JPH06338014A - Magnetic head - Google Patents

Magnetic head

Info

Publication number
JPH06338014A
JPH06338014A JP12391093A JP12391093A JPH06338014A JP H06338014 A JPH06338014 A JP H06338014A JP 12391093 A JP12391093 A JP 12391093A JP 12391093 A JP12391093 A JP 12391093A JP H06338014 A JPH06338014 A JP H06338014A
Authority
JP
Japan
Prior art keywords
magnetic
magnetic head
thin film
film
adhesive glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12391093A
Other languages
Japanese (ja)
Inventor
Osamu Watanabe
修 渡辺
Shintaro Hara
慎太郎 原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP12391093A priority Critical patent/JPH06338014A/en
Publication of JPH06338014A publication Critical patent/JPH06338014A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To avoide sinking of a joined part of adhesive glass and to improve CSS characteristics by specifying the whole film thickness of the adhesive glass and oxidizing thin film to 0.4-1.7mum, more preferably 0.5-1.5mum. CONSTITUTION:Head core blocks 13, 14, after bonded is cut shown as a chain line in the figure according to the outer dimension of a magnetic head, machined into a specified shape, and subjected to polishing, etc., to produce a magnetic head. In this process, by specifying the whole film thickness of the adhesive glass and the oxidizing thin film to 0.4-1.7mum, preferably to 0.5-1.5mum, sinking in the joined part of the glass is prevented. Moreover, CSS characteristics can be improved and the defect rate due to peeling in the bonded part can be suppressed to about 5%.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は磁気記録再生装置に用い
られる磁気ヘッド、特に金属磁性薄膜を非磁性基板間で
狭持して磁気コアを形成する磁気ヘッドに関するもので
ある。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic head used in a magnetic recording / reproducing apparatus, and more particularly to a magnetic head in which a metal magnetic thin film is sandwiched between nonmagnetic substrates to form a magnetic core.

【0002】[0002]

【従来の技術】近年、磁気記憶装置の高密度記録化に伴
い、磁気ヘッドとして、高飽和磁束密度、狭トラック化
等が要求されるようになった。
2. Description of the Related Art In recent years, with high density recording of magnetic storage devices, high saturation magnetic flux density, narrower track, etc. have been required for magnetic heads.

【0003】これらの要求を満たすものとして、Fe−
Al−Si合金、非晶質合金などの金属磁性膜を、蒸着
やスパッタリング等の薄膜形成技術により基板上に形成
し磁気コアを形成した積層型の磁気ヘッドがある。しか
し、金属磁性膜の片面のみに非磁性基板を配した構造で
は、機械的強度が弱く、また耐摩耗性が劣るという問題
点を有していることがわかった。そこで、本出願人は、
これらの問題点を解決するものとして金属磁性膜の両側
を非磁性基板で挟持した構造の磁気ヘッドを開発し、特
許出願を行った(特開昭63−249913号公報、特
願平3−308800号)。
To satisfy these requirements, Fe-
There is a laminated magnetic head in which a metal magnetic film such as an Al—Si alloy or an amorphous alloy is formed on a substrate by a thin film forming technique such as vapor deposition or sputtering to form a magnetic core. However, it has been found that the structure in which the non-magnetic substrate is arranged on only one surface of the metal magnetic film has problems of low mechanical strength and poor wear resistance. Therefore, the applicant
In order to solve these problems, a magnetic head having a structure in which both sides of a metal magnetic film are sandwiched by non-magnetic substrates was developed and a patent application was filed (Japanese Patent Application Laid-Open No. 63-249913, Japanese Patent Application No. 3-308800). issue).

【0004】以下に従来の磁気ヘッドについて説明す
る。図7は従来の磁気ヘッドの要部斜視図であり、図8
は図7のA部の部分拡大図である。1は磁気ヘッドのス
ライダー、2は金属磁性膜、3はチタン酸カルシウム、
α−ヘマタイト、結晶ガラス等からなる第1の非磁性基
板、4は第1の非磁性基板3と同様な材料からなる第2
の非磁性基板、5は金属磁性膜2の表面に形成されたS
iO2 等からなる第1の酸化物薄膜、6は金属磁性膜2
と第2の非磁性基板4を接合する接着ガラス、7は接着
ガラス6と第2の非磁性基板4の間に設けられた第2の
酸化物薄膜、8は磁気ギャップ、9は巻線溝である。
A conventional magnetic head will be described below. FIG. 7 is a perspective view of a main part of a conventional magnetic head.
FIG. 8 is a partially enlarged view of part A of FIG. 7. 1 is a slider of a magnetic head, 2 is a metal magnetic film, 3 is calcium titanate,
The first non-magnetic substrate 4 made of α-hematite, crystalline glass or the like, and the second non-magnetic substrate 4 made of the same material as the first non-magnetic substrate 3.
Non-magnetic substrate 5 of S is formed on the surface of the metal magnetic film 2.
First oxide thin film made of iO 2 etc., 6 is metal magnetic film 2
And an adhesive glass for joining the second non-magnetic substrate 4 to each other, 7 a second oxide thin film provided between the adhesive glass 6 and the second non-magnetic substrate 4, 8 a magnetic gap, and 9 a winding groove Is.

【0005】接着ガラス6の厚みは、例えばVTR用等
の磁気ヘッドで3μm程度のものが使用されている。
The thickness of the adhesive glass 6 is about 3 μm for a magnetic head for VTR or the like.

【0006】以上のように構成された従来の磁気ヘッド
について、以下その製造方法を説明する。まず、結晶化
ガラスやセラミックス等の第1の非磁性基板3表面に金
属磁性膜2をスパッタリング等の手法により形成し、そ
の金属磁性膜2上にSiO2等の第1の酸化物薄膜5を
形成する。次に第2の非磁性基板4の金属磁性膜2の形
成されていないもう片方にSiO2 等の第2の酸化物薄
膜7及び接着ガラス6を形成する。このようにして作製
した基板を数枚重ね、加圧、加温溶着して磁気コアブロ
ックを作製する。その後、一対の積層磁気コアブロック
の少なくとも一方に巻線溝9を形成し、所定厚のSiO
2 膜等を介して積層磁気コアを突合せ磁気ギャップ8を
形成し所定の形状に機械加工して磁気ヘッドを製造して
いた。
A method of manufacturing the conventional magnetic head having the above structure will be described below. First, the metal magnetic film 2 is formed on the surface of the first non-magnetic substrate 3 such as crystallized glass or ceramics by a method such as sputtering, and the first oxide thin film 5 such as SiO 2 is formed on the metal magnetic film 2. Form. Next, a second oxide thin film 7 such as SiO 2 and an adhesive glass 6 are formed on the other side of the second non-magnetic substrate 4 on which the metal magnetic film 2 is not formed. The magnetic core block is manufactured by stacking several substrates manufactured in this way and applying pressure and heat while welding. Then, the winding groove 9 is formed in at least one of the pair of laminated magnetic core blocks, and SiO 2 having a predetermined thickness is formed.
A magnetic head is manufactured by laminating a laminated magnetic core through two films or the like to form a butt magnetic gap 8 and machining it into a predetermined shape.

【0007】[0007]

【発明が解決しようとする課題】しかしながら上記従来
の構成では、金属磁性膜2が被着された第1の非磁性基
板3と第2の非磁性基板4を接着している接着ガラス6
の部分が厚くなると、接着ガラス6部分は側面の研磨に
よりへこみを生じ易く、その段差を10nm以下にする
ことは極めて困難であることが知られている。このよう
な段差には、コンタクト・スタート・ストップ(以下、
CSSと略す)によりディスク媒体からの付着物が溜ま
り易く、その結果ディスク媒体との摩擦力が増大して耐
久性に欠けるという問題点を有していた。逆に接着ガラ
ス層を薄くすると、十分な接着強度が得られず磁気ヘッ
ドの製造歩留りが低下するという問題点を有していた。
一方、金属磁性膜2と接着ガラス6の間及び接着ガラス
6と第2の非磁性基板4の間に設けた酸化物薄膜5,7
の膜厚を薄くすると、接着ガラス6が金属磁性膜2に反
応浸食して特性劣化をおこしたり、また非磁性基板3,
4と接着ガラス6とが反応して接着ガラス6が発泡及び
非磁性基板3,4にチッピングが発生し歩留りが低下し
生産性に欠けるという問題点を有していた。
However, in the above-mentioned conventional structure, the adhesive glass 6 for adhering the first non-magnetic substrate 3 and the second non-magnetic substrate 4 on which the metal magnetic film 2 is adhered is adhered.
It is known that when the thickness of the portion becomes thick, the portion of the adhesive glass 6 is likely to have a dent due to the polishing of the side surface, and it is extremely difficult to reduce the step to 10 nm or less. Contact start / stop (hereinafter,
The abbreviated form (CSS) easily deposits from the disk medium, resulting in an increase in the frictional force with the disk medium and a lack of durability. On the contrary, if the adhesive glass layer is made thin, sufficient adhesive strength cannot be obtained and the production yield of the magnetic head is reduced.
On the other hand, oxide thin films 5 and 7 provided between the metal magnetic film 2 and the adhesive glass 6 and between the adhesive glass 6 and the second non-magnetic substrate 4.
When the film thickness of the non-magnetic substrate 3 is reduced, the adhesive glass 6 reacts and corrodes the metal magnetic film 2 to cause characteristic deterioration.
4 and the adhesive glass 6 react with each other to cause foaming of the adhesive glass 6 and chipping of the non-magnetic substrates 3 and 4, resulting in a decrease in yield and lack of productivity.

【0008】本発明は上記従来の問題点を解決するもの
で、接着ガラス部分に段差を生じることがなく、CSS
特性を向上させることができ、十分な接着強度を有し低
原価で量産性に優れた磁気ヘッドを提供することを目的
とする。
The present invention solves the above-mentioned problems of the prior art, and does not generate a step in the adhesive glass portion, and the CSS
An object of the present invention is to provide a magnetic head which can improve characteristics, has sufficient adhesive strength, is low in cost, and is excellent in mass productivity.

【0009】[0009]

【課題を解決するための手段】この目的を達成するため
に本発明の磁気ヘッドは以下の構成からなる。
In order to achieve this object, the magnetic head of the present invention has the following structure.

【0010】請求項1の磁気ヘッドは、非磁性基板の表
面に金属磁性膜を被着し、前記金属磁性膜の表面に第1
の酸化物薄膜を形成した第1の非磁性基板と、他の非磁
性基板の表面に第2の酸化物薄膜を形成した第2の非磁
性基板とを接着ガラスで溶着してなる磁気ヘッドであっ
て、前記接着ガラスの膜厚と前記接着ガラスで融着され
る前記第1の酸化物薄膜及び前記第2の酸化物薄膜との
総膜厚が0.4μm〜1.7μm好ましくは0.5μm
〜1.5μmである構成を有している。
According to a first aspect of the present invention, there is provided a magnetic head, wherein a metal magnetic film is deposited on the surface of a non-magnetic substrate, and the first surface is formed on the surface of the metal magnetic film.
A magnetic head formed by fusing an adhesive glass to weld a first non-magnetic substrate having an oxide thin film formed thereon to a second non-magnetic substrate having a second oxide thin film formed on the surface of another non-magnetic substrate. Therefore, the total film thickness of the adhesive glass and the first oxide thin film and the second oxide thin film fused by the adhesive glass is 0.4 μm to 1.7 μm, preferably 0. 5 μm
.About.1.5 .mu.m.

【0011】請求項2の磁気ヘッドは、請求項1におい
て、接着ガラスの膜厚が0.1μm〜1.0μm好まし
くは0.2μm〜0.8μmである構成を有している。
According to a second aspect of the present invention, in the magnetic head according to the first aspect, the thickness of the adhesive glass is 0.1 μm to 1.0 μm, preferably 0.2 μm to 0.8 μm.

【0012】[0012]

【作用】この構成によって、接着ガラスと酸化物薄膜の
総膜厚が、1.7μm以下に形成しているので、側面の
研磨時の接着ガラス部分のへこみが10nm以下に押さ
えることができ、CSS特性を向上させることができ
る。一方、接着ガラスと酸化物薄膜の総膜厚が、0.4
μm以上に形成しているので、溶着熱処理工程でも金属
磁性膜と接着ガラスとの反応による特性劣化、接着強度
低下や、非磁性基板と接着ガラスとの反応による接着ガ
ラスの発泡等を防止することができ、接着強度の低下を
防止することができ、十分な機械的強度を有した磁気ヘ
ッドを得ることができる。
With this configuration, the total thickness of the adhesive glass and the oxide thin film is formed to be 1.7 μm or less, so that the dent in the adhesive glass portion at the time of polishing the side surface can be suppressed to 10 nm or less. The characteristics can be improved. On the other hand, the total thickness of the adhesive glass and the oxide thin film is 0.4.
Since it is formed with a thickness of μm or more, it is possible to prevent the deterioration of the characteristics due to the reaction between the metal magnetic film and the adhesive glass, the decrease in the adhesive strength, and the foaming of the adhesive glass due to the reaction between the non-magnetic substrate and the adhesive glass even in the welding heat treatment step. Therefore, it is possible to prevent a decrease in adhesive strength, and it is possible to obtain a magnetic head having sufficient mechanical strength.

【0013】[0013]

【実施例】以下本発明の一実施例における磁気ヘッドに
ついて、図面を参照しながら説明する。図1は本発明の
一実施例における磁気ヘッドの要部斜視図であり、図2
は図1のA部の部分拡大図である。図1及び図2におい
て、1は磁気ヘッドのスライダー、2は金属磁性膜、3
は第1の非磁性基板、4は第2の非磁性基板、8は磁気
ギャップ、9は巻線溝であり、これらは従来例と同様な
もので同一の符号を付し説明を省略する。10は金属磁
性膜2の表面に形成されたSiO2 膜等の第1の酸化物
薄膜、11は金属磁性膜2と第2の非磁性基板4を接合
する膜厚が0.2μm〜0.8μmの接着ガラス、12
は第2の非磁性基板4の表面に形成された第2の酸化物
薄膜である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS A magnetic head according to an embodiment of the present invention will be described below with reference to the drawings. 1 is a perspective view of a main part of a magnetic head according to an embodiment of the present invention.
[Fig. 2] is a partially enlarged view of a portion A in Fig. 1. 1 and 2, 1 is a slider of a magnetic head, 2 is a metal magnetic film, 3
Is a first non-magnetic substrate, 4 is a second non-magnetic substrate, 8 is a magnetic gap, and 9 is a winding groove. These are the same as those in the conventional example and are denoted by the same reference numerals, and description thereof will be omitted. Reference numeral 10 is a first oxide thin film such as a SiO 2 film formed on the surface of the metal magnetic film 2, 11 is a film thickness for bonding the metal magnetic film 2 and the second non-magnetic substrate 4 from 0.2 μm to 0. 8 μm adhesive glass, 12
Is a second oxide thin film formed on the surface of the second non-magnetic substrate 4.

【0014】ここで、金属磁性膜2の表面に形成された
酸化物薄膜10及び第2の非磁性基板4の表面に形成さ
れた酸化物薄膜12と接着ガラス11の総膜厚は0.5
μm以上で1.5μm以下になるように形成している。
The total thickness of the oxide thin film 10 formed on the surface of the metal magnetic film 2, the oxide thin film 12 formed on the surface of the second non-magnetic substrate 4 and the adhesive glass 11 is 0.5.
It is formed so as to be not less than 1.5 μm and not less than μm.

【0015】以上のように構成された磁気ヘッドについ
て、以下その製造方法を説明する。図3(a)は本発明
の一実施例における磁気ヘッドの第1の非磁性基板形成
工程を示す断面図であり、図3(b)は本発明の一実施
例における磁気ヘッドの第2の非磁性基板形成工程を示
す断面図であり、図3(c)は本発明の一実施例におけ
る磁気ヘッドの非磁性基板を接合した状態を示す斜視図
である。まず、図3(a)に示すようにチタン酸カルシ
ウム、α−ヘマタイト、結晶化ガラス等からなる第1の
非磁性基板3の表面にDC又はRFスパッタリング装置
により、Fe−Al−Si系合金等を所要の厚さ、例え
ば7μmの厚みを有する金属磁性膜2を形成する。この
金属磁性膜2の上に、汚染物質の吸着や酸化の防止、接
着ガラス6と金属磁性膜2との反応の防止、耐摩耗性の
向上の目的で膜厚0.3μm〜0.5μmのSiO2
等からなる第1の酸化物薄膜10をRFスパッタリング
により形成する。次いで、第1の酸化物薄膜10上に低
融点のガラス、例えば作業温度が500℃〜600℃の
溶着用の接着ガラス11を膜厚0.2μm〜0.8μm
になるようにスパッタリング法により形成する。
A method of manufacturing the magnetic head having the above structure will be described below. FIG. 3A is a cross-sectional view showing a step of forming a first non-magnetic substrate of a magnetic head in one embodiment of the present invention, and FIG. 3B is a second magnetic head in the embodiment of the present invention. FIG. 3C is a cross-sectional view showing the non-magnetic substrate forming step, and FIG. 3C is a perspective view showing a state in which the non-magnetic substrates of the magnetic head according to the embodiment of the present invention are joined. First, as shown in FIG. 3A, the surface of the first non-magnetic substrate 3 made of calcium titanate, α-hematite, crystallized glass or the like is coated with a Fe—Al—Si alloy or the like by a DC or RF sputtering device. Then, the metal magnetic film 2 having a required thickness, for example, 7 μm is formed. A film having a thickness of 0.3 μm to 0.5 μm is formed on the metal magnetic film 2 for the purpose of preventing adsorption of contaminants and oxidation, prevention of reaction between the adhesive glass 6 and the metal magnetic film 2, and improvement of abrasion resistance. The first oxide thin film 10 made of a SiO 2 film or the like is formed by RF sputtering. Then, a glass having a low melting point, for example, an adhesive glass 11 for welding at a working temperature of 500 ° C. to 600 ° C. and having a film thickness of 0.2 μm to 0.8 μm is formed on the first oxide thin film 10.
Is formed by a sputtering method.

【0016】一方、図3(b)に示すように第2の非磁
性基板4の表面に、第2の非磁性基板4と接着ガラス1
1の反応防止、耐摩耗性の向上の目的で第1の酸化物薄
膜10と同様にRFスパッタリング法により0.3μm
〜0.5μmの第2の酸化物薄膜12を形成する。ここ
で、酸化物薄膜10,12、接着ガラス11の総膜厚は
0.5μm以上1.5μm以下になるように制御する。
尚、本実施例においては、第1の非磁性基板3の最上面
に接着ガラス層を形成するようにしたが、第2の非磁性
基板4側の第2の酸化物薄膜12上に形成してもよい
し、また、第1の非磁性基板3及び第2の非磁性基板4
の各々の最上面に所要の膜厚の半分の低融点ガラス薄膜
を形成してもよい。次に、第1の非磁性基板3と第2の
非磁性基板4を治具を用いて加圧、加温溶着して、図3
(c)に示すような非磁性基板ブロックを形成する。
On the other hand, as shown in FIG. 3B, the second non-magnetic substrate 4 and the adhesive glass 1 are formed on the surface of the second non-magnetic substrate 4.
For the purpose of preventing the reaction of No. 1 and improving wear resistance, 0.3 μm is formed by the RF sputtering method like the first oxide thin film 10.
A second oxide thin film 12 having a thickness of 0.5 μm is formed. Here, the total film thickness of the oxide thin films 10 and 12 and the adhesive glass 11 is controlled to be 0.5 μm or more and 1.5 μm or less.
Although the adhesive glass layer is formed on the uppermost surface of the first non-magnetic substrate 3 in this embodiment, it is formed on the second oxide thin film 12 on the second non-magnetic substrate 4 side. Alternatively, the first non-magnetic substrate 3 and the second non-magnetic substrate 4 may be used.
A low-melting-point glass thin film having a thickness half that required may be formed on the uppermost surface of each of the above. Next, the first non-magnetic substrate 3 and the second non-magnetic substrate 4 are pressure-welded and heated and welded using a jig, and then, as shown in FIG.
A nonmagnetic substrate block as shown in (c) is formed.

【0017】次に、図4を用いてヘッドコアブロック形
成工程を説明する。図4(a)は本発明の一実施例にお
ける磁気ヘッドの非磁性基板を複数積層した積層ブロッ
クの要部斜視図であり、図4(b)は本発明の一実施例
における磁気ヘッドの非磁性基板のプレートの要部斜視
図であり、図4(c)は本発明の一実施例における磁気
ヘッドのヘッドコアブロックの要部斜視図である。ま
ず、第2の非磁性基板4の上面にも第1の非磁性基板3
と同様にして、金属磁性膜等が形成された非磁性基板を
複数個積層し、接合して図4(a)に示すような非磁性
基板ブロックを形成する。
Next, the head core block forming process will be described with reference to FIG. FIG. 4A is a perspective view of a main part of a laminated block in which a plurality of non-magnetic substrates of a magnetic head according to an embodiment of the present invention are laminated, and FIG. 4B is a perspective view of a magnetic head according to an embodiment of the present invention. FIG. 4C is a perspective view of a main part of a plate of a magnetic substrate, and FIG. 4C is a perspective view of a main part of a head core block of a magnetic head according to an embodiment of the present invention. First, the first non-magnetic substrate 3 is also formed on the upper surface of the second non-magnetic substrate 4.
Similarly, a plurality of nonmagnetic substrates on which a metal magnetic film or the like is formed are laminated and bonded to form a nonmagnetic substrate block as shown in FIG.

【0018】次に、非磁性基板を複数積層し、接合した
ブロックを一点鎖線で示すように積層面に対して直角に
切断して図4(b)に示すようなプレートを形成し、更
に図4(b)において一点鎖線で示したようにプレート
面と金属磁性膜2が直交するように短冊状に切断して、
図4(c)に示すような一対のヘッドコアブロック1
3,14を作製する。次いで、図4(c)に示すように
少なくとも一方のヘッドコアブロックのギャップ対向面
に金属磁性膜2に直交するコイル溝を形成し両ヘッドコ
アブロック13,14のギャップ対向面を鏡面加工す
る。次に、ヘッドコアブロックの何れか一方または両方
のギャップ対向面にギャップスペーサとして、ギャップ
幅に相当する厚さのSiO2 薄膜をスパッタリング法に
より形成後、ヘッドコアブロック13,14とを磁気ギ
ャップ8を介して各コア部の金属磁性膜2が互いに相対
するように位置合わせをしながら加圧保持し、ボンディ
ングを行う。
Next, a plurality of non-magnetic substrates are laminated and the joined blocks are cut at right angles to the laminating plane as shown by the chain line to form a plate as shown in FIG. 4 (b). 4 (b), the plate surface and the metal magnetic film 2 are cut in a strip shape so as to be orthogonal to each other, as indicated by a dashed line,
A pair of head core blocks 1 as shown in FIG.
3 and 14 are produced. Next, as shown in FIG. 4C, a coil groove orthogonal to the metal magnetic film 2 is formed on the gap facing surface of at least one head core block, and the gap facing surfaces of both head core blocks 13 and 14 are mirror-finished. Then, a SiO 2 thin film having a thickness corresponding to the gap width is formed as a gap spacer on one or both of the head core blocks facing the gap by a sputtering method, and then the head core blocks 13 and 14 and the magnetic gap 8 are formed. The metal magnetic films 2 of the respective cores are aligned and positioned under pressure while being held, and bonding is performed.

【0019】次に、図5を用いて、磁気ヘッドの切断工
程について説明する。図5(a)は本発明の一実施例に
おける磁気ヘッドのボンディング済みのヘッドコアブロ
ックの斜視図であり、図5(b)は本発明の一実施例に
おける磁気ヘッドのヘッドコアブロックを切断した状態
を示す斜視図である。図5(a)に示すようにボンディ
ング済みのヘッドコアブロック13,14を一点鎖線で
示すように磁気ヘッドの外形寸法に合わせて図5(b)
に示すように切断し、所定の形状に切削加工し、研磨等
の工程(図示せず)を経て、図1に示すような磁気ヘッ
ドを形成した。
Next, the cutting process of the magnetic head will be described with reference to FIG. FIG. 5A is a perspective view of the head core block to which the magnetic head in the embodiment of the invention is bonded, and FIG. 5B is a sectional view of the head core block of the magnetic head according to the embodiment of the invention. It is a perspective view showing a state. As shown in FIG. 5A, the bonded head core blocks 13 and 14 are shown in FIG.
1 was cut, cut into a predetermined shape, and subjected to steps such as polishing (not shown) to form a magnetic head as shown in FIG.

【0020】以上のように製造された本発明の一実施例
における磁気ヘッドについて接着ガラスと酸化物薄膜の
膜厚を変えて性能比較試験を行った。以下その結果につ
いて説明する。
Performance comparison tests were carried out on the magnetic head in one example of the present invention manufactured as described above by changing the film thicknesses of the adhesive glass and the oxide thin film. The results will be described below.

【0021】(実験例)本実施例に示した製造方法によ
り、接着ガラスと酸化物薄膜の総膜厚が0.5μm〜
1.5μmの範囲で異なる複数のコアブロックを作製
し、各々コアブロックから磁気ヘッドを作製した。各々
の磁気ヘッドについて、CSS試験後の摩擦係数と接着
はがれの不良率を調べた。その結果を図6に示す。図6
は磁気ヘッドの接着ガラスと酸化物薄膜の総膜厚に対す
るCSS試験後の摩擦係数及び接着はがれの不良率の依
存性を示す図である。
(Experimental Example) According to the manufacturing method shown in this example, the total thickness of the adhesive glass and the oxide thin film was 0.5 μm.
A plurality of different core blocks were produced within a range of 1.5 μm, and a magnetic head was produced from each core block. With respect to each magnetic head, the coefficient of friction after the CSS test and the defective rate of adhesive peeling were examined. The result is shown in FIG. Figure 6
FIG. 3 is a diagram showing the dependence of the coefficient of friction and the peeling failure rate after the CSS test on the total thickness of the adhesive glass and oxide thin film of the magnetic head.

【0022】この図6から明らかなように0.5μm〜
1.5μmとすることにより、接着ガラス接合部分のへ
こみを解消できCSS特性を向上させることができた。
また、接着はがれによる不良率を5%程度に押さえるこ
とができた。
As is apparent from FIG. 6, 0.5 μm
By setting the thickness to 1.5 μm, it was possible to eliminate the dent in the bonded glass bonding portion and improve the CSS characteristics.
In addition, the defective rate due to peeling of the adhesive could be suppressed to about 5%.

【0023】(比較例1)実施例と同様の方法により、
接着ガラスと酸化物薄膜の総膜厚が0.1μm〜0.4
μmの範囲で異なる複数のコアブロックを作製し、各々
コアブロックから磁気ヘッドを作製し、CSS試験後の
摩擦係数と接着はがれによる不良率を調べた。その結果
を図6に示す。総膜厚が0.4μm以下になると、接着
はがれによる不良率が10%以上になり、それ以降急増
することがわかった。これは接着ガラスの膜厚が薄くな
ると接着強度が低下し、また酸化物薄膜の膜厚が薄くな
ると、金属磁性膜及び非磁性基板と接着ガラスの反応侵
食防止の効果が薄れ、接着強度が低下するためと考えら
れる。
(Comparative Example 1) By the same method as in Example,
The total thickness of the adhesive glass and the oxide thin film is 0.1 μm to 0.4
A plurality of core blocks different in the range of μm were produced, a magnetic head was produced from each core block, and the coefficient of friction after the CSS test and the defective rate due to peeling of the adhesive were examined. The result is shown in FIG. It has been found that when the total film thickness is 0.4 μm or less, the defective rate due to peeling of the adhesive becomes 10% or more, and then increases sharply thereafter. This is because when the thickness of the adhesive glass becomes thin, the adhesive strength decreases, and when the thickness of the oxide thin film becomes thin, the effect of preventing the reaction erosion between the metallic magnetic film and the non-magnetic substrate and the adhesive glass decreases, and the adhesive strength decreases. It is thought to be to do.

【0024】(比較例2)実施例と同様の方法により、
接着ガラスと酸化物薄膜の総膜厚が1.6μm〜1.9
μmまでの範囲で異なる複数のコアブロックを作製し、
各々のコアブロックから磁気ヘッドを作製し、CSS試
験後の摩擦係数と接着はがれによる不良率を調べた。そ
の結果を図6に示す。
Comparative Example 2 By the same method as in Example,
The total thickness of the adhesive glass and the oxide thin film is 1.6 μm to 1.9.
Fabricate multiple core blocks with different sizes up to μm,
A magnetic head was produced from each core block, and the coefficient of friction after the CSS test and the defective rate due to peeling of the adhesive were examined. The result is shown in FIG.

【0025】図6から明らかなように、総膜厚が1.5
μmを越えると、摩擦係数が0.5以上になりそれ以降
急速に増大することがわかった。そこで、最終仕上げ後
の接着ガラスと酸化物薄膜の総膜厚が1.8μmの磁気
ヘッドについて、接着ガラス接合部の段差を触針式表面
粗さ計により測定したところ、50nm〜150nmの
へこみが形成されていた。更に、この磁気ヘッドのCS
S試験後のヘッド媒体摺動面を観察したところ、接着ガ
ラス部分のへこみに付着物が存在していた。これが原因
で摩擦係数が増加したと考えられる。
As is clear from FIG. 6, the total film thickness is 1.5.
It has been found that when the thickness exceeds μm, the friction coefficient becomes 0.5 or more and increases rapidly thereafter. Then, when the step difference of the adhesive glass joint part was measured by a stylus type surface roughness meter for the magnetic head in which the total thickness of the adhesive glass and the oxide thin film after final finishing was 1.8 μm, a dent of 50 nm to 150 nm was found. Had been formed. Furthermore, the CS of this magnetic head
When the sliding surface of the head medium was observed after the S test, deposits were present in the dents in the adhesive glass portion. It is considered that the friction coefficient increased due to this.

【0026】従って、以上のことから、本実施例の磁気
ヘッドの接着ガラスと酸化物薄膜の総膜厚を0.4μm
〜1.7μm好ましくは0.5μm〜1.5μmの範囲
内に設定することにより接着ガラス部で十分な接着強度
を維持しつつ、CSS特性も優れていることがわかっ
た。
Therefore, from the above, the total thickness of the adhesive glass and the oxide thin film of the magnetic head of this embodiment is 0.4 μm.
.About.1.7 .mu.m, preferably 0.5 .mu.m to 1.5 .mu.m, it was found that sufficient adhesive strength is maintained in the adhesive glass portion and the CSS characteristics are excellent.

【0027】尚、本実施例では、金属磁性膜2はFe−
Al−Si系合金が使用されたが、非晶質合金膜あるい
は窒化合金を用いても同様であり、また酸化物薄膜5,
7はSiO2 に限らず、他の酸化物例えばAl2 3
TiO2 でも同様の効果がある。さらに酸化物薄膜とし
て複合酸化物であるフォルステライト(MgO−SiO
2 系)やジルコン(ZrO2 −SiO2 系)などを使用
してもよい。
In this embodiment, the metal magnetic film 2 is made of Fe-
Although an Al-Si alloy was used, the same applies when an amorphous alloy film or a nitride alloy is used.
7 is not limited to SiO 2 , but other oxides such as Al 2 O 3 ,
TiO 2 has the same effect. Furthermore, forsterite (MgO-SiO), which is a complex oxide, is used as an oxide thin film.
2 type) or zircon (ZrO 2 —SiO 2 type) or the like may be used.

【0028】[0028]

【発明の効果】以上のように本発明は、接着ガラスと酸
化物薄膜の総薄膜を0.4μm〜1.7μm好ましくは
0.5μm〜1.5μmの範囲内に設定することによ
り、接着ガラス接合部分のへこみを解消でき、CSS特
性を向上させることができる。更に接着ガラス部で十分
な接着強度が得られるため、接着部のはがれ等の不良を
低減化することができる高品質で歩留りの高い信頼性、
生産性に優れた磁気ヘッドを実現できるものである。
As described above, according to the present invention, the total thickness of the adhesive glass and the oxide thin film is set within the range of 0.4 μm to 1.7 μm, preferably 0.5 μm to 1.5 μm. It is possible to eliminate dents at the joint portion and improve CSS characteristics. Furthermore, since sufficient adhesive strength can be obtained at the adhesive glass part, high quality and high yield reliability that can reduce defects such as peeling of the adhesive part,
It is possible to realize a magnetic head with excellent productivity.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例における磁気ヘッドの要部斜
視図
FIG. 1 is a perspective view of a main part of a magnetic head according to an embodiment of the present invention.

【図2】図1のA部の部分拡大図FIG. 2 is a partially enlarged view of part A of FIG.

【図3】(a)本発明の一実施例における磁気ヘッドの
第1の非磁性基板形成工程を示す断面図 (b)本発明の一実施例における磁気ヘッドの第2の非
磁性基板形成工程を示す断面図 (c)本発明の一実施例における磁気ヘッドの非磁性基
板を接合した状態を示す斜視図
FIG. 3A is a sectional view showing a first non-magnetic substrate forming step of a magnetic head according to an embodiment of the present invention. FIG. 3B is a second non-magnetic substrate forming step of a magnetic head according to an embodiment of the present invention. (C) A perspective view showing a state in which non-magnetic substrates of a magnetic head in one embodiment of the present invention are joined together.

【図4】(a)本発明の一実施例における磁気ヘッドの
非磁性基板を複数積層した積層ブロックの要部斜視図 (b)本発明の一実施例における磁気ヘッドの非磁性基
板のプレートの要部斜視図 (c)本発明の一実施例における磁気ヘッドのヘッドコ
アブロックの要部斜視図
FIG. 4A is a perspective view of a main part of a laminated block in which a plurality of nonmagnetic substrates of a magnetic head according to an embodiment of the present invention are laminated. FIG. 4B is a nonmagnetic substrate plate of a magnetic head according to an embodiment of the present invention. (C) Perspective view of main part of head core block of magnetic head in one embodiment of the present invention

【図5】(a)本発明の一実施例における磁気ヘッドの
ボンディング済みのヘッドコアブロックの斜視図 (b)本発明の一実施例における磁気ヘッドのヘッドコ
アブロックを切断した状態を示す斜視図
FIG. 5A is a perspective view of a head core block to which a magnetic head of the present invention has been bonded, which has been bonded; FIG. 5B is a perspective view showing a state in which the head core block of the magnetic head of the present invention has been cut.

【図6】磁気ヘッドの接着ガラスと酸化物薄膜の総膜厚
に対するCSS試験後の摩擦係数及び接着はがれの不良
率の依存性を示す図
FIG. 6 is a diagram showing the dependence of the coefficient of friction and the peeling failure rate after the CSS test on the total thickness of the adhesive glass and the oxide thin film of the magnetic head.

【図7】従来の磁気ヘッドの要部斜視図FIG. 7 is a perspective view of a main part of a conventional magnetic head.

【図8】図7のA部の部分拡大図8 is a partially enlarged view of part A of FIG.

【符号の説明】 1 スライダー 2 金属磁性膜 3 第1の非磁性基板 4 第2の非磁性基板 5,10 第1の酸化物薄膜 6,11 接着ガラス 7,12 第2の酸化物薄膜 8 磁気ギャップ 9 巻線溝 13,14 ヘッドコアブロック[Explanation of symbols] 1 slider 2 metal magnetic film 3 first non-magnetic substrate 4 second non-magnetic substrate 5,10 first oxide thin film 6,11 adhesive glass 7,12 second oxide thin film 8 magnetic Gap 9 Winding groove 13,14 Head core block

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】非磁性基板の表面に金属磁性膜を被着し前
記金属磁性膜の表面に第1の酸化物薄膜を形成した第1
の非磁性基板と、他の非磁性基板の表面に第2の酸化物
薄膜を形成した第2の非磁性基板とを接着ガラスで溶着
してなる磁気ヘッドであって、前記接着ガラスの膜厚と
前記接着ガラスで融着される前記第1の酸化物薄膜及び
前記第2の酸化物薄膜との総膜厚が0.4μm〜1.7
μm好ましくは0.5μm〜1.5μmであることを特
徴とする磁気ヘッド。
1. A first magnetic thin film deposited on the surface of a non-magnetic substrate to form a first oxide thin film on the surface of the metallic magnetic film.
A non-magnetic substrate and a second non-magnetic substrate having a second oxide thin film formed on the surface of another non-magnetic substrate with an adhesive glass, the magnetic head having a film thickness of the adhesive glass. And the total thickness of the first oxide thin film and the second oxide thin film fused by the adhesive glass is 0.4 μm to 1.7.
A magnetic head having a thickness of μm, preferably 0.5 μm to 1.5 μm.
【請求項2】前記接着ガラスの膜厚が0.1μm〜1.
0μm好ましくは0.2μm〜0.8μmであることを
特徴とする請求項1に記載の磁気ヘッド。
2. The film thickness of the adhesive glass is from 0.1 μm to 1.
The magnetic head according to claim 1, wherein the magnetic head has a thickness of 0 μm, preferably 0.2 μm to 0.8 μm.
JP12391093A 1993-05-26 1993-05-26 Magnetic head Pending JPH06338014A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12391093A JPH06338014A (en) 1993-05-26 1993-05-26 Magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12391093A JPH06338014A (en) 1993-05-26 1993-05-26 Magnetic head

Publications (1)

Publication Number Publication Date
JPH06338014A true JPH06338014A (en) 1994-12-06

Family

ID=14872375

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12391093A Pending JPH06338014A (en) 1993-05-26 1993-05-26 Magnetic head

Country Status (1)

Country Link
JP (1) JPH06338014A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103375877A (en) * 2012-04-25 2013-10-30 珠海格力电器股份有限公司 Air conditioner and control method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103375877A (en) * 2012-04-25 2013-10-30 珠海格力电器股份有限公司 Air conditioner and control method thereof

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