JPH0415920A - Method and holder for washing wafer - Google Patents

Method and holder for washing wafer

Info

Publication number
JPH0415920A
JPH0415920A JP12075290A JP12075290A JPH0415920A JP H0415920 A JPH0415920 A JP H0415920A JP 12075290 A JP12075290 A JP 12075290A JP 12075290 A JP12075290 A JP 12075290A JP H0415920 A JPH0415920 A JP H0415920A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
arms
wafer
washing
semiconductor wafer
under
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12075290A
Inventor
Toshihiko Noguchi
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Abstract

PURPOSE: To arrange washing nozzles under arms, improve the reliability of wafer washing, and stably hold a semiconductor wafer by rotating the rollers of both the arms synchronously using two electric movers moved on a rail back and forth individually and having the two wafer holding arms under the rail.
CONSTITUTION: The present invention comprises a horizontal rail 22, sliders 23 and 24 moved on the rail back and forth individually, horizontal arms 27 and 28 having fingers 25 and 26 perpendicularly thereto under the sliders, six rollers 32-37 fixed rotatably to roller holders 30 and 31, which are fitted on the periphery of a semiconductor wafer 29, at the tips of the fingers, and washing nozzles under the arms 27 and 28. When the semiconductor wafer 29 at the specified position is held with the sliders 23 and 24 brought close thereto and washing liquid is sprayed on both faces of the semiconductor wafer 29 through the washing nozzles while the rollers 32-37 are rotated synchronously using drives 38 and 39, the wafer is not polluted because the washing liquid does not scatter to the arms 27 and 28 and the other parts.
COPYRIGHT: (C)1992,JPO&Japio
JP12075290A 1990-05-09 1990-05-09 Method and holder for washing wafer Pending JPH0415920A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12075290A JPH0415920A (en) 1990-05-09 1990-05-09 Method and holder for washing wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12075290A JPH0415920A (en) 1990-05-09 1990-05-09 Method and holder for washing wafer

Publications (1)

Publication Number Publication Date
JPH0415920A true true JPH0415920A (en) 1992-01-21

Family

ID=14794115

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12075290A Pending JPH0415920A (en) 1990-05-09 1990-05-09 Method and holder for washing wafer

Country Status (1)

Country Link
JP (1) JPH0415920A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5730162A (en) * 1995-01-12 1998-03-24 Tokyo Electron Limited Apparatus and method for washing substrates
US6059891A (en) * 1997-07-23 2000-05-09 Tokyo Electron Limited Apparatus and method for washing substrate
US6115867A (en) * 1997-08-18 2000-09-12 Tokyo Electron Limited Apparatus for cleaning both sides of substrate
US6431184B1 (en) 1997-08-05 2002-08-13 Tokyo Electron Limited Apparatus and method for washing substrate

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01184831A (en) * 1988-01-13 1989-07-24 Sony Corp Cleaning process

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01184831A (en) * 1988-01-13 1989-07-24 Sony Corp Cleaning process

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5730162A (en) * 1995-01-12 1998-03-24 Tokyo Electron Limited Apparatus and method for washing substrates
US5817185A (en) * 1995-01-12 1998-10-06 Tokyo Electron Limited Method for washing substrates
US6059891A (en) * 1997-07-23 2000-05-09 Tokyo Electron Limited Apparatus and method for washing substrate
US6431184B1 (en) 1997-08-05 2002-08-13 Tokyo Electron Limited Apparatus and method for washing substrate
US6115867A (en) * 1997-08-18 2000-09-12 Tokyo Electron Limited Apparatus for cleaning both sides of substrate
US6276378B1 (en) 1997-08-18 2001-08-21 Tokyo Electron Limited Apparatus for cleaning both sides of substrate

Similar Documents

Publication Publication Date Title
JPS60143634A (en) Wafer treatment and device thereof
JPH0419030A (en) Machine tool of tool head replacing type
JPH04186626A (en) Etching apparatus
US4541141A (en) Machine for washing electronic circuits
JPH04157755A (en) Wafer transferring pen holder device for vertical semiconductor manufacturing apparatus
JPH04200768A (en) Coating apparatus
US4701973A (en) Bottle duster
JPS55112702A (en) Grinding process and chamfering machine for plate glass by numerical control
JPH0290523A (en) Substrate cleaning device
JPH06120192A (en) Both side scrubbing washing device
JPH01304732A (en) Semiconductor wafer washer
JPH0314230A (en) Cleaning of semiconductor wafer and device therefor
JPH0831783A (en) Method and apparatus for dicing substrate
JPH04118074A (en) Coating device
JPS63137448A (en) Semiconductor wafer treatment apparatus
DE2756998A1 (en) Conveyor system for clothing items buttons attaching prodn. line - has infinite control allowing different fabrics and different fastening methods to be used
JPS58182826A (en) Automatic removing device for forein matter
JPH04333570A (en) Method for cleaning silicon nitiride with gaseous hf
JPS6374547A (en) Robot for inverting work
JPH0430521A (en) Rotary type apparatus for surface treatment for substrate
JPS5258458A (en) Spinner cleaning and drying mechanism
JPS60201871A (en) Grinding and sweeping apparatus
JPS525313A (en) Method for opening continuous multifilament yarns
JPH04272026A (en) Work reversing and transfer device