JPH06315683A - Mixed bed type ion exchange device and production of pure water and ultrapure water using mixed bed type ion exchange device - Google Patents
Mixed bed type ion exchange device and production of pure water and ultrapure water using mixed bed type ion exchange deviceInfo
- Publication number
- JPH06315683A JPH06315683A JP12784793A JP12784793A JPH06315683A JP H06315683 A JPH06315683 A JP H06315683A JP 12784793 A JP12784793 A JP 12784793A JP 12784793 A JP12784793 A JP 12784793A JP H06315683 A JPH06315683 A JP H06315683A
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- Prior art keywords
- water
- ion exchange
- exchange device
- mixed bed
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Treatment Of Water By Ion Exchange (AREA)
Abstract
Description
【０００１】この発明は混床式イオン交換装置並びにこ
の混床式イオン交換装置を使用した純水及び超純水の製
造方法に係り、その目的は、一次純水装置の後段に用い
られる混床塔、又は二次純水装置として使用される混床
ポリッシャーにおいて、処理水中に充填樹脂からのイオ
ンリークをほとんど生じさせず、高度化されてきた半導
体工業において好適に使用される極めて純度の高い処理
水を得ることのできる混床式イオン交換装置並びに純水
及び超純水の製造方法の提供にある。The present invention relates to a mixed bed type ion exchange apparatus and a method for producing pure water and ultrapure water using the mixed bed type ion exchange apparatus, and an object thereof is a mixed bed used in a subsequent stage of a primary pure water apparatus. In a mixed bed polisher used as a tower or a secondary deionizer, it produces almost no ion leak from the filling resin in the treated water, and is a highly pure treatment that is suitable for use in the advanced semiconductor industry. (EN) Provided are a mixed bed type ion exchange apparatus capable of obtaining water and a method for producing pure water and ultrapure water.
【０００２】[0002]
【発明の背景】ＬＳＩ製造プロセスの洗浄工程において
は、使用する洗浄水中にイオンや微粒子、有機物等がご
く微量でも存在していると、ウエハーに組み込まれる酸
化膜や多結晶膜、配線などに悪影響を及ぼし、結果とし
てＬＳＩの電気特性の不良を起こしてしまう。従って、
半導体工業が要求する洗浄水には高純度の水質が要求さ
れ、含有される各イオンは数ｐｐｔ〜数十ｐｐｔ、有機
炭素ですら５ｐｐｂ以下とされる超純水が要求されてい
る。しかしながら、近年、半導体デバイスの高集積化、
微細化が進むにつれて、要求される水質レベルがｐｐｂ
からｐｐｔのレベルへと向かっており、さらに高純度化
された超純水が要求されるようになってきている。BACKGROUND OF THE INVENTION In the cleaning process of an LSI manufacturing process, even if a very small amount of ions, fine particles, organic substances, etc. are present in the cleaning water used, it adversely affects the oxide film, polycrystalline film, wiring, etc. incorporated in the wafer. As a result, the electrical characteristics of the LSI are deteriorated. Therefore,
The cleaning water required by the semiconductor industry is required to have high-purity water quality, and each ion to be contained is required to be ultrapure water of several ppt to several tens of ppt, and even organic carbon of 5 ppb or less. However, in recent years, high integration of semiconductor devices,
As miniaturization progresses, the required water quality level is ppb
Since then, the level of ppt has been approached, and ultrapure water that has been further purified has been required.
【０００３】[0003]
【従来の技術】一般に半導体工業において使用される超
純水は、前処理装置、一次純水装置、二次純水装置及び
配管等によって構成される超純水製造装置によって得ら
れる。前処理装置では、上水、地下水などの原水を凝
集、沈殿、濾過し、懸濁物質などが除去され、次いでイ
オン交換装置や逆浸透膜から構成される一次純水装置に
よって原水成分の９９〜９９．９９％が除去されて一次
純水とされる。このように精製処理された一次純水は、
さらに二次純水装置によって、残留するごく微量のイオ
ンやコロイド成分が除去され、超純水とされる。2. Description of the Related Art Ultrapure water generally used in the semiconductor industry is obtained by an ultrapure water production system including a pretreatment system, a primary deionization system, a secondary deionization system and piping. In the pretreatment device, raw water such as tap water and groundwater is coagulated, precipitated, filtered to remove suspended substances, and then 99% of raw water components are removed by a primary pure water device composed of an ion exchange device and a reverse osmosis membrane. 99.99% is removed to obtain primary pure water. The primary pure water purified in this way is
Further, a very small amount of residual ions and colloidal components are removed by the secondary pure water device to obtain ultrapure water.
【０００４】このような超純水の製造工程においては、
原水中のイオンの除去は、主としてイオン交換装置によ
り行なわれている。イオン交換装置としては、カチオン
交換樹脂、アニオン交換樹脂をそれぞれ単床として用い
る多床式のイオン交換装置や、カチオン、アニオンの両
樹脂を混合状態で用いる混床式のイオン交換装置が用い
られている。特に混床式イオン交換装置は、被処理水中
のカチオン、アニオンとを同一塔内で繰り返し交換させ
ることができるため、被処理水を高度に精製する目的で
使用されている。この混床式のイオン交換装置は、被処
理水の通水後にイオン交換樹脂の再生処理を行なう必要
のある再生型混床塔、或いはカチオン樹脂、アニオン樹
脂をそれぞれ再生処理した後、特別に精製し、一定割合
で混合充填した非再生型のカートリッジポリッシャーが
それぞれ存在する。再生型の混床塔は、２床３塔型等の
多床式イオン交換装置の後段工程として一次純水装置に
使用され、またカートリッジポリッシャーは二次純水装
置の一つとして、超純水の水質維持を目的として使用さ
れている。In the manufacturing process of such ultrapure water,
Ions in the raw water are mainly removed by an ion exchange device. As the ion exchange device, a multi-bed type ion exchange device using cation exchange resin and anion exchange resin as a single bed, and a mixed bed type ion exchange device using both cation and anion resins in a mixed state are used. There is. In particular, the mixed bed type ion exchanger is used for highly purifying the water to be treated because it can repeatedly exchange cations and anions in the water to be treated in the same column. This mixed bed type ion exchange device is a regenerated mixed bed tower in which it is necessary to regenerate the ion exchange resin after passing the water to be treated, or a cation resin and an anion resin, respectively, and then specially purified. However, there are non-regeneration type cartridge polishers which are mixed and filled at a fixed ratio. Regeneration type mixed bed tower is used in the primary deionizer as a post-process of multi-bed type ion exchange equipment such as 2 beds and 3 towers type, and the cartridge polisher is one of the secondary deionizers and ultra pure water. Is used for the purpose of maintaining the water quality of.
【０００５】以上のような再生型、非再生型の混床式イ
オン交換装置（Ｍ）は、一般に図１０に示すように、内
部にカチオン交換樹脂とアニオン交換樹脂との混合樹脂
（Ｒ）を充填させ、上部に被処理水（Ｈ0 ）を供給する
供給部（Ｓ）を備え、被処理水（Ｈ0 ）を下向流で混合
樹脂（Ｒ）中に通水させるとともに、得られる処理水を
イオン交換装置（Ｍ）の最下部に設けた集水部（Ｇ）に
より集水する構成とされていた。また、このような混床
式イオン交換装置（Ｍ）を用いて、純水を製造する場合
には、図１１乃至図１２に示すように、前工程（Ａ）か
ら供給される被処理水（Ｈ0 ）を、イオン交換装置
（Ｍ）の上部の供給部（Ｓ）より下向流で通水し、カチ
オン、アニオンの混合樹脂（Ｒ）中を通過させてイオン
交換処理を行い、脱塩された処理水（Ｈ1 ）を最下部の
集水部（Ｇ）にて集水し、一本の集水管（Ｐ）を通じて
流出させ、次工程へと移行させる方法で製造されてい
た。As shown in FIG. 10, the regenerated and non-regenerated mixed bed type ion exchange apparatus (M) generally has a mixed resin (R) containing a cation exchange resin and an anion exchange resin therein. is filled, the supply unit for supplying water to be treated (H 0) at the top provided with a (S), with is passed through in the mixed resin in downflow treatment water (H 0) (R), obtained processing The water was collected by the water collecting part (G) provided at the bottom of the ion exchange device (M). Further, in the case of producing pure water using such a mixed bed type ion exchange device (M), as shown in FIGS. 11 to 12, the treated water (from the previous step (A) ( H 0 ) is passed in a downward flow from the supply section (S) at the upper part of the ion exchange device (M), and is passed through a mixed resin (R) of cation and anion for ion exchange treatment to desalinate. The treated water (H 1 ) thus treated was collected in the lowermost water collecting section (G), flowed out through one water collecting pipe (P), and transferred to the next step.
【０００６】[0006]
【発明が解決しようとする課題】しかしながら、前記し
たような混床式イオン交換装置（Ｍ）や製造方法では、
イオン交換装置（Ｍ）よりＳＯ4 - イオンがリークして
処理水中に混入し、そのまま次工程へと移行されてしま
うため、高純度の処理水を得ることができないという課
題が存在した。すなわち、再生型イオン交換装置におい
ては混合樹脂（Ｒ）の再生処理に際して、混合されてい
るカチオン、アニオン両樹脂を分離させる必要がある。
通常、この分離、再生作業は、図１３に示すように、イ
オン交換装置の下部（Ｕ）より洗浄水を上昇流で注入し
て、内部の混合樹脂（Ｒ）を逆洗した後、図１４に示す
ように樹脂の比重によって、上層部にアニオン交換樹脂
（Ｒ1 ）、下層部にカチオン交換樹脂（Ｒ2 ）をそれぞ
れ分離させ、この状態で下部から酸を、上部からアルカ
リといった再生剤を注入して再生処理を行なう。再生処
理終了後は樹脂を水洗し、エアー又は窒素ガス等を樹脂
層内に注入して、分離されたカチオン、アニオンの両交
換樹脂を再び混合させる。ところが、この再生処理に際
して、カチオン、アニオンの両樹脂の混合を、水洗やエ
アー又は窒素ガスによって充分に行なった場合でも、比
重の重いカチオン交換樹脂は沈降してしまい、イオン交
換装置の最下部に集積してしまいやすい傾向にあった。
このため、混床式イオン交換装置の最下部においては、
カチオン樹脂より分離して生じるＳＯ4 - イオンが、ア
ニオン樹脂によって捕捉されない状態となるため、樹脂
層よりリークされて溶出してしまうといった問題が生じ
ていた。従って、このような下層部分より処理水の集水
を行なうと、リークされたＳＯ4 - イオンが処理水とと
もに流出されて次工程へ移行されてしまうという問題が
存在した。However, in the mixed bed type ion exchange device (M) and the manufacturing method as described above,
SO 4 − ions leak from the ion exchange device (M) and are mixed into the treated water, and are transferred to the next step as they are, so that there is a problem that highly purified treated water cannot be obtained. That is, in the regenerative ion exchange device, it is necessary to separate the mixed cation and anion resins when regenerating the mixed resin (R).
Usually, in this separation and regeneration work, as shown in FIG. 13, washing water is injected in an upward flow from the lower part (U) of the ion exchange device, and the mixed resin (R) inside is backwashed. As shown in Fig. 2, the anion exchange resin (R 1 ) is separated in the upper layer and the cation exchange resin (R 2 ) is separated in the lower layer according to the specific gravity of the resin. Inject and regenerate. After the completion of the regeneration treatment, the resin is washed with water, air or nitrogen gas is injected into the resin layer, and the separated cation and anion exchange resins are mixed again. However, in this regeneration treatment, even if both the cation and anion resins are thoroughly mixed with water or air or nitrogen gas, the cation exchange resin having a high specific gravity will settle out, and the cation exchange resin at the bottom of the ion exchange apparatus will be deposited. It tended to accumulate.
Therefore, at the bottom of the mixed bed type ion exchange device,
SO 4 − ions generated by separation from the cation resin are not captured by the anion resin, which causes a problem that they are leaked from the resin layer and eluted. Therefore, when the treated water is collected from such a lower layer portion, there is a problem that leaked SO 4 − ions flow out together with the treated water and are transferred to the next step.
【０００７】一方、非再生型のカートリッジポリッシャ
ーの場合においては、再生処理したアニオン、カチオン
の両交換樹脂を一定割合でイオン交換装置に混合、充填
する際、或いは再生処理したイオン交換樹脂を混合、充
填して使用場所まで運搬し、配管に接続させる際の振動
等により、やはり比重の重いカチオン交換樹脂がイオン
交換装置の最下部に集まりやすい傾向にあった。このた
め、前記再生型イオン交換装置と同様に、最下部に集ま
ったカチオン交換樹脂より分離して生じるＳＯ4 - イオ
ンが、アニオン交換樹脂によって除去されずに、わずか
にリークされて溶出し、処理水とともに集水部から流出
して次工程へ移行されてしまう結果となっていた。On the other hand, in the case of the non-regeneration type cartridge polisher, when the regenerated anion and cation exchange resins are mixed and filled in the ion exchange device at a constant ratio, or the regenerated ion exchange resin is mixed, The cation exchange resin, which also has a high specific gravity, tended to collect at the bottom of the ion exchange device due to vibrations and the like when filled and transported to the place of use and connected to the pipe. Therefore, similarly to the regenerative ion exchange device, SO 4 − ions generated by separation from the cation exchange resin collected at the bottom are not removed by the anion exchange resin but are slightly leaked and eluted, and treated. The result was that the water flowed out of the water collection section and was transferred to the next process.
【０００８】このように混床式イオン交換装置を経て流
出されたＳＯ4 - イオンは、そのまま除去されずに次工
程へと移行されるため、得られる純水又は超純水中に微
量のＳＯ4 - イオンが存在してしまい、ｐｐｔレベルと
いう半導体工業が要求するような極めて高純度の処理水
を得ることはできないという課題が存在した。そこで業
界では、高集積化、高密度化されている半導体工業の要
望に応じるべく、極めて純度の高い処理水を得るため
に、被処理水中の微量イオンを除去する際に、充填樹脂
からのイオンリークが極めて少ない再生、非再生型の混
床式イオン交換装置並びに純水及び超純水の優れた製造
方法の創出が望まれていた。The SO 4 − ions thus flown out through the mixed bed type ion exchange apparatus are transferred to the next step without being removed as they are, so that a small amount of SO 4 is contained in the obtained pure water or ultrapure water. There was a problem that 4 - ion was present, and it was not possible to obtain treated water of ppt level, which was extremely high purity required by the semiconductor industry. Therefore, in the industry, in order to meet the demands of the semiconductor industry, which is highly integrated and highly densified, in order to obtain treated water of extremely high purity, when removing trace amounts of ions in the water to be treated, ions from the filling resin are removed. It has been desired to create a regenerated and non-regenerated mixed-bed ion exchange device with extremely few leaks and an excellent method for producing pure water and ultrapure water.
【０００９】[0009]
【課題を解決するための手段】この発明では内部にカチ
オン交換樹脂とアニオン交換樹脂との混合樹脂を充填し
てなる混床式イオン交換装置において、上部に被処理水
を通水する供給部が設けられてなるとともに、下部のカ
チオン交換樹脂が沈降集積する部分の直上方に処理水の
第一集水部が設けられてなることを特徴とする混床式イ
オン交換装置及び前段工程からの処理水を混床式イオン
交換装置の上部より下向流で通水させるとともに、得ら
れた処理水を該混床式イオン交換装置の下層部に設けた
上段と下段との二段の集水部によってそれぞれ集水し、
上段の集水部によって得られた処理水は次工程へと移行
させ、下段の集水部より得られた処理水は前段工程へと
戻してなることを特徴とする純水及び超純水の製造方法
を提供することにより、前記従来の課題を悉く解消す
る。According to the present invention, in a mixed bed type ion exchange device having a mixed resin of a cation exchange resin and an anion exchange resin filled therein, a supply part for passing water to be treated is provided above. The mixed-bed ion exchange apparatus and the treatment from the preceding step, characterized in that a first water collecting section of the treated water is provided immediately above the lower portion where the cation exchange resin sediments and accumulates. Water is made to flow downward from the upper part of the mixed bed type ion exchange device, and the obtained treated water is provided in the lower layer part of the mixed bed type ion exchange device. Collect water by
The treated water obtained by the upper water collecting section is transferred to the next step, and the treated water obtained from the lower water collecting section is returned to the previous step. By providing a manufacturing method, the above conventional problems are solved.
【００１０】[0010]
【作用】混床式イオン交換装置においては、内部に充填
されている混床樹脂を充分に攪拌、混合しても、比重の
重いカチオン樹脂は樹脂塔の最下部に集まりやすくなっ
ている。しかし、混床式イオン交換装置によって処理さ
れた処理水の集水部を、イオン交換装置の下部のカチオ
ン交換樹脂が沈降集積している部分の直上方に設けるこ
とによって、樹脂層下部より溶出されるＳＯ4 - イオン
を処理水中に混入させることなく、処理水を集水させる
ことができる。さらに、純水及び超純水の製造工程にお
いて、混床式イオン交換装置に通水された処理水を、イ
オン交換装置の下層部の、上段と下段とに設けた二段集
水部によってそれぞれ集水し、上段の集水部より得られ
た処理水のみを次工程へと移行させ、下段の集水部より
得られた処理水は、前段工程へとリターンさせる製造方
法を採用することにより、カチオン樹脂より分離された
ＳＯ4 - イオンを処理水中に溶出させてしまうことな
く、極めて純度の高い純水及び超純水を製造することが
できる。In the mixed bed type ion exchange device, even if the mixed bed resin filled in the inside is sufficiently stirred and mixed, the cation resin having a high specific gravity tends to collect at the bottom of the resin tower. However, by providing a collecting part of the treated water treated by the mixed bed type ion exchange device just above the part where the cation exchange resin is settled and accumulated in the lower part of the ion exchange device, it is eluted from the lower part of the resin layer. The treated water can be collected without mixing SO 4 − ions that are contained in the treated water. Further, in the process of producing pure water and ultrapure water, the treated water that has been passed through the mixed-bed ion exchange device is respectively separated by the two-stage water collecting parts provided in the upper and lower stages of the lower layer part of the ion exchange device. By collecting water, only the treated water obtained from the upper water collecting part is transferred to the next process, and the treated water obtained from the lower water collecting part is returned to the previous process. Thus, it is possible to produce extremely pure water and ultrapure water without eluting SO 4 − ions separated from the cation resin into the treated water.
【００１１】[0011]
【発明の構成】以下、この発明に係る混床式イオン交換
装置並びにこの混床式イオン交換装置を使用した純水及
び超純水の製造方法の構成について詳述する。図１はこ
の発明に係る混床式イオン交換装置の一実施例を示す模
式説明図であり、図中（１）は混床式イオン交換装置、
（２）はカチオン交換樹脂とアニオン交換樹脂の混合樹
脂、（３）は被処理水（Ｈ0 ）を通水させる供給部、
（４）は集水部である。BEST MODE FOR CARRYING OUT THE INVENTION The structure of a mixed bed ion exchange apparatus according to the present invention and a method for producing pure water and ultrapure water using this mixed bed ion exchange apparatus will be described in detail below. FIG. 1 is a schematic explanatory view showing an embodiment of a mixed bed type ion exchange apparatus according to the present invention, in which (1) is a mixed bed type ion exchange apparatus,
(2) is a mixed resin of a cation exchange resin and an anion exchange resin, (3) is a supply unit for passing water to be treated (H 0 ),
(4) is a water collecting part.
【００１２】図１に示す実施例では、混床式イオン交換
装置（１）上部に設けられた供給部（３）から被処理水
（Ｈ0 ）を混合樹脂（２）中に通水させ、得られる処理
水（Ｈ1 ）を、イオン交換装置（１）の下部のカチオン
交換樹脂が沈降集積している部分の直上方に設けられた
集水部（４）で集水させる構成とされている。図示する
ような混床式イオン交換装置（１）においては、内部に
充填されている混合樹脂（２）が充分に混合され、アニ
オン交換樹脂及びカチオン交換樹脂が分散されていて
も、比重の大きいカチオン交換樹脂はややもすると最下
部に沈降することがあり、特に長時間通水するとその傾
向が強くなる。従って、この発明では、このカチオン交
換樹脂が沈降集積する部分の直上方に集水部（４）を設
ける構成を採用した。カチオン交換樹脂が沈降集積する
位置は、充填されているアニオン交換樹脂とカチオン交
換樹脂との混合比や、使用されるイオン交換装置（１）
の内径、樹脂の充填高さ等によって異なってくるが、よ
り望ましくは内径１２０ｃｍのイオン交換装置の場合、
最下部より１〜３０ｃｍ上方部分にカチオン交換樹脂が
沈降集積しやすい傾向にあるため、集積部（４）は最下
部より２〜３５ｃｍ上方部分に設けることが好ましい。In the embodiment shown in FIG. 1, the water to be treated (H 0 ) is passed through the mixed resin (2) from the supply part (3) provided on the upper part of the mixed bed type ion exchange device (1), The treated water (H 1 ) thus obtained is configured to be collected in a water collecting section (4) provided immediately above a portion where the cation exchange resin is deposited and accumulated under the ion exchange device (1). There is. In the mixed bed type ion exchange device (1) as shown in the figure, the mixed resin (2) filled in the inside is sufficiently mixed and the specific gravity is large even if the anion exchange resin and the cation exchange resin are dispersed. The cation exchange resin may settle to the bottom if a little, and the tendency becomes strong especially when water is passed for a long time. Therefore, in the present invention, the water collecting portion (4) is provided immediately above the portion where the cation exchange resin sediments and accumulates. The position where the cation exchange resin sediments and accumulates is determined by the mixing ratio of the filled anion exchange resin and the cation exchange resin and the ion exchange device (1) used.
It depends on the inner diameter, the filling height of the resin, etc., but more desirably in the case of an ion exchange device with an inner diameter of 120 cm
Since the cation exchange resin tends to settle and accumulate in a portion 1 cm to 30 cm above the lowermost portion, the accumulation portion (4) is preferably provided 2 to 35 cm above the lowermost portion.
【００１３】図２は、この発明に係る混床式イオン交換
装置（１）の第二実施例を示す模式説明図であり、この
第二実施例においては、イオン交換装置（１）の下層部
に上段と下段との二段集水部（４）が設けられている。
上段を第一集水部（４１）とし、下段を第二集水部（４
２）として、混合樹脂（２）によって処理された処理水
をそれぞれ異なる位置で集水する構成とされており、上
段の第一集水部（４１）で得られた処理水（Ｈ1 ）のみ
を精製処理水として次工程へと移行させ、下段の第二集
水部（４２）で得られた処理水（Ｈ2 ）は、再びこのイ
オン交換装置（１）に通水させる構成が好適に採用でき
る。この発明においては、混床式イオン交換装置（１）
の下層部に以上のような集水部（４）を設ける構成が採
用されるが、集水部（４）としては特に限定はされず、
適宜任意の集水装置が使用されればよい。FIG. 2 is a schematic explanatory view showing a second embodiment of the mixed bed type ion exchange device (1) according to the present invention. In the second embodiment, the lower layer portion of the ion exchange device (1) is shown. Is provided with a two-stage water collecting section (4) including an upper stage and a lower stage.
The upper part is the first water collecting part (41) and the lower part is the second water collecting part (4).
As 2), the treated water treated by the mixed resin (2) is collected at different positions, and only the treated water (H 1 ) obtained in the upper first water collecting section (41) is collected. It is preferable that the treated water (H 2 ) obtained in the lower second water collecting section (42) is passed through the ion exchange device (1) again as purified purified water to the next step. Can be adopted. In the present invention, a mixed bed ion exchange device (1)
A structure in which the water collecting part (4) as described above is provided in the lower layer part is adopted, but the water collecting part (4) is not particularly limited,
Any appropriate water collecting device may be used.
【００１４】図３は、この発明に係る混床式イオン交換
装置（１）の第三実施例を示す模式説明図である。図示
する実施例では、上段に第一集水部（４１）及び下段に
第二集水部（４２）を配設した二重集水管（４）が取り
付けられている。この実施例では、イオン交換装置
（１）の上部に、供給水（被処理水）（Ｈ0)を下向流で
通水させる供給部（３）が設けられ、混合樹脂によって
処理された処理水（Ｈ1)（Ｈ2)を二重集水管（４）によ
ってそれぞれ異なる位置で集水し、上昇流で流出させる
構成となっている。FIG. 3 is a schematic explanatory view showing a third embodiment of the mixed bed type ion exchange device (1) according to the present invention. In the illustrated embodiment, a double water collecting pipe (4) having a first water collecting section (41) on the upper stage and a second water collecting section (42) on the lower stage is attached. In this embodiment, a supply part (3) for supplying feed water (water to be treated) (H 0 ) in a downward flow is provided above the ion exchange device (1) and treated with a mixed resin. The water (H 1 ) (H 2 ) is collected at different positions by the double water collecting pipes (4) and discharged in an upward flow.
【００１５】次に、この発明に係る純水及び超純水の製
造方法について説明する。図４乃至図５はこの発明に係
る純水及び超純水の製造方法の一実施例を示す模式説明
図である。図中（Ａ）は前段工程によって得られた一次
純水を充填した一次純水タンク、（１）は混床式イオン
交換装置、（２）はカチオン交換樹脂とアニオン交換樹
脂の混合樹脂、（３）は被処理水（Ｈ0 ）を通水させる
供給部、（４）は集水部であり、この集水部はイオン交
換装置（１）下層部に、上段の第一集水部（４１）と下
段の第二集水部（４２）との二段に分かれて設けられて
いる。この実施例において、一次純水タンク（Ａ）より
被処理水（Ｈ0）が混床式イオン交換装置（１）の上部
より供給されて、内部の混合樹脂（２）に下向流で通水
される。この混合樹脂（２）に通水させることによっ
て、被処理水中のアニオン、カチオン両樹脂がそれぞれ
吸着・除去される。Next, a method for producing pure water and ultrapure water according to the present invention will be described. 4 to 5 are schematic explanatory views showing an embodiment of the method for producing pure water and ultrapure water according to the present invention. In the figure, (A) is a primary pure water tank filled with the primary pure water obtained in the previous step, (1) is a mixed bed type ion exchange device, (2) is a mixed resin of a cation exchange resin and an anion exchange resin, ( 3) is a supply part for passing water to be treated (H 0 ), (4) is a water collecting part, and this water collecting part is a lower layer part of the ion exchange device (1) and a first water collecting part (upper part). 41) and the lower second water collecting part (42) are provided in two stages. In this embodiment, the water to be treated (H 0 ) is supplied from the primary pure water tank (A) from the upper part of the mixed bed type ion exchange device (1) and is passed through the mixed resin (2) inside in a downward flow. To be watered. By passing water through this mixed resin (2), both anion and cation resins in the water to be treated are adsorbed and removed.
【００１６】イオン交換処理がなされた処理水は、それ
ぞれイオン交換装置（１）下層部に設けられた第一集水
部（４１）と第二集水部（４２）との集水部によってそ
れぞれ集水される。第一集水部（４１）によって集水さ
れた処理水（Ｈ1）は、次いでさらに高度精製される次
工程（図示せず）へと送られる。一方、第二集水部（４
２）によって集水された処理水（Ｈ2）は、前段工程、
図示する実施例においては、一次純水タンク（Ａ）へと
戻される構成とされている。この発明において、集水部
（４）としては特に限定はされず、適宜任意のコレクタ
ー等を用い、それぞれ所定のラインへ接続する構成が適
宜採用できる。また、処理水を移行させる工程について
も、第一集水部（４１）によって集水された処理水（Ｈ
1）のみを次の高度精製ラインへと接続し、第二集水部
（４２）によって集水された処理水（Ｈ2）は前段工
程、つまり一次純水タンク（Ａ）又はイオン交換装置
（１）前段の任意のポンプ入口（図示せず）へ戻される
構成とされればよく、特に限定されるものではない。The treated water that has been subjected to the ion exchange treatment is respectively collected by the water collecting portions of the first water collecting portion (41) and the second water collecting portion (42) provided in the lower layer portion of the ion exchange device (1). The water is collected. The treated water (H 1 ) collected by the first water collecting section (41) is then sent to the next step (not shown) which is further highly purified. On the other hand, the second water catchment section (4
The treated water (H 2 ) collected by 2) is used in the previous step,
In the illustrated embodiment, it is configured to be returned to the primary pure water tank (A). In the present invention, the water collecting section (4) is not particularly limited, and a configuration in which an arbitrary collector or the like is used and each is connected to a predetermined line can be appropriately adopted. In addition, regarding the step of transferring the treated water, the treated water collected by the first water collecting section (41) (H
Only 1 ) is connected to the next advanced purification line, and the treated water (H 2 ) collected by the second water collecting section (42) is used in the previous step, that is, the primary pure water tank (A) or the ion exchange device ( 1) There is no particular limitation as long as it can be returned to an arbitrary pump inlet (not shown) at the preceding stage.
【００１７】上記したように、混床式イオン交換装置
（１）に通水させた処理水のうち、上段の第一集水部
（４１）により集水した処理水のみを次工程へと移行さ
せる方法を採用することにより、カチオン交換樹脂より
リークされやすいＳＯ4 - イオンの次工程への流出を防
ぐことが可能となる。すなわち、混床式イオン交換装置
（１）においては、その最下部に比重の大きいカチオン
交換樹脂が集まりやすくなっている。このようにカチオ
ン交換樹脂が最下部に集まってしまうと、カチオン交換
樹脂より分離されたＳＯ4 - イオンが、アニオン交換樹
脂によって捕捉されずに溶出してしまうが、次工程へと
移行させる処理水を、イオン交換装置（１）下層部のう
ち、カチオン交換樹脂とアニオン交換樹脂との割合が良
好な状態にある上段の第一集水部（４１）により集水し
た処理水に限定してしまうことによって、リークされた
ＳＯ4 - イオンを含まない処理水のみを次工程へと移行
させることができる。つまり、上段集水部（４１）付近
では、逆洗や空気又は窒素ガス等の流入によって混合さ
れたカチオン交換樹脂とアニオン交換樹脂とが良好な状
態で存在しており、カチオン交換樹脂より分離されたＳ
Ｏ4 - イオンがアニオン樹脂によって捕捉されてしまう
ため、処理水中にイオンをリークさせてしまうことなく
集水させることができる。また、ＳＯ4 - イオンがリー
クされやすい下段の第二集水部（４２）により集水され
た処理水は、前段工程へと戻される構成とされるため、
再び混床式イオン交換装置（１）へ通水され、ＳＯ4 -
イオンが除去され、次工程へと移行される。As described above, among the treated water passed through the mixed bed type ion exchange device (1), only the treated water collected by the upper first water collecting section (41) is transferred to the next step. By adopting this method, it becomes possible to prevent SO 4 − ions, which are more easily leaked than the cation exchange resin, from flowing out to the next step. That is, in the mixed bed type ion exchange device (1), the cation exchange resin having a large specific gravity is easily collected at the lowermost portion. With such cation exchange resins will gather at the bottom, SO 4 is separated from the cation exchange resin - ions, but become eluted without being captured by the anion exchange resin, treated water to shift to the next step Is limited to the treated water collected by the upper first water collecting part (41) in the lower part of the ion exchange device (1) where the ratio of the cation exchange resin and the anion exchange resin is in a good state. As a result, only the treated water containing no leaked SO 4 − ion can be transferred to the next step. That is, in the vicinity of the upper water collecting section (41), the cation exchange resin and the anion exchange resin mixed by backwashing or inflow of air or nitrogen gas exist in good condition, and are separated from the cation exchange resin. S
Since the O 4 − ion is captured by the anion resin, it is possible to collect the water without leaking the ion into the treated water. Further, since the treated water collected by the second water collecting section (42) in the lower stage where SO 4 − ions are likely to leak is returned to the previous step,
It is passed through again mixed-bed ion exchanger to (1), SO 4 -
Ions are removed and the process is transferred to the next step.
【００１８】この発明において、混床式イオン交換装置
（１）の下層部に設けられる集水部（４）の位置として
は、イオン交換樹脂の充填高さや、イオン交換装置の内
径、混合されるカチオン交換樹脂及びアニオン交換樹脂
の割合によって適宜任意に設定されればよいが、少なく
とも下段の第二集水部（４２）は、混合樹脂（２）の最
下部付近に、上段の第一集水部（４１）は、カチオン交
換樹脂が沈降集積する部分の直上方に設けられる。具体
的にはイオン交換装置最下部から５〜３０ｃｍ上方に第
一集水部（４１）が設けられ、この第一集水部（４１）
から３〜１０ｃｍ下方位置に下段の第二集水部（４２）
を設けられることが、純度の高い処理水を得る観点から
ましいが特に限定されるものではない。尚、この発明に
おいて、混床式イオン交換装置（１）としては、特に限
定はされず、一次純水装置として使用される再生型の混
床塔、二次純水装置として使用される非再生型のカート
リッジポリッシャー等、カチオン交換樹脂とアニオン交
換樹脂を混合して充填した混床式のイオン交換装置全て
を指す。充填されるイオン交換樹脂の割合についても特
に限定はされず、被処理水の成分や使用目的等に応じて
適宜任意の割合の混合樹脂が好適に使用される。また、
この混床式イオン交換装置の前段工程としても、特に限
定はされずに、原水を濾過、沈殿、凝集させる工程、或
いは一次純水工程等任意の工程が全て含まれる。In the present invention, as the position of the water collecting part (4) provided in the lower layer part of the mixed bed type ion exchange device (1), the filling height of the ion exchange resin, the inner diameter of the ion exchange device, and the mixing are set. It may be arbitrarily set depending on the ratio of the cation exchange resin and the anion exchange resin, but at least the second water collecting section (42) in the lower stage is provided near the lowermost portion of the mixed resin (2) and the first water collecting unit in the upper stage. The part (41) is provided immediately above the part where the cation exchange resin sediments and accumulates. Specifically, the first water collecting part (41) is provided 5 to 30 cm above the lowermost part of the ion exchange device, and the first water collecting part (41) is provided.
3 to 10 cm below the second water collecting section (42)
It is preferable to provide the above from the viewpoint of obtaining treated water with high purity, but it is not particularly limited. In the present invention, the mixed bed type ion exchange device (1) is not particularly limited, and it is a regenerative type mixed bed tower used as a primary deionized water device or a non-regenerated device used as a secondary deionized water device. Type of cartridge polisher, etc. refers to all mixed-bed type ion exchange devices that are filled by mixing cation exchange resin and anion exchange resin. The ratio of the ion exchange resin to be filled is not particularly limited, and a mixed resin having an arbitrary ratio is suitably used depending on the component of the water to be treated, the purpose of use, and the like. Also,
The pre-stage process of this mixed bed type ion exchange device is not particularly limited and includes any process such as a process of filtering raw water, a process of precipitating and aggregating raw water, or a process of primary pure water.
【００１９】[0019]
【実施例】以下、この発明に係る混床式イオン交換装置
並びにこの混床式イオン交換装置を使用した純水及び超
純水の製造方法の効果を、実施例、比較例を挙げること
により、一層明確にする。但し、この発明は以下の実施
例により何ら限定されるものではない。EXAMPLES Hereinafter, the effects of the mixed bed ion exchange apparatus according to the present invention and the method for producing pure water and ultrapure water using this mixed bed ion exchange apparatus will be described by giving Examples and Comparative Examples. Make it clearer. However, the present invention is not limited to the following examples.
【００２０】（実施例１）図６に示すように、２５．５
ｃｍの内径を有する非再生型混床式イオン交換装置
（１）内に、底部より１５ｃｍ高さ（ａ）まで、強酸性
カチオン交換樹脂と強塩基性アニオン交換樹脂との混合
物（混合比１：１０）（商品名：ダイヤイオンＳＫ−１
Ｂ、三菱化成（株）製、商品名：ダイヤイオンＳＡ−１
１Ａ、三菱化成（株）製）（２１）を充填し、さらにそ
の上部に前記同様の強酸性カチオン交換樹脂と強塩基性
アニオン交換樹脂との混合物（混合比１：２）（２２）
を９５ｃｍ高さ（ｂ）迄充填した。この混床式イオン交
換装置（１）の上部に被処理水を下向流で通水する供給
部（３）を設けるとともに、前記混合比１：１０の樹脂
混合物（２１）と、混合比１：２（２２）の樹脂混合物
との境界部分より６ｃｍ上部位置（ｃ）に集水管（４）
を取り付けて実施例１の混床式イオン交換装置とした。 （実施例２）前記実施例１と同様の非再生型混床式イオ
ン交換装置（１）に図７に示すように混合比１：１０の
樹脂混合物（２１）と、混合比１：２の樹脂混合物（２
２）との境界部分より６ｃｍ上部位置（ｃ）に第一集水
管（４１）を取り付け、且つ前記境界部分より１０ｃｍ
下部位置（ｄ）に第二集水管（４２）をそれぞれ取り付
けて実施例２の混床式イオン交換装置とした。(Embodiment 1) As shown in FIG.
A mixture of a strongly acidic cation exchange resin and a strongly basic anion exchange resin up to a height of 15 cm (a) from the bottom in a non-regeneration type mixed bed ion exchange device (1) having an inner diameter of cm (mixing ratio 1: 10) (Product name: Diaion SK-1
B, manufactured by Mitsubishi Kasei Co., Ltd., product name: Diaion SA-1
1A, manufactured by Mitsubishi Kasei Co., Ltd. (21), and a mixture of a strong acid cation exchange resin and a strong basic anion exchange resin (mixing ratio 1: 2) (22) above the same.
Was filled to a height (b) of 95 cm. A supply part (3) for passing the water to be treated in a downward flow is provided on the upper part of the mixed bed type ion exchange device (1), and the resin mixture (21) having the mixing ratio of 1:10 and the mixing ratio of 1 are used. : Water collecting pipe (4) at a position (c) 6 cm above the boundary with the resin mixture of 2 (22)
Was attached to form a mixed bed type ion exchange apparatus of Example 1. (Example 2) In the same non-regenerative mixed bed type ion exchange apparatus (1) as in Example 1, as shown in FIG. 7, a resin mixture (21) having a mixing ratio of 1:10 and a mixing ratio of 1: 2 were used. Resin mixture (2
The first water collecting pipe (41) is attached at a position (c) 6 cm above the boundary with 2) and 10 cm above the boundary.
The second water collecting pipes (42) were attached to the lower positions (d), respectively, to obtain the mixed bed type ion exchange device of the second embodiment.
【００２１】（比較例）前記実施例１と同様の非再生型
混床式イオン交換装置（１）において、図８に示すよう
に混合比１：１０の樹脂混合物（２１）と、混合比１：
２の樹脂混合物（２２）との境界部分より１０ｃｍ下部
位置（ｃ）に集水管（４）を取り付けて比較例の混床式
イオン交換装置とした。(Comparative Example) In the same non-regenerative mixed bed type ion exchange apparatus (1) as in Example 1, as shown in FIG. 8, a resin mixture (21) having a mixing ratio of 1:10 and a mixing ratio of 1 were used. :
A water collecting pipe (4) was attached at a position (c) 10 cm below the boundary with the resin mixture (22) of No. 2 to prepare a mixed bed ion exchange device of a comparative example.
【００２２】（試験例）前記実施例１〜２及び比較例の
混床式イオン交換装置を、図９に示すような純水製造ラ
インに接続した。タンク（Ｔ）より粗純水を各イオン交
換装置へ同時に３ｍ3 ／Ｈの流量で、上部から下部へ供
給し、各イオン交換装置の集水部より得られた処理水
を、実施例１及び比較例については３ｍ3 ／Ｈの流量で
上昇流により流出させた。得られた処理水中の硫酸イオ
ン（ＳＯ4 - ）濃度を、濃縮カラム付きイオンクロマト
グラフィーオフライン分析装置（ダイオネックスＤＸ３
００）により測定した。尚、実施例２のイオン交換装置
については、第一集水管から２．８ｍ3 ／Ｈの流量で処
理水を流出させ、第二集水部からは０．２ｍ3 ／Ｈの流
量で処理水を流出させた。処理水中のイオン濃度の測定
については、第一集水部から得られたものにのみ行い、
第二集水部から得られた処理水は、タンク（Ｔ）にリタ
ーンするよう配管した。実施例及び比較例で得られた処
理水中の硫酸イオン（ＳＯ4 - ）濃度をそれぞれ表１に
示した。(Test Example) The mixed bed type ion exchangers of Examples 1 and 2 and Comparative Example were connected to a pure water production line as shown in FIG. Crude pure water was simultaneously supplied from the tank (T) to each ion exchange device at a flow rate of 3 m 3 / H from the upper part to the lower part, and the treated water obtained from the water collecting part of each ion exchange device was used in Example 1 and For the comparative example, it was made to flow out by an ascending flow at a flow rate of 3 m 3 / H. The resulting treated water of sulfate (SO 4 -) concentration, ion chromatography offline analysis apparatus with the concentration column (Dionex DX3
00). In the ion exchange device of Example 2, the treated water was discharged from the first water collecting pipe at a flow rate of 2.8 m 3 / H, and the treated water was discharged from the second water collecting part at a flow rate of 0.2 m 3 / H. Spilled. Regarding the measurement of the ion concentration in the treated water, only the one obtained from the first water collection part is measured,
The treated water obtained from the second water collecting section was piped so as to return to the tank (T). Table 1 shows the sulfate ion (SO 4 − ) concentrations in the treated water obtained in Examples and Comparative Examples.
【表１】 [Table 1]
【００２３】表１から明らかな如く、実施例の混床式イ
オン交換装置によって得られた処理水は、比較例のイオ
ン交換装置と比べると、測定された硫酸イオン濃度が低
いことが明らかであり、実施例の混床式イオン交換装置
においても、第一集水部と第二集水部とによってそれぞ
れ集水し、第二集水部によって得られた処理水を前段工
程へとリターンさせる実施例２の混床式イオン交換装置
の方が得られる処理水中のイオン濃度が極めて低いこと
が判る。As is clear from Table 1, it is clear that the treated water obtained by the mixed bed type ion exchange apparatus of the example has a lower sulfate ion concentration measured as compared with the ion exchange apparatus of the comparative example. In the mixed bed type ion exchange apparatus of the embodiment, the first water collecting section and the second water collecting section respectively collect water, and the treated water obtained by the second water collecting section is returned to the preceding step. It can be seen that the mixed bed type ion exchange apparatus of Example 2 has an extremely low ion concentration in the obtained treated water.
【００２４】[0024]
【発明の効果】以上詳述した如く、この発明は内部にカ
チオン交換樹脂とアニオン交換樹脂との混合樹脂を充填
してなる混床式イオン交換装置において、上部に被処理
水を通水する供給部が設けられてなるとともに、下部の
カチオン交換樹脂が沈降集積する部分の直上方に処理水
の第一集水部が設けられてなることを特徴とする混床式
イオン交換装置及び前段工程からの処理水を混床式イオ
ン交換装置の上部より下向流で通水させるとともに、得
られた処理水を該混床式イオン交換装置の下層部に設け
た上段と下段との二段の集水部によってそれぞれ集水
し、上段の集水部によって得られた処理水は次工程へと
移行させ、下段の集水部より得られた処理水は前段工程
へと戻してなることを特徴とする純水及び超純水の製造
方法であるから、前記試験例の結果より明らかな如く、
樹脂からのイオンリークがほとんどなく、高集積化、高
密度化されている半導体工業の洗浄用水として利用可能
な極めて純度の高い処理水を得ることができるという優
れた効果を奏する。As described in detail above, the present invention is a mixed bed type ion exchange apparatus having a mixed resin of a cation exchange resin and an anion exchange resin filled therein, and a feed for passing treated water through the upper part. Part of the mixed bed type ion exchange device and the preceding step, characterized in that the first collecting part of the treated water is provided immediately above the part where the cation exchange resin in the lower part sediments and accumulates. The treated water of 1. is passed downward from the upper part of the mixed bed type ion exchange device, and the obtained treated water is provided in the lower layer part of the mixed bed type ion exchange device, and a two-stage collection of an upper stage and a lower stage is provided. The treated water obtained by the upper water collecting part is transferred to the next process, and the treated water obtained from the lower water collecting part is returned to the previous process. Since it is a method for producing pure water and ultrapure water, As is clear from the results of Test Examples,
There is almost no ion leakage from the resin, and it is possible to obtain an excellent effect that highly purified treated water that can be used as cleaning water in the semiconductor industry, which has been highly integrated and highly densified, can be obtained.
【図１】この発明に係る混床式イオン交換装置の第一実
施例を示した模式図である。FIG. 1 is a schematic diagram showing a first embodiment of a mixed bed type ion exchange device according to the present invention.
【図２】この発明に係る混床式イオン交換装置の第二実
施例を示した模式図である。FIG. 2 is a schematic view showing a second embodiment of the mixed bed type ion exchange device according to the present invention.
【図３】この発明に係る混床式イオン交換装置の第三実
施例を示した模式図である。FIG. 3 is a schematic view showing a third embodiment of the mixed bed type ion exchange device according to the present invention.
【図４】この発明に係る純水及び超純水の製造方法の一
実施例の概要を示す模式図である。FIG. 4 is a schematic view showing an outline of one embodiment of a method for producing pure water and ultrapure water according to the present invention.
【図５】この発明に係る純水及び超純水の製造方法の一
実施例の概要を示す模式図である。FIG. 5 is a schematic view showing an outline of one embodiment of a method for producing pure water and ultrapure water according to the present invention.
【図６】この発明の実施例１に係る混床式イオン交換装
置の断面模式図である。FIG. 6 is a schematic sectional view of a mixed bed type ion exchange device according to a first embodiment of the present invention.
【図７】この発明の実施例２に係る混床式イオン交換装
置の断面模式図である。FIG. 7 is a schematic sectional view of a mixed bed type ion exchange device according to a second embodiment of the present invention.
【図８】この発明の比較例に係る混床式イオン交換装置
の断面模式図である。FIG. 8 is a schematic cross-sectional view of a mixed bed type ion exchange device according to a comparative example of the present invention.
【図９】この発明の試験例における純水の製造方法の概
要を示す模式図である。FIG. 9 is a schematic diagram showing an outline of a method for producing pure water in a test example of the present invention.
【図１０】従来の混床式イオン交換装置の一実施例を示
す模式図である。FIG. 10 is a schematic view showing an example of a conventional mixed bed type ion exchange device.
【図１１】従来の混床式イオン交換装置を用いた純水の
製造方法の概要を示す模式図である。FIG. 11 is a schematic diagram showing an outline of a method for producing pure water using a conventional mixed bed ion exchange apparatus.
【図１２】従来の混床式イオン交換装置を用いた純水の
製造方法の概要を示す模式図である。FIG. 12 is a schematic diagram showing an outline of a method for producing pure water using a conventional mixed bed ion exchange apparatus.
【図１３】混床式イオン交換装置の再生処理での逆洗工
程の概要を示す模式図である。FIG. 13 is a schematic diagram showing an outline of a backwash process in a regeneration process of a mixed bed type ion exchange device.
【図１４】混床式イオン交換装置の再生処理におけるア
ニオン、カチオン両イオン交換樹脂の分離状態を示す模
式図である。FIG. 14 is a schematic view showing a separated state of both anion and cation ion exchange resins in the regeneration treatment of the mixed bed type ion exchange apparatus.
１ 混床式イオン交換装置 ２ 混合樹脂 ３ 供給部 ４ 集水部 ４１第一集水部 ４２第二集水部 1 Mixed Bed Ion Exchange Device 2 Mixed Resin 3 Supply Part 4 Water Collection Part 41 First Water Collection Part 42 Second Water Collection Part
Claims (3)
樹脂との混合樹脂を充填してなる混床式イオン交換装置
において、上部に被処理水を通水する供給部が設けられ
てなるとともに、下部のカチオン交換樹脂が沈降集積す
る部分の直上方に処理水の第一集水部が設けられてなる
ことを特徴とする混床式イオン交換装置。1. A mixed bed type ion exchange apparatus having a mixed resin of a cation exchange resin and an anion exchange resin filled therein, wherein a feed part for passing water to be treated is provided on the upper part and a lower part is provided. A mixed bed type ion exchange device, wherein a first water collecting portion of the treated water is provided immediately above a portion where the cation exchange resin of (1) is accumulated and accumulated.
が設けられてなることを特徴とする請求項１に記載の混
床式イオン交換装置。2. The mixed bed type ion exchange apparatus according to claim 1, wherein a second water collecting section is provided at a lower position of the first water collecting section.
換装置の上部より下向流で通水させるとともに、得られ
た処理水を該混床式イオン交換装置の下層部に設けた上
段と下段との二段の集水部によってそれぞれ集水し、上
段の集水部によって得られた処理水は次工程へと移行さ
せ、下段の集水部より得られた処理水は前段工程へと戻
してなることを特徴とする純水及び超純水の製造方法。3. An upper stage in which the treated water from the preceding step is passed downward from the upper part of the mixed bed type ion exchange device and the obtained treated water is provided in the lower layer part of the mixed bed type ion exchange device. The treated water obtained by the upper water collecting part is transferred to the next process, and the treated water obtained from the lower water collecting part is sent to the previous process. And a method for producing pure water and ultrapure water.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5127847A JP2742976B2 (en) | 1993-04-30 | 1993-04-30 | Mixed bed type ion exchange apparatus and method for producing pure water and ultrapure water using the mixed bed type ion exchange apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5127847A JP2742976B2 (en) | 1993-04-30 | 1993-04-30 | Mixed bed type ion exchange apparatus and method for producing pure water and ultrapure water using the mixed bed type ion exchange apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06315683A true JPH06315683A (en) | 1994-11-15 |
| JP2742976B2 JP2742976B2 (en) | 1998-04-22 |
Family
ID=14970144
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5127847A Expired - Lifetime JP2742976B2 (en) | 1993-04-30 | 1993-04-30 | Mixed bed type ion exchange apparatus and method for producing pure water and ultrapure water using the mixed bed type ion exchange apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2742976B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006116086A (en) * | 2004-10-21 | 2006-05-11 | Tokuyama Corp | Action pole structure for iontophoresis apparatus and iontophoresis apparatus |
| WO2007023796A1 (en) * | 2005-08-25 | 2007-03-01 | Miura Co., Ltd. | Ion exchange equipment |
| JP2011041878A (en) * | 2009-08-19 | 2011-03-03 | Disco Abrasive Syst Ltd | Waste working liquid treatment apparatus |
| JP2016131954A (en) * | 2015-01-21 | 2016-07-25 | 株式会社ディスコ | Pure water purification apparatus |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5969187A (en) * | 1982-10-14 | 1984-04-19 | Kansai Electric Power Co Inc:The | Condensate treating method |
| JPS63315189A (en) * | 1988-06-03 | 1988-12-22 | Ebara Infilco Co Ltd | Condensate treatment method |
-
1993
- 1993-04-30 JP JP5127847A patent/JP2742976B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5969187A (en) * | 1982-10-14 | 1984-04-19 | Kansai Electric Power Co Inc:The | Condensate treating method |
| JPS63315189A (en) * | 1988-06-03 | 1988-12-22 | Ebara Infilco Co Ltd | Condensate treatment method |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006116086A (en) * | 2004-10-21 | 2006-05-11 | Tokuyama Corp | Action pole structure for iontophoresis apparatus and iontophoresis apparatus |
| WO2007023796A1 (en) * | 2005-08-25 | 2007-03-01 | Miura Co., Ltd. | Ion exchange equipment |
| JP2011041878A (en) * | 2009-08-19 | 2011-03-03 | Disco Abrasive Syst Ltd | Waste working liquid treatment apparatus |
| JP2016131954A (en) * | 2015-01-21 | 2016-07-25 | 株式会社ディスコ | Pure water purification apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2742976B2 (en) | 1998-04-22 |
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