JPH06254768A - Electrodeposition grinding wheel and manufacture thereof - Google Patents

Electrodeposition grinding wheel and manufacture thereof

Info

Publication number
JPH06254768A
JPH06254768A JP4077546A JP7754692A JPH06254768A JP H06254768 A JPH06254768 A JP H06254768A JP 4077546 A JP4077546 A JP 4077546A JP 7754692 A JP7754692 A JP 7754692A JP H06254768 A JPH06254768 A JP H06254768A
Authority
JP
Japan
Prior art keywords
layer
superabrasive grains
grindstone
electroless plating
phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4077546A
Other languages
Japanese (ja)
Other versions
JP3134469B2 (en
Inventor
Naoki Shitamae
直樹 下前
Yoshiaki Hatakeyama
義昭 畠山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority to JP04077546A priority Critical patent/JP3134469B2/en
Publication of JPH06254768A publication Critical patent/JPH06254768A/en
Application granted granted Critical
Publication of JP3134469B2 publication Critical patent/JP3134469B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To provide an increased life for a grinding wheel and to stabilize the quality of cutting by uniforming dispersion density of super grinding grains and the thickness of a grinding grain layer and improving a grinding grain holding force, in a multilayer-form grinding grain layer wherein super grinding grains are dispersed in a multilayer-form manner. CONSTITUTION:An electrodeposition grinding wheel is provided with a grinding wheel base substance 1; and a grinding grain layer formed on a grinding grain layer forming surface. The grinding grain layer comprises a first layer 20 wherein super grinding grains 10 are arranged in a dispersed state on a grinding grain layer forming surface and the super grinding grains are orderly fixed at an Ni electrolytic plating phase 12 having thickness being 5-20% of an average grain side and an Ni-P electroless plating phase 14 having thickness being 30-100% of an average grain size; and a second layer 22 wherein the noble super grinding grains 10 having the same average grain size so as to be positioned between the super grinding grains 10 in the first layer 20 and the super grinding grains are orderly fixed in an Ni electrolytic plating phase 16 having thickness being 5-20% of an average grain size and an Ni-P electroless plating phase 18 having thickness being 30-100% of the average grain size. Hardness of the Ni-P electroless plating phases 14 and 18 is set to 450 Hv or more.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は各種用途に使用される電
着砥石およびその製造方法に係わり、特に、砥石寿命を
延長するとともに切れ味を安定化するための改良に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrodeposition grindstone used for various purposes and a method for manufacturing the same, and more particularly to an improvement for extending the life of the grindstone and stabilizing the sharpness.

【0002】[0002]

【従来の技術】電着砥石は、砥石基体の砥粒層形成面に
ダイヤモンドまたはCBN等の超砥粒を金属めっき相に
より固定したものであり、メタルボンド砥石やレジンボ
ンド砥石、ビトリファイドボンド砥石に比して結合剤相
の強度が高く、砥粒層の摩耗が少ないため、砥粒層の摩
耗による形状劣化を嫌う仕上げ加工やの総型加工に適し
ている。
2. Description of the Related Art An electrodeposition grindstone is one in which superabrasive grains such as diamond or CBN are fixed by a metal plating phase on the surface of a grindstone base on which a grindstone layer is formed. The electrodeposited grindstone, resin bond grindstone, and vitrified bond grindstone. In comparison, since the strength of the binder phase is high and the wear of the abrasive grain layer is small, it is suitable for finishing and general-type machining in which shape deterioration due to wear of the abrasive grain layer is not desired.

【0003】この種の電着砥石を製造する場合、従来は
次のような方法が採られている。まず、金属製の砥石基
体の砥粒層形成面以外をマスキングした後、砥石基体を
Ni電解めっき浴中に浸漬し、その砥粒層形成面を上向
きにしてそのうえに超砥粒を均一に蒔く。砥石基体を電
源陰極に接続し、電解めっき浴中に配置された陽極との
間で通電することにより、砥粒層形成面にNiめっき相
を析出させ、超砥粒を単層状に固着させる。砥粒層形成
面が円環状をなす場合には、砥石基体を一定角度づつ間
欠的に回転させながら、その都度、上記操作を行い、砥
粒層形成面の全域に亙って超砥粒を固着させる。
In the case of manufacturing this kind of electrodeposition grindstone, the following method has been conventionally adopted. First, after masking the surface of the metal grindstone substrate other than the abrasive grain layer forming surface, the grindstone substrate is immersed in a Ni electrolytic plating bath, and the abrasive grain layer forming surface faces upward, and the superabrasive grains are evenly sown thereon. By connecting the grindstone base to a power source cathode and energizing it with an anode arranged in an electrolytic plating bath, a Ni plating phase is deposited on the surface where the abrasive grain layer is formed, and the superabrasive grains are fixed in a single layer. When the abrasive grain layer forming surface has an annular shape, the above operation is performed each time while the grindstone substrate is intermittently rotated by a constant angle, and the superabrasive grains are spread over the entire area of the abrasive grain layer forming surface. Fix it.

【0004】[0004]

【発明が解決しようとする課題】ところで、上記の製造
方法では、単層状であれば超砥粒を砥粒層形成面にほぼ
均一に固着させることができるが、超砥粒を2層以上積
層した砥粒層を形成しようとすると、金属めっき相の偏
析が激しくなり、均一な厚さの砥粒層が形成困難である
うえ、その内部の超砥粒分布も乱れる。このため、金属
めっき相による砥粒保持力がばらつき、研削中に超砥粒
が無駄に脱落したり、切れ味がばらつくなどの問題を生
じ、満足のいく研削性能が得られなかった。この理由に
より、従来の電着砥石の殆どは、超砥粒を単層状に固定
したものに留まり、砥石寿命が短かかった。
By the way, in the above-mentioned manufacturing method, the superabrasive grains can be fixed to the surface on which the abrasive grain layer is formed in a substantially single layer, but two or more superabrasive grains are laminated. If an attempt is made to form an abrasive grain layer, segregation of the metal plating phase becomes severe, making it difficult to form an abrasive grain layer having a uniform thickness, and the superabrasive grain distribution inside thereof is disturbed. For this reason, the abrasive grain holding force due to the metal plating phase varies, and problems such as unnecessary loss of superabrasive grains during grinding and variation in sharpness occur, and satisfactory grinding performance cannot be obtained. For this reason, most of the conventional electrodeposition grindstones are limited to those in which superabrasive grains are fixed in a single layer, and the life of the grindstone is short.

【0005】本発明は上記事情に鑑みてなされたもの
で、超砥粒を多層状に分散した多層状電着砥石におい
て、砥粒層の厚さおよび超砥粒分布を均一化するととも
に、個々の超砥粒に対する砥粒保持力を高めることによ
り、砥石寿命が長く、しかも切れ味が安定した電着砥石
を得ることを課題としている。
The present invention has been made in view of the above circumstances. In a multi-layered electrodeposition grindstone in which super-abrasive grains are dispersed in multiple layers, the thickness of the abrasive grain layer and the super-abrasive grain distribution are made uniform and An object of the present invention is to obtain an electrodeposition grindstone having a long grindstone life and stable sharpness by increasing the abrasive grain holding force for the superabrasive grind.

【0006】[0006]

【課題を解決するための手段】本発明は上記課題を解決
するためになされたもので、砥石基体と、この砥石基体
の砥粒層形成面に形成された砥粒層とを具備する電着砥
石において、前記砥粒層は、前記砥粒層形成面に超砥粒
を分散配置し、これら超砥粒の平均粒径の5〜20%の
厚さのNi電解めっき相、および前記平均粒径の30〜
100%の厚さのNi−P無電解めっき相で、前記超砥
粒を順次固定してなる第1層と、第n−1層(nは2以
上の整数)の上に、第n−1層中の超砥粒の間に位置す
るように同じ平均粒径を有する新たな超砥粒を分散配置
し、前記平均粒径の5〜20%の厚さのNi電解めっき
相、および前記平均粒径の30〜100%の厚さのNi
−P無電解めっき相で順次固定してなる第n層とを有
し、前記各Ni−P無電解めっき相の硬度は、450H
v以上とされていることを特徴とする。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and is electrodeposition provided with a grindstone base and an abrasive grain layer formed on an abrasive grain layer forming surface of the grindstone base. In the grindstone, the abrasive grain layer has superabrasive grains dispersedly arranged on the abrasive grain layer forming surface, a Ni electrolytic plating phase having a thickness of 5 to 20% of the average grain size of these superabrasive grains, and the average grain. Diameter 30 ~
An Ni-P electroless plating phase having a thickness of 100%, a first layer formed by sequentially fixing the superabrasive grains, and an n-1th layer (n is an integer of 2 or more) on the nth layer. New superabrasive grains having the same average grain size are dispersedly arranged so as to be located between the superabrasive grains in one layer, and the Ni electrolytic plating phase having a thickness of 5 to 20% of the average grain size, and the above Ni with a thickness of 30 to 100% of the average particle size
-P electroless plating phase and the n-th layer which is sequentially fixed, and the hardness of each Ni-P electroless plating phase is 450H.
It is characterized by being set to v or more.

【0007】なお、前記各Ni−P無電解めっき相の硬
度は、熱硬化処理により600Hv以上とされていても
よい。
The hardness of each Ni-P electroless plating phase may be set to 600 Hv or more by thermosetting treatment.

【0008】一方、本発明に係る電着砥石の製造方法
は、下記工程a〜eを全て有することを特徴とする。 a.砥粒層形成面が導電性を有する砥石基体をNi電解
めっき浴に浸漬し、前記砥粒層形成面上に超砥粒を分散
配置したうえ、前記砥粒層形成面に前記超砥粒の平均粒
径の5〜20%の厚さのNi電解めっき相を析出させて
超砥粒を仮固定する。 b.前記砥石基体を、Pを添加したNi無電解めっき浴
に浸漬し、前記平均粒径の30〜100%の厚さのNi
−P無電解めっき相を前記Ni電解めっき相上に析出さ
せて超砥粒を埋設して第1層を形成する。 c.砥石基体を再びNi電解めっき浴に浸漬し、第n−
1層(nは2以上の整数)の超砥粒の間に、同じ平均粒
径を有する超砥粒を新たに分散配置したうえ、第n−1
層のNi−P無電解めっき相上に、前記平均粒径の5〜
20%の厚さのNi電解めっき相を析出させて超砥粒を
仮固定する。 d.砥石基体を、Pを添加したNi無電解めっき浴に再
び浸漬し、前記平均粒径の30〜100%の厚さのNi
−P無電解めっき相を、第n−1層のNi電解めっき相
の上に析出させて超砥粒を埋設して第n層を形成する。 e.nが所望の数になるまで、前記工程c,dを繰り返
す。
On the other hand, the method for producing an electrodeposition grindstone according to the present invention is characterized by including all the following steps a to e. a. An abrasive grain base having an electrically conductive abrasive grain layer forming surface is immersed in a Ni electrolytic plating bath to disperse superabrasive grains on the abrasive grain layer forming surface, and to dispose the superabrasive grains on the abrasive grain layer forming surface. The Ni electroplating phase having a thickness of 5 to 20% of the average grain size is deposited to temporarily fix the superabrasive grains. b. The grindstone substrate is immersed in a Ni electroless plating bath containing P, and Ni having a thickness of 30 to 100% of the average particle diameter is used.
A -P electroless plating phase is deposited on the Ni electroplating phase and embedded with superabrasive grains to form a first layer. c. The whetstone substrate is again immersed in the Ni electrolytic plating bath to
Superabrasive grains having the same average particle diameter are newly dispersed and arranged between one layer (n is an integer of 2 or more) of superabrasive grains,
On the Ni-P electroless plating layer of the layer,
A 20% thick Ni electroplating phase is deposited to temporarily fix the superabrasive grains. d. The grindstone substrate is immersed again in a Ni electroless plating bath containing P, and Ni having a thickness of 30 to 100% of the average particle diameter is used.
The -P electroless plating phase is deposited on the Ni electrolytic plating phase of the (n-1) th layer and embedded with superabrasive grains to form the nth layer. e. The above steps c and d are repeated until n reaches a desired number.

【0009】なお、前記工程a〜eを終えた後、前記砥
石基体を加熱して各層のNi−P無電解めっき相を硬質
化してもよい。
After finishing steps a to e, the grindstone substrate may be heated to harden the Ni-P electroless plating phase of each layer.

【0010】[0010]

【作用】本発明に係る電着砥石では、上下に重なる各層
の超砥粒が互い違いに隣接して配置されているため、研
削時には、上層の超砥粒を下層の超砥粒が直接、または
金属めっき相を介して間接的に支え、砥粒保持力が高め
られる。
In the electrodeposition grindstone according to the present invention, since the superabrasive grains of the respective layers which are vertically stacked are alternately and adjacently arranged, during grinding, the superabrasive grains of the upper layer are directly or directly adhered to the superabrasive grains of the lower layer. It indirectly supports through the metal plating phase to enhance the abrasive grain holding force.

【0011】また、超砥粒が多層状に分散されているか
ら、上層の超砥粒が摩耗すると下層の超砥粒が順次露出
して研削を担当し、長期に亙って安定した切れ味を維持
できる。さらに、電解めっき相とNi−P無電解めっき
相に硬度差をつけることにより、超砥粒は研削によりあ
る程度摩耗すると、相対的に硬度の低いNi電解めっき
相で支持される割合が高くなるから、切れ味のよいうち
は脱落しにくい反面、ある程度摩耗するとその砥粒に対
する砥粒保持力が急低下する。この作用により、摩耗の
進んだ超砥粒は容易に脱落し、下層の超砥粒の露出を促
すだけでなく、脱落した後にチップポケットを形成し、
これらチップポケットが切粉排出性を高め、研削面の目
詰まりを防止し、この点からも研削性能の向上が図れ
る。
Further, since the superabrasive grains are dispersed in multiple layers, when the superabrasive grains in the upper layer are worn out, the superabrasive grains in the lower layer are sequentially exposed and are in charge of grinding, so that stable sharpness can be obtained over a long period of time. Can be maintained. Further, by providing a hardness difference between the electrolytic plating phase and the Ni-P electroless plating phase, when the superabrasive particles are worn to some extent by grinding, the proportion supported by the Ni electrolytic plating phase having a relatively low hardness increases. Although it does not easily come off while it is sharp, when it is worn to some extent, the abrasive holding force for the abrasive drops sharply. By this action, superabrasive grains that have advanced wear easily fall off, not only promote the exposure of the lower layer superabrasive grains, but also form a chip pocket after falling off,
These chip pockets improve the chip discharge property and prevent clogging of the grinding surface, and from this point also the grinding performance can be improved.

【0012】一方、本発明に係る電着砥石の製造方法で
は、各層の超砥粒をNi電解めっき相およびNi−P無
電解めっき相により平均粒径の35〜120%まで埋め
込んだ後、その上に超砥粒を再び分散させて同様の埋め
込み処理を繰り返すので、下層の超砥粒同士の中間位置
に上層の超砥粒が分散配置される確率が高く、整然とし
た層構造をなし超砥粒分布が均一な多層状砥粒層が容易
に形成できる。
On the other hand, in the method for producing an electrodeposition grindstone according to the present invention, after superabrasive grains of each layer are embedded by the Ni electrolytic plating phase and the Ni-P electroless plating phase to 35 to 120% of the average grain size, the Since the superabrasive grains are dispersed again on the top and the same embedding process is repeated, there is a high probability that the superabrasive grains of the upper layer will be dispersed and arranged at the intermediate position between the superabrasive grains of the lower layer, and a super-abrasive structure with no order A multi-layered abrasive grain layer having a uniform grain distribution can be easily formed.

【0013】また、各層において分散した超砥粒を、ま
ず平均粒径の5〜20%の厚さのNi電解めっき相で仮
固定した後、平均粒径の30〜100%の均一なめっき
厚を有するNi−P無電解めっき相により埋設するの
で、均一な厚さで形成することができ、全体の厚さが均
一でしかも砥粒保持力の高い砥粒層が形成可能である。
Further, the superabrasive grains dispersed in each layer are first temporarily fixed with a Ni electrolytic plating phase having a thickness of 5 to 20% of the average grain size, and then a uniform plating thickness of 30 to 100% of the average grain size is obtained. It is possible to form an abrasive grain layer having a uniform thickness and a high overall grain holding force because it is embedded by a Ni-P electroless plating phase having a.

【0014】[0014]

【実施例】図1は、本発明に係る電着砥石の一実施例と
して、板ガラス等に貫通孔を形成するための穴明けビッ
トを示す縦断面図である。図中符号1は金属製の砥石基
体であり、この砥石基体1は円柱状の頭部1Aと、この
頭部1Aと同軸の軸部1Bとが一体形成されたもので、
その軸線に沿って中心孔1Cが形成されている。頭部1
Aの先端部には先端に向けて窄むテーパ部2と、このテ
ーパ部2の先端面から突出する円環部4が同心状に形成
されている。
FIG. 1 is a vertical sectional view showing a drill bit for forming a through hole in a plate glass or the like as an embodiment of an electrodeposition grindstone according to the present invention. In the figure, reference numeral 1 is a metal grindstone base, and this grindstone base 1 is formed by integrally forming a cylindrical head portion 1A and a shaft portion 1B coaxial with the head portion 1A.
A center hole 1C is formed along the axis. Head 1
A tapered portion 2 that narrows toward the tip and an annular portion 4 that protrudes from the tip surface of the tapered portion 2 are concentrically formed at the tip portion of A.

【0015】テーパ部2の外周面、円環部4の外周面お
よび内周面には単層状砥粒層6が形成される一方、円環
部4の先端面(砥粒層形成面)には多層状砥粒層8が形
成されている。
A single-layer abrasive grain layer 6 is formed on the outer peripheral surface of the tapered portion 2, the outer peripheral surface and the inner peripheral surface of the annular portion 4, while the tip surface of the annular portion 4 (abrasive grain layer forming surface). Has a multi-layered abrasive grain layer 8.

【0016】ビット先端の多層状砥粒層8は本発明の特
徴点となるもので、図2はその断面拡大図である。円環
部4の先端面には、薄いNi電解めっき相12により超
砥粒10が分散して固定され、さらに、各超砥粒10間
を埋めるように相対的に厚いNi−P無電解めっき相1
4が形成されて、第1層20が形成されている。
The multi-layered abrasive grain layer 8 at the tip of the bit is a feature of the present invention, and FIG. 2 is an enlarged sectional view thereof. Superabrasive grains 10 are dispersed and fixed on the tip surface of the annular portion 4 by a thin Ni electroplating phase 12, and further, relatively thick Ni-P electroless plating so as to fill the spaces between the superabrasive grains 10. Phase 1
4 is formed, and the first layer 20 is formed.

【0017】第1層20上にはさらに、薄いNi電解め
っき相16により超砥粒10が分散して固定され、各超
砥粒10を埋めるように相対的に厚いNi−P無電解め
っき相18が形成され、第2層22となっている。
On the first layer 20, superabrasive grains 10 are dispersed and fixed by a thin Ni electrolytic plating phase 16, and a relatively thick Ni-P electroless plating phase is filled so as to fill each superabrasive grain 10. 18 is formed and becomes the second layer 22.

【0018】Ni電解めっき相12,16はいずれも、
その厚さが超砥粒10の平均粒径の5〜20%とされて
いる。5%未満では、製造時に超砥粒10を十分な強度
で仮固定できず、20%より厚いと偏析の影響が大とな
り、砥粒層の厚さが不均一になる。
The Ni electrolytic plating phases 12 and 16 are both
The thickness is set to 5 to 20% of the average particle diameter of the superabrasive particles 10. If it is less than 5%, the superabrasive grains 10 cannot be temporarily fixed at a sufficient strength during production, and if it is more than 20%, the effect of segregation becomes large and the thickness of the abrasive grain layer becomes uneven.

【0019】一方、Ni−P無電解めっき相14,18
の厚さは、超砥粒10の平均粒径の30〜100%とさ
れている。30%未満では砥粒保持力が低下し、100
%より厚いと研削面における砥粒突き出し量が足らなく
なり、切れ味が低下するうえ、各層を重ねていく段階
で、超砥粒10を均一に分散配置することが困難にな
る。
On the other hand, the Ni-P electroless plating phase 14, 18
Is 30 to 100% of the average particle size of the superabrasive grains 10. If it is less than 30%, the holding power of the abrasive grains will be reduced to 100.
%, The amount of protrusion of the abrasive grains on the ground surface becomes insufficient, the sharpness decreases, and it becomes difficult to uniformly disperse the superabrasive grains 10 at the stage of stacking each layer.

【0020】Ni電解めっき相12(または16)とN
i−P無電解めっき相14(または18)を合わせた厚
さは、超砥粒10の平均粒径の1/3〜1/2、特に1
/2であることが望ましい。1/3より薄いまたは1/
2より厚いと、いずれの場合も上層の超砥粒10の配置
が乱れる傾向が増す。
Ni electrolytic plating phase 12 (or 16) and N
The total thickness of the i-P electroless plating phase 14 (or 18) is 1/3 to 1/2 of the average particle diameter of the superabrasive particles 10, and particularly 1
It is desirable that it is / 2. Thinner than 1/3 or 1 /
If the thickness is more than 2, the tendency of the arrangement of the superabrasive grains 10 in the upper layer to be disturbed increases in any case.

【0021】Ni電解めっき相12,16は、Niまた
はNi合金で形成されたもので、特に、Co含有量が1
0〜60wt%のNi−Co系合金は熱処理後の硬度が
高く、好適である。Co含有量が10wt%未満では、
耐熱性、耐疲労性が低下して砥粒保持力が低下する一
方、60wt%より大ではCoが高価であるからコスト
が高くつく。
The Ni electrolytic plating phases 12 and 16 are formed of Ni or a Ni alloy, and particularly, the Co content is 1
A Ni—Co based alloy of 0 to 60 wt% has a high hardness after heat treatment and is suitable. When the Co content is less than 10 wt%,
While the heat resistance and fatigue resistance decrease and the abrasive grain holding power decreases, if it is more than 60 wt%, Co is expensive and the cost becomes high.

【0022】一方、単層状砥粒層6は、図3に示すよう
に、上述した第1層20のみを砥石基体1上に形成した
ものであり、各部の材質や寸法は、多層状砥粒層8と同
様でよい。
On the other hand, the single-layer abrasive grain layer 6 is formed by forming only the above-mentioned first layer 20 on the grindstone substrate 1, as shown in FIG. 3, and the material and dimensions of each part are multi-layered abrasive grains. It may be similar to layer 8.

【0023】次に、上記穴明けビットの製造方法を説明
する。砥石基体1の砥粒層6,8の形成面を除く全面に
マスキングを施したうえ、砥石基体1を公知の組成から
なるNi電解めっき浴に浸漬し、その砥粒層6,8を形
成すべき面の一部を上向きに配置する。この上向きにな
った部分に超砥粒10を蒔き、電解めっき浴に浸漬され
た陽極との間で通電し、Ni電解めっき相12を析出さ
せて超砥粒10を仮固定する。
Next, a method of manufacturing the above-mentioned punching bit will be described. After masking the entire surface of the grindstone base 1 excluding the surface on which the abrasive grain layers 6 and 8 are formed, the grindstone base 1 is immersed in a Ni electrolytic plating bath having a known composition to form the abrasive grain layers 6 and 8. Place part of the power side facing upward. Superabrasive grains 10 are sown on the portion facing upward, and an electric current is applied between the superabrasive grains 10 and the anode immersed in the electrolytic plating bath to precipitate the Ni electrolytic plating phase 12 to temporarily fix the superabrasive grains 10.

【0024】一部分の仮固定が完了したら、砥石基体1
の位置を変えて別の部分を上向きにし、再び超砥粒10
を蒔いて仮固定する作業を繰り返し、砥粒層6,8を形
成すべき全面に超砥粒10を単層状に仮固定する。な
お、電解めっき相16としてNi−Co系合金を使用す
る場合には、周知のNi電解めっき浴に例えばスルファ
ミン酸Coを添加しておけばよい。
After the temporary fixing of a part is completed, the grindstone base 1
Change the position of and move another part upward, and again
The superabrasive grain 10 is temporarily fixed in a single layer on the entire surface where the abrasive grain layers 6 and 8 are to be formed. When a Ni-Co alloy is used as the electrolytic plating phase 16, for example, Co sulfamate may be added to a known Ni electrolytic plating bath.

【0025】次に、砥石基体1を水洗した後、Ni−P
無電解めっき浴中に移し、仮固定された超砥粒10の間
にNi−P無電解めっき相14を析出させ、第1層20
を完成させる。このように無電解めっき法を用いて超砥
粒10の埋め込みを行うと、電解めっき法の場合のよう
に偏析が起こらず、均一な厚さの砥粒層が形成できる。
Next, after the grindstone base 1 is washed with water, Ni-P is used.
The Ni-P electroless plating phase 14 is deposited between the temporarily fixed superabrasive grains 10 by transferring the electroless plating bath to the first layer 20.
To complete. By embedding the superabrasive grains 10 by using the electroless plating method as described above, segregation does not occur unlike the case of the electrolytic plating method, and an abrasive grain layer having a uniform thickness can be formed.

【0026】形成された第1層20のうち、単層状砥粒
層6となる部分をマスキングし、再び電解めっき浴に浸
漬し、円環部4の先端面を上向きとして、その部分の第
1層20上に超砥粒10を蒔く。蒔かれた超砥粒10は
第1層20の超砥粒10同士の間に収まり、第1層20
の超砥粒10の分散状態に倣って均一分散される。再び
砥石基体1と陽極とに通電し、円環部4の先端面のNi
−P無電解めっき相14上にNi電解めっき相16を析
出させ、新たに蒔かれた超砥粒10を単層状に仮固定す
る。
Of the formed first layer 20, the portion to be the single-layered abrasive grain layer 6 is masked and immersed again in the electrolytic plating bath so that the front end surface of the annular portion 4 faces upward, and the first portion of the portion is formed. The superabrasive grains 10 are sown on the layer 20. The seeded superabrasive grains 10 are contained between the superabrasive grains 10 of the first layer 20,
The super-abrasive grains 10 are uniformly dispersed according to the dispersed state. The grindstone base 1 and the anode are energized again, and Ni on the tip surface of the annular portion 4 is applied.
The Ni electrolytic plating phase 16 is deposited on the -P electroless plating phase 14, and the newly-sown superabrasive grains 10 are temporarily fixed in a single layer.

【0027】砥石基体1を水洗して無電解めっき浴中に
戻し、超砥粒10の間のNi電解めっき相16上に再び
Ni−P無電解めっき相18を析出させ、超砥粒10を
所定の深さまで埋め込んで第2層22を形成する。埋め
込みが完了したら通電を停止し、全てのマスキングを外
して水洗する。水洗後、熱処理を行なった場合には、析
出後は450Hv以上であるNi−P無電解めっき相を
600Hv以上にまで硬化することが可能である。
The grindstone substrate 1 is washed with water and returned to the electroless plating bath, and the Ni-P electroless plating phase 18 is again deposited on the Ni electrolytic plating phase 16 between the superabrasive particles 10 to form the superabrasive particles 10. The second layer 22 is formed by embedding it to a predetermined depth. When the embedding is completed, stop energizing, remove all masking and wash with water. When heat treatment is performed after washing with water, the Ni-P electroless plating phase, which is 450 Hv or more after precipitation, can be hardened to 600 Hv or more.

【0028】Ni電解めっき相12,16をNi−Co
系合金で形成した場合、その硬度は析出状態で525H
v、熱処理後(400℃以下)で300〜400Hvで
あり、従来のNiめっき相が熱処理により200Hv以
下まで低下するのに比べて硬度が高く、砥粒保持力をい
っそう向上できる。
The Ni electrolytic plating phases 12 and 16 are replaced with Ni-Co.
When formed from a system alloy, its hardness is 525H in the precipitated state.
v, 300 to 400 Hv after heat treatment (400 ° C. or less), which is higher in hardness than the conventional Ni plating phase is reduced to 200 Hv or less by heat treatment, and the grain holding power can be further improved.

【0029】上記構成からなる穴明けビットを使用する
には、軸部1Bを研削盤に固定し、その軸線回りに高速
回転させつつ、先端を垂直に板ガラス等の被削材に当接
させる。すると被削材は穴明けビット先端の多層状砥粒
層8により円形にくり抜かれ、さらに開口部の周縁がテ
ーパ部2の単層状砥粒層6によって面取り加工される。
In order to use the punching bit having the above structure, the shaft portion 1B is fixed to the grinder, and while rotating at a high speed around the axis line, the tip is vertically contacted with a work material such as plate glass. Then, the work material is hollowed out in a circular shape by the multilayer abrasive grain layer 8 at the tip of the drilling bit, and the peripheral edge of the opening is chamfered by the single layer abrasive grain layer 6 of the taper portion 2.

【0030】この実施例の穴明けビットでは、以下のよ
うな優れた効果が得られる。 主に研削を担うビット先端の砥粒層8が多層状であ
り、第2層22の超砥粒10が摩耗すると第1層20の
超砥粒10が順次露出するから、長期に亙って切れ味を
維持でき、砥石寿命が延長できる。
The punching bit of this embodiment has the following excellent effects. The abrasive grain layer 8 at the tip of the bit, which is mainly used for grinding, has a multi-layered shape, and when the superabrasive grains 10 of the second layer 22 are worn, the superabrasive grains 10 of the first layer 20 are sequentially exposed. The sharpness can be maintained and the life of the grindstone can be extended.

【0031】 多層状砥粒層8において、上下に重な
る各層20,22の超砥粒10が互い違いに隣接して配
置されているため、研削時には、第2層22の超砥粒1
0が第1層20の超砥粒10によって直接、または金属
めっき相16,18を介して間接的に支えられるうえ、
各超砥粒10が埋め込まれたNi−P無電解めっき相1
4,18は、熱効果処理により高強度化されているか
ら、これらの相乗効果により第2層22における砥粒保
持力が大幅に高められる。したがって、第2層22の超
砥粒10により、第1層20の超砥粒10と同様の研削
性能が得られる。
In the multi-layered abrasive grain layer 8, the superabrasive grains 10 of each of the layers 20 and 22 that are vertically stacked are alternately and adjacently arranged. Therefore, during grinding, the superabrasive grains 1 of the second layer 22 are
0 is directly supported by the superabrasive grains 10 of the first layer 20 or indirectly through the metal plating phases 16 and 18, and
Ni-P electroless plating phase 1 in which each superabrasive grain 10 is embedded
Since Nos. 4 and 18 are strengthened by the heat effect treatment, the synergistic effect of these effects greatly enhances the abrasive grain holding force in the second layer 22. Therefore, the same grinding performance as the superabrasive grains 10 of the first layer 20 can be obtained by the superabrasive grains 10 of the second layer 22.

【0032】 多層状砥粒層8において、第2層22
の超砥粒10は研削によりある程度摩耗すると、相対的
に硬度の低いNi電解めっき相16で支持される割合が
高くなるため、切れ味のよいうちは脱落しにくい反面、
ある程度摩耗した後は砥粒保持力が急低下する。この作
用により、摩耗の進んだ第2層22の超砥粒10は容易
に脱落し、第1層20の超砥粒10の露出(発刃)を促
す。また、超砥粒10が脱落した後にはチップポケット
が形成されるから、これらチップポケットが切粉排出性
を高めて研削面の目詰まりを防止し、この点からも研削
性能の向上が図れる。
In the multi-layered abrasive grain layer 8, the second layer 22
When the superabrasive grains 10 are worn to some extent by grinding, the ratio of being supported by the Ni electrolytic plating phase 16 having a relatively low hardness increases, so that they are hard to drop while being sharp,
After a certain amount of wear, the abrasive grain holding force drops sharply. Due to this action, the superabrasive grains 10 of the second layer 22 that have been worn away easily fall off, and the exposure (blazing) of the superabrasive grains 10 of the first layer 20 is promoted. Further, since the chip pockets are formed after the superabrasive grains 10 have fallen off, these chip pockets improve the chip discharging property and prevent the grinding surface from being clogged, and from this point also the grinding performance can be improved.

【0033】一方、上記実施例の砥石製造方法では、以
下のような優れた効果が得られる。 超砥粒10をNi電解めっき相12およびNi−P
無電解めっき相14により平均粒径の35〜120%ま
で埋め込んだ後、その上に超砥粒10を再び分散させて
同様の埋め込み処理を繰り返すので、下層の超砥粒10
同士の中間位置に上層の超砥粒10が分散配置される確
率が高く、整然とした層構造をなして砥粒分布が均一な
多層状砥粒層が容易に形成できる。
On the other hand, with the method for manufacturing a grindstone of the above embodiment, the following excellent effects can be obtained. Superabrasive grains 10 are Ni electrolytic plating phase 12 and Ni-P
After the electroless plating phase 14 is embedded to 35 to 120% of the average grain size, the superabrasive grains 10 are dispersed again thereon and the same embedding treatment is repeated.
There is a high probability that the upper layer superabrasive grains 10 will be dispersedly arranged at an intermediate position between them, and a multi-layered abrasive grain layer having an orderly layered structure and uniform abrasive grain distribution can be easily formed.

【0034】 各層20,22の形成に際し、超砥粒
10をまずNi電解めっき相12,16で仮固定したう
え、Ni−P無電解めっき相14,18により埋設する
ので、砥粒保持力が高く偏析が生じにくいNi−P無電
解めっき相14,18によって主に超砥粒10を支持す
ることができ、厚さが均一で砥粒保持力が高い砥粒層が
得られる。
When forming the layers 20 and 22, the superabrasive grains 10 are first temporarily fixed by the Ni electrolytic plating phases 12 and 16, and then embedded by the Ni—P electroless plating phases 14 and 18, so that the abrasive grain retaining force is improved. The super-abrasive grains 10 can be mainly supported by the Ni-P electroless plating phases 14 and 18 which are highly resistant to segregation, and an abrasive grain layer having a uniform thickness and a high abrasive retaining force can be obtained.

【0035】図4は本発明の他の実施例を示す縦断面図
である。この実施例は板ガラス等の端縁の面取り加工を
行うための総型砥石であり、30は金属製で円板状の砥
石基体、30Aは中心孔、30Bは研削盤への取付孔で
ある。砥石基体30の外周面には、全周に亙って溝部3
2が形成され、この溝部32を含む前記外周面の全面に
は、前記実施例と同様の2層に超砥粒を分散させてなる
多層状砥粒層8が形成されている。
FIG. 4 is a vertical sectional view showing another embodiment of the present invention. In this embodiment, a full-form grindstone for chamfering an edge of a plate glass or the like, 30 is a disk-shaped grindstone base made of metal, 30A is a central hole, and 30B is a mounting hole to a grinder. On the outer peripheral surface of the grindstone base 30, the groove portion 3 is formed over the entire circumference.
2 is formed, and the entire surface of the outer peripheral surface including the groove 32 is provided with a multi-layered abrasive grain layer 8 in which superabrasive grains are dispersed in two layers similar to those in the embodiment.

【0036】この総型砥石を使用するには、研削盤に固
定して回転させつつ、多層状砥粒層8の凹部に板ガラス
等の端縁を当て、端縁に沿って砥石を移動させる。この
実施例においても、上記実施例と同様の優れた効果が得
られる。さらに本発明は、図示した実施例に限定される
ものではなく、その他にも例えば単純なホイール型砥
石、カップ型砥石など、いかなる形状の砥石にも適用可
能である。
To use this full-form grindstone, while being fixed to a grinding machine and being rotated, an edge of plate glass or the like is applied to the concave portion of the multilayer abrasive grain layer 8 and the grindstone is moved along the edge. Also in this embodiment, the same excellent effects as in the above embodiment can be obtained. Furthermore, the present invention is not limited to the illustrated embodiment, but may be applied to any other shape of grindstone such as a simple wheel-type grindstone or a cup-type grindstone.

【0037】[0037]

【実験例】次に、実験例を挙げて本発明の効果を実証す
る。 (実験例)外径150mm×内径50mm×厚さ10m
mの平型の台金の砥粒層形成面を除く部分にマスキング
を施し、台金を下記組成からなる電解めっき浴に浸漬
し、台金表面に平均粒径200μmの超砥粒を蒔きなが
らNi層を10μmの厚さ(平均粒径の5%に相当)に
析出させ、超砥粒を単層状に仮固定した。
[Experimental Example] Next, the effect of the present invention will be demonstrated with reference to an experimental example. (Experimental example) Outer diameter 150 mm × inner diameter 50 mm × thickness 10 m
m of the flat base metal except the surface where the abrasive grain layer is formed is masked, the base metal is immersed in an electrolytic plating bath having the following composition, and while superabrasive grains having an average particle size of 200 μm are sown on the surface of the base metal. A Ni layer was deposited to a thickness of 10 μm (corresponding to 5% of the average grain size), and superabrasive grains were temporarily fixed in a single layer.

【0038】Ni電解めっき浴 スルファミン酸Ni:450g/l ホウ酸:30g/l 塩化Ni:10g/l 光沢剤:少量 pH:4.2 温度:50℃Ni electrolytic plating bath Ni sulfamate: 450 g / l Boric acid: 30 g / l Ni chloride: 10 g / l Brightening agent: small amount pH: 4.2 Temperature: 50 ° C.

【0039】次に、台金を無電解めっき液(日本カニゼ
ン株式会社製、商品名「ブルーシューマー」)に浸漬
し、90℃で無電解めっきを行い、Ni層上にNi−P
系合金層を形成して、仮固定された超砥粒を平均粒径の
50%まで埋め込んだ。再び、上記の電解めっきおよび
無電解めっきを同一条件で繰り返し、2層状の砥粒層を
形成した。図5は、得られた砥石の角部の断面拡大写真
を模写した図である。超砥粒がほぼ整然と2層状に均一
分布している。
Next, the base metal is immersed in an electroless plating solution (manufactured by Nippon Kanigen Co., Ltd., trade name "Blue Sumer") and electroless plated at 90 ° C. to form Ni-P on the Ni layer.
A system alloy layer was formed and the temporarily fixed superabrasive grains were embedded to 50% of the average grain size. Again, the above electrolytic plating and electroless plating were repeated under the same conditions to form a two-layer abrasive grain layer. FIG. 5 is a copy of a cross-sectional enlarged photograph of a corner portion of the obtained grindstone. The super-abrasive grains are almost regularly distributed in two layers.

【0040】(比較例)上記実験例と同じ台金を使用
し、同じ電解めっき浴を用いて前記同様に同じ超砥粒を
電着した。そして超砥粒の平均粒径の60%の厚さの金
属めっき相を形成した。
(Comparative Example) The same base metal as in the above experimental example was used, and the same superabrasive grains were electrodeposited as described above using the same electrolytic plating bath. Then, a metal plating phase having a thickness of 60% of the average grain size of the superabrasive grains was formed.

【0041】(比較実験)上記実験例の砥石と、比較例
の砥石を使用して以下の条件で平面研削を行った。そし
て、研削したワーク体積と、砥石を駆動するための主軸
動力の関係を図6のグラフに示した。
(Comparative Experiment) Using the grindstone of the above-mentioned experimental example and the grindstone of the comparative example, surface grinding was performed under the following conditions. Then, the relationship between the ground work volume and the spindle power for driving the grindstone is shown in the graph of FIG.

【0042】平面研削条件 ホイール周速:1500m/分 テーブル送り:10m/分 クロス送り:2mm/パス 切込み:0.015mm 被削材:超硬合金「UT120T」 被削材切削面寸法:90×40mmSurface grinding conditions Wheel peripheral speed: 1500 m / min Table feed: 10 m / min Cross feed: 2 mm / pass Depth of cut: 0.015 mm Work material: cemented carbide "UT120T" Work material cutting surface dimensions: 90 x 40 mm

【0043】図6のグラフから明らかなように、実験例
の砥石では比較例の砥石に比して4倍以上の長寿命が得
られた。また、実験例の砥石の主軸動力は、砥粒層が多
層状でありながら常にほぼ一定で、安定した切れ味が得
られた。
As is clear from the graph of FIG. 6, the grinding wheel of the experimental example provided a life of 4 times or more that of the grinding wheel of the comparative example. In addition, the spindle power of the grindstone of the experimental example was almost constant at all times even though the abrasive grain layers were multi-layered, and stable sharpness was obtained.

【0044】[0044]

【発明の効果】以上説明したように、本発明に係る電着
砥石では、上下に重なる各層の超砥粒が互い違いに隣接
して配置されているため、研削時には、上層の超砥粒を
下層の超砥粒が直接、または金属めっき相を介して間接
的に支える。同時に、各超砥粒を主に支えているNi−
P無電解めっき相は、熱効果処理により高強度化されて
いるから、これらの相乗効果により砥粒保持力が大幅に
高められ、上層の超砥粒によっても下層の超砥粒と同様
の研削性能が得られる。
As described above, in the electrodeposition grindstone according to the present invention, since the superabrasive grains of the upper and lower layers are alternately arranged adjacent to each other, the superabrasive grains of the upper layer are arranged at the lower layer during grinding. The super-abrasive grains directly support or indirectly support through the metal plating phase. At the same time, Ni- which mainly supports each superabrasive grain
Since the P electroless plating phase is strengthened by the thermal effect treatment, the synergistic effect of these increases the abrasive grain holding power significantly, and the superabrasive grains in the upper layer also perform the same grinding as the superabrasive grains in the lower layer. Performance is obtained.

【0045】また、超砥粒が多層状に分散されているか
ら、上層の超砥粒が摩耗すると下層の超砥粒が順次露出
して研削を担当し、長期に亙って安定した切れ味を維持
できるうえ、超砥粒は研削によりある程度摩耗すると、
相対的に硬度の低いNi電解めっき相で支持される割合
が高くなるから、切れ味のよいうちは脱落しにくい反
面、ある程度摩耗するとその砥粒に対する砥粒保持力が
急低下する。この作用により、摩耗の進んだ超砥粒は容
易に脱落し、下層の超砥粒の露出を促すだけでなく、脱
落した後にチップポケットを形成し、これらチップポケ
ットが切粉排出性を高め、研削面の目詰まりを防止し、
この点からも研削性能の向上が図れる。
Further, since the superabrasive particles are dispersed in multiple layers, when the superabrasive particles in the upper layer are worn out, the superabrasive particles in the lower layer are sequentially exposed and are in charge of grinding, so that stable sharpness is achieved over a long period of time. Not only can it be maintained, but when the superabrasive grains wear to some extent due to grinding,
Since the proportion supported by the Ni electroplating phase having a relatively low hardness is high, it does not easily come off while it is sharp, but when it is worn to some extent, the abrasive grain holding force for the abrasive grains drops sharply. By this action, superabrasive grains that have advanced wear easily fall off, not only promote the exposure of the superabrasive grains of the lower layer, but also form a chip pocket after falling off, these chip pockets enhance the chip discharge performance, Prevents clogging of the grinding surface,
Also from this point, the grinding performance can be improved.

【0046】一方、本発明に係る電着砥石の製造方法で
は、各層の超砥粒をNi電解めっき相およびNi−P無
電解めっき相により平均粒径の35〜120%まで埋め
込んだ後、その上に超砥粒を再び分散させて同様の埋め
込み処理を繰り返すので、下層の超砥粒同士の中間位置
に上層の超砥粒が分散配置される確率が高く、整然とし
た層構造をなし超砥粒分布が均一な多層状砥粒層が容易
に形成できる。
On the other hand, in the method for producing an electrodeposition grindstone according to the present invention, after superabrasive grains of each layer are embedded by the Ni electrolytic plating phase and the Ni-P electroless plating phase to 35 to 120% of the average grain size, the Since the superabrasive grains are dispersed again on the top and the same embedding process is repeated, there is a high probability that the superabrasive grains of the upper layer will be dispersed and arranged at the intermediate position between the superabrasive grains of the lower layer, and a super-abrasive structure with no order A multi-layered abrasive grain layer having a uniform grain distribution can be easily formed.

【0047】また、各層において分散した超砥粒を、ま
ず平均粒径の5〜20%の厚さのNi電解めっき相で仮
固定した後、平均粒径の30〜100%の厚さの、偏析
が生じにくいNi−P無電解めっき相により埋設するの
で、砥粒保持力の高い無電解めっき相を均一な厚さで形
成することができ、全体の厚さが均一でしかも砥粒保持
力の高い砥粒層が形成可能である。
Further, the superabrasive grains dispersed in each layer are first temporarily fixed with a Ni electroplating phase having a thickness of 5 to 20% of the average grain size, and then having a thickness of 30 to 100% of the average grain size. Since it is embedded by the Ni-P electroless plating phase in which segregation does not easily occur, the electroless plating phase having high abrasive grain holding force can be formed with a uniform thickness, and the entire thickness is uniform and the abrasive grain holding force is high. A high-abrasive grain layer can be formed.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の電着砥石の一実施例として穴明けビッ
トを示す縦断面図である。
FIG. 1 is a vertical cross-sectional view showing a drill bit as an embodiment of an electrodeposition grindstone of the present invention.

【図2】同穴明けビットの多層状砥粒層を示す断面拡大
図である。
FIG. 2 is an enlarged cross-sectional view showing a multilayer abrasive grain layer of the same punching bit.

【図3】同穴明けビットの単層状砥粒層を示す断面拡大
図である。
FIG. 3 is an enlarged cross-sectional view showing a single-layer abrasive grain layer of the punched bit.

【図4】本発明の他の実施例として総型砥石を示す縦断
面図である。
FIG. 4 is a vertical sectional view showing a full-scale grindstone as another embodiment of the present invention.

【図5】実験例の砥石の断面写真の模写図である。FIG. 5 is a copy of a cross-sectional photograph of a grindstone of an experimental example.

【図6】実験例の砥石と比較例の砥石の研削性能を比較
したグラフである。
FIG. 6 is a graph comparing grinding performances of a grinding stone of an experimental example and a grinding stone of a comparative example.

【符号の説明】[Explanation of symbols]

1 砥石基体 2 テーパ部 4 円環部 6 単層状砥粒層 8 多層状砥粒層 10 超砥粒 12,16 Ni電解めっき相 14,18 Ni−P無電解めっき相 20 第1層 22 第2層 30 砥石基体 1 Grindstone Base 2 Tapered Part 4 Annular Part 6 Single Layer Abrasive Grain Layer 8 Multilayer Abrasive Grain Layer 10 Super Abrasive Grains 12, 16 Ni Electrolytic Plating Phase 14, 18 Ni-P Electroless Plating Phase 20 First Layer 22 Second Layer 30 Grindstone base

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】砥石基体と、この砥石基体の砥粒層形成面
に形成された砥粒層とを具備する電着砥石において、 前記砥粒層は、前記砥粒層形成面に超砥粒を分散配置
し、これら超砥粒の平均粒径の5〜20%の厚さのNi
電解めっき相、および前記平均粒径の30〜100%の
厚さのNi−P無電解めっき相で、前記超砥粒を順次固
定してなる第1層と、 第n−1層(nは2以上の整数)の上に、第n−1層中
の超砥粒の間に位置するように同じ平均粒径を有する新
たな超砥粒を分散配置し、前記平均粒径の5〜20%の
厚さのNi電解めっき相、および前記平均粒径の30〜
100%の厚さのNi−P無電解めっき相で順次固定し
てなる第n層とを有し、 前記各Ni−P無電解めっき相の硬度は、450Hv以
上とされていることを特徴とする電着砥石。
1. An electrodeposition grindstone comprising a grindstone base and an abrasive grain layer formed on the abrasive grain layer forming surface of the grindstone substrate, wherein the abrasive grain layer is superabrasive on the abrasive grain layer forming surface. Are dispersedly arranged, and Ni having a thickness of 5 to 20% of the average particle diameter of these superabrasive particles is
An electrolytic plating phase and a Ni-P electroless plating phase having a thickness of 30 to 100% of the average particle diameter, the first layer formed by sequentially fixing the superabrasive particles, and the n-1th layer (n is 2 or more), new superabrasive grains having the same average grain size are dispersedly arranged so as to be located between the superabrasive grains in the (n-1) th layer, and the average grain size is 5 to 20. % Ni electroplating phase, and 30 to 30% of the average particle size
A Ni-P electroless plating phase having a thickness of 100% and sequentially fixed by an n-th layer, wherein the hardness of each Ni-P electroless plating phase is 450 Hv or more. An electroplated whetstone.
【請求項2】前記各Ni−P無電解めっき相の硬度は、
熱硬化処理により600Hv以上とされていることを特
徴とする請求項1記載の電着砥石。
2. The hardness of each Ni-P electroless plating phase is
The electroplated grindstone according to claim 1, wherein the electroplated grindstone is set to 600 Hv or more by heat curing treatment.
【請求項3】下記工程a〜eを全て有することを特徴と
する電着砥石の製造方法。 a.砥粒層形成面が導電性を有する砥石基体をNi電解
めっき浴に浸漬し、前記砥粒層形成面上に超砥粒を分散
配置したうえ、前記砥粒層形成面に前記超砥粒の平均粒
径の5〜20%の厚さのNi電解めっき相を析出させて
超砥粒を仮固定する。 b.前記砥石基体を、Pを添加したNi無電解めっき浴
に浸漬し、前記平均粒径の30〜100%の厚さのNi
−P無電解めっき相を前記Ni電解めっき相上に析出さ
せて超砥粒を埋設して第1層を形成する。 c.砥石基体を再びNi電解めっき浴に浸漬し、第n−
1層(nは2以上の整数)の超砥粒の間に、同じ平均粒
径を有する超砥粒を新たに分散配置したうえ、第n−1
層のNi−P無電解めっき相上に、前記平均粒径の5〜
20%の厚さのNi電解めっき相を析出させて超砥粒を
仮固定する。 d.砥石基体を、Pを添加したNi無電解めっき浴に再
び浸漬し、前記平均粒径の30〜100%の厚さのNi
−P無電解めっき相を、第n−1層のNi電解めっき相
の上に析出させて超砥粒を埋設して第n層を形成する。 e.nが所望の数になるまで、前記工程c,dを繰り返
す。
3. A method for manufacturing an electrodeposition grindstone, which comprises all of the following steps a to e. a. An abrasive grain base having an electrically conductive abrasive grain layer forming surface is immersed in a Ni electrolytic plating bath to disperse superabrasive grains on the abrasive grain layer forming surface, and to dispose the superabrasive grains on the abrasive grain layer forming surface. The Ni electroplating phase having a thickness of 5 to 20% of the average grain size is deposited to temporarily fix the superabrasive grains. b. The grindstone substrate is immersed in a Ni electroless plating bath containing P, and Ni having a thickness of 30 to 100% of the average particle diameter is used.
A -P electroless plating phase is deposited on the Ni electroplating phase and embedded with superabrasive grains to form a first layer. c. The whetstone substrate is again immersed in the Ni electrolytic plating bath to
Superabrasive grains having the same average particle diameter are newly dispersed and arranged between one layer (n is an integer of 2 or more) of superabrasive grains,
On the Ni-P electroless plating layer of the layer,
A 20% thick Ni electroplating phase is deposited to temporarily fix the superabrasive grains. d. The grindstone substrate is immersed again in a Ni electroless plating bath containing P, and Ni having a thickness of 30 to 100% of the average particle diameter is used.
The -P electroless plating phase is deposited on the Ni electrolytic plating phase of the (n-1) th layer and embedded with superabrasive grains to form the nth layer. e. The above steps c and d are repeated until n reaches a desired number.
【請求項4】前記工程a〜eを終えた後、前記砥石基体
を加熱して各層のNi−P無電解めっき相を硬質化する
ことを特徴とする請求項3記載の電着砥石の製造方法。
4. The production of an electrodeposition grindstone according to claim 3, wherein after the steps a to e are completed, the grindstone base is heated to harden the Ni-P electroless plating phase of each layer. Method.
JP04077546A 1992-03-31 1992-03-31 Electroplated whetstone and method of manufacturing the same Expired - Lifetime JP3134469B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP04077546A JP3134469B2 (en) 1992-03-31 1992-03-31 Electroplated whetstone and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04077546A JP3134469B2 (en) 1992-03-31 1992-03-31 Electroplated whetstone and method of manufacturing the same

Publications (2)

Publication Number Publication Date
JPH06254768A true JPH06254768A (en) 1994-09-13
JP3134469B2 JP3134469B2 (en) 2001-02-13

Family

ID=13637013

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3134469B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996023630A1 (en) * 1995-02-01 1996-08-08 Hiroshi Ishizuka Superabrasive electroplated cutting edge and method of manufacturing the same
JP2011245561A (en) * 2010-05-21 2011-12-08 Ngk Insulators Ltd Electroplated grinding wheel and method for producing the same
CN104526592A (en) * 2014-12-31 2015-04-22 广东工业大学 Device and method for abrasive material multilayer orderly arraying

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996023630A1 (en) * 1995-02-01 1996-08-08 Hiroshi Ishizuka Superabrasive electroplated cutting edge and method of manufacturing the same
US6098609A (en) * 1995-02-01 2000-08-08 Ishizuka; Hiroshi Superabrasive electrodeposited cutting edge and method of manufacturing the same
JP2011245561A (en) * 2010-05-21 2011-12-08 Ngk Insulators Ltd Electroplated grinding wheel and method for producing the same
CN104526592A (en) * 2014-12-31 2015-04-22 广东工业大学 Device and method for abrasive material multilayer orderly arraying

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