JP3482117B2 - Inner lead bending prevention transfer method for chemical treatment tank of film carrier conductor pattern - Google Patents

Inner lead bending prevention transfer method for chemical treatment tank of film carrier conductor pattern

Info

Publication number
JP3482117B2
JP3482117B2 JP34764597A JP34764597A JP3482117B2 JP 3482117 B2 JP3482117 B2 JP 3482117B2 JP 34764597 A JP34764597 A JP 34764597A JP 34764597 A JP34764597 A JP 34764597A JP 3482117 B2 JP3482117 B2 JP 3482117B2
Authority
JP
Japan
Prior art keywords
film carrier
opening
conductor pattern
chemical treatment
treatment tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP34764597A
Other languages
Japanese (ja)
Other versions
JPH11186342A (en
Inventor
真 西原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Mining and Smelting Co Ltd
Original Assignee
Mitsui Mining and Smelting Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Mining and Smelting Co Ltd filed Critical Mitsui Mining and Smelting Co Ltd
Priority to JP34764597A priority Critical patent/JP3482117B2/en
Publication of JPH11186342A publication Critical patent/JPH11186342A/en
Application granted granted Critical
Publication of JP3482117B2 publication Critical patent/JP3482117B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0097Processing two or more printed circuits simultaneously, e.g. made from a common substrate, or temporarily stacked circuit boards

Landscapes

  • ing And Chemical Polishing (AREA)
  • Wire Bonding (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、 TAB(Tap
e Automated Bonding)テープ等の
フィルムキャリア導体パターンの製造方法に関する。
TECHNICAL FIELD The present invention relates to TAB (Tap).
The present invention relates to a method of manufacturing a film carrier conductor pattern such as an e-Automated Bonding) tape.

【0002】[0002]

【従来の技術】TAB、BGA、CSPテープ等のフィ
ルムキャリア導体パターン(以下フィルムキャリアと称
する)は、ポリイミドフィルム等の光透過性フィルムの
中央部に矩形のデバイスホールを設け、その四辺の位置
に多数本のリードを配置している。リードは光透過性フ
ィルムに接着されている。リードは、その先端部がデバ
イスホール上に突出しており、この突出部分をインナー
リードと称する。これらのリードのパターン形状は、エ
ッチングによって形成される。さらに、フィルムキャリ
アの製造工程においては、エッチングに使用するレジス
トの除去、エッチング工程においてリードパターンをバ
ックアップするバックアップ層の除去等において各種液
体による化学処理を行う。
2. Description of the Related Art A film carrier conductor pattern (hereinafter referred to as a film carrier) such as TAB, BGA, and CSP tape is provided with a rectangular device hole in a central portion of a light-transmitting film such as a polyimide film, and is provided on four sides thereof. Many leads are arranged. The leads are adhered to the light transmissive film. The tip of the lead projects above the device hole, and this projecting portion is called an inner lead. The pattern shape of these leads is formed by etching. Further, in the manufacturing process of the film carrier, chemical treatment with various liquids is performed for removing the resist used for etching, removing the backup layer for backing up the lead pattern in the etching process, and the like.

【0003】従来例を図2を用いて説明する。図2は従
来例の化学処理槽の構成を示す図である。図2におい
て、処理槽すなわちグロット30は相対する側面部にそ
れぞれ開口部32を有する。以下、開口部32を有する
側面部を堰34と称する。フィルムキャリア36は一方
の堰34からグロット30に送入され、もう一方の堰3
4からグロット30を出るように搬送される。二つの開
口部32を結ぶ直線の延長線上であって、グロット30
の両方の外側には、フィルムキャリア36の搬送のため
の二つのローラー対38が設けてある。フィルムキャリ
ア36は、この二つのローラー対38により十分な張力
を保ちつつグロット30の中を通るように搬送される。
A conventional example will be described with reference to FIG. FIG. 2 is a diagram showing the configuration of a conventional chemical treatment tank. In FIG. 2, the processing tank, that is, the grotto 30 has openings 32 on opposite side surfaces. Hereinafter, the side surface portion having the opening 32 is referred to as a weir 34. The film carrier 36 is fed into the grotto 30 from one weir 34 and the other weir 3
4 is conveyed so as to leave the grotto 30. It is on the extension of the straight line connecting the two openings 32, and
Two roller pairs 38 for transporting the film carrier 36 are provided on both outer sides of the roller. The film carrier 36 is conveyed by the two roller pairs 38 while passing through the grotto 30 while maintaining sufficient tension.

【0004】[0004]

【発明が解決しようとする課題】しかし、従来例におい
ては、フィルムキャリア36上のインナーリードがグロ
ット30の堰34の開口部32の上側部40または下側
部42に接触し、インナーリードの曲がり不良が発生す
るという問題点があった。
However, in the conventional example, the inner lead on the film carrier 36 comes into contact with the upper side 40 or the lower side 42 of the opening 32 of the weir 34 of the grotto 30 to bend the inner lead. There was a problem that defects occurred.

【0005】この原因としては、以下の3点が考えられ
る。第1には、フィルムキャリア36のカール変形があ
る。フィルムキャリア36は、その搬送方向について
は、ローラー対38により十分に伸長されているが、フ
ィルムキャリア36上にデバイスホール、リードが形成
されているため、搬送方向に垂直な方向にはカール変形
を起こしやすい。カール変形を起こしているフィルムキ
ャリア36は、グロット30の堰34の開口部32にお
いてインナーリード等が開口部32の上側部40または
下側部42に接触しやすい。
There are three possible causes for this. First, there is curl deformation of the film carrier 36. The film carrier 36 is sufficiently extended by the roller pair 38 in the carrying direction, but since the device holes and leads are formed on the film carrier 36, curl deformation is caused in the direction perpendicular to the carrying direction. Easy to wake up. In the film carrier 36 that has undergone curl deformation, the inner leads or the like are likely to come into contact with the upper side 40 or the lower side 42 of the opening 32 in the opening 32 of the weir 34 of the grotto 30.

【0006】第2には、デバイスホールの大きさ、イン
ナーリードの長さ、幅等のフィルムキャリアの形状があ
る。グロット30内の化学処理液は、未使用の処理液を
供給しつつ処理に使用した処理液を排出するように循環
させている。すなわち、図4に示すように、グロット3
0の下部の処理液供給口44から未使用の化学処理液を
供給して二つの堰34の開口部32から排出するように
なっている。開口部32は、処理液の循環量に関連して
必要最小限の大きさとしなければならず、フィルムキャ
リア36のデバイスホールの大きさ、インナーリードの
長さ、幅等によっては、インナーリードが堰34の開口
部32の上側部40または下側部42に接触することが
ある。
Secondly, there is the shape of the film carrier such as the size of the device hole and the length and width of the inner lead. The chemical treatment liquid in the grotto 30 is circulated so as to supply the unused treatment liquid and discharge the treatment liquid used for the treatment. That is, as shown in FIG.
The unused chemical treatment liquid is supplied from the treatment liquid supply port 44 at the bottom of 0 and is discharged from the openings 32 of the two weirs 34. The opening 32 must have a minimum necessary size in relation to the circulating amount of the processing liquid, and the inner lead may be a weir depending on the size of the device hole of the film carrier 36, the length of the inner lead, the width of the inner lead, and the like. The upper side 40 or the lower side 42 of the opening 32 of 34 may come into contact.

【0007】第3には、グロット30内の液流によるフ
ィルムキャリア36の揺動がある。上記のグロット30
内の化学処理液の液流により、グロット30内にあるフ
ィルムキャリア36は揺動しやすく、これに伴いグロッ
ト30の堰34の開口部32にあるフィルムキャリア3
6も揺動しやすく、フィルムキャリア36はグロットの
開口部32の上側部40または下側部42に接触するこ
とがある。
Thirdly, the film carrier 36 swings due to the liquid flow in the grotto 30. Grotto 30 above
Due to the liquid flow of the chemical treatment liquid inside, the film carrier 36 in the grotto 30 is likely to swing, and along with this, the film carrier 3 in the opening 32 of the weir 34 of the grotto 30.
6 also swings easily, and the film carrier 36 may come into contact with the upper side 40 or the lower side 42 of the opening 32 of the grotto.

【0008】[0008]

【課題を解決するための手段】本発明においては、フィ
ルムキャリア導体パターンを化学処理槽に連続的に送入
する工程において、化学処理槽入口部および出口部の下
部に回転式ローラを設け、フィルムキャリア導体パター
ンの搬送スピードに回転式ローラを同調回転させること
としている。
According to the present invention, in the step of continuously feeding a film carrier conductor pattern into a chemical treatment tank, rotary rollers are provided below the inlet and outlet of the chemical treatment tank to form a film. The rotary roller is tuned to rotate at the transport speed of the carrier conductor pattern.

【0009】[0009]

【実施例】本発明の実施例を図1により説明する。図1
は本実施例の化学処理槽の構成を示す図である。図1に
おいて、グロット1は相対する側面部すなわち堰3にそ
れぞれ開口部5を有する。この堰3の下部はPVC(ポ
リビニルカルバゾール)製のローラー7となっており、
フィルムキャリア9の搬送スピードと同調回転する。ま
た、二つの開口部5の両方の外側には、グロット1の開
口部5よりも低い位置に二つのローラー対11(PVC
製)が設けてある。フィルムキャリア9の搬送は、グロ
ット1内と、ローラー7とローラー対11との間とでは
一定の角度αを保つようになっている。
EXAMPLE An example of the present invention will be described with reference to FIG. Figure 1
FIG. 3 is a diagram showing a configuration of a chemical treatment tank of this embodiment. In FIG. 1, the grotto 1 has an opening 5 in each of opposite side surfaces, that is, the weir 3. The lower part of the weir 3 is a roller 7 made of PVC (polyvinylcarbazole),
The film carrier 9 rotates in synchronization with the transport speed of the film carrier 9. Also, on both outsides of the two openings 5, two roller pairs 11 (PVC) are placed at a position lower than the openings 5 of the grotto 1.
Product) is provided. The film carrier 9 is conveyed such that a constant angle α is maintained between the inside of the grotto 1 and between the roller 7 and the roller pair 11.

【0010】本実施例においては、グロット1の下部に
設けた処理液供給口13から未使用の化学処理液を供給
して堰3の開口部5から排出する。フィルムキャリア9
は、その裏面をローラー7に接触させるようになってお
り、さらにローラー対11を開口部5よりも下方に設け
たことにより、フィルムキャリア9に十分な張力をか
け、フィルムキャリア9を常にローラー7に接触させる
こととが可能となる。また、ローラー7およびローラー
対11の直径は、フィルムキャリアに設けられたデバイ
スホールよりも十分大きい。
In this embodiment, an unused chemical treatment liquid is supplied from the treatment liquid supply port 13 provided at the bottom of the grotto 1 and discharged from the opening 5 of the weir 3. Film carrier 9
Has its rear surface brought into contact with the roller 7, and by providing the roller pair 11 below the opening portion 5, sufficient tension is applied to the film carrier 9 so that the film carrier 9 is always rotated. Can be brought into contact with. The diameter of the roller 7 and the roller pair 11 is sufficiently larger than the device hole provided in the film carrier.

【0011】本実施例のように、ローラー7をフィルム
キャリア9の裏面と常に接触させてグロット1内のフィ
ルムキャリア9と堰3の上部14との距離を一定に保
ち、また、ローラー7をフィルムキャリア9の搬送スピ
ードと同調回転させることにより、フィルムキャリア9
のカール、デバイスホールの大きさ、インナーリードの
長さ、液流による揺動等に起因するフィルムキャリア9
と堰3の開口部5との接触によるインナーリードの曲が
りを防止することが可能となる。また、ローラー7およ
びローラー対11の直径をデバイスホールよりも十分大
きくとってあるため、ローラー7およびローラー対11
がデバイスホール側からインナーリードに接触してイン
ナーリードが曲がることはない。なお、ローラー7およ
びローラー対11の材質はPVC以外のものであっても
よい。
As in the present embodiment, the roller 7 is constantly brought into contact with the back surface of the film carrier 9 to keep the distance between the film carrier 9 in the grotto 1 and the upper portion 14 of the weir 3 constant, and the roller 7 is set to the film. By rotating the carrier 9 in synchronism with the carrier speed, the film carrier 9
Curl, device hole size, inner lead length, swing due to liquid flow, etc.
It is possible to prevent the inner lead from bending due to contact between the inner wall and the opening 5 of the weir 3. Further, since the diameters of the roller 7 and the roller pair 11 are set sufficiently larger than the device hole, the roller 7 and the roller pair 11 are
Does not contact the inner lead from the device hole side and bend the inner lead. The rollers 7 and the roller pair 11 may be made of materials other than PVC.

【0012】[0012]

【発明の効果】化学処理槽において、フィルムキャリア
のカール、デバイスホールの大きさ、インナーリードの
長さ、液流による揺動等の接触によるインナーリード曲
がりを防止することでき、より高品質のフィルムキャリ
ア導体パターンを提供することが可能となる。
INDUSTRIAL APPLICABILITY In the chemical treatment tank, curling of the film carrier, size of the device hole, length of the inner lead, bending of the inner lead due to contact such as rocking due to liquid flow can be prevented, and a higher quality film can be obtained. It is possible to provide a carrier conductor pattern.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例の化学処理槽の構成を示す図で
ある。
FIG. 1 is a diagram showing a configuration of a chemical treatment tank according to an embodiment of the present invention.

【図2】従来例の化学処理槽の構成を示す図である。FIG. 2 is a diagram showing a configuration of a conventional chemical treatment tank.

【符号の説明】[Explanation of symbols]

1 グロット 3 堰 5 開口部 7 ローラー 9 フィルムキャリア導体パターン 11 ローラー対 1 grotto 3 weirs 5 openings 7 rollers 9 Film carrier conductor pattern 11 roller pairs

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01L 21/60 311 C23F 1/00 ─────────────────────────────────────────────────── ─── Continuation of the front page (58) Fields surveyed (Int.Cl. 7 , DB name) H01L 21/60 311 C23F 1/00

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 フィルムキャリア導体パターンを化学処
理槽に連続的に送入する工程において、該化学処理槽
入口部の側面部の開口部および出口部の側面部の開口部
の下部に回転式ローラを設け、前記入口部の側面部の開
口部と前記出口部の側面部の開口部とのそれぞれの外側
に、それぞれの開口部より低い位置にローラ対を設け、
フィルムキャリア導体パターンの搬送スピードに該回転
式ローラを同調回転させることを特徴とするフィルムキ
ャリア導体パターンの製造方法。
1. A step of continuously feeding a film carrier conductor pattern into a chemical treatment tank, wherein an opening of a side surface of an inlet portion and an opening of a side surface of an outlet portion of the chemical treatment tank are provided. A rotary roller is installed in the lower part of the
Outside of the mouth and the opening of the side of the outlet
, A roller pair is provided at a position lower than each opening,
A method of manufacturing a film carrier conductor pattern, characterized in that the rotary roller is synchronously rotated at a conveyance speed of the film carrier conductor pattern.
【請求項2】 化学処理槽入口部の側面部の開口部
よび出口部の側面部の開口部のそれぞれの下部に設けら
れた回転式ローラと、 前記入口部の側面部の開口部と前記出口部の側面部の開
口部とのそれぞれの外側に、それぞれの開口部より低い
位置に配置されたローラ対とを備え、 フィルムキャリア導体パターンの搬送スピードに該回転
式ローラを同調回転させることを特徴とするフィルムキ
ャリア導体パターンの連続化学処理装置。
Wherein each of, et al provided in the lower portion of the opening portion of the side surface of the opening contact <br/> spare outlet portion of the side surface of the inlet portion of the chemical treatment bath
And rotary rollers, open side portion of the outlet portion and the opening of the side surface portion of the inlet portion
Lower than each opening, on each outside with mouth
A continuous chemical processing apparatus for a film carrier conductor pattern, comprising : a pair of rollers arranged at a position, wherein the rotary roller is synchronously rotated at a conveying speed of the film carrier conductor pattern.
JP34764597A 1997-12-17 1997-12-17 Inner lead bending prevention transfer method for chemical treatment tank of film carrier conductor pattern Expired - Lifetime JP3482117B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34764597A JP3482117B2 (en) 1997-12-17 1997-12-17 Inner lead bending prevention transfer method for chemical treatment tank of film carrier conductor pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34764597A JP3482117B2 (en) 1997-12-17 1997-12-17 Inner lead bending prevention transfer method for chemical treatment tank of film carrier conductor pattern

Publications (2)

Publication Number Publication Date
JPH11186342A JPH11186342A (en) 1999-07-09
JP3482117B2 true JP3482117B2 (en) 2003-12-22

Family

ID=18391632

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34764597A Expired - Lifetime JP3482117B2 (en) 1997-12-17 1997-12-17 Inner lead bending prevention transfer method for chemical treatment tank of film carrier conductor pattern

Country Status (1)

Country Link
JP (1) JP3482117B2 (en)

Also Published As

Publication number Publication date
JPH11186342A (en) 1999-07-09

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