JPH06254734A - Xy stage device and linear motor used for it - Google Patents

Xy stage device and linear motor used for it

Info

Publication number
JPH06254734A
JPH06254734A JP5066197A JP6619793A JPH06254734A JP H06254734 A JPH06254734 A JP H06254734A JP 5066197 A JP5066197 A JP 5066197A JP 6619793 A JP6619793 A JP 6619793A JP H06254734 A JPH06254734 A JP H06254734A
Authority
JP
Japan
Prior art keywords
stage
linear motor
moving
base
movable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5066197A
Other languages
Japanese (ja)
Inventor
Shigeo Sakino
茂夫 崎野
Shigeto Kamata
重人 鎌田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP5066197A priority Critical patent/JPH06254734A/en
Publication of JPH06254734A publication Critical patent/JPH06254734A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25Movable or adjustable work or tool supports
    • B23Q1/44Movable or adjustable work or tool supports using particular mechanisms
    • B23Q1/56Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism
    • B23Q1/60Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism
    • B23Q1/62Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides
    • B23Q1/621Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides a single sliding pair followed perpendicularly by a single sliding pair
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q5/00Driving or feeding mechanisms; Control arrangements therefor
    • B23Q5/22Feeding members carrying tools or work
    • B23Q5/28Electric drives
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Jigs For Machine Tools (AREA)
  • Machine Tool Units (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Linear Motors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Specific Conveyance Elements (AREA)

Abstract

PURPOSE:To improve the positioning precision of an XY stage device and accelerate the positioning speed. CONSTITUTION:An XY stage device E1 is constituted of a Y stage 4 reciprocatable along the guide face 8a of a guide member 8 fixed to a base plate 1 and an X stage 7 reciprocatable together with it and reciprocatable along the guide face of a center member 4c. The Y stage 4 is moved by a pair of Y linear motors 2, 3, and the X stage 7 is moved by a pair of X linear motors 5 supported by the Y stage 4 along the center member 4c of the Y stage 4. The Y stage 4 and the X stage 7 are supported on the base plate 1 via individual static pressure bearing pads respectively.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体露光装置、精密
測定器あるいは精密加工機等においてウエハ等基板、被
加工物あるいは被測定物等を位置決めするためのXYス
テージ装置およびこれに用いるリニアモータに関するも
のである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an XY stage device for positioning a substrate such as a wafer, an object to be processed or an object to be measured in a semiconductor exposure apparatus, a precision measuring device or a precision processing machine, and a linear motor used therefor. It is about.

【0002】[0002]

【従来の技術】半導体露光装置、精密測定器あるいは精
密加工機等においては、露光されるウエハ等基板や、被
測定物あるいは被加工物を、露光光や測定用の照明光あ
るいは工具に対して高精度で位置決めすることが要求さ
れる。このために、図16に示すようなXYステージ装
置が開発されている。該XYステージ装置は、図示しな
い支持体によって支持された台盤101と、台盤101
に設けられた一対の案内面108a,108b上に支持
され、これに沿って摺動自在なYステージ104と、Y
ステージ104に設けられた一対の案内面104c,1
04d上に支持され、これに沿って摺動自在なXステー
ジ107からなり、Xステージ107には、図示しない
吸着チャック等の保持盤が設けられ、これによってウエ
ハ等基板や、被測定物あるいは被加工物を保持する。台
盤101の案内面108a,108bとYステージ10
4の案内面104c,104dはそれぞれ台盤104の
表面に平行な一平面内で互に直交する2軸(以下、それ
ぞれ「Y軸、X軸」という。)に沿って配設され、Yス
テージ104は、台盤101の案内面108a,108
bの外側に配設された図示しないリニアモータ等の駆動
装置によってY軸方向に往復移動され、Xステージ10
7は、その下面に配設された図示しないリニアモータ等
の駆動装置によってX軸方向に往復移動される。
2. Description of the Related Art In a semiconductor exposure apparatus, a precision measuring device, a precision processing machine, etc., a substrate such as a wafer to be exposed, an object to be measured or an object to be processed is exposed to exposure light, illumination light for measurement or a tool High precision positioning is required. For this reason, an XY stage device as shown in FIG. 16 has been developed. The XY stage device includes a base 101 supported by a support (not shown), and a base 101.
A Y stage 104 that is supported on a pair of guide surfaces 108a and 108b provided on the
A pair of guide surfaces 104c, 1 provided on the stage 104
04d, which is composed of an X stage 107 that is slidable along the 04d, is provided with a holding plate such as a suction chuck (not shown), which allows a substrate such as a wafer, an object to be measured, or an object to be measured. Hold the work piece. Guide surfaces 108a and 108b of the base 101 and the Y stage 10
The four guide surfaces 104c and 104d are arranged along two axes (hereinafter, respectively referred to as "Y-axis and X-axis") orthogonal to each other in one plane parallel to the surface of the base 104, and the Y stage. Reference numeral 104 denotes guide surfaces 108a, 108 of the base 101.
It is reciprocally moved in the Y-axis direction by a driving device (not shown) such as a linear motor arranged outside b,
7 is reciprocally moved in the X-axis direction by a driving device such as a linear motor (not shown) provided on the lower surface thereof.

【0003】[0003]

【発明が解決しようとする課題】しかしながら上記従来
の技術によれば、Yステージが台盤の案内面上に摺動自
在に支持され、また、Yステージの案内面上にXステー
ジが摺動自在に支持された2重構造であるため、X軸と
Y軸を含む平面に垂直な軸(以下、「Z軸」という。)
の方向の寸法が大きいうえに、以下の理由で保持盤の位
置決め精度の向上や高速化が障げられている。
However, according to the above-mentioned conventional technique, the Y stage is slidably supported on the guide surface of the base, and the X stage is slidable on the guide surface of the Y stage. Since it is a double structure supported by, an axis perpendicular to a plane including the X axis and the Y axis (hereinafter, referred to as “Z axis”).
In addition to the large dimension in the direction of, the improvement of the positioning accuracy and the speedup of the holding plate are hindered for the following reasons.

【0004】(1)図14の(a)および(b)に示す
ように、Yステージ104上でXステージ107がX軸
方向に往復移動することにより、Yステージ104に荷
重の偏りが発生し、これによってYステージ104が変
形する。その結果、Xステージ107が傾斜して位置決
め精度が損われる。
(1) As shown in FIGS. 14 (a) and 14 (b), when the X stage 107 reciprocates on the Y stage 104 in the X-axis direction, a load deviation occurs on the Y stage 104. As a result, the Y stage 104 is deformed. As a result, the X stage 107 tilts and the positioning accuracy is impaired.

【0005】(2)XステージとYステージの移動によ
ってXYステージ装置全体の重心が繰返し変動するた
め、図15に示すように、XステージおよびYステージ
にそれぞれピッチング(進行方向の軸に対する傾斜)、
ローリング(進行方向の軸のまわりの回動)およびヨー
イング(Z軸のまわりの回動)、およびX軸、Y軸およ
びZ軸のそれぞれの方向に振動が発生し、前述のように
2重構造であるために、Xステージに発生した振動はす
べてYステージに伝達され、また、Yステージの振動も
Xステージに伝達される。XステージおよびYステージ
を高速度で振動させると、これらの振動が増幅され、位
置決め精度が著しく低下する。
(2) Since the center of gravity of the entire XY stage device is repeatedly changed by the movement of the X stage and the Y stage, as shown in FIG. 15, pitching (inclination with respect to the axis of the traveling direction) on the X stage and the Y stage, respectively.
Vibration is generated in the rolling (rotation around the axis in the traveling direction) and yawing (rotation around the Z axis), and in the respective directions of the X axis, the Y axis, and the Z axis, and the double structure as described above. Therefore, all the vibration generated in the X stage is transmitted to the Y stage, and the vibration of the Y stage is also transmitted to the X stage. When the X stage and the Y stage are vibrated at high speed, these vibrations are amplified and the positioning accuracy is significantly reduced.

【0006】また、XステージおよびYステージを駆動
する駆動装置がリニアモータである場合には、高速化に
伴って発熱量が増加するため、図12および図13に示
すようにリニアモータコイル121の両端の長尺部材1
23,124のみに冷却管123a,124aを設けた
だけでは冷却量が不足し、コイル温度が上昇するととも
に、発生した熱が雰囲気中に放出され、リニアモータコ
イル121や移動部材120のみならず、XYステージ
装置全体あるいはこれに載置されたウエハ等基板、被測
定物または被加工物等が熱変形を起こし、位置決め精度
が低下するおそれがある。
Further, when the driving device for driving the X stage and the Y stage is a linear motor, the amount of heat generated increases as the speed increases, so that the linear motor coil 121 of the linear motor coil 121 as shown in FIGS. Long member 1 at both ends
Only by providing the cooling pipes 123a and 124a only to 23 and 124, the cooling amount becomes insufficient, the coil temperature rises, and the generated heat is released into the atmosphere, not only the linear motor coil 121 and the moving member 120, The entire XY stage device or a substrate such as a wafer mounted on the XY stage device, an object to be measured or an object to be processed may be thermally deformed, and the positioning accuracy may be deteriorated.

【0007】本発明は、上記従来の技術の有する未解決
の課題に鑑みてなされたものであって、位置決め精度を
向上させ、位置決めを高速化できるXYステージ装置お
よびこれに用いるリニアモータを提供することを目的と
するものである。
The present invention has been made in view of the above-mentioned unsolved problems of the prior art, and provides an XY stage device capable of improving the positioning accuracy and accelerating the positioning, and a linear motor used therefor. That is the purpose.

【0008】[0008]

【課題を解決するための手段】上記の目的を達成するた
めに本発明のXYステージ装置は、台盤と、該台盤と一
体である第1の案内面に沿って往復移動自在な第1の移
動体と、これを移動させる第1の駆動手段と、前記第1
の移動体とともに移動自在でありかつ該移動体に設けら
れた第2の案内面に沿って往復移動自在である第2の移
動体と、該第2の移動体を前記第2の案内面に沿って移
動させる第2の駆動手段からなり、前記第1および前記
第2の移動体がそれぞれ個別に前記台盤上に支持されて
いることを特徴とする。
In order to achieve the above object, the XY stage device of the present invention is a first and second movable XY stage device which is movable back and forth along a base and a first guide surface which is integral with the base. Moving body, first driving means for moving the moving body, and the first
Second moving body that is movable together with the moving body and that is reciprocable along a second guide surface provided on the moving body, and the second moving body on the second guide surface. It is characterized in that it comprises a second driving means for moving along, and the first and second moving bodies are individually supported on the base.

【0009】また、第1の駆動手段が、それぞれ第1の
移動体の両側に結合された一対の駆動装置からなり、第
2の駆動手段が、それぞれ第2の移動体の幅方向の異な
る部位に結合された複数の駆動装置から構成されてい
る。
Further, the first driving means is composed of a pair of driving devices which are respectively coupled to both sides of the first moving body, and the second driving means is different in the width direction of the second moving body. It is composed of a plurality of driving devices coupled to each other.

【0010】さらに、第1および第2の移動体がそれぞ
れ台盤と第1および第2の案内面に対して静圧軸受手段
によって非接触に保持されている。
Further, the first and second moving bodies are held in non-contact with the base and the first and second guide surfaces by hydrostatic bearing means, respectively.

【0011】本発明の各XYステージ装置に用いられる
リニアモータは、XYステージ装置に用いるリニアモー
タであって、固定部材と、これに対向して移動自在であ
る移動部材を有し、前記固定部材の磁気手段と、前記移
動部材の磁気手段のうちの少くとも一方が、他方に対向
する表面に冷却手段を有することを特徴とする。
The linear motor used in each XY stage device of the present invention is a linear motor used in an XY stage device, and has a fixed member and a movable member that is movable facing the fixed member. And at least one of the magnetic means of the moving member has a cooling means on the surface facing the other.

【0012】[0012]

【作用】上記の装置によれば、第1の移動体と第2の移
動体がそれぞれ個別に台盤上に支持されているため、両
者がそれぞれ第1および第2の手段によって移動すると
きに台盤上に発生する荷重の偏りを軽減し、振動を防ぐ
ことができる。また、2重構造でないために寸法の縮小
も容易である。
According to the above apparatus, since the first moving body and the second moving body are individually supported on the base, when they are moved by the first and second means, respectively. It is possible to reduce the bias of the load generated on the base and prevent vibration. Further, since the structure is not double, the size can be easily reduced.

【0013】また、第1の駆動手段が、それぞれ第1の
移動体の両側に結合された一対の駆動装置からなり、第
2の駆動手段が、それぞれ第2の移動体の幅方向の異な
る部位に結合された複数の駆動装置から構成されていれ
ば、第1および第2の移動体のそれぞれのピッチングあ
るいはヨーイングを効果的に防ぐことができる。
Further, the first driving means is composed of a pair of driving devices which are respectively coupled to both sides of the first moving body, and the second driving means is different in the width direction of the second moving body. If it is composed of a plurality of driving devices coupled to each other, it is possible to effectively prevent pitching or yawing of each of the first and second moving bodies.

【0014】また、第1および第2の移動体がそれぞれ
台盤と第1および第2の案内面に対して静圧軸受手段に
よって非接触に保持されていれば、第1および第2の移
動体の間およびこれらと台盤の間の振動の伝達を防止あ
るいは軽減できる。
If the first and second moving bodies are held in non-contact with the base plate and the first and second guide surfaces by the hydrostatic bearing means, respectively, the first and second moving bodies can be moved. It is possible to prevent or reduce the transmission of vibration between the body and between these and the base.

【0015】また、上記リニアモータは、移動部材や固
定部材の熱変形を防ぐとともに、雰囲気に放出される熱
量を減少させることで周囲の装置の熱変形を防ぐ。
Further, the linear motor prevents thermal deformation of the moving member and fixed member, and also prevents thermal deformation of surrounding devices by reducing the amount of heat released to the atmosphere.

【0016】[0016]

【実施例】本発明の実施例を図面に基づいて説明する。Embodiments of the present invention will be described with reference to the drawings.

【0017】図1は一実施例を示す斜視図であって、本
実施例のXYステージ装置E1 は、図示しない支持盤上
に固定された台盤1と、台盤1の両端にそれぞれ配設さ
れた第1の駆動手段である一対のYリニアモータ2,3
と、これらによって、互に直交する2軸(以下、それぞ
れ「X軸、Y軸」という。)の一方であるY軸の方向に
往復移動される略H形の枠体からなる第1の移動体であ
るYステージ4と、図示上下方向に重なり合ってYステ
ージ4に支持された第2の駆動手段である一対のXリニ
アモータ5,6(下方のXリニアモータ6は図3に示
す)と、これらによってX軸の方向に往復移動される第
2の移動体であるXステージ7からなる。Xステージ7
は、X軸およびY軸を含む平面に平行な表面を有する板
状体7aを有し、該板状体7aには図示しない吸着チャ
ック等の保持盤が載置される。
FIG. 1 is a perspective view showing an embodiment. An XY stage device E 1 of the present embodiment has a base 1 fixed on a support plate (not shown) and both ends of the base 1. A pair of Y linear motors 2 and 3 which are the first driving means provided.
And a first movement including a substantially H-shaped frame reciprocally moved in the Y-axis direction, which is one of two axes (hereinafter, referred to as “X-axis and Y-axis”, respectively) orthogonal to each other. A Y stage 4 which is a body, and a pair of X linear motors 5 and 6 (second X linear motor 6 shown below is shown in FIG. 3) which are second driving means and which are supported by the Y stage 4 so as to overlap each other in the vertical direction in the figure. The X stage 7 is a second moving body that is reciprocally moved in the X axis direction by these elements. X stage 7
Has a plate-shaped body 7a having a surface parallel to a plane including the X-axis and the Y-axis, and a holding plate such as a suction chuck (not shown) is placed on the plate-shaped body 7a.

【0018】台盤1は、Xステージ7の板状体7aの表
面に平行な表面1aを有し、その一端にはY軸方向にの
びる案内部材8が設けられ、案内部材8は、台盤1の一
対の端縁1b,1cのうちの一方に一体的に結合されて
おり、その側面の一つは、台盤1の表面1aの端縁から
X軸およびY軸を含む平面に直交する軸(以下、「Z
軸」という。)に沿って立設された第1の案内面である
案内面8aを構成する。
The base 1 has a surface 1a parallel to the surface of the plate-shaped body 7a of the X stage 7, and a guide member 8 extending in the Y-axis direction is provided at one end of the base 1a. One of the pair of end edges 1b and 1c is integrally coupled, and one of the side surfaces thereof is orthogonal to the plane including the X axis and the Y axis from the end edge of the surface 1a of the base 1. Axis (hereinafter "Z
Axis. ), The guide surface 8a which is the first guide surface is provided.

【0019】一方のYリニアモータ2は案内部材8の外
側に一体的に設けられたYリニアモータコイル2aとこ
れに沿って移動する移動部材2bからなり、他方のYリ
ニアモータ3は台盤1の他方の端縁1cに一体的に設け
られたYリニアモータコイル3aとこれに沿って移動す
る移動部材3bからなり、各Yリニアモータ2,3の移
動部材2b,3bは、連結板2c,3cによってYステ
ージ4の平行部材4a,4bに一体的に結合されてい
る。
One Y linear motor 2 comprises a Y linear motor coil 2a integrally provided outside the guide member 8 and a moving member 2b which moves along the Y linear motor coil 2a, and the other Y linear motor 3 is the base 1 The Y linear motor coil 3a integrally provided on the other end edge 1c of the above and a moving member 3b moving along the Y linear motor coil 3a. The moving members 2b and 3b of the Y linear motors 2 and 3 are connected to the connecting plate 2c, It is integrally connected to the parallel members 4a and 4b of the Y stage 4 by 3c.

【0020】図2に示すように、Yステージ4の平行部
材4a,4bのうちで案内部材8に隣接する側の平行部
材4aは案内部材8の案内面8aに対向する静圧軸受手
段である静圧軸受パッド9を有し、また、各平行部材4
a,4bは図示下端に台盤1の表面1aに対向する静圧
軸受手段である静圧軸受パッド10a,10bを有す
る。Yステージ4は、前記平行部材4a,4bと両端を
これらと一体的に結合された中央部材4cからなり、中
央部材4cは、図3に示すように、U字形の断面をも
つ。
As shown in FIG. 2, of the parallel members 4a and 4b of the Y stage 4, the parallel member 4a on the side adjacent to the guide member 8 is a hydrostatic bearing means facing the guide surface 8a of the guide member 8. It has a hydrostatic bearing pad 9 and also each parallel member 4
The a and 4b have hydrostatic bearing pads 10a and 10b which are hydrostatic bearing means facing the surface 1a of the base 1 at the lower end of the figure. The Y stage 4 is composed of the parallel members 4a and 4b and a central member 4c whose both ends are integrally connected to each other. The central member 4c has a U-shaped cross section as shown in FIG.

【0021】Xステージ7は、前述の板状体7aと、そ
の下面に一体的に結合された断面U字形の下枠7bから
なり、下枠7bは、板状体7aとの間にYステージ4の
中央部材4cを挿通自在な空間を形成し、下枠7bの内
面には、Yステージ4の中央部材4cの両側面のそれぞ
れに設けられた第2の案内面である案内面4d,4eに
それぞれ対向する静圧軸受手段である静圧軸受パッド1
1a,11bが設けられている。すなわち、Xステージ
7の下枠7bは、気体の静圧によってYステージ4の中
央部材4cの各側面に向って逆方向に付勢され、その結
果、Xステージ7は、Yステージ4がY軸方向に移動す
るときにこれとともに同方向へ移動する。また、下枠7
bの下面には、台盤1の表面1aに対向する一対の静圧
軸受手段である静圧軸受パッド12a,12bが保持さ
れている。
The X stage 7 is composed of the above-mentioned plate-like body 7a and a lower frame 7b having a U-shaped cross section integrally connected to the lower surface thereof, and the lower frame 7b is provided between the plate-like body 7a and the Y stage. 4 forms a space through which the central member 4c can be inserted, and the inner surfaces of the lower frame 7b are guide surfaces 4d and 4e, which are second guide surfaces provided on both side surfaces of the central member 4c of the Y stage 4, respectively. Hydrostatic bearing pad 1 which is a hydrostatic bearing means facing each other
1a and 11b are provided. That is, the lower frame 7b of the X stage 7 is biased in the opposite direction toward each side surface of the central member 4c of the Y stage 4 by the static pressure of the gas, and as a result, the X stage 7 moves the Y stage 4 in the Y axis direction. When moving in the same direction, it moves in the same direction. Also, the lower frame 7
Hydrostatic bearing pads 12a and 12b, which are a pair of hydrostatic bearing means facing the surface 1a of the base 1, are held on the lower surface of b.

【0022】各Xリニアモータ5,6は、両端をYステ
ージ4の中央部材4cに一体的に結合されたXリニアモ
ータコイル5a,6aと、これに沿って移動する移動部
材5b,6bからなり、その一方はXステージ7の板状
体7aの下面に直接固着されており、他方は支持部材7
cによって板状体7aから懸下されている。
Each of the X linear motors 5 and 6 comprises X linear motor coils 5a and 6a whose both ends are integrally connected to the central member 4c of the Y stage 4, and moving members 5b and 6b which move along the X linear motor coils 5a and 6a. , One of which is directly fixed to the lower surface of the plate-shaped body 7a of the X stage 7, and the other is the support member 7
It is suspended from the plate 7a by c.

【0023】両Yリニアモータ2,3が駆動されると、
Yステージ4は、Xステージ7とともに、案内部材8の
案内面8aに沿ってY軸方向へ移動し、両Xリニアモー
タ5,6が駆動されると、Xステージ7はYステージ4
の中央部材4cの案内面4d,4eに沿ってX軸方向へ
移動する。Yステージ4およびXステージ7は、それぞ
れの下端に設けられた静圧軸受パッド10a,10bお
よび12a,12bによって個別に台盤1の表面1aに
非接触で支持されており、両Yリニアモータ2,3およ
び両Xリニアモータ5,6を同時に駆動することによ
り、Xステージ7の板状体7aに保持された吸着チャッ
ク等の保持盤を高速度で位置決めすることができる。
When both Y linear motors 2 and 3 are driven,
The Y stage 4 moves in the Y-axis direction along with the X stage 7 along the guide surface 8a of the guide member 8, and when both X linear motors 5 and 6 are driven, the X stage 7 will move to the Y stage 4
The central member 4c moves in the X-axis direction along the guide surfaces 4d and 4e. The Y stage 4 and the X stage 7 are individually supported by the hydrostatic bearing pads 10a, 10b and 12a, 12b provided at the lower ends of the Y stage 4 and the X stage 7 on the surface 1a of the base 1 in a non-contact manner. , 3 and both X linear motors 5 and 6 are simultaneously driven, so that a holding plate such as a suction chuck held by the plate-shaped body 7a of the X stage 7 can be positioned at high speed.

【0024】前述のようにYステージ4およびXステー
ジ7はそれぞれ個別に台盤1上に支持されているため、
Xステージ7のX軸方向の移動によってYステージ4に
大きな荷重の偏りが発生し、そのためにYステージ4が
変形してXステージ7が傾斜するおそれがない。
As described above, since the Y stage 4 and the X stage 7 are individually supported on the base 1,
Due to the movement of the X stage 7 in the X-axis direction, a large load deviation occurs in the Y stage 4, so that there is no possibility that the Y stage 4 deforms and the X stage 7 tilts.

【0025】また、Yステージ4とXステージ7のそれ
ぞれの移動によってXYステージ装置全体の重心の位置
が変動して様々な振動を発生するが、Xステージ7のX
軸方向およびZ軸方向の振動とピッチングは、Xステー
ジ7がその下枠7cの内面の静圧軸受パッド11a,1
1bによってYステージ4の中央部材4cを挟持してい
るためYステージ4に伝達されるおそれが皆無である。
また、Xステージ7のローリングは下枠7aの下端の静
圧軸受パッド12a,12bによって大部分が吸収され
て直ちに減衰され、Xステージ7のピッチングおよびヨ
ーイングは、一対のXリニアモータ5,6を配設するこ
とで大幅に軽減され、さらに、Yステージ4のヨーイン
グは、Yステージ4の両側縁にYリニアモータ2,3を
配設することで大幅に軽減される。また、Yステージの
ピッチングは、静圧軸受パッド11a,11bによって
大きく軽減されてXステージに伝達される。
Further, the movement of the Y stage 4 and the X stage 7 causes the position of the center of gravity of the entire XY stage apparatus to fluctuate, which causes various vibrations.
In the axial and Z-axis vibrations and pitching, the X stage 7 uses the hydrostatic bearing pads 11a, 1 on the inner surface of the lower frame 7c thereof.
Since the central member 4c of the Y stage 4 is sandwiched by 1b, there is no possibility of being transmitted to the Y stage 4.
Further, the rolling of the X stage 7 is mostly absorbed by the hydrostatic bearing pads 12a and 12b at the lower end of the lower frame 7a and immediately damped, and the pitching and yawing of the X stage 7 are performed by the pair of X linear motors 5 and 6. By disposing the Y stage 4, the yawing of the Y stage 4 is greatly reduced by disposing the Y linear motors 2 and 3 on both side edges of the Y stage 4. Further, the pitching of the Y stage is greatly reduced by the hydrostatic bearing pads 11a and 11b and transmitted to the X stage.

【0026】なお、Yリニアモータ2,3およびXリニ
アモータ5,6に替えて、公知の油圧直流モータ等を用
いることもできることは言うまでもない。
Needless to say, a known hydraulic DC motor or the like can be used instead of the Y linear motors 2 and 3 and the X linear motors 5 and 6.

【0027】図4は本実施例の一変形例を示すもので、
本変形例は、一対のXリニアモータを上下に重なりあっ
て配設する替わりに、一対のXリニアモータ15,16
のそれぞれの移動部材15b,16bをXステージ17
の板状体17aの下面に直接固着する一方、第3のXリ
ニアモータ18の移動部材18bを支持部材17cによ
ってXステージ17の板状体17aから両Xリニアモー
タ15,16の間を通って懸下する。これによって、X
ステージ17のほぼ全幅に均一な推進力を発生させ、X
ステージ17のピッチングとヨーイングをより効果的に
軽減することができる。なお、各Xリニアモータ15,
16,18のXリニアモータコイル15a,16a,1
8aは、その両端をYステージの中央部材14cに結合
されている。
FIG. 4 shows a modification of this embodiment.
In this modification, instead of arranging a pair of X linear motors vertically on top of each other, a pair of X linear motors 15 and 16 are arranged.
The moving members 15b and 16b of the
While being directly fixed to the lower surface of the plate-shaped body 17a, the moving member 18b of the third X linear motor 18 is passed between the plate-shaped body 17a of the X stage 17 and the X linear motors 15 and 16 by the support member 17c. To hang. By this, X
A uniform propulsion force is generated over almost the entire width of the stage 17, and X
The pitching and yawing of the stage 17 can be reduced more effectively. In addition, each X linear motor 15,
16, 18 X linear motor coils 15a, 16a, 1
Both ends of 8a are connected to the central member 14c of the Y stage.

【0028】本実施例のXYステージ装置の位置決めを
高速化するには、YリニアモータおよびXリニアモータ
を高速度で駆動することが必要である。そこで、各Yリ
ニアモータおよび各Xリニアモータに、図5ないし図7
に示すような、リニアモータコイルの冷却を強化したリ
ニアモータM1 を用いることが望ましい。リニアモータ
1 は、図5にその断面を示すように、方形断面を有す
る箱形の移動部材20と、これを貫通する固定部材であ
るリニアモータコイル21からなり、移動部材20は互
に対向する一対の内面に一対の磁気手段である永久磁石
20a,20bを有し、リニアモータコイル21は、図
7に示すように、各永久磁石20a,20bに平行であ
る表面22a,22bを有する複数の磁気手段である環
状部材22と、各環状部材22の両側縁をそれぞれ保持
する一対の長尺部材23,24からなるコイル本体25
と、コイル本体25の両面を覆う冷却ジャケット26か
らなる。冷却ジャケット26は、コイル本体25の両面
をそれぞれ覆う一対の冷却板27,28および両者の各
端に配設された一対の分流板29,30を有し、各冷却
板27,28は、複数の互に平行な内部流路27a,2
8aを備えており、各内部流路27a,28aを流れる
冷媒によってコイル本体25の両面を冷却する。また、
各長尺部材23,24も内部流路23a,24aを有
し、これを流れる冷媒は、各環状部材22の端面を冷却
する。一方の分流板29は一対の分流室29a,29b
を有し、他方の分流板30も同様の分流室を有する。ま
た、一方の分流板29は両分流室29a,29bに連通
する供給管29cを有し、他方の分流板30は両分流室
に連通する排出管30cを有する。
In order to speed up the positioning of the XY stage device of this embodiment, it is necessary to drive the Y linear motor and the X linear motor at a high speed. Therefore, in each Y linear motor and each X linear motor, as shown in FIG.
It is desirable to use a linear motor M 1 having enhanced cooling of the linear motor coil as shown in FIG. As shown in the cross section of FIG. 5, the linear motor M 1 includes a box-shaped moving member 20 having a rectangular cross section and a linear motor coil 21 that is a fixed member that penetrates the box-shaped moving member 20. The moving members 20 face each other. As shown in FIG. 7, the linear motor coil 21 has a plurality of surfaces 22a, 22b parallel to the permanent magnets 20a, 20b. A coil body 25 including an annular member 22 which is a magnetic means and a pair of long members 23 and 24 which hold both side edges of each annular member 22, respectively.
And a cooling jacket 26 covering both sides of the coil body 25. The cooling jacket 26 has a pair of cooling plates 27 and 28 respectively covering both surfaces of the coil body 25, and a pair of flow distribution plates 29 and 30 arranged at each end of both, and each cooling plate 27, 28 is plural. Internal flow paths 27a, 2 parallel to each other
8a, and both sides of the coil body 25 are cooled by the refrigerant flowing through the internal flow paths 27a and 28a. Also,
Each of the elongated members 23, 24 also has internal flow paths 23a, 24a, and the refrigerant flowing therein cools the end surface of each annular member 22. One of the flow dividing plates 29 has a pair of flow dividing chambers 29a and 29b.
And the other flow dividing plate 30 also has a similar flow dividing chamber. Further, one flow dividing plate 29 has a supply pipe 29c that communicates with both the flow dividing chambers 29a and 29b, and the other flow dividing plate 30 has an exhaust pipe 30c that communicates with both the flow dividing chambers.

【0029】供給管29cから一方の分流板29に供給
された冷媒は、その分流室29a,29bを経て各冷却
板27,28の内部流路27a,28aへ供給され、コ
イル本体25の各環状部材22の両面を冷却したのち、
他方の分流板30の分流室30a,30bに集められ、
排出管30cから排出される。
The refrigerant supplied from the supply pipe 29c to one of the flow dividing plates 29 is supplied to the internal flow passages 27a and 28a of the cooling plates 27 and 28 through the flow dividing chambers 29a and 29b, and the respective annular shapes of the coil body 25. After cooling both sides of the member 22,
Collected in the flow dividing chambers 30a and 30b of the other flow dividing plate 30,
It is discharged from the discharge pipe 30c.

【0030】リニアモータM1 は、移動部材20の永久
磁石20a,20bに対向するリニアモータコイル21
の両面を覆う冷却ジャケット26によって冷却するもの
であるため、リニアモータコイル21に発生する熱の大
部分を効果的に回収する。従って、リニアモータコイル
21のコイル本体25あるいは移動部材20の温度が著
しく上昇するおそれはない。また、コイル本体25の周
囲の雰囲気に放出される熱量を低減し、XYステージや
これに保持された基板や、被測定物、被加工物等の温度
上昇を防ぐことができる。
The linear motor M 1 includes a linear motor coil 21 facing the permanent magnets 20a and 20b of the moving member 20.
Since it is cooled by the cooling jacket 26 that covers both surfaces of the above, most of the heat generated in the linear motor coil 21 is effectively recovered. Therefore, there is no possibility that the temperature of the coil body 25 of the linear motor coil 21 or the moving member 20 will rise significantly. In addition, the amount of heat released to the atmosphere around the coil body 25 can be reduced, and the temperature rise of the XY stage, the substrate held by the XY stage, the workpiece, the workpiece, and the like can be prevented.

【0031】なお、内部流路27a,28aを有する冷
却板27,28の替わりに、図8に示すように、細管4
7aを平板状に束ねた冷却板47や、図9の(a)に示
すように、1個の平板状の内部流路57aを有する中空
の冷却板57や、図9の(b)に示すように、片面に凹
所58aを有し、コイル本体25の各面に装着したとき
にこれとともに内部流路を構成する冷却板58を用いる
こともできる。
In place of the cooling plates 27, 28 having the internal flow paths 27a, 28a, as shown in FIG.
A cooling plate 47 formed by bundling 7a in a flat plate shape, a hollow cooling plate 57 having one flat plate-shaped internal flow path 57a as shown in FIG. 9A, and a cooling plate shown in FIG. 9B. As described above, it is possible to use the cooling plate 58 which has the recess 58a on one surface and which, when mounted on each surface of the coil body 25, forms the internal flow path together with the recess 58a.

【0032】また、冷却ジャケットによってリニアモー
タコイルのコイル本体の両面を覆う替わりに、移動部材
の各永久磁石のリニアモータコイルに対する表面を冷却
ジャケットによって覆うこともできる。
Further, instead of covering both sides of the coil body of the linear motor coil with the cooling jacket, the surface of each permanent magnet of the moving member with respect to the linear motor coil may be covered with the cooling jacket.

【0033】なお、図10および図11に示すように、
ボイスコイルモータB1 のコイルにリニアモータM1
同様に磁場を横ぎる冷却ジャケットを設ければ、リニア
モータM1 と同じくコイルの冷却を強化することができ
る。ボイスコイルモータB1は、磁性体からなる中心軸
61および円筒部材62と、環状の磁石63からなる移
動部材64と、中心軸61と円筒部材62の間の環状空
間に配設された円筒コイル65からなり、円筒コイル6
5は、冷却ジャケット66によってその表面を覆われて
おり、冷却ジャケット66は、一対の円筒状の冷却板6
7,68と、その両端に配設された一対の分流板69,
70からなり、一方の分流板69は供給管69cを有
し、他方の分流板70は排出管70cを有する。冷却板
67,68および分流板69,70の他の点については
前述の冷却板27,28および分流板29,30と同様
であるので説明は省略する。
As shown in FIGS. 10 and 11,
By providing the transverse Gill cooling jacket a magnetic field similar to the voice coil motor B 1 coil linear motor M 1, can also enhance the cooling of the coil and the linear motor M 1. The voice coil motor B 1 includes a central shaft 61 and a cylindrical member 62 made of a magnetic material, a moving member 64 made of an annular magnet 63, and a cylindrical coil arranged in an annular space between the central shaft 61 and the cylindrical member 62. Consisting of 65, cylindrical coil 6
5 has its surface covered with a cooling jacket 66, and the cooling jacket 66 includes a pair of cylindrical cooling plates 6
7, 68 and a pair of flow dividing plates 69 arranged at both ends thereof,
70, one flow dividing plate 69 has a supply pipe 69c, and the other flow dividing plate 70 has a discharge pipe 70c. The other points of the cooling plates 67, 68 and the flow dividing plates 69, 70 are the same as those of the cooling plates 27, 28 and the flow dividing plates 29, 30 described above, and thus the description thereof will be omitted.

【0034】[0034]

【発明の効果】本発明は上述のとおり構成されているの
で、以下に記載するような効果を奏する。ウエハ等基
板、被加工物あるいは被測定物を露光装置、精密加工機
あるいは精密測定器に対して位置決めするに当り、位置
決め精度の向上および位置決めの高速化が容易である。
Since the present invention is configured as described above, it has the following effects. When positioning a substrate such as a wafer, an object to be processed or an object to be measured with respect to an exposure apparatus, a precision processing machine or a precision measuring instrument, it is easy to improve the positioning accuracy and speed up the positioning.

【0035】請求項1に記載された発明は、XYステー
ジ装置の荷重の偏りを軽減することで位置決め精度を向
上させ、かつ、振動を防ぐことで位置決めの高速化を容
易にする。
The invention described in claim 1 improves the positioning accuracy by reducing the bias of the load of the XY stage device, and facilitates the speeding up of the positioning by preventing vibration.

【0036】請求項5に記載された発明は、XYステー
ジ装置を駆動するリニアモータの発熱によるXYステー
ジ装置およびその周囲の装置の熱変形を防ぐことで位置
決め精度を向上させ、位置決めの高速化を促進する。
The invention described in claim 5 improves the positioning accuracy and speeds up the positioning by preventing thermal deformation of the XY stage device and its surrounding devices due to heat generation of the linear motor that drives the XY stage device. Facilitate.

【図面の簡単な説明】[Brief description of drawings]

【図1】一実施例のXYステージ装置を示す斜視図であ
る。
FIG. 1 is a perspective view showing an XY stage device of an embodiment.

【図2】図1の装置を、両Yリニアモータを取りはずし
た状態で示す模式立面図である。
FIG. 2 is a schematic elevational view showing the device of FIG. 1 with both Y linear motors removed.

【図3】図1のA−A線に沿ってとった部分断面図であ
る。
3 is a partial cross-sectional view taken along the line AA of FIG.

【図4】本実施例の一変形例を示す部分断面図である。FIG. 4 is a partial cross-sectional view showing a modified example of the present embodiment.

【図5】一実施例のリニアモータを示す模式断面図であ
る。
FIG. 5 is a schematic cross-sectional view showing a linear motor of one embodiment.

【図6】図5のリニアモータのリニアモータコイルを示
す斜視図である。
6 is a perspective view showing a linear motor coil of the linear motor of FIG.

【図7】図6のリニアモータコイルの分解斜視図であ
る。
7 is an exploded perspective view of the linear motor coil of FIG.

【図8】冷却板の一変形例を示す斜視図である。FIG. 8 is a perspective view showing a modified example of the cooling plate.

【図9】冷却板の別の2つの変形例を示すもので、
(a)は中空の板状体からなる冷却板、(b)は片面に
凹所を有する板状体からなる冷却板をそれぞれ示す斜視
図である。
FIG. 9 shows another two modified examples of the cooling plate,
FIG. 3A is a perspective view showing a cooling plate made of a hollow plate-shaped body, and FIG. 6B is a perspective view showing a cooling plate made of a plate-shaped body having a recess on one surface.

【図10】ボイスコイルモータを示す模式断面図であ
る。
FIG. 10 is a schematic cross-sectional view showing a voice coil motor.

【図11】図10のボイスコイルモータの移動部材を示
す分解斜視図である。
11 is an exploded perspective view showing a moving member of the voice coil motor of FIG.

【図12】リニアモータの従来例を示す模式斜視図であ
る。
FIG. 12 is a schematic perspective view showing a conventional example of a linear motor.

【図13】図12のリニアモータの断面図である。13 is a sectional view of the linear motor of FIG.

【図14】従来例のXステージが傾く理由を説明するも
ので、(a)はXステージがYステージの中央にある場
合、(b)はXステージがYステージの一端へ移動した
場合をそれぞれ示す説明図である。
14A and 14B are diagrams for explaining the reason why the X stage of the conventional example is tilted. FIG. 14A shows the case where the X stage is in the center of the Y stage, and FIG. 14B shows the case where the X stage moves to one end of the Y stage. It is an explanatory view shown.

【図15】Xステージの振動を説明する図である。FIG. 15 is a diagram illustrating vibration of the X stage.

【図16】従来例のXYステージ装置を示す模式斜視図
である。
FIG. 16 is a schematic perspective view showing an XY stage device of a conventional example.

【符号の説明】[Explanation of symbols]

1 台盤 2,3 Yリニアモータ 4 Yステージ 4c,14c 中央部材 4d,4e,8a 案内面 5,6,15,16,18 Xリニアモータ 7,17 Xステージ 8 案内部材 9,10a,10b,11a,11b,12a,12b
静圧軸受パッド 20 移動部材 20a,20b 永久磁石 21 リニアモータコイル 22 環状部材 23,24 長尺部材 25 コイル本体 26,66 冷却ジャケット 27,28,47,48,57,58,67,68
冷却板 29,30,69,70 分流板 63 磁石 64 移動部材
1 platform 2,3 Y linear motor 4 Y stage 4c, 14c central member 4d, 4e, 8a guide surface 5,6,15,16,18 X linear motor 7,17 X stage 8 guide member 9,10a, 10b, 11a, 11b, 12a, 12b
Hydrostatic bearing pad 20 Moving member 20a, 20b Permanent magnet 21 Linear motor coil 22 Annular member 23, 24 Long member 25 Coil body 26,66 Cooling jacket 27,28,47,48,57,58,67,68
Cooling plate 29, 30, 69, 70 Flow distribution plate 63 Magnet 64 Moving member

フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 B65G 49/07 9244−3F G03F 9/00 H 7316−2H H01L 21/027 21/68 K 8418−4M H02K 41/02 C 7346−5H // B65G 47/90 A 8010−3F Continuation of the front page (51) Int.Cl. 5 Identification number Reference number within the agency FI Technical display location B65G 49/07 9244-3F G03F 9/00 H 7316-2H H01L 21/027 21/68 K 8418-4M H02K 41 / 02 C 7346-5H // B65G 47/90 A 8010-3F

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 台盤と、該台盤と一体である第1の案内
面に沿って往復移動自在な第1の移動体と、これを移動
させる第1の駆動手段と、前記第1の移動体とともに移
動自在でありかつ該移動体に設けられた第2の案内面に
沿って往復移動自在である第2の移動体と、該第2の移
動体を前記第2の案内面に沿って移動させる第2の駆動
手段からなり、前記第1および前記第2の移動体がそれ
ぞれ個別に前記台盤上に支持されていることを特徴とす
るXYステージ装置。
1. A base, a first movable body that is reciprocally movable along a first guide surface that is integral with the base, a first drive unit that moves the movable body, and the first movable body. A second movable body that is movable together with the movable body and is reciprocally movable along a second guide surface provided on the movable body; and the second movable body along the second guide surface. An XY stage apparatus comprising a second driving unit for moving the first and second moving bodies, each of which is individually supported on the base.
【請求項2】 第1の駆動手段が、それぞれ第1の移動
体の両側に結合された一対の駆動装置からなり、第2の
駆動手段が、それぞれ第2の移動体の幅方向の異なる部
位に結合された複数の駆動装置からなることを特徴とす
る請求項1記載のXYステージ装置。
2. The first driving means is composed of a pair of driving devices respectively coupled to both sides of the first moving body, and the second driving means is different in the width direction of the second moving body. The XY stage apparatus according to claim 1, wherein the XY stage apparatus comprises a plurality of driving devices coupled to each other.
【請求項3】 第1および第2の移動体がそれぞれ台盤
と第1および第2の案内面に対して静圧軸受手段によっ
て非接触に保持されていることを特徴とする請求項1ま
たは2記載のXYステージ装置。
3. The first and second moving bodies are held in non-contact with the base and the first and second guide surfaces by hydrostatic bearing means, respectively. The XY stage device according to 2.
【請求項4】 第2の案内面が第1の移動体の側面に設
けられており、これに向って第2の移動体が付勢されて
いることを特徴とする請求項1ないし3いずれか1項記
載のXYステージ装置。
4. The second guide surface is provided on a side surface of the first moving body, and the second moving body is urged toward the side surface of the first moving body. An XY stage device according to the item 1.
【請求項5】 XYステージ装置に用いるリニアモータ
であって、固定部材と、これに対向して移動自在である
移動部材を有し、前記固定部材の磁気手段と、前記移動
部材の磁気手段のうちの少くとも一方が、他方に対向す
る表面に冷却手段を有することを特徴とするリニアモー
タ。
5. A linear motor used in an XY stage apparatus, comprising: a fixed member and a moving member facing the movable member, the magnetic means of the fixed member and the magnetic means of the moving member. A linear motor, characterized in that at least one of them has a cooling means on the surface facing the other.
【請求項6】 冷却手段が冷却ジャケットであることを
特徴とする請求項5記載のリニアモータ。
6. The linear motor according to claim 5, wherein the cooling means is a cooling jacket.
JP5066197A 1993-03-02 1993-03-02 Xy stage device and linear motor used for it Pending JPH06254734A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5066197A JPH06254734A (en) 1993-03-02 1993-03-02 Xy stage device and linear motor used for it

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5066197A JPH06254734A (en) 1993-03-02 1993-03-02 Xy stage device and linear motor used for it

Publications (1)

Publication Number Publication Date
JPH06254734A true JPH06254734A (en) 1994-09-13

Family

ID=13308887

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH06254734A (en)

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