JPH06204394A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH06204394A
JPH06204394A JP4347594A JP34759492A JPH06204394A JP H06204394 A JPH06204394 A JP H06204394A JP 4347594 A JP4347594 A JP 4347594A JP 34759492 A JP34759492 A JP 34759492A JP H06204394 A JPH06204394 A JP H06204394A
Authority
JP
Japan
Prior art keywords
semiconductor device
wiring
lsi chips
lsi
chip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4347594A
Other languages
Japanese (ja)
Inventor
Yoshito Muraishi
嘉人 村石
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP4347594A priority Critical patent/JPH06204394A/en
Publication of JPH06204394A publication Critical patent/JPH06204394A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L24/23Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
    • H01L24/24Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L2224/23Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
    • H01L2224/24Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49175Parallel arrangements

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)

Abstract

PURPOSE:To increase circuit speed, reduce power consumption, miniaturize a system, and increase density by directly connecting adjacent LSI chips in a semiconductor device using a plurality of LSI chips. CONSTITUTION:An LSI chip 15 for wiring is adjacent between LSI chips 14 and 16 in a semiconductor device 10 while they are in contact or there is slight space among them and then they ate connected by a wiring layer 18 consisting of aluminum deposition layer, etc.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は基板上に複数のLSI
チップを搭載してなる半導体装置に関する。
This invention relates to a plurality of LSIs on a substrate.
The present invention relates to a semiconductor device mounted with a chip.

【0002】[0002]

【従来の技術】従来、図8に示されるように、マルチチ
ップモジュールと称される、複数のLSIチップ1をシ
リコン基板2上に搭載し、このシリコン基板2を更にセ
ラミック基板3上に搭載した半導体装置がある。
2. Description of the Related Art Conventionally, as shown in FIG. 8, a plurality of LSI chips 1 called a multi-chip module are mounted on a silicon substrate 2, and the silicon substrate 2 is further mounted on a ceramic substrate 3. There is a semiconductor device.

【0003】この半導体装置において、前記複数のLS
Iチップ1は、シリコン基板2上に形成されたアルミ配
線パターン(図示省略)にワイヤボンディングされ、更
に、該アルミ配線パターンは外部にワイヤボンディング
されている。
In this semiconductor device, the plurality of LS
The I-chip 1 is wire-bonded to an aluminum wiring pattern (not shown) formed on the silicon substrate 2, and the aluminum wiring pattern is wire-bonded to the outside.

【0004】[0004]

【発明が解決しようとする課題】上記従来の半導体装置
は、シリコン基板2上で太いアルミ配線を長く引き回し
ているために、LSIチップ1間の抵抗容量が大きくな
り、結果として消費電力の増大、処理速度の低下、コス
トの増大をもたらすという問題点がある。
In the conventional semiconductor device described above, since the thick aluminum wiring is laid long on the silicon substrate 2, the resistance capacitance between the LSI chips 1 becomes large, resulting in an increase in power consumption. There are problems that the processing speed is lowered and the cost is increased.

【0005】この発明は上記従来の問題点に鑑みて成さ
れたものであって、LSIチップ間をほぼ直結状態で結
線し、製造を簡単化すると共に、回路速度の向上、消費
電力の低減及びパッケージの小型化を図ることができる
ようにした半導体装置を提供することを目的とする。
The present invention has been made in view of the above-mentioned problems of the prior art. The LSI chips are connected in a substantially direct connection state to simplify manufacturing, improve the circuit speed, and reduce the power consumption. It is an object of the present invention to provide a semiconductor device capable of reducing the package size.

【0006】[0006]

【課題を解決するための手段】この発明は、基板上に複
数のLSIチップを載置し、各LSIチップ相互を接続
する半導体装置において、隣り合うLSIチップの間に
配線用LSIチップをほぼ接触して配置すると共に、こ
れら隣接LSIチップの配線端部を前記配線用LSIチ
ップに結線したことを特徴とする半導体装置により、上
記目的を達成するものである。
According to the present invention, in a semiconductor device in which a plurality of LSI chips are mounted on a substrate and each LSI chip is connected to each other, wiring LSI chips are almost contacted between adjacent LSI chips. The above object is achieved by a semiconductor device characterized in that the wiring ends of the adjacent LSI chips are connected to the wiring LSI chip.

【0007】又、前記隣接するLSIチップ間は、外部
への接続のためのI/Oバッファよりも小さい容量のI
/Oバッファを用いて接続するようにしてもよい。
Further, between the adjacent LSI chips, an I / O buffer having a capacity smaller than that of an I / O buffer for external connection is used.
You may make it connect using an / O buffer.

【0008】[0008]

【作用及び効果】この発明においては、隣接するLSI
チップ間が、最短距離でほぼ直結状態に結線されている
ので、製造が簡単であり、回路速度の向上、消費電力の
低減及びパッケージの小型化を図ることができる。
In the present invention, adjacent LSIs are
Since the chips are connected to each other in a direct connection state with the shortest distance, the manufacturing is simple, the circuit speed can be improved, the power consumption can be reduced, and the package can be downsized.

【0009】請求項2によれば、各LSIチップ間の接
続に、小さい容量のI/Oバッファを用いることができ
るので、更に消費電力の低減及び製造コストの低減を図
ることができる。
According to the second aspect, since the I / O buffer having a small capacity can be used for the connection between the respective LSI chips, it is possible to further reduce the power consumption and the manufacturing cost.

【0010】[0010]

【実施例】以下本発明の実施例を図面を参照して説明す
る。
Embodiments of the present invention will be described below with reference to the drawings.

【0011】図1に示されるように、この実施例に係る
半導体装置10は、基板12上に2つのLSIチップ1
4、16を搭載するものであり、両LSIチップ14、
16は、相互に接続されるべきボンディングパッドが対
向するようにして配置され、且つ、両者の間に配置され
た配線用LSIチップ15を介して結線されている。
As shown in FIG. 1, a semiconductor device 10 according to this embodiment has two LSI chips 1 on a substrate 12.
4 and 16 are mounted on both LSI chips 14,
The bonding pads 16 are arranged so that the bonding pads to be connected to each other face each other, and are connected via the wiring LSI chip 15 arranged between them.

【0012】図2に示されるように、これらのボンディ
ングパッド14A、16Aは、隣接する配線用LSIチ
ップ15のボンディングパッド15Aに接近して配置さ
れた状態で、図3に示されるように、アルミニウム蒸着
によって形成された配線層18により接続されている。
As shown in FIG. 2, these bonding pads 14A and 16A are arranged close to the bonding pad 15A of the adjacent wiring LSI chip 15, and as shown in FIG. They are connected by a wiring layer 18 formed by vapor deposition.

【0013】ここで、LSIチップ14、16と、配線
用LSIチップ15との間に少しの隙間があっても、図
4に示されるように、蒸着の際に、これらLSIチップ
14、16の対向する角部が溶けて隙間を埋めるので、
配線層18は確実に両LSIチップ14、16と配線用
LSIチップ15とを接続できる。
Here, even if there is a small gap between the LSI chips 14 and 16 and the wiring LSI chip 15, as shown in FIG. Since the opposite corners melt and fill the gap,
The wiring layer 18 can reliably connect the both LSI chips 14 and 16 and the wiring LSI chip 15.

【0014】図1の符号20は基板12から外部に出る
ピンを示す。前記LSIチップ14、16の対応するボ
ンディングパッド14B、16Bは、ピン20にワイヤ
ボンディングされている。
Reference numeral 20 in FIG. 1 denotes a pin which is exposed from the substrate 12 to the outside. The corresponding bonding pads 14B and 16B of the LSI chips 14 and 16 are wire-bonded to the pins 20.

【0015】ここで、前記LSIチップ14、16にお
ける配線用LSIチップ15に接続するためのボンディ
ングパッドは、図5に示されるように、小さいI/Oバ
ッファ22を介して設けられているのに対して、前記ピ
ン20に接続されるボンディングパッド14B、16B
は共に大きいI/Oバッファ24を介して配置されてい
る。
Here, the bonding pads for connecting to the wiring LSI chip 15 in the LSI chips 14 and 16 are provided via a small I / O buffer 22 as shown in FIG. On the other hand, the bonding pads 14B and 16B connected to the pin 20.
Are arranged via a large I / O buffer 24.

【0016】この実施例においては、隣接するLSIチ
ップ14、16間をアルミ蒸着層からなる配線層18に
よって接続しているので、配線容量が非常に小さくな
る。
In this embodiment, since the adjacent LSI chips 14 and 16 are connected by the wiring layer 18 made of the aluminum vapor deposition layer, the wiring capacitance becomes very small.

【0017】又、配線層18によって接続されるボンデ
ィングパッドは、ピン20に接続されるI/Oバッファ
24と比較して小容量のものを用いることができる。
The bonding pad connected by the wiring layer 18 may have a smaller capacity than the I / O buffer 24 connected to the pin 20.

【0018】従って、回路速度の向上、消費電力の低減
及びパッケージの小型化を図ることができる。
Therefore, it is possible to improve the circuit speed, reduce the power consumption, and reduce the size of the package.

【0019】又、隣接するLSIチップ14、16間の
接続をアルミ蒸着等により行うことができるので、製造
が簡素化される。
Further, since the connection between the adjacent LSI chips 14 and 16 can be made by aluminum vapor deposition or the like, the manufacturing is simplified.

【0020】上記実施例は、2つのLSIチップ14、
16を備えた半導体装置10についてのものであるが、
本発明はこれに限定されるものでなく、更に多数のLS
Iチップを用いた半導体装置についても当然適用される
ものである。
In the above embodiment, two LSI chips 14,
Regarding the semiconductor device 10 including 16
The present invention is not limited to this, and a large number of LS
It is naturally applied to a semiconductor device using an I chip.

【0021】例えば、図6(A)に示されるように、6
個のLSIチップ26を用いた半導体装置28にも当然
適用され得るものである。この実施例の場合、左右各3
個のLSIチップ26の間に縦方向に、配線用LSIチ
ップ27が配置されている。縦方向に隣接するLSIチ
ップ26間は配線層18によっても直接結線されてい
る。
For example, as shown in FIG.
It can be naturally applied to the semiconductor device 28 using the individual LSI chips 26. In the case of this embodiment, each of the left and right is 3
A wiring LSI chip 27 is arranged vertically between the individual LSI chips 26. The wiring layers 18 also directly connect between the LSI chips 26 adjacent in the vertical direction.

【0022】又、図6(B)に示される第3実施例の半
導体装置28Aのように6個のLSIチップ26間に縦
横に配線用LSIチップ27を配置するようにしてもよ
い。
Further, as in the semiconductor device 28A of the third embodiment shown in FIG. 6B, wiring LSI chips 27 may be arranged vertically and horizontally between the six LSI chips 26.

【0023】又、上記実施例は隣接するLSIチップの
ボンディングパッド間を接続するものであるが、本発明
はこれに限定されず、例えば、図7に示される第4実施
例のように、ボンディングパッドを省略し、LSIチッ
プ32と配線用LSIチップ34の配線32A、34A
を対向する端面まで延在させ、該端面近傍で配線層18
により接続してもよい。
In the above embodiment, the bonding pads of the adjacent LSI chips are connected to each other, but the present invention is not limited to this. For example, as in the fourth embodiment shown in FIG. Wiring 32A, 34A between the LSI chip 32 and the wiring LSI chip 34 with the pads omitted
Are extended to the opposite end face, and the wiring layer 18 is formed near the end face.
You may connect by.

【0024】なお、上記実施例において、隣接するLS
Iチップを接続する配線層18はアルミニウムの蒸着層
から構成されているが、本発明はこれに限定されるもの
でなく、要すれば、LSIチップ上に直接形成すること
ができる膜状の配線層であってもよく、又、ワイヤボン
ディング、ハンダ等の他の結線手段を用いてもよい。
In the above embodiment, the adjacent LSs are
The wiring layer 18 for connecting the I-chip is composed of a vapor-deposited layer of aluminum, but the present invention is not limited to this, and if necessary, a film-like wiring that can be directly formed on the LSI chip. It may be a layer, or other connecting means such as wire bonding or solder may be used.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る半導体装置の実施例を示す平面図FIG. 1 is a plan view showing an embodiment of a semiconductor device according to the present invention.

【図2】同実施例装置におけるボンディングパッドの位
置関係を拡大して示す平面図
FIG. 2 is an enlarged plan view showing a positional relationship of bonding pads in the apparatus of the embodiment.

【図3】同実施例のボンディングパッド間を配線層で接
続した状態を拡大して示す平面図
FIG. 3 is an enlarged plan view showing a state in which bonding pads of the embodiment are connected by a wiring layer.

【図4】同実施例の配線層部分を拡大して示す断面図FIG. 4 is an enlarged sectional view showing a wiring layer portion of the embodiment.

【図5】同実施例のI/Oバッファの配置状態を拡大し
て示す平面図
FIG. 5 is an enlarged plan view showing an arrangement state of I / O buffers of the embodiment.

【図6】本発明の第2及び第3実施例に係る半導体装置
を示す平面図
FIG. 6 is a plan view showing a semiconductor device according to second and third embodiments of the present invention.

【図7】本発明の第4実施例に係る半導体装置の要部を
拡大して示す平面図
FIG. 7 is an enlarged plan view showing an essential part of a semiconductor device according to a fourth embodiment of the invention.

【図8】従来のマルチチップモジュールを示す側面図FIG. 8 is a side view showing a conventional multi-chip module.

【符号の説明】[Explanation of symbols]

10、28、30…半導体装置 12…基板 14、16、26、32…LSIチップ 14A、16A…ボンディングパッド 15、27、34…配線用LSIチップ 18…配線層 22、24…I/Oバッファ 10, 28, 30 ... Semiconductor device 12 ... Substrate 14, 16, 26, 32 ... LSI chip 14A, 16A ... Bonding pad 15, 27, 34 ... Wiring LSI chip 18 ... Wiring layer 22, 24 ... I / O buffer

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】基板上に複数のLSIチップを載置し、各
LSIチップ相互を接続する半導体装置において、隣り
合うLSIチップの間に配線用LSIチップをほぼ接触
して配置すると共に、これら隣接LSIチップの配線端
部を前記配線用LSIチップに結線したことを特徴とす
る半導体装置。
1. In a semiconductor device in which a plurality of LSI chips are mounted on a substrate and the respective LSI chips are connected to each other, wiring LSI chips are arranged in contact with each other between adjacent LSI chips, and the adjacent LSI chips are arranged. A semiconductor device in which a wiring end portion of an LSI chip is connected to the wiring LSI chip.
【請求項2】請求項1において、前記隣接するLSIチ
ップ間は、外部への接続のためのI/Oバッファよりも
小さい容量のI/Oバッファを用いて接続したことを特
徴とする半導体装置。
2. The semiconductor device according to claim 1, wherein the adjacent LSI chips are connected by using an I / O buffer having a capacity smaller than that of an I / O buffer for external connection. .
JP4347594A 1992-12-28 1992-12-28 Semiconductor device Pending JPH06204394A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4347594A JPH06204394A (en) 1992-12-28 1992-12-28 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4347594A JPH06204394A (en) 1992-12-28 1992-12-28 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH06204394A true JPH06204394A (en) 1994-07-22

Family

ID=18391277

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4347594A Pending JPH06204394A (en) 1992-12-28 1992-12-28 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH06204394A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7443010B2 (en) * 2001-04-05 2008-10-28 Taiwan Semiconductor Manufacturing Co., Ltd. Matrix form semiconductor package substrate having an electrode of serpentine shape

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7443010B2 (en) * 2001-04-05 2008-10-28 Taiwan Semiconductor Manufacturing Co., Ltd. Matrix form semiconductor package substrate having an electrode of serpentine shape

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