JPH06268043A - Reticle arrangement - Google Patents
Reticle arrangementInfo
- Publication number
- JPH06268043A JPH06268043A JP5663993A JP5663993A JPH06268043A JP H06268043 A JPH06268043 A JP H06268043A JP 5663993 A JP5663993 A JP 5663993A JP 5663993 A JP5663993 A JP 5663993A JP H06268043 A JPH06268043 A JP H06268043A
- Authority
- JP
- Japan
- Prior art keywords
- reticle
- host computer
- input
- storage shelf
- communication line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
Landscapes
- Engineering & Computer Science (AREA)
- Library & Information Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Warehouses Or Storage Devices (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、コンピュータを使用し
た半導体製造装置に於けるレチクルの配膳方法に関する
ものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reticle setting method in a semiconductor manufacturing apparatus using a computer.
【0002】[0002]
【従来の技術】従来の配膳方法は、作業者が製造ロット
の進捗とは関係無く、ある特定の時間間隔毎にホストコ
ンピュータと接続された入出力端末より出庫すべきレチ
クルを検索して、該当するレチクルをまとめて収納棚よ
り出庫し、製造ロットの処理を行う露光装置に配膳を行
っていた。2. Description of the Related Art In the conventional distribution method, an operator searches for a reticle to be delivered from an input / output terminal connected to a host computer at a specific time interval regardless of the progress of the manufacturing lot, The reticle to be processed was put out from the storage shelf and delivered to the exposure apparatus for processing the manufacturing lot.
【0003】[0003]
【発明が解決しようとする課題】半導体装置の生産ライ
ンにおける露光装置は、製造品種毎に異なるレチクルを
部材として使用する必要があり、近年顕著となっている
カスタム指向での少量生産における多品種化は、そのレ
チクルの頻繁な変更を余儀なくされる。もし製造ロット
が露光装置に到着してもレチクルが準備できない場合は
装置が空くことになり露光装置の稼働率低下となる。An exposure apparatus in a semiconductor device production line requires the use of different reticles as members for each product type, and in recent years it has become more prominent in custom-oriented small-quantity production to achieve multiple product types. Are forced to change their reticles frequently. If the reticle cannot be prepared even when the manufacturing lot arrives at the exposure apparatus, the apparatus becomes empty and the operation rate of the exposure apparatus decreases.
【0004】従来の配膳方法では、製造ロットの進捗と
作業者のレチクル検索・搬送作業とは非同期であるた
め、場合によっては、製造ロットが装置に到着したにも
関わらずレチクルの配膳が遅れてしまい、装置を空かせ
てしまうという問題があった。In the conventional servicing method, since the progress of the manufacturing lot and the reticle search / conveyance work of the operator are asynchronous, in some cases, the reticle serving is delayed even though the manufacturing lot arrives at the apparatus. There was a problem that the device was emptied.
【0005】又、工場内の自動化が進行し、一人の作業
者が複数の作業をこなすようになると、工数上の都合に
よりレチクルの検索・配膳作業の頻度が減少し、その
為、一回の検索・配膳作業で多くのレチクルの処理を行
わなければ成らなくなり、ますます製造ロットとレチク
ルの到着タイミングが会わなくなるという問題があっ
た。Further, when the automation in the factory progresses and one worker is to perform a plurality of tasks, the frequency of reticle search / serving work is reduced due to man-hours. There was a problem that it would not be possible without processing many reticles in the search / serving work, and it would become more and more difficult to meet the arrival timing of the reticle with the manufacturing lot.
【0006】[0006]
【課題を解決するための手段】製造ロットの各作業工程
で作業開始及び作業完了時に入出力端末よりホストコン
ピュータに報告し、そのタイミングに於いて製造ロット
の露光装置への予想到達時間とレチクルの露光装置への
予想到達時間との比較を行い、レチクルを収納棚より出
庫するか否かを判断し、出庫する場合に於いてレチクル
出庫指示を収納棚に伝達し、レチクルを収納棚から出庫
させ露光装置に配膳する手段を備えている。Means for Solving the Problems At each work step of a manufacturing lot, a report is sent from an input / output terminal to a host computer at the time of starting and completing the work, and at that timing, the expected arrival time of the manufacturing lot to the exposure apparatus and the reticle By comparing with the expected arrival time to the exposure device, it is determined whether or not the reticle is to be ejected from the storage shelf.If the reticle is to be ejected, the reticle delivery instruction is transmitted to the storage shelf and the reticle is ejected from the storage shelf. Means for arranging the exposure apparatus are provided.
【0007】[0007]
【実施例】本発明について図面を参照して説明する。図
1は本発明による一実施例の方法に用いるレチクル配膳
システムの概略を示す構成図である。工場の生産ライン
全体を管理するホストコンピュータaは、通信回線bを
介して、入出力端末c1,c2,…cnに接続されてい
る。又、入出力端末c1,c2は、通信回線d1,d2
を介してレチクル収納棚e1,e2に接続されている。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described with reference to the drawings. FIG. 1 is a block diagram showing the outline of a reticle serving system used in the method of one embodiment according to the present invention. A host computer a that manages the entire production line of the factory is connected to the input / output terminals c1, c2, ... cn via a communication line b. The input / output terminals c1 and c2 are connected to the communication lines d1 and d2.
Is connected to the reticle storage shelves e1 and e2 via.
【0008】図2は、本発明によるレチクル配膳方法の
タイミングチャートの一例である。上の段は製造ロット
の作業工程であり、中段及び下段はそれぞれロット及び
レチクルの動きを表したものである。これらを時系列に
説明する。製造ロットはその定められた工程順序に従い
図2上段のように進行するが、その各作業工程に於いて
作業開始時及び作業完了時には、図1の通信回線bを介
して接続された入出力端末cnよりその旨ホストコンピ
ュータaに報告する。そのタイミングに於いてホストコ
ンピュータaは、レチクルを準備しなければならない工
程か否かを製造ロットの予想到達時間及びレチクルの予
想到達時間より判断して、もしレチクルを準備すべき工
程であると判断した場合、通信回線b、入出力端末c1
又はc2を介して接続されたレチクル収納棚e1又はe
2にレチクル出庫指示として伝え、レチクル収納棚e1
又はe2は該当レチクルを出庫して、製造ロットが処理
を行う露光装置にレチクルを配膳する。FIG. 2 is an example of a timing chart of the reticle serving method according to the present invention. The upper stage shows the manufacturing process of the manufacturing lot, and the middle stage and the lower stage show the movement of the lot and the reticle, respectively. These will be described in time series. The manufacturing lot proceeds according to the defined process sequence as shown in the upper part of FIG. 2, but at the start and end of the work in each work process, the input / output terminals connected via the communication line b in FIG. cn reports this to the host computer a. At that timing, the host computer a determines whether or not the process should prepare the reticle based on the expected arrival time of the manufacturing lot and the expected arrival time of the reticle, and determines that the reticle should be prepared. Communication line b, input / output terminal c1
Or reticle storage shelves e1 or e connected via c2
The reticle storage shelf e1
Alternatively, at e2, the reticle is unloaded and the reticle is placed in the exposure apparatus where the manufacturing lot processes.
【0009】[0009]
【発明の効果】以上説明したように本発明は、製造ロッ
トの露光作業時に部材として使用されるレチクルを、露
光作業開始時に間に合うタイミングでレチクル収納棚よ
り出庫・配膳することにより、レチクルの配膳待ちによ
る露光装置の空きが回避でき、従って露光装置の稼働率
向上が行える。As described above, according to the present invention, the reticle used as a member during the exposure operation of the manufacturing lot is put out and arranged from the reticle storage shelf at the timing when the exposure operation is started, thereby waiting for the reticle to be set. It is possible to avoid the vacancy of the exposure apparatus due to, and thus improve the operation rate of the exposure apparatus.
【図1】本発明の一実施例に用いるレチクル配膳システ
ムの概略を示す構成図である。FIG. 1 is a configuration diagram showing an outline of a reticle serving system used in an embodiment of the present invention.
【図2】本発明の一実施例のレチクル配膳システムのタ
イミングチャートである。FIG. 2 is a timing chart of the reticle serving system according to the embodiment of the present invention.
a 工場の生産ライン全体を管理するホストコンピュ
ータ b ホストコンピュータと入出力端末を接続する通信
回線 c1,c2…cn 入出力端末 d1,d2 入出力端末とレチクル収納棚を接続通信
回線 e1,e2 レチクル収納棚a Host computer that manages the entire production line of the factory b Communication line that connects the host computer and the input / output terminal c1, c2 ... cn Input / output terminal d1, d2 Connection between the input / output terminal and the reticle storage shelf Communication line e1, e2 Reticle storage shelf
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 H01L 21/027 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Office reference number FI technical display location H01L 21/027
Claims (1)
ュータと、通信回線を介してホストコンピュータに接続
されている入出力端末と、通信回線を介して入出力端末
に接続されているレチクルの収納棚を有する半導体装置
製造におけるレチクルの配膳方法において、 製造ロットの各作業工程で作業開始及び作業完了時に入
出力端末よりホストコンピュータに報告し、そのタイミ
ングに於いて製造ロットの露光装置への予想到達時間と
レチクルの露光装置への予想到達時間との比較を行い、
レチクルを収納棚より出庫するか否かを判断し、出庫す
る場合に於いてレチクル出庫指示を収納棚に伝達し、レ
チクルを収納棚から出庫させ露光装置に配膳することを
特徴とするレチクル配膳方法。1. A host computer for managing the entire production line, an input / output terminal connected to the host computer via a communication line, and a reticle storage shelf connected to the input / output terminal via the communication line. In the reticle distribution method used in semiconductor device manufacturing, the I / O terminal reports to the host computer at the start and end of each work step of the manufacturing lot, and the expected arrival time of the manufacturing lot to the exposure equipment Compare with the expected arrival time of the reticle to the exposure device,
A reticle serving method characterized by determining whether or not the reticle is to be delivered from the storage shelf, transmitting a reticle delivery instruction to the storage shelf when delivering, and delivering the reticle from the storage shelf to the exposure device. .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5663993A JPH06268043A (en) | 1993-03-17 | 1993-03-17 | Reticle arrangement |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5663993A JPH06268043A (en) | 1993-03-17 | 1993-03-17 | Reticle arrangement |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH06268043A true JPH06268043A (en) | 1994-09-22 |
Family
ID=13032911
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5663993A Pending JPH06268043A (en) | 1993-03-17 | 1993-03-17 | Reticle arrangement |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06268043A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6801826B2 (en) | 2001-08-16 | 2004-10-05 | Nec Corporation | System and method for manufacturing semiconductor devices controlled by customer |
-
1993
- 1993-03-17 JP JP5663993A patent/JPH06268043A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6801826B2 (en) | 2001-08-16 | 2004-10-05 | Nec Corporation | System and method for manufacturing semiconductor devices controlled by customer |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 19981222 |