JPH0628715Y2 - 電子エネルギー分布測定装置 - Google Patents
電子エネルギー分布測定装置Info
- Publication number
- JPH0628715Y2 JPH0628715Y2 JP5100888U JP5100888U JPH0628715Y2 JP H0628715 Y2 JPH0628715 Y2 JP H0628715Y2 JP 5100888 U JP5100888 U JP 5100888U JP 5100888 U JP5100888 U JP 5100888U JP H0628715 Y2 JPH0628715 Y2 JP H0628715Y2
- Authority
- JP
- Japan
- Prior art keywords
- target
- electrons
- energy distribution
- electron
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5100888U JPH0628715Y2 (ja) | 1988-04-15 | 1988-04-15 | 電子エネルギー分布測定装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5100888U JPH0628715Y2 (ja) | 1988-04-15 | 1988-04-15 | 電子エネルギー分布測定装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01154489U JPH01154489U (enrdf_load_html_response) | 1989-10-24 |
JPH0628715Y2 true JPH0628715Y2 (ja) | 1994-08-03 |
Family
ID=31277037
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5100888U Expired - Lifetime JPH0628715Y2 (ja) | 1988-04-15 | 1988-04-15 | 電子エネルギー分布測定装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0628715Y2 (enrdf_load_html_response) |
-
1988
- 1988-04-15 JP JP5100888U patent/JPH0628715Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH01154489U (enrdf_load_html_response) | 1989-10-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6020592A (en) | Dose monitor for plasma doping system | |
US4011449A (en) | Apparatus for measuring the beam current of charged particle beam | |
US6723998B2 (en) | Faraday system for ion implanters | |
JPH01220350A (ja) | 帯電抑制方法及びその装置を用いた粒子線照射装置 | |
JPH0724209B2 (ja) | イオン注入装置 | |
JPH0628715Y2 (ja) | 電子エネルギー分布測定装置 | |
JPH0361303B2 (enrdf_load_html_response) | ||
JP2756704B2 (ja) | イオンビーム照射装置における電荷中和装置 | |
JP3399230B2 (ja) | イオン照射装置 | |
JPH09167593A (ja) | イオン注入装置 | |
JPH0626107B2 (ja) | 荷電粒子照射装置 | |
JPH06267490A (ja) | 負イオン注入装置 | |
JP3843494B2 (ja) | 基板保持装置 | |
JP2663564B2 (ja) | イオンビーム照射装置 | |
JP2769375B2 (ja) | イオン注入装置 | |
JP3265988B2 (ja) | イオン照射装置 | |
JPH02216500A (ja) | 荷電粒子照射方法および荷電粒子照射装置 | |
JPH0782830B2 (ja) | 電荷中和装置 | |
JP3265987B2 (ja) | イオン照射装置 | |
JPH0518646U (ja) | 電子線照射装置 | |
JPH0654649B2 (ja) | イオン注入装置 | |
JPH0644007U (ja) | イオン注入装置 | |
JPH0613019A (ja) | イオン注入装置 | |
JPH0754918Y2 (ja) | エレクトロンシャワー装置 | |
JPH03261059A (ja) | イオン注入装置 |