JPH06137625A - Air conditioning system - Google Patents

Air conditioning system

Info

Publication number
JPH06137625A
JPH06137625A JP28723692A JP28723692A JPH06137625A JP H06137625 A JPH06137625 A JP H06137625A JP 28723692 A JP28723692 A JP 28723692A JP 28723692 A JP28723692 A JP 28723692A JP H06137625 A JPH06137625 A JP H06137625A
Authority
JP
Japan
Prior art keywords
air
air conditioning
area
conditioning system
high cleanliness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28723692A
Other languages
Japanese (ja)
Inventor
Takashi Hirose
隆 広瀬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Yamagata Ltd
Original Assignee
NEC Yamagata Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Yamagata Ltd filed Critical NEC Yamagata Ltd
Priority to JP28723692A priority Critical patent/JPH06137625A/en
Publication of JPH06137625A publication Critical patent/JPH06137625A/en
Pending legal-status Critical Current

Links

Landscapes

  • Central Air Conditioning (AREA)
  • Ventilation (AREA)

Abstract

PURPOSE:To effectually utilize a building of a semiconductor fabrication factory by eliminating an air conditioning machine chamber which does not directly contribute to fabrication of a semiconductor. CONSTITUTION:In a semiconductor fabrication factory, an air conditioner 1, which is conventionally disposed in an air conditioning machine chamber adjoining to a high purification area 8, is disposed in a return chamber 9 located below a floor of the high purification area 8. Further, in a building of the semiconductor fabrication factory, the air conditioning machine chamber is eliminated and an area of the high purification area 8 is widened for effectual utilization of the building.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、空気調和システムに関
し、特に半導体製造工場の清浄度および環境を維持する
空気調和システムに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an air conditioning system, and more particularly to an air conditioning system that maintains the cleanliness and environment of a semiconductor manufacturing plant.

【0002】[0002]

【従来の技術】図2は従来の空気調和システムの一例に
おける概要を示す図である。従来の空気調和システム
は、図2に示すように、半導体製造工場の作業室である
高清浄度エリア8に隣接して配置される空調機械室11
と、室外から空気を取入れる外気導入ダクト3とを有し
ていた。
2. Description of the Related Art FIG. 2 is a diagram showing an outline of an example of a conventional air conditioning system. As shown in FIG. 2, the conventional air conditioning system includes an air conditioning machine room 11 arranged adjacent to a high cleanliness area 8 which is a work room of a semiconductor manufacturing factory.
And the outside air introduction duct 3 for taking in air from the outside.

【0003】また、この空気調和システムの動作は外気
導入ダクト3からの外気と高清浄度エリア8内の空気を
空気吸引口5から吸気し、空気調和機1にて温度、湿
度、清浄度を調整し、消音チャンバ2,給気ダクト4を
経由して高清浄度エリア8の天井裏の均圧のエアーチャ
ンバ7へ送風する。次に、エアーチャンバ7へ送風され
た空気は、天井面に設置された吹出フィルタ6から高清
浄度エリア8へ吹き出される。
Further, the operation of this air conditioning system takes in the outside air from the outside air introduction duct 3 and the air in the high cleanliness area 8 from the air suction port 5, and the air conditioner 1 controls the temperature, humidity and cleanliness. The air is adjusted and blown through the muffling chamber 2 and the air supply duct 4 to the pressure equalizing air chamber 7 in the ceiling above the high cleanliness area 8. Next, the air blown to the air chamber 7 is blown out to the high cleanliness area 8 from the blowout filter 6 installed on the ceiling surface.

【0004】このように調整された空気は、高清浄度エ
リア8を通過する時に、室内に停留する塵や熱を奪い、
再び床10を通して床下のリターンチャンバ9へ流れ空
気吸込口5から空気調和機1に戻り循環し、常に高清浄
度エリア8の温度及び清浄度を維持していた。
When the air thus adjusted passes through the high cleanliness area 8, it deprives the dust and heat staying in the room,
It again flows through the floor 10 to the return chamber 9 under the floor, returns from the air suction port 5 to the air conditioner 1 and circulates, and always maintains the temperature and cleanliness of the high cleanliness area 8.

【0005】[0005]

【発明が解決しようとする課題】この従来の空気調和シ
ステムは、空気調和機1を高清浄度エリア8の隣に設け
られた空調機械室11に設置していたため、半導体製造
工場の建屋の一部を空調機械室11に占有され、半導体
製造の為の高清浄度エリア8が狭くなり、半導体製造工
場の建屋を有効に活用することができないという問題点
があった。
In this conventional air conditioning system, since the air conditioner 1 is installed in the air conditioning machine room 11 provided next to the high cleanliness area 8, one of the buildings of a semiconductor manufacturing factory is installed. Since the part is occupied by the air conditioning machine room 11, the high cleanliness area 8 for semiconductor manufacturing becomes narrow, and there is a problem that the building of the semiconductor manufacturing factory cannot be effectively utilized.

【0006】本発明の目的は、高清浄度エリアを広く
し、建屋の床面積を有効に利用出来る空気調和システム
を提供することである。
[0006] An object of the present invention is to provide an air conditioning system in which a high cleanliness area can be widened and a floor area of a building can be effectively used.

【0007】[0007]

【課題を解決するための手段】本発明の空気調和システ
ムは、作業室である高清浄度エリアの床下に配置されこ
の高清浄度エリアの空気及び外気を吸引するとともに正
常な温度一定の空気を供給する空気調和機を備え、正常
な温度一定の前記空気をフィルタを介して天井から前記
高清浄度エリアに圧送することを特徴としている。
The air conditioning system of the present invention is arranged under the floor of a high cleanliness area which is a working room, sucks the air and the outside air of the high cleanliness area, and at the same time, keeps the air at a constant temperature. An air conditioner for supplying the air is provided, and the air having a constant temperature is pressure-fed from the ceiling to the high cleanliness area through a filter.

【0008】[0008]

【実施例】次に、本発明について図面を参照して説明す
る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described with reference to the drawings.

【0009】1は本発明の空気調和システムの一実施例
における概要を示す図である。この空気調和システム
は、図1に示すように、空気調和機1を高清浄度エリア
8の床下であるリターンチャンバ9内に設置したことで
ある。
FIG. 1 is a diagram showing the outline of an embodiment of the air conditioning system of the present invention. In this air conditioning system, as shown in FIG. 1, the air conditioner 1 is installed in the return chamber 9 under the floor of the high cleanliness area 8.

【0010】また、その動作は従来例と同じように、ま
ず、外気導入ダクト3からの外気と空気吸込口5からの
空気を空気調和機1にて温度,湿度,清浄度を調整し、
消音チャンバ2,吸気ダクト4を経由し、高清浄度エリ
ア8の天井裏の均圧なエアーチャンバ7へ送気され、天
井面に設置された吹出フィルタ6から高清浄度エリア8
へ吹き出される。高清浄度エリア8を通過する空気は、
塵や熱を奪い床10を通して床下のリターンチャンバ9
へ流れ、再び空気吸込口5から空気調和機1に戻り循環
する。
The operation is the same as in the conventional example. First, the temperature, humidity and cleanliness of the outside air from the outside air introducing duct 3 and the air from the air intake port 5 are adjusted by the air conditioner 1.
Air is sent to a pressure-equalizing air chamber 7 behind the ceiling of the high-cleanliness area 8 via the muffling chamber 2 and the intake duct 4, and the high-cleanness area 8 is blown from the blow-out filter 6 installed on the ceiling surface.
Is blown out to. The air passing through the high cleanliness area 8 is
Dust and heat are taken away and through the floor 10, the return chamber 9 under the floor
To the air conditioner 1 for circulation again.

【0011】[0011]

【発明の効果】以上説明したように本発明は、従来、高
清浄度エリア8の隣に配置された空調機械室11を高清
浄度エリアの床下のリターンチャンバ9に設置すること
により、半導体製造工場の建屋において、本来、直接半
導体の製造に寄与しない空調機械室11の配置される室
がなくなり、半導体の製造に直接寄与する高清浄度エリ
ア8を広くすることができ、半導体製造工場の建屋を有
効に活用することができるという効果を有する。
As described above, according to the present invention, semiconductor manufacturing is conventionally performed by installing the air conditioning machine room 11 arranged next to the high cleanliness area 8 in the return chamber 9 under the floor of the high cleanliness area. In the factory building, there is no room where the air-conditioning machine room 11, which originally does not directly contribute to semiconductor manufacturing, is disposed, and the high cleanliness area 8 directly contributing to semiconductor manufacturing can be widened. It has an effect that can be effectively utilized.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の空気調和システムの一実施例における
概略を示す図である。
FIG. 1 is a diagram schematically showing an embodiment of an air conditioning system of the present invention.

【図2】従来の空気調和システムの一例における概略を
示す図である。
FIG. 2 is a diagram showing an outline of an example of a conventional air conditioning system.

【符号の説明】[Explanation of symbols]

1 空気調和機 2 消音チャンバ 3 外気導入ダクト 4 吸気ダクト 5 空気吸込口 6 吹出フィルタ 7 エアーチャンバ 8 高清浄度エリア 9 リターンチャンバ 10 床 11 空調機械室 1 Air conditioner 2 Silence chamber 3 Outside air introduction duct 4 Air intake duct 5 Air inlet 6 Air outlet filter 7 Air chamber 8 High cleanliness area 9 Return chamber 10 Floor 11 Air conditioning machine room

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 作業室である高清浄度エリアの床下に配
置されこの高清浄度エリアの空気及び外気を吸引すると
ともに正常な温度一定の空気を供給する空気調和機を備
え、正常な温度一定の前記空気をフィルタを介して天井
から前記高清浄度エリアに圧送することを特徴とする空
気調和システム。
1. An air conditioner which is arranged under the floor of a high cleanliness area, which is a working room, sucks air and outside air in the high cleanliness area and supplies air having a normal temperature at a constant temperature. 2. The air conditioning system, wherein the air of 1. is pressure-fed from the ceiling to the high cleanliness area through a filter.
JP28723692A 1992-10-26 1992-10-26 Air conditioning system Pending JPH06137625A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28723692A JPH06137625A (en) 1992-10-26 1992-10-26 Air conditioning system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28723692A JPH06137625A (en) 1992-10-26 1992-10-26 Air conditioning system

Publications (1)

Publication Number Publication Date
JPH06137625A true JPH06137625A (en) 1994-05-20

Family

ID=17714799

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28723692A Pending JPH06137625A (en) 1992-10-26 1992-10-26 Air conditioning system

Country Status (1)

Country Link
JP (1) JPH06137625A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012078056A (en) * 2010-10-05 2012-04-19 Shimizu Corp Air conditioning system for server room

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012078056A (en) * 2010-10-05 2012-04-19 Shimizu Corp Air conditioning system for server room

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Legal Events

Date Code Title Description
A02 Decision of refusal

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Effective date: 19980623