JPH06291006A - Production of semiconductor wafer - Google Patents

Production of semiconductor wafer

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Publication number
JPH06291006A
JPH06291006A JP7592093A JP7592093A JPH06291006A JP H06291006 A JPH06291006 A JP H06291006A JP 7592093 A JP7592093 A JP 7592093A JP 7592093 A JP7592093 A JP 7592093A JP H06291006 A JPH06291006 A JP H06291006A
Authority
JP
Japan
Prior art keywords
semiconductor wafer
processing
time
symbol
production line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7592093A
Other languages
Japanese (ja)
Other versions
JP2871994B2 (en
Inventor
Yoichi Togashi
洋一 富樫
Yukihiro Muraoka
幸弘 村岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Yamagata Ltd
Original Assignee
NEC Yamagata Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Yamagata Ltd filed Critical NEC Yamagata Ltd
Priority to JP7592093A priority Critical patent/JP2871994B2/en
Publication of JPH06291006A publication Critical patent/JPH06291006A/en
Application granted granted Critical
Publication of JP2871994B2 publication Critical patent/JP2871994B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To restrain the number of workpieces in process and shorten the lead time of production by attaining a target throughput by raising the operation rate of the manufacturing device on a semiconductor wafer production line and suppressing the number of delays by optimizing the flow of semiconductor wafers. CONSTITUTION:In the production line of a semiconductor wafer composed of a plurality of processing processes K1, K2, and K3, the process completing time A6 of the manufacturing device of the semiconductor wafer to be processed is presumed based on the time (actual results) spent by the process in the past at the time A1 at which the process is started and the semiconductor wafer to be processed is carried A2 to the manufacturing device. At the same time, all preparatory works A5 required before and after the process are completed. In addition, the process A4 of the next semiconductor wafer is performed at the moment the process of the current semiconductor wafer is completed. Thus the flow of semiconductor wafers is optimized on the production line.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体ウェーハの生産
方法に関し、特に多くの加工工程を必要とする半導体ウ
ェーハ生産ラインの生産制御方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor wafer production method, and more particularly to a production control method for a semiconductor wafer production line which requires many processing steps.

【0002】[0002]

【従来の技術】[Prior art]

(1)まず複数の加工工程からなる半導体ウェーハ生産
ラインにおいて、各工程間での半導体ウェーハの流れに
ついて説明する。半導体ウェーハ生産ラインは、加工工
程数が300〜500工程と非常に多く、各工程の製造
装置が非常に高価なため、加工手順通りに装置を一列に
並べるようなことはせず、図3の記号C1から記号C8
に一例を示すように各工程の装置を繰り返し使用するこ
とによって加工進行させていく方式をとっている。
(1) First, in a semiconductor wafer production line including a plurality of processing steps, the flow of semiconductor wafers between the steps will be described. The semiconductor wafer production line has a very large number of processing steps of 300 to 500, and the manufacturing equipment of each step is very expensive. Therefore, it is not necessary to arrange the equipment in a line according to the processing procedure. Symbols C1 to C8
As shown in the example, the method of advancing the processing is adopted by repeatedly using the apparatus of each process.

【0003】また、各工程に製造装置における処理条件
が、加工工程の進行に応じて変わっていき、同じ製造装
置で処理する場合でも、1回目の処理と2回目の処理で
は、処理条件が異なる。
Further, the processing conditions in the manufacturing apparatus for each step change according to the progress of the processing steps, and even when processing is performed by the same manufacturing apparatus, the processing conditions are different between the first processing and the second processing. .

【0004】加えて半導体ウェーハの品種が非常に多
く、品種毎で処理条件が異なり、1ロット当たりの半導
体ウェーハ処理枚数も異なる。
In addition, there are a great variety of semiconductor wafers, and the processing conditions vary from product to product, and the number of semiconductor wafers processed per lot also differs.

【0005】ここで、図3の記号C6を中心に自工程と
した場合、前後の工程を見ると、前工程は、記号C1,
記号C2および記号C5の工程であり、後工程と呼ばれ
る工程は、記号C2,記号C3,記号C4および記号C
7の工程である。これらの各工程が複雑に絡み合い加工
進行していくため、各工程間で半導体ウェーハ処理の同
期を取ることが困難である。従って、各工程が独立した
ジョブショップ形式で半導体ウェーハを処理しており、
自工程の処理が終了した時点で、後工程の仕掛り状態を
意識しないで半導体ウェーハを送り出す、後工程に対し
ての押し出し方式を行っていた。
Here, in the case where the process is centered on the symbol C6 in FIG.
The processes of the symbols C2 and C5, which are called post-processes, include the symbols C2, C3, C4, and C.
Step 7. Since each of these processes is complicatedly entangled and the processing progresses, it is difficult to synchronize the semiconductor wafer processing between the processes. Therefore, each process processes semiconductor wafers in an independent job shop format,
When the processing of the self-process is completed, the semiconductor wafer is sent out without being aware of the work-in-process state of the post-process, and the extrusion method for the post-process is used.

【0006】(2)次に各工程での半導体ウェーハの流
れについて説明する。図4の記号D1は、半導体ウェー
ハ保管棚と製造装置の間で、半導体ウェーハを搬送する
のに必要な時間であり、記号D2は、半導体ウェーハを
処理するために必要となる部材の準備や処理条件切り替
えおよび半導体ウェーハを製造装置に設置する場合に必
要となる時間であり、記号D3は、処理にかかる時間で
ある。また、記号D6は、半導体ウェーハの処理終了後
に、半導体ウェーハを製造装置から取り外したり半導体
ウェーハを冷やすために必要な時間であり、記号D7
は、半導体ウェーハを次工程に搬送するために必要とな
る時間である。自工程に仕掛っている複数のロットから
最優先に処理するロットを選択し、図4に示すように記
号L6のロットの処理が終了(記号D4)した後、人が
勘と経験を頼りに記号L7のロットの処理開始タイミン
グを測り処理を行っていた。
(2) Next, the flow of the semiconductor wafer in each step will be described. The symbol D1 in FIG. 4 is the time required to transfer the semiconductor wafer between the semiconductor wafer storage shelf and the manufacturing apparatus, and the symbol D2 is the preparation and processing of the members necessary for processing the semiconductor wafer. The time required to switch the conditions and install the semiconductor wafer in the manufacturing apparatus is indicated by the symbol D3. The symbol D6 is the time required to remove the semiconductor wafer from the manufacturing apparatus or cool the semiconductor wafer after the semiconductor wafer has been processed.
Is the time required to transfer the semiconductor wafer to the next step. After selecting the lot to be processed with the highest priority from a plurality of lots in the process, and finishing the processing of the lot L6 as shown in FIG. 4 (symbol D4), a person can rely on his intuition and experience. The processing start timing was measured for the lot L7.

【0007】[0007]

【発明が解決しようとする課題】前記の従来の半導体ウ
エーハの生産では、以下に示すような問題点があった。
(1)各工程が独立で半導体ウェーハを処理しており、
工程と工程の間で半導体ウェーハの処理の同期がとられ
ていないため、前工程から自工程に半導体ウェーハが何
時搬送されて来るか分からず、製造装置が空いてしま
う。従って、製造装置が高価であるにもかかわらず、稼
働率が低下してしまう。(2)半導体生産ラインの全て
の工程にある製造装置の処理能力が均等であり、同じ処
理時間で半導体ウェーハが処理できれば、各工程の仕掛
り状態は、常に一定であるため、後工程の仕掛り状態を
意識しなくても、特に問題にはならない。
The above-mentioned conventional production of semiconductor wafers has the following problems.
(1) Each process independently processes semiconductor wafers,
Since the processing of the semiconductor wafer is not synchronized between the steps, it is not possible to know when the semiconductor wafer is transferred from the previous step to its own step, and the manufacturing apparatus becomes empty. Therefore, the operating rate is reduced even though the manufacturing apparatus is expensive. (2) If the processing capacities of the manufacturing equipment in all the processes of the semiconductor production line are equal and the semiconductor wafers can be processed in the same processing time, the in-process state of each process is always constant, so that the in-process processes of the subsequent processes are There is no particular problem even if you do not care about the condition.

【0008】しかし、実際は、各工程にある製造装置の
処理能力が均等でなく処理時間も異なる。また、半導体
ウェーハの枚数により処理時間が異なる製造装置もあ
る。
However, in reality, the processing capacity of the manufacturing apparatus in each process is not uniform and the processing time is different. In addition, there are manufacturing apparatuses in which the processing time differs depending on the number of semiconductor wafers.

【0009】ここで、後工程の仕掛り状態を意識しない
で後工程に対して半導体ウェーハを搬送すると、自工程
と後工程の処理能力の差または、処理時間の差によっ
て、後工程での処理能力がオーバしても、後工程に半導
体ウェーハが搬送され、必要以上の仕掛りを持つことに
なる。
Here, if a semiconductor wafer is transferred to a post-process without being aware of the in-process state of the post-process, the process in the post-process may be performed due to a difference in processing capacity between the self-process and the post-process or a difference in processing time. Even if the capacity is exceeded, semiconductor wafers will be transported in the subsequent process and more work in process will be required.

【0010】仕掛り数が増え続けると、この工程が半導
体ウェーハ生産ラインのネック工程となり、他の工程に
半導体ウェーハが搬送されないことになり、目標の生産
量を満たせない。(3)自工程に複数仕掛っている半導
体ウェーハの処理開始のタイミングにについても、人の
勘と経験によって定性的に行われている。
If the number of work in process continues to increase, this process becomes a neck process of the semiconductor wafer production line, and the semiconductor wafer is not transported to other processes, so that the target production amount cannot be satisfied. (3) Regarding the timing of starting the processing of a plurality of semiconductor wafers in its own process, it is qualitatively performed by human intuition and experience.

【0011】また、一人の作業者が半導体ウェーハ処理
後の後段取り、次工程への搬送、棚からの製造装置まで
の搬送および処理前の段取りなどを行っている。
Further, one worker carries out post-setup after semiconductor wafer processing, carrying to the next process, carrying from a shelf to a manufacturing apparatus, and pre-processing.

【0012】従って、図4の記号D4から記号D5のよ
うに半導体ウェーハ処理の間に空き時間が発生する。
Therefore, as indicated by the symbols D4 to D5 in FIG. 4, a vacant time is generated during the semiconductor wafer processing.

【0013】また、上記(2)の問題の対策として、各
工程に十分な仕掛り数を得るために必要生産数以上に半
導体ウェーハを生産ラインに投入し、製造装置の稼働率
を維持していた。
As a measure against the above problem (2), more semiconductor wafers are put on the production line than the required number of production in order to obtain a sufficient number of in-process in each process, and the operating rate of the manufacturing apparatus is maintained. It was

【0014】このため、半導体ウェーハ生産ラインの仕
掛り数が増加してしまい、半導体ウェーハの処理に時間
が掛り、半導体ウェーハが投入されてから入庫されるま
でのリードタイムが延びてしまう。
As a result, the number of work in process on the semiconductor wafer production line increases, the processing of the semiconductor wafers takes time, and the lead time from the loading of the semiconductor wafers to the loading of the semiconductor wafers increases.

【0015】本発明の目的は、半導体ウェーハ生産ライ
ンの無駄な仕掛りを削減し、半導体ウェーハ処理にかか
る搬送時間、段取り時間の短縮を行う仕組みを提供し、
生産効率を向上させ、かつ、リードタイムを短縮するこ
とにある。
An object of the present invention is to provide a mechanism for reducing wasteful work-in-process in a semiconductor wafer production line and shortening transportation time and setup time required for semiconductor wafer processing,
It is to improve production efficiency and shorten lead time.

【0016】[0016]

【課題を解決するための手段】本発明の半導体ウェーハ
の生産方法は、搬送時間、製品処理時間、段取り時間を
過去の実績から定量的にとらえ、後工程からの要求をト
リガすることによって半導体ウェーハ処理開始時に、そ
の製造装置で半導体ウェーハ処理が完了する時刻をコン
ピュータによって自動で予測し、予測した半導体ウェー
ハ処理完了時刻までに、次にその製造装置で処理する半
導体ウェーハについて製造装置までの搬送時間、前
(外)段取り時間および前処理に必要な時間を、予測し
た半導体ウェーハ処理終了時刻から逆算することによっ
て搬送開始時刻を求め、半導体ウェーハ処理中に搬送
し、かつ、次に処理する半導体ウェーハの搬送や段取を
終了させることにより、処理終了と同時に次の半導体ウ
ェーハの処理が開始できるようににする。
A method for producing a semiconductor wafer according to the present invention is designed to quantitatively capture a transfer time, a product processing time, and a setup time from past results, and trigger a request from a subsequent process. At the start of processing, the computer automatically predicts the time at which the semiconductor wafer processing will be completed in the manufacturing equipment, and by the predicted semiconductor wafer processing completion time, the transfer time of the semiconductor wafer to be processed next in the manufacturing equipment to the manufacturing equipment. , The front (outer) setup time and the time required for the pretreatment are calculated back from the predicted end time of the semiconductor wafer treatment to obtain the conveyance start time, and the semiconductor wafer is conveyed during the semiconductor wafer treatment and is processed next. By finishing the transfer and setup of the wafer, the next semiconductor wafer can be processed at the same time as the end of the processing. To so.

【0017】[0017]

【実施例】次に本発明について図面を参照して説明す
る。図1は本発明の一実施例として記号K1工程と記号
K2工程の2工程間で同期をとり半導体ウェーハの処理
を行う方法を説明するための工程説明図である。図1に
示すように、記号A1にて記号K2工程処理装置からの
処理開始トリガに、その半導体ウェーハの処理終了時刻
(記号A6)を予測する。この処理時間の算出は、過去
の処理に要した時間(実績値)を基にコンピュータが行
う。
The present invention will be described below with reference to the drawings. FIG. 1 is a process explanatory view for explaining a method of processing a semiconductor wafer by synchronizing two processes of a symbol K1 process and a symbol K2 process as one embodiment of the present invention. As shown in FIG. 1, the processing end time (symbol A6) of the semiconductor wafer is predicted by the processing start trigger from the processing apparatus K2 at the symbol A1. The calculation of the processing time is performed by the computer based on the time (actual value) required for the past processing.

【0018】次に記号K2工程の前処理である記号K1
工程で処理開始が通知された製造装置で処理可能な半導
体ウェーハを検索する。その後、記号K1工程で半導体
ウェーハを処理するために必要となる棚からの搬送時間
(記号A2)、処理前の段取り(記号A3)、処理時間
(記号A4)、記号K2工程までの搬送時間(記号A
4)、記号K2工程での処理前の外段取りに要する合計
時間を求める。
Next, the symbol K1 which is the pretreatment of the symbol K2 step
A semiconductor wafer that can be processed by the manufacturing apparatus notified of the start of processing in the process is searched. After that, a transfer time from the shelf (symbol A2) necessary for processing the semiconductor wafer in the step K1; a setup before the processing (symbol A3); a processing time (symbol A4); and a transfer time up to the step K2 ( Symbol A
4) Obtain the total time required for the external setup before the processing in step K2.

【0019】このときに使用した、搬送、処理前内段取
り、処理および処理前外段取りの個々の時間もまた、過
去の処理に要した時間(実績値)を基にコンピュータが
計算する。ここで、予測した処理終了時刻(記号A6)
から、求めた合計時間を引いた値を搬送開始時刻とす
る。この搬送開始時刻で搬送を開始することで記号K2
工程の処理中に、記号K2工程の前処理である記号K1
工程の処理、搬送、段取りを終了させ、記号K2工程の
処理終了時刻(記号A6)に次半導体ウェーハの処理が
開始できるようにすることで、記号K2工程に余分な仕
掛りを持たなくても半導体ウェーハ生産が行える。
The computer also calculates the individual times of the transportation, the pre-processing inner setup, the processing and the pre-processing outer setup used at this time based on the time (actual value) required for the past processing. Here, the predicted processing end time (symbol A6)
The value obtained by subtracting the calculated total time from is defined as the transport start time. By starting the transportation at this transportation start time, the symbol K2
During the process, the symbol K2, which is the pretreatment of the process K2, is performed.
Even if there is no extra work in the process K2, the process, transportation, and setup of the process can be completed and the process of the next semiconductor wafer can be started at the processing end time (process A6) of the process K2. Semiconductor wafer production is possible.

【0020】ここで、内段取りとは、製造装置を占有す
るため、内段取りと半導体ウェーハ処理は、同時に行え
ない段取りのことであり、また、外段取りとは、製造装
置を占有せずに行える、つまり、半導体ウェーハ処理と
同時に行える。
Here, the inner setup is a setup in which the manufacturing equipment is occupied, and therefore the inner setup and the semiconductor wafer processing cannot be performed at the same time, and the outer setup is performed without occupying the manufacturing equipment. That is, it can be performed simultaneously with semiconductor wafer processing.

【0021】図2は本発明の他の実施例として搬送時間
が予測終了より長い場合の半導体ウェーハの流れを説明
するための図である。なお、処理内容の説明を簡略化す
るため段取り時間は、省略し説明する。ロットL1の処
理開始(記号B1)をトリガにし、処理終了時間(記号
B2)を予測する。その際、次ロットL2を決定する
が、ロットL2をすぐに搬送開始(記号B3)してもロ
ットL1の処理終了時間(記号B2)に問い合わない場
合は、ロットL2をそのまま搬送し、ロットL2の処理
終了時間(記号B2)に間に合うようにロットL3を搬
送開始(記号B3)する。ロットL2の処理開始(記号
B2)をトリガにし、ロットL3の処理終了時間(記号
B3)を予測し、ロットL3の処理終了時間(記号B
2)に間に合うようにロットL4を搬送開始(記号B
3)する。その後、処理開始をトリガに、次々半導体ウ
ェーハの搬送を行い、処理終了時間と同時に次の半導体
ウェーハの処理が行える。
FIG. 2 is a diagram for explaining the flow of the semiconductor wafer when the transfer time is longer than the predicted end as another embodiment of the present invention. The setup time will be omitted in order to simplify the description of the processing contents. The processing end time (symbol B2) is predicted by using the processing start (symbol B1) of the lot L1 as a trigger. At this time, the next lot L2 is determined, but if the processing end time (symbol B2) of the lot L1 is not inquired even if the lot L2 is immediately conveyed (symbol B3), the lot L2 is conveyed as it is and the lot L2 is conveyed. The lot L3 is started to be conveyed (symbol B3) in time for the processing end time of L2 (symbol B2). The processing start time (symbol B2) of the lot L2 is used as a trigger to predict the processing end time (symbol B3) of the lot L3, and the processing end time (symbol B) of the lot L3 is predicted.
Transporting lot L4 in time for 2) (symbol B
3) Do. After that, the semiconductor wafers are transferred one after another triggered by the start of processing, and the next semiconductor wafer can be processed at the same time as the processing end time.

【0022】[0022]

【発明の効果】以上に説明したように、本発明によっ
て、以下の効果が得られる。(1)製造装置に適切に処
理されるロットが搬送されることによって製造装置の稼
働率を向上することができる。(2)半導体ウェーハ生
産ラインの特定工程に仕掛りが集中しないので、特定の
工程に半導体ウェーハが搬送されないということがなく
なり、各工程での必要処理数がこなせるため、目標の生
産量が満たせる。(3)製造装置における半導体ウェー
ハ処理の開始タイミングの適切化による、半導体ウェー
ハの待ち時間低減および仕掛り数の低減(本発明を全工
程に実施すれば、各工程の仕掛り数は、0にできる)に
よって、他の半導体ウェーハを処理することにより待た
される時間の短縮ができるため、半導体ウェーハの生産
リードタイム短縮ができる。
As described above, according to the present invention, the following effects can be obtained. (1) The operating rate of the manufacturing apparatus can be improved by transporting the lot that is appropriately processed to the manufacturing apparatus. (2) Since the work in process is not concentrated in a specific process of the semiconductor wafer production line, the semiconductor wafer is not conveyed to the specific process, and the required number of processes in each process can be performed, so that the target production amount can be satisfied. (3) Reducing the waiting time of semiconductor wafers and the number of work in process by optimizing the start timing of the semiconductor wafer processing in the manufacturing apparatus (If the present invention is carried out in all the processes, the number of work in process of each process is reduced to 0. By doing so, the waiting time for processing other semiconductor wafers can be shortened, so that the production lead time of semiconductor wafers can be shortened.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例で2つの工程間で実施した場
合の例を示す説明図である。
FIG. 1 is an explanatory diagram showing an example of a case of performing between two steps in an embodiment of the present invention.

【図2】本発明の他の実施例で搬送時間が予測終了処理
時間より長い場合における対処方法を示す説明図であ
る。
FIG. 2 is an explanatory diagram showing a coping method in the case where the transport time is longer than the predicted end processing time in another embodiment of the present invention.

【図3】従来の半導体ウェーハ生産ラインにおける各工
程のつながりを示す図である。
FIG. 3 is a diagram showing a connection between respective steps in a conventional semiconductor wafer production line.

【図4】従来の半導体ウェーハが加工工程を経て加工完
了するまでの流れを示す図である。
FIG. 4 is a diagram showing a flow of a conventional semiconductor wafer through a processing step and completion of processing.

【符号の説明】 A1 処理時間 A2 搬送時間 A3 処理前内段取り時間 A4 処理時間 A5 処理前外段取り時間 A6 処理終了 A7 製品の流れ A8 実績時間 A9 予測時間 K1〜K2 工程 B1 処理開始 B2 処理終了 B3 搬送開始 B4 搬送時間 B5 処理時間 B6 空き時間 L1〜L5 ロット C1〜C8 工程 in1 投入 out1 入庫 D1 搬送時間 D2 処理前段取り時間 D3 処理時間 D4 処理終了 D5 処理開始 D6 処理後段取り時間 D7 次工程への搬送時間 D8 空き時間 L6〜L7 半導体ウェーハ[Explanation of Codes] A1 processing time A2 transfer time A3 pre-processing internal setup time A4 processing time A5 pre-processing external setup time A6 processing end A7 product flow A8 actual time A9 estimated time K1 to K2 process B1 processing start B2 processing end B3 Transport start B4 Transport time B5 Processing time B6 Free time L1 to L5 Lots C1 to C8 Process in1 Input out1 Storage D1 Transport time D2 Processing pre-setup time D3 Processing time D4 Processing end D5 Processing start D6 Processing post-processing D7 To next process Transport time D8 Free time L6 to L7 Semiconductor wafer

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】複数の加工工程からなる半導体ウェーハ生
産ラインにおいて、半導体ウェーハ処理開始時に、現
在、その製造装置で半導体ウェーハ処理が完了する時刻
を、過去の処理に要した時間(実績値)を基に予測し、
予測した半導体ウェーハ処理完了時刻までに、次にその
製造装置で処理する半導体ウェーハを製造装置まで搬送
し、かつ、処理前後に必要な段取りを完了させ、半導体
ウェーハ処理が終了すると同時に次の半導体ウェーハの
処理を行うことによって半導体ウェーハ生産ラインにお
ける半導体ウェーハの流れを最適に行うことを特徴とす
る半導体ウェーハの生産方法。
1. In a semiconductor wafer production line comprising a plurality of processing steps, at the start of semiconductor wafer processing, the time at which the semiconductor wafer processing is completed at the present manufacturing apparatus is the time (actual value) required for the past processing. Predict based on
By the predicted semiconductor wafer processing completion time, the semiconductor wafer to be processed next by the manufacturing equipment is transported to the manufacturing equipment, and the necessary setup before and after the processing is completed, and at the same time as the semiconductor wafer processing is completed, the next semiconductor wafer is processed. The method for producing a semiconductor wafer, which is characterized in that the flow of the semiconductor wafer in the semiconductor wafer production line is optimized by performing the process of.
JP7592093A 1993-04-01 1993-04-01 Semiconductor wafer production method Expired - Fee Related JP2871994B2 (en)

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Application Number Priority Date Filing Date Title
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JPH06291006A true JPH06291006A (en) 1994-10-18
JP2871994B2 JP2871994B2 (en) 1999-03-17

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6351686B1 (en) 2000-01-04 2002-02-26 Mitsubishi Denki Kabushiki Kaisha Semiconductor device manufacturing apparatus and control method thereof
US7692764B2 (en) 2004-08-30 2010-04-06 Nikon Corporation Exposure apparatus, operation decision method, substrate processing system, maintenance management method, and device manufacturing method
CN102737141A (en) * 2011-03-30 2012-10-17 拉碧斯半导体株式会社 Processing support device, method and computer readable storage medium, and semiconductor fabrication support device and method
WO2019064876A1 (en) * 2017-09-28 2019-04-04 東京エレクトロン株式会社 Testing system and testing method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6351686B1 (en) 2000-01-04 2002-02-26 Mitsubishi Denki Kabushiki Kaisha Semiconductor device manufacturing apparatus and control method thereof
US7692764B2 (en) 2004-08-30 2010-04-06 Nikon Corporation Exposure apparatus, operation decision method, substrate processing system, maintenance management method, and device manufacturing method
CN102737141A (en) * 2011-03-30 2012-10-17 拉碧斯半导体株式会社 Processing support device, method and computer readable storage medium, and semiconductor fabrication support device and method
US8862441B2 (en) 2011-03-30 2014-10-14 Lapis Semiconductor Co., Ltd. Processing support device, method and computer readable storage medium, and semiconductor fabrication support device and method
WO2019064876A1 (en) * 2017-09-28 2019-04-04 東京エレクトロン株式会社 Testing system and testing method

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