JPH06342138A - Adsorption panel of spacer material dispersing device for liquid crystal display element and production of panel - Google Patents

Adsorption panel of spacer material dispersing device for liquid crystal display element and production of panel

Info

Publication number
JPH06342138A
JPH06342138A JP15425393A JP15425393A JPH06342138A JP H06342138 A JPH06342138 A JP H06342138A JP 15425393 A JP15425393 A JP 15425393A JP 15425393 A JP15425393 A JP 15425393A JP H06342138 A JPH06342138 A JP H06342138A
Authority
JP
Japan
Prior art keywords
spacer material
plate
holes
metal
metal plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP15425393A
Other languages
Japanese (ja)
Inventor
Satoshi Taniguchi
訓 谷口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Alps Alpine Co Ltd
Original Assignee
Alps Electric Co Ltd
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co Ltd, Dainippon Screen Manufacturing Co Ltd filed Critical Alps Electric Co Ltd
Priority to JP15425393A priority Critical patent/JPH06342138A/en
Publication of JPH06342138A publication Critical patent/JPH06342138A/en
Withdrawn legal-status Critical Current

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Landscapes

  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PURPOSE:To provide a spacer material dispersing device capable of scattering a spacer material on the surface of a substrate in dispersed state, to improve the performance of a liquid crystal display element and the yield in mass- production, to facilitate the control of the scattering quantity of the spacer material and to improve the utilization efficiency of the spacer material. CONSTITUTION:An adsorption panel mounted to block the opening face of a suction and exhaust chamber and arranged to face the substrate is constituted by mutually joining a porous plate member 10 having a laminated structure composed of a polyimide film 18 and a metal plated layer 22 and having many spacer material adsorption pores uniformly formed on the whole surface smaller in the opening diameter of the under surface of the polyimide film than the diameter of the spacer material with a rigid honeycomb body 14 formed with many air permeating holes 16.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、液晶表示素子を製造
する一連のプロセス中のセル組立工程において、上下2
枚の基板を貼り合わせる前に下側の基板面上へスペーサ
材を散布するのに使用されるスペーサ材分散装置の一構
成部品であるスペーサ材吸着板、並びにその吸着板の製
造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is used in a cell assembling process in a series of processes for manufacturing a liquid crystal display device.
The present invention relates to a spacer adsorbing plate which is a component of a spacer material dispersing device used to disperse a spacer material onto a lower substrate surface before laminating two substrates, and a method for manufacturing the adsorbing plate.

【0002】[0002]

【従来の技術】液晶表示素子において、液晶が注入され
るセルギャップを全面にわたって均一にするために、上
下2枚の基板間に球状のプラスチック素材或いは円柱状
のガラスファイバ素材などからなるスペーサ材を介挿す
るようにしている。このスペーサ材は、セル組立工程に
おいて上下2枚の基板を貼り合わせる前に下側の基板面
上へ散布されるが、均一なセル厚を得るためには、スペ
ーサ材を均一に分散させて基板面上へ散布する必要があ
る。
2. Description of the Related Art In a liquid crystal display device, in order to make the cell gap into which liquid crystal is injected uniform over the entire surface, a spacer material made of a spherical plastic material or a cylindrical glass fiber material is provided between the upper and lower substrates. I am trying to insert it. This spacer material is sprinkled on the lower substrate surface before the upper and lower two substrates are bonded together in the cell assembling process. However, in order to obtain a uniform cell thickness, the spacer material should be uniformly dispersed. It is necessary to spray on the surface.

【0003】基板面上へのスペーサ材の散布方法として
は、湿式散布と乾式散布との2つの方法がある。このう
ち、湿式散布は、まず、フロンやエタノール等の揮発性
溶媒にスペーサ材を混合して分散させておき、スペーサ
材散布装置のスプレイノズルの下方にガラス基板を置い
て、スペーサ材が混合、分散された液をスプレイノズル
から窒素ガス等の不活性ガスと一緒にガラス基板に向か
って霧状に噴出させるようにして行なわれる。この際、
スペーサ材が分散された液が吹き出される室内を加熱し
ておき、スプレイノズルから噴出した液の溶媒が速やか
に蒸発するようにする。そして、溶媒が蒸発した後のス
ペーサ材をガラス基板面上へ分散して落下させるように
する。
There are two methods of spraying the spacer material on the surface of the substrate: wet spraying and dry spraying. Among them, in wet spraying, first, a spacer material is mixed and dispersed in a volatile solvent such as CFC or ethanol, and a glass substrate is placed below a spray nozzle of a spacer material spraying device to mix the spacer material. The dispersed liquid is sprayed from the spray nozzle together with an inert gas such as nitrogen gas toward the glass substrate in a mist state. On this occasion,
The chamber in which the liquid in which the spacer material is dispersed is blown is heated so that the solvent of the liquid jetted from the spray nozzle is quickly evaporated. Then, the spacer material after the solvent is evaporated is dispersed and dropped onto the glass substrate surface.

【0004】また、乾式散布は、溶媒を使用せずに、窒
素ガス等の気体だけでスペーサ材を分散させてガラス基
板面上へ散布する方式である。この乾式散布では、湿式
散布のように予めスペーサ材を溶媒中に分散させたりし
ないため、スペーサ材を分散させるための工夫が必要に
なる。このための方法として、従来、電界をかけてスペ
ーサ材に同符号の電荷を与え、スペーサ材同士を電気的
に反発させてスペーサ材を分散させるようにしたり、ス
ペーサ材と共に窒素ガス等の圧縮ガスを吹き出すノズル
の噴出口の前方に球やメッシュ等の障害物を設置してお
き、圧縮ガスと一緒にノズルの噴出口から吹き出された
スペーサ材を障害物に衝突させて分散させるようにした
りしている。また、特開昭63−155026号公報に
は、圧縮ガスが高速噴出するノズルの噴出口近傍で負圧
が生じる場所にパイプの一端を配置し、パイプの他端を
スペーサ材受皿近傍に配置して、そのパイプ内に発生す
る負圧を利用してスペーサ材を搬送し、パイプ出口にお
いてスペーサ材を圧縮ガスと衝突させて剪断し、スペー
サ材を分離させた状態でノズルの噴出口から吹き出すこ
とにより、基板上にスペーサ材を分散させるようにする
方法が開示されている。
Further, the dry spraying is a system in which a spacer material is dispersed only by a gas such as nitrogen gas without using a solvent and sprayed on the glass substrate surface. In this dry type spraying, unlike the wet type spraying, the spacer material is not previously dispersed in the solvent, and therefore, a device for dispersing the spacer material is required. As a method for this, conventionally, an electric field is applied to the spacer material so that the spacer material is electrically repulsed to disperse the spacer material, or a compressed gas such as nitrogen gas is used together with the spacer material. It is possible to install obstacles such as spheres and meshes in front of the jet outlet of the nozzle that blows out, and to collide the spacer material blown from the jet outlet of the nozzle with the compressed gas to disperse by colliding with the obstacle. ing. Further, in Japanese Patent Laid-Open No. 63-155026, one end of the pipe is arranged at a place where a negative pressure is generated in the vicinity of the ejection port of a nozzle from which compressed gas is ejected at high speed, and the other end of the pipe is arranged in the vicinity of a spacer material tray. The spacer material is conveyed by utilizing the negative pressure generated in the pipe, and the spacer material is collided with the compressed gas at the pipe outlet and sheared, and the spacer material is blown out from the jet outlet of the nozzle in a separated state. Discloses a method of dispersing a spacer material on a substrate.

【0005】[0005]

【発明が解決しようとする課題】上記した湿式散布方式
では、揮発性溶媒に主としてフロンが使用されてきた
が、環境問題の面からそのフロンが使用できなくなると
いった現実があり、また、現状では、フロンの代替溶媒
として引火性、毒性などの点で満足できるものも見付か
っていない。また、スペーサ材を揮発性溶媒に混合した
液は、スペーサ材と溶媒との比重の相違から、スペーサ
材の濃度が常に一定になるように調製しておくことが難
しい。このため、スペーサ材をガラス基板面上へ散布し
たときに、基板面におけるスペーサ材の密度が変化する
ことになり、液晶表示素子のコントラストの低下を来た
す原因になる、といった問題点もある。
In the above-mentioned wet spraying method, chlorofluorocarbon has been mainly used as the volatile solvent, but there is a reality that the fluorocarbon cannot be used because of environmental problems. As an alternative solvent for CFCs, no satisfactory one has been found in terms of flammability and toxicity. Further, it is difficult to prepare a liquid in which the spacer material is mixed with the volatile solvent so that the concentration of the spacer material is always constant because of the difference in specific gravity between the spacer material and the solvent. For this reason, when the spacer material is scattered on the glass substrate surface, the density of the spacer material on the substrate surface changes, which causes a decrease in contrast of the liquid crystal display element.

【0006】一方、乾式散布方式では、スペーサ材の凝
集が強いとスペーサ材が十分に分散しない場合があり、
このようにスペーサ材の分散程度に差が出ることにより
セルギャップのむらを生じ、液晶表示素子のコントラス
トが低下し、量産に際しての歩留まりの低下につなが
る、といった問題点がある。また、乾式散布では、非常
に少量のスペーサ材の計量を行なう必要があり、湿式散
布に比べてスペーサ材の散布量の制御が難しく、さら
に、スペーサ材の利用効率も極めて低い、といった問題
点がある。
On the other hand, in the dry spraying method, if the spacer material is strongly aggregated, the spacer material may not be sufficiently dispersed.
Thus, there is a problem that unevenness in the cell gap occurs due to the difference in the degree of dispersion of the spacer material, the contrast of the liquid crystal display element decreases, and the yield in mass production decreases. In addition, in dry spraying, it is necessary to measure a very small amount of spacer material, which makes it difficult to control the spraying amount of spacer material as compared with wet spraying, and the utilization efficiency of spacer material is extremely low. is there.

【0007】以上のような湿式散布及び従来の乾式散布
における諸々の問題点を解決するための提案として、図
10に模式図を示したようなスペーサ材分散方法が考えら
れる。すなわち、配管1を通して図示しない吸気装置及
び排気装置に切換え的に連通接続される吸排気室2に、
開口直径がスペーサ材5の直径より小さいスペーサ材吸
着孔4が全面にわたって均一に多数形成された吸着板3
を、吸排気室2の開口面を閉塞するように気密に取着し
たスペーサ材分散装置を使用し、まず、図10の(a)に
示すように、吸排気室2を吸気装置に連通接続し、吸排
気室2内の空気を吸引して吸排気室2内を負圧状態にす
ることにより、多数のスペーサ材吸着孔4の開口端にそ
れぞれスペーサ材5を吸着し保持する。全部のスペーサ
材吸着孔4にスペーサ材5が吸着保持されると、図10の
(b)に示すように、吸着板3の下方にそれと対向して
基板6を配置し、その後に吸排気室2を排気装置に連通
接続する。そして、吸排気室2から多数のスペーサ材吸
着孔4を通して排気することにより、スペーサ材吸着孔
4の開口端に吸着保持されていた多数のスペーサ材5を
基板6に向かって吹き付ける。これにより、図10の
(b)に二点鎖線で示すように、吸着板3の多数のスペ
ーサ材吸着孔4の配列に従って分散した状態で多数のス
ペーサ材5が基板6の表面上に散布されることになる。
As a proposal for solving various problems in the above wet spraying and conventional dry spraying,
A spacer material dispersion method as shown in the schematic diagram in Fig. 10 is conceivable. That is, to the intake / exhaust chamber 2 that is switchably connected to an intake device and an exhaust device (not shown) through the pipe 1,
Adsorption plate 3 in which a large number of spacer material adsorption holes 4 having an opening diameter smaller than the diameter of the spacer material 5 are formed uniformly over the entire surface.
Using a spacer material dispersing device that is airtightly attached so as to close the opening surface of the intake / exhaust chamber 2, first connect the intake / exhaust chamber 2 to the intake device as shown in FIG. 10 (a). Then, the air in the intake / exhaust chamber 2 is sucked to bring the inside of the intake / exhaust chamber 2 into a negative pressure state, so that the spacer materials 5 are adsorbed and held at the open ends of the large number of spacer material adsorption holes 4, respectively. When the spacer material 5 is adsorbed and held in all the spacer adsorbing holes 4, as shown in FIG. 10B, the substrate 6 is arranged below the adsorbing plate 3 so as to face the adsorbing plate 3, and then the intake / exhaust chamber is placed. 2 is connected in communication with the exhaust device. Then, by exhausting air from the intake / exhaust chamber 2 through the large number of spacer material adsorption holes 4, the large number of spacer materials 5 adsorbed and held at the open ends of the spacer material adsorption holes 4 are sprayed toward the substrate 6. As a result, as shown by the chain double-dashed line in FIG. 10B, a large number of spacer materials 5 are dispersed on the surface of the substrate 6 in a state of being dispersed according to the arrangement of the large number of spacer material adsorption holes 4 of the adsorption plate 3. Will be.

【0008】以上のようなスペーサ材分散方法によれ
ば、従来の散布方法におけるような上記諸問題点が一挙
に解決される。ところで、スペーサ材5の直径は、通常
約4〜7μmであり、従って、上記したスペーサ材分散
方法を実施化するためには、開口端における開口直径が
約4μm未満であるようなスペーサ材吸着孔4が全面に
わたって均一に多数形成された吸着板3が必要になる。
しかも、吸排気室2を吸気及び排気する際には1kg/cm
2程度の圧力が吸着板3にかかることになり、また、吸
着板3の大きさは、数百mm角程度にする必要があるた
め、十分な剛性を有していなければならない。
According to the spacer material dispersing method as described above, the above-mentioned various problems as in the conventional spraying method can be solved at once. By the way, the diameter of the spacer material 5 is usually about 4 to 7 μm. Therefore, in order to carry out the above-described spacer material dispersion method, the spacer material adsorption holes whose opening diameter is less than about 4 μm are required. The suction plate 3 in which a large number of 4 are uniformly formed is required.
Moreover, when inhaling and exhausting the intake / exhaust chamber 2, it is 1 kg / cm.
Since a pressure of about 2 is applied to the suction plate 3 and the size of the suction plate 3 needs to be about several hundreds of mm square, it must have sufficient rigidity.

【0009】そこで、この発明は、上記したような条件
を備えた吸着板を提供すること、並びに、そのような吸
着板を製造するための方法を提供することを技術的課題
としてなされたものであり、もって、図10に示したよう
なスペーサ材分散方法の実施化を可能にすることを目的
とする。
Therefore, the present invention has been made as a technical subject to provide an adsorption plate satisfying the above-mentioned conditions and to provide a method for producing such an adsorption plate. Therefore, the purpose is to enable implementation of the spacer material dispersion method as shown in FIG.

【0010】[0010]

【課題を解決するための手段】この発明では、図10に概
略構成を示したような液晶表示素子用スペーサ材分散装
置の、吸排気室の開口面を閉塞するように気密に取着さ
れスペーサ材を散布しようとする基板に対向して配置さ
れる吸着板を、多数のスペーサ材吸着孔が全面にわたっ
て均一に形成された多孔板部材と、一定の厚みに形成さ
れ剛性を有する多孔補強部材とを互いに接合することに
より構成した。前記多孔板部材は、合成樹脂フィルムの
上面に均一な厚みの金属メッキ層を密着形成した積層構
造をなしており、その積層構造体に前記した多数のスペ
ーサ材吸着孔が、前記合成樹脂フィルム及び金属メッキ
層をそれぞれ貫通した状態で、かつ、合成樹脂フィルム
の下面側の開口直径がスペーサ材の直径より小さくなる
ように形成されている。そして、前記多孔補強部材は、
多孔板部材の金属メッキ層側に接合される。この多孔補
強部材は、例えば、厚さ方向に直線状に貫通した多数の
通気孔を有するハニカム体により形成することができ
る。
According to the present invention, in a spacer material dispersion device for a liquid crystal display element as shown in FIG. 10, the spacers are airtightly attached so as to close the opening surface of the intake and exhaust chambers. A suction plate arranged to face the substrate on which the material is to be dispersed, a porous plate member having a large number of spacer material suction holes uniformly formed over the entire surface, and a porous reinforcement member having a constant thickness and having rigidity. Are bonded to each other. The porous plate member has a laminated structure in which a metal plating layer having a uniform thickness is closely formed on the upper surface of a synthetic resin film, and the numerous spacer material adsorption holes in the laminated structure are the synthetic resin film and It is formed such that it penetrates the metal plating layers and the opening diameter on the lower surface side of the synthetic resin film is smaller than the diameter of the spacer material. And the porous reinforcement member,
The porous plate member is bonded to the metal plating layer side. This porous reinforcing member can be formed of, for example, a honeycomb body having a large number of ventilation holes penetrating linearly in the thickness direction.

【0011】また、合成樹脂フィルムの片面に真空蒸着
又はスパッタリングにより金属薄膜層を被着形成する工
程と、前記金属薄膜層の表面に電気メッキにより金属メ
ッキ膜層を被着形成する工程と、前記金属メッキ膜層の
表面にフォトエレクトロフォーミングにより、多数の貫
通孔が全面にわたって均一に形成された金属メッキ層を
密着形成する工程と、前記金属メッキ層側から、その金
属メッキ層の多数の貫通孔に対応した多数のビーム通過
部がパターン形成されたマスクを介してエキシマレーザ
光を照射し、前記金属メッキ膜層、金属薄膜層及び合成
樹脂フィルムを貫通し合成樹脂フィルムの、金属薄膜層
の被着面側とは反対の面側の開口直径がスペーサ材の直
径より小さい貫通細孔を前記多数の貫通孔にそれぞれ連
通するように多数形成する工程と、前記金属メッキ層の
表面に、一定の厚みに形成され剛性を有する多孔補強部
材を接合する工程とを経ることにより、上記構成の吸着
板を製造するようにする。
Also, a step of depositing a metal thin film layer on one surface of the synthetic resin film by vacuum vapor deposition or sputtering, a step of depositing a metal plating film layer on the surface of the metal thin film layer by electroplating, A step of closely adhering a metal plating layer having a large number of through holes uniformly formed on the surface of the metal plating film layer by photoelectroforming, and a plurality of through holes of the metal plating layer from the metal plating layer side. Irradiating excimer laser light through a mask in which a large number of beam passing portions corresponding to the above are formed, and the metal plating film layer, the metal thin film layer and the synthetic resin film penetrate the metal thin film layer of the synthetic resin film. A large number of through-holes whose opening diameter on the side opposite to the attachment surface side is smaller than the diameter of the spacer material are connected so as to communicate with the above-mentioned many through-holes. A step of forming, on the surface of the metal plating layer, by going through a step of bonding the porous reinforcing member having rigidity is formed at a constant thickness, so as to produce a suction plate of the structure.

【0012】また、上記構成の吸着板を製造するための
別の方法として、金属薄板の片面上にフォトエレクトロ
フォーミングにより、多数の貫通孔が全面にわたって均
一に形成された薄板状金属メッキ体を形成する工程と、
前記薄板状金属メッキ体から前記金属薄板を剥離する工
程と、前記薄板状金属メッキ体の、前記金属薄板が剥離
された面に合成樹脂フィルムを接合する工程と、前記薄
板状金属メッキ体側から、その薄板状金属メッキ体の多
数の貫通孔に対応した多数のビーム通過部がパターン形
成されたマスクを介してエキシマレーザ光を照射し、前
記合成樹脂フィルムを貫通し合成樹脂フィルムの、薄板
状金属メッキ体との接合面側とは反対の面側の開口直径
がスペーサ材の直径より小さい貫通細孔を前記多数の貫
通孔にそれぞれ連通するように多数形成する工程と、前
記薄板状金属メッキ体の表面に、一定の厚みに形成され
剛性を有する多孔補強部材を接合する工程とを経るよう
にする。
As another method for manufacturing the adsorption plate having the above-mentioned structure, a thin plate-shaped metal plating body having a large number of through holes uniformly formed on the entire surface by photoelectroforming is formed on one surface of the metal thin plate. And the process of
A step of peeling the metal thin plate from the thin plate metal plated body, a step of joining a synthetic resin film to the surface of the thin plate metal plated body from which the metal thin plate is peeled off, from the thin plate metal plated body side, The thin plate metal of the synthetic resin film is irradiated with excimer laser light through a mask in which a large number of beam passage portions corresponding to the large number of through holes of the thin plate metal plated body are radiated, and penetrates through the synthetic resin film. A step of forming a large number of through holes having an opening diameter smaller than the diameter of the spacer material on the surface side opposite to the joint surface side with the plated body so as to respectively communicate with the plurality of through holes; And a step of joining a porous reinforcement member having a certain thickness and having rigidity to the surface of the.

【0013】[0013]

【作用】上記のように構成されたこの発明に係る吸着板
は、スペーサ材を吸着保持する多数のスペーサ材吸着孔
が、合成樹脂フィルム及び金属メッキ層を積層した構造
の多孔板部材に形成され、その多孔板部材の合成樹脂フ
ィルムの下面側にスペーサ材を吸着保持するように構成
されているため、スペーサ材吸着孔の、合成樹脂フィル
ムの下面側の開口直径がスペーサ材の直径より小さくな
るように形成すればよく、スペーサ材吸着孔の形成に
は、それほど難しい技術を必要としない。そして、この
吸着板が吸排気室の開口面を閉塞するように取着された
スペーサ材分散装置において、その吸排気室内を吸気し
たとき、スペーサ材は、吸排気室内に吸い込まれること
なく、合成樹脂フィルムの下面側の、スペーサ材吸着孔
の開口端に保持されることになる。また、多孔板部材
は、剛性を有する多孔補強部材と接合されることにより
補強されているので、吸排気室を吸気及び排気する際に
或る程度の圧力が吸着板にかかっても、吸着板が変形し
たりすることがない。
In the suction plate according to the present invention configured as described above, a large number of spacer material suction holes for sucking and holding the spacer material are formed in the porous plate member having a structure in which the synthetic resin film and the metal plating layer are laminated. Since the spacer material is configured to adsorb and hold the spacer material on the lower surface side of the synthetic resin film of the porous plate member, the opening diameter of the spacer material adsorption hole on the lower surface side of the synthetic resin film is smaller than the diameter of the spacer material. The spacer material suction holes need not be formed by a very difficult technique. Then, in the spacer material dispersion device in which the adsorption plate is attached so as to close the opening surface of the intake / exhaust chamber, when the intake / exhaust chamber is inhaled, the spacer material is not sucked into the intake / exhaust chamber and is synthesized. It is held at the open end of the spacer material suction hole on the lower surface side of the resin film. Further, since the porous plate member is reinforced by being joined to the porous reinforcing member having rigidity, even if a certain pressure is applied to the suction plate during intake and exhaust of the intake and exhaust chambers, the adsorption plate Will not be deformed.

【0014】また、上記したような各方法により吸着板
を製造するようにしたときは、開口端における開口直径
がスペーサ材の直径より小さい多数のスペーサ材吸着孔
を吸着板の全面にわたって均一に、比較的容易に形成す
ることができ、また、十分な剛性を有する吸着板が得ら
れる。
When the suction plate is manufactured by each of the above methods, a large number of spacer material suction holes whose opening diameter at the opening end is smaller than the diameter of the spacer material are evenly distributed over the entire surface of the suction plate. A suction plate that can be formed relatively easily and that has sufficient rigidity is obtained.

【0015】[0015]

【実施例】以下、この発明の好適な実施例について図面
を参照しながら説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT A preferred embodiment of the present invention will be described below with reference to the drawings.

【0016】図1は、この発明の1実施例を示し、液晶
表示素子の製造プロセスにおいて基板面上へスペーサ材
を散布するのに使用されるスペーサ材分散装置の吸着板
を破断状態で示す部分拡大斜視図である。この吸着板
は、多数のスペーサ材吸着孔12が全面にわたって均一に
形成された多孔板部材10と、厚さ方向に直線状に貫通し
た多数の通気孔16を有するハニカム体14とを互いに接合
することにより構成されている。
FIG. 1 shows an embodiment of the present invention, in which a suction plate of a spacer material dispersing device used for spraying a spacer material onto a substrate surface in a manufacturing process of a liquid crystal display element is shown in a broken state. It is an expansion perspective view. This adsorption plate joins together a porous plate member 10 in which a large number of spacer material adsorption holes 12 are uniformly formed over the entire surface and a honeycomb body 14 having a large number of ventilation holes 16 penetrating linearly in the thickness direction. It is composed of

【0017】多孔板部材10は、合成樹脂フィルム、例え
ばポリイミドフィルム18の上面に金属薄膜層20を被着形
成し、その金属薄膜層20の上面に均一な厚みの金属メッ
キ層22を密着形成した積層構造を有しており、それらポ
リイミドフィルム18、金属薄膜層20及び金属メッキ層22
からなる積層構造体を厚み方向に貫通するようにスペー
サ材吸着孔12が形成されている。スペーサ材吸着孔12の
形設間隔は、例えば100μm程度とされる。ポリイミ
ドフィルム18は、厚みが例えば25μm程度であり、そ
の下面側におけるスペーサ材吸着孔12の開口直径は、ス
ペーサ材の直径すなわち4〜7μmより小さく、例えば
約4μm未満とされており、スペーサ材がスペーサ材吸
着孔12の下側開口端の位置に吸着保持されるようになっ
ている。尚、スペーサ材吸着孔12は、断面が逆台形状と
なっているため、そのスペーサ材吸着孔12を通して吸気
及び排気したときにスペーサ材吸着孔12の下側開口端に
おける気体の流速が大きくなる。金属薄膜層20は、ポリ
イミドフィルム18の上面に真空蒸着又はスパッタリング
により金属、例えばニッケル、アルミニウム等を被着し
て形成されている。尚、真空蒸着等で形成された金属薄
膜層20は、厚みが約0.3〜0.4μm程度であり、電
気メッキで金属メッキ層22を形成する際に金属薄膜層20
だけでは厚みが不足するときは、金属薄膜層20の表面に
電気メッキにより1〜2μmの厚みのニッケル等の金属
メッキ膜層を被着形成するようにする。多数の孔が形成
された金属メッキ層22は、フォトエレクトロフォーミン
グ技術を利用して形成される。そして、多孔板部材10の
取扱いが容易に行なえる程度の所要の厚み、例えば80
μmの厚みの金属メッキ層22を得るためには、フォトエ
レクトロフォーミングの単位工程を複数回、例えば3回
繰り返すようにする。ハニカム体14は、剛性を有してお
り、一定の厚みに形成されている。そして、多孔板部材
10の補強部材としての機能を十分に果たし1kg/cm2
度の圧力に耐えられるように、吸着板全体の大きさを数
百mm角程度にする場合、ハニカム体14は、例えば数10
mm程度の厚みとされる。
In the porous plate member 10, a metal thin film layer 20 is adhered and formed on an upper surface of a synthetic resin film, for example, a polyimide film 18, and a metal plating layer 22 having a uniform thickness is closely formed on the upper surface of the metal thin film layer 20. It has a laminated structure, and the polyimide film 18, the metal thin film layer 20 and the metal plating layer 22.
Spacer material suction holes 12 are formed so as to penetrate through the laminated structure made of. The spacing between the spacer material suction holes 12 is, for example, about 100 μm. The polyimide film 18 has a thickness of, for example, about 25 μm, and the opening diameter of the spacer material adsorption holes 12 on the lower surface side thereof is smaller than the diameter of the spacer material, that is, 4 to 7 μm, for example, less than about 4 μm. The spacer material suction holes 12 are sucked and held at the lower open end positions. Since the spacer material suction hole 12 has an inverted trapezoidal cross section, the gas flow velocity at the lower opening end of the spacer material suction hole 12 increases when air is taken in and exhausted through the spacer material suction hole 12. . The metal thin film layer 20 is formed by depositing a metal such as nickel or aluminum on the upper surface of the polyimide film 18 by vacuum vapor deposition or sputtering. The metal thin film layer 20 formed by vacuum deposition has a thickness of about 0.3 to 0.4 μm, and the metal thin film layer 20 is formed when the metal plated layer 22 is formed by electroplating.
If the thickness is insufficient by itself, a metal plating film layer of nickel or the like having a thickness of 1 to 2 μm is formed on the surface of the metal thin film layer 20 by electroplating. The metal plating layer 22 having a large number of holes is formed by using a photoelectroforming technique. Then, the perforated plate member 10 has a required thickness such that it can be easily handled, for example, 80
In order to obtain the metal plating layer 22 having a thickness of μm, the unit process of photoelectroforming is repeated a plurality of times, for example, three times. The honeycomb body 14 has rigidity and is formed to have a constant thickness. And perforated plate member
When the entire size of the adsorption plate is set to about several hundreds of mm square so that it can fully function as a reinforcing member of 10 and can withstand a pressure of about 1 kg / cm 2 , the honeycomb body 14 may have, for example, several tens of millimeters.
The thickness is about mm.

【0018】次に、図2ないし図5に基づいて、図1に
示したような構成の吸着板を製造する方法の1例につい
て説明する。
Next, an example of a method of manufacturing the suction plate having the structure shown in FIG. 1 will be described with reference to FIGS.

【0019】まず、図2(a)に示すような25μm程
度の厚みのポリイミドフィルム24の片面(上面)側を放
電加工して粗面化した後、図2(b)に示すように、ポ
リイミドフィルム24の上面に真空蒸着により0.3〜
0.4μm程度の厚みのニッケル薄膜層26を被着形成し
て、ポリイミドフィルム24の表面に導電性を付与する。
次に、電気メッキにより、図2(c)に示すように、ニ
ッケル薄膜層26の上面に1〜2μm程度の厚みのニッケ
ルメッキ膜層28を被着形成し、このニッケルメッキ膜層
28の上面にフォトレジスト液を塗布して乾燥させ、図2
(d)に示すように、2〜3μm程度の厚みのフォトレ
ジスト層30を被着形成する。次に、図2(e)に示すよ
うに、水銀ランプから光線32を、露光用マスク板34を介
在させてフォトレジスト層30の表面に照射し、フォトレ
ジスト層30を露光した後、通常の手法により現像、水洗
及び乾燥処理して、図2(f)に示すように、約100
μm程度の間隔でニッケルメッキ膜層28の表面にレジス
ト膜36を被着形成する。そして、電気メッキにより、図
3(g)に示すように、ニッケルメッキ膜層28の、レジ
スト膜36で被覆されていない露出部位上に第1段のニッ
ケルメッキ層38を形成した後、水洗する。続いて、図3
(h)に示すように、第1段のニッケルメッキ層38の凹
窩部にフォトレジスト液を塗布して充填し、レジスト膜
36上に第1段のニッケルメッキ層38と同等の厚みの第1
段のフォトレジスト層40を形成する。そして、第1段の
ニッケルメッキ層38及び第1段のフォトレジスト層40を
表面研磨するなどして第1段のニッケルメッキ層38の表
面を十分に露出させた状態にしてから、再び電気メッキ
して、図3(i)に示すように、第1段のニッケルメッ
キ層38上に第2段のニッケルメッキ層42を形成し、その
後に水洗する。続いて同様の工程を繰り返し、図3
(j)に示すように、第1段のフォトレジスト層40上に
第2段のニッケルメッキ層42と同等の厚みの第2段のフ
ォトレジスト層44を形成し、第2段のニッケルメッキ層
42上に第3段のニッケルメッキ層46を形成する。そし
て、苛性ソーダ水溶液を使用して、レジスト膜36、第1
段のフォトレジスト層40及び第2段のフォトレジスト層
44の全体をニッケルメッキ膜層28上から剥離し、その後
に水洗して、図4(k)に示すように、最細部の直径が
約30μm程度の貫通孔50が多数形成された約80μm
程度の厚みのニッケルメッキ層48を得る。
First, one side (upper surface) of a polyimide film 24 having a thickness of about 25 μm as shown in FIG. 2 (a) is subjected to electric discharge machining to roughen the surface, and then polyimide as shown in FIG. 2 (b). 0.3 to 0.3 by vacuum deposition on the top surface of film 24
A nickel thin film layer 26 having a thickness of about 0.4 μm is adhered and formed to give conductivity to the surface of the polyimide film 24.
Next, as shown in FIG. 2C, a nickel plating film layer 28 having a thickness of about 1 to 2 μm is deposited on the upper surface of the nickel thin film layer 26 by electroplating.
Apply photoresist solution to the upper surface of 28 and dry it.
As shown in (d), a photoresist layer 30 having a thickness of about 2 to 3 μm is deposited. Next, as shown in FIG. 2 (e), the surface of the photoresist layer 30 is irradiated with a light beam 32 from a mercury lamp through an exposure mask plate 34 to expose the photoresist layer 30, and then a normal light is applied. After the development, washing with water and drying according to the method, as shown in FIG.
A resist film 36 is formed on the surface of the nickel plating film layer 28 at intervals of about μm. Then, as shown in FIG. 3G, a first-stage nickel plating layer 38 is formed on the exposed portion of the nickel plating film layer 28 that is not covered with the resist film 36 by electroplating, and then washed with water. . Then, FIG.
As shown in (h), the concave portion of the nickel plating layer 38 of the first stage is coated and filled with a photoresist liquid to form a resist film.
The first layer with the same thickness as the first-stage nickel plating layer 38 on 36
A stepped photoresist layer 40 is formed. Then, the surface of the nickel plating layer 38 of the first step and the photoresist layer 40 of the first step are polished to make the surface of the nickel plating layer 38 of the first step sufficiently exposed, and then electroplating is performed again. Then, as shown in FIG. 3 (i), a second-stage nickel plating layer 42 is formed on the first-stage nickel plating layer 38, and then washed with water. Then, the same process is repeated, and FIG.
As shown in (j), a second-step photoresist layer 44 having the same thickness as the second-step nickel plating layer 42 is formed on the first-step photoresist layer 40, and the second-step nickel plating layer is formed.
A nickel plating layer 46 of a third stage is formed on 42. Then, using a caustic soda aqueous solution, the resist film 36, the first
Step photoresist layer 40 and second step photoresist layer
The entire 44 is peeled off from the nickel-plated film layer 28, and then washed with water, and as shown in FIG.
A nickel-plated layer 48 having a thickness of about 4 is obtained.

【0020】次に、図4(i)に示すように、ニッケル
メッキ層48側からエキシマレーザ光52を、ニッケルメッ
キ層48の多数の貫通孔50に対応した多数のビーム通過部
がパターン形成されたマスク板54を介して照射する。こ
れにより、図4(m)に示すように、ニッケルメッキ膜
層28、ニッケル薄膜層26及びポリイミドフィルム24を貫
通し上側開口端の直径が20〜30μmで下側開口端の
直径が1〜4μmである逆台形状の貫通細孔56を形成
し、貫通孔50と貫通細孔56とが連通して形成されるスペ
ーサ材吸着孔60を有する多孔板部材58を得る。そして、
図5(n)に示すように、ロールコータ66を使用し、厚
さ方向に直線状に貫通した多数の通気孔64を有する数1
0mm程度の均一な厚みのハニカム体62の片面側に接着剤
68を均一に薄く塗布する。最後に、図5(o)に示すよ
うに、多孔板部材58のニッケルメッキ層48側とハニカム
体62の、接着剤68が塗布された側とを対向させ、ハニカ
ム体62と多孔板部材58とを圧着によって接合することに
より、吸着板が完成する。このとき、ハニカム体62には
ロールコータ66によって均一に薄く接着剤68が塗布され
ているため、接着剤68の塊によってニッケルメッキ層48
の貫通孔50が塞がれる心配が無い。
Next, as shown in FIG. 4 (i), a large number of beam passing portions corresponding to the large number of through holes 50 of the nickel plating layer 48 are patterned by excimer laser light 52 from the nickel plating layer 48 side. Irradiate through the mask plate 54. As a result, as shown in FIG. 4 (m), the nickel plated film layer 28, the nickel thin film layer 26, and the polyimide film 24 are penetrated so that the diameter of the upper opening end is 20 to 30 μm and the diameter of the lower opening end is 1 to 4 μm. Thus, the perforated plate member 58 having the inverted trapezoidal through-hole 56 and the spacer material adsorption hole 60 formed by the through-hole 50 and the through-hole 56 communicating with each other is obtained. And
As shown in FIG. 5 (n), a roll coater 66 is used, and a number 1 having a large number of ventilation holes 64 penetrating linearly in the thickness direction is used.
An adhesive is applied to one side of the honeycomb body 62 having a uniform thickness of about 0 mm.
Apply 68 evenly and thinly. Finally, as shown in FIG. 5 (o), the nickel plating layer 48 side of the porous plate member 58 and the side of the honeycomb body 62 on which the adhesive 68 is applied are opposed to each other, and the honeycomb body 62 and the porous plate member 58. The suction plate is completed by joining and by pressure bonding. At this time, since the adhesive 68 is uniformly and thinly applied to the honeycomb body 62 by the roll coater 66, the nickel plating layer 48 is formed by the lump of the adhesive 68.
There is no concern that the through hole 50 of will be blocked.

【0021】また、図1に示した構成と同等の構成を有
する吸着板を製造する別の方法を、図6ないし図9に基
づいて以下に説明する。
Another method of manufacturing the suction plate having the same structure as that shown in FIG. 1 will be described below with reference to FIGS. 6 to 9.

【0022】まず、図6(A)に示すような密着性及び
剥離性が良いステンレス等の金属薄板70の片面(上面)
に、図6(B)に示すように、フォトレジスト液を塗
布、乾燥させて2〜3μm程度の厚みのフォトレジスト
層72を被着形成する。次に、図6(C)に示すように、
水銀ランプから光線74を、露光用マスク板76を介在させ
てフォトレジスト層72の表面に照射し、フォトレジスト
層72を露光した後、通常の手法により現像、水洗及び乾
燥処理して、図6(D)に示すように、約100μm程
度の間隔で金属薄板70の表面にレジスト膜78を被着形成
する。そして、電気メッキにより、図6(E)に示すよ
うに、金属薄板70の、レジスト膜78で被覆されていない
露出部位上に第1段のニッケルメッキ層80を形成した
後、水洗する。続いて、図7(F)に示すように、第1
段のニッケルメッキ層80の凹窩部にフォトレジスト液を
塗布して充填し、レジスト膜78上に第1段のニッケルメ
ッキ層80と同等の厚みの第1段のフォトレジスト層82を
形成する。そして、第1段のニッケルメッキ層80及び第
1段のフォトレジスト層82を表面研磨するなどして第1
段のニッケルメッキ層80の表面を十分に露出させた状態
にしてから、再び電気メッキして、図7(G)に示すよ
うに、第1段のニッケルメッキ層80上に第2段のニッケ
ルメッキ層84を形成し、その後に水洗する。続いて同様
の工程を繰り返し、図7(H)に示すように、第1段の
フォトレジスト層82上に第2段のニッケルメッキ層84と
同等の厚みの第2段のフォトレジスト層86を形成し、第
2段のニッケルメッキ層84上に第3段のニッケルメッキ
層88を形成する。そして、図7(I)に示すように、第
1段のニッケルメッキ層80及びレジスト膜78の各下面か
ら金属薄板70を剥離した後、苛性ソーダ水溶液を使用し
て、レジスト膜78、第1段のフォトレジスト層82及び第
2段のフォトレジスト層86の全体を第1段、第2段及び
第3段のニッケルメッキ層80、84、88から除去し、その
後に水洗して、図8(J)に示すように、最細部の直径
が約30μm程度の貫通孔92が多数形成された約80μ
m程度の厚みの薄板状ニッケルメッキ体90を得る。
First, one surface (upper surface) of a metal thin plate 70 such as stainless steel having good adhesion and peeling property as shown in FIG. 6 (A).
Then, as shown in FIG. 6B, a photoresist solution is applied and dried to deposit a photoresist layer 72 having a thickness of about 2 to 3 μm. Next, as shown in FIG.
The surface of the photoresist layer 72 is irradiated with a light beam 74 from a mercury lamp through an exposure mask plate 76, and the photoresist layer 72 is exposed to light. As shown in (D), a resist film 78 is deposited on the surface of the metal thin plate 70 at intervals of about 100 μm. Then, as shown in FIG. 6 (E), a first-stage nickel plating layer 80 is formed on the exposed portion of the metal thin plate 70 which is not covered with the resist film 78 by electroplating, followed by washing with water. Then, as shown in FIG.
A photoresist solution is applied and filled in the concave portions of the nickel plating layer 80 of the step, and a first-step photoresist layer 82 having the same thickness as the nickel plating layer 80 of the first step is formed on the resist film 78. . Then, the surface of the first-stage nickel plating layer 80 and the first-stage photoresist layer 82 is polished to form a first layer.
After the surface of the nickel plating layer 80 of the step is sufficiently exposed, electroplating is performed again, and as shown in FIG. 7G, the nickel of the second step is plated on the nickel plating layer 80 of the first step. The plated layer 84 is formed and then washed with water. Subsequently, the same steps are repeated, and as shown in FIG. 7H, a second-step photoresist layer 86 having the same thickness as the second-step nickel plating layer 84 is formed on the first-step photoresist layer 82. Then, the nickel plating layer 88 of the third step is formed on the nickel plating layer 84 of the second step. Then, as shown in FIG. 7 (I), the thin metal plate 70 is peeled off from the lower surfaces of the nickel plating layer 80 and the resist film 78 of the first step, and then the resist film 78 and the first step of the caustic soda solution are used. Of the first photoresist layer 82 and the second photoresist layer 86 are removed from the nickel plating layers 80, 84 and 88 of the first, second and third stages, followed by rinsing with water, as shown in FIG. As shown in J), about 80μ with a large number of through holes 92 with a diameter of about 30μm in the smallest detail.
A thin plate nickel-plated body 90 having a thickness of about m is obtained.

【0023】次に、図8(K)に示すように、薄板状ニ
ッケルメッキ体90と片面に接着剤層96が塗布形成された
25μm程度の厚みのポリイミドフィルム94とを、熱加
圧ローラ98を使用して圧着することにより、図8(L)
に示すように、薄板状ニッケルメッキ体90の、金属薄板
70が剥離された面に接着剤層96を介してポリイミドフィ
ルム94を接合する。そして、図4(l)〜図5(n)に
基づいて上述した工程と同様の工程を経ることにより、
図9(M)に示すように、接着剤層96及びポリイミドフ
ィルム94を貫通し上側開口端の直径が20〜30μmで
下側開口端の直径が1〜4μmである逆台形状の貫通細
孔100と貫通孔92とが連通して形成されるスペーサ材吸
着孔104を有する多孔板部材102と、厚さ方向に直線状に
貫通した多数の通気孔108を有する数10mm程度の均一
な厚みのハニカム体106とが接着剤110によって接合され
た吸着板が得られる。
Next, as shown in FIG. 8K, a thin plate-shaped nickel-plated body 90 and a polyimide film 94 having a thickness of about 25 μm and having an adhesive layer 96 applied and formed on one surface are heat-pressurized roller 98. 8 (L) by crimping using
As shown in, the thin plate nickel-plated body 90, metal thin plate
A polyimide film 94 is bonded to the surface from which the 70 is peeled off via an adhesive layer 96. Then, by going through the same steps as those described above with reference to FIGS. 4 (l) to 5 (n),
As shown in FIG. 9M, an inverted trapezoidal through hole that penetrates the adhesive layer 96 and the polyimide film 94 and has an upper opening end diameter of 20 to 30 μm and a lower opening end diameter of 1 to 4 μm. A perforated plate member 102 having a spacer material adsorption hole 104 formed by communicating 100 and a through hole 92, and a plurality of ventilation holes 108 linearly penetrating in the thickness direction and having a uniform thickness of about several tens mm. An adsorption plate obtained by joining the honeycomb body 106 with the adhesive 110 is obtained.

【0024】[0024]

【発明の効果】この発明は以上説明したように構成され
かつ作用するので、この発明によれば、湿式散布及び従
来の乾式散布におけるような諸問題点を解決することが
できる、図10に示したようなスペーサ材分散方法の実施
化が可能になる。すなわち、配管を通して吸気装置及び
排気装置に切換え的に連通接続される吸排気室に、スペ
ーサ材吸着孔が全面にわたって均一に多数形成された吸
着板を、吸排気室の開口面を閉塞するように気密に取着
したスペーサ材分散装置を構成し、吸着板の多数のスペ
ーサ材吸着孔の配列に従って分散した状態で多数のスペ
ーサ材を基板面上に散布することが可能になる。そし
て、この発明は、液晶表示素子の性能の向上並びに量産
に際しての歩留まりの向上、さらには、スペーサ材の散
布量の制御の容易化やスペーサ材の利用効率の向上に大
いに寄与し得る。
Since the present invention is constructed and operates as described above, according to the present invention, various problems as in the wet spraying and the conventional dry spraying can be solved, as shown in FIG. It is possible to implement such a spacer material dispersion method. That is, in the intake / exhaust chamber that is switchably connected to the intake device and the exhaust device through the pipe, a suction plate having a large number of spacer material suction holes formed uniformly over the entire surface is formed so as to close the opening face of the intake / exhaust chamber. It is possible to configure an airtightly attached spacer material dispersion device and to disperse a large number of spacer materials on the substrate surface in a dispersed state according to the arrangement of a large number of spacer material adsorption holes of the adsorption plate. The present invention can greatly contribute to the improvement of the performance of the liquid crystal display device, the improvement of the yield in mass production, the easy control of the spray amount of the spacer material, and the improvement of the utilization efficiency of the spacer material.

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明の1実施例に係る、液晶表示素子用ス
ペーサ材分散装置の吸着板を破断状態で示す部分拡大斜
視図である。
FIG. 1 is a partially enlarged perspective view showing a suction plate of a spacer material dispersion device for a liquid crystal display element in a broken state according to an embodiment of the present invention.

【図2】図1に示した構成の吸着板を製造する方法の1
例について説明するための部分拡大縦断面図である。
FIG. 2 is a first method of manufacturing the suction plate having the configuration shown in FIG.
It is a partial expanded longitudinal cross-sectional view for explaining an example.

【図3】同じく部分拡大縦断面図である。FIG. 3 is a partially enlarged vertical sectional view of the same.

【図4】同じく部分拡大縦断面図である。FIG. 4 is a partially enlarged vertical sectional view of the same.

【図5】同じく部分拡大縦断面図である。FIG. 5 is a partially enlarged vertical sectional view of the same.

【図6】図1に示した構成と同等の構成を有する吸着板
を製造する別の方法を説明するための部分拡大縦断面図
である。
FIG. 6 is a partially enlarged vertical cross-sectional view for explaining another method of manufacturing the suction plate having the same configuration as that shown in FIG.

【図7】同じく部分拡大縦断面図である。FIG. 7 is a partially enlarged vertical sectional view of the same.

【図8】同じく部分拡大縦断面図である。FIG. 8 is a partially enlarged vertical sectional view of the same.

【図9】同じく部分拡大縦断面図である。FIG. 9 is a partially enlarged vertical sectional view of the same.

【図10】湿式散布及び従来の乾式散布における諸問題点
を解決するスペーサ材分散方法を説明するための模式図
である。
FIG. 10 is a schematic diagram for explaining a spacer material dispersion method for solving various problems in wet spraying and conventional dry spraying.

【符号の説明】[Explanation of symbols]

10、58、102 多孔板部材 12、60、104 スペーサ材吸着孔 14、62、106 ハニカム体 16、64、108 ハニカム体の通気孔 18、24、94 ポリイミドフィルム 20 金属薄膜層 22 金属メッキ層 26 ニッケル薄膜層 28 ニッケルメッキ膜層 36、78 レジスト膜 38、80 第1段のニッケルメッキ層 40、82 第1段のフォトレジスト層 42、84 第2段のニッケルメッキ層 44、86 第2段のフォトレジスト層 46、88 第3段のニッケルメッキ層 48 ニッケルメッキ層 50 ニッケルメッキ層の貫通孔 52 エキシマレーザ光 54 マスク板 56、100 貫通細孔 68、110 接着剤 70 金属薄板 90 薄板状ニッケルメッキ 92 薄板状ニッケルメッキの貫通孔 96 接着剤層 10, 58, 102 Perforated plate member 12, 60, 104 Spacer material adsorption holes 14, 62, 106 Honeycomb body 16, 64, 108 Honeycomb body ventilation holes 18, 24, 94 Polyimide film 20 Metal thin film layer 22 Metal plating layer 26 Nickel thin film layer 28 Nickel plated film layer 36, 78 Resist film 38, 80 First stage nickel plated layer 40, 82 First stage photoresist layer 42, 84 Second stage nickel plated layer 44, 86 Second stage Photoresist layer 46, 88 Third-stage nickel plating layer 48 Nickel plating layer 50 Nickel plating layer through hole 52 Excimer laser light 54 Mask plate 56, 100 Through hole 68, 110 Adhesive 70 Metal thin plate 90 Thin plate nickel plating 92 Thin plate nickel plated through hole 96 Adhesive layer

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 合成樹脂フィルムの上面に均一な厚みの
金属メッキ層が密着形成された積層構造をなし、前記合
成樹脂フィルム及び金属メッキ層をそれぞれ貫通した状
態で、かつ、合成樹脂フィルムの下面側の開口直径がス
ペーサ材の直径より小さくなるように、多数のスペーサ
材吸着孔が全面にわたって均一に形成された多孔板部材
の、前記金属メッキ層側に、一定の厚みに形成され剛性
を有する多孔補強部材を接合してなり、 吸排気室の開口面を閉塞するように気密に取着され、ス
ペーサ材を散布しようとする基板に対向して配置され
る、液晶表示素子用スペーサ材分散装置の吸着板。
1. A laminated structure in which a metal plating layer having a uniform thickness is adhered and formed on an upper surface of a synthetic resin film, the synthetic resin film and the metal plating layer are respectively penetrated, and the lower surface of the synthetic resin film is formed. Has a certain thickness on the metal plating layer side of the perforated plate member having a large number of spacer material adsorption holes formed uniformly over the entire surface such that the opening diameter on the side is smaller than the diameter of the spacer material and has rigidity. A spacer material dispersion device for liquid crystal display elements, which is formed by joining porous reinforcement members, is airtightly attached so as to close the opening surface of the intake / exhaust chamber, and is arranged facing the substrate on which the spacer material is to be dispersed. Adsorption plate.
【請求項2】 多孔補強部材が、厚さ方向に直線状に貫
通した多数の通気孔を有するハニカム体である請求項1
記載の、液晶表示素子用スペーサ材分散装置の吸着板。
2. The honeycomb body, wherein the porous reinforcing member has a large number of ventilation holes penetrating linearly in the thickness direction.
A suction plate for a spacer material dispersion device for a liquid crystal display element as described above.
【請求項3】 合成樹脂フィルムの片面に真空蒸着又は
スパッタリングにより金属薄膜層を被着形成する工程
と、 前記金属薄膜層の表面に電気メッキにより金属メッキ膜
層を被着形成する工程と、 前記金属メッキ膜層の表面にフォトエレクトロフォーミ
ングにより、多数の貫通孔が全面にわたって均一に形成
された金属メッキ層を密着形成する工程と、 前記金属メッキ層側から、その金属メッキ層の多数の貫
通孔に対応した多数のビーム通過部がパターン形成され
たマスクを介してエキシマレーザ光を照射し、前記金属
メッキ膜層、金属薄膜層及び合成樹脂フィルムを貫通し
合成樹脂フィルムの、金属薄膜層の被着面側とは反対の
面側の開口直径がスペーサ材の直径より小さい貫通細孔
を前記多数の貫通孔にそれぞれ連通するように多数形成
する工程と、 前記金属メッキ層の表面に、一定の厚みに形成され剛性
を有する多孔補強部材を接合する工程とからなる、液晶
表示素子用スペーサ材分散装置の吸着板の製造方法。
3. A step of depositing a metal thin film layer on one surface of a synthetic resin film by vacuum vapor deposition or sputtering; a step of depositing a metal plating film layer on the surface of the metal thin film layer by electroplating; A step of closely adhering a metal plating layer having a large number of through holes uniformly formed on the surface of the metal plating film layer by photoelectroforming, and a plurality of through holes of the metal plating layer from the metal plating layer side. Irradiating excimer laser light through a mask in which a large number of beam passing portions corresponding to the above are formed, and the metal plating film layer, the metal thin film layer and the synthetic resin film penetrate the metal thin film layer of the synthetic resin film. A large number of through-holes having an opening diameter on the side opposite to the attachment surface side smaller than the diameter of the spacer material are formed so as to respectively communicate with the above-mentioned multiple through-holes. And a step of joining a porous reinforcing member having a certain thickness and having rigidity to the surface of the metal plating layer, the manufacturing method of the adsorption plate of the spacer material dispersion device for a liquid crystal display element.
【請求項4】 金属薄板の片面上にフォトエレクトロフ
ォーミングにより、多数の貫通孔が全面にわたって均一
に形成された薄板状金属メッキ体を形成する工程と、 前記薄板状金属メッキ体から前記金属薄板を剥離する工
程と、 前記薄板状金属メッキ体の、前記金属薄板が剥離された
面に合成樹脂フィルムを接合する工程と、 前記薄板状金属メッキ体側から、その薄板状金属メッキ
体の多数の貫通孔に対応した多数のビーム通過部がパタ
ーン形成されたマスクを介してエキシマレーザ光を照射
し、前記合成樹脂フィルムを貫通し合成樹脂フィルム
の、薄板状金属メッキ体との接合面側とは反対の面側の
開口直径がスペーサ材の直径より小さい貫通細孔を前記
多数の貫通孔にそれぞれ連通するように多数形成する工
程と、 前記薄板状金属メッキ体の表面に、一定の厚みに形成さ
れ剛性を有する多孔補強部材を接合する工程とからな
る、液晶表示素子用スペーサ材分散装置の吸着板の製造
方法。
4. A step of forming a thin plate-shaped metal plating body having a large number of through-holes uniformly formed on one surface of the thin metal plate by photoelectroforming, and a step of forming the thin metal plate from the thin plate-shaped metal plating body. A step of peeling, a step of joining a synthetic resin film to the surface of the thin plate-shaped metal plated body from which the thin metal plate has been peeled, and a number of through holes of the thin plate-shaped metal plated body from the side of the thin plate-shaped metal plated body. Is irradiated with excimer laser light through a mask in which a large number of beam passing portions corresponding to are pierced, and the synthetic resin film penetrating the synthetic resin film is opposite to the joint surface side with the thin plate metal plating body. Forming a large number of through-holes having an opening diameter on the surface side smaller than the diameter of the spacer material so as to communicate with the plurality of through-holes, respectively; On the surface of the body, and a step of bonding the porous reinforcing member having rigidity is formed at a constant thickness, the manufacturing method of the suction plate of the liquid crystal display device spacer material distribution apparatus.
JP15425393A 1993-05-31 1993-05-31 Adsorption panel of spacer material dispersing device for liquid crystal display element and production of panel Withdrawn JPH06342138A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15425393A JPH06342138A (en) 1993-05-31 1993-05-31 Adsorption panel of spacer material dispersing device for liquid crystal display element and production of panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15425393A JPH06342138A (en) 1993-05-31 1993-05-31 Adsorption panel of spacer material dispersing device for liquid crystal display element and production of panel

Publications (1)

Publication Number Publication Date
JPH06342138A true JPH06342138A (en) 1994-12-13

Family

ID=15580178

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15425393A Withdrawn JPH06342138A (en) 1993-05-31 1993-05-31 Adsorption panel of spacer material dispersing device for liquid crystal display element and production of panel

Country Status (1)

Country Link
JP (1) JPH06342138A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106560740A (en) * 2015-10-06 2017-04-12 乐金显示有限公司 Light Controlling Device, Transparent Display Device Including The Same, And Method For Fabricating The Same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106560740A (en) * 2015-10-06 2017-04-12 乐金显示有限公司 Light Controlling Device, Transparent Display Device Including The Same, And Method For Fabricating The Same

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