JPH0645272Y2 - 通過形ｓｗｒ測定装置 - Google Patents

通過形ｓｗｒ測定装置

Info

Publication number
JPH0645272Y2
JPH0645272Y2 JP1989092007U JP9200789U JPH0645272Y2 JP H0645272 Y2 JPH0645272 Y2 JP H0645272Y2 JP 1989092007 U JP1989092007 U JP 1989092007U JP 9200789 U JP9200789 U JP 9200789U JP H0645272 Y2 JPH0645272 Y2 JP H0645272Y2
Authority
JP
Japan
Prior art keywords
swr
output
terminal
wave power
potentiometer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1989092007U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0330870U (cg-RX-API-DMAC7.html
Inventor
広信 渡辺
東 堀米
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Ichi Denpa Kogyo Co Ltd
Original Assignee
Dai Ichi Denpa Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Ichi Denpa Kogyo Co Ltd filed Critical Dai Ichi Denpa Kogyo Co Ltd
Priority to JP1989092007U priority Critical patent/JPH0645272Y2/ja
Publication of JPH0330870U publication Critical patent/JPH0330870U/ja
Application granted granted Critical
Publication of JPH0645272Y2 publication Critical patent/JPH0645272Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Monitoring And Testing Of Transmission In General (AREA)
  • Measurement Of Resistance Or Impedance (AREA)
JP1989092007U 1989-08-04 1989-08-04 通過形ｓｗｒ測定装置 Expired - Lifetime JPH0645272Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989092007U JPH0645272Y2 (ja) 1989-08-04 1989-08-04 通過形ｓｗｒ測定装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989092007U JPH0645272Y2 (ja) 1989-08-04 1989-08-04 通過形ｓｗｒ測定装置

Publications (2)

Publication Number Publication Date
JPH0330870U JPH0330870U (cg-RX-API-DMAC7.html) 1991-03-26
JPH0645272Y2 true JPH0645272Y2 (ja) 1994-11-16

Family

ID=31641456

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989092007U Expired - Lifetime JPH0645272Y2 (ja) 1989-08-04 1989-08-04 通過形ｓｗｒ測定装置

Country Status (1)

Country Link
JP (1) JPH0645272Y2 (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6921686B2 (en) 1995-02-21 2005-07-26 Semiconductor Energy Laboratory Co., Ltd. Method for producing insulated gate thin film semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6921686B2 (en) 1995-02-21 2005-07-26 Semiconductor Energy Laboratory Co., Ltd. Method for producing insulated gate thin film semiconductor device
US7045403B2 (en) 1995-02-21 2006-05-16 Semiconductor Energy Laboratory Co., Ltd. Method for producing insulated gate thin film semiconductor device
US7615423B2 (en) 1995-02-21 2009-11-10 Semiconductor Energy Laboratory Co., Ltd. Method for producing insulated gate thin film semiconductor device

Also Published As

Publication number Publication date
JPH0330870U (cg-RX-API-DMAC7.html) 1991-03-26

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