JPH06330397A - Surface covering treatment device - Google Patents

Surface covering treatment device

Info

Publication number
JPH06330397A
JPH06330397A JP11617193A JP11617193A JPH06330397A JP H06330397 A JPH06330397 A JP H06330397A JP 11617193 A JP11617193 A JP 11617193A JP 11617193 A JP11617193 A JP 11617193A JP H06330397 A JPH06330397 A JP H06330397A
Authority
JP
Japan
Prior art keywords
liquid
treated
treatment
surface coating
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11617193A
Other languages
Japanese (ja)
Other versions
JP2501760B2 (en
Inventor
Kiyoshi Kida
潔 木田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kidaseiko KK
Original Assignee
Kidaseiko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kidaseiko KK filed Critical Kidaseiko KK
Priority to JP11617193A priority Critical patent/JP2501760B2/en
Publication of JPH06330397A publication Critical patent/JPH06330397A/en
Application granted granted Critical
Publication of JP2501760B2 publication Critical patent/JP2501760B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To form a covering film with uniform thickness on the whole surface of the treated part by discharging and removing gas collected on a recess part of an object to be treated. CONSTITUTION:A treating tank 3 storing a surface covering treatment liquid 2, a counter electrode 5 provided at the position in the lower side of the object to be treated 21 in the tank 3, an injection pipe 6 injecting the prescribed liquid 2 toward a treating part of the object to be treated 21, and an agitating means 9 stirring the treating liquid by rotating a rotary blade 8 with the injected treating liquid 2 are provided integrally, and many through-holes 18 for treating liquid are provided on the blade part 8A of the prescribed rotary blade 8, and a sucking opening 19 for treating liquid is provided on the circumferential of a supporting cylinder 7 housing and also supporting the rotary blade 8, and a stirred stream of the treating liquid is brought into the optimized state to discharge and remove the gas.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、被処理物を電気的に処
理する表面被処理装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment apparatus for electrically treating a treatment object.

【0002】[0002]

【従来の技術】比較的深い凹部を有する被処理物とし
て、例えば図3に示すようなエアコンのスクロール型ロ
ータ21がある。該ロータ21には、表面被覆処理を施す部
分即ち処理部分と、非処理部分があり、処理部分はロー
タ摺動部即ち凹部22を形成するスクロール部23の周面24
および内底面25であり、非処理部分は閉塞部27上面中央
部に設けられたベアリングハウジング部26である。
2. Description of the Related Art As an object to be processed having a relatively deep recess, there is, for example, a scroll type rotor 21 of an air conditioner as shown in FIG. The rotor 21 has a surface-coated portion, that is, a treated portion and a non-treated portion. The treated portion has a peripheral surface 24 of a scroll portion 23 that forms a rotor sliding portion, that is, a recess 22.
And the inner bottom surface 25, and the non-treated portion is the bearing housing portion 26 provided in the central portion of the upper surface of the closing portion 27.

【0003】従来、処理部分と非処理部分とがある被処
理物を表面被覆処理する場合、非処理部分をマスクした
状態で、凹部22の開口22A を上向きにして被処理物全体
を処理液内の電極間に浸漬し、通電するのが一般的であ
る。しかし、従来方法では、手間のかかるマスキング作
業が不可欠であるという問題があった。このマスキング
作業を省略する表面被覆処理方法として、被処理物の処
理部分のみを処理液に浸漬する方法が考えられる。
Conventionally, in the case of subjecting an object to be treated having a treated portion and a non-treated portion to a surface coating treatment, with the untreated portion masked, the opening 22A of the concave portion 22 faces upward, and the entire object to be treated is placed in the treatment liquid. It is common to immerse between the electrodes and to energize. However, the conventional method has a problem that time-consuming masking work is indispensable. As a surface coating method that omits this masking operation, a method of immersing only the treated portion of the object to be treated in the treatment liquid can be considered.

【0004】[0004]

【発明が解決しようとする課題】ところで、被処理物の
処理部分のみを処理液に浸漬する方法では、マスキング
作業が不要となるが、図3に示すロータ21の場合、電極
間で発生したガスがロータ21の処理部分に付着して、表
面被覆処理を妨げ、個々の製品において均一な被膜形成
ができないという問題がある。
By the way, in the method of immersing only the treated portion of the object to be treated in the treatment liquid, the masking work is unnecessary, but in the case of the rotor 21 shown in FIG. 3, the gas generated between the electrodes is generated. Adheres to the treated portion of the rotor 21 and interferes with the surface coating treatment, so that a uniform coating cannot be formed on individual products.

【0005】即ち、表面被覆処理過程で発生したガス
(例えば、アルマイト処理の場合には酸素ガス) が凹部2
2内に閉じ込められるため、スクロール部23の周面24お
よび内底面25にガスが付着して気泡が成長し、部分的に
表面被覆処理ができないという問題が生じ、さらに、対
極側で発生したガス (例えばアルマイト処理の場合には
水素ガス) も、前記凹部22内に保留されてスクロール周
面24および内底面25に付着する。また、処理物を処理液
に浸漬する際に凹部22内にガスが入り込み、このガスが
凹部内底面25の表面被覆処理を妨げるなどの問題が生じ
る。
That is, the gas generated during the surface coating process
(For example, oxygen gas in the case of alumite treatment)
Since it is confined in 2, the gas adheres to the peripheral surface 24 and the inner bottom surface 25 of the scroll portion 23 and bubbles grow, which causes a problem that the surface coating cannot be partially performed. (For example, hydrogen gas in the case of alumite treatment) is also retained in the recess 22 and adheres to the scroll peripheral surface 24 and the inner bottom surface 25. Further, when the treated material is dipped in the treatment liquid, a gas enters the concave portion 22, and this gas causes a problem that the surface coating treatment of the concave inner bottom surface 25 is hindered.

【0006】本発明は、上述のような問題点を解消すべ
くなされたもので、その目的とするところは、被処理物
の凹部に集まるガスを排出除去して、均一な膜厚の被覆
膜を処理部分全面に形成することができる表面被覆処理
装置を提供するにある。
The present invention has been made to solve the above-mentioned problems, and the purpose thereof is to discharge and remove the gas collected in the concave portion of the object to be processed to obtain a coating having a uniform film thickness. It is an object of the present invention to provide a surface coating treatment apparatus capable of forming a film on the entire treated portion.

【0007】[0007]

【課題を解決するための手段】本発明では、上記目的を
達成するために、次の技術的手段を講じた。即ち、本発
明は、表面被覆処理液を貯溜する処理槽と、該槽内に被
処理物の下方に位置して設けられた被処理物を電気的に
処理するための対極と、被処理物の処理すべき部分に前
記液を噴射する噴射手段と、前記液を撹拌する撹拌手段
とを備え、撹拌手段は前記噴射手段により駆動するよう
にした表面被覆処理装置であって、前記撹拌手段は回転
羽根から成りかつ該羽根の羽部に多数の孔を備えている
ことを特徴としている。
In order to achieve the above object, the present invention takes the following technical means. That is, the present invention is directed to a treatment tank for storing a surface coating treatment liquid, a counter electrode provided below the treatment object in the tank for electrically treating the treatment object, and a treatment object. Of the surface coating treatment apparatus, which is equipped with a spraying means for spraying the liquid onto a portion to be treated and a stirring means for stirring the liquid, the stirring means being driven by the spraying means. It is characterized in that it is composed of rotating blades and that the blades of the blades are provided with a large number of holes.

【0008】また、本発明は、前記回転羽根を収容しか
つ軸支する支持筒体の周壁に、回転羽根の軸と直交する
方向に貫通する処理液吸入開口を設けたことを特徴とし
ている。さらに、本発明は、前記処理槽内には処理液供
給循環用の噴射管マニホールドを配設し、複数の対極を
列設して夫々に前記マニホールドに接続した噴射管の各
先端部を臨入し、各噴射管の途中に流量調整弁を設けた
ことを特徴としている。
Further, the present invention is characterized in that a treatment liquid suction opening is provided in a peripheral wall of a support cylinder for accommodating and axially supporting the rotary blade, the processing liquid suction opening penetrating in a direction orthogonal to the axis of the rotary blade. Further, according to the present invention, an injection pipe manifold for supplying and circulating a processing liquid is arranged in the processing tank, and a plurality of counter electrodes are arranged in a row and each tip of the injection pipe connected to the manifold is inserted. However, it is characterized in that a flow rate adjusting valve is provided in the middle of each injection pipe.

【0009】[0009]

【作用】請求項1の発明によれば、まず凹部を有する被
処理物を、凹部の開口を下に向けて対極と対向させ、か
つ処理部分のみを処理液に浸漬してセットする。そこ
で、被処理物と対極との間に通電すると共に、処理液噴
射手段の運転を開始すると、被処理物を処理液に浸漬す
る際に被処理物の凹部に入り込んだガス、および表面被
覆処理中に処理部分等で発生したガスは、噴射手段によ
って生じた噴流および撹拌手段によって生じた処理液の
撹拌作用により、大きな気泡に成長する前に除去され、
また、対極側で発生したガスは、処理液の噴射流および
撹拌によって被処理物の凹部に移動することなく、放出
される。
According to the first aspect of the present invention, first, the object to be treated having the concave portion is set facing the counter electrode with the opening of the concave portion facing downward and only the treated portion is immersed in the treatment liquid. Therefore, when electricity is applied between the object to be processed and the counter electrode, and the operation of the processing liquid injection means is started, the gas that has entered the concave portion of the object to be processed when the object is immersed in the processing liquid, and the surface coating treatment The gas generated in the processing portion and the like is removed by the jet flow generated by the injection unit and the stirring action of the processing liquid generated by the stirring unit before it grows into large bubbles,
Further, the gas generated on the counter electrode side is discharged without moving to the concave portion of the object to be processed due to the jet flow and stirring of the processing liquid.

【0010】特に、回転羽根に設けた多数の孔を噴射手
段によって噴射された処理液の一部が通過するため、回
転羽根の回転が和らげられ、被処理物の凹部に集まろう
とするガスを円滑に排出して、気泡の付着、成長を防止
し、処理膜形成を妨げることなく、均一な被膜を形成す
ることができる。なお、被処理物の非処理部を、処理液
に浸漬しないで済むものには、マスキングが不要である
ことは勿論である。
In particular, since a part of the processing liquid jetted by the jetting means passes through a large number of holes provided in the rotary blade, the rotation of the rotary blade is moderated, and the gas which tends to collect in the recess of the object to be processed is absorbed. It can be discharged smoothly to prevent bubbles from adhering and growing, and a uniform film can be formed without disturbing the formation of the treatment film. Needless to say, masking is not necessary for those that do not need to immerse the non-treated part of the object to be treated in the treatment liquid.

【0011】また、請求項2の発明によれば、回転羽根
の回転によって、処理液吸入開口から支持筒体外周の処
理液を吸入して処理液撹拌流量を多くするので、被処理
物の凹部に集まろうとするガスをより円滑にかつ確実に
排出することができる。さらに、請求項3の発明によれ
ば、複数の対極の内部に臨入する噴射管の各先端部から
噴出する処理液流量を、流量調整弁により調整して、均
等にすることができ、各被処理物に当たる処理液撹拌流
を同じ状態にすることができ、各被処理物を同条件下で
処理できる。
Further, according to the second aspect of the present invention, the rotation of the rotary blade sucks the processing liquid on the outer periphery of the supporting cylinder from the processing liquid suction opening to increase the processing liquid stirring flow rate. It is possible to smoothly and surely discharge the gas that tends to collect in the. Further, according to the invention of claim 3, the flow rate of the processing liquid ejected from each tip of the injection pipe which enters the inside of the plurality of counter electrodes can be adjusted by the flow rate adjusting valve to be equalized. It is possible to make the treatment liquid agitated flow that hits the object to be treated the same, and to treat each object under the same conditions.

【0012】[0012]

【実施例】以下、本発明の実施例を図面に基づき説明す
る。図1および図2は本発明の実施例を示し、被処理物
として、図3に示すエアコンのスクロール型ロータ21を
用いて、複数の該ロータ21の処理部分であるスクロール
23の周面24および凹部22の内底面25をアルマイト処理す
る表面被覆処理装置1 である。
Embodiments of the present invention will be described below with reference to the drawings. 1 and 2 show an embodiment of the present invention, in which a scroll type rotor 21 of an air conditioner shown in FIG. 3 is used as an object to be processed, and a scroll which is a processing portion of the plurality of rotors 21 is used.
A surface coating apparatus 1 for alumite-treating a peripheral surface 24 of 23 and an inner bottom surface 25 of a recess 22.

【0013】本装置1 は、表面被覆処理液2 を貯溜する
処理槽3 と、該槽3 の内底上に設けた処理液噴射管マニ
ホールド4 と、該マニホールド4 の上側に取付けた円筒
状の複数の対極 (電極) 5 と、該対極5 内下部に偏心的
にかつ上向きに臨入された処理液噴射手段 (噴射管) 6
と、前記対極5 の外周に同心的にかつ上方に延出状に取
付けられた支持筒体7 および支持筒体7 の上端内側に設
けた回転羽根8 とからなる処理液撹拌手段9 と、処理液
2 を前記マニホールド4 に供給し循環させる循環ポンプ
10と、前記各噴射管6 の途中に設けた流量調整弁11とか
ら成っている。
The apparatus 1 comprises a treatment tank 3 for storing the surface coating treatment liquid 2, a treatment liquid injection pipe manifold 4 provided on the inner bottom of the treatment tank 3, and a cylindrical shape attached above the manifold 4. A plurality of counter electrodes (electrodes) 5 and a processing liquid ejecting means (injection pipe) 6 eccentrically and upwardly inserted in the lower part of the counter electrodes 5.
And a treatment liquid stirring means 9 consisting of a support cylinder 7 concentrically and upwardly attached to the outer periphery of the counter electrode 5 and a rotary blade 8 provided inside the upper end of the support cylinder 7, liquid
Circulation pump for supplying 2 to the manifold 4 and circulating it
10 and a flow rate adjusting valve 11 provided in the middle of each of the injection pipes 6.

【0014】前記マニホールド4 は、絶縁性物質からな
る対極支持板12A,12B 間の下部に形成され、処理槽3 内
の処理液2 が前記ポンプ10により供給されるようになっ
ており、図2に示すように、複数の処理液噴射管6 の基
端がマニホールド4 に連通連結されている。そして、前
記流量調整弁11は、各噴射管6 の先端から噴出する処理
液の流量が均一になるように調整するために設けられて
おり、各被処理物を同状態、同条件下で処理できるよう
にしてある。
The manifold 4 is formed below the counter electrode support plates 12A and 12B made of an insulating material, and the processing liquid 2 in the processing tank 3 is supplied by the pump 10 as shown in FIG. As shown in, the base ends of the plurality of treatment liquid injection pipes 6 are connected to the manifold 4 so as to communicate with each other. The flow rate adjusting valve 11 is provided to adjust the flow rate of the treatment liquid ejected from the tip of each injection pipe 6 to be uniform, and treats each object to be treated under the same condition and under the same condition. I can do it.

【0015】前記対極支持板12A,12B の上端部対向内側
面には、導電性材料からなる共通の対極支持部材13A,13
B が固着され、該部材13B には陰極が接続されており、
該部材13A,13B 上に各対極5 の外周に設けた鍔部5Aが載
り、該鍔5Aを対極挿通孔14Aを有する絶縁性物質からな
る取付板14により前記支持板12A,12B に取替自在に固定
するようになっている。
Common counter electrode supporting members 13A, 13 made of a conductive material are provided on inner surfaces of the counter electrode supporting plates 12A, 12B facing the upper ends.
B is fixed, the cathode is connected to the member 13B,
A collar portion 5A provided on the outer circumference of each counter electrode 5 is placed on the member 13A, 13B, and the collar plate 5A can be replaced with the support plates 12A, 12B by a mounting plate 14 made of an insulating material having a counter electrode insertion hole 14A. It is designed to be fixed to.

【0016】そして、前記対極5 は鉛管製でその下半分
の周面には、処理液噴射管臨入切欠部15が設けられ、該
対極5 内に前記噴射管6 の先端部6Aが上向きにかつ偏心
して臨入されている。なお、噴射管先端部6Aは一方の対
極支持板12A の貫通孔に挿入固着された噴射管6 に、前
記貫通孔内で接続し、フランジ16により対極支持板12A
の内面に取付けられている。
The counter electrode 5 is made of a lead pipe, and a processing liquid jetting pipe entry cutout portion 15 is provided on the peripheral surface of the lower half thereof, and the tip portion 6A of the jetting pipe 6 is directed upward in the counter electrode 5. And it is eccentrically entered. The tip end portion 6A of the injection pipe is connected to the injection pipe 6 fixedly inserted in the through hole of one counter electrode supporting plate 12A in the through hole, and is connected by the flange 16 to the counter electrode supporting plate 12A.
It is attached to the inner surface of.

【0017】前記取付板14の上面には、各対極挿通孔14
A と同心にかつ対極5 を貫通させうる絶縁性物質からな
る撹拌手段9 の取付管17が夫々立設されており、各取付
管17に前記支持筒体7 が夫々外嵌固定されている。前記
回転羽根8 は、羽部8Aが略半円形を呈しかつ多数の処理
液通孔18を備え、そのボス部8Bがマニホールド4 の長手
方向と平行な水平軸8Cにより、支持筒体7内上端部に回
転自在に取付けられている。そして、支持筒体7 の上端
部周面には、前記噴射管6 側に水平軸8Cと直交する方向
に貫通する横長の処理液吸入開口19が設けられている。
Each counter electrode insertion hole 14 is formed on the upper surface of the mounting plate 14.
Concentric with A and mounting tubes 17 of stirring means 9 made of an insulating material capable of penetrating the counter electrode 5 are respectively provided upright, and the supporting cylinders 7 are externally fitted and fixed to the respective mounting tubes 17. The rotary vane 8 has a vane portion 8A having a substantially semi-circular shape and a large number of treatment liquid passage holes 18, and a boss portion 8B of the rotary vane 8 is formed by a horizontal shaft 8C parallel to the longitudinal direction of the manifold 4 so that the upper end of the support cylinder 7 is closed. It is rotatably attached to the section. On the peripheral surface of the upper end portion of the support cylinder 7, a horizontally long processing liquid suction opening 19 is provided on the injection pipe 6 side so as to penetrate in a direction orthogonal to the horizontal axis 8C.

【0018】20は被処理物吊チャックで、前記ロータ21
の非処理部分であるベアリングハウジング部26をチャッ
キングして、凹部22が下向きになるよう吊り下げて対極
5 の直上に夫々対向させ、処理部分であるスクロール部
23の周面24およびその内底面25が、処理液2 中に浸漬さ
れ、ロータ21には陽極が接続されている。次に、上記実
施例によりロータ21の処理部分をアルマイト処理する場
合について説明する。
Reference numeral 20 is a chuck for suspending the object to be processed, which is the rotor 21.
The non-treated bearing housing 26 is chucked and the recess 22 is hung so that it faces downward.
Directly above 5 and facing each other, the scroll part which is the processing part
A peripheral surface 24 of 23 and an inner bottom surface 25 thereof are immersed in the treatment liquid 2, and an anode is connected to the rotor 21. Next, a case where the treated portion of the rotor 21 is subjected to the alumite treatment according to the above embodiment will be described.

【0019】まず、被処理物であるロータ21は、前記チ
ャック20によりその凹部22の開口が下向きでかつ対極5
の直上に位置すると共に、凹部22の内底面25と処理液2
の界面が一致する高さに吊下げられ、処理部分のみが処
理液2 に浸漬されている。この状態で、ロータ21と対極
5 に通電すると同時に、処理液循環ポンプ10を運転開始
する。
First, in the rotor 21, which is the object to be processed, the opening of the concave portion 22 is directed downward by the chuck 20 and the counter electrode 5 is used.
Located directly above the inner bottom surface 25 of the recess 22 and the treatment liquid 2
The interfaces are suspended at the same height, and only the treated part is immersed in the treatment liquid 2. In this state, the rotor 21 and
At the same time as energizing 5, the processing liquid circulation pump 10 is started.

【0020】なお、各処理液噴射管6 の先端部6Aから噴
出される処理液量は、前もって流量計を用いかつ流量調
整弁11を操作して、均一になるように調整されている。
したがって、各噴射管6 から噴出された処理液流は、撹
拌手段9 の回転羽根8 の羽部8Aに当って、回転羽根8 を
図1に矢印(イ)で示す方向に回転させ、処理液流の一
部は羽部8Aの処理液通孔18を通って流れるので、回転羽
根8 の回転が和らげられ、しかも処理液吸入開口19から
支持筒体7 外周の処理液が吸入され、処理液撹拌流量が
多くなるため、処理液の撹拌作用がロータ21の凹部22内
のガスを排出するのに最適な状態となる。
The amount of the processing liquid ejected from the tip portion 6A of each processing liquid injection pipe 6 is adjusted in advance by using a flow meter and operating the flow rate adjusting valve 11.
Therefore, the processing liquid flow ejected from each injection pipe 6 hits the blade portion 8A of the rotary blade 8 of the stirring means 9 to rotate the rotary blade 8 in the direction shown by the arrow (a) in FIG. Since a part of the flow flows through the processing liquid passage hole 18 of the blade portion 8A, the rotation of the rotary vane 8 is moderated, and further, the processing liquid on the outer periphery of the support cylinder 7 is sucked from the processing liquid suction opening 19 to be processed liquid. Since the agitation flow rate increases, the agitation action of the processing liquid is in the optimum state for discharging the gas in the recess 22 of the rotor 21.

【0021】他方、通電によってロータ21 (アノード)
は酸化されて、ロータ21の処理部分に酸化皮膜が形成さ
れる。このとき、ロータ21で生じた酸素ガスがスクロー
ル部23の周面24および内底面25に付着するが、噴射手段
6 および撹拌手段9 による処理液の撹拌流によって、前
記凹部22内に付着し或いは滞留するガスを凹部22外に排
出し、凹部22内で気泡が成長するのを防止すると共に、
対極5(カソード) 側で発生したガスが凹部22内に入り込
むのを防止する。
On the other hand, by energization, the rotor 21 (anode)
Is oxidized and an oxide film is formed on the treated portion of the rotor 21. At this time, the oxygen gas generated in the rotor 21 adheres to the peripheral surface 24 and the inner bottom surface 25 of the scroll portion 23.
By the stirring flow of the treatment liquid by 6 and the stirring means 9, the gas adhering to or staying in the recess 22 is discharged to the outside of the recess 22 to prevent the growth of bubbles in the recess 22, and
The gas generated on the counter electrode 5 (cathode) side is prevented from entering the recess 22.

【0022】このようにして、水素ガス等の気泡付着が
防止されることにより、ロータ21の処理部分が均等に表
面被覆処理される状態となり、均一な酸化皮膜が得られ
る。また、被処理物であるロータ21を、対極5 に対して
個々に吊下げかつ同じ状態に処理液撹拌流を生じさせる
ので、従来のように被処理物の引掛け位置による製品毎
の酸化皮膜のバラツキがなく、品質の向上を図ることが
できる。
In this way, by preventing bubbles such as hydrogen gas from adhering to the surface, the treated portion of the rotor 21 is uniformly surface-coated, and a uniform oxide film is obtained. Further, since the rotor 21, which is the object to be treated, is individually hung with respect to the counter electrode 5 and the treatment liquid agitating flow is generated in the same state, the oxide film for each product depending on the hooking position of the object to be treated as in the past. It is possible to improve the quality without any variation.

【0023】さらに、上記実施例によれば、被処理物内
部に処理液が溜まらないので、被処理物の処理槽への浸
漬、支持および取り出しという一連の作業の自動化が容
易となり、被処理物取り出し時の処理液持出し量が少な
くなる。そして、被処理物のマスキング作業を不要とす
ることができ、またマスキング作業を要する場合でもマ
スキング精度が緩和され、作業性が向上する。また、多
数個の被処理物を1度に処理でき、大幅に生産性の向上
を図ることができる。
Further, according to the above-mentioned embodiment, since the processing liquid does not accumulate inside the object to be processed, it is easy to automate a series of operations such as dipping, supporting and taking out the object to be processed, and the object to be processed can be easily processed. The amount of processing liquid taken out at the time of taking out becomes small. Further, the masking work of the object to be processed can be eliminated, and even when the masking work is required, the masking accuracy is relaxed and the workability is improved. Further, a large number of objects to be processed can be processed at one time, and the productivity can be greatly improved.

【0024】本発明の上記実施例では、アルマイト処理
を行なう陽極酸化について述べたが、本発明はこれに限
定されるものではなく、メッキにも適用できる。また、
上記実施例では、対極、噴射手段および撹拌手段を一体
的に構成しているが、これらを処理槽内に夫々個別に設
けることができ、この場合、対極および噴射手段は表面
被覆処理および気泡排出を効率的に行ないうるように、
被処理物の凹部開口に対向する位置に設けるのが好まし
い。さらに、対極、噴射手段および撹拌手段は、処理槽
内に1組設け、一個の被処理物を処理する装置としうる
ことは勿論であり、この場合、マニホールド4 および流
量調整弁11を省略できる。
In the above-mentioned embodiment of the present invention, the anodic oxidation for performing the alumite treatment is described, but the present invention is not limited to this and can be applied to plating. Also,
In the above embodiment, the counter electrode, the jetting means and the stirring means are integrally formed, but they can be separately provided in the processing tank. In this case, the counter electrode and the jetting means are provided with the surface coating treatment and the bubble discharge. So that
It is preferably provided at a position facing the opening of the recess of the object to be processed. Further, it is needless to say that the counter electrode, the injection means and the stirring means may be provided as one set in the processing tank so as to process one processing object, and in this case, the manifold 4 and the flow rate adjusting valve 11 can be omitted.

【0025】[0025]

【発明の効果】本発明は、上述のように、表面被覆処理
液を貯溜する処理槽と、該槽内に被処理物の下方に位置
して設けられた被処理物を電気的に処理するための対極
と、被処理物の処理すべき部分に前記液を噴射する噴射
手段と、前記液を撹拌する撹拌手段とを備え、撹拌手段
は前記噴射手段により駆動するようにした表面被覆処理
装置であって、前記撹拌手段は回転羽根から成りかつ該
羽根の羽部に多数の孔を備えていることを特徴とするも
のであるから、処理液撹拌流が最適に処理部分に作用
し、被処理物に凹部がある場合でも、付着するガスを排
出除去して、均一な膜厚の被覆膜を処理部分全面に形成
でき、被処理物の品質向上を図ることができる。
As described above, according to the present invention, the processing tank for storing the surface coating processing solution and the object to be processed provided below the object to be processed in the tank are electrically processed. And a counter electrode for spraying the liquid to a portion to be treated of the object to be treated, and a stirring means for stirring the liquid, and the stirring means is driven by the jetting means. The agitation means is characterized by comprising rotary blades and having a large number of holes in the blades of the blades. Even if the processed object has a concave portion, the adhered gas can be discharged and removed to form a coating film having a uniform film thickness on the entire surface of the processed part, so that the quality of the processed object can be improved.

【0026】また、本発明は、前記回転羽根を収容しか
つ軸支する支持筒体の周壁に、回転羽根の軸と直交する
方向に貫通する処理液吸入開口を設けたことを特徴とす
るものであるから、処理液撹拌流量が多くなり、処理部
分全表面に撹拌流が到達し、付着するガスの除去および
気泡の成長防止を有効に行なうことができる。さらに、
本発明は、前記処理槽内には処理液供給循環用の噴射管
マニホールドを配設し、複数の対極を列設して夫々に前
記マニホールドに接続した噴射管の各先端部を臨入し、
各噴射管の途中に流量調整弁を設けたことを特徴とする
ものであるから、複数の各噴射手段からの処理液噴出流
量を均等にして、被処理物個々の被覆膜厚を均一にする
と共に被処理物毎の品質のバラツキをなくすことができ
る。
Further, the present invention is characterized in that a treatment liquid suction opening penetrating in a direction orthogonal to the axis of the rotary blade is provided on a peripheral wall of a support cylinder which houses and axially supports the rotary blade. Therefore, the agitation flow rate of the treatment liquid increases, the agitation flow reaches the entire surface of the treatment portion, and it is possible to effectively remove the adhering gas and prevent the growth of bubbles. further,
In the present invention, an injection pipe manifold for processing liquid supply circulation is arranged in the processing tank, a plurality of counter electrodes are arranged in a row, and the respective tip portions of the injection pipes connected to the manifold are respectively inserted.
Since it is characterized in that a flow rate adjusting valve is provided in the middle of each injection pipe, the flow rate of the processing liquid ejected from each of the plurality of injection means is made uniform, and the coating film thickness of each object to be processed is made uniform. In addition, it is possible to eliminate variations in quality among the objects to be processed.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例を示す縦断側面図である。FIG. 1 is a vertical sectional side view showing an embodiment of the present invention.

【図2】図1のA−A線に沿う一部省略正面図である。FIG. 2 is a partially omitted front view taken along the line AA of FIG.

【図3】被処理物であるエアコンのスクロール型ロータ
を示し、(a)は平面図、(b)は(a)のB−B線断
面図である。
3A and 3B show a scroll type rotor of an air conditioner which is an object to be processed, FIG. 3A is a plan view, and FIG. 3B is a sectional view taken along line BB of FIG. 3A.

【符号の説明】[Explanation of symbols]

1 表面被覆処理装置 2 処理液 3 処理槽 4 マニホールド 5 対極 6 噴射管(噴射手段) 7 支持筒体 8 回転羽根 8A 羽部 9 撹拌手段 11 流量調整弁 18 処理液通孔 19 処理液吸入開口 1 Surface Coating Treatment Device 2 Treatment Liquid 3 Treatment Tank 4 Manifold 5 Counter Electrode 6 Injection Pipe (Injection Means) 7 Supporting Cylinder 8 Rotating Blade 8A Wing 9 Agitating Means 11 Flow Control Valve 18 Treatment Liquid Through-hole 19 Treatment Liquid Suction Port

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 表面被覆処理液を貯溜する処理槽と、該
槽内に被処理物の下方に位置して設けられた被処理物を
電気的に処理するための対極と、被処理物の処理すべき
部分に前記液を噴射する噴射手段と、前記液を撹拌する
撹拌手段とを備え、撹拌手段は前記噴射手段により駆動
するようにした表面被覆処理装置であって、前記撹拌手
段は回転羽根から成りかつ該羽根の羽部に多数の孔を備
えていることを特徴とする表面被覆処理装置。
1. A treatment tank for storing a surface coating treatment liquid, a counter electrode disposed below the treatment object in the tank for electrically treating the treatment object, and a treatment object. The surface coating treatment device is provided with a spraying unit for spraying the liquid onto a portion to be treated and a stirring unit for stirring the liquid, and the stirring unit is a surface coating treatment device driven by the spraying unit, and the stirring unit is a rotating unit. A surface coating treatment device comprising a blade and having a large number of holes in the blade portion of the blade.
【請求項2】 前記回転羽根を収容しかつ軸支する支持
筒体の周壁に、回転羽根の軸と直交する方向に貫通する
処理液吸入開口を設けたことを特徴とする請求項1の表
面被覆処理装置。
2. The surface of claim 1, wherein the peripheral wall of a support cylinder that accommodates and axially supports the rotary blade is provided with a processing liquid suction opening that penetrates in a direction orthogonal to the axis of the rotary blade. Coating processing equipment.
【請求項3】 前記処理槽内には処理液供給循環用の噴
射管マニホールドを配設し、複数の対極を列設して夫々
に前記マニホールドに接続した噴射管の各先端部を臨入
し、各噴射管の途中に流量調整弁を設けたことを特徴と
する請求項1又は2の表面被覆処理装置。
3. An injection pipe manifold for supplying and circulating a processing liquid is arranged in the processing tank, a plurality of counter electrodes are arranged in a row, and the respective tip portions of the injection pipes connected to the manifold are respectively inserted therein. The surface coating apparatus according to claim 1 or 2, wherein a flow rate adjusting valve is provided in the middle of each injection pipe.
JP11617193A 1993-05-18 1993-05-18 Surface coating equipment Expired - Lifetime JP2501760B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11617193A JP2501760B2 (en) 1993-05-18 1993-05-18 Surface coating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11617193A JP2501760B2 (en) 1993-05-18 1993-05-18 Surface coating equipment

Publications (2)

Publication Number Publication Date
JPH06330397A true JPH06330397A (en) 1994-11-29
JP2501760B2 JP2501760B2 (en) 1996-05-29

Family

ID=14680555

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11617193A Expired - Lifetime JP2501760B2 (en) 1993-05-18 1993-05-18 Surface coating equipment

Country Status (1)

Country Link
JP (1) JP2501760B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013124407A (en) * 2011-12-15 2013-06-24 Mitsubishi Heavy Ind Ltd Alumite treatment method
WO2014185159A1 (en) * 2013-05-13 2014-11-20 株式会社Jcu Substrate plating device
CN114214671A (en) * 2021-12-08 2022-03-22 中航西安飞机工业集团股份有限公司 Method for eliminating gas retained in part groove cavity in electrochemical process

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013124407A (en) * 2011-12-15 2013-06-24 Mitsubishi Heavy Ind Ltd Alumite treatment method
WO2014185159A1 (en) * 2013-05-13 2014-11-20 株式会社Jcu Substrate plating device
CN105209670A (en) * 2013-05-13 2015-12-30 株式会社杰希优 Substrate plating device
CN114214671A (en) * 2021-12-08 2022-03-22 中航西安飞机工业集团股份有限公司 Method for eliminating gas retained in part groove cavity in electrochemical process

Also Published As

Publication number Publication date
JP2501760B2 (en) 1996-05-29

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