JP4164548B2 - Resist removal device - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a resist removing apparatus, and more particularly to a resist removing apparatus that can prevent entanglement or winding of a dry film resist peeled off from a substrate around a roller.
[0002]
[Prior art]
The plasma display panel (PDP) has been vigorously developed in recent years as a flat panel display that has a clear display and can have a large screen and is extremely thin compared to a cathode ray tube (CRT) or the like.
The PDP has a structure in which two glass substrates (a front substrate and a back substrate) are opposed to each other, electrodes are arranged on respective surfaces facing each other, and a gas such as He or Ne is sealed in a space between the substrates.
[0003]
Then, a minute discharge is generated by applying a voltage to each electrode, and the phosphor applied to the substrate is caused to emit light by this discharge to develop a color.
At this time, in order to prevent color interference between pixels, stripe-shaped or lattice-shaped ribs (also referred to as barrier ribs or partition walls) are usually provided on the back substrate surface.
[0004]
The rib is formed to have a height of about 100 to 200 μm and a width of about 30 μm using a method such as a sandblasting method or a photolithographic method.
Among them, the sandblasting method is a method of forming ribs by spraying abrasive powder using a photoresist as a mask to cut rib paste to form ribs, and it is said that high-definition ribs can be manufactured relatively easily.
[0005]
FIG. 8 is a diagram schematically showing a step of forming striped ribs on the back substrate using the sand blasting method (for emphasis, the ribs and the like are shown larger than the actual size).
Unless otherwise specified, hereinafter, the back substrate is simply referred to as a substrate, and the surface on which the rib is formed is referred to as the surface of the substrate.
[0006]
(A) First, the surface of the substrate G is solidly coated with the rib paste P and dried by heating.
(B) A dry film resist D is laminated thereon.
(C) After exposing the dry film resist D, the treatment liquid is showered to remove excess dry film resist and develop.
[0007]
(D) A polishing powder is sprayed using the remaining dry film resist D as a mask, and the rib paste is cut (etched) to form ribs R.
(E) A chemical solution (peeling solution) is sprayed to peel the dry film resist from the ribs R.
After this step (E), the rib R is baked and bonded to the substrate G.
[0008]
As mentioned above, although each process was described roughly, in fact, a finer operation | work is performed in each of each process.
For example, in the dry film resist peeling step (E), the dry film resist is peeled off after removing the polishing powder remaining on the substrate by washing with water or the like, or by spraying a chemical solution and simultaneously removing the polishing powder.
[0009]
Then, it is necessary to perform operations such as removing the chemical solution remaining on the substrate surface by blowing air and washing the substrate with cleaning water (for example, see JP-A-11-202502).
These operations are usually performed while being placed on a roller conveyor that intermittently supports the substrate and being conveyed through the apparatus (see, for example, JP-A-10-301300).
[0010]
FIGS. 9A and 9B are schematic views showing a conventional general resist removing apparatus, in which FIG. 9A is a side view and FIG. 9B is a top view (note that a shower pipe is omitted in FIG. 9B). .
The resist removing apparatus 100 includes a roller conveyor 101 and a chemical shower pipe 102 inside.
[0011]
The roller conveyor 101 includes a roller shaft 104 and a conveying roller 105 attached to both wall surfaces of the apparatus via bearings 103, and a plurality of roller shafts 104 are arranged in parallel in a horizontal posture.
A plurality of nozzle holes are opened in the shower pipe 102, and the chemical liquid L is sprayed on the surface of the substrate G that is placed on the roller conveyor 101 and conveyed.
[0012]
In such an apparatus, the sprayed chemical solution stays on the surface of the substrate G and is transported to the next cleaning step, so that the consumption of the chemical solution increases more than necessary and the cleaning efficiency of the cleaning step decreases. The so-called problem of taking out chemicals arises.
Therefore, in recent years, there has been proposed a removing device of a type in which the substrate G is not transported in the horizontal posture as described above but is transported in an inclined posture (see, for example, Japanese Patent Laid-Open No. 9-155306).
[0013]
In any case, such a conventional resist removing apparatus (including an inclined conveyance type) can function effectively for a resist of a type that is dissolved and removed in a chemical solution.
Such a type of resist dissolves in the chemical solution and flows down below the substrate G (see the arrows in FIGS. 9A and 9B) and is removed from the substrate G.
[0014]
However, the dry film resist is usually insoluble in a chemical solution.
The chemical only dissolves the adhesive that bonds the ribs to the dry film, and when the chemical is sprayed, a dry film resist with the same shape as the rib etching pattern (in the above case, striped or grid) is formed. It is peeled off.
And the dry film resist will be in the state which floated in the chemical | medical solution.
[0015]
In the above conventional resist removing apparatus, when the chemical solution in such a state flows down below the substrate G (see arrows in FIGS. 9A and 9B), the dry film resist in the chemical solution is entangled or wound around the roller conveyor. The problem of sticking arises.
That is, in such an apparatus, the peeled solid dry film resist may be wound around the roller conveyor 101 (the roller shaft 104 or the conveying roller 105) or may be caught in the bearing 103.
[0016]
If it becomes like this, it will become a big resistance at the time of a roller conveyor rotating, the conveyance capability of a roller conveyor will fall, and in an extreme case, an apparatus will stop.
In addition, since an extra load is applied to the drive motor of the roller conveyor, the power consumption becomes larger than necessary.
[0017]
Therefore, it is necessary to frequently remove the dry film resist wound around the roller conveyor. However, the apparatus has to be stopped each time, and there is a problem that the production efficiency is remarkably lowered.
[0018]
[Problems to be solved by the invention]
The present invention has been made in order to overcome the above-mentioned problems against the background of such circumstances.
That is, an object of the present invention is to provide a resist removing device that prevents the dry film resist peeled from the substrate from being entangled and wound around the roller conveyor.
[0019]
[Means for Solving the Problems]
Thus, as a result of earnest research on the background of such problems, the present inventor has arranged the roller conveyor of the resist removing apparatus in an inclined state, cantilevered the upper end, and opened the lower end side to the open end. Thus, the present inventors have found that the dry film resist can surely flow down without being entangled or wound, and have completed the present invention based on this finding.
[0020]
That is, the present invention provides (1) a plurality of conveying rollers arranged in parallel. And a plurality of guide rollers arranged side by side A resist removing device that removes a resist from the substrate by spraying a chemical solution from a spraying means on the substrate supported and transported by the transporting roller, Consists of a cylindrical roller, and for horizontal orientation It is disposed in an inclined state, and the roller shaft of the transport roller is cantilevered at the upper end, The guide roller is a cylindrical roller, and is disposed in an inclined state in a direction substantially orthogonal to the transport roller to support and transport the lower end of the substrate, and the roller shaft of the guide roller is at the upper end. Cantilevered, and provided with a collar on the upper end of the guide roller Resists in resist removal equipment.
[0025]
and again,( 2 ), The spraying means includes a plurality of shower pipes for spraying the chemical solution over the entire substrate. As described in (1) above Resists in resist removal equipment.
[0026]
and again,( 3 ), The shower pipe is The above-described (2), which is provided in a plane parallel to the substrate and inclined downward in the substrate transport direction. Resists in resist removal equipment.
[0027]
and again,( 4 ), The above described (2), wherein the shower pipe is rotated by a certain angle. Resists in resist removal equipment.
[0028]
and again,( 5 ), The spraying means The above-described (1), comprising a layered discharge pipe for spraying a chemical on the upper end of the substrate Resists in resist removal equipment.
[0029]
and again,( 6 ), The frame surrounding the transport roller, guide roller, and spraying means can be adjusted to a negative pressure environment. As described in (1) above Resists in resist removal equipment.
[0030]
If the present invention meets this purpose, the above 1 to 6 A configuration combining two or more selected from the above can also be adopted.
[0031]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, preferred embodiments of a resist removal apparatus of the present invention will be described with reference to the drawings.
FIG. 1 is a view of a resist removing apparatus of the present invention fixed to a gantry as viewed from the upstream side.
FIG. 2 is a view of the resist removing apparatus as viewed from the front (shown with the apparatus upright for convenience).
[0032]
The resist removing apparatus A according to the present invention conveys the substrate G in an inclined posture by inclining the whole apparatus and fixing it to the gantry B (see FIG. 1).
In this embodiment, the transport direction is a direction toward the back of the paper surface in FIG. 1, and a direction from right to left of the paper surface in FIG.
[0033]
The resist removing apparatus A includes a frame 1, a conveying roller 2, a guide roller 3, spraying means including a shower pipe 4, a drive system including a drive motor 5, and the like.
The frame 1 is formed so as to surround the transport roller 2, the guide roller 3, the spraying means, and the like, and various chemicals are sprayed therein. Therefore, the frame 1 is formed of a material such as a plastic plate having excellent chemical resistance. .
[0034]
In this embodiment, since the chemical solution is used repeatedly, the bottom surface 11 of the frame 1 is inclined to collect the sprayed chemical solution.
And the chemical | medical solution collected from the discharge pipe 13 provided in the rear wall 12 of the frame 1 is discharged | emitted, after removing solid components, such as a dry film resist, it accommodates in the tank which is not shown in figure.
[0035]
Further, in order to prevent leakage of the chemical solution to the outside of the frame body, an exhaust duct 14 is opened in the rear wall 12 of the frame body 1, and the air inside the frame body 1 is exhausted and the internal pressure becomes a negative pressure environment. It can be adjusted to be.
Furthermore, it is more preferable to use a transparent material for the frame 1 because the internal working situation can be monitored at any time.
[0036]
In the resist removing apparatus A, a plurality of conveying rollers 2 are arranged in parallel at an equal pitch, and a roller conveyor is formed as a whole.
The roller shaft 21 of the conveying roller 2 is inserted into the upper wall 15 of the frame body 1 and is freely rotatable via a bearing or the like by two support plates 22 and a support plate 23 fixed to the frame B outside the frame body 1. Supported.
Thus, in this apparatus A, the conveyance roller 2 is cantilevered by the support plate 22 and the support plate 23 at the upper end of the roller shaft 21, and the lower end side is an open end.
[0037]
Incidentally, as described above, the device A is used by being fixed to the gantry B in a state where the entire device is inclined (see FIG. 1).
Accordingly, since the transport roller 2 is also used in an inclined state, it is possible to transport the substrate G while supporting the substrate G in an inclined posture at the same time.
[0038]
Since the resist removing apparatus A of the present invention supports and conveys the lower end of the substrate G from below, a plurality of guide rollers 3 arranged in parallel in a direction substantially orthogonal to the conveying roller are provided on the lower end side of the substrate G. Prepare.
As described above, since the entire apparatus is used while being fixed to the gantry B in an inclined state, the guide roller 3 is used in an inclined state as well as the transport roller 2.
[0039]
As in the case of the transport roller 2, the roller shaft 31 of the guide roller 3 is inserted into the front wall 16 of the frame body 1 and is supported by two support plates 32 and 33 fixed to the frame B outside the frame body 1. Therefore, it is rotatably supported via a bearing or the like.
As described above, in this apparatus A, like the conveying roller 2, the guide roller 3 is also cantilevered by the support plate 32 and the support plate 33 at the upper end (front end) of the roller shaft 31, and the lower end side is opened. It is the end.
[0040]
The guide roller 3 is preferably provided with a flange 34 on the upper end side thereof.
This is because even if the lower end of the substrate G being conveyed, that is, the portion that contacts the guide roller 3 is displaced toward the front wall side of the frame 1, it is stopped before contacting the front wall 16.
[0041]
Here, the conveyance roller 2 and the guide roller 3 are preferably cylindrical rollers.
As the material, a material having excellent chemical resistance and abrasion resistance and having hardness and flexibility to such an extent that the glass does not break even if it comes into contact, for example, a polyolefin resin such as polyethylene is preferably employed.
[0042]
In order to prevent the sprayed chemical liquid from leaking out of the apparatus from the gap between the upper wall 15 or the front wall 16 of the frame 1 and the roller shaft, the liquid is applied to the inner part such as the upper wall of the roller shaft 21 or the roller shaft 31. Stop plates (not shown) are arranged in double and triple.
Further, as described above, since the pressure inside the frame body is maintained in the negative pressure environment by the exhaust duct 14, leakage of the chemical liquid and the like outside the frame body is reliably prevented.
[0043]
In this embodiment, the spraying means is configured by arranging a plurality of shower pipes 4 in parallel.
The shower pipe 4 (a part of which is shown in FIG. 2) is arranged in parallel with a certain interval with respect to a roller conveyor formed by a plurality of transport rollers 2.
At this time, it may be arranged in a slightly inclined state with respect to the transport direction of the substrate G so that the chemical solution is surely applied to the entire surface of the substrate G (see the one-dot chain line in FIGS. 1 and 2).
[0044]
FIG. 3 is an enlarged view of a spraying means including a shower pipe.
The shower pipe 4 is provided with a plurality of spray nozzles 41, one end of which is supported by a main pipe 43 via a bearing portion 42.
The spray nozzle 41 is appropriately selected and used from a 1-fluid nozzle, a 2-fluid nozzle, and the like having various spray patterns in consideration of a spraying amount of the chemical solution.
[0045]
The bearing part 42 has a sealed bearing structure, and the shower pipe 4 is rotatably attached.
The chemical liquid L is supplied from the tank (not shown) outside the apparatus described above to the main pipe 43 through the supply pipe 44, distributed to each shower pipe 4 and sprayed from the spray nozzle 41.
The main pipe 43 is fixed to the apparatus A by fixing means (not shown), and the shower pipe 4 is positioned in the apparatus.
[0046]
The opposite end of the shower pipe 4 is rotatably attached to the support body 45 via a bearing or the like, and is fixed to one end of the connecting piece 46 outside the support body 45.
The support body 45 is fixed to the device A by fixing means (not shown).
[0047]
Further, the other end of the connecting piece 46 is rotatably attached to a rod-like reciprocating link 47.
The reciprocating link 47 reciprocates in the vertical direction by a power source (not shown) installed outside the frame (see the vertical arrow in the figure).
The reciprocating motion of the reciprocating link 47 in the vertical direction is transmitted to the shower pipe 4 through the connecting piece 46 and rotates the shower pipe 4 by a certain angle (see the arrow around the shower pipe in the figure).
[0048]
By rotating the shower pipe 4 in this manner, the spray nozzle 41 performs a so-called swinging motion in the vertical direction, so that it is possible to efficiently spray the chemical liquid over the entire surface of the substrate.
Of course, it is possible to fix the direction of the spray nozzle 41 without rotating the shower pipe 4.
[0049]
1 and 2, the transport roller 2 and the guide roller 3 are rotationally driven in synchronization by a drive system including a drive motor 5.
The rotation of the drive motor 5 is driven and transmitted to each guide roller 3 via a chain 51 and a sprocket 35 attached to the upper end of the roller shaft 31.
[0050]
The rotational drive of the drive motor 5 is transmitted from the sprocket 52 to the pulley 55 above the apparatus A via the pulley 53 on the same shaft, the timing belt 54 and the like.
And the sprocket 56 attached to the same shaft is rotated, The rotation is transmitted to the sprocket 24 via the chain 57, and each conveyance roller 2 is rotated synchronously.
Thus, in the resist removing apparatus A of the present invention, all of the transport roller 2 and the guide roller 3 rotate in synchronization.
[0051]
For example, a change such as using a timing belt and a pulley in a portion where the chain and the sprocket are used can be appropriately changed, and an auxiliary unit for pressing the chain against the sprocket is also appropriately provided.
Further, the transport roller and the guide roller only need to exhibit the function of supporting and transporting the substrate. For example, only one of them can be driven to rotate and the other can be freely rotated.
[0052]
The basic structure of the resist removing apparatus A according to the present invention has been described above. Next, the apparatus A will be described in more detail based on the actual process of processing the substrate G.
As will be described later, the resist removing apparatus A of the present invention can be used for stripping various resists as well as dry film resists.
However, here, a description will be given in accordance with a dry film resist peeling process in which the present invention exhibits excellent effects.
[0053]
A substrate G (see FIG. 8D), on which ribs are formed by sandblasting, is carried into apparatus A by transfer means (not shown) such as a transfer apparatus or a robot separate from apparatus A.
Specifically, the substrate (in this case, the substrate G1 in FIG. 2) is inclined by the transfer means, and is provided with a slit-shaped carry-in port (upstream wall 17) provided on the upstream wall (upstream wall 17) of the frame 1 ( (Not shown) is carried into apparatus A.
[0054]
The substrate G is arranged in a state indicated by a one-dot chain line in FIG. 1 and FIG. 2 (the central substrate G in FIG. 2), and a predetermined chemical solution is sprayed from the spray nozzle 41 of the shower pipe 4 over the entire surface of the substrate G.
Then, as described above, the adhesive that bonds the rib and the dry film resist is dissolved, and the dry film resist is peeled off.
[0055]
The peeled dry film resist flows down the surface of the substrate G together with the sprayed chemical solution, and falls from the lower end of the substrate G to the bottom surface 11 of the frame 1.
At this time, a part of the dry film resist may be caught by the guide roller 3 or the conveyance roller 2 in some cases.
[0056]
However, as described above, the conveying roller 2 and the guide roller 3 of the resist removing apparatus A of the present invention are arranged in an inclined state, are cantilevered at the upper end of each roller shaft, and the lower end side is an open end. (See FIG. 1).
Moreover, the conveyance roller 2 and the guide roller 3 are cylindrical rollers.
[0057]
Therefore, even if the dry film resist is caught or slightly entangled with the guide roller 3 or the like, it is washed away by the sprayed chemical solution or by the chemical solution that flows down one after another along the substrate surface and falls from the open end of the roller. Do (washing function).
Also, the dry film resist caught by the roller naturally falls by the rotation of the guide roller 3 or the like (self-cleaning function).
[0058]
As described above, the resist removing apparatus A according to the present invention can accurately prevent the dry film resist from being wound around the roller by including the roller disposed in the inclined state and having the open end on the lower end side. .
Further, since the substrate G is transported in an inclined posture, most of the sprayed chemical liquid flows down to the bottom surface 11 of the frame 1.
Therefore, the above-mentioned problem of taking out the chemical solution is solved, and the chemical solution can be reused efficiently.
[0059]
Incidentally, there are cases where the polishing powder of the sandblasting process, which is the previous process, remains on the surface of the substrate G. By spraying the chemical solution, the polishing powder is washed away at the same time as the dry film resist is peeled off and can be efficiently removed. it can.
Therefore, a cleaning agent and other chemicals are appropriately added to the chemical solution for use.
[0060]
As described above, in the dry film resist peeling step, the rib R is not yet baked and is not necessarily firmly attached to the substrate (see FIGS. 8D and 8E).
For this reason, there is a possibility that the rib on the substrate surface may be inclined or peeled off from the substrate due to the impact of the chemical solution sprayed from the shower pipe 4.
[0061]
In order not to give an impact by the spraying, the spraying means is a layered discharge pipe for spraying the chemical liquid gently on the upper end of the substrate G in place of the shower pipe 4 or in the form of being attached to the shower pipe 4. Can also be provided.
FIG. 4 is a diagram illustrating a configuration example of a spraying unit including a layered discharge pipe.
[0062]
The layered discharge pipe 6 includes a slit nozzle 61.
The chemical liquid L is sent from the tank outside the apparatus to the layered discharge pipe 6 through the supply pipe 62, and discharged (layered dispersion) in layers from the slit nozzle 61 of the apparatus to the upper end of the substrate G.
Then, the dry film resist is peeled off while gently flowing down the surface of the substrate G.
[0063]
The supply pipe 62 also has a function of supporting the layered discharge pipe 6.
At this time, if the supply pipe 62 is attached to the apparatus so as to be movable in the direction along the transport roller 2 (the arrow direction in the drawing), the vertical position of the layered discharge pipe 6 can be adjusted according to the size of the substrate G. .
[0064]
On the other hand, since the chemical solution flowing down the substrate surface pulls the dry film resist partially peeled from the ribs downward, the ribs may be inclined or peeled off (see FIG. 5).
In other words, the dry film resist D from which the flowing chemical solution is partially peeled is pulled, and the dry film resist D pulls the rib R of the bonded portion without being peeled yet, so that the rib is inclined (R1) or peeled off. (R2).
[0065]
Such a phenomenon is likely to occur when the flow rate of the chemical solution on the substrate surface is too high. Therefore, it can be avoided by making the inclined state of the substrate gentle. The resist removing apparatus A of the present invention is fixed to the gantry B by inclining the entire apparatus (see FIG. 1). By changing the fixing angle of the apparatus, the inclination angle of the transport roller can be freely changed. it can.
[0066]
FIG. 6 is a schematic diagram illustrating the inclination angle θ of the transport roller.
The inclination angle θ is an angle formed by the transport roller 2 and the horizontal plane H, and at the same time, an angle indicating the degree of inclination of the substrate G with respect to the horizontal plane.
When the inclination angle θ of the transport roller 2 is set to a small angle (for example, about 30 °), the flow rate of the chemical solution on the substrate surface decreases, and the above-described problems of rib inclination and peeling can be avoided.
[0067]
Incidentally, if the inclination angle θ of the transport roller 2 is increased, the flow rate of the chemical solution is increased, so that the dry film resist peeling efficiency is improved.
Therefore, the inclination angle θ of the conveying roller 2 is appropriately selected from the viewpoints of the above problems and peeling efficiency, and is usually selected from an angle range of about 20 to 80 °.
[0068]
The substrate G is conveyed in an inclined posture in the apparatus A while receiving the spray of the chemical solution from the shower pipe 4 or the layered discharge pipe 6 (see FIGS. 1 and 2).
As described above, since the transport roller 2 and the guide roller 3 rotate in synchronization with the drive system, the substrate G is smoothly transported in the downstream direction.
[0069]
In this way, the substrate G is peeled off the dry film resist (in some cases, the sandblasting polishing powder is removed at the same time), and finally the carry-out port (illustrated) provided on the downstream wall 18 of the frame 1 of the apparatus A is shown. Not carried out).
[0070]
As described above, the resist removing apparatus A of the present invention exhibits excellent performance in the dry film resist peeling step.
However, it naturally functions effectively even for resists of the type that can be dissolved in the chemical solution described in the conventional example.
[0071]
In other words, the resist removing apparatus A of the present invention can be used for removing all resists used in various photolithography techniques, whether dry film resists or soluble resists.
Effective in not only normal printed circuit board manufacturing processes and conductive or insulating thick film forming processes, but also in manufacturing processes of field emission displays (FED), electroluminescence (EL), liquid crystal display devices, fluorescent display devices, etc. It goes without saying that it can be used.
[0072]
Although the present invention has been described above, the present invention is not limited to the embodiments, and it goes without saying that various other modifications are possible without departing from the essence thereof.
For example, instead of inclining the entire apparatus as in the above-described embodiment, it is naturally possible to dispose the conveying roller 2 and the like in an inclined state inside the apparatus C standing upright on a horizontal plane (see FIG. 7). .
[0073]
Further, when the inclination angle θ of the conveyance roller is large (for example, as shown in FIG. 1), it can be said that the dry film resist is not caught on the conveyance roller.
In such a case, the conveying roller is not the cylindrical roller as described above, but a roller as shown in FIG. 9 (however, the roller shaft is cantilevered at its upper end). Is possible.
[0074]
Furthermore, in recent years, the size of plasma display panels has been increasing, and the resist removal apparatus of the present invention can be expanded by increasing the number of rollers or by connecting a plurality of apparatuses. It is.
[0075]
【The invention's effect】
According to the present invention, the transport roller is disposed in an inclined state, is cantilevered at the upper end thereof, and has an open end at the lower end side, so that the entanglement or winding of the dry film resist can be reliably prevented. .
The same is true for the guide rollers.
[0076]
Further, the chemical solution can be accurately applied to the entire surface of the substrate by the application means including the shower pipe and the layered discharge pipe.
Furthermore, the chemical solution is reliably applied to the entire surface by providing the shower pipe so as to be inclined with respect to the transport direction of the substrate.
[Brief description of the drawings]
FIG. 1 is a view of a resist removing apparatus of the present invention fixed to a pedestal as viewed from the upstream side.
FIG. 2 is a front view of the resist removing apparatus.
FIG. 3 is an enlarged view of a spraying means including a shower pipe.
FIG. 4 is a diagram illustrating a configuration example of a spraying unit including a layered discharge pipe.
FIG. 5 is a schematic view showing a state in which the rib is inclined and peeled off by being pulled by the dry film resist.
FIG. 6 is a schematic diagram for explaining an inclination angle θ of a transport roller.
FIG. 7 is a schematic diagram showing a configuration example in which an inclined conveying roller and the like are arranged in an upright apparatus.
FIG. 8 is a diagram schematically showing a step of forming striped ribs on the back substrate using a sand blast method.
9A and 9B are schematic views showing a conventional general resist removal apparatus, in which FIG. 9A is a side view and FIG. 9B is a top view.
[Explanation of symbols]
1 ... Frame
11 ... Bottom
12 ... Back wall
13 ... discharge pipe
14 ... Exhaust duct
15 ... Upper wall
16 ... Front wall
17 ... Upstream wall
18 ... Downstream wall
2 ... Conveying roller
21 ... Roller shaft
22, 23 ... support plate
24 ... Sprocket
3 ... Guide roller
31 ... Roller shaft
32, 33 ... support plate
34 ... Buttocks
35 ... Sprocket
4 ... Shower pipe
41 ... Spray nozzle
42 ... Bearing part
43 ...
44 ... Supply pipe
45 ... Support
46 ... Connecting piece
47 ... Reciprocating link
5 ... Drive motor
51 ... Chain
52 ... Sprocket
53 ... Pulley
54. Timing belt
55 ... Pulley
56 ... Sprocket
57 ... Chain
6 ... Layered discharge pipe
61 ... Slit nozzle
62 ... Supply pipe
100: Conventional resist removing apparatus
101 ... Roller conveyor
102 ... Shower pipe
103 ... Bearing
104 ... Roller shaft
105 ... Conveying roller
A ... resist removal device
B ... Stand
C: Modification of resist removal apparatus
D ... Dry film resist
G, G1 ... Substrate
H ... Horizontal plane
L ... Chemical solution
P ... Rib paste
R, R1, R2 ... ribs

Claims (6)

The substrate is transported while being supported by the plurality juxtaposed conveying rollers and a plurality juxtaposed guide rollers, a resist removing apparatus for removing the resist from the substrate by spraying the chemical solution from the spraying means, said The transport roller is a cylindrical roller, and is further inclined with respect to the horizontal posture , and the roller shaft of the transport roller is cantilevered at the upper end, and the guide roller is formed from the cylindrical roller. Furthermore, in order to support and convey the lower end of the substrate, it is disposed in an inclined state in a direction substantially orthogonal to the conveyance roller, and the roller shaft of the guide roller is cantilevered at the upper end, and further the upper end of the guide roller A resist removing apparatus characterized in that a flange is provided on the side .   The resist removing apparatus according to claim 1, wherein the spraying means includes a plurality of shower pipes for spraying the chemical liquid over the entire substrate. The resist removing apparatus according to claim 2, wherein the shower pipe is provided so as to be inclined downward in a substrate transport direction within a plane parallel to the substrate . The resist removing apparatus according to claim 2, wherein the shower pipe is rotated by a predetermined angle .   The resist removing apparatus according to claim 1, wherein the spraying means includes a layered discharge pipe for spraying a chemical on the upper end of the substrate.   2. The resist removing apparatus according to claim 1, wherein the frame surrounding the conveying roller, the guide roller, and the spraying means can be adjusted to be a negative pressure environment.

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