JPH06339854A - Surface polishing method for ceramics - Google Patents

Surface polishing method for ceramics

Info

Publication number
JPH06339854A
JPH06339854A JP13035893A JP13035893A JPH06339854A JP H06339854 A JPH06339854 A JP H06339854A JP 13035893 A JP13035893 A JP 13035893A JP 13035893 A JP13035893 A JP 13035893A JP H06339854 A JPH06339854 A JP H06339854A
Authority
JP
Japan
Prior art keywords
surface plate
rings
ring
rotating
polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13035893A
Other languages
Japanese (ja)
Inventor
Yutaka Kubo
裕 久保
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Priority to JP13035893A priority Critical patent/JPH06339854A/en
Publication of JPH06339854A publication Critical patent/JPH06339854A/en
Pending legal-status Critical Current

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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

PURPOSE:To restain the occurrence of dimensional failure and a flaw and the like caused by the rotational fluctuation of rings by rotating forcibly the rings to hold a material to be worked inside in the inverse direction to the rotating direction of a rotary surface plate. CONSTITUTION:An abrasive grain is supplied onto a rotary surface plate 1 by an abrasive grain supply device. A ring 3 having the rotational center in a position separated by a prescribed dimension from the rotational center of this surface plate 1 is arranged by four pieces at its maximum on this rotary surface plate 1. A material 4 to be worked is held inside of the respective rings 3 by a pressurizing plate 5, and polishing pressure is applied to the material 4 to be worked. A gear 6 is arranged in the rotational center of the rotary surface plate 1, and this gear 6 and these rings 3 are meshed with each other, and these rings 3 are rotated forcibly in the inverse direction to the rotating direction of the rotary surface plate 1, and polishing work is carried out on the material 4 to be worked.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】セラミックスを高精度に研磨する
研磨方法に関するものである。
TECHNICAL FIELD The present invention relates to a polishing method for polishing ceramics with high precision.

【0002】[0002]

【従来の技術】砥粒を用いて精密な研磨を行う方法はラ
ップ加工と呼ばれ、セラミックスなどの脆性材料の部品
製作に適するとして幅広く用いられている方法である。
ラップ加工の方式のうち、片面研磨に用いられるリング
型研磨機と呼ばれる装置が操作法も比較的簡単であるた
め広く用いられている。このリング型研磨機は、回転す
る定盤上に、定盤の回転中心から離れた位置に回転中心
があり被加工物を保持するリングを定盤と同一方向に回
転させることにより、被加工物を回転しながら研磨を行
なうものある。
2. Description of the Related Art A method of performing precision polishing using abrasive grains is called lapping and is widely used as a method suitable for manufacturing brittle materials such as ceramics.
Among the lapping methods, an apparatus called a ring type polishing machine used for single-sided polishing is widely used because the operating method is relatively simple. This ring type polishing machine has a center of rotation on a rotating surface plate at a position distant from the center of rotation of the surface plate, and the ring holding the workpiece is rotated in the same direction as the surface plate, thereby rotating the workpiece. There are those that rotate while rotating.

【0003】[0003]

【発明が解決しようとする課題】上述のリング型研磨機
を用いる方法では、被加工物を保持するリングには特に
強制的な動力は与えられないものであり、回転する定盤
との摩擦力によって定盤と同一方向に従動するものであ
った。そのため、硬いセラミックスにそのまま使用する
と、加工速度が一定とならず加工の途中で寸法チェック
をする必要が生じたり、加工し過ぎて寸法不良が発生す
る場合があり、工数上からも、歩留り上からも問題とな
る場合があった。また、リングの回転が不均一となった
場合には製品にコスレ傷が発生することも多く、外観不
良の原因となることがあった。
In the method using the ring type polishing machine described above, the ring for holding the workpiece is not particularly forcibly powered, and the frictional force with the rotating surface plate is not applied. Was driven by the same direction as the surface plate. Therefore, if it is used as it is for hard ceramics, the machining speed may not be constant, and it may be necessary to check the dimensions during machining, or dimensional defects may occur due to over-machining. Could be a problem. Further, when the rotation of the ring is not uniform, the product often suffers from scratches, which may cause a poor appearance.

【0004】本発明の目的は、上述のリング型研磨機を
用いる方法を改良し、特にセラミックスを精度良く研磨
できるセラミックスの研磨方法を提供することである。
It is an object of the present invention to improve the method using the above-mentioned ring type polishing machine, and particularly to provide a ceramic polishing method capable of polishing ceramics with high precision.

【0005】[0005]

【課題を解決するための手段】本発明者は、上述のリン
グ型研磨機を検討し、セラミックスのように硬質の材料
に対しては、回転定盤の回転方向に対して、逆の回転を
リングに与えることにより被加工物を均一に、短時間で
研磨できることを見いだし本発明に到達した。すなわち
本発明は回転定盤上に置かれた砥粒を用いて被加工物の
表面研磨を行う方法であって、回転定盤上に置かれ被加
工物を内側に保持するリングを回転定盤の回転する方向
と逆方向に強制回転させることを特徴とするセラミック
スの表面研磨方法である。
DISCLOSURE OF THE INVENTION The present inventor has examined the above-mentioned ring-type polishing machine, and for a hard material such as ceramics, rotates it in the opposite direction to the rotation direction of the rotary platen. It has been found that the work can be uniformly polished in a short time by giving it to the ring, and the present invention has been accomplished. That is, the present invention is a method for polishing the surface of a workpiece using abrasive grains placed on a rotary surface plate, in which a ring placed on the rotary surface plate and holding the workpiece inside is rotated. The surface polishing method for ceramics is characterized in that the surface is forcibly rotated in a direction opposite to the rotating direction of the.

【0006】[0006]

【作用】リングの回転は定盤の回転に従動するのではな
く強制的に定盤と逆方向に強制回転させるため、リング
の回転速度を被加工物による負荷に関係なく一定とする
ことが可能となる。また定盤の回転方向とは逆に回転さ
せるため、被加工物の接触する速度を高めることにな
り、金属材料に比較して硬いセラミックスの研磨を行う
のに適したものとなる。そのため、正確な部品寸法を得
ることが可能となり、加工途中での寸法チェックおよび
これにともなう工数が低減できる。リングを定盤上に複
数個配置する場合にも、それぞれのリング間の寸法差が
なくなり、同一寸法のものを同時に数倍の量加工するこ
とが可能となる。
[Function] Since the rotation of the ring is not driven by the rotation of the surface plate but is forced to rotate in the opposite direction to the surface plate, the rotation speed of the ring can be made constant regardless of the load by the workpiece. Becomes Further, since the platen is rotated in the direction opposite to the rotating direction, the contact speed of the workpiece is increased, which is suitable for polishing ceramics that are harder than metal materials. Therefore, it becomes possible to obtain an accurate part size, and it is possible to reduce the number of man-hours required for size check during the process. Even when a plurality of rings are arranged on the surface plate, there is no dimensional difference between the rings, and it becomes possible to process the same size at the same time by several times.

【0007】[0007]

【実施例】【Example】

(実施例1)以下実施例により本発明を更に詳細に説明
する。10×20×3mmのアルミナ板の研磨加工を行
ない、寸法および傷の発生状態について調査した。使用
した装置の構成図を図1および図2に示す、図1および
図2の装置は、半径610mmの回転定盤1の上に、砥
粒2が供給される装置であり、回転定盤の回転中心から
190mmに回転中心がある外径260mmのリング3
を最大4個設置可能で、リング3の内側に被加工物4を
保持するとともに被加工物4に研磨圧力を加える加圧板
5を有するものである。さらに図1の装置には回転定盤
の回転中心にギヤ6が設けられ、ギヤ6とリング3がか
み合うことによってリング3が定盤の回転方向と逆の方
向に強制回転されるものである。
(Example 1) The present invention will be described in more detail with reference to the following examples. The alumina plate having a size of 10 × 20 × 3 mm was polished, and the dimension and the state of occurrence of scratches were investigated. 1 and 2 show the configuration of the used apparatus. The apparatus of FIGS. 1 and 2 is an apparatus in which abrasive grains 2 are supplied onto a rotary platen 1 having a radius of 610 mm. Ring 3 with an outer diameter of 260 mm, whose center of rotation is 190 mm from the center of rotation
Up to four can be installed, and the pressurizing plate 5 that holds the workpiece 4 inside the ring 3 and applies a polishing pressure to the workpiece 4 is provided. Further, in the apparatus shown in FIG. 1, a gear 6 is provided at the center of rotation of the rotary platen, and the ring 6 is forcibly rotated in the direction opposite to the rotating direction of the platen by engaging the gear 6 and the ring 3.

【0008】図1の装置により1リング当たり50ケ装
入、加工時間30分研磨を10回行った。他の加工条件
を表1に示す。また比較例としてギヤを使用しないもの
についても同条件で加工を行なった。い、本発明例と同
様の評価を行なった。結果を表2に示す。表2によれば
本発明の方法により研磨したアルミナ板 試料No.1〜10
は、比較例 試料No.11〜20に比べて寸法のバラツキが
著しく減少するとともに、回転の不均一に起因して生じ
るコスレ傷の発生も大幅に低減できることがわかる。
Using the apparatus of FIG. 1, 50 pieces were loaded per ring and polishing was performed 10 times for 30 minutes. Other processing conditions are shown in Table 1. Further, as a comparative example, processing was performed under the same conditions even for the case where no gear was used. Then, the same evaluation as in the example of the present invention was performed. The results are shown in Table 2. According to Table 2, an alumina plate polished by the method of the present invention Sample Nos. 1 to 10
In comparison with Comparative Samples Nos. 11 to 20, the dimensional variation is remarkably reduced, and the occurrence of scuff marks caused by uneven rotation can be significantly reduced.

【0009】[0009]

【表1】 [Table 1]

【0010】[0010]

【表2】 [Table 2]

【0011】(実施例2)実施例1と同様の装置により
20×30×5mmの窒化アルミニウム板の研磨を行っ
た。この時1リング当たりの挿入量は25ケであり、加
工時間45分で10回の研磨を行った。他の加工条件を
表3に示す。また比較例としてギヤを使しないものにつ
いても同条件で加工を行なった。い、本発明例と同様の
評価を行なった。結果を表4に示す。表4によれば本発
明の方法により研磨した窒化アルミニウム板 試料No.2
1〜30は、比較例 試料No.31〜40に比べて寸法のバラツ
キが著しく減少するとともに、回転の不均一に起因して
生じるコスレ傷の発生も大幅に低減できたことがわか
る。
(Embodiment 2) An apparatus similar to that of Embodiment 1 was used to polish an aluminum nitride plate of 20 × 30 × 5 mm. At this time, the number of insertions per ring was 25, and polishing was performed 10 times with a processing time of 45 minutes. Other processing conditions are shown in Table 3. In addition, as a comparative example, processing was performed under the same conditions even for those that did not use gears. Then, the same evaluation as in the example of the present invention was performed. The results are shown in Table 4. According to Table 4, an aluminum nitride plate polished by the method of the present invention Sample No. 2
It can be seen that in 1 to 30, the dimensional variation was remarkably reduced as compared with the comparative sample Nos. 31 to 40, and the occurrence of scratches caused by uneven rotation was also significantly reduced.

【0012】[0012]

【表3】 [Table 3]

【0013】[0013]

【表4】 [Table 4]

【0014】[0014]

【発明の効果】本発明の加工方法を用いることにより、
リング型研磨機によりセラミックスを研磨する場合問題
となっていたリングの回転のばらつきによる寸法不良お
よび傷等の発生を抑えることがてぎるため、高精度な研
磨面を得ることができる。セラミックスの高精度な研磨
は、特にセラミックスを電子部品用として使用するため
には欠くことのできない工程であり、本発明は極めて有
効である。
By using the processing method of the present invention,
Since it is possible to suppress the occurrence of dimensional defects and scratches due to variations in the rotation of the ring, which has been a problem when polishing ceramics with a ring-type polishing machine, it is possible to obtain a highly accurate polished surface. High-precision polishing of ceramics is an essential step for using ceramics for electronic parts, and the present invention is extremely effective.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施に使用した装置の構成を示す斜視
図である。
FIG. 1 is a perspective view showing a configuration of an apparatus used for implementing the present invention.

【図2】本発明の実施に使用した装置の構成を示す断面
図である。
FIG. 2 is a cross-sectional view showing the structure of an apparatus used for implementing the present invention.

【符号の説明】[Explanation of symbols]

1 回転定盤、2 砥粒、3 リング、4 被加工物、
5 加圧板、6 ギヤ
1 rotating surface plate, 2 abrasive grains, 3 ring, 4 work piece,
5 pressure plates, 6 gears

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 回転定盤上に置かれた砥粒を用いて被加
工物の表面研磨を行う方法であって、回転定盤上に置か
れ被加工物を内側に保持するリングを回転定盤の回転す
る方向と逆方向に強制回転させることを特徴とするセラ
ミックスの表面研磨方法。
1. A method for polishing the surface of a workpiece using abrasive grains placed on a rotating surface plate, comprising rotating a ring placed on the rotating surface plate and holding the object inside. A method for polishing a surface of ceramics, which comprises forcibly rotating the disk in a direction opposite to the rotating direction of the disk.
JP13035893A 1993-06-01 1993-06-01 Surface polishing method for ceramics Pending JPH06339854A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13035893A JPH06339854A (en) 1993-06-01 1993-06-01 Surface polishing method for ceramics

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13035893A JPH06339854A (en) 1993-06-01 1993-06-01 Surface polishing method for ceramics

Publications (1)

Publication Number Publication Date
JPH06339854A true JPH06339854A (en) 1994-12-13

Family

ID=15032478

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13035893A Pending JPH06339854A (en) 1993-06-01 1993-06-01 Surface polishing method for ceramics

Country Status (1)

Country Link
JP (1) JPH06339854A (en)

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