JPH06322485A - Fe-ni base thin sheet for high temperature and low baume degree etching treatment and its production - Google Patents

Fe-ni base thin sheet for high temperature and low baume degree etching treatment and its production

Info

Publication number
JPH06322485A
JPH06322485A JP13262093A JP13262093A JPH06322485A JP H06322485 A JPH06322485 A JP H06322485A JP 13262093 A JP13262093 A JP 13262093A JP 13262093 A JP13262093 A JP 13262093A JP H06322485 A JPH06322485 A JP H06322485A
Authority
JP
Japan
Prior art keywords
etching
degree
rolling
cold rolling
annealing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13262093A
Other languages
Japanese (ja)
Inventor
Takayuki Nagashio
隆之 長塩
Shuichi Nakamura
秀一 中村
Kazu Sasaki
計 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Priority to JP13262093A priority Critical patent/JPH06322485A/en
Publication of JPH06322485A publication Critical patent/JPH06322485A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To produce an Fe-Ni base thin sheet capable of etching treatment at a high temp. and low Baume degree having an effect of improving etching efficiency and suppressing side-etching. CONSTITUTION:In an Fe-Ni base alloy contg., by weight, 30 to 60% Ni, the accumulating degree in the {100} orientation in the plane parallel to the rolling surface is regulated to >=85%, and the microstructure in the section vertical to the sheet width direction of the rolled stock is formed into a fibrous rolled structure. Furthermore, the Fe-31 to 60% Ni base alloy is subjected to hot working and is thereafter subjected to cold rolling and annealing to sufficiently increase the accmulating degree in the {100} orientation in the plane parallel to the rolling surface and to stabilize the crystalline otientation, and after that, cold rolling at a draft not exceeding the draft in the same cold rolling and annealing in the temp. range in which recrystallzation does not occur are executed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、エッチング能率向上、
サイドエッチングの低下等の効果を有する高温およびま
たは低ボーメ度エッチングにおいても、微細エッチング
が可能なFe−Ni系薄板に関し、さらに詳しくは、高
精細シャドウマスク、ファインピッチICリ−ドフレ−
ム、表示管用スペーサーフレームなどの微細エッチング
加工用Fe−Ni系薄板に関するものである。
BACKGROUND OF THE INVENTION The present invention is directed to improving etching efficiency,
The present invention relates to a Fe—Ni-based thin plate capable of fine etching even at high temperature and / or low bowing degree etching, which has an effect of reducing side etching, and more specifically, a high-definition shadow mask and a fine pitch IC lead frame.
The present invention relates to a Fe—Ni-based thin plate for fine etching such as a spacer and a frame for a display tube.

【0002】[0002]

【従来の技術】従来、例えば、カラ−ブラウン管用シャ
ドウマスク材として、アルミキルド鋼が用いられてきた
が、最近では熱膨張係数の低いアンバ−材(Fe−36
Ni合金)が用いられるようになり、微細エッチング加
工により製造されている。また、ICリ−ドフレ−ム材
料としては42合金(Fe−42Ni合金)がその低熱
膨張性から用いられ、100ピンを超えるような多ピン
製品については、微細エッチング加工により製造されて
いる。この他、表示管、電子銃などの各種電子部品用素
材としてFe−50Ni合金、Fe−52Ni合金およ
びFe−42Ni−6Cr合金などのFe−Ni系合金
が使用されている。
2. Description of the Related Art Conventionally, for example, aluminum killed steel has been used as a shadow mask material for a color cathode ray tube, but recently, an amber material (Fe-36) having a low coefficient of thermal expansion has been used.
Ni alloys) have come to be used and are manufactured by fine etching. As the IC lead frame material, 42 alloy (Fe-42Ni alloy) is used due to its low thermal expansion property, and multi-pin products having more than 100 pins are manufactured by fine etching. In addition, Fe-50Ni alloys, Fe-52Ni alloys, Fe-42Ni-6Cr alloys and other Fe-Ni alloys are used as materials for various electronic components such as display tubes and electron guns.

【0003】これらのFe−Ni系合金は純鉄に比べ、
エッチング速度が遅く、作業能率向上を阻害するのみな
らず、サイドエッチングが大きく、微細加工を必要とす
るシャドウマスクやICリ−ドフレ−ムの製造において
は大きな問題であり、エッチング加工性に優れたFe−
Ni系材料の要求があった。これまで、エッチング性を
改善することに関し、特公平4−43980号、特公平
2−51973号のようにC、O、N等の不純物元素を
低減させてエッチング速度を向上するもの、特開昭61
−39343号のように結晶粒度を規定し、また特公平
2−9655号のように結晶方位を規定する等により、
エッチング性改善の提案がなされていた。
Compared with pure iron, these Fe--Ni alloys are
The etching rate is slow and not only hinders the improvement of work efficiency, but also side etching is large, which is a big problem in the production of shadow masks and IC lead frames that require fine processing, and is excellent in etching processability. Fe-
There was a demand for Ni-based materials. Up to now, regarding improvement of etching property, as disclosed in JP-B-4-43980 and JP-B-2-51973, the impurity elements such as C, O and N are reduced to improve the etching rate. 61
By defining the crystal grain size as in No. 39343 and the crystal orientation as in Japanese Patent Publication No. 2-9655,
Proposals for improving the etching property have been made.

【0004】[0004]

【発明が解決しようとする課題】近年、シャドウマスク
は200μmピッチと超高精細化し、エッチング面の粗
さ、エッチング孔の寸法形状の点でさらに品質要求が厳
しくなっている。またICリ−ドフレ−ムも160ピン
クラスから240ピン、さらに350ピンクラス以上と
超多ピン化し、サイドエッチングによるリ−ドの狭幅化
が問題となってきており、前記従来技術ではこれらの問
題に対し解決が困難になっていた。一般に、エッチング
速度が高い程サイドエッチングが少なく加工精度が良く
なり、また、作業効率の点からも好ましい。エッチング
速度を高くするには高温でエッチングするか、あるいは
エッチング液の濃度を低くする(低ボ−メ度)ことが知
られているが、従来の材料ではエッチング面が粗くな
り、シャドウマスクにおいては電子線の散乱の原因にな
ること、リ−ドフレ−ムにおいてはリ−ド端面がギザギ
ザになるなどの理由から微細エッチング加工には適さな
かった。本発明は作業能率、サイドエッチング防止等の
観点から、高温またはおよび低ボ−メ度のエッチング条
件でも、滑らかなエッチング面を生成するFe−Ni系
合金薄板を提供することを目的とする。
In recent years, shadow masks have been made ultra fine with a pitch of 200 μm, and the quality requirements have become more stringent in terms of the roughness of the etching surface and the size and shape of the etching holes. In addition, the IC lead frame has increased from 160-pin class to 240-pin and further to 350-pin class or more, and the narrowing of the lead due to side etching has become a problem. It was difficult to solve the problem. Generally, the higher the etching rate is, the less side etching is, the better the processing accuracy is, and it is also preferable from the viewpoint of working efficiency. In order to increase the etching rate, it is known to perform the etching at a high temperature or to reduce the concentration of the etching solution (low degree of body). However, the etching surface becomes rough in the conventional material, and the shadow mask becomes It is not suitable for fine etching because it causes scattering of electron beams and the lead frame has a jagged edge in the lead frame. It is an object of the present invention to provide an Fe-Ni alloy thin plate that produces a smooth etched surface even under high temperature or low-bome etching conditions from the viewpoints of work efficiency, side etching prevention and the like.

【0005】[0005]

【発明を解決するための手段】本発明は、Fe−Ni系
合金の組織やエッチング条件(温度・ボ−メ度)に対す
る、エッチング面粗さの関係について研究を重ねた結
果、ミクロ組織を特定状態とすることにより、高温・低
ボ−メ度化してエッチング速度を高めても、精細なエッ
チング面が得られるFe−Ni系薄板とその製造方法を
見いだしたことに基づくものである。従来、エッチング
加工用Fe−Ni系薄板は、一般に再結晶組織を有して
おり、一方、エッチング速度は結晶粒単位で決定される
ため、エッチング面に凹凸が発生する。そこで、微細エ
ッチング面を得るため、前述のように結晶粒径を微細範
囲に規定する提案があった。
According to the present invention, as a result of repeated studies on the relationship between the etching surface roughness with respect to the structure of the Fe-Ni alloy and the etching conditions (temperature / boehm degree), the microstructure was identified. This is based on the finding of a Fe—Ni-based thin plate and a method for producing the same that can obtain a finely etched surface even if the etching rate is increased by increasing the etching temperature by lowering the temperature and body temperature. Conventionally, an Fe-Ni-based thin plate for etching processing generally has a recrystallized structure. On the other hand, since the etching rate is determined in crystal grain units, unevenness occurs on the etched surface. Therefore, in order to obtain a finely etched surface, there has been a proposal to define the crystal grain size in the fine range as described above.

【0006】本発明者らは明瞭な結晶粒界を持たない繊
維状組織にすれば結晶粒の影響は防止できるものと考え
て研究を重ねた結果、特定の製造工程を採用することに
より、組織が安定化し、その後の冷間圧延や焼鈍の条件
にやや制限を加えることにより、圧延面に平行な面の
{100}方位集積度を高率に維持したまま、再結晶を
生ずることなく繊維状圧延組織を有するFe−Ni系薄
板を得ることができ、かつこのFe−Ni系薄板におい
ては非常に滑らかなエッチング面が得られ、したがって
高温・低ボ−メ度でのエッチングが可能であることを見
いだし本発明をなした。
The inventors of the present invention have conducted repeated research on the idea that the influence of crystal grains can be prevented by forming a fibrous structure having no clear crystal grain boundaries, and as a result, by adopting a specific manufacturing process, Is stabilized, and the conditions for cold rolling and annealing thereafter are slightly restricted, so that the fibrous shape can be maintained without recrystallization while maintaining the high degree of {100} orientation integration of the plane parallel to the rolling surface. It is possible to obtain an Fe-Ni-based thin plate having a rolling structure, and to obtain a very smooth etched surface in this Fe-Ni-based thin plate, and thus to enable etching at a high temperature and a low degree of deformation. Found and made the present invention.

【0007】すなわち、先ず第二発明は、重量%でNi
30〜60%を含有するFe−Ni系合金を熱間加工
後、冷間圧延と焼鈍を施し、圧延面に平行な面の{10
0}方位集積度を十分高めて結晶方位を安定化した後
(本願ではこの状態を前駆材料と呼称する)、さらに該
前駆材料に、前記冷間圧延の圧延率を越えない圧延率の
冷間圧延と、再結晶を起こさない温度範囲の焼鈍を施し
て、圧延面に平行な面の{100}方位集積度が85%
以上で、かつ圧延材の板幅方向に垂直な断面でのミクロ
組織が繊維状圧延組織とすることを特徴とする高温・低
ボーメ度エッチング処理用Fe−Ni系薄板の製造方法
であり、次に、本願の第一発明は重量%でNi30〜6
0%を含有するFe−Ni系合金において、圧延面に平
行な面の{100}方位集積度が85%以上で、かつ、
圧延材の板幅方向に垂直な断面のミクロ組織が繊維状圧
延組織を有することを特徴とする高温・低ボーメ度エッ
チング処理用Fe−Ni系薄板である。
That is, first, the second aspect of the present invention is to use Ni by weight.
After hot working an Fe-Ni-based alloy containing 30 to 60%, cold rolling and annealing are performed, and {10
0} orientation After sufficiently increasing the degree of integration to stabilize the crystal orientation (this state is referred to as a precursor material in the present application), the precursor material is further cold-rolled at a rolling rate not exceeding the rolling rate of the cold rolling. By rolling and annealing in a temperature range that does not cause recrystallization, the degree of {100} orientation integration of the plane parallel to the rolled surface is 85%.
Above, and is a method for producing a Fe-Ni-based thin plate for high-temperature low-Baume degree etching treatment, characterized in that the microstructure in a cross section perpendicular to the plate width direction of the rolled material is a fibrous rolled structure. According to the first invention of the present application, Ni30-6 by weight% is used.
In a Fe-Ni alloy containing 0%, the {100} orientation integration degree of the plane parallel to the rolled surface is 85% or more, and
A Fe-Ni-based thin plate for high temperature / low Baume degree etching treatment, characterized in that a microstructure of a cross section perpendicular to the plate width direction of a rolled material has a fibrous rolled structure.

【0008】[0008]

【作用】先ず、本発明材料とその効果の概略を述べる。
図1および図2に本発明材料(a)と従来の再結晶組織
を有するFe−Ni系材料(b)の、それぞれ圧延板幅
方向に垂直な断面におけるミクロ組織およびエッチング
面の走査電子顕微鏡写真を示す。ミクロ組織は塩化第二
銅を飽和させた王水で腐食(約10秒)した後、400
倍の顕微鏡で観察したものである。本発明材料(a)は
繊維状圧延組織を有し、比較材料(b)のような明瞭な
結晶粒界を認め難いことが特徴である。これによって、
図2に示すように、本発明材料(a)は比較材料(b)
で問題となる結晶粒の影響によるエッチング面の凹凸が
大幅に小さくなり形状が極めて良好となることが、図2
の比較から明瞭にわかる。
First, the material of the present invention and its effect will be outlined.
1 and 2 are scanning electron micrographs of a microstructure and an etched surface of a material of the present invention (a) and a conventional Fe-Ni-based material (b) having a recrystallized structure in a cross section perpendicular to the width direction of a rolled plate, respectively. Indicates. After the microstructure was corroded with aqua regia saturated with cupric chloride (about 10 seconds), 400
It was observed with a double microscope. The material (a) of the present invention has a fibrous rolling structure, and is characterized in that it is difficult to recognize clear crystal grain boundaries as in the comparative material (b). by this,
As shown in FIG. 2, the material (a) of the present invention is the comparative material (b).
As shown in FIG. 2, the unevenness of the etching surface due to the influence of crystal grains, which is a problem with
It is clear from the comparison of.

【0009】一般に、Fe−Ni系合金は再結晶過程で
立方体組織(結晶の各{100}面が圧延材の長さ、
幅、厚み、それぞれの方向に直角となる配置)を形成し
易い。そして、安定な立方体組織を得るには、例えば8
5%以上の冷間圧延率と700℃以上の焼鈍の組合せが
適当である。この処理により、圧延面に平行な{10
0}面の方位集積度が十分に高められる。すなわち、本
発明材料の製造方法において、前駆材料として、仕上圧
延前までの過程で最低1回は十分に再結晶させ十分な立
方体組織を得ることが最適な繊維状の圧延組織を得る点
で非常に重要である。
In general, an Fe-Ni alloy has a cubic structure (each {100} face of the crystal is the length of the rolled material in the recrystallization process,
It is easy to form a width and a thickness, which are arranged at right angles to the respective directions. To obtain a stable cubic tissue, for example, 8
A combination of a cold rolling rate of 5% or more and annealing at 700 ° C or more is suitable. By this process, {10
The degree of orientation integration of the 0} plane is sufficiently increased. That is, in the method for producing the material of the present invention, it is very important to recrystallize the precursor material at least once in the process before finish rolling to obtain a sufficient cubic structure in order to obtain an optimal fibrous rolling structure. Is important to.

【0010】図3および図4は、それぞれ図中に示した
条件による圧延と焼鈍で調製した十分に立方体組織が発
達した本発明のFe−36Ni前駆材料(○印)と、冷
間圧延率85%未満または焼鈍の温度が700℃未満で
調製され、不十分な立方体組織を有する比較材のFe−
36Ni前駆材料(△印および菱形印)について、上記
の焼鈍まま(図4のみ)、その後圧下率80%の冷間圧
延とさらにその後各温度の焼鈍を施したときの硬さの関
係、および圧延面の{100}方位集積度(%)の関係
を示したものである。図3から、本発明の前駆材料は、
再結晶化温度が高温側にシフトしており、875℃以下
の焼鈍温度に対してもビッカ−ス硬さが約130以上
と、比較材料に較べ結晶組織が非常に安定しているこ
と、また、図4から、80%の冷間圧延やその後の焼鈍
温度850℃までは{100}方位集積度の変化がほと
んどなく、したがって、冷間圧延や、焼鈍によっても結
晶方位の変化に対し影響を受けることが非常に小さいこ
とがわかる。そのため、本発明材料は、高い{100}
方位集積度を維持したまま繊維状の圧延組織を有するこ
とができるものである。
FIG. 3 and FIG. 4 respectively show the Fe-36Ni precursor material of the present invention (circle mark) of the present invention having a sufficiently cubic structure developed by rolling and annealing under the conditions shown in the figures, and a cold rolling rate of 85. % Of Fe or an annealing temperature of less than 700 ° C. and a comparative material Fe− having an insufficient cubic structure
With respect to the 36Ni precursor material (marked with Δ and diamond), the relationship between the hardness as it was when annealed as described above (only in FIG. 4), then cold rolled at a reduction rate of 80%, and then annealed at each temperature, and rolling. It shows the relationship of the {100} orientation integration degree (%) of the plane. From FIG. 3, the precursor material of the present invention is
The recrystallization temperature is shifted to the high temperature side, and the Vickers hardness is about 130 or more even at an annealing temperature of 875 ° C. or less, and the crystal structure is very stable as compared with the comparative material. From FIG. 4, there is almost no change in the {100} orientation integration degree up to 80% cold rolling and the subsequent annealing temperature of 850 ° C. Therefore, there is no effect on the change in crystal orientation by cold rolling or annealing. It turns out that receiving is very small. Therefore, the material of the present invention has a high {100}
It is possible to have a fibrous rolling structure while maintaining the orientation integration degree.

【0011】図5は、本発明の繊維状組織を有するFe
−36Ni材(○印、繊維状組織≒100%、{10
0}方位集積度95%)と、従来の再結晶組織を有する
Fe−36Ni材(△印、繊維状組織≒0%、{10
0}方位集積度90%)について、42ボ−メ、50ボ
−メの各エッチング液でエッチングしたときの、それぞ
れエッチング液の温度とエッチング面粗さの関係を示し
たものである。図中の比較からもわかるようにエッチン
グ液が高温、低ボ−メ度である程、エッチング面粗さは
大きくなっている。本発明材料では従来材料の50℃、
50ボ−メでのエッチング面粗さと同じレベル(0.4
μm)のものが70℃、42ボ−メで得られることがわか
る。エッチング条件が高温・低ボ−メになればエッチン
グ速度が上昇する。したがって、本発明材料ではエッチ
ング速度の上昇によりサイドエッチングの減少、ライン
速度の上昇、低ボ−メによるエッチング後の洗浄時間の
短縮などの効果が約束される。
FIG. 5 shows Fe having the fibrous structure of the present invention.
-36Ni material (○, fibrous structure ≈ 100%, {10
Fe-36Ni material (0 mark, fibrous structure ≈ 0%, {10
0} azimuth degree of integration 90%), the relationship between the temperature of the etching solution and the etching surface roughness is shown when etching is performed with each of the 42-bore and 50-bore etching solutions. As can be seen from the comparison in the figure, the higher the temperature of the etching solution and the lower the degree of boke, the larger the etching surface roughness. The material of the present invention is 50 ° C,
The same level as the etched surface roughness at 50 bore (0.4
It can be seen that the one having a diameter of 70 μm is obtained at 70 ° C. and 42 boke. If the etching conditions are high temperature and low volume, the etching rate increases. Therefore, the material of the present invention promises effects such as a decrease in side etching due to an increase in etching rate, an increase in line speed, and a reduction in cleaning time after etching due to low brome.

【0012】次に本発明の数値限定理由を述べる。Ni
含有量は、30%未満ではオ−ステナイト組織が不安定
となり、一方60%を超えると熱膨張率が上昇し、本来
の低熱膨張特性を満足しないことから、Ni%は30〜
60%に限定する。圧延面に平行な面の{100}方位
集積度が85%未満ではエッチング速度が低下し、ま
た、これに伴って、サイドエッチング量が増加するた
め、圧延面の{100}方位集積度は85%以上に限定
する。なお、本発明においてFe−Ni系合金とは、N
i30〜60%を含み、残部は不純物を除いて、実質的
にFeからなるFe−Ni合金のみならず、エッチング
性を劣化させない範囲で、主に高強度化、耐食性向上、
熱膨張調整の目的等で該目的に応じて添加されるCo、
Cr、Nb、Ti、Zr、Mo、V、W、Beを単独ま
たは複合で添加したものを含む。
Next, the reasons for limiting the numerical values of the present invention will be described. Ni
If the content is less than 30%, the austenite structure becomes unstable, while if it exceeds 60%, the coefficient of thermal expansion rises, and the original low coefficient of thermal expansion is not satisfied.
Limited to 60%. If the {100} orientation integration degree of the plane parallel to the rolled surface is less than 85%, the etching rate decreases, and the side etching amount increases accordingly. Therefore, the {100} orientation integration degree of the rolled surface is 85%. Limited to at least%. In the present invention, the Fe-Ni alloy means N
i30 to 60%, and the balance except for impurities, not only Fe-Ni alloy consisting essentially of Fe, but mainly in the range not to deteriorate the etching property, to increase the strength, improve the corrosion resistance,
Co added according to the purpose for the purpose of adjusting thermal expansion,
Includes Cr, Nb, Ti, Zr, Mo, V, W and Be added alone or in combination.

【0013】[0013]

【実施例】表1に概略成分と加工条件、特性等をまとめ
て示すように、A、B、C、D、E1〜9(FはAと同
一溶解)の各種のFe−Ni系合金を真空誘導溶解、鋳
造し、次いで1100〜1150℃で鍛造、熱間圧延を
行って、所定厚みの熱間圧延コイルとし、表面を酸洗、
研磨後前駆材料欄に示す冷間圧延およびこれに続く焼鈍
を施してそれぞれ前駆材料を調製した。続いて、仕上材
料欄に示す冷間圧延を施して厚みを0.15mmとし、
次いでやはり同欄に示す温度の焼鈍(最終焼鈍)を施し
た。前駆材料欄、仕上材料欄それぞれの焼鈍後の圧延面
に平行な面の{100}方位集積度を測定するととも
に、最終焼鈍後の材料について、硬さ、圧延板幅方向に
垂直な断面における顕微鏡写真による繊維状組織面積率
とエッチング試験によるエッチング面粗さ(Ra)を測
定した。
EXAMPLES As shown in Table 1 by summarizing the outline components, processing conditions, characteristics, etc., various Fe-Ni alloys of A, B, C, D, E1 to 9 (F is the same as A) were used. Vacuum induction melting, casting, then forging at 1100 to 1150 ° C., hot rolling to obtain a hot rolled coil of a predetermined thickness, and pickling the surface,
After polishing, cold rolling shown in the column of precursor materials and subsequent annealing were performed to prepare precursor materials. Subsequently, cold rolling shown in the finishing material column is performed to make the thickness 0.15 mm,
Then, the annealing (final annealing) at the temperature shown in the same column was performed. The {100} orientation integration degree of the plane parallel to the rolled surface after annealing in each of the precursor material column and the finishing material column was measured, and the hardness of the material after the final annealing and the microscope in the cross section perpendicular to the width direction of the rolled plate The fibrous structure area ratio by the photograph and the etched surface roughness (Ra) by the etching test were measured.

【0014】{100}方位集積度は、{111}、
{100}、{110}、{311}の主たる方位のX
線回折での相対強度Iから次式により求めた。 D{100}%=I{100}×100/(I{11
1}+I{100}+I{110}+I{311}) エッチング試験は0.15mm厚焼鈍素材を熱アルカリ
脱脂し、所定のパタ−ンのフォトレジストをマスキング
処理後、FeCl3液にて50℃、50ボ−メと60
℃、42ボ−メの条件でそれぞれスプレ−エッチングを
行なった。エッチング面粗さはエッチング面について板
幅方向に測定した。しかし、圧延方向との差はほとんど
なかった
The degree of {100} orientation integration is {111},
X of the main directions of {100}, {110}, and {311}
It was determined from the relative intensity I in line diffraction by the following formula. D {100}% = I {100} × 100 / (I {11
1} + I {100} + I {110} + I {311}) In the etching test, the 0.15 mm thick annealed material is degreased with hot alkali, and the photoresist of a predetermined pattern is masked, and then FeCl 3 solution is used at 50 ° C. , 50 bom and 60
Spray etching was performed under the conditions of 42 ° C. and 42 ° C., respectively. The etching surface roughness was measured in the width direction of the etching surface. However, there was almost no difference from the rolling direction

【0015】[0015]

【表1】 [Table 1]

【0016】本発明材料A1〜E9は、熱間圧延後の材
料に前駆材料欄に示したごとき85%以上の冷間圧延
と、700℃以上の焼鈍をそれぞれ施されることによ
り、圧延面に平行な面の{100}方位集積度がほぼ1
00%となって安定な立方体組織になり、その後、前駆
材料の調製での冷間圧延の圧延率を越えない冷間圧延や
それに続く850℃を越えない焼鈍後において、図3、
4で述べたごとく、再結晶温度が高温側にシフトすると
ともに、圧延面の{100}方位集度が高いまま維持さ
れている。
The materials A1 to E9 of the present invention are subjected to cold rolling of 85% or more as shown in the precursor material column and annealing of 700 ° C. or more to the material after hot rolling, and Parallel plane {100} orientation integration is almost 1
A cubic structure with a stable cubic structure of 00% is obtained, and after that, after cold rolling that does not exceed the rolling rate of cold rolling in the preparation of the precursor material and subsequent annealing that does not exceed 850 ° C., FIG.
As described in 4, the recrystallization temperature shifts to the high temperature side and the {100} orientation concentration of the rolled surface is maintained high.

【0017】この結果、この高い{100}方位集積度
による立方体組織安定化作用と再結晶遅延効果により、
繊維組織が高度に発達したままであり、従来のごとき明
瞭な結晶粒界を有しない繊維状圧延組織による作用とに
より、本発明材のエッチング面の表面粗さRa値は従来
材に比べ非常に低い値になっている。このため、本発明
材の高温・低ボ−メ(60℃、42ボ−メ)でのエッチ
ング面粗さは、比較材料では、エッチング条件を低温・
高ボーメ(50℃、50ボーメ)としても得られない低
い値となっている(Ra0.32〜0.37)。
As a result, the cubic texture stabilizing effect and recrystallization retarding effect due to the high degree of {100} orientation integration results in
Due to the fact that the fibrous structure remains highly developed and the action of the fibrous rolled structure does not have clear grain boundaries as in the conventional case, the surface roughness Ra value of the etched surface of the material of the present invention is much higher than that of the conventional material. It is a low value. Therefore, the etching surface roughness of the material of the present invention at a high temperature and a low bow (60 ° C., 42 bow) is the same as that of the comparative material.
The value is low (Ra 0.32 to 0.37) that cannot be obtained even with high baume (50 ° C, 50 baume).

【0018】これに対し、F1〜F5の比較材料は、前
駆材料欄に示したような、不適正な冷間圧延条件(F
1、F5)もしくは、不適正な焼鈍条件(F2、F5)
により立方体組織の発達が不十分、または仕上げ材料欄
に示したような、不適正な冷間圧延条件(前駆材料の圧
延率より高い F3)、もしくは、不適正な焼鈍条件
(850℃を越える過度に高温・・・図4参照 F4)に
より、立方体組織が壊されており、その結果、仕上げ材
料のミクロ組織は従来と同様の再結晶組織となってしま
い、高温・低ボ−メ(60℃、42ボ−メ)ではもちろ
ん、低温・高ボーメとしても、本発明材料の高温・低ボ
ーメでのエッチング面の表面粗さRa値は対応する本発
明材のRa値に及ばないものである。また、本発明材料
は、図3でも述べた再結晶温度が高いことから従来材に
比べ高強度である利点を有する。
On the other hand, the comparative materials of F1 to F5 are not suitable for cold rolling conditions (F
1, F5) or inappropriate annealing conditions (F2, F5)
Due to insufficient cubic structure development, or inappropriate cold rolling conditions (F3 higher than the rolling ratio of the precursor material) as shown in the finishing material column, or inappropriate annealing conditions (excessive temperature exceeding 850 ° C). High temperature ... See Fig. 4 F4) destroys the cubic structure, and as a result, the microstructure of the finishing material becomes a recrystallized structure similar to the conventional one, resulting in high temperature and low body (60 ° C). , 42 bom) and of course low temperature / high bow, the surface roughness Ra value of the etched surface of the material of the present invention at high temperature / low bow is less than the Ra value of the corresponding material of the present invention. Further, the material of the present invention has an advantage that it has higher strength than the conventional material because of the high recrystallization temperature described in FIG.

【0019】[0019]

【発明の効果】以上述べたように、本発明のFe−Ni
系薄板は、従来の再結晶組織を有する材料とは異なった
繊維状の圧延組織を有するものであり、これにより従来
低温・高ボ−メのエッチング条件でしか得られなかった
エッチング性を高温またはおよび低ボ−メのエッチング
条件で得ることができるFe−Ni系薄板である。高温
・低ボ−メでのエッチング加工が可能なことで、エッチ
ング速度を上げることができ、サイドエッチングの減
少、エッチング時間の短縮、低ボ−メによる洗浄の簡便
化が期待できるもので、工業上の効果は極めて大なるも
のである。
As described above, the Fe--Ni of the present invention is used.
The system thin plate has a fibrous rolling structure different from that of the conventional material having a recrystallization structure, and therefore, the etching property which has been obtained only under the etching conditions of low temperature and high brome at high temperature or And a Fe-Ni-based thin plate that can be obtained under low-bome etching conditions. Since it is possible to perform etching processing at high temperature and low volume, it is possible to increase the etching rate, reduce side etching, shorten etching time, and simplify cleaning with low volume. The above effect is extremely large.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明材料と比較材料の金属断面ミクロ組織写
真である。
FIG. 1 is a photograph of a metal structure microstructure of a material of the present invention and a comparative material.

【図2】本発明材料と比較材料のエッチング面の金属ミ
クロ組織の走査電子顕微鏡写真である。
FIG. 2 is a scanning electron micrograph of the metal microstructures of the etched surfaces of the inventive material and the comparative material.

【図3】最終焼鈍温度と硬さの相関図である。FIG. 3 is a correlation diagram between final annealing temperature and hardness.

【図4】最終焼鈍温度と{100}方位集積度の相関図
である。
FIG. 4 is a correlation diagram between final annealing temperature and {100} orientation integration degree.

【図5】エッチング条件に対するエッチング面粗さの相
関図である。
FIG. 5 is a correlation diagram of etching surface roughness with respect to etching conditions.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 重量%でNi30〜60%を含有するF
e−Ni系合金において、圧延面に平行な面の{10
0}方位集積度が85%以上で、かつ、圧延材の板幅方
向に垂直な断面のミクロ組織が繊維状圧延組織を有する
ことを特徴とする高温・低ボーメ度エッチング処理用F
e−Ni系薄板。
1. F containing 30-60% Ni by weight.
In an e-Ni-based alloy, the surface parallel to the rolling surface {10
F for high temperature and low bowing degree etching, characterized in that the degree of 0} orientation integration is 85% or more, and the microstructure of the cross section perpendicular to the sheet width direction of the rolled material has a fibrous rolled structure.
e-Ni type thin plate.
【請求項2】 重量%でNi30〜60%を含有するF
e−Ni系合金を熱間加工後、冷間圧延と焼鈍を施し、
圧延面に平行な面の{100}方位集積度を十分高めて
結晶方位を安定化した後、さらに、前記冷間圧延の圧延
率を越えない圧延率の冷間圧延と再結晶を起こさない温
度範囲の焼鈍を施して、圧延面に平行な面の{100}
方位集積度が85%以上で、かつ、圧延材の板幅方向に
垂直な断面でのミクロ組織が繊維状圧延組織とすること
を特徴とする高温・低ボーメ度エッチング処理用Fe−
Ni系薄板の製造方法。
2. F containing 30-60% Ni by weight.
After hot working the e-Ni alloy, cold rolling and annealing are performed,
After increasing the {100} orientation integration degree of the plane parallel to the rolling plane to stabilize the crystal orientation, cold rolling at a rolling rate not exceeding the rolling rate of the cold rolling and the temperature at which recrystallization does not occur Annealed in the range, {100} on the surface parallel to the rolling surface
Fe-for high-temperature / low Baume degree etching treatment characterized in that the degree of orientation integration is 85% or more, and the microstructure in the cross section perpendicular to the sheet width direction of the rolled material is a fibrous rolled structure.
Manufacturing method of Ni-based thin plate.
JP13262093A 1993-05-10 1993-05-10 Fe-ni base thin sheet for high temperature and low baume degree etching treatment and its production Pending JPH06322485A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13262093A JPH06322485A (en) 1993-05-10 1993-05-10 Fe-ni base thin sheet for high temperature and low baume degree etching treatment and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13262093A JPH06322485A (en) 1993-05-10 1993-05-10 Fe-ni base thin sheet for high temperature and low baume degree etching treatment and its production

Publications (1)

Publication Number Publication Date
JPH06322485A true JPH06322485A (en) 1994-11-22

Family

ID=15085591

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13262093A Pending JPH06322485A (en) 1993-05-10 1993-05-10 Fe-ni base thin sheet for high temperature and low baume degree etching treatment and its production

Country Status (1)

Country Link
JP (1) JPH06322485A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109628864A (en) * 2018-12-21 2019-04-16 南京工程学院 The method for improving G3 sheet alloy pitting resistance is preferentially distributed using dense crystal plane

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109628864A (en) * 2018-12-21 2019-04-16 南京工程学院 The method for improving G3 sheet alloy pitting resistance is preferentially distributed using dense crystal plane

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