JPH0638123B2 - Color solid-state image sensor - Google Patents
Color solid-state image sensorInfo
- Publication number
- JPH0638123B2 JPH0638123B2 JP29863687A JP29863687A JPH0638123B2 JP H0638123 B2 JPH0638123 B2 JP H0638123B2 JP 29863687 A JP29863687 A JP 29863687A JP 29863687 A JP29863687 A JP 29863687A JP H0638123 B2 JPH0638123 B2 JP H0638123B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- state image
- color solid
- separation filter
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000926 separation method Methods 0.000 claims description 18
- 238000004043 dyeing Methods 0.000 description 6
- 238000003384 imaging method Methods 0.000 description 5
- 230000008961 swelling Effects 0.000 description 3
- 108010010803 Gelatin Proteins 0.000 description 2
- 239000005018 casein Substances 0.000 description 2
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 2
- 235000021240 caseins Nutrition 0.000 description 2
- CMMUKUYEPRGBFB-UHFFFAOYSA-L dichromic acid Chemical compound O[Cr](=O)(=O)O[Cr](O)(=O)=O CMMUKUYEPRGBFB-UHFFFAOYSA-L 0.000 description 2
- 229920000159 gelatin Polymers 0.000 description 2
- 239000008273 gelatin Substances 0.000 description 2
- 235000019322 gelatine Nutrition 0.000 description 2
- 235000011852 gelatine desserts Nutrition 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 241001428397 Taito Species 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
Landscapes
- Optical Filters (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Color Television Image Signal Generators (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は色分解フィルターの周縁に形成された遮光部を
改良してなるカラー固体撮像素子に関する。Description: TECHNICAL FIELD The present invention relates to a color solid-state image pickup device having an improved light-shielding portion formed on the periphery of a color separation filter.
(従来の技術) カラー固体撮像素子において、色分解フィルターの周縁
に設けられる遮光部は従来、以下のようにしてつくられ
ていた。すなわち、ゼラチン又はカゼインを主成分とす
る重クロム酸系レジスト等の易染色性感光性樹脂を全面
に塗布したのち、遮光部のみが残るようにマスキング
し、ついで露光、現像をおこない、全体的にベタの遮光
部を形成していた。(Prior Art) In a color solid-state imaging device, a light-shielding portion provided on the periphery of a color separation filter has conventionally been manufactured as follows. That is, after applying an easily dyeable photosensitive resin such as a dichromic acid-based resist containing gelatin or casein as a main component to the entire surface, masking is performed so that only the light-shielding portion remains, and then exposure and development are performed, and the whole is exposed. The solid light-shielding portion was formed.
(発明が解決しようとする問題点) しかし、このようにして形成されたベタ状の遮光部は遮
光部を構成するレジスト膜がこの下の基板との熱膨張率
の差、その他の原因によりストレスが溜り、遮光部の一
部、特に角部に亀裂が生じ易く、この亀裂部分から光が
洩れ、撮像時の偽信号の原因となるという問題があっ
た。(Problems to be solved by the invention) However, in the solid light-shielding portion thus formed, the resist film constituting the light-shielding portion causes stress due to a difference in coefficient of thermal expansion from the substrate below this and other causes. However, there is a problem that a part of the light-shielding portion, especially a corner portion is likely to be cracked, and light leaks from the cracked portion, which causes a false signal at the time of imaging.
したがって、本発明は遮光部の亀裂の発生のおそれのな
いカラー固体撮像素子を提供することを目的とする。Therefore, it is an object of the present invention to provide a color solid-state image pickup device that is free from the risk of cracks in the light shielding part.
(問題点を解決するための手段) 本発明は上記問題を解決するため、色分解フィルター領
域周辺の遮光部も、色分解フィルターの色素パターンと
同様に分割したパターン形状に形成し、遮光部に加わる
ストレスの分散を図り、遮光部の亀裂の発生を防止する
という手段を講じた。(Means for Solving Problems) In order to solve the above problems, the present invention forms a light-shielding portion around a color separation filter region into a divided pattern shape similarly to the dye pattern of the color separation filter, and Measures were taken to disperse the applied stress and prevent the occurrence of cracks in the light shielding part.
すなわち、本発明は、色分解フィルターの周縁に沿って
遮光部を形成してなるカラー固体撮像素子において、該
遮光部がスリット巾が1.0μm以下になるように予め分
割して形成されたレジストパターンに遮光用染色を施し
たものからなることを特徴とするカラー固体撮像素子を
提供するものである。That is, the present invention is a color solid-state imaging device in which a light-shielding portion is formed along the periphery of a color separation filter, and the resist pattern formed by dividing the light-shielding portion in advance so that the slit width is 1.0 μm or less. The present invention provides a color solid-state image pickup device, characterized in that the color solid-state image pickup device is formed by dyeing for light shielding.
なお、レジストパターンは一辺が15μm以下の四角形
ブロックを並列させたものが好ましい。より好ましく
は、レジストパターンは色分解フィルターの主パターン
と同一形状、同一寸法のものとなるように形成する。The resist pattern is preferably a rectangular block having a side of 15 μm or less arranged in parallel. More preferably, the resist pattern is formed to have the same shape and size as the main pattern of the color separation filter.
(作用) 本発明のカラー固体撮像素子によれば、遮光部が当初に
おいて分割されたレジストパターンから構成されている
から、遮光部に対するストレスが分散されるため、遮光
部に亀裂が生じさせるおそれがない。又、レジストパタ
ーンは分割されたスリット巾が1.0μm以下であるので
染色工程におけるパターンの膨潤によりその隙間は自然
に埋まり、その間から光が洩れるおそれは全くない。(Operation) According to the color solid-state imaging device of the present invention, since the light-shielding portion is initially composed of the divided resist patterns, stress to the light-shielding portion is dispersed, and thus the light-shielding portion may be cracked. Absent. Moreover, since the divided slit width of the resist pattern is 1.0 μm or less, the gap is naturally filled by the swelling of the pattern in the dyeing step, and there is no possibility that light leaks between them.
レジストパターンを色分解フィルターの主パターンと同
一形状、同一寸法とすることにより、色分解フィルター
の形成のためのフォトリソグラフィ条件をそのまま採用
すればよく、これら条件を遮光部形成のために再度検討
する必要がなくなるという利点が得られる。By setting the resist pattern to have the same shape and size as the main pattern of the color separation filter, the photolithography conditions for forming the color separation filter may be adopted as they are, and these conditions will be examined again for forming the light shielding part. The advantage is that there is no need.
(実施例) 以下、本発明を図示の実施例を参照して説明する。(Example) Hereinafter, the present invention will be described with reference to the illustrated examples.
第1図は本発明に係わるカラー固体撮像装置の色分解フ
ィルター領域1と、その周辺に形成された遮光領域2
の、それぞれ一部を示している。色分解フィルター領域
1は図示の如く各色素パターン、例えばシアン(Cy)、
イエロー(Ye)、グリーン(G)、マゼンタ(M)を格
子状に配列したものからなる。遮光領域2はレジスト膜
を色分解フィルター領域1の色素パターンと同一形状、
同一寸法のパターンに当初形成した分割パターン領域2
aと、この当初のレジスト膜をのちに黒色に染色するこ
とにより膨潤し、領域2a相互間を埋めつくした膨潤領
域2bとから構成されている。この当初に形成される分
割パターン領域2a相互間のスリット巾“a”は1.0μ
m以下とすることが好ましい。もし、このスリット巾
“a”が1.0μmを超えると、のちの遮光用染色工程に
よる膨潤によっても分割パターン領域2a相互間が埋め
尽くされずに、隙間が残る可能性があり好ましくない。FIG. 1 shows a color separation filter region 1 of a color solid-state image pickup device according to the present invention and a light-shielding region 2 formed around the color separation filter region 1.
, Each showing a part. The color separation filter area 1 is shown in the figure for each dye pattern, for example, cyan (Cy),
It consists of yellow (Ye), green (G), and magenta (M) arranged in a grid pattern. In the light-shielding area 2, the resist film has the same shape as the dye pattern in the color separation filter area 1,
Divided pattern area 2 initially formed in a pattern of the same size
a and a swollen region 2b that is swollen by dyeing the initial resist film later and then swelled to fill the space between the regions 2a. The slit width "a" between the divided pattern regions 2a initially formed is 1.0 μm.
It is preferably m or less. If the slit width “a” exceeds 1.0 μm, the divided pattern regions 2a may not be completely filled with each other due to the swelling in the light-shielding dyeing step later, which is not preferable.
このよな遮光領域2を形成する方法としては、例えばゼ
ラチン、カゼイン等を主成分とする重クロム酸系レジス
ト膜を全面塗布したのち、第2図に示すような分割パタ
ーン領域2aに相当する開口部3aを設けたマスク3を
重ね、ついで露光、現像することによって分割パターン
領域2a(例えば13μm×8μmの四角形ブロックか
らなる)を形成し、ついで染料としてMCFA-001(三菱化
成製.商品名)またはCFTダイワBlack(ダイワ化成製.
商品名)を用い、従来と同様にして湿式で分割パターン
領域2aを染色することにより分割パターン領域2aが
膨潤した膨潤領域2bを形成させることができる。As a method of forming such a light-shielding region 2, for example, a dichromic acid-based resist film containing gelatin, casein or the like as a main component is applied over the entire surface, and then an opening corresponding to the divided pattern region 2a as shown in FIG. 2 is formed. The mask 3 provided with the portion 3a is overlapped, and then exposed and developed to form a divided pattern area 2a (consisting of a square block of 13 μm × 8 μm, for example), and then as a dye, MCFA-001 (trade name, manufactured by Mitsubishi Kasei). Or CFT Daiwa Black (manufactured by Daiwa Kasei.
It is possible to form the swelled region 2b in which the divided pattern region 2a is swollen by dyeing the divided pattern region 2a by a wet method in the same manner as the conventional method using the product name).
(発明の効果) 以上詳述したように、本発明のカラー固体撮像素子によ
れば色分解フィルター周縁の遮光部が予め分割して形成
されたレジストパターンに遮光用染色を施して形成され
たものからなるから、遮光部の温度等による膨縮に基づ
く亀裂、破損等の発生を効果的に防止することができ
る。(Effects of the Invention) As described in detail above, according to the color solid-state imaging device of the present invention, the light-shielding portion at the periphery of the color separation filter is formed by applying light-shielding dyeing to a resist pattern formed by being divided in advance. Therefore, it is possible to effectively prevent the occurrence of cracks, breakages and the like due to expansion and contraction due to the temperature of the light shielding portion.
なお、本発明は色分解フィルターをガラス等の透明基板
に予め形成し、これを固体撮像素子上に貼り合せる場
合、又は固体撮像素子上に色分解フィルターを直接形成
する場合のいずれに対して適用し得る。The present invention is applied to either a case where a color separation filter is formed in advance on a transparent substrate such as glass and is attached to a solid-state image sensor, or a case where the color separation filter is directly formed on the solid-state image sensor. You can
第1図は本発明に係わるカラー固体撮像素子の一部を示
す平面図、第2図は第1図のカラー固体撮像素子の遮光
部を形成するために用いられるマスクの一部を示す平面
図である。 図中、1…色分解フィルター領域、2…遮光領域、2a
…分割パターン領域、2b…膨潤領域、3…マスク、3
a…開口部。FIG. 1 is a plan view showing a part of a color solid-state image sensor according to the present invention, and FIG. 2 is a plan view showing a part of a mask used to form a light-shielding portion of the color solid-state image sensor of FIG. Is. In the figure, 1 ... Color separation filter area, 2 ... Shading area, 2a
... division pattern area, 2b ... swelling area, 3 ... mask, 3
a ... opening.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 伊藤 慎次 東京都台東区台東1丁目5番1号 凸版印 刷株式会社内 (56)参考文献 特開 昭57−183192(JP,A) 特開 昭55−19885(JP,A) ─────────────────────────────────────────────────── ─── Continued Front Page (72) Inventor Shinji Ito 1-5-1 Taito, Taito-ku, Tokyo Toppan Printing Co., Ltd. (56) Reference JP-A-57-183192 (JP, A) JP-A-SHO 55-19885 (JP, A)
Claims (3)
形成してなるカラー固体撮像素子において、該遮光部が
スリット巾が1.0μm以下になるように予め分割して形
成されたレジストパターンに遮光用染色を施したものか
らなることを特徴とするカラー固体撮像素子。1. A color solid-state image pickup device comprising a light-shielding portion formed along the periphery of a color separation filter, wherein the light-shielding portion has a resist pattern formed beforehand by dividing the slit width to 1.0 μm or less. A color solid-state image pickup device comprising a dye for light shielding.
角形ブロックを並列させたものからなる特許請求の範囲
第1項記載のカラー固体撮像素子。2. The color solid-state image pickup device according to claim 1, wherein the resist pattern is formed by arranging parallel rectangular blocks each having a side of 15 μm or less.
パターンと同一形状、同一寸法のものからなる特許請求
の範囲第2項のカラー固体撮像素子。3. The color solid-state image pickup device according to claim 2, wherein the resist pattern has the same shape and size as the main pattern of the color separation filter.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29863687A JPH0638123B2 (en) | 1987-11-26 | 1987-11-26 | Color solid-state image sensor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29863687A JPH0638123B2 (en) | 1987-11-26 | 1987-11-26 | Color solid-state image sensor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01140101A JPH01140101A (en) | 1989-06-01 |
JPH0638123B2 true JPH0638123B2 (en) | 1994-05-18 |
Family
ID=17862303
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP29863687A Expired - Lifetime JPH0638123B2 (en) | 1987-11-26 | 1987-11-26 | Color solid-state image sensor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0638123B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7518691B2 (en) * | 2020-07-30 | 2024-07-18 | 株式会社ジャパンディスプレイ | Detector and Optical Filter |
-
1987
- 1987-11-26 JP JP29863687A patent/JPH0638123B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH01140101A (en) | 1989-06-01 |
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