JPS6380146A - Clean room configuration - Google Patents
Clean room configurationInfo
- Publication number
- JPS6380146A JPS6380146A JP22416886A JP22416886A JPS6380146A JP S6380146 A JPS6380146 A JP S6380146A JP 22416886 A JP22416886 A JP 22416886A JP 22416886 A JP22416886 A JP 22416886A JP S6380146 A JPS6380146 A JP S6380146A
- Authority
- JP
- Japan
- Prior art keywords
- clean room
- power supply
- room
- clean
- work
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000007246 mechanism Effects 0.000 claims abstract description 18
- 238000000034 method Methods 0.000 claims abstract description 6
- 238000009434 installation Methods 0.000 claims 1
- 238000004378 air conditioning Methods 0.000 abstract description 5
- 238000004140 cleaning Methods 0.000 abstract description 2
- 238000005192 partition Methods 0.000 abstract description 2
- 239000000428 dust Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 4
- 102000001999 Transcription Factor Pit-1 Human genes 0.000 description 2
- 108010040742 Transcription Factor Pit-1 Proteins 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Ventilation (AREA)
Abstract
Description
【発明の詳細な説明】
く利用分野〉
本発明は、半導体製造、薬品、バイオ製品製造等の工場
の如き発塵を抑制し、温湿度等の環境温度がii[され
る、いわゆるクリーンルームの構成に関する。[Detailed Description of the Invention] Fields of Application The present invention is applicable to so-called clean room configurations in which dust generation is suppressed and environmental temperatures such as temperature and humidity are controlled to such as in factories for semiconductor manufacturing, medicine, bioproduct manufacturing, etc. Regarding.
く従来技術〉
例えば、半導体の製造は各工程毎に単体の装置を準備し
、これを塵を極度に減少し、温湿度の調整が完全に管理
されたクリーンルーム内に設置して利用されている。こ
こでルーム内に供給される空気の管理調整には多くの費
用をかけている。また、従来の製造機械装置では実際に
ワークを加工し、処理する作業部とその電源・制御部等
が総て一体に、個々の装置毎に単体として製作されてい
る。ところで、電源部や制御部はその稼動によって発熱
するため、冷却用ファン等をもって昇温した空気を取り
出すことが通常行なわれている。機械装置の発熱は室内
空気の温度を上げることになり、また、ファン等の使用
により塵を室内に拡散させることになる。そこで特にク
リーン度が要求される場合にはダクトを設けてクリーン
ルーム外に排出することが行なわれているが、ダクトの
ルーム内引き廻しは、室内の作業スペース等環境を悪く
し、かつこれらを考ttした空調管理が必要になるなど
未だ解決すべき問題を有していた。For example, in the manufacturing of semiconductors, a single device is prepared for each process, and this is installed in a clean room where dust is extremely reduced and temperature and humidity are completely controlled. . A lot of money is spent on managing and adjusting the air supplied to the room. In addition, in conventional manufacturing machinery, the working section for actually processing and processing the workpiece, its power source, control section, etc. are all manufactured as a single unit for each individual device. By the way, since the power supply section and the control section generate heat as they operate, it is common practice to take out the heated air using a cooling fan or the like. The heat generated by mechanical devices increases the temperature of the indoor air, and the use of fans and the like causes dust to be diffused into the room. Therefore, when a particularly high degree of cleanliness is required, a duct is installed to discharge the air outside the clean room. However, running the duct inside the room worsens the environment such as the indoor work space, and takes these into consideration. There were still problems to be solved, such as the need for strict air conditioning management.
く本発明の目的〉
以上のような点に鑑みて本発明が提供されたもので、発
熱、発塵の一因ともなりやすい機械装置の電源・制御部
を独立した電源・制御体として、又作業部を独立した作
業機構体として機械装置を機能別に分離し、電源線、配
管等による信号・駆動系で接続することにより高度な空
調、清浄度を要求されるクリーンルームから前記電源・
制御体を排除して、空調・清浄のほか作業性も含めてク
リーンルームの一層の良好な環境が得られるようにしよ
うとするものである。OBJECT OF THE INVENTION The present invention has been provided in view of the above-mentioned points. By separating the machinery and equipment into functional units with the working parts as independent working mechanisms and connecting them with signal and drive systems such as power lines and piping, the power supply and
The aim is to eliminate the control unit and create an even better environment in the clean room, including air conditioning, cleaning, and workability.
〈実施例〉
図は本発明構成を模式図化して示すものであり、1は作
業エリアとしてのクリーンルーム、2は該ルーム直下の
床下クリーンピット、3はクリーンルーム1の温湿度を
11!i整し、必要により除塵(吸塵)をも行なう空調
機等が設備されている機械室゛である。又、上記のほか
、図示しないが配電、配管スペースその他のクリーンル
ーム用建物Aを構成する為の必要スペース、エリアが設
けられている。クリーンルーム1の空気流コントロール
方式としていわゆるダウン70一方式が採用される場合
は、クリーンルーム1の床1aは通気可能に例えばグレ
ーティング床で形成される。4はクリーンルーム1内に
設置される作業機構体であり、ワーク(図示せず)を加
工したり、次工程へ搬送したり、更には加工済ワークを
検査するなど、ワークに直接作用する動作部のみで構成
されている。5は、作業機構体4と該機構体を動作させ
るに必要な手段としての電源線や水配管、空気配管等で
なる信号・駆動系6で接続され、該機構体4を指令通り
に動作させるエネルギー及び信号を送受する電源・制御
体であり、図例ではクリーンルーム1直下の床下クリー
ンピット2に設置されているが、作業機構体の配置プラ
ン、レイアウト等によっては間仕切壁Wを介して隣室に
設置することもよい。<Example> The figure schematically shows the configuration of the present invention. 1 is a clean room as a work area, 2 is an underfloor clean pit directly under the room, and 3 is a temperature and humidity of 11! This is a machine room equipped with an air conditioner, etc. that performs air conditioning and dust removal (dust suction) if necessary. In addition to the above, although not shown in the drawings, necessary spaces and areas for constructing the clean room building A, such as power distribution and piping space, are provided. When the so-called down 70 type is adopted as the airflow control method for the clean room 1, the floor 1a of the clean room 1 is formed of, for example, a grating floor to allow ventilation. Reference numeral 4 denotes a working mechanism installed in the clean room 1, which includes operating parts that directly act on the workpiece, such as processing the workpiece (not shown), transporting it to the next process, and inspecting the processed workpiece. It consists only of 5 is connected to the working mechanism 4 by a signal/drive system 6 consisting of power lines, water piping, air piping, etc. as means necessary to operate the mechanism, and operates the mechanism 4 according to instructions. It is a power supply/control unit that sends and receives energy and signals, and in the example shown, it is installed in the underfloor clean pit 2 directly below the clean room 1, but depending on the arrangement plan and layout of the working mechanism, it may be installed in an adjacent room via the partition wall W. It is also good to set it up.
前述したように作業機構体4と電源・制御体5は床1a
等を介して信号・駆動系6で接続されているので、該機
構体が通常、各種の機能毎に個々体の装置として独立し
て構成されていることがらすれば、容易な設備構成とし
ては電源・制御体5もそれぞれの機構体4毎に対応して
設置することが考えられるが、電源等を共通として制御
信号等を個々の機構体4と送受できるように、即ち電源
・制御体を一個体にまとめて設置することも可能である
。As mentioned above, the working mechanism body 4 and the power supply/control body 5 are located on the floor 1a.
Since the mechanism is normally configured independently as an individual device for each function, it is easy to configure the equipment. It is conceivable to install the power supply/control body 5 correspondingly to each mechanism body 4, but it is possible to install the power supply/control body 5 in correspondence with each mechanism body 4. It is also possible to install them all in one unit.
7は前記電源・制御体5とクリーンルーム用建物Aの外
部とを連通させるダクトであり、電源・制御体5の内部
で発生した熱、塵埃等を建物Aの外に排出するものであ
る。従ってファン装置を電源・制御体5に内蔵させ、又
はダクト内に設けている。尚、床1a等がグレーティン
グ構成でなく、断熱等の良好な遮断構成であれば、前記
ダクト7は必ずしも設ける必要はなく、該クリーンピッ
ト2を単なる空間として排熱等の処理を施せばよい。A duct 7 communicates the power supply/control unit 5 with the outside of the clean room building A, and discharges heat, dust, etc. generated inside the power supply/control unit 5 to the outside of the building A. Therefore, the fan device is built into the power supply/control body 5 or provided in the duct. Incidentally, if the floor 1a etc. does not have a grating structure but has a good isolation structure such as heat insulation, the duct 7 does not necessarily need to be provided, and the clean pit 2 may be treated as a mere space for exhaust heat or the like.
く効果〉
以上のような本発明によれば、以下の如き優れた効果を
奏するクリーンルーム構成とすることができる。Effects> According to the present invention as described above, it is possible to have a clean room configuration that provides the following excellent effects.
(1)作業8!構体には従来の電源・制御体との一体型
のような電源等による発熱部がないので、発熱量として
は極めて少なくなり、従って機構体としてWj閉するこ
とも可能であってこれにより機械装置自体からのクリー
ンルーム内発塵を抑えることができる。(1) Work 8! Since the structure does not have a heat generating part such as a power source that is integrated with a conventional power supply/control body, the amount of heat generated is extremely small. It is possible to suppress the generation of dust in the clean room from itself.
(2)上記により、クリーンルーム内での排気ダクト等
設備が不用となり、作業エリアとしてのスペース増大が
可能となる。(2) The above eliminates the need for equipment such as exhaust ducts in the clean room, making it possible to increase the space available as a work area.
(3)機械装置のクリーンルーム内占有スペースが小さ
くなるので、相対的にクリーンルーム自体を小さくでき
、従って空調等の制御管理が容易となる。(3) Since the space occupied by the mechanical equipment in the clean room is reduced, the clean room itself can be made relatively smaller, and control management of air conditioning and the like becomes easier.
(4)電源・制御体はクリーンルーム外に設置するので
、その発熱、発塵の処理手段を簡便にできる。(4) Since the power source and control unit are installed outside the clean room, the means for disposing of heat generation and dust generation can be simplified.
【図面の簡単な説明】 図は本発明に係るクリーンルーム構成の模式図である。[Brief explanation of the drawing] The figure is a schematic diagram of a clean room configuration according to the present invention.
Claims (2)
指示制御を行なう電源・制御体とを分離すると共に該機
構体と制御体は電源線、配管等による信号・駆動系で接
続してなり、該作業機構体をクリーンルーム内に設置し
、電源・制御体はクリーンルームに隣接する室に設置し
てなるクリーンルーム構成。(1) Separate the working mechanism that processes and processes the workpiece from the power supply/control unit that instructs and controls its operation, and connect the mechanism and control unit with a signal/drive system using power lines, piping, etc. This is a clean room configuration in which the working mechanism is installed in a clean room, and the power supply and control unit are installed in a room adjacent to the clean room.
下クリーンピットである特許請求の範囲第1項記載のク
リーンルーム構成。(2) The clean room configuration according to claim 1, wherein the installation room for the power supply and control unit is an underfloor clean pit directly below the clean room.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22416886A JPS6380146A (en) | 1986-09-22 | 1986-09-22 | Clean room configuration |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22416886A JPS6380146A (en) | 1986-09-22 | 1986-09-22 | Clean room configuration |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6380146A true JPS6380146A (en) | 1988-04-11 |
Family
ID=16809596
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22416886A Pending JPS6380146A (en) | 1986-09-22 | 1986-09-22 | Clean room configuration |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6380146A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5928077A (en) * | 1996-08-28 | 1999-07-27 | Sony Corporation | Clean room for manufacturing of semiconductor device |
US20180108519A1 (en) * | 2016-10-17 | 2018-04-19 | Applied Materials, Inc. | POWER DELIVERY FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING (HiPIMS) |
-
1986
- 1986-09-22 JP JP22416886A patent/JPS6380146A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5928077A (en) * | 1996-08-28 | 1999-07-27 | Sony Corporation | Clean room for manufacturing of semiconductor device |
US20180108519A1 (en) * | 2016-10-17 | 2018-04-19 | Applied Materials, Inc. | POWER DELIVERY FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING (HiPIMS) |
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