JPH0647015Y2 - 育成結晶冷却用具 - Google Patents
育成結晶冷却用具Info
- Publication number
- JPH0647015Y2 JPH0647015Y2 JP1990100581U JP10058190U JPH0647015Y2 JP H0647015 Y2 JPH0647015 Y2 JP H0647015Y2 JP 1990100581 U JP1990100581 U JP 1990100581U JP 10058190 U JP10058190 U JP 10058190U JP H0647015 Y2 JPH0647015 Y2 JP H0647015Y2
- Authority
- JP
- Japan
- Prior art keywords
- shaft
- crystal
- pulling
- pull
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000013078 crystal Substances 0.000 title claims description 41
- 238000001816 cooling Methods 0.000 title claims description 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 6
- 239000007789 gas Substances 0.000 description 12
- 239000000155 melt Substances 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000017525 heat dissipation Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 206010021143 Hypoxia Diseases 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990100581U JPH0647015Y2 (ja) | 1990-09-26 | 1990-09-26 | 育成結晶冷却用具 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990100581U JPH0647015Y2 (ja) | 1990-09-26 | 1990-09-26 | 育成結晶冷却用具 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0456765U JPH0456765U (enrdf_load_stackoverflow) | 1992-05-15 |
| JPH0647015Y2 true JPH0647015Y2 (ja) | 1994-11-30 |
Family
ID=31843343
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990100581U Expired - Lifetime JPH0647015Y2 (ja) | 1990-09-26 | 1990-09-26 | 育成結晶冷却用具 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0647015Y2 (enrdf_load_stackoverflow) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS538374A (en) * | 1976-07-12 | 1978-01-25 | Hitachi Ltd | Growing method for single crystal of semiconductor |
-
1990
- 1990-09-26 JP JP1990100581U patent/JPH0647015Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0456765U (enrdf_load_stackoverflow) | 1992-05-15 |
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