JPH06281326A - Drying method for object to be washed - Google Patents
Drying method for object to be washedInfo
- Publication number
- JPH06281326A JPH06281326A JP7238793A JP7238793A JPH06281326A JP H06281326 A JPH06281326 A JP H06281326A JP 7238793 A JP7238793 A JP 7238793A JP 7238793 A JP7238793 A JP 7238793A JP H06281326 A JPH06281326 A JP H06281326A
- Authority
- JP
- Japan
- Prior art keywords
- motor
- drying
- drive control
- speed
- glass substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001035 drying Methods 0.000 title claims abstract description 42
- 238000000034 method Methods 0.000 claims abstract description 14
- 239000007788 liquid Substances 0.000 claims abstract description 13
- 238000005406 washing Methods 0.000 claims abstract description 7
- 230000001133 acceleration Effects 0.000 claims abstract description 3
- 238000004140 cleaning Methods 0.000 claims description 18
- 239000000758 substrate Substances 0.000 abstract description 36
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 32
- 239000011521 glass Substances 0.000 abstract description 26
- 239000004973 liquid crystal related substance Substances 0.000 abstract description 5
- 238000007796 conventional method Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 9
- 239000003595 mist Substances 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 229910021642 ultra pure water Inorganic materials 0.000 description 2
- 239000012498 ultrapure water Substances 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 1
- 239000011538 cleaning material Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000007730 finishing process Methods 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
- Drying Of Solid Materials (AREA)
- Centrifugal Separators (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、液晶表示デバイス（Ｌ
ＣＤ；Liquid Crystal Display）などの製造工程におい
て、純水などにより洗浄されたガラス基板などを乾燥さ
せるための方法に関するものである。The present invention relates to a liquid crystal display device (L
The present invention relates to a method for drying a glass substrate or the like that has been washed with pure water in a manufacturing process such as a CD (Liquid Crystal Display).
【０００２】[0002]
【従来の技術】ＬＣＤに用いられるガラス基板の表面に
汚れや塵が付着していると電極形成時に短絡が生じた
り、また、配向層にムラが発生するなどの理由から、Ｌ
ＣＤの製造過程においては、ＬＣＤのガラス基板を直
接、超純水などの純水で洗浄する工程あるいは界面活性
剤、無機酸、アルカリ溶液などで洗浄した後、純粋です
すぎ洗浄する洗浄工程が設けられている。2. Description of the Related Art If dirt or dust adheres to the surface of a glass substrate used for an LCD, a short circuit may occur at the time of forming an electrode, and an alignment layer may have unevenness.
In the CD manufacturing process, there is a cleaning process for directly cleaning the glass substrate of the LCD with pure water such as ultrapure water or for cleaning with a surfactant, an inorganic acid, an alkaline solution, and then rinsing with pure water. Has been.
【０００３】そして、この洗浄工程の後には、ガラス基
板を乾燥させるための乾燥工程が設けられている。この
乾燥工程においては、乾燥後、被洗浄基板に水シミが残
ると、液晶分子の配列乱れを誘発するなどの理由から、
一般に急速乾燥処理が行われている。After the cleaning step, a drying step for drying the glass substrate is provided. In this drying step, if water stains remain on the substrate to be cleaned after drying, the liquid crystal molecules may be disturbed in alignment, and so on.
Generally, a rapid drying process is performed.
【０００４】図５は、乾燥工程において用いられる乾燥
装置を示す簡略構成図で、同図（ａ）は一部を断面とし
た側面図、同図（ｂ）は平面図である。図５において、
１はモータ、１ａは下噴出ノズル、２は回転板、３は支
持碗、３ａは支持ピン、４は各支持碗３の先端に取り付
けられた横碗、４ａは挟持ピン、５は上噴出ノズル、Ｇ
Ｓは被乾燥対象物としてのガラス基板をそれぞれ示して
いる。FIG. 5 is a simplified configuration diagram showing a drying device used in a drying process. FIG. 5 (a) is a side view with a part in section, and FIG. 5 (b) is a plan view. In FIG.
1 is a motor, 1a is a lower ejection nozzle, 2 is a rotating plate, 3 is a support bowl, 3a is a support pin, 4 is a horizontal bowl attached to the tip of each support bowl 3, 4a is a pin for pinching, 5 is an upper ejection nozzle. , G
Each S represents a glass substrate as an object to be dried.
【０００５】この装置を用いてガラス基板ＧＳの表面を
乾燥させるには、純水で濡れたガラス基板ＧＳを回転板
２上に置き、ピン４ａにより基板の４辺を挟持するとと
もに、裏面を支持ピン３ａ上端に当接させる。この状態
で、モータ１が始動される。モータ１の始動と並行して
上下各噴出ノズル１ａ，５から乾燥用の気体、たとえば
窒素ガス（Ｎ2 ）が所定の圧力をもって噴出される。こ
れにより、ガラス基板ＧＳの表裏両面の中心にある純水
は周囲に飛散される。In order to dry the surface of the glass substrate GS using this apparatus, the glass substrate GS wet with pure water is placed on the rotating plate 2 and the four sides of the substrate are sandwiched by the pins 4a and the back surface is supported. Abut on the upper end of the pin 3a. In this state, the motor 1 is started. In parallel with the start of the motor 1, a drying gas, for example, nitrogen gas (N 2 ) is ejected from the upper and lower ejection nozzles 1a and 5 at a predetermined pressure. As a result, the pure water at the center of the front and back surfaces of the glass substrate GS is scattered around.
【０００６】また、図６に示すように、モータ１は始動
から所定時間を経過すると高速度、たとえば数千ｒｐｍ
で定速に回転される。これにより、回転板２に装着され
たガラス基板ＧＳは、高速で回転し、その表裏両面に付
着した純水は遠心力により速やかに周囲に飛散される。
この結果、回転中心に純水が残ることなく、基板両面を
確実かつ均一に乾燥させることができる。Further, as shown in FIG. 6, the motor 1 has a high speed, for example, several thousand rpm, after a lapse of a predetermined time from the start.
Is rotated at a constant speed. As a result, the glass substrate GS mounted on the rotary plate 2 rotates at a high speed, and the pure water attached to both the front and back surfaces of the glass substrate GS is quickly scattered around due to the centrifugal force.
As a result, the both surfaces of the substrate can be surely and uniformly dried without leaving pure water at the center of rotation.
【０００７】[0007]
【発明が解決しようとする課題】しかしながら、上述し
た乾燥装置では、乾燥工程の最初からモータ１を高速回
転させて基板表面の水膜を振り切っているため、このと
き飛散する、いわゆる水滴（ウォータミスト）ＷＭが、
図７に示すように、搬出ステージ側の乾燥済基板ＧＳ表
面に付着してしまい、乾燥した後のガラス基板ＧＳ表面
に水シミが残るという問題があった。この水シミは、上
述したように、液晶分子の配列乱れの誘発要因となり、
ひいては、製造歩留りの低下を招くなどのおそれがあ
る。However, in the above-mentioned drying device, since the motor 1 is rotated at high speed from the beginning of the drying process to shake off the water film on the substrate surface, so-called water drops (water mist) are scattered at this time. ) WM
As shown in FIG. 7, there is a problem that water stains adhere to the dried substrate GS surface on the carry-out stage side and remain on the dried glass substrate GS surface. As described above, this water stain causes the disorder of alignment of liquid crystal molecules,
As a result, the production yield may be reduced.
【０００８】本発明は、かかる事情に鑑みてなされたも
のであり、その目的は、洗浄後の洗浄物を確実に乾燥さ
せることができることはもとより、近傍に配置された乾
燥後の洗浄物への水滴の付着を防止できる乾燥方法を提
供することにある。The present invention has been made in view of the above circumstances, and an object of the present invention is not only to surely dry a cleaned product after cleaning, but also to a cleaned product disposed in the vicinity. It is to provide a drying method capable of preventing the adhesion of water droplets.
【０００９】[0009]
【課題を解決するための手段】上記目的を達成するた
め、本発明では、洗浄液により洗浄された洗浄物の乾燥
方法において、上記洗浄物を第１の速度で第１の時間だ
け回転させて、洗浄物上の洗浄液の大部分を除去した
後、少なくとも所定の加速工程を得た後、第２の速度で
第２の時間だけ回転させて洗浄物上の残りの洗浄液を除
去するようにした。In order to achieve the above object, in the present invention, in a method for drying a wash product washed with a wash solution, the wash product is rotated at a first speed for a first time, After removing most of the cleaning liquid on the cleaning product, after obtaining at least a predetermined acceleration step, the cleaning liquid was rotated at a second speed for a second time to remove the remaining cleaning liquid on the cleaning product.
【００１０】[0010]
【作用】本発明によれば、まず洗浄物は、第１の速度で
第１の時間だけ回転される。これにより、洗浄物上の大
部分の洗浄液は小さな遠心力にって飛散されて除去され
る。次に、洗浄物の回転速度は加速されて第２の速度ま
で上げられる。そして、洗浄物はこの第２の速度で第２
の時間だけ回転される。これにより、。洗浄物上に残っ
ていた洗浄液が大きな遠心力をもって飛散されて除去さ
れる。In accordance with the invention, the item to be cleaned is first rotated at a first speed for a first time. As a result, most of the cleaning liquid on the cleaning product is scattered and removed by a small centrifugal force. The spin rate of the wash is then accelerated to a second speed. Then, the washed product is secondized at this second speed.
It is rotated only for the time. With this ,. The cleaning liquid remaining on the cleaning material is scattered and removed with a large centrifugal force.
【００１１】[0011]
【実施例】図１は、本発明に係る乾燥方法を適用した基
板乾燥装置の一実施例を示す構成図であって、従来例を
示す図４と同一構成部分は同一符号をもって表す。すな
わち、１はモータ、１ａは下噴出ノズル、２は回転板、
３は支持碗、３ａは支持ピン、４ａは挟持ピン、５は上
噴出ノズル、ＧＳは被乾燥対象物としてのガラス基板、
１０はモータ駆動制御部をそれぞれ示している。1 is a block diagram showing an embodiment of a substrate drying apparatus to which a drying method according to the present invention is applied. The same components as those of the conventional example shown in FIG. 4 are designated by the same reference numerals. That is, 1 is a motor, 1a is a lower jet nozzle, 2 is a rotating plate,
3 is a support bowl, 3a is a support pin, 4a is a holding pin, 5 is an upper ejection nozzle, GS is a glass substrate as an object to be dried,
Reference numerals 10 respectively denote motor drive control units.
【００１２】モータ駆動制御部１０は、図示しない乾燥
制御系による乾燥開始信号ＳＴを受けると、たとえば図
２に示すように、駆動制御信号ＤＲ1 をモータ１の駆動
部に出力し、ｔ1 秒後にたとえば数百ｒｐｍの低速度回
転に移行させ、駆動制御信号ＤＲ1 出力から（ｔ1 ＋ｔ
2 ）秒経過後には、駆動制御信号ＤＲ2 をモータ１の駆
動部に出力し、ｔ3 秒後にたとえば数千ｒｐｍの高速度
回転に移行させ、さらに駆動制御信号ＤＲ2 出力から
（ｔ3 ＋ｔ4 ）秒経過後には駆動制御信号ＤＲ2の出力
を停止して、ｔ5 秒後にモータ１の回転を停止させるよ
うに、モータ１の回転制御を行う。なお、このモータ駆
動制御部１０の回転プログラムは、任意に変更可能であ
り、洗浄物であるガラス基板ＧＳの大きさや洗浄液の量
などに応じて回転速度および時間を設定可能である。[0012] The motor drive control unit 10 receives the drying start signal ST by unillustrated drying control system, for example as shown in FIG. 2, it outputs a drive control signal DR 1 to the drive unit of the motor 1, t 1 seconds later example is shifted to the low speed rotation of a few hundred rpm, the drive control signal DR 1 output (t 1 + t
2 ) seconds later, the drive control signal DR 2 is output to the drive section of the motor 1, and after t 3 seconds, the rotation is changed to high speed rotation of, for example, several thousand rpm, and further from the output of the drive control signal DR 2 to (t 3 + t 4 ) After the lapse of seconds, the output of the drive control signal DR 2 is stopped, and the rotation of the motor 1 is controlled so that the rotation of the motor 1 is stopped after t 5 seconds. The rotation program of the motor drive control unit 10 can be arbitrarily changed, and the rotation speed and the time can be set according to the size of the glass substrate GS as the cleaning object, the amount of the cleaning liquid, and the like.
【００１３】次に、上記構成による動作を説明する。こ
の装置を用いてガラス基板ＧＳの表面を乾燥させるに
は、界面活性剤などで洗浄後、超純水で洗浄したガラス
基板ＧＳを回転板２上に置き、ピン４ａにより基板の４
辺を挟持するとともに、裏面を支持ピン３ａ上端に当接
させる。Next, the operation of the above configuration will be described. In order to dry the surface of the glass substrate GS using this apparatus, the glass substrate GS washed with a surfactant or the like and then washed with ultrapure water is placed on the rotary plate 2 and the pin 4a
The side is sandwiched and the back surface is brought into contact with the upper end of the support pin 3a.
【００１４】この状態で、図示しない乾燥制御系からの
乾燥開始信号ＳＴがモータ駆動制御部１０に入力され
る。モータ駆動制御部１０では、乾燥開始信号ＳＴの入
力に伴い、駆動制御信号ＤＲ1 がモータ１の駆動部に出
力される。これにより、モータ１が始動され、モータ１
の回転速度はｔ1 秒後に数百ｒｐｍの低速度回転に移行
される。この低速度回転は粗乾燥工程としてｔ2 秒間行
われ、この間にガラス基板ＧＳ上に付着していた純水の
大部分は小さな遠心力により飛散されるが、一気に飛散
されず、また、細かな霧状の水滴となって搬送ステージ
まで飛散されることはほとんどない。また、モータ１の
始動と並行して上下各噴出ノズル１ａ，５から乾燥用の
気体、たとえば窒素ガス（Ｎ2 ）が所定の圧力をもって
噴出される。これにより、ガラス基板ＧＳの表裏両面の
中心にある純水は周囲に飛散される。In this state, a drying start signal ST from a drying control system (not shown) is input to the motor drive controller 10. In the motor drive control unit 10, the drive control signal DR 1 is output to the drive unit of the motor 1 in response to the input of the drying start signal ST. As a result, the motor 1 is started and the motor 1
The rotation speed of is shifted to a low speed rotation of several hundred rpm after t 1 seconds. This low speed rotation is performed for t 2 seconds as a rough drying step, and most of the pure water adhering to the glass substrate GS is scattered by a small centrifugal force during this time, but it is not scattered all at once and it is fine. Almost no mist-like water drops are scattered to the transfer stage. Further, in parallel with the start of the motor 1, a drying gas, for example, nitrogen gas (N 2 ) is ejected from the upper and lower ejection nozzles 1a and 5 at a predetermined pressure. As a result, the pure water at the center of the front and back surfaces of the glass substrate GS is scattered around.
【００１５】モータ駆動制御部１０では、駆動制御信号
ＤＲ1 出力から（ｔ1 ＋ｔ2 ）秒経過後には、駆動制御
信号ＤＲ2 がモータ１の駆動部に出力される。これによ
り、モータの回転が、ｔ3 秒後に数百ｒｐｍの低速回転
から数千ｒｐｍの高速度回転に移行される。すなわち、
粗乾燥工程から仕上げ乾燥工程に移行される。これによ
り、回転板２に装着されたガラス基板ＧＳは、高速で回
転し、その表裏両面に付着した純水は遠心力により速や
かに周囲に飛散される。このとき、飛散される純水の量
は、粗乾燥工程において大部分が振り切られていること
から、少なく、ガラス基板ＧＳ周辺から大気中へ飛出す
ミストは水蒸気となり消失するため飛散距離も小さい。
したがって、搬送ステージまで飛散されることはほとん
どない。In the motor drive control unit 10, after (t 1 + t 2 ) seconds have elapsed from the output of the drive control signal DR 1 , the drive control signal DR 2 is output to the drive unit of the motor 1. As a result, the rotation of the motor is changed from low speed rotation of several hundred rpm to high speed rotation of several thousand rpm after t 3 seconds. That is,
The rough drying process is transferred to the finish drying process. As a result, the glass substrate GS mounted on the rotary plate 2 rotates at a high speed, and the pure water attached to both the front and back surfaces of the glass substrate GS is quickly scattered around due to the centrifugal force. At this time, the amount of the pure water to be scattered is small because most of the pure water has been shaken off in the rough drying step, and the mist flying from the periphery of the glass substrate GS into the atmosphere disappears as water vapor, and the scattering distance is small.
Therefore, it is rarely scattered to the transfer stage.
【００１６】モータ駆動制御部１０では、仕上げ乾燥工
程を所定時間（ｔ4 秒間）行わせた後、駆動制御信号Ｄ
Ｒ2 のモータ１の駆動部への出力が停止される。これに
より、モータ１の回転が停止されて、乾燥処理が終了す
る。In the motor drive control unit 10, after the finishing drying process is performed for a predetermined time (t 4 seconds), the drive control signal D
The output of R 2 to the drive unit of the motor 1 is stopped. As a result, the rotation of the motor 1 is stopped and the drying process ends.
【００１７】この結果、回転中心に純水が残ることな
く、基板両面を確実かつ均一に乾燥させることができる
ことはもとより、近傍に配置された乾燥後の基板への水
滴の付着が防止される。As a result, both surfaces of the substrate can be surely and uniformly dried without leaving pure water at the center of rotation, and also water droplets are prevented from adhering to the dried substrate arranged in the vicinity.
【００１８】図３は、本実施例のように粗乾燥工程と仕
上げ工程との２段階の工程によりガラス基板ＧＳの乾燥
を行う方法と、従来のように高速回転による工程のみを
用いてガラス基板ＧＳの乾燥を行う方法とを適用して乾
燥処理実験を行った際の、搬送ステージにおけるいわゆ
るウォータミストをパーティクルカウンタで測定した結
果を示す図である。図３の（Ａ）が本発明方法による実
験結果を示し、（Ｂ）および（Ｃ）が第１および第２の
従来方法による実験結果を示している。FIG. 3 shows a method of drying a glass substrate GS by a two-step process including a rough drying process and a finishing process as in this embodiment, and a glass substrate using only a conventional high speed rotation process. It is a figure which shows the result which measured what is called water mist in a conveyance stage at the time of performing a drying process experiment by applying the method of drying GS with a particle counter. FIG. 3A shows the experimental results by the method of the present invention, and FIGS. 3B and 3C show the experimental results by the first and second conventional methods.
【００１９】図４は、この実験に際してのモータ１の回
転プログラムを示している。同図（Ａ）が本発明方法、
（Ｂ）が第１の従来方法、（Ｃ）が第２の従来方法の回
転プログラムを示している。第１の従来方法と第２の従
来方法との相違は、高速度回転による時間がｔ7 秒とｔ
10秒とに設定されていることである。FIG. 4 shows a rotation program of the motor 1 in this experiment. The figure (A) is the method of the present invention,
(B) shows the rotation program of the first conventional method, and (C) shows the rotation program of the second conventional method. The difference between the first conventional method and the second conventional method is that the time required for high-speed rotation is t 7 seconds and t
It is set to 10 seconds.
【００２０】図３からわかるように、本発明方法によれ
ば、搬送ステージへのウォータミストの飛散を確実に防
止できる。As can be seen from FIG. 3, according to the method of the present invention, it is possible to reliably prevent the dispersion of water mist on the carrying stage.
【００２１】以上説明したように、本実施例によれば、
洗浄物であるガラス基板ＧＳを数百ｒｐｍという低速度
で所定時間回転させて洗浄液である純水の大部分を除去
させた後、モータ１を加速させて数千ｒｐｍの高速度回
転に移行させ、所定時間の高速度回転により残りの純水
を除去するようにしたので、洗浄後のガラス基板を確実
に乾燥させることができることはもとより、搬送ステー
ジへのウォータミストの飛散を確実に防止でき、近傍に
配置された乾燥後の基板への水滴の付着を防止できる乾
燥装置を実現できる。As described above, according to this embodiment,
The glass substrate GS, which is the cleaned product, is rotated at a low speed of several hundred rpm for a predetermined time to remove most of the pure water, which is the cleaning liquid, and then the motor 1 is accelerated to shift to high speed rotation of several thousand rpm. Since the remaining pure water is removed by high-speed rotation for a predetermined time, it is possible to surely dry the glass substrate after cleaning, and it is possible to reliably prevent the dispersion of water mist on the transfer stage. It is possible to realize a drying device that can prevent water droplets from adhering to a substrate that has been dried and that is disposed in the vicinity.
【００２２】[0022]
【発明の効果】以上説明したように、本発明によれば、
洗浄後の洗浄物を確実に乾燥させることができることは
もとより、近傍に配置された乾燥後の洗浄物への水滴の
付着を防止できる。As described above, according to the present invention,
It is possible to surely dry the washed object after washing, and also it is possible to prevent water droplets from adhering to the dried object placed in the vicinity.
【図１】本発明に係る乾燥方法を適用した基板乾燥装置
の一実施例を示す構成図である。FIG. 1 is a configuration diagram showing an embodiment of a substrate drying apparatus to which a drying method according to the present invention is applied.
【図２】本発明に係るモータ駆動制御部の回転プログラ
ム例を示す図である。FIG. 2 is a diagram showing an example of a rotation program of a motor drive control unit according to the present invention.
【図３】本発明方法と、従来方法適用して乾燥処理実験
を行った際の、搬送ステージにおけるいわゆるウォータ
ミストをパーティクルカウンタで測定した結果を示す図
である。FIG. 3 is a diagram showing a result of measuring a so-called water mist on a transfer stage with a particle counter when a drying treatment experiment is performed by applying the method of the present invention and the conventional method.
【図４】実験に際して採用したモータ回転プログラムを
示す図である。FIG. 4 is a diagram showing a motor rotation program adopted in the experiment.
【図５】従来方法を適用した乾燥装置を示す簡略構成図
で、同図（ａ）は一部を断面とした側面図、同図（ｂ）
は平面図である。5A and 5B are simplified configuration diagrams showing a drying apparatus to which a conventional method is applied, in which FIG. 5A is a side view with a part in section, and FIG.
Is a plan view.
【図６】従来方法におけるモータ回転プログラム例を示
す図である。FIG. 6 is a diagram showing an example of a motor rotation program in a conventional method.
【図７】従来方法の課題を説明するための図である。FIG. 7 is a diagram for explaining the problems of the conventional method.
１…モータ １ａ…下噴出ノズル ２…回転板 ３…支持碗 ３ａ…支持ピン ４…各支持碗３の先端に取り付けられた横碗 ４ａ…挟持ピン ５…上噴出ノズル １０…モータ駆動制御部 ＧＳ…ガラス基板 DESCRIPTION OF SYMBOLS 1 ... Motor 1a ... Lower ejection nozzle 2 ... Rotating plate 3 ... Support bowl 3a ... Support pin 4 ... Side bowl attached to the tip of each support bowl 3 ... Clamping pin 5 ... Upper ejection nozzle 10 ... Motor drive control part GS ... Glass substrate
Claims (1)
法であって、 上記洗浄物を第１の速度で第１の時間だけ回転させて、
洗浄物上の洗浄液の大部分を除去した後、 少なくとも所定の加速工程を得た後、第２の速度で第２
の時間だけ回転させて洗浄物上の残りの洗浄液を除去す
ることを特徴とする洗浄物の乾燥方法。1. A method for drying a wash product washed with a wash solution, comprising rotating the wash product at a first speed for a first time,
After removing most of the cleaning liquid on the object to be cleaned, at least after obtaining a predetermined acceleration step, a second speed is applied at a second speed.
The method for drying a washed product, which comprises rotating the washing liquid for a period of time to remove the remaining washing liquid on the washed product.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7238793A JPH06281326A (en) | 1993-03-30 | 1993-03-30 | Drying method for object to be washed |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7238793A JPH06281326A (en) | 1993-03-30 | 1993-03-30 | Drying method for object to be washed |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06281326A true JPH06281326A (en) | 1994-10-07 |
Family
ID=13487826
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7238793A Pending JPH06281326A (en) | 1993-03-30 | 1993-03-30 | Drying method for object to be washed |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06281326A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6051223A (en) * | 1989-09-21 | 2000-04-18 | Mitsui Toatsu Chemicals Incorporated | Method of improving solubility of tissue plasminogen activator |
-
1993
- 1993-03-30 JP JP7238793A patent/JPH06281326A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6051223A (en) * | 1989-09-21 | 2000-04-18 | Mitsui Toatsu Chemicals Incorporated | Method of improving solubility of tissue plasminogen activator |
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