JPH0631865U - Continuous processing tank for film materials - Google Patents

Abstract

(57) [Summary] [Purpose] To prevent the film material from moving during processing. A belt guide device that includes an upper roller (31), a lower roller (32), and a belt (33) and is capable of traveling in the same direction as the conveyance direction of a film material (F) in a treatment liquid (Q). (30) and a liquid jetting means (40) for jetting the liquid from each outer surface side of the film material (F) are provided, and the film material (F) is conveyed while being pressed against the belt (33).

Description

[Detailed description of the device]

[0001]

[Industrial applications]

 The present invention relates to a continuous processing tank for film materials. Especially, it is used for conveying and processing ultra-thin and wide film materials with low tension.

[0002]

[Prior art]

 The film material continuous processing tank, which carries out predetermined processing continuously while detouring the film material suspended between the transfer rollers in the processing liquid in the tank body, consists of a plating device, an alumite device, an etching device, etc. Widely used as an element.

FIG. 3 exemplifies a continuous processing tank used for continuous plating. In the figure, reference numeral 1 denotes a bath main body, which stores a plating solution Q, electrodes 2 and 2 are provided on both side walls, and riser pipes 5 and 5 for solution circulation are provided below. Further, a driven roller 15 rotatably held is provided at the center.

Here, the film material F is hung down between the two upper conveying rollers 10 and 20, and is detoured via the driven roller 15, and is continuously conveyed in the Y direction. That is, by feeding a constant tension to the film material F by the transport roller 20 or a driving roller (not shown) and energizing the film material F and the electrode 2 while transporting the film material F in the Y direction, the outer surfaces Fo 1 and Fo 2 are continuously connected. Apply plating treatment. Even in the case of another continuous processing tank (for example, a water washing tank) from which the electrodes 2 and 2 have been removed, the drooping detour transportation of the film material F is the same.

By the way, when the film material F is an FPC (Flexible Printed Circuit) material 100 shown in FIG. 4A, the FPC material 100 is extremely thin (for example, 25 μm), for example, extremely thin (for example, 1 μm) on the polyimide resin film 102. The copper foil 101 is formed by vapor deposition or the resin 102 is coated on the copper foil 101. Further, in preparation for the FPC completion step, a resist 102R for the resin 102 and a resist 101R for the copper foil 101 are applied. Even when the resists 101R and 102R are integrally formed, the total thickness is about 100 μm.

By the way, as a completion process, for example, a resist 101R exposure and etching process, a plating process for forming a pattern 110 composed of a large number of electric paths 111, 111, a bonding hole including exposure and etching of the resist 101R are used. 102H forming step. Thus, the completed FPC is often in the form shown in (B).

Further, in such an ultra-thin FPC material 100, it is necessary to convey it at a tension of 300 g and a speed of 0.3 to 1.0 m / min. Therefore, as shown in FIG. Only the narrow film material F that can be formed only in rows can be continuously processed. In such a case, the width Wp is limited to 35 mm or less at most. In other words, as shown in (B), if a wide FPC material 110 (F) having a width dimension W capable of forming a plurality of patterns 110 in parallel, for example, a wide FPC material 110 (F) can be smoothly transported and continuously processed, It is clear that the productivity and quality of can be greatly improved. The same applies to the film material F that is subjected to other processing.

[0008]

[Problems to be solved by the device]

 However, according to the conventional structure, although there is no problem with an extremely thick and narrow coil material or the like, with respect to the film material, even if the width dimension Wp of the film material F is 35 mm or less, it is originally functionally flexible. Since it is abundant and no measures have been taken, the liquid material circulating in the tank body 1 causes the film material F to fluctuate or swing in two-dimensional or three-dimensional directions. Therefore, for example, in the case of plating treatment, not only the distance between the electrodes fluctuates and the quality thereof deteriorates, but also there is a strong possibility that a short circuit accident or a burnout may be caused by contact with the electrodes 2 and 2. Further, if the rotational resistance of the driven roller 15 increases due to a change with time or the like, the frictional resistance between the driven roller 15 and the film material F increases due to the low tension, which causes a problem that the transportation itself stops. Thus, it is difficult to continuously and stably convey the wide film material F, which has a more violent and more complicated swing, and the continuous processing is not yet performed.

The object of the present invention is to prevent even the extremely thin and wide film material from moving and rocking in the processing liquid, and to carry it smoothly, thereby improving both productivity and quality by continuous processing. An object of the present invention is to provide a continuous processing tank for film materials.

[0010]

[Means for Solving the Problems]

 The present invention effectively utilizes the fact that the film material, which has been the cause of the above-mentioned conventional problems, is extremely thin and has low rigidity, and presses the film material against a belt that is difficult to deform to prevent its movement. The object is achieved by adopting a structure that can also reduce frictional resistance.

That is, a film material continuous processing tank according to the present invention includes a tank body for storing a processing liquid, and a film material for carrying out a predetermined processing continuously on a film material which is transported by a detour between transport rollers. The continuous processing tank includes an upper roller, a lower roller disposed in the processing liquid, and a belt stretched between the rollers, and the belt is formed to be rotatable in the same direction as the film material conveying direction. And a belt guide device disposed between both inner surfaces of the film material suspended in a U-shape in the tank body, and each inner surface of the film material suspended in a U-shape in the tank body by the belt. And a liquid jetting means for jetting liquid from the outer surface side of the film material so as to be able to be pressed against each outer surface.

[0012]

[Action]

 In the present invention having the above structure, the film material guided into the processing liquid has its inner surface pressed against the outer surface of the belt of the belt guide device by the hydraulic pressure flow from the liquid ejection means, so that the film material can be prevented from moving in the processing liquid. . Further, since the film material is bypassed in the processing liquid together with the rotating belt, it is possible to eliminate the situation that the frictional resistance with the driven roller increases. Therefore, high-quality, high-efficiency continuous processing can be performed under smooth transportation.

[0013]

【Example】

 Embodiments of the present invention will be described below with reference to the drawings. As shown in FIGS. 1 and 2, the continuous processing tank for the film material is provided with a belt guide device 30 and a liquid jetting means 40, and each inner surface Fi, Fi of the film material F is placed in the processing liquid Q to form a belt 33. The frictional resistance between the film material F and the belt 33 is removed by pressing against each outer surface of the film and rotating it together with the belt 33 so that continuous processing can be performed efficiently while being smoothly transported. Is formed. Therefore, the processing quality and productivity of ultra-thin and wide film materials can be greatly improved and the cost can be reduced.

In this embodiment, the width direction guide devices 50, 50 are provided to regulate the meandering of the film material F.

In FIG. 1 and FIG. 2, the continuous processing tank is a continuous plating processing tank including a tank body 1 in which a plating solution Q is stored, electrodes 2, 2 and conveying rollers 10 and 20, and the film material F is Y. It is possible to perform continuous plating on the outer surfaces Fo 1 and Fo 2 of the film material F that has been circumvented into the plating solution Q while being conveyed in the direction.

The belt guide device 30 includes an upper roller 31, a lower roller 32 arranged in the plating solution Q, and a belt 33 stretched between the rollers 31 and 32. 33 is formed so as to be able to travel in the same direction as the transport (Y) direction of the film material F, and as a whole (30), it is hung between the inner surfaces F i, Fi of the film material F hung in the tank body 1 in a U shape It is installed in. The belt 33 is formed of a synthetic resin having a high chemical resistance of several mm, and the width dimension thereof is about 1 mm larger than the width dimension of the film material F. Further, the rollers 31 and 32 are stretched with sufficient tension so that they do not fluctuate or oscillate due to the fluid pressure flow caused by the fluid ejection.

Further, in this embodiment, the traveling speed of the belt 33 is selected to be the same as the conveying speed of the film material F. Therefore, since the film material F can be rotated synchronously with the belt 33, it is not necessary to consider the magnitude of the frictional resistance between the film material F and the belt 33. In other words, even if the film material F is conveyed with a low tension (for example, 300 g), the frictional resistance between them does not affect, so that smooth conveyance can be stably performed.

Next, the liquid jetting means 40 causes the inner surface Fi of the film material F introduced into the tank main body 1 to the outer surface Fo of the film material F by a hydraulic pressure flow capable of pressing the inner surface Fi of the film material F to the outer surface of the belt 33. In the case of this embodiment, it is a means for ejecting liquid, and is formed from a plurality of riser pipes 41 and a liquid circulation device (overflow tank 1F, circulation pipe 43, pump 44) shown in FIGS.

The ejected liquid from the riser pipe 41 is formed so as to hit the film material F vertically, but it may be an upward inclined flow or a downward inclined flow. Here, sufficient liquid circulation can be performed even if the conventional riser pipes 5 and 5 in the tank body 1 are eliminated, and the activity of the plated surface (Fo, Fo) can be further enhanced. Therefore, the plating efficiency can be improved and a high quality coating can be formed.

Further, the widthwise guide device 50 additionally provided in this embodiment is composed of two pairs of guide members 51, 52 provided on both sides in the longitudinal direction of the tank body 1 as shown in FIG. ing. The first restricting surface 53 of the guide member 50 restricts the meandering of the film material F, and the second restricting surface 54 on the other hand is in an initial state where the hydraulic pressure from the liquid jetting means 40 is not established or due to a failure. It also has the role of restricting the free floating property of the film material F in the event of insufficient hydraulic pressure.

Next, the operation of this embodiment will be described. While driving the belt guide device 30 and the liquid ejecting means 40, the film material F is fed in the Y direction using the transport rollers 10 and 20.

Since a hydraulic flow is applied to the outer surfaces Fo, Fo of the film material F, the inner surfaces Fi, Fi are pressed against the corresponding outer surfaces of the belt 33, and the film material F can be completely prevented from moving in the plating solution Q. . The distance between the film material F (Fo, Fo) and the electrodes 2 and 2, that is, the distance between the electrodes is also constant.

Further, the film material F is detoured in the plating solution Q at the same speed as the traveling speed of the belt 33 while being pressed against the belt 33, and is fed in the Y direction. Therefore, since the problem of increase / decrease in frictional resistance between the belt 33 and the film material F is irrelevant, it can be smoothly conveyed even with a low tension of 300 g.

If one electrode of the power supply device is connected to the film material F via the transport roller 10 and the other electrode is connected to both electrodes 2 and 2 to energize, the outer surfaces Fo and Fo of the power supply device are continuously contacted. You can apply. At this time, since liquid pressure flow is applied from the liquid ejection means 40 (41, 41) to the outer surfaces Fo, Fo, the activity is enhanced and high-quality plating treatment can be performed with high efficiency.

When the film material F meanders vertically moving in FIG. 2 during continuous conveyance, the width direction guide device 50 (53, 53) regulates the film material F to a small value. Even if the hydraulic flow is stopped for some reason, the guide surfaces 54, 54 prevent the play.

Therefore, according to this embodiment, the belt guide device 30 and the liquid jetting means 40 (41) are provided in the tank main body 1, and the film material F and the belt 33 are made to rotate in the same direction. Since the film material F is pressed against the belt 33 by the hydraulic pressure flow, it is possible to completely prevent the film material F from moving and swinging in the treatment liquid Q, so that even an extremely thin and wide film material F can be smoothly processed. It can be transported and stable continuous processing can be performed.

Further, since the belt guide device 30 is formed of the rollers 31 and 32 that rotate in synchronization with each other and the belt 33 that is stretched between these rollers and has high rigidity, it is possible to reliably prevent the film material F from moving. Moreover, there is no need to worry about an increase or decrease in frictional resistance with the film material F, and smooth transport can always be carried out. Therefore, it can be applied to a film material F which is much thinner and wider.

Further, since the liquid jetting means 40 is formed so as to apply a hydraulic pressure flow perpendicularly to the film material F (outer surface Fo) from the plurality of riser pipes 41, it is only possible to prevent the movement in the processing liquid Q. The activation of the treated surface (Fo, Fo) can be greatly improved. Therefore, high quality processing can be performed with high efficiency.

Further, since the liquid ejecting means 40 can use a part (1F, 43, 44) of the conventional liquid circulating device as it is, the cost burden is small.

Further, since the film material F in the plating solution Q does not move, the distance between the electrodes 2 and 2 can be reduced, so that the current supply efficiency can be improved and the size of the tank body 1 can be reduced.

[0031]

[Effect of device]

 According to the present invention, the belt guide device and the liquid jetting means are provided in the tank body, and the film material and the belt are rotated in the same direction and the film material is pressed against the belt by the liquid pressure flow. Therefore, it is possible to completely prevent the film material from floating or swinging in the processing liquid, and even an extremely thin and wide film material can be smoothly transported and stable continuous processing can be performed.

[Brief description of drawings]

FIG. 1 is a side view showing an embodiment of the present invention.

FIG. 2 is likewise a plan view.

FIG. 3 is a side view for explaining a conventional example.

FIG. 4 is a vertical cross-sectional view for explaining an example of a film material of the present invention and a conventional example.

FIG. 5 is a plan view of the same.

[Explanation of symbols]

 1 Tank Main Body 1F Overflow Tank 2 Electrodes 10 and 20 Conveying Roller 15 Driven Roller 30 Belt Guide Device 31 Upper Roller 32 Lower Roller 33 Belt 40 Liquid Ejection Means 41 Riser Pipe 43 Liquid Circulation Piping 44 Pump 50 Width Direction Guide Device 51, 52 Guide Member 53 First restriction surface 54 Second restriction surface

Claims (1)

[Scope of utility model registration request] 1. A continuous processing tank for a film material, comprising a tank main body for storing a processing liquid, for continuously performing a predetermined processing on a film material which is drooped between transport rollers, wherein the upper roller and the processing liquid are in contact with each other. A lower roller provided and a belt stretched between the rollers are formed, and the belt is formed to be rotatable in the same direction as the film material conveying direction, and is hung in a U-shape in the tank body. And a belt guide device disposed between both inner surfaces of the film material, and the inner surface of the film material hanging in a U-shape in the tank body can be pressed against the outer surface of the belt from the outer surface side of the film material. And a liquid jetting means for jetting the film.