JPH0634372Y2 - 不純物蒸発装置 - Google Patents
不純物蒸発装置Info
- Publication number
- JPH0634372Y2 JPH0634372Y2 JP11172789U JP11172789U JPH0634372Y2 JP H0634372 Y2 JPH0634372 Y2 JP H0634372Y2 JP 11172789 U JP11172789 U JP 11172789U JP 11172789 U JP11172789 U JP 11172789U JP H0634372 Y2 JPH0634372 Y2 JP H0634372Y2
- Authority
- JP
- Japan
- Prior art keywords
- evaporation
- impurity
- vaporizer
- carbon
- evaporation device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000008020 evaporation Effects 0.000 title claims description 31
- 238000001704 evaporation Methods 0.000 title claims description 31
- 239000012535 impurity Substances 0.000 title claims description 23
- 239000002184 metal Substances 0.000 claims description 13
- 239000006200 vaporizer Substances 0.000 claims description 7
- 239000007787 solid Substances 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 12
- 229910052799 carbon Inorganic materials 0.000 description 12
- 238000000605 extraction Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Landscapes
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11172789U JPH0634372Y2 (ja) | 1989-09-25 | 1989-09-25 | 不純物蒸発装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11172789U JPH0634372Y2 (ja) | 1989-09-25 | 1989-09-25 | 不純物蒸発装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0350055U JPH0350055U (enrdf_load_stackoverflow) | 1991-05-15 |
JPH0634372Y2 true JPH0634372Y2 (ja) | 1994-09-07 |
Family
ID=31660194
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11172789U Expired - Lifetime JPH0634372Y2 (ja) | 1989-09-25 | 1989-09-25 | 不純物蒸発装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0634372Y2 (enrdf_load_stackoverflow) |
-
1989
- 1989-09-25 JP JP11172789U patent/JPH0634372Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0350055U (enrdf_load_stackoverflow) | 1991-05-15 |
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