JPH06232326A - Package for semiconductor device and its preparation - Google Patents

Package for semiconductor device and its preparation

Info

Publication number
JPH06232326A
JPH06232326A JP5298001A JP29800193A JPH06232326A JP H06232326 A JPH06232326 A JP H06232326A JP 5298001 A JP5298001 A JP 5298001A JP 29800193 A JP29800193 A JP 29800193A JP H06232326 A JPH06232326 A JP H06232326A
Authority
JP
Japan
Prior art keywords
die pad
semiconductor device
package
adhesive
holes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5298001A
Other languages
Japanese (ja)
Inventor
Hyeon-Jo Jeong
ヒェオン−ジョ ジェオン、
Fumei Fumei
秉 石 宋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of JPH06232326A publication Critical patent/JPH06232326A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/02Containers; Seals
    • H01L23/04Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L24/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/3205Shape
    • H01L2224/32057Shape in side view
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8338Bonding interfaces outside the semiconductor or solid-state body
    • H01L2224/83385Shape, e.g. interlocking features
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/73Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Lead Frames For Integrated Circuits (AREA)
  • Die Bonding (AREA)

Abstract

PURPOSE: To improve a bonding strength between a lead frame and a molding resin by forming a plurality of through-holes in a mosaic array in a die pad and forming its through-hole section as recessed lower than a top surface of the die pad. CONSTITUTION: A die pad 30 is formed therein with a multiplicity of through- holes 32, arranged in a mosaic array. Then a part of the pad corresponding to the entire through-holes 32 forms a swaging space 33 thereon in the pad. A suitable amount of conductive adhesive agent is dropped on a stepped part 35, which is formed at an outer peripheral surface of the swaging space 33 with use of a dotting tool. Next, a semiconductor chip is compressed under a constant load, while heat is applied to the pad to harden the adhesive. At this time, the adhesive is compressed to spread onto the entire top surface of the stepped part 35 and partly flow into the swaging space 33 lower than the stepped part 35. Accordingly, a bonding strength between a lead frame and molding resin can be improved.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、半導体装置用パッケ
ージ及びその製造方法に関し、さらに詳しくは、リード
フレームのダイパッドに貫通ホール及びスエージング空
間を形成してリードフレームとモールド樹脂との間の接
着力を向上させ、ダイ接着工程から接着剤の流れ溢れる
ことを防止できる半導体装置用パッケージ及びその製造
方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device package and a method of manufacturing the same, and more particularly, to forming a through hole and a swaging space in a die pad of a lead frame to bond the lead frame and a molding resin. The present invention relates to a semiconductor device package capable of improving force and preventing overflow of an adhesive from a die bonding process, and a method for manufacturing the same.

【0002】[0002]

【従来の技術】電子機器の軽薄短小化要求及び高集積度
化要求により、半導体集積回路の微細加工技術を用いた
高集積ディバイスが開発されている。
2. Description of the Related Art In response to the demand for lighter, thinner, shorter and smaller electronic devices and the demand for higher integration, highly integrated devices using fine processing technology for semiconductor integrated circuits have been developed.

【0003】半導体集積回路の集積度増加は、半導体チ
ップの大きさの増加及び多ピン化を随伴するようにな
る。したがって、電子製品の小型軽量化に沿った実装の
合理化のためには半導体パッケージの開発が重要な課題
になっている。
As the degree of integration of semiconductor integrated circuits increases, the size of semiconductor chips increases and the number of pins increases. Therefore, development of a semiconductor package has become an important issue in order to rationalize the mounting of electronic products along with the reduction in size and weight.

【0004】現在までの半導体パッケージ技術は小形薄
型化及び高機能化を目指して推進されており、このよう
な傾向にしたがって、従来の挿入形パッケージから高密
度実装のための表面実装形のパッケージに転換が図ら
れ、効率面で多くの進歩を見せている。
The semiconductor packaging technology up to the present time has been promoted with the aim of miniaturization, thinning, and high functionality. In accordance with such a trend, the conventional insertion type package is changed to the surface mounting type package for high density mounting. It has been transformed and has made a lot of progress in terms of efficiency.

【0005】前記表面実装形パッケージ、例えばTSO
P(Thin Small Outline Package)などは、その厚さが
非常に薄く、重さも従来のSOJ(Small Outline J-Be
nd Package)に比べて1/3と重くないが、それ故また
パッケージ設計及び材料の選択など製造工程上の多くの
問題点がある。
The surface mount package, eg TSO
P (Thin Small Outline Package) etc. are very thin and weigh the conventional SOJ (Small Outline J-Be).
nd Package) is not as heavy as 1/3, but there are many problems in the manufacturing process such as package design and material selection.

【0006】特に、リードフレームとモールド樹脂との
界面形成による接着力の減少及びパッケージクラックが
発生される問題点がある。
In particular, there are problems that the adhesive force is reduced and package cracks are generated due to the formation of the interface between the lead frame and the molding resin.

【0007】すなわち、高集積化による半導体チップの
大きさの巨大化のため、一定の大きさの範囲内よりリー
ドフレームのダイパッドの面積が大きくなると、ダイパ
ッドとモールド樹脂との結合力が悪くなってVPS(Va
por Phase Soldering )のときに多くの不良が発生され
る。
That is, when the area of the die pad of the lead frame becomes larger than a certain size due to the increase in the size of the semiconductor chip due to the high integration, the bonding force between the die pad and the molding resin becomes poor. VPS (Va
Many defects occur during por phase soldering.

【0008】このような問題点を内包する従来の表面実
装形パッケージにおいて、パッケージクラック及び接着
力減少に対応した対策として、リードフレームにディン
プル、貫通ホールを形成するなど種々の方法が適用さ
れ、モールド樹脂との接着力向上が図られている。
In the conventional surface mount type package having such a problem, various methods such as forming dimples and through holes in the lead frame are applied as a countermeasure against the package crack and the decrease in the adhesive force, and the mold is molded. The adhesive strength with resin is improved.

【0009】図4(a)は従来技術のディンプルを形成
した半導体装置のリードフレームの平面図であり、図4
(b)は図4(a)のリードフレームを用いた半導体装
置用パッケージの断面図である。このような半導体装置
用リードフレームは、半導体チップを搭載するためのダ
イパッド10だけ図示されている。ダイパッド10周囲
の内部リード及び外部リードなどは説明の適宜上図示し
なかった。
FIG. 4A is a plan view of a lead frame of a semiconductor device in which a dimple according to the prior art is formed.
FIG. 4B is a sectional view of a semiconductor device package using the lead frame of FIG. In such a lead frame for a semiconductor device, only a die pad 10 for mounting a semiconductor chip is shown. The internal leads and the external leads around the die pad 10 are not shown in the drawings for convenience of description.

【0010】前記半導体装置用リードフレームのダイパ
ッド10には、一定の形状及び深みを持つ多数個のディ
ンプル12が規則的に配列形成されている。これらのデ
ィンプル12は、リードフレームの製作後、化学物質を
用いた半エッチング工程により、半導体チップが搭載さ
れるダイパッド10の底面に形成される。
On the die pad 10 of the semiconductor device lead frame, a large number of dimples 12 having a constant shape and depth are regularly arranged. These dimples 12 are formed on the bottom surface of the die pad 10 on which the semiconductor chip is mounted by a semi-etching process using a chemical substance after the lead frame is manufactured.

【0011】また、図4(b)に示したごとく、ダイパ
ッド10の上面に接着剤14を媒介して半導体チップ1
6が接着されており、前記半導体チップ16とリード1
8とは金Auなどの微細金属線であるボンディングワイ
ヤ17で結線されている。そして前記構造の全体はモー
ルド樹脂19でモールディングされている。
Further, as shown in FIG. 4B, the semiconductor chip 1 is bonded to the upper surface of the die pad 10 with an adhesive agent 14.
6 is bonded to the semiconductor chip 16 and the lead 1
8 is connected by a bonding wire 17 which is a fine metal wire such as gold Au. The entire structure is molded with the molding resin 19.

【0012】上記のような構造は、ダイパッド10の底
面にエッチング工程に形成された多数個のディンプル1
2によりモールディングコンパウンドが充填されてダイ
パッド10とモールド樹脂19との接着力は多少強化さ
れる。
The above structure has a large number of dimples 1 formed on the bottom surface of the die pad 10 in the etching process.
The molding compound 2 is filled by 2 and the adhesive force between the die pad 10 and the mold resin 19 is somewhat strengthened.

【0013】しかし、このようなエッチング工程により
形成されるディンプルを有する半導体装置の製造方法に
おいては、ディンプル12の形状が不完全だとか、大き
さが小さい場合にモールド樹脂19とリードフレームと
の結合力が落ちる問題点がある。
However, in the method of manufacturing a semiconductor device having dimples formed by such an etching process, when the shape of the dimples 12 is incomplete or the size thereof is small, the mold resin 19 and the lead frame are bonded together. There is a problem of weakness.

【0014】また、前記半導体装置の製造方法はスタン
ピングリードフレームでは製作できないため、スタンピ
ングリードフレームに比べて生産性が劣りまた製造原価
が高いエッチングリードフレームでのみ製作するしかな
く、大量生産に適合しないという問題点がある。
In addition, since the method of manufacturing a semiconductor device cannot be manufactured by using a stamping lead frame, the semiconductor device can only be manufactured by using an etching lead frame, which is inferior in productivity to the stamping lead frame and has a high manufacturing cost, which is not suitable for mass production. There is a problem.

【0015】一方、量産性が優秀なスタンピングリード
フレームでディンプルの代わりに多数の貫通ホールを形
成する方法も良く使われている。この方法に使われる貫
通ホール23a,23bそれぞれが形成されたリードフ
レーム20a,20bの例を各図5(a)及び図5
(b)に示した。
On the other hand, a method of forming a large number of through holes instead of dimples in a stamping lead frame which is excellent in mass productivity is also often used. Examples of the lead frames 20a and 20b having through holes 23a and 23b used in this method are shown in FIGS.
It is shown in (b).

【0016】このようなスタンピングによる貫通ホール
23a,23bを形成する半導体装置の製造方法は半導
体チップとモールド樹脂との密着性低下に起因して、貫
通ホール23a,23bの部位からパッケージクラック
を誘発されることがある。また、このような方法は、ダ
イ接着工程から接着剤が貫通ホール23a,23bを通
じて流れることによる、また半導体チップとダイパッド
との間隔が狭い場合には接着剤がダイパッドの外部へ過
多に流れあふれることによる信頼性低下の問題がある。
In the method of manufacturing a semiconductor device in which the through holes 23a and 23b are formed by such stamping, package cracks are induced from the portions of the through holes 23a and 23b due to a decrease in adhesion between the semiconductor chip and the molding resin. Sometimes. In addition, in such a method, the adhesive flows from the die bonding process through the through holes 23a and 23b, and when the gap between the semiconductor chip and the die pad is narrow, the adhesive excessively overflows to the outside of the die pad. Therefore, there is a problem that reliability is deteriorated.

【0017】[0017]

【発明が解決しようとする課題】従って、この発明の目
的は、リードフレームとモールド樹脂との間の接着力を
向上させることができる半導体装置用パッケージを提供
することにある。
SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a semiconductor device package which can improve the adhesive force between the lead frame and the molding resin.

【0018】この発明の他の目的は、ダイ接着工程にお
いて接着剤が流れ溢れることを防止できる半導体装置用
パッケージの製造方法を提供することにある。
Another object of the present invention is to provide a method of manufacturing a semiconductor device package which can prevent the adhesive from overflowing in the die bonding step.

【0019】[0019]

【課題を解決するための手段】前記目的を達成するため
に、この発明は、ダイパッドに複数個のリードを備えた
リードフレームと、前記ダイパットの上に接着剤を媒介
して搭載された半導体チップと、この半導体チップと前
記複数個のリードとを結線する複数個のボンディングワ
イヤと、前記複数個のリードの一部を除外した前記構造
の全体を封止するモールド樹脂とを備える半導体装置用
パッケージにおいて、前記リードフレームが、ダイパッ
ドにモザイク状に形成された複数個の貫通ホールと、前
記複数個の貫通ホールが配列されている部分を前記ダイ
パッドの上面より低く陥没させて形成することにより形
成されるスエージング空間と、前記スエージング空間の
外周面に所定の幅を持つ段差とを具備することを特徴と
する。
To achieve the above object, the present invention provides a lead frame having a plurality of leads on a die pad, and a semiconductor chip mounted on the die pad through an adhesive. And a plurality of bonding wires for connecting the semiconductor chip and the plurality of leads, and a mold resin for sealing the entire structure excluding a part of the plurality of leads. In the above, the lead frame is formed by forming a plurality of through holes formed in a mosaic shape in the die pad and a portion in which the plurality of through holes are arranged, lower than the upper surface of the die pad. And a step having a predetermined width on the outer peripheral surface of the swaging space.

【0020】また、別のこの発明に係る半導体装置用パ
ッケージの製造方法においては、スタンピング方法によ
りダイパッドの上面にモザイク状の複数個の貫通ホール
を形成し、これら貫通ホールの表面が前記ダイパッドの
表面より陥没されるようにスエージング空間を形成し、
それぞれ前記貫通ホールとスエージング空間と同一な高
さで形成された段差を備えたリードフレームを準備する
工程と、この工程のあとにスエージング空間の外周面に
成形された段差の上部にドッティングツールを使って適
定量の導伝性接着剤を落とす工程と、この工程のあとに
半導体チップをダイパッドの上面に実装するダイ接着工
程と、この工程のあとにモールディングコンパウンドで
ダイパッド及び半導体チップをモールディングするモー
ルディング工程とを含むことを特徴とする。
In another method for manufacturing a semiconductor device package according to the present invention, a plurality of mosaic through holes are formed on the upper surface of the die pad by a stamping method, and the surfaces of these through holes are the surfaces of the die pad. Form a swaging space so that it will be more depressed,
A step of preparing lead frames each having a step formed at the same height as the through hole and the swaging space, and after this step, dotting on the step formed on the outer peripheral surface of the swaging space A step of dropping a suitable amount of conductive adhesive with a tool, a die bonding step of mounting the semiconductor chip on the upper surface of the die pad after this step, and a molding compound after this step to mold the die pad and the semiconductor chip. And a molding step.

【0021】[0021]

【作用】上記構成に係るパッケージ及びその製造方法に
よれば、ダイパッドに複数個の貫通ホール及びスエージ
ング空間を形成しているため、半導体チップをダイパッ
ドの上面に実装するダイ接着工程のときに、接着剤は段
差上部の全面にわたりひろがりながら一部は段差下部の
スエージング空間側へ流れるため、接着剤が流れ溢れる
ことを防止でき、エポキシカバリッジを向上し、半導体
チップ底面の空間の減少及びリードフレームとモールド
樹脂との間の接着力の向上を図ることができる。
According to the package and the method of manufacturing the same having the above structure, since a plurality of through holes and swaging spaces are formed in the die pad, during the die bonding step of mounting the semiconductor chip on the upper surface of the die pad, The adhesive spreads over the entire top surface of the step while part of it flows to the swaging space side below the step, which prevents the adhesive from overflowing, improving the epoxy coverage, reducing the space on the bottom surface of the semiconductor chip, and reducing the leads. It is possible to improve the adhesive force between the frame and the molding resin.

【0022】[0022]

【実施例】以下、添付した図面を参照してこの発明によ
る半導体装置用パッケージ及びその製造方法の一実施例
を詳細に説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a semiconductor device package and a method of manufacturing the same according to the present invention will be described in detail below with reference to the accompanying drawings.

【0023】図1(a)及び図1(b)は、この発明に
よる半導体装置用パッケージの製造方法に用いられるリ
ードフレームを示した図面であって、図1(a)はリー
ドフレームの平面図であり、図1(b)は図1(a)の
A−A’線断面図である。
1 (a) and 1 (b) are drawings showing a lead frame used in a method for manufacturing a semiconductor device package according to the present invention. FIG. 1 (a) is a plan view of the lead frame. FIG. 1B is a sectional view taken along the line AA ′ of FIG.

【0024】図1(a)に示すように、この発明に用い
られるリードフレームは、半導体チップが付着されるダ
イパッド30が中央に配置されて固定用バ−31により
支持されており、ダイパッド30の両側に多数個のリー
ド31aが配列されている。
As shown in FIG. 1A, in the lead frame used in the present invention, a die pad 30 to which a semiconductor chip is attached is arranged at the center and is supported by a fixing bar 31. A large number of leads 31a are arranged on both sides.

【0025】前記ダイパッド30には、モザイク状に配
列された多数個の貫通ホール32が形成されている。こ
こで、貫通ホール32は、その形状が円形や多角形など
の様々な形状に変形が可能で、特に限定されるものでは
ない。
The die pad 30 has a large number of through holes 32 arranged in a mosaic pattern. Here, the through-hole 32 is not limited to a particular shape, as it can be modified into various shapes such as a circle and a polygon.

【0026】そして、多数個の貫通ホール32が形成さ
れている部分全体にはスエージング空間33が形成され
ている。
A swaging space 33 is formed in the entire portion where a large number of through holes 32 are formed.

【0027】前記リードフレームの製作は、まず、ダイ
パッド30にスタンピング加工で多数個の貫通ホール3
2を形成し、その後、多数個の貫通ホール32全体が十
分にカバーされるようにダイパッド30の上面をプレス
加工してスエージング空間33を形成してなされる。
The lead frame is manufactured by first stamping the die pad 30 into a large number of through holes 3.
2 is formed, and then the upper surface of the die pad 30 is pressed so that the entire large number of through holes 32 are sufficiently covered to form the swaging space 33.

【0028】前記スエージング空間33の形成後のリー
ドフレームの形状は、図1(b)に示すように、モザイ
ク形状に多数個の貫通ホール32が配列されている部分
の上面に元来のダイパッド30の厚さより低く陥没され
て現われるスエージング空間33が形成され、スエージ
ング空間33の外周面へ所定の幅を持つ段差35が形成
されたものとなっている。
The shape of the lead frame after the formation of the swaging space 33 is, as shown in FIG. 1B, the original die pad on the upper surface of the portion where a large number of through holes 32 are arranged in a mosaic shape. A swaging space 33 that is recessed and appears to be lower than the thickness of 30 is formed, and a step 35 having a predetermined width is formed on the outer peripheral surface of the swaging space 33.

【0029】図2(a)は、この実施例に係る図1
(a),(b)に示した半導体装置用リードフレームを
用いた半導体パッケージの断面図であり、図2(b)は
図2(a)の要部拡大図である。
FIG. 2 (a) is a schematic diagram of FIG. 1 according to this embodiment.
It is sectional drawing of the semiconductor package which used the lead frame for semiconductor devices shown to (a), (b), and FIG. 2 (b) is a principal part enlarged view of FIG. 2 (a).

【0030】図2(a)に示したごとく、多数個の貫通
ホール32,スエージング空間33,段差35が形成さ
れたダイパッド30上に半導体チップ36が接着剤34
を媒介して搭載されている。半導体チップ36は、金線
などのボンディングワイヤ37によりリード38と連結
されている。
As shown in FIG. 2A, a semiconductor chip 36 is attached with an adhesive 34 on a die pad 30 having a large number of through holes 32, a swaging space 33 and a step 35.
It is installed through the media. The semiconductor chip 36 is connected to the leads 38 by bonding wires 37 such as gold wires.

【0031】このように、半導体チップ36がボンディ
ングされたリードフレームは、エポキシなどのモールド
樹脂39でモールディングされている。
As described above, the lead frame to which the semiconductor chip 36 is bonded is molded with the molding resin 39 such as epoxy.

【0032】上記構造の半導体装置は、モールド樹脂3
9がモザイク形状で配列された多数個の貫通ホール32
及び半導体チップ36の下部のスエージング空間33の
全体に埋め合わせられて、リードフレームとモールド樹
脂39との間を強制に結束している。
The semiconductor device having the above structure has the mold resin 3
Numerous through holes 32 in which 9 are arranged in a mosaic shape
Also, the entire swaging space 33 below the semiconductor chip 36 is filled up, and the lead frame and the molding resin 39 are forcibly bound together.

【0033】このような、半導体装置の製造方法を図3
(a)乃至図3(c)の接合工程図を参照して簡略に説
明する。
FIG. 3 shows a method of manufacturing such a semiconductor device.
A brief description will be given with reference to the joining process diagrams of FIGS.

【0034】まず、図3(a)を参照すれば、前述した
ごとく、多数個の貫通ホール32,スエージング空間3
3,段差35(図3(c))が形成されたリードフレー
ムを準備し、スエージング空間33の外周面に形成され
た段差35の上部にドッティングツールを使って適定量
の導伝性の接着剤34を落とす。
First, referring to FIG. 3A, as described above, a large number of through holes 32 and the swaging space 3 are provided.
3. Prepare a lead frame on which a step 35 (FIG. 3C) is formed, and use a dotting tool on the upper part of the step 35 formed on the outer peripheral surface of the swaging space 33 to obtain an appropriate amount of conductivity. The adhesive 34 is dropped.

【0035】ここで、前記接着剤34としては、導伝性
が優秀な銀Agを主成分として作ったシルバーエポキシ
が使用される。また、前記接着剤34として、エポキシ
系あるいはポリイミド系の樹脂、また、導伝性,熱伝導
性,機械的特性などを改善する目的で銀やシリカ、アル
ミニウムフィルタなどが添加された合成樹脂も使用する
ことができる。
Here, as the adhesive 34, silver epoxy having silver Ag, which has excellent conductivity, as a main component is used. Further, as the adhesive 34, an epoxy-based or polyimide-based resin, or a synthetic resin added with silver, silica, an aluminum filter or the like for the purpose of improving conductivity, thermal conductivity, mechanical properties, etc. is also used. can do.

【0036】その次に、オーブンや高周波炉を用いて熱
を加えて接着剤を硬化させながら半導体チップ36を一
定荷重に圧搾するが、この際、接着剤34は圧搾されて
段差35上部の全面にわたりひろがりながら一部は段差
35下部のスエージング空間33側へ流れるため、従来
の場合のように接着剤が貫通ホールを通じて流れるとか
ダイパッド30の外部へ過多に流れ溢れるというような
事がない。
Next, the semiconductor chip 36 is squeezed to a constant load while applying heat to cure the adhesive using an oven or a high frequency oven. At this time, the adhesive 34 is squeezed and the entire surface of the upper portion of the step 35 is squeezed. Since a part of the adhesive flows to the swaging space 33 side below the step 35 while spreading over, the adhesive does not flow through the through hole or excessively overflow to the outside of the die pad 30 unlike the conventional case.

【0037】そして、このような方法によれば、段差3
5の上部にだけ接着剤34を使用するため接着剤34で
あるエポキシのカバリッジを向させることができる。
According to such a method, the step 3
Since the adhesive 34 is used only on the upper part of 5, the epoxy cover which is the adhesive 34 can be oriented.

【0038】すなわち、従来、ドッティングールの設計
が不正確でエポキシカバリッジが良好になされなかった
場合があったが、この実施例のように半導体チップ36
の底面とダイパッド30との間に形成された空間によっ
て、界面薄利現象を防止することができるものである。
That is, in the past, there were cases where the design of the dotting tool was incorrect and the epoxy coverage was not good, but as in this embodiment, the semiconductor chip 36 was used.
The thin space phenomenon can be prevented by the space formed between the bottom surface of the die pad and the die pad 30.

【0039】従って、ダイ接着工程あとの結果的構造
は、図3(b)及び図3(c)に示すようになることを
知ることができる。最終的にダイ接着工程あとにモール
ディングコンパウンドでモールドして、半導体装置の製
造方法が完遂される。
Therefore, it can be seen that the resulting structure after the die bonding step is as shown in FIGS. 3 (b) and 3 (c). Finally, after the die bonding step, molding is performed with a molding compound to complete the method for manufacturing a semiconductor device.

【0040】なお、この発明の技術的思想が外れない範
囲内で、この実施例に限定されず多様な変更を加えるこ
とが可能であることは言うまでもない。
Needless to say, the present invention is not limited to this embodiment and various changes can be made without departing from the technical idea of the present invention.

【0041】[0041]

【発明の効果】以上、説明したように、この発明に係る
半導体装置用パッケージ及びその製造方法によれば、ダ
イパッドに複数個の貫通ホール及びスエージング空間を
形成することにより、エポキシカバリッジを向上し、接
着剤の過多溢れを防止し、半導体チップ底面の空間の減
少及びリードフレームとモールド樹脂との間の接着力の
向上を図ることができ、量産性を高め信頼性を向上する
ことができる。
As described above, according to the semiconductor device package and the method of manufacturing the same according to the present invention, a plurality of through holes and a swaging space are formed in the die pad to improve the epoxy coverage. However, it is possible to prevent the adhesive from overflowing excessively, to reduce the space on the bottom surface of the semiconductor chip and to improve the adhesive force between the lead frame and the molding resin, which can enhance the mass productivity and improve the reliability. .

【0042】また、この発明に係る半導体装置用パッケ
ージの製造方法によれば、ダイパッドに複数個の貫通ホ
ール及びスエージング空間を形成した後、半導体チップ
をダイパッドの上面に実装するダイ接着工程のときに、
接着剤は段差上部の全面にわたりひろがりながら一部は
段差下部のスエージング空間側へ流れるため、接着剤が
流れ溢れることを防止できる。
Further, according to the method for manufacturing a semiconductor device package of the present invention, in the die bonding step of mounting the semiconductor chip on the upper surface of the die pad after forming the plurality of through holes and the swaging space in the die pad. To
Since the adhesive spreads over the entire upper surface of the step and part of the adhesive flows toward the swaging space under the step, the adhesive can be prevented from overflowing.

【図面の簡単な説明】[Brief description of drawings]

【図1】図1(a)はこの発明による半導体装置用パッ
ケージの製造方法に用いられるリードフレームの平面図
であり、図1(b)は、図1(a)に示したA−A’線
に係る断面図である。
FIG. 1A is a plan view of a lead frame used in a method for manufacturing a semiconductor device package according to the present invention, and FIG. 1B is an AA ′ shown in FIG. It is sectional drawing which concerns on a line.

【図2】図2(a)はこの発明の実施例による半導体装
置用パッケージの断面図であり、図2(b)は、図2
(a)の要部拡大図である。
FIG. 2A is a sectional view of a semiconductor device package according to an embodiment of the present invention, and FIG.
It is a principal part enlarged view of (a).

【図3】この発明による半導体装置用パッケージの製造
工程中、特にダイ接合前後の工程を順に示すためのもの
で、図3(a)及び図3(b)は平面図、図3(c)は
断面図である。
FIG. 3 is a view for sequentially showing a process before and after die bonding during a manufacturing process of a semiconductor device package according to the present invention, and FIGS. 3 (a) and 3 (b) are plan views and FIG. 3 (c). Is a sectional view.

【図4】図4(a)は従来の半導体装置に関するもの
で、ディンプルが形成されたリードフレームの平面図で
あり、図4(b)は図4(a)のリードフレームを用い
た半導体装置用パッケージの断面図である。
4A is a plan view of a lead frame in which dimples are formed, and FIG. 4B is a semiconductor device using the lead frame of FIG. 4A. FIG. 3 is a cross-sectional view of a package for a vehicle.

【図5】図5(a)及び図5(b)は、従来技術に係る
貫通ホールが形成された半導体装置用リードフレームの
平面図である。
FIG. 5A and FIG. 5B are plan views of a lead frame for a semiconductor device in which a through hole according to a conventional technique is formed.

【符号の説明】[Explanation of symbols]

30 ダイパッド 31a リード 34 接着剤 36 半導体チップ 37 ボンディングワイヤ37 39 モールド樹脂 32 貫通ホール 33 スエージング空間 35 段差 30 Die Pad 31a Lead 34 Adhesive 36 Semiconductor Chip 37 Bonding Wire 37 39 Mold Resin 32 Through Hole 33 Swaging Space 35 Step

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 ダイパッドに複数個のリードを備えたリ
ードフレームと、前記ダイパットの上に接着剤を媒介し
て搭載された半導体チップと、この半導体チップと前記
複数個のリードとを結線する複数個のボンディングワイ
ヤと、前記複数個のリードの一部を除外した前記構造の
全体を封止するモールド樹脂とを備える半導体装置用パ
ッケージにおいて、 前記リードフレームが、ダイパッドにモザイク状に形成
された複数個の貫通ホールと、 前記複数個の貫通ホールが配列されている部分を前記ダ
イパッドの上面より低く陥没させて形成することにより
形成されるスエージング空間と、 前記スエージング空間の外周面に所定の幅を持つ段差と
を具備することを特徴とする半導体装置用パッケージ。
1. A lead frame having a plurality of leads on a die pad, a semiconductor chip mounted on the die pad via an adhesive, and a plurality of wires connecting the semiconductor chip and the plurality of leads. In a package for a semiconductor device including individual bonding wires and a mold resin that seals the entire structure excluding a part of the plurality of leads, a plurality of lead frames are formed on a die pad in a mosaic shape. A plurality of through holes, a swaging space formed by recessing a portion in which the plurality of through holes are arranged lower than the upper surface of the die pad, and a predetermined outer peripheral surface of the swaging space. A semiconductor device package comprising a step having a width.
【請求項2】 前記接着剤は、前記段差の上部に付され
ることを特徴とする請求項1記載の半導体装置用パッケ
ージ。
2. The package for a semiconductor device according to claim 1, wherein the adhesive is applied to an upper portion of the step.
【請求項3】 前記接着剤は、銀やシリカ,ないしアル
ミニウムフィルタを添加したエポキシ系樹脂またはポリ
イミド系樹脂であることを特徴とする請求項1または2
記載の半導体装置用パッケージ。
3. The adhesive is an epoxy resin or a polyimide resin added with silver, silica, or an aluminum filter.
The semiconductor device package described.
【請求項4】 前記貫通ホールの形状は円形または多角
形状であることを特徴とする請求項1記載の半導体装置
用パッケージ。
4. The package for a semiconductor device according to claim 1, wherein the shape of the through hole is circular or polygonal.
【請求項5】 前記モールド樹脂は、前記貫通ホールを
通じて前記スエージング空間内に埋め合わせられること
を特徴とする請求項1記載の半導体装置用パッケージ。
5. The package for a semiconductor device according to claim 1, wherein the mold resin is filled in the swaging space through the through hole.
【請求項6】 前記段差は、接着剤が流れ溢れることを
防止する役割をすることを特徴とする請求項1記載の半
導体装置用パッケージ。
6. The semiconductor device package according to claim 1, wherein the step has a role of preventing the adhesive from overflowing.
【請求項7】 前記リードフレームは、スタンピング加
工が可能な材料からなることを特徴とする請求項1記載
の半導体装置用パッケージ。
7. The package for a semiconductor device according to claim 1, wherein the lead frame is made of a stampable material.
【請求項8】 スタンピング方法によりダイパッドの上
面にモザイク状の複数個の貫通ホールを形成し、これら
貫通ホールの表面が前記ダイパッドの表面より陥没され
るようにスエージング空間を形成し、それぞれ前記貫通
ホールとスエージング空間と同一な高さで形成された段
差を備えたリードフレームを準備する工程と、 この工程のあとにスエージング空間の外周面に成形され
た段差の上部にドッティングツールを使って適定量の導
伝性接着剤を落とす工程と、 この工程のあとに半導体チップをダイパッドの上面に実
装するダイ接着工程と、 この工程のあとにモールディングコンパウンドでダイパ
ッド及び半導体チップをモールディングするモールディ
ング工程とを含むことを特徴とする半導体装置用パッケ
ージの製造方法。
8. A stamping method is used to form a plurality of mosaic through holes on an upper surface of a die pad, and a swaging space is formed such that the surfaces of the through holes are recessed from the surface of the die pad. A step of preparing a lead frame with a step formed at the same height as the hole and the swaging space, and after this step, using a dotting tool on the step formed on the outer peripheral surface of the swaging space And a suitable amount of conductive adhesive are removed, after this step the semiconductor chip is mounted on the upper surface of the die pad, the die bonding step, and after this step, the molding compound is used to mold the die pad and the semiconductor chip. A method of manufacturing a package for a semiconductor device, comprising:
JP5298001A 1992-12-31 1993-11-29 Package for semiconductor device and its preparation Pending JPH06232326A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1019920027634A KR940016706A (en) 1992-12-31 1992-12-31 Semiconductor package
KR1992-27634 1992-12-31

Publications (1)

Publication Number Publication Date
JPH06232326A true JPH06232326A (en) 1994-08-19

Family

ID=19348833

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5298001A Pending JPH06232326A (en) 1992-12-31 1993-11-29 Package for semiconductor device and its preparation

Country Status (2)

Country Link
JP (1) JPH06232326A (en)
KR (1) KR940016706A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1024532A3 (en) * 1999-01-28 2001-04-18 Fujitsu Limited Semiconductor device and method of producing the same
US7964942B2 (en) 2003-05-28 2011-06-21 Yamaha Corporation Lead frame having a die stage smaller than a semiconductor device and a semiconductor device using the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1024532A3 (en) * 1999-01-28 2001-04-18 Fujitsu Limited Semiconductor device and method of producing the same
US7964942B2 (en) 2003-05-28 2011-06-21 Yamaha Corporation Lead frame having a die stage smaller than a semiconductor device and a semiconductor device using the same

Also Published As

Publication number Publication date
KR940016706A (en) 1994-07-23

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