JPH06301037A - Production of liquid crystal display device - Google Patents

Production of liquid crystal display device

Info

Publication number
JPH06301037A
JPH06301037A JP8737093A JP8737093A JPH06301037A JP H06301037 A JPH06301037 A JP H06301037A JP 8737093 A JP8737093 A JP 8737093A JP 8737093 A JP8737093 A JP 8737093A JP H06301037 A JPH06301037 A JP H06301037A
Authority
JP
Japan
Prior art keywords
film
alignment
liquid crystal
display device
crystal display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8737093A
Other languages
Japanese (ja)
Inventor
Takayuki Miwa
高行 美和
Koji Anada
幸治 穴田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP8737093A priority Critical patent/JPH06301037A/en
Publication of JPH06301037A publication Critical patent/JPH06301037A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To improve a method for forming oriented films in the liquid crystal display device. CONSTITUTION:This process for production has a stage for peeling a protective film 2 of an oriented dry film 4 formed by providing the oriented film 1 having oriented molecules 3 subjected to an orientation treatment with the protective film 2 behind this film and a stage for sticking the oriented film 1 atop a TFT substrate 20 constituted by forming the TFTs atop the substrate.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はTFT(Thin Film Tran
sistor: 薄膜トランジスタ)アクティヴマトリクスなど
の液晶表示装置の製造方法における、液晶分子を配向さ
せるために用いる配向膜の形成方法の改善に関する。
The present invention relates to a thin film transistor (TFT).
sistor: thin film transistor) The present invention relates to improvement of a method of forming an alignment film used for aligning liquid crystal molecules in a method of manufacturing a liquid crystal display device such as an active matrix.

【0002】[0002]

【従来の技術】以下で、従来例に係る液晶表示装置の製
造方法について説明する。図5は、液晶表示装置の製造
方法に係るTFT基板の構造を示す断面図である。図5
に示すように、一般に液晶表示装置の製造方法に係るT
FT基板(20)は、ガラス基板(11)上に補助電極
(12),ゲートバスライン(13), SiNX 膜などか
らなるゲート絶縁膜(14)が順次形成され、該ゲート
絶縁膜(14)上にアモルファスシリコンからなる動作
半導体層(15),ITO膜からなる画素電極(1
6),動作半導体層(15)とオーミックコンタクトを
とるためのコンタクト層(17A,17B),Al/M
o膜の2層構造からなるソース/ドレイン〔以下S/D
と称する〕電極(18A,18B)、 SiNX 膜からなる
基板保護膜(19)が形成されてなる。
2. Description of the Related Art A method of manufacturing a liquid crystal display device according to a conventional example will be described below. FIG. 5 is a cross-sectional view showing the structure of the TFT substrate according to the method of manufacturing a liquid crystal display device. Figure 5
As shown in FIG.
In the FT substrate (20), an auxiliary electrode (12), a gate bus line (13), and a gate insulating film (14) including a SiNX film are sequentially formed on a glass substrate (11), and the gate insulating film (14) is formed. An operating semiconductor layer (15) made of amorphous silicon and a pixel electrode (1
6), contact layers (17A, 17B) for making ohmic contact with the operating semiconductor layer (15), Al / M
Source / drain consisting of two-layer structure of o film [hereinafter referred to as S / D
Electrode] (18A, 18B) and a substrate protection film (19) made of a SiNX film.

【0003】従来例に係る液晶表示装置の製造方法は、
まず図5に示すような構造を有するTFT基板(20)
にポリイミドなどの高分子材料を塗布したのちに、それ
を200℃程度に熱処理して硬化させて配向膜(5)を
形成し(図6)、次いで綿布などでその表面を一定方向
に擦るラビング処理をすることにより配向膜(5)の表
面の配向分子(5A)を一定方向に配向させて、配向膜
を形成していた(図7)。
A method of manufacturing a liquid crystal display device according to a conventional example is as follows.
First, a TFT substrate (20) having a structure as shown in FIG.
After applying a polymer material such as polyimide to the above, heat treating it at about 200 ° C. to cure it to form an alignment film (5) (FIG. 6), and then rubbing the surface in a certain direction with a cotton cloth or the like. By performing the treatment, the alignment molecules (5A) on the surface of the alignment film (5) were aligned in a fixed direction to form the alignment film (FIG. 7).

【0004】[0004]

【発明が解決しようとする課題】しかしながら、上記従
来の方法によると、高分子材料を硬化させて配向膜を形
成するために、TFT基板(20)を熱処理する必要が
あるので、TFT基板(20)上に形成されたTFTが
熱破壊されてしまう。また、配向膜(5)の配向分子を
一定方向に配向させるためのラビング処理の際に、静電
気が発生してしまい、TFT基板(20)上のTFTが
静電破壊されてしまい、またラビング処理自体も煩雑な
処理であった。
However, according to the above-mentioned conventional method, the TFT substrate (20) needs to be heat-treated in order to cure the polymer material to form the alignment film. ) The TFT formed above is thermally destroyed. Further, static electricity is generated during the rubbing treatment for orienting the oriented molecules of the orientation film (5) in a certain direction, the TFT on the TFT substrate (20) is electrostatically destroyed, and the rubbing treatment is performed. The process itself was complicated.

【0005】このため、配向膜形成の際に多数のTFT
が破壊されるので、歩留りが低下してしまうといった問
題が生じていた。
Therefore, a large number of TFTs are required to form the alignment film.
However, there is a problem in that the yield is reduced because of the destruction.

【0006】[0006]

【課題を解決するための手段】本発明は上記従来の欠点
に鑑み成されたもので、図1に示すように、配向処理が
なされた配向分子(3)をその表面に有する配向膜
(1)の背面に保護膜(2)が設けられて成る配向ドラ
イフィルム(4)の前記保護膜(2)を剥離し、TFT
がその上面に形成されてなるTFT基板(20)の上面
に前記配向膜(1)を貼付することにより、TFTの熱
処理による熱破壊や、ラビング処理による静電破壊を抑
止し、歩留りの向上を図ることが可能となる液晶表示装
置の製造方法を提供するものである。
The present invention has been made in view of the above-mentioned conventional drawbacks, and as shown in FIG. 1, an alignment film (1) having alignment molecules (3) subjected to alignment treatment on its surface is formed. ), The protective film (2) of the oriented dry film (4) having a protective film (2) provided on the back surface of
By sticking the alignment film (1) on the upper surface of the TFT substrate (20) formed on the upper surface thereof, thermal destruction due to heat treatment of the TFT and electrostatic destruction due to rubbing treatment are suppressed, and the yield is improved. The present invention provides a method for manufacturing a liquid crystal display device that can be manufactured.

【0007】[0007]

【作 用】本発明に係る液晶表示装置の製造方法によれ
ば、図1に示すように、配向処理がなされた配向分子
(3)をその表面に有する配向膜(1)の背面に保護膜
(2)が設けられて成る配向ドライフィルム(4)の保
護膜(2)を図2に示すように剥離し、図3に示すよう
にTFTがその上面に形成されてなるTFT基板(2
0)の上面に配向膜(1)を貼付している。
[Operation] According to the method of manufacturing a liquid crystal display device of the present invention, as shown in FIG. 1, a protective film is provided on the back surface of the alignment film (1) having alignment molecules (3) subjected to alignment treatment on the surface thereof. The protective film (2) of the oriented dry film (4) provided with (2) is peeled off as shown in FIG. 2, and the TFT substrate (2 having the TFT formed on the upper surface thereof as shown in FIG. 3 is formed.
The alignment film (1) is attached to the upper surface of (0).

【0008】このため、既にラビング処理や静電処理な
どの配向処理がなされた配向分子(3)を表面に有する
配向膜(1)を貼付するだけの工程でTFT基板(2
0)の上面に配向膜を形成することができる。これによ
り、従来のように配向膜材料を硬化させて配向膜を形成
するために、TFT基板(20)を熱処理する必要もな
く、また、配向膜(5)の配向分子を一定方向に配向さ
せるためのラビング処理も必要としないので、TFTの
熱処理による熱破壊や、ラビング処理による静電破壊を
抑止し、歩留りの向上を図ることが可能となる。
For this reason, the TFT substrate (2) can be formed by simply attaching the alignment film (1) having the alignment molecules (3) which have been already subjected to the alignment treatment such as rubbing or electrostatic treatment.
An alignment film can be formed on the upper surface of (0). As a result, it is not necessary to heat the TFT substrate (20) to cure the alignment film material and form the alignment film as in the conventional case, and the alignment molecules of the alignment film (5) are aligned in a fixed direction. Since no rubbing treatment is also required, it is possible to suppress thermal breakdown due to heat treatment of TFT and electrostatic breakdown due to rubbing treatment, and improve yield.

【0009】[0009]

【実施例】以下に本発明の実施例に係る液晶表示装置の
製造方法を図面を参照しながら説明する。本発明の実施
例に用いられる配向ドライフィルム(4)は、図1に示
すように、その表面がラビング処理され、配向分子
(3)が一定の方向に配向されているポリイミドからな
る配向膜(1)と、配向膜(1)の裏面に設けられた保
護膜(2)とからなる。この保護膜(2)は図2に示す
ように容易に剥離することが可能である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A method of manufacturing a liquid crystal display device according to an embodiment of the present invention will be described below with reference to the drawings. As shown in FIG. 1, the alignment dry film (4) used in the examples of the present invention has an alignment film (made of polyimide whose surface is rubbed and alignment molecules (3) are aligned in a certain direction). 1) and a protective film (2) provided on the back surface of the alignment film (1). This protective film (2) can be easily peeled off as shown in FIG.

【0010】また、配向膜(1)と保護膜(2)との界
面には、接着剤が塗布されており、保護膜(2)を剥離
して配向膜(1)を露出すると、配向膜(1)を所望の
面に貼付することができる。本発明の実施例に係る液晶
表示装置の製造方法は、TFTアクティヴマトリクスに
用いられる液晶層の液晶分子を一定方向に配向させるた
めの配向膜をTFTがその上面にマトリクス状に配置さ
れたTFT基板上に形成する方法であって、その製造工
程に上記した配向ドライフィルム(4)を用いることを
特徴としている。
An adhesive is applied to the interface between the alignment film (1) and the protective film (2), and when the protective film (2) is peeled off to expose the alignment film (1), the alignment film is formed. (1) can be attached to a desired surface. A method for manufacturing a liquid crystal display device according to an embodiment of the present invention is a TFT substrate in which TFTs are arranged in a matrix on the upper surface of an alignment film for aligning liquid crystal molecules of a liquid crystal layer used in a TFT active matrix in a certain direction. A method of forming the above, characterized by using the above-mentioned oriented dry film (4) in the manufacturing process.

【0011】本発明の実施例に係る液晶表示装置の製造
方法は、図2に示すようにまず配向ドライフィルム
(4)から保護膜(2)を剥離し、次に図5に示すよう
な構造を有するTFT基板(20)に、保護膜(2)が
剥離された配向ドライフィルム(4)を、図3に示すよ
うに貼付する。すると、図4に示すように、すでにラビ
ング処理,静電処理などの配向処理がなされた表面を有
する配向膜(1)がTFT基板(20)上に形成され
る。
In the method of manufacturing a liquid crystal display device according to the embodiment of the present invention, as shown in FIG. 2, first, the protective film (2) is peeled from the alignment dry film (4), and then the structure shown in FIG. The oriented dry film (4) from which the protective film (2) has been peeled off is attached to the TFT substrate (20) having the film as shown in FIG. Then, as shown in FIG. 4, an alignment film (1) having a surface that has already been subjected to alignment treatment such as rubbing treatment or electrostatic treatment is formed on the TFT substrate (20).

【0012】以上説明したように、本発明の実施例に係
る液晶表示装置の製造方法によれば、図1に示すように
配向処理がなされた配向分子(3)を表面に有する配向
膜(1)の背面に保護膜(2)が設けられた配向ドライ
フィルム(4)の保護膜(2)を図2に示すように剥離
し、図3に示すように配向膜(1)をTFT基板(2
0)の上面に貼付している。
As described above, according to the method of manufacturing a liquid crystal display device in accordance with the embodiment of the present invention, as shown in FIG. 1, an alignment film (1) having alignment molecules (3) subjected to alignment treatment on its surface is formed. ), The protective film (2) of the alignment dry film (4) provided with the protective film (2) on the back surface is peeled as shown in FIG. 2, and the alignment film (1) is removed as shown in FIG. Two
It is attached to the upper surface of 0).

【0013】このため、既にラビング処理や静電処理な
どの配向処理がなされた配向分子(3)を表面に有する
配向膜(1)を貼付するだけの工程でTFT基板(2
0)の上面に容易に配向膜を形成することができる。こ
れにより、従来のようにポリイミドからなる配向膜材料
を硬化させて配向膜を形成するために、TFT基板(2
0)を200℃程度の温度で熱処理する必要がない。
For this reason, the TFT substrate (2) can be formed by simply attaching the alignment film (1) having the alignment molecules (3) which have already been subjected to the alignment treatment such as rubbing treatment or electrostatic treatment.
The alignment film can be easily formed on the upper surface of (0). As a result, in order to cure the alignment film material made of polyimide as in the prior art to form the alignment film, the TFT substrate (2
It is not necessary to heat-treat 0) at a temperature of about 200 ° C.

【0014】また、すでに配向ドライフィルム(4)は
ラビング処理やその後の静電処理などを含む配向処理が
なされており、配向膜(5)の配向分子を一定方向に配
向させるためのラビング処理を必要としないので、TF
T基板(20)を熱処理することによるTFTの熱破壊
や、ラビング処理によるTFTの静電破壊を抑止し、歩
留りの向上を図ることが可能となる。
The oriented dry film (4) has already been subjected to an orientation treatment including a rubbing treatment and a subsequent electrostatic treatment, and the rubbing treatment for orienting the orientation molecules of the orientation film (5) in a certain direction is performed. I don't need it, so TF
It is possible to suppress the thermal destruction of the TFT due to the heat treatment of the T substrate (20) and the electrostatic destruction of the TFT due to the rubbing treatment, and to improve the yield.

【0015】[0015]

【発明の効果】以上説明したように、本発明に係る液晶
表示装置の製造方法によれば、配向処理がなされた配向
分子(3)を表面に有する配向膜(1)の背面に保護膜
(2)が設けられた配向ドライフィルム(4)の保護膜
(2)を剥離し、配向膜(1)をTFT基板の上面に貼
付している。
As described above, according to the method of manufacturing a liquid crystal display device of the present invention, the protective film (on the back surface of the alignment film (1) having the alignment molecules (3) subjected to the alignment treatment on the surface ( The protective film (2) of the oriented dry film (4) provided with 2) is peeled off, and the oriented film (1) is attached to the upper surface of the TFT substrate.

【0016】このため、配向処理がなされた配向膜
(1)を貼付するだけでTFT基板の上面に配向膜を形
成することができるので、 TFTの熱処理による熱破
壊や、ラビング処理による静電破壊を抑止し、歩留りの
向上を図ることが可能となる。
For this reason, the alignment film can be formed on the upper surface of the TFT substrate only by sticking the alignment film (1) which has been subjected to the alignment treatment, and therefore, the thermal destruction of the TFT by heat treatment or the electrostatic destruction of the rubbing treatment. It is possible to suppress the above and improve the yield.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例に係る配向ドライフィルムを説
明する断面図である。
FIG. 1 is a cross-sectional view illustrating an oriented dry film according to an example of the present invention.

【図2】本発明の実施例に係る液晶表示装置の製造方法
を説明する第1の断面図である。
FIG. 2 is a first cross-sectional view illustrating the method of manufacturing the liquid crystal display device according to the embodiment of the invention.

【図3】本発明の実施例に係る液晶表示装置の製造方法
を説明する第2の断面図である。
FIG. 3 is a second cross-sectional view illustrating the method of manufacturing the liquid crystal display device according to the embodiment of the present invention.

【図4】本発明の実施例に係る液晶表示装置の製造方法
を説明する第3の断面図である。
FIG. 4 is a third cross-sectional view illustrating the method of manufacturing the liquid crystal display device according to the embodiment of the invention.

【図5】一般の液晶表示装置に係るTFT基板の構造を
説明する断面図である。
FIG. 5 is a cross-sectional view illustrating a structure of a TFT substrate of a general liquid crystal display device.

【図6】従来例に係る液晶表示装置の製造方法を説明す
る第1の断面図である。
FIG. 6 is a first cross-sectional view illustrating the method of manufacturing the liquid crystal display device according to the conventional example.

【図7】従来例に係る液晶表示装置の製造方法を説明す
る第2の断面図である。
FIG. 7 is a second cross-sectional view illustrating the method of manufacturing the liquid crystal display device according to the conventional example.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 配向処理がなされた配向分子(3)をそ
の表面に有する配向膜(1)の背面に保護膜(2)が設
けられて成る配向ドライフィルム(4)の前記保護膜
(2)を剥離する工程と、 TFTがその上面に形成されてなるTFT基板(20)
の上面に前記配向膜(1)を貼付する工程とを有するこ
とを特徴とする液晶表示装置の製造方法。
1. The protective film (2) of an alignment dry film (4) comprising a protective film (2) provided on the back surface of an alignment film (1) having alignment molecules (3) subjected to alignment treatment on its surface. ) Is peeled off, and a TFT substrate (20) having a TFT formed on the upper surface thereof
A step of attaching the alignment film (1) to the upper surface of the liquid crystal display device.
JP8737093A 1993-04-14 1993-04-14 Production of liquid crystal display device Pending JPH06301037A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8737093A JPH06301037A (en) 1993-04-14 1993-04-14 Production of liquid crystal display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8737093A JPH06301037A (en) 1993-04-14 1993-04-14 Production of liquid crystal display device

Publications (1)

Publication Number Publication Date
JPH06301037A true JPH06301037A (en) 1994-10-28

Family

ID=13913015

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8737093A Pending JPH06301037A (en) 1993-04-14 1993-04-14 Production of liquid crystal display device

Country Status (1)

Country Link
JP (1) JPH06301037A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102636912A (en) * 2012-05-14 2012-08-15 深圳市华星光电技术有限公司 Liquid crystal display device and manufacturing method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102636912A (en) * 2012-05-14 2012-08-15 深圳市华星光电技术有限公司 Liquid crystal display device and manufacturing method thereof
WO2013170476A1 (en) * 2012-05-14 2013-11-21 深圳市华星光电技术有限公司 Liquid crystal display device and manufacturing method therefor

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