JPH06304871A - Polishing grinding wheel - Google Patents

Polishing grinding wheel

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Publication number
JPH06304871A
JPH06304871A JP5120541A JP12054193A JPH06304871A JP H06304871 A JPH06304871 A JP H06304871A JP 5120541 A JP5120541 A JP 5120541A JP 12054193 A JP12054193 A JP 12054193A JP H06304871 A JPH06304871 A JP H06304871A
Authority
JP
Japan
Prior art keywords
grinding wheel
abrasive grains
grindstone
polishing
dressing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5120541A
Other languages
Japanese (ja)
Other versions
JP3310385B2 (en
Inventor
Shinji Yokoyama
真司 横山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Optical Co Ltd filed Critical Olympus Optical Co Ltd
Priority to JP12054193A priority Critical patent/JP3310385B2/en
Publication of JPH06304871A publication Critical patent/JPH06304871A/en
Application granted granted Critical
Publication of JP3310385B2 publication Critical patent/JP3310385B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To attain dressing of a grinding wheel surface by dispersedly arranging abrasive grains, abrasive grains of applying a metal film eluted by electrolysis and a fiber material having conductivity in a binding agent with synthetic resin serving as the binding agent. CONSTITUTION:In a resinoid grinding wheel using synthetic resin 2 for a binding material in a polishing grinding wheel 1, conductivity is provided by a fiber material 6, and a metal film 4 of an abrasive grain 5 is eluted by electrolytic inprocess dressing by electrolysis. In the case of providing conductivity in the polishing grinding wheel 1, in the fiber material 6 having a high probability of coming into contact with each other, conductivity is provided in the grinding wheel 1 by a low charging amount, to usefully display nature of the resinoid grinding wheel. In the case of electrolyzing a surface of the polishing grinding wheel 1, its surface is violated to be dressed by eluting the metal film 4, and also by rolling the abrasive grains 5, made free by eluting the metal film 4, between the grinding wheel surface and a worked surface, mechanical dressing is performed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、光学部品、機械部品、
セラミックス、半導体等における研磨加工もしくは研削
加工に用いる研磨用砥石に係り、特に電解インプロセス
ドレッシング加工用の研磨用砥石に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to optical parts, mechanical parts,
The present invention relates to a polishing grindstone used for polishing or grinding in ceramics, semiconductors, etc., and particularly to a polishing grindstone for electrolytic in-process dressing processing.

【0002】[0002]

【従来の技術】従来、研磨用砥石としては、例えば特開
平4−141375号公報に開示されている。図6は、
上記研磨用砥石30を示す断面図で、砥石結合材31と
しての合成樹脂中に砥粒32、電気分解により溶出する
金属粒子33及び導電材34を添加して形成されてい
る。この研磨用砥石30では、結合材31で砥粒32を
保持しつつ、金属粒子33及び導電材34の電気分解に
よる溶出により電解インプロセスドレッシングが可能に
なるので、砥粒32の保持力を低下させることなく、レ
ジノイド砥石による電解インプロセスドレッシング加工
を施すことができる。
2. Description of the Related Art Conventionally, a grindstone for polishing has been disclosed in, for example, Japanese Patent Application Laid-Open No. 4-141375. Figure 6
FIG. 2 is a cross-sectional view showing the polishing grindstone 30, which is formed by adding abrasive grains 32, metal particles 33 eluted by electrolysis and a conductive material 34 to a synthetic resin as a grindstone binding material 31. In this polishing grindstone 30, while holding the abrasive grains 32 by the binding material 31, electrolytic in-process dressing is possible by elution by electrolysis of the metal particles 33 and the conductive material 34, so that the holding force of the abrasive grains 32 is reduced. It is possible to perform electrolytic in-process dressing processing with a resinoid grindstone without performing the above.

【0003】[0003]

【発明が解決しようとする課題】上記従来の砥石30で
は、電解インプロセスドレッシングを可能とするために
結合剤31中に金属粒子33等を添加しているが、金属
粒子33を電気分解により溶出させるには、各金属粒子
33が互いに接している必要がある。そのためには、結
合剤31中に分散させる金属粒子33の割合をかなり高
めておく必要がある。しかし、金属粒子33の添加割合
を多くすると、結合剤31としての合成樹脂の硬度が高
くなってしまうので、レジノイド砥石特有の砥粒32を
弾性保持する性質を減退させていた。この結果、被加工
面にギスを生じさせ易くなるという問題点があった。
In the conventional grindstone 30 described above, the metal particles 33 and the like are added to the binder 31 in order to enable electrolytic in-process dressing, but the metal particles 33 are eluted by electrolysis. To do so, the metal particles 33 must be in contact with each other. For that purpose, it is necessary to considerably increase the ratio of the metal particles 33 dispersed in the binder 31. However, if the addition ratio of the metal particles 33 is increased, the hardness of the synthetic resin as the binder 31 becomes high, so that the property of elastically holding the abrasive grains 32 peculiar to the resinoid grindstone is deteriorated. As a result, there is a problem in that the work surface is likely to be scratched.

【0004】本発明は、上記従来技術の問題点に鑑みて
なされたもので、レジノイド砥石の上記特徴を生しつ
つ、被加工面にキズを生じさせない研磨用砥石を提供す
ることを目的とする。
The present invention has been made in view of the above problems of the prior art, and an object of the present invention is to provide a polishing grindstone which produces the above-mentioned characteristics of a resinoid grindstone and does not cause scratches on a surface to be processed. .

【0005】[0005]

【課題を解決するための手段】図1は、本発明の研磨用
砥石1を示す拡大断面図で、結合剤としての合成樹脂2
中に、砥粒3と、電気分解により溶出する金属被覆4を
施した砥粒5と、導電性を有する繊維材6とを分散配置
して構成してある。また、砥粒3、金属被覆4を施した
砥粒5及び繊維材6に加えて電気分解により溶出する金
属粒子を分散配置してもよい。
FIG. 1 is an enlarged sectional view showing a polishing grindstone 1 of the present invention, in which a synthetic resin 2 as a binder is used.
An abrasive grain 3, an abrasive grain 5 coated with a metal coating 4 that is eluted by electrolysis, and a fiber material 6 having conductivity are dispersed and arranged. Further, in addition to the abrasive grains 3, the abrasive grains 5 having the metal coating 4 and the fiber material 6, metal particles eluted by electrolysis may be dispersed.

【0006】上記砥粒3,5としては、酸化セリウム、
アルミナ系、炭化ケイ素系、酸化ジルコニウム、ダイヤ
モンド等の材質のものが用いられる。繊維材6として
は、単組繊維や各種金属の繊維材等が用いられ、また、
結合材にはフェノール系、ポリイミド系等の合成樹脂2
が用いられる。
As the abrasive grains 3 and 5, cerium oxide,
Materials made of alumina, silicon carbide, zirconium oxide, diamond or the like are used. As the fibrous material 6, single set fibers or fibrous materials of various metals are used.
The binder is a synthetic resin such as phenol or polyimide 2
Is used.

【0007】[0007]

【作用】上記構成の研磨用砥石1によれば、結合材に合
成樹脂2を用いたレジノイド砥石に繊維材6によって導
電性を持たせ、電解インプロセスドレッシングにより砥
粒5の金属被覆4を電気分解で溶出させることが可能に
なる。研磨用砥石1に導電性を持たせる際に、金属粒子
を用い、これが互いに接して導電性を得るのに比べて、
繊維材6の方が互いに接する確率が高く、低い充填量に
て砥石1に導電性を持たせることができ、レジノイド砥
石の性質を生かすことができる。また、研磨用砥石1の
表面(加工面)を電解する際に金属被覆4が溶出して砥
石表面が侵され目立たされるとともに、金属被覆4の溶
出によって遊離した砥粒5が被加工面との間で転動する
ことにより機械的な目立てを行うことができる。
According to the polishing grindstone 1 having the above structure, the resinoid grindstone using the synthetic resin 2 as the binder is made electrically conductive by the fiber material 6, and the metal coating 4 of the abrasive grains 5 is electrically charged by electrolytic in-process dressing. It becomes possible to elute by decomposition. When the polishing grindstone 1 is made to have conductivity, metal particles are used, which are in contact with each other to obtain conductivity.
The fibrous materials 6 are more likely to come into contact with each other, and the grindstone 1 can be made conductive with a small filling amount, and the properties of the resinoid grindstone can be utilized. Further, when the surface (processed surface) of the polishing grindstone 1 is electrolyzed, the metal coating 4 elutes and the surface of the grindstone is attacked to be conspicuous, and the abrasive grains 5 liberated by the elution of the metal coating 4 become By rolling between them, mechanical dressing can be performed.

【0008】[0008]

【実施例1】図2は、本発明の実施例1を示す拡大断面
図である。本実施例の研磨用砥石10は、結合剤として
フェノール樹脂11を用い、フェノール樹脂11中にダ
イヤモンド砥粒(#3000)12、ニッケル被覆13
を施したダイヤモンド砥粒(#3000)14及び炭素
繊維15を分散配置して構成されている。
Embodiment 1 FIG. 2 is an enlarged sectional view showing Embodiment 1 of the present invention. The polishing grindstone 10 of this embodiment uses a phenol resin 11 as a binder, and the diamond resin (# 3000) 12 and the nickel coating 13 are contained in the phenol resin 11.
The diamond abrasive grains (# 3000) 14 and the carbon fibers 15 are dispersed and arranged.

【0009】上記配合比は、フェノール樹脂11を38
重量%、ダイヤモンド砥粒12を40重量%、ニッケル
被覆13を施したダイヤモンド砥粒14を15重量%及
び炭素繊維を7重量%とし、これらを混合して成縮成形
した後、焼成し、本実施例の研磨用砥石10を得た。
The above compounding ratio is 38 for phenol resin 11.
% By weight, 40% by weight of diamond abrasive grains 12, 15% by weight of diamond abrasive grains 14 coated with nickel 13 and 7% by weight of carbon fiber, and these are mixed and compression-molded and then fired A polishing grindstone 10 of the example was obtained.

【0010】図3は、本実施例の研磨用砥石10を用い
た研磨加工方法を示す模式図、図4は、電解インプロセ
スドレッシング中における研磨用砥石10の表面を示す
拡大断面図である。研磨加工は、回転軸を兼ねる台金1
6に固着した研磨用砥石10の表面(以下、砥石表面と
いう)に被加工物17を摺動させることにより行われ
る。台金16には電源18の陽極が接続され、砥石表面
との間に間隙を設けて砥石表面に対向配置した電極19
には電極18の陰極が接続されている。電解インプロセ
スドレッシングには、電解インプロセスドレッシング加
工用クーラント20が用いられ、電極19と砥石表面と
の間隙に介在させることにより砥石表面を電気分解し、
目立てするようになっている。
FIG. 3 is a schematic view showing a polishing method using the polishing grindstone 10 of this embodiment, and FIG. 4 is an enlarged sectional view showing the surface of the polishing grindstone 10 during electrolytic in-process dressing. For polishing, a base metal that doubles as a rotating shaft 1
It is performed by sliding the work piece 17 on the surface of the polishing grindstone 10 fixed to 6 (hereinafter referred to as the grindstone surface). An anode of a power source 18 is connected to the base metal 16 and an electrode 19 is disposed opposite to the surface of the grindstone with a gap provided between the base metal 16 and the surface of the grindstone.
The cathode of the electrode 18 is connected to. For electrolytic in-process dressing, a coolant 20 for electrolytic in-process dressing is used, and the surface of the grindstone is electrolyzed by interposing it in the gap between the electrode 19 and the surface of the grindstone.
It's designed to stand out.

【0011】次に、図4を用いて電解インプロセスドレ
ッシングを説明する。電極19と砥石表面との間隙にク
ーラント20を介在させた状態で、電極18の陽極から
台金に電流を流すと、電流は研磨用砥石10中の炭素繊
維15又はニッケル被覆13を介して、砥石表面に露出
しているニッケル被覆13に伝わり、そして、クーラン
ト20を介して電極19に流れる。このとき、ニッケル
被覆13は電気分解されてクーラント20中に溶出す
る。これにより、砥石表面は侵食され目立てが行われ
る。さらに、ニッケル被覆13の溶出により遊離砥粒化
したダイヤモンド砥粒14は、被加工物17と砥石表面
との間に介在することになり、その砥粒14の転動によ
って砥石表面が機械的に目立てが行われる。
Next, electrolytic in-process dressing will be described with reference to FIG. When a current is passed from the anode of the electrode 18 to the base metal with the coolant 20 interposed in the gap between the electrode 19 and the surface of the grindstone, the current flows through the carbon fiber 15 or the nickel coating 13 in the grinding grindstone 10, It is transmitted to the nickel coating 13 exposed on the surface of the grindstone, and then flows to the electrode 19 via the coolant 20. At this time, the nickel coating 13 is electrolyzed and eluted into the coolant 20. As a result, the grindstone surface is eroded and sharpened. Further, the diamond abrasive grains 14 which have been made into free abrasive grains by the elution of the nickel coating 13 are present between the work piece 17 and the surface of the grindstone, and the rolling of the abrasive grains 14 causes the surface of the grindstone to mechanically move. Sharpening is done.

【0012】本実施例の研磨用砥石10を用いて、光学
ガラスBK−7を研磨加工したところ、ダメージ少ない
鏡面状態に加工することができた。一方、従来技術の研
磨用砥石30(図6参照)を用いて上記光学を研磨した
ところ、鏡面状態に近づくものの細かなキズが生じる結
果となった。
When the optical grindstone 10 of this embodiment was used to polish the optical glass BK-7, it could be processed into a mirror surface state with less damage. On the other hand, when the above-mentioned optics were polished using the conventional grinding stone 30 for polishing (see FIG. 6), fine scratches were generated although the mirror-like state was approached.

【0013】なお、本実施例において、ニッレル被覆1
3を施したダイヤモンド砥粒14が7重量%以下である
とドレッシング効果が低減して目詰まりを生じ、25重
量%を超えると研磨加工能力が低減する。また、炭素繊
維15が3重量%以下であると導電性が低下し、10重
量%を超えるとフェノール樹脂11による砥粒12,1
4の保持力が低下する。
In this embodiment, the Nirel coating 1
If the content of the diamond abrasive grains 14 subjected to No. 3 is 7% by weight or less, the dressing effect is reduced to cause clogging, and if it exceeds 25% by weight, the polishing ability is reduced. Further, when the carbon fiber 15 is less than 3% by weight, the conductivity is lowered, and when it exceeds 10% by weight, the abrasive grains 12, 1 by the phenol resin 11 are reduced.
The holding power of No. 4 decreases.

【0014】本実施例によれば、電解作用によりダイヤ
モンド砥粒14の表面に施したニッケル被覆13が溶出
して、砥石表面のドレッシングが行われるとともに、ニ
ッケル被覆13の溶出により遊離したダイヤモンド砥粒
14の転動によって砥石表面の機械的なドレッシングを
行うことができ、ダメージの少ない加工面を得ることが
できる。
According to this embodiment, the nickel coating 13 applied to the surface of the diamond abrasive grains 14 is eluted by the electrolytic action to dress the surface of the grindstone, and the diamond abrasive grains released by the elution of the nickel coating 13 are released. The rolling of 14 makes it possible to mechanically dress the surface of the grindstone and to obtain a machined surface with less damage.

【0015】[0015]

【実施例2】図5は、本発明の実施例2を示す拡大断面
図である。本実施例の研磨用砥石21は、結合剤に電気
分解により溶出可能な金属粉末を少量添加して電解によ
る目立て作用を促進させたことに特徴を有する。研磨用
砥石21は、結合剤としてポリイミド樹脂22を用い、
ポリイミド樹脂22中に酸化セリウム砥粒(粒径約1μ
m)23、銅被覆24を施した酸化セリウム砥粒(粒径
約1μm)25、炭素繊維26及び銅粒子(粒径約5μ
m)27を分散配置して構成されている。
Second Embodiment FIG. 5 is an enlarged sectional view showing a second embodiment of the present invention. The polishing grindstone 21 of the present embodiment is characterized in that a small amount of metal powder that can be eluted by electrolysis is added to the binder to promote the dressing action by electrolysis. The polishing grindstone 21 uses a polyimide resin 22 as a binder,
Cerium oxide abrasive grains (particle size about 1μ in polyimide resin 22
m) 23, cerium oxide abrasive grains (particle size of about 1 μm) 25 coated with copper 24, carbon fiber 26 and copper particles (particle size of about 5 μm
m) 27 are arranged in a distributed manner.

【0016】上記配合比は、ポリイミド樹脂22を35
重量%、酸化セリウム砥粒23を35重量%、銅被覆2
4を施した酸化セリウム砥粒25を20重量%、炭素繊
維26を5重量%及び銅粒子27を5重量%とし、これ
らを混合して圧縮成形した後、焼成して本実施例の研磨
用砥石21を得た。
The above mixing ratio is such that the polyimide resin 22 is 35
% By weight, 35% by weight of cerium oxide abrasive grains 23, copper coating 2
20% by weight of cerium oxide abrasive grains 25, 5% by weight of carbon fibers 26 and 5% by weight of copper particles 27, which were mixed and compression-molded and then fired for polishing of this example. The grindstone 21 was obtained.

【0017】本実施例の研磨用砥石21を用いた研磨加
工方法は、実施例1の研磨用砥石10を用いた場合と同
様である。本実施例にあっては、銅被覆24及び銅粒子
27が電解作用により溶出される。これにより、実施例
1におけるニッケル被覆13のみの溶出よりも、砥石表
面において溶出される部分が増加するため、その分、電
解インプロセスドレッシングによる目立て効果か増大さ
れる。
The polishing method using the polishing grindstone 21 of the present embodiment is the same as the case of using the polishing grindstone 10 of the first embodiment. In this embodiment, the copper coating 24 and the copper particles 27 are eluted by the electrolytic action. As a result, the portion eluted on the surface of the grindstone is larger than the elution of only the nickel coating 13 in Example 1, and the dressing effect of electrolytic in-process dressing is correspondingly increased.

【0018】なお、本実施例において、銅被覆24を施
した酸化セリウム砥粒25が1重量%以下であるとドレ
ッシング効果が低下し、15重量%を超えるとドレッシ
ングが過多になり研削比の低下が生じる。また、銅粒子
27が15重量%を超えると被加工面にキズを生じさせ
ることがある。
In this embodiment, when the cerium oxide abrasive grains 25 coated with the copper coating 24 were 1% by weight or less, the dressing effect was lowered, and when the amount was more than 15% by weight, the dressing was excessive and the grinding ratio was lowered. Occurs. If the copper particles 27 exceed 15% by weight, the surface to be processed may be damaged.

【0019】本実施例によれば、実施例1と同様の効果
が得られるとともに、結合剤であるポリイミド樹脂22
中の銅粒子27の溶出作用により、より一層の電解によ
る砥石表面の目立てに作用を増大することができる。
According to this embodiment, the same effect as that of the first embodiment can be obtained, and the polyimide resin 22 as the binder is obtained.
The elution action of the copper particles 27 in the inside can further increase the action of dressing the surface of the grindstone by electrolysis.

【0020】なお、上記実施例1,2では、砥粒にダイ
ヤモンド、酸化セリウムを用いた場合を例示したが、ア
ルミナ系、炭化ケイ素系、酸化ジルコニウム系等を用い
ることができる。また、金属被覆を施した砥粒と金属被
覆を施さない砥粒は、研磨加工の用途に応じて砥粒の種
類、粒径を替えて用いもよい。さらに、導電性を有する
繊維材には炭素繊維以外に鋳鉄、銅等の金属繊維を用い
てもよく、また、金属粒子には銅以外にブロンズ、ニッ
ケル、銀等の粒子を用いてもよいが、繊維材および金属
粒子は被加工物にキズを与えない、極力軟らかなものを
用いるのがよい。
In Examples 1 and 2 described above, diamond and cerium oxide were used as the abrasive grains, but alumina, silicon carbide, zirconium oxide or the like can be used. Further, the abrasive particles coated with a metal and the abrasive particles not coated with a metal may be used by changing the type and particle size of the abrasive particles according to the purpose of polishing. Furthermore, in addition to carbon fibers, cast iron, metal fibers such as copper may be used as the conductive fiber material, and bronze, nickel, silver particles other than copper may be used as the metal particles. The fibrous material and the metal particles are preferably as soft as possible so as not to damage the work piece.

【0021】[0021]

【発明の効果】以上のように、本発明の研磨用砥石によ
れば、レジノイド砥石の特徴である弾性を損なうことな
く、電解インプロセスドレッシングによる砥石表面の目
立てが可能になり、ダメージの少ない鏡面加工を行うこ
とができる。
As described above, according to the polishing grindstone of the present invention, it is possible to sharpen the surface of the grindstone by electrolytic in-process dressing without impairing the elasticity which is a characteristic of the resinoid grindstone, and to provide a mirror surface with less damage. Processing can be performed.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の研磨用砥石を示す拡大断面図である。FIG. 1 is an enlarged sectional view showing a polishing grindstone of the present invention.

【図2】本発明の実施例1を示す拡大断面図である。FIG. 2 is an enlarged cross-sectional view showing the first embodiment of the present invention.

【図3】本発明の実施例1の研磨用砥石を用いた研磨加
工方法を示す模式図である。
FIG. 3 is a schematic view showing a polishing method using the polishing grindstone of Example 1 of the present invention.

【図4】電解インプロセスドレッシング中における本発
明の実施例1の砥石表面を示す拡大断面図である。
FIG. 4 is an enlarged cross-sectional view showing a grindstone surface of Example 1 of the present invention during electrolytic in-process dressing.

【図5】本発明の実施例2を示す拡大断面図である。FIG. 5 is an enlarged cross-sectional view showing a second embodiment of the present invention.

【図6】従来の研磨用砥石を示す拡大断面図である。FIG. 6 is an enlarged sectional view showing a conventional grinding wheel.

【符号の説明】[Explanation of symbols]

1 研磨用砥石 2 合成樹脂 3,5 砥粒 4 金属被覆 6 繊維材 1 Grinding stone for polishing 2 Synthetic resin 3,5 Abrasive grains 4 Metal coating 6 Fiber material

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 砥粒を結合剤で固定して得られる研磨用
砥石において、剛性樹脂を結合剤とし、結合剤中に砥粒
と、電気分解により溶出する金属被覆を施した砥粒と、
導電性を有する繊維材とを分散配置して構成したことを
特徴とする研磨用砥石。
1. A polishing grindstone obtained by fixing abrasive grains with a binder, wherein a rigid resin is used as the binder, abrasive grains in the binder, and abrasive grains coated with a metal that is eluted by electrolysis.
A grindstone for polishing, comprising a conductive fiber material dispersedly arranged.
【請求項2】 砥粒を結合剤で固定して得られる研磨用
砥石において、合成樹脂を結合剤とし、結合剤中に砥粒
と、電気分解により溶出する金属被覆を施した砥粒と、
導電性を有する繊維材と、電気分解により溶出する金属
粒子とを分散配置して構成したこと特徴とする研磨用砥
石。
2. A polishing grindstone obtained by fixing abrasive grains with a binder, wherein synthetic resin is used as the binder, abrasive grains in the binder, and abrasive grains having a metal coating eluted by electrolysis,
A polishing grindstone comprising a conductive fiber material and metal particles eluted by electrolysis dispersedly arranged.
JP12054193A 1993-04-23 1993-04-23 Polishing whetstone Expired - Fee Related JP3310385B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12054193A JP3310385B2 (en) 1993-04-23 1993-04-23 Polishing whetstone

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12054193A JP3310385B2 (en) 1993-04-23 1993-04-23 Polishing whetstone

Publications (2)

Publication Number Publication Date
JPH06304871A true JPH06304871A (en) 1994-11-01
JP3310385B2 JP3310385B2 (en) 2002-08-05

Family

ID=14788851

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12054193A Expired - Fee Related JP3310385B2 (en) 1993-04-23 1993-04-23 Polishing whetstone

Country Status (1)

Country Link
JP (1) JP3310385B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003048168A (en) * 2001-08-07 2003-02-18 Noritake Co Ltd Thin cutting edge abrasive grain tool made of resin binding material
JP2003071719A (en) * 2001-09-04 2003-03-12 Inst Of Physical & Chemical Res Metal-less bond grinding wheel, method and device for electrolytic dressing grinding using the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003048168A (en) * 2001-08-07 2003-02-18 Noritake Co Ltd Thin cutting edge abrasive grain tool made of resin binding material
JP2003071719A (en) * 2001-09-04 2003-03-12 Inst Of Physical & Chemical Res Metal-less bond grinding wheel, method and device for electrolytic dressing grinding using the same
JP4737492B2 (en) * 2001-09-04 2011-08-03 独立行政法人理化学研究所 Metalless bond grindstone and electrolytic dressing grinding method and apparatus using the same

Also Published As

Publication number Publication date
JP3310385B2 (en) 2002-08-05

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