodated therein. Can be transported to any position. At this time, since a clean gas (usually the same pressure as the atmospheric pressure) is sealed inside the clean box 11,
Although there is no pressure difference between the inside and outside of the cover 13 serving as the shutter, the inside and outside pressure difference (when the inside space T is a vacuum) is applied to the cover chuck 14 which is annular and has an L-shaped cross section and surrounds and holds the outer edge of the cover 13. Since the outside atmospheric pressure is applied, the lid chuck 14 is vacuum-sucked to the box body side flange portion 12a and the lower surface of the lid 13, so that the lid 13 is securely sealed in a closed state.

According to this embodiment, the following effects can be obtained.

(1) The clean box 11 does not have an exhaust means and a transfer means, and further has a box body 12 having an opening and closing opening, a shutter / lid 13 for hermetically closing the opening and closing opening, a box body 12 and a lid. A simple mechanism having only a lid chuck 14 that holds the lid 13 in a closed state by vacuum suction on the body 13 may be used. In addition, since a mechanical seal using a spring or the like is not used, defects associated with the use of the mechanical seal can be eliminated, and the problems of the related art can be completely solved.

(2) Since the inside of the clean box 11 is evacuated to vacuum and filled with a clean gas such as nitrogen, purging nitrogen and the like can be minimized. In the prior art, the replacement is performed in the atmosphere, and the nitrogen for purging is wasted.

(3) The clean box 11 can be used safely even when nitrogen purge is performed. That is, unnecessary nitrogen is not diffused to the outside, and problems such as oxygen deficiency do not occur.

(4) The coupling surface of the vacuum changer section 40 of the cleaning device 30 where the clean box 11 is disposed has a double hermetic seal structure, and hermetic seals P1 and P2
Is evacuated through the annular groove 65 and the evacuation path 66 so that the flange 12
a can be held down (vacuum adsorbed) on the upper surface of the connecting block 42 to prevent outside air from entering when the shutter / cover 13 of the clean box 11 and the shutter 45 of the apparatus are opened and closed. The floating of dust particles accompanying the intrusion can be reliably prevented. Also, since there is no need to mechanically lock the clean box side flange portion 12a to the apparatus side connection block 42, the clean box 1
1 is easy to automate.

In the above embodiment, the case where the inside of the clean box 11 is sealed with a clean gas such as nitrogen (usually at the same pressure as the atmospheric pressure) has been described.
1 can also be used when the inside is vacuum-sealed. In this case, the step of sealing the clean gas such as nitrogen after evacuating the inside of the clean box 11 is omitted, and the shutter is kept in a vacuum state in the clean box 11. What is necessary is just to close the dual-purpose lid 13.

In the above embodiment, the joint between the clean box 11 and the clean device 30 is a double hermetic seal P1, P2. However, a double or more hermetic seal is provided, and a vacuum is applied between the seals. You may make it exhaust.

As the clean gas sealed in the clean box 11, besides nitrogen, clean air from which suspended solid particles have been sufficiently removed, other inert gas, and the like can be used according to the intended use.

Although the positioning pin 16 is provided on the lid 13 to position the lid 13 and the lid receiving and lowering table 46, the positioning of the lid 13 and the lid receiving and lowering table 46 by other positioning means. May be performed.

Although the embodiments of the present invention have been described above, it is obvious to those skilled in the art that the present invention is not limited to the embodiments and that various modifications and changes can be made within the scope of the claims. There will be.

[0046]

As described above, according to the present invention,
By adding a lid chuck that can hold the lid of the clean box in an airtight seal state using the force of vacuum suction (atmospheric pressure) to the clean box, the mechanical seal using a conventional spring etc. becomes unnecessary. The transfer can be performed using the clean box not only in a vacuum sealed state but also in a state where the conveyed object is sealed with a clean gas such as nitrogen. As a result, the mechanism of the clean box can be simplified, and a mechanical chuck release operation is not required for opening and closing the clean box, and it is easy to automate the attaching and detaching operation to the clean device. Further, it is possible to safely inject a clean gas such as nitrogen into the clean box by using a clean device.

[Brief description of the drawings]

FIG. 1 is a front sectional view showing a state where a clean box is separated from a clean device according to an embodiment of the present invention.

FIG. 2 is a front sectional view showing a state where the clean box is connected to a clean device.

FIG. 3 is a front sectional view showing a state in which a lid chuck on the clean box side is removed after the clean box is connected to the clean device.

FIG. 4 is a front sectional view showing a state in which a shutter / lid on the clean box side is opened.

FIG. 5 is a front sectional view showing a state in which the shutter on the clean device side is opened, and a shutter / lid and an object placed thereon are drawn into the clean device.

FIG. 6 is a front sectional view showing a conventional clean box.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 11 Clean box 12 Box main body 12a Flange part 13 Shutter lid 13b, 14b, 14d, 45b, 63, 64 O-ring 14 Lid chuck 15 Holder 16 Positioning pin 20 Conveyed object 30 Clean device 40 Vacuum changer part 41 Opening / closing opening 42 Connection block 43 Airtight container 45 Elevating shutter 46 Lid receiving elevating table 47 Chuck receiving elevating table 65 Annular groove 66, 80 Vacuum exhaust path 71, 81 Open / close valve for vacuum exhaust 72, 82 Open / close valve for leak P1, P2 Hermetic seal S middle area

 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Toshihiko Miyajima 1-13-1 Nihonbashi, Chuo-ku, Tokyo Inside TDK Corporation

Claims (4)

[Claims] 1. A box body having an opening / closing opening, a shutter / lid body for hermetically closing the opening / closing opening, and a lid for holding the lid body in a closed state by vacuum suction to the box body and the lid body. A clean box having a body chuck and not having an exhaust unit and a transfer unit, and a clean device having an opening and closing opening which can be opened and closed by a shutter, are hermetically coupled with the lid and the shutter closed. Forming a sealed space in which the lid and the shutter face and the lid chuck is included therein, evacuating the sealed space, removing the lid chuck, and opening the lid. Clean transport method. 2. After opening the lid of the clean box, the interior of the enclosed space surrounded by the clean box and the shutter is set to a clean atmosphere similar to that in the clean device, and then the shutter is opened to open the shutter and The clean transfer method according to claim 1, wherein the lid is drawn into the clean device. 3. A box body having an opening / closing port, a shutter / lid body for hermetically closing the opening / closing port, and a lid for holding the lid body in a closed state by vacuum suction to the box body and the lid body. A clean box comprising a body chuck and having no exhaust means and no transfer means. 4. A box body having an opening / closing port, a shutter / lid body for hermetically closing the opening / closing port, and a lid for holding the lid body in a closed state by vacuum suction on the box body and the lid body. A clean box having a body chuck and not having an exhaust unit and a transfer unit, a lid receiving / elevating platform for receiving the lid, a chuck receiving / elevating platform for receiving the lid chuck, an elevating shutter, and the shutter. A clean device having an openable and closable opening, wherein the clean device has a closed space in which the lid and the shutter face and the lid chuck is included inside in a state where the clean box is connected. A clean transfer device comprising a vacuum exhaust means for exhausting air.