JPH06275702A - Substrate conveyor - Google Patents
Substrate conveyorInfo
- Publication number
- JPH06275702A JPH06275702A JP8564093A JP8564093A JPH06275702A JP H06275702 A JPH06275702 A JP H06275702A JP 8564093 A JP8564093 A JP 8564093A JP 8564093 A JP8564093 A JP 8564093A JP H06275702 A JPH06275702 A JP H06275702A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- particle collector
- processing chamber
- holder
- fine particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Cleaning In General (AREA)
- Manipulator (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、被処理物となる基板を
搬送する際に用いられる基板搬送装置に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate transfer device used to transfer a substrate to be processed.
【０００２】[0002]
【従来の技術】従来の基板搬送装置の中には、半導体プ
ロセスのマルチチャンバーシステムなどで見られるよう
に、基板に所定の処理（例えば成膜処理や洗浄処理）を
施すための処理室に基板（ウエハ）を供給したり、反対
に処理室から基板を取り出したりする動作機能を備えた
ものがある。2. Description of the Related Art In a conventional substrate transfer apparatus, a substrate is placed in a processing chamber for performing a predetermined process (for example, a film forming process or a cleaning process) on the substrate as seen in a multi-chamber system of a semiconductor process. Some have an operation function of supplying (wafer) and conversely taking out a substrate from the processing chamber.
【０００３】[0003]
【発明が解決しようとする課題】しかしながら従来の基
板搬送装置では、例えば上述した半導体プロセスのマル
チチャンバーシステムの場合、システム装置全体のクリ
ーン度を高める手段は講じられているが、最も重要であ
る基板の保持部やこれに保持される基板表面の塵埃を局
部的に除去する手段が講じられていないため、装置の摺
動部分などから発生した塵埃（微粒子）が基板保持部や
基板表面に付着した状態で基板の搬送が行われるという
問題があった。However, in the conventional substrate transfer apparatus, for example, in the case of the multi-chamber system of the semiconductor process described above, a means for improving the cleanliness of the entire system apparatus is taken, but the most important one is the substrate. Since there is no means to locally remove the dust on the substrate holding part and the substrate holding it, dust (fine particles) generated from the sliding parts of the device adhered to the substrate holding part and the substrate surface. There is a problem that the substrate is conveyed in this state.
【０００４】本発明は、上記問題を解決するためになさ
れたもので、被処理物となる基板を常にクリーンな状態
で搬送することができる基板搬送装置を提供することを
目的とする。The present invention has been made to solve the above problems, and an object of the present invention is to provide a substrate transfer apparatus which can always transfer a substrate to be processed in a clean state.
【０００５】[0005]
【課題を解決するための手段】本発明は、上記目的を達
成するためになされたもので、基板を保持するための基
板保持部と、その基板に所定の処理を施すための処理室
に対して基板保持部を進退可能に支持する可動アームと
を備えた基板搬送装置において、基板保持部の搬送経路
上に、集塵面を有する微粒子コレクターを近接配置した
ものである。そして具体的な実施態様としては、微粒子
コレクターを基板保持部の移動起点に配置したものであ
る。また、微粒子コレクターを処理室の基板出入口に配
置したものである。SUMMARY OF THE INVENTION The present invention has been made to achieve the above-mentioned object, and provides a substrate holding portion for holding a substrate and a processing chamber for performing a predetermined processing on the substrate. In a substrate transfer device having a movable arm that supports a substrate holding unit so as to be able to move forward and backward, a particle collector having a dust collecting surface is arranged in proximity to the transfer path of the substrate holding unit. In a specific embodiment, the fine particle collector is arranged at the starting point of movement of the substrate holder. Further, a fine particle collector is arranged at the substrate entrance / exit of the processing chamber.
【０００６】[0006]
【作用】本発明の基板搬送装置においては、基板保持部
の搬送経路上に近接して微粒子コレクターが配置されて
いるので、そこを通過する度に基板保持部やこれに保持
される基板表面の微粒子が微粒子コレクターの集塵面で
吸着される。In the substrate transfer apparatus of the present invention, since the fine particle collector is arranged close to the transfer path of the substrate holding unit, the substrate holding unit and the surface of the substrate held by the particle holding unit are moved every time the particle collector passes therethrough. Fine particles are adsorbed on the dust collecting surface of the fine particle collector.
【０００７】[0007]
【実施例】以下、本発明の実施例について図面を参照し
ながら詳細に説明する。図１は、本発明に係わる基板搬
送装置の第１実施例を説明する図であり、図中（ａ）は
装置全体の斜視図、（ｂ）は側面から見た模式図であ
る。図示した基板搬送装置１０の構成において、１１は
装置本体であり、この装置本体１１の内部には、例えば
駆動モータや歯車機構からなる駆動装置が内蔵されてい
る。また、装置本体１１の上部には可動アーム１２が取
り付けられており、この可動アーム１２の一端は互いに
支軸１３によって連結され、上記駆動装置を駆動源とし
てリンク運動するようになっている。Embodiments of the present invention will now be described in detail with reference to the drawings. 1A and 1B are views for explaining a first embodiment of a substrate transfer apparatus according to the present invention, in which FIG. 1A is a perspective view of the entire apparatus, and FIG. 1B is a schematic view seen from a side. In the configuration of the substrate transfer apparatus 10 shown in the figure, 11 is a main body of the apparatus, and inside the main body 11 of the apparatus, a drive unit including, for example, a drive motor and a gear mechanism is incorporated. Further, a movable arm 12 is attached to the upper part of the apparatus main body 11, and one ends of the movable arm 12 are connected to each other by a support shaft 13 so as to perform a link motion using the drive device as a drive source.
【０００８】さらに、可動アーム１２の先端部分には基
板保持部１４が設けられており、この基板保持部１４に
被処理物となる基板１５が保持されるようになってい
る。また、こうした構成の中で可動アーム１２は、基板
１５に所定の処理（例えば成膜処理や洗浄処理）を施す
ための処理室（不図示）に対して基板保持部１４を進退
可能に支持している。すなわち、図示せぬ駆動装置の駆
動により可動アーム１２をリンク運動させると、その可
動アーム１２の先端部分に取り付けられた基板保持部１
４は図中矢印で示す搬送経路Ｘ上を移動して、図示せぬ
処理室に対して進出したり後退したりするようになって
いる。Further, a substrate holding portion 14 is provided at the tip of the movable arm 12, and a substrate 15 which is an object to be processed is held by the substrate holding portion 14. Further, in such a configuration, the movable arm 12 supports the substrate holding unit 14 so as to be able to move forward and backward with respect to a processing chamber (not shown) for performing a predetermined process (for example, film forming process or cleaning process) on the substrate 15. ing. That is, when the movable arm 12 is caused to perform the link movement by the driving of the driving device (not shown), the substrate holding portion 1 attached to the tip end portion of the movable arm 12
Reference numeral 4 is adapted to move on a transfer path X indicated by an arrow in the figure and to move in and out of a processing chamber (not shown).
【０００９】加えて、本第１実施例の基板搬送装置１０
においては、基板保持部１４の搬送経路Ｘ上に微粒子コ
レクター１６が近接配置されている。さらに詳述する
と、本第１実施例では、可動アーム１２のリンク運動に
よって基板保持部１４が移動起点Ｐをホームポジション
として処理室（不図示）に対し進退動作するようになっ
ており、上記微粒子コレクター１６はその移動起点Ｐに
配置されている。In addition, the substrate transfer device 10 of the first embodiment.
In FIG. 3, the particle collector 16 is disposed in the vicinity of the transport path X of the substrate holding unit 14. More specifically, in the first embodiment, the substrate holding portion 14 moves forward and backward with respect to the processing chamber (not shown) with the movement starting point P as the home position due to the link movement of the movable arm 12. The collector 16 is arranged at the movement starting point P.
【００１０】ここで、微粒子コレクター１６の構造につ
いて説明すると、これは大きくは装置本体１１の上面に
固定された支持アーム１７と、この支持アーム１７の先
端に一体形成された幅広部１８とから構成されている。
そして図１（ｂ）に示すように、幅広部１８の下面側に
は、上下一対の絶縁膜１９で薄板状の電極２０をサンド
イッチ状に挟み込むことにより集塵面２１が形成されて
いる。さらに、絶縁膜１９の間に配置された電極２０に
は電源ライン２２が接続されており、この電源ライン２
２を通して電極２０に所定の電圧を印加することで集塵
面２１に静電吸着力が発生するようになっている。The structure of the fine particle collector 16 will now be described. It is roughly composed of a support arm 17 fixed to the upper surface of the apparatus main body 11 and a wide portion 18 integrally formed at the tip of the support arm 17. Has been done.
Then, as shown in FIG. 1B, a dust collecting surface 21 is formed on the lower surface side of the wide portion 18 by sandwiching the thin plate-shaped electrodes 20 between the pair of upper and lower insulating films 19 in a sandwich shape. Further, a power supply line 22 is connected to the electrode 20 arranged between the insulating films 19, and the power supply line 2
An electrostatic attraction force is generated on the dust collecting surface 21 by applying a predetermined voltage to the electrode 20 through 2.
【００１１】続いて、本第１実施例の基板搬送装置１０
の動作の一例を説明する。先ず、未処理の基板１５を処
理室（不図示）に供給する場合は、可動アーム１２を収
縮方向にリンク運動させて、基板保持部１４を移動起点
Ｐつまり微粒子コレクター１６の真下に配置し、この状
態で基板保持部１４に付着している微粒子（塵埃）を集
塵面２１に静電吸着させる。Subsequently, the substrate transfer device 10 of the first embodiment.
An example of the operation will be described. First, when the unprocessed substrate 15 is supplied to the processing chamber (not shown), the movable arm 12 is caused to perform a link movement in the contraction direction, and the substrate holding portion 14 is arranged at the movement starting point P, that is, directly below the particle collector 16. In this state, the fine particles (dust) adhering to the substrate holding portion 14 are electrostatically adsorbed to the dust collecting surface 21.
【００１２】次に、可動アーム１２を伸張方向にリンク
運動させて、図示せぬ基板搬送ケースの中から基板１５
を取り出し、これを基板保持部１４で保持する。そし
て、一旦可動アーム１２を収縮方向にリンク運動させて
基板保持部１４を移動起点Ｐに配置し、この状態で基板
１５の表面に付着している微粒子（塵埃）を集塵面２１
に静電吸着させる。Next, the movable arm 12 is caused to perform a link motion in the extension direction, and the substrate 15 is moved from the substrate transfer case (not shown).
Is taken out and held by the substrate holding unit 14. Then, the movable arm 12 is once made to perform a link movement in the contracting direction to dispose the substrate holding portion 14 at the movement starting point P, and in this state, the fine particles (dust) adhering to the surface of the substrate 15 are collected on the dust collecting surface 21.
Electrostatically adsorb to.
【００１３】続いて、装置本体１１の回転角を可変して
基板保持部１４の搬送経路Ｘの向きを規定の方向に設定
し、さらに可動アーム１２を伸張方向にリンク運動させ
て図示せぬ処理室に対し基板保持部１４を進出させると
ともに、そこに設けられた基板出入口を通して基板１５
を処理室に供給する。Subsequently, the rotation angle of the apparatus main body 11 is changed to set the direction of the transfer path X of the substrate holding portion 14 in a predetermined direction, and the movable arm 12 is further linked to move in the extension direction, which is not shown. The substrate holding portion 14 is advanced into the chamber, and the substrate 15 is passed through the substrate inlet / outlet provided therein.
Is supplied to the processing chamber.
【００１４】一方、処理済の基板１５を処理室から取り
出す場合は、微粒子コレクター１６の真下に待機させた
基板保持部１４を可動アーム１２のリンク運動により処
理室に向けて進出させる。そして、処理室の基板出入口
を通して処理済の基板１５を取り出し、その後一旦、基
板保持部１４を微粒子コレクター１６の真下に配置し
て、基板１５表面の微粒子を集塵面２１で静電吸着して
から、装置本体１１の回転角を可変して、基板保持部１
４に保持された基板１５を図示せぬ基板搬送ケースに収
納する。On the other hand, when the processed substrate 15 is taken out from the processing chamber, the substrate holding portion 14 which stands by immediately below the particle collector 16 is advanced toward the processing chamber by the link motion of the movable arm 12. Then, the processed substrate 15 is taken out through the substrate inlet / outlet of the processing chamber, and then the substrate holding unit 14 is once arranged directly below the particle collector 16 to electrostatically adsorb the particles on the surface of the substrate 15 by the dust collecting surface 21. From the above, the rotation angle of the apparatus main body 11 is changed to
Substrate 15 held by No. 4 is stored in a substrate carrying case (not shown).
【００１５】このように本第１実施例の基板搬送装置１
０においては、基板保持部１４の搬送経路Ｘ上に近接し
て微粒子コレクター１６が配置されているので、この微
粒子コレクター１６の真下に基板保持部１４を配置し
て、基板保持部１４やこれに保持される基板１５表面の
微粒子を集塵面２１で静電吸着させることにより、被処
理物となる基板１５を常にクリーンな状態で搬送するこ
とが可能となる。As described above, the substrate transfer apparatus 1 according to the first embodiment.
In 0, since the particle collector 16 is arranged in the vicinity of the transfer path X of the substrate holder 14, the substrate holder 14 is arranged immediately below the particle collector 16, and the substrate holder 14 and By electrostatically adsorbing the fine particles on the surface of the substrate 15 held by the dust collecting surface 21, the substrate 15 to be processed can be always conveyed in a clean state.
【００１６】また、本第１実施例の基板搬送装置１０で
は、装置本体１１に内蔵された駆動装置（不図示）の駆
動力伝達機能により基板保持部１４を上下方向に移動可
能とするか、或いは図示はしないが微粒子コレクター１
６に上下駆動機構を設けることにより、微粒子コレクタ
ー１６への印加電圧による基板１５のダメージや、集塵
対象となる微粒子の大きさに対応した集塵効率を考慮し
て、微粒子コレクター１６と基板保持部１４の離間距離
を最適寸法に設定することが可能となる。In the substrate transfer apparatus 10 of the first embodiment, the substrate holding section 14 can be moved in the vertical direction by the driving force transmission function of the drive unit (not shown) built in the apparatus body 11. Alternatively, although not shown, the particulate collector 1
6 is provided with an up-and-down driving mechanism, the particle collector 16 and the substrate are held in consideration of damage to the substrate 15 due to the voltage applied to the particle collector 16 and dust collection efficiency corresponding to the size of the particles to be collected. It is possible to set the separation distance of the portions 14 to the optimum size.
【００１７】続いて、本発明の第２実施例について説明
する。図２は、本発明に係わる基板搬送装置の第２実施
例を説明する図であり、図中（ａ）は装置全体の斜視
図、（ｂ）は側面から見た模式図である。図示した基板
搬送装置３０の構成において、３１は装置本体、３２は
可動アーム、３３は基板保持部であり、これらの基本的
な構成については上記第１実施例の場合とほとんど同様
であるため説明を省略する。Next, a second embodiment of the present invention will be described. 2A and 2B are views for explaining a second embodiment of the substrate transfer apparatus according to the present invention, in which FIG. 2A is a perspective view of the entire apparatus, and FIG. 2B is a schematic view seen from the side. In the configuration of the substrate transfer device 30 shown in the figure, 31 is an apparatus main body, 32 is a movable arm, and 33 is a substrate holding portion. The basic configurations of these are almost the same as in the case of the above-described first embodiment, and therefore description will be made. Is omitted.
【００１８】また、本第２実施例においても上記第１実
施例と同様に基板保持部３３の移動経路Ｘ上に微粒子コ
レクター３４が近接配置されているが、本例では被処理
物となる基板３５に所定の処理を施すための処理室３６
の基板出入口３７に微粒子コレクター３４が配置されて
いる。すなわち、処理室３６の入口部分には仕切機能を
備えたゲートバルブ３８が取り付けられており、このゲ
ートバルブ３８に連結したかたちで微粒子コレクター３
４が設けられている。Also in the second embodiment, as in the first embodiment, the fine particle collector 34 is disposed in the vicinity of the moving path X of the substrate holding portion 33, but in this embodiment, the substrate to be processed is the substrate. Processing chamber 36 for performing predetermined processing on 35
The fine particle collector 34 is disposed at the substrate inlet / outlet 37 of the. That is, a gate valve 38 having a partitioning function is attached to the entrance of the processing chamber 36, and the particulate collector 3 is connected to the gate valve 38.
4 are provided.
【００１９】ここで第２実施例における微粒子コレクタ
ー３４の構造について説明すると、これは全体的には四
角い筒型をなしており、その内壁上面には図２（ｂ）に
示すように、上下一対の絶縁膜３９で薄板状の電極４０
をサンドイッチ状に挟み込むことで集塵面４１が形成さ
れている。さらに、絶縁膜３９の間に配置された電極４
０には電源ライン４２が接続されており、この電源ライ
ン４２を通して電極４０に所定の電圧を印加することで
集塵面４１に静電吸着力が発生するようになっている。The structure of the fine particle collector 34 in the second embodiment will now be described. It has a rectangular cylindrical shape as a whole, and the upper surface of its inner wall has a pair of upper and lower parts as shown in FIG. 2 (b). Insulating film 39 of thin plate electrode 40
Is sandwiched to form a dust collecting surface 41. Further, the electrodes 4 arranged between the insulating films 39
A power supply line 42 is connected to 0, and an electrostatic attraction force is generated on the dust collecting surface 41 by applying a predetermined voltage to the electrode 40 through the power supply line 42.
【００２０】上記構成からなる本第２実施例の基板搬送
装置３０においては、未処理の基板３５を処理室３６に
供給する場合や、反対に処理済の基板３５を処理室３６
から取り出す場合、図２（ｂ）に示すように可動アーム
３２の先端部分に取り付けられた基板保持部３３が、基
板出入口３７に配置された微粒子コレクター３４の中を
必ず通過するようになる。したがって、基板保持部３３
が微粒子コレクター３４の中を通過する度に基板保持部
３３やこれに保持される基板３５表面の微粒子（塵埃）
は微粒子コレクター３４の集塵面４１に静電吸着される
ことになり、これによって被処理物となる基板３５を常
にクリーンな状態で搬送することが可能となる。In the substrate transfer apparatus 30 of the second embodiment having the above-mentioned configuration, the case where the unprocessed substrate 35 is supplied to the processing chamber 36, or conversely, the processed substrate 35 is processed.
2B, the substrate holder 33 attached to the tip of the movable arm 32 always passes through the particle collector 34 arranged at the substrate inlet / outlet 37 as shown in FIG. 2B. Therefore, the substrate holder 33
Each time the particles pass through the particle collector 34, the particles (dust) on the surface of the substrate holder 33 and the substrate 35 held by the substrate holder 33.
Is electrostatically adsorbed on the dust collecting surface 41 of the fine particle collector 34, which allows the substrate 35 to be processed to be always conveyed in a clean state.
【００２１】図３は上記第２実施例の他の態様を示す要
部斜視図であり、この場合は処理室３６の入口部分に取
り付けられたゲートバルブ３８に微粒子コレクター３４
が組み込まれている。すなわち、ゲートバルブ３８の開
孔部、つまり基板出入口４３の上面には、微粒子コレク
ター３４を構成する上下一対の絶縁膜３９とこれに挟み
込まれた薄板状の電極４０とが設けられ、これにより集
塵面４１が形成されている。FIG. 3 is a perspective view of an essential part showing another aspect of the second embodiment. In this case, the gate valve 38 attached to the inlet portion of the processing chamber 36 is attached to the fine particle collector 34.
Is built in. That is, the opening portion of the gate valve 38, that is, the upper surface of the substrate inlet / outlet 43 is provided with a pair of upper and lower insulating films 39 forming the particle collector 34 and the thin plate-shaped electrode 40 sandwiched between the insulating films 39. A dust surface 41 is formed.
【００２２】この場合も上記同様に基板保持部３３が微
粒子コレクター３４の下を通過する度に基板保持部３３
やこれに保持される基板３５表面の微粒子（塵埃）は微
粒子コレクター３４の集塵面４１に静電吸着されること
になり、これによって被処理物となる基板３５を常にク
リーンな状態で搬送することが可能となる。Also in this case, each time the substrate holding portion 33 passes under the particle collector 34, the substrate holding portion 33 is also provided.
Fine particles (dust) on the surface of the substrate 35 held by the electrostatic chuck are electrostatically adsorbed to the dust collecting surface 41 of the fine particle collector 34, whereby the substrate 35 to be processed is always conveyed in a clean state. It becomes possible.
【００２３】なお、本第２実施例においても、装置本体
３１に内蔵された駆動装置（不図示）の駆動力伝達機能
により基板保持部３３を上下方向に移動可能とすること
により、上記第１実施例の場合と同様に微粒子コレクタ
ー３４と基板保持部３３の離間距離を最適寸法に設定す
ることが可能となる。In the second embodiment as well, the substrate holding portion 33 can be moved in the vertical direction by the driving force transmission function of the driving device (not shown) built in the apparatus main body 31, so that the above-mentioned first embodiment can be performed. As in the case of the embodiment, the separation distance between the particle collector 34 and the substrate holding portion 33 can be set to the optimum size.
【００２４】[0024]
【発明の効果】以上、説明したように本発明によれば、
基板保持部の搬送経路上に近接して微粒子コレクターが
配置されているので、そこを通過する度に基板保持部や
これに保持される基板表面の微粒子が集塵面によって吸
着されるようになる。その結果、常にクリーンな状態で
基板を搬送することが可能となり、これによって微粒子
の付着に伴う基板処理不良の発生が低減されて、基板処
理プロセスにおける歩留りの向上が図られる。As described above, according to the present invention,
Since the particle collector is arranged in the vicinity of the transfer path of the substrate holder, the particle on the substrate holder or the substrate surface held by the particle collector is adsorbed by the dust collecting surface every time it passes therethrough. . As a result, it becomes possible to always transport the substrate in a clean state, which reduces the occurrence of substrate processing defects due to the adhesion of fine particles and improves the yield in the substrate processing process.
【図１】本発明に係わる基板搬送装置の第１実施例を説
明する図である。FIG. 1 is a diagram illustrating a first embodiment of a substrate transfer device according to the present invention.
【図２】本発明に係わる基板搬送装置の第２実施例を説
明する図である。FIG. 2 is a diagram illustrating a second embodiment of the substrate transfer apparatus according to the present invention.
【図３】第２実施例の他の態様を示す要部斜視図であ
る。FIG. 3 is a main part perspective view showing another aspect of the second embodiment.
１０、３０ 基板搬送装置 １２、３２ 可動アーム １４、３３ 基板保持部 １５、３５ 基板 １６、３４ 微粒子コレクター ２１、４１ 集塵面 ３７、４３ 基板出入口 Ｐ 移動起点 Ｘ 搬送経路 10, 30 Substrate transfer device 12, 32 Movable arm 14, 33 Substrate holding unit 15, 35 Substrate 16, 34 Fine particle collector 21, 41 Dust collecting surface 37, 43 Substrate entrance / exit P Movement origin X Transport path
Claims (3)
記基板に所定の処理を施すための処理室に対して前記基
板保持部を進退可能に支持する可動アームとを備えた基
板搬送装置において、 前記基板保持部の搬送経路上に、集塵面を有する微粒子
コレクターを近接配置したことを特徴とする基板搬送装
置。1. A substrate transfer apparatus comprising: a substrate holding unit for holding a substrate; and a movable arm for supporting the substrate holding unit so that the substrate holding unit can move forward and backward with respect to a processing chamber for performing a predetermined process on the substrate. 2. The substrate transfer device according to claim 1, wherein a fine particle collector having a dust collecting surface is arranged in the vicinity of the transfer path of the substrate holder.
の移動起点に配置したことを特徴とする請求項１記載の
基板搬送装置。2. The substrate transfer apparatus according to claim 1, wherein the fine particle collector is arranged at a starting point of movement of the substrate holder.
板出入口に配置したことを特徴とする請求項１記載の基
板搬送装置。3. The substrate transfer apparatus according to claim 1, wherein the fine particle collector is arranged at a substrate inlet / outlet port of the processing chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8564093A JP3271207B2 (en) | 1993-03-18 | 1993-03-18 | Substrate transfer device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8564093A JP3271207B2 (en) | 1993-03-18 | 1993-03-18 | Substrate transfer device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06275702A true JPH06275702A (en) | 1994-09-30 |
| JP3271207B2 JP3271207B2 (en) | 2002-04-02 |
Family
ID=13864431
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8564093A Expired - Fee Related JP3271207B2 (en) | 1993-03-18 | 1993-03-18 | Substrate transfer device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3271207B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012059819A (en) * | 2010-09-07 | 2012-03-22 | Tokyo Electron Ltd | Substrate transfer method and storage medium |
| JP2015204378A (en) * | 2014-04-14 | 2015-11-16 | 東京エレクトロン株式会社 | Jig for dust collection, substrate processing device and particle collection method |
| JP2018190783A (en) * | 2017-04-28 | 2018-11-29 | 東京エレクトロン株式会社 | Transport device and transport method |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19829113A1 (en) | 1998-06-10 | 1999-12-16 | Bayer Ag | Means for controlling plant pests |
-
1993
- 1993-03-18 JP JP8564093A patent/JP3271207B2/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012059819A (en) * | 2010-09-07 | 2012-03-22 | Tokyo Electron Ltd | Substrate transfer method and storage medium |
| JP2015204378A (en) * | 2014-04-14 | 2015-11-16 | 東京エレクトロン株式会社 | Jig for dust collection, substrate processing device and particle collection method |
| JP2018190783A (en) * | 2017-04-28 | 2018-11-29 | 東京エレクトロン株式会社 | Transport device and transport method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3271207B2 (en) | 2002-04-02 |
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