JPH0631617A - Polishing device and its method - Google Patents

Abstract

PURPOSE:To shorten the polishing time by rotatably holding a work holding member on a rocking arm to face the polishing face of a surface plate, and rotating the work holding member synchronously with the rocking of the rocking arm in a polishing device of a glass plate or the like. CONSTITUTION:A work holding member 3 is rotatably provided in the free state on a support shaft 6 suspended at the tip of a rocking arm 5 to face the polishing face 2 of a surface plate 1. A motor 8 is fitted to the tip section of the rocking arm 5, and its rotation is transferred to the spur gear 11 of a rotary member 10 rotatably supported on the support shaft 6 via a spur gear 9. The work holding member 3 is connected to the rotary member 10 with a connecting pin 12. A rocking angle detecting sensor 7 is provided on the rocking shaft 4 of the rocking arm 5, and the motor 8 is driven according to the detected angle. The work holding member 3 is rotated according to the rocking angle. Only one direction of a work can be selectively polished, and fine irregularities having directivity can be polished in a short time.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a device for polishing a glass plate or the like, and more particularly to a device for polishing the surface of a liquid crystal substrate glass with high precision.

[0002]

2. Description of the Related Art Substrate glass for liquid crystals is a glass plate whose surface flatness is extremely required. Usually, in order to achieve this flatness, a float plate glass manufactured by a float type manufacturing apparatus is further polished by a polishing apparatus. I am trying to do it.

As such a polishing apparatus, as shown in FIGS. 6 and 7, a polishing surface 101 such as a polishing cloth or a polishing pad is used.
And a glass holding member 103 to which a glass plate (work) W is attached so as to face the surface plate 102.
And the glass holding member 103 includes a swing arm 10
There is a so-called Oscar type polishing machine which is rotatably attached to a lower end portion of a support shaft 105 which hangs at a tip portion of No. 4.

In this polishing apparatus, while rotating the platen 102 at a constant speed, a chiller containing an abrasive such as cerium oxide is flown on the polishing surface 101, while the glass holding member 1 is used.
03 is attached to the polishing surface 101 of the surface plate 102.
Since the glass holding member 103 can freely rotate about its center by pressing it against the surface plate 1 with a constant polishing pressure, the surface plate 1 can be freely rotated according to the rotation of the surface plate 102.
Rock on 02.

As a result, the work W is uniformly polished by the polishing surface 101 and the polishing agent, and the fine irregularities on the work surface disappear along with the polishing, and a liquid crystal substrate glass having high flatness is obtained.

[0006]

By the way, as shown in FIG. 4, the float material manufactured by the float type manufacturing apparatus used as the material of the substrate glass for liquid crystal has a small amount in the direction orthogonal to the pulling direction. There are irregularities,
There are no minute irregularities in the pulling direction. When polishing a glass material that has directionality in such fine irregularities,
In the above-mentioned conventional Oscar type polishing apparatus, the polishing time becomes long.

[0007]

In order to solve the above problems, the present invention rotates a work holding member in synchronism with the swing of a swing arm to polish minute irregularities from a certain direction. .

[0008]

By rotating the work holding member in synchronism with the swing of the swing arm, it is possible to selectively polish only one direction of the work and shorten the polishing time when the minute irregularities have directionality. it can.

[0009]

Embodiments of the present invention will be described below with reference to the accompanying drawings. 1 is a front view of a polishing apparatus according to the present invention, FIG.
Is a plan view of the same apparatus, FIG. 3 is an operation explanatory view of the same apparatus, FIG. 4 is an explanatory view of a glass material polished by the same apparatus, and FIG. 5 is an operation explanatory view of the same apparatus.

This polishing apparatus has a surface plate 1 having a polishing surface 2 formed by sticking a polishing cloth or a polishing pad on the upper surface, and a work on which a glass plate (work) W is attached so as to face the surface plate 1. And a holding member 3. The work holding member 3 is rotatably attached to a lower end portion of a support shaft 6 that is suspended from a tip end portion of a swing arm 5 that is pivotally supported by a swing shaft 4.

A drive motor 8 is attached to the tip of the swing arm 5, and the rotation of the drive motor 8 is formed on a rotary member 10 rotatably attached to the outer periphery of the support shaft 6 via a spur gear 9. It is transmitted to the gear 11 and the rotating member 10 is connected to the work holding member 3 via the connecting pin 12. Also,
The swing shaft 4 of the swing arm 5 is provided with an angle sensor 13 such as a rotary encoder for detecting the swing angle. These members rotate the work holding member 3 in synchronization with the swing of the swing arm 5.

In the polishing apparatus configured as described above,
While rotating the platen 1 at a constant speed, a chiller containing a polishing agent such as cerium oxide is flown on the polishing surface 2, while the work W attached to the work holding member 3 is uniformly polished on the polishing surface 2 of the platen 1. Workpiece holding member 3 by pressing with pressure
Swings on the surface plate 1 in accordance with the swing of the swing arm 5.

At this time, the angle sensor 7 detects the swing position of the swing arm 5, and as shown in FIG. 3, the drive motor 8 is rotationally driven according to the detected position of the swing arm 5 to rotate the rotary member 10. The work holding member 3 is rotated in synchronism with the swing of the swing arm 5. In this case, if the direction in which the work W and the polishing surface 2 rub is consistent with the direction in which the fine irregularities of the work W always exist, the work of polishing is effectively used only for removing the fine irregularities on the surface of the work W. It will be.

That is, as shown in FIG. 4, the float glass plate manufactured by the float manufacturing apparatus has fine irregularities in the direction A orthogonal to the pulling direction B, but there is no fine irregularity in the pulling direction B. not exist. Therefore, by making the direction in which the work W (float glass plate) and the polishing surface 2 rub against each other coincide with the direction A orthogonal to the pulling direction B, effective polishing can be performed.

In this case, in reality, it is impossible to always match the directions of the two with each other, and normally, in the direction in which the minute unevenness on the surface of the work W exists at the speed at which the work W and the polishing surface 2 rub. The rotation of the work holding member 3 and the swing of the swing arm 5 are synchronized so that the cumulative value of the components during polishing is maximized.

Now, a concrete example will be described. Using the conventional Oscar type polishing apparatus and the polishing apparatus according to the present invention, the diameters of the surface plate 1 and the work holding member 3 are
The polishing processing pressure, the swing cycle of the swing arm 5, and the rotation cycle of the work holding member 3 were set as shown in Table 1, and 300 square glass with a thickness of 1.1 mm was polished.

At this time, in the polishing apparatus according to the present invention, as shown in FIG. 3, when the swing arm 5 is at the center of the surface plate 1, the direction A in which the minute irregularities exist is orthogonal to the swing arm 5. Direction, and when the swinging arm 5 is located at both ends of the surface plate 1, the swinging arm 5 moves in the direction A in which minute irregularities exist.
The direction of the swing arm 5 when it is in the center of the is matched.

Under these conditions, the cumulative value of the components during polishing in the direction A in which minute irregularities of the speed at which the glass and the polishing surface 2 rub against each other is maximized, and as a result, as shown in Table 1, the polishing time is increased. Was reduced from 5 minutes to 4 minutes by about 1 minute.

Here, the control of the rotational position of the work holding member by detecting the swing angle will be described. Referring to FIG. 5, the swing angle of the swing arm 5 is represented by the equation 1, and the rotation angle of the work holding member 3 is represented by the equation 2. In the above-described specific example, the angular velocity α of the work holding member 3 and The parameters c that determine the swing angle of the swing arm 5 are all π
/ 4 (8 seconds / cycle).

[0020]

[Equation 1]

[0021]

[Equation 2]

Further, the position of the point x of the coordinate system having the center O2 of the work holding member 3 as the origin at a certain time t is expressed by Equation 3, and the center O2 of the work holding member 3 has the swing center O1 as the origin. When viewed from the coordinate system, it is expressed by Equation 4, and by a coordinate system in which the swing center O1 at the point x is the origin, it is expressed by Equation 5.

[0023]

[Equation 3]

[0024]

[Equation 4]

[0025]

[Equation 5]

[0026]

As is apparent from the above description and the following (Table 1), according to the present invention, the work holding member is rotated in synchronization with the swing of the swing arm. Only the direction can be selectively polished, and the polishing time can be shortened when the fine irregularities of the work have directionality, thus improving the productivity.

[0027]

[Table 1]

[0028]

[Brief description of drawings]

FIG. 1 is a front view of a polishing apparatus according to the present invention.

FIG. 2 is a plan view of the device.

FIG. 3 is an explanatory view of the operation of the device.

FIG. 4 is an explanatory diagram of a glass material polished by the same device.

FIG. 5 is an explanatory view of the operation of the device.

FIG. 6 is a front view of a conventional polishing apparatus.

FIG. 7 is a plan view of the device.

[Explanation of symbols]

1 ... Surface plate, 2 ... Polishing surface, 3 ... Work holding member, 4 ... Oscillating shaft, 5 ... Oscillating arm, 6 ... Spindle, 7 ... Angle sensor, 8 ...
Drive motors, 9, 11 ... Spur gears, 10 ... Rotating members, 12
…pin.

Claims (2)

[Claims] 1. A surface plate having a polishing surface, and a work holding member which faces the polishing surface of the surface plate and is rotatably supported by a swinging arm, and holds the work surface while rotating the surface plate. In a polishing apparatus for polishing a workpiece held by a member against a polishing surface, means for rotating the workpiece holding member in synchronization with the swing of the swing arm is provided, and the workpiece is selectively polished in only one direction. A polishing device characterized by the above. 2. A polishing method in which a workpiece held by a workpiece holding member rotatably supported by a swing arm is pressed against the polishing surface of a rotating surface plate to polish the workpiece holding member of the swing arm. Rotate in synchronization with rocking,
A polishing method which selectively polishes only one direction of a work.