JPH0610673Y2 - 光ｃｖｄ装置 - Google Patents
光ｃｖｄ装置Info
- Publication number
- JPH0610673Y2 JPH0610673Y2 JP4138887U JP4138887U JPH0610673Y2 JP H0610673 Y2 JPH0610673 Y2 JP H0610673Y2 JP 4138887 U JP4138887 U JP 4138887U JP 4138887 U JP4138887 U JP 4138887U JP H0610673 Y2 JPH0610673 Y2 JP H0610673Y2
- Authority
- JP
- Japan
- Prior art keywords
- pressure oil
- vapor pressure
- irradiation window
- low vapor
- reaction chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 title claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 24
- 239000010409 thin film Substances 0.000 claims description 17
- 230000002093 peripheral effect Effects 0.000 claims description 13
- 238000001816 cooling Methods 0.000 claims description 9
- 239000012495 reaction gas Substances 0.000 claims description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 239000010408 film Substances 0.000 description 5
- 239000003507 refrigerant Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 230000035484 reaction time Effects 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4138887U JPH0610673Y2 (ja) | 1987-03-20 | 1987-03-20 | 光ｃｖｄ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4138887U JPH0610673Y2 (ja) | 1987-03-20 | 1987-03-20 | 光ｃｖｄ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63149522U JPS63149522U (enrdf_load_stackoverflow) | 1988-10-03 |
| JPH0610673Y2 true JPH0610673Y2 (ja) | 1994-03-16 |
Family
ID=30856344
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4138887U Expired - Lifetime JPH0610673Y2 (ja) | 1987-03-20 | 1987-03-20 | 光ｃｖｄ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0610673Y2 (enrdf_load_stackoverflow) |
-
1987
- 1987-03-20 JP JP4138887U patent/JPH0610673Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63149522U (enrdf_load_stackoverflow) | 1988-10-03 |
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