JPH059726A - Sample holder device for sputtering - Google Patents

Abstract

PURPOSE:To prevent the film forming surfaces on substrates from being contaminated by forming the holder of a sputtering device consisting of the substrate holder and a pallet which rotates and revolves the substrates at the circumferential difference between the diameter of the holes provided on the pallet and the outside diameter of the holder to a rotation system of a specific structure. CONSTITUTION:The contact surfaces of the substrate holder 2 fixed with the substrates 1 for sputtering and the pallet 3 holding the holder 2 are coated with 'Teflon (R)' 4 having a low coefft. of friction. Targets 5 are disposed on the front surfaces of the substrates 1 and the films of the target materials are formed on the substrates 1 in a gaseous Ar atmosphere. Since the contact surfaces of the substrate holder 2 are coated with the 'Teflon (R)' 4 which is a material having the low coefft. of friction, the friction on the rotating surfaces of the pallet 3 and the substrate holder 2 is small at the time when both rotate and revolve and, therefore, the peeling of the films of the target materials sticking between the pallet 3 and the substrate holder 2 at the time of sputtering and the staining of the recording surfaces on the substrate surfaces by sticking of these films onto the substrates 1 are obviated. The disks having high quality are thus stably produced.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a disk rotation type (hereinafter referred to as pallet revolution type) sample holder device for sputtering, which forms a uniform film on a disk substrate.

[0002]

2. Description of the Related Art In recent years, a medium has been developed in which a recording layer is provided on a disk-shaped disk substrate and information signals are recorded, reproduced and erased by using a laser beam or a magnetic head. In such a recording medium, a thin recording layer is formed by sputtering in order to improve the signal recording density. In such a sputtering apparatus, the composition can be easily changed by multi-source sputtering or a composite target, and the film formation rate per disk can be increased.
A pallet revolution type side sputtering type sputtering apparatus has been developed because of its simple driving mechanism.

An example of the conventional pallet revolution type sputtering apparatus described above will be described below with reference to the drawings.

FIG. 5 is a front view of a conventional pallet revolution type sputtering sample holder device, FIG. 6 is an enlarged view of a substrate holder portion, and FIG. 7 is a side view of the sputtering device. 5, 6 and 7,
The disk-shaped disk substrate 11 is fixed to a substrate holder 12, and a rotating motor 15 revolves a rotating disk (hereinafter referred to as pallet) 13. At this time, the substrate holder 12 rotates about its own axis due to the circumferential difference between the inner periphery of the holes of the pallet 13 and the outer periphery of the substrate holder 12. By the revolution of the pallet 13 and the rotation of the substrate holder 12, a uniform film can be formed in the surface of the disc substrate 11.

[0005]

However, in the above structure, a film generated by sputtering adheres to the periphery of the substrate holder, and the adhered film is peeled off due to abrasion between the substrate holder and the pallet due to rotation of the substrate holder. Therefore, there is a problem that it causes an increase in error rate on the recording surface.

Further, a film adheres to the film forming surface of the holder mask of the pallet and the substrate holder, and when the film is deposited, it peels off due to stress, which causes a defect on the recording surface. Had. In view of the above problems, the present invention provides a sputtering sample holder device capable of reducing a defect on a recording surface caused by peeling of a film attached to a pallet or a substrate holder.

[0007]

In order to solve the above problems, the sputtering sample holder device of the present invention comprises:
A sputtering apparatus comprising a substrate holder on which a substrate is fixed, and a pallet that revolves around the substrate by the circumferential difference between the hole diameter provided in the pallet and the outer diameter of the substrate holder, the pallet being held by the pallet and the pallet. A structure having a structure in which at least one of the contact surfaces of the substrate holder is coated with a material having a low friction coefficient, or
A strain gauge is provided on at least one film forming surface of the pallet or the substrate holder held by the pallet, or both of them are provided.

[0008]

With the above-described structure, the present invention can reduce the defect on the recording surface caused by the peeling of the film adhering to the pallet or the substrate holder, and can realize the sputtering sample holder device capable of producing a high quality disc. Become.

[0009]

DESCRIPTION OF THE PREFERRED EMBODIMENTS A sample holder device for sputtering according to an embodiment of the present invention will be described below with reference to the drawings.

FIG. 1 is a front view of a sputtering sample holder device according to a first embodiment of the present invention, and FIG. 2 is an enlarged view of a substrate holder portion.
1 and 2, 1 is a substrate, 2 is a substrate holder made of a magnetic material, 3 is a pallet, and 4 is a Teflon coating layer. As shown in the enlarged view, the contact surface of the substrate holder 2 among the contact surfaces of the substrate holder 2 to which the substrate 1 is fixed and the pallet 3 to hold the substrate holder 2 is coated with Teflon 4 of a low friction coefficient material. There is.
The target 5 is arranged on the front surface of the substrate 1 and forms a film on the substrate 1 by side sputtering in an argon gas atmosphere. In the conventional sample holder device for sputtering shown in FIG. 5, when a film deposited by sputtering adheres between the pallet and the substrate holder, and the pallet and the substrate holder revolve, the contact surface between the pallet and the substrate holder is worn and The adhered film peels off and adheres to the disk, which causes a defect on the recording surface.
As a result, as shown in the characteristic diagram of the change in the error rate with respect to the cumulative number of disks manufactured in the conventional sputtering sample holder device shown in FIG. 8, the error rate starts to increase when the number of disks manufactured exceeds 1,000.

However, in the present embodiment, the contact surface of the substrate holder 2 is coated with Teflon 4 which is a low coefficient of friction material. Since the friction coefficient is small, the adhered film is hardly peeled off, the recording surface does not become a defect, and the error rate does not increase.

FIG. 4 is a characteristic diagram showing changes in the error rate with respect to the cumulative number of discs actually manufactured in the first embodiment of the present invention. As shown in the figure, even when 4000 discs are continuously manufactured, the defect of the recording surface caused by the peeling of the film can be reduced and the error rate does not change.

Next, a second embodiment of the present invention will be described with reference to the drawings. FIG. 3 is a front view of the sputtering sample holder device according to the second embodiment of the present invention. In FIG. 3, the substrate 1 is fixed to a substrate holder 7 made of a magnetic material and attached to a pallet 8 as in the first embodiment. As shown in the figure, the pallet 8 is provided with a structure in which a strain gauge 9 using a resistance wire of nichrome is arranged on the film forming surface in the vicinity of holding the substrate holder 7. The target 5 is arranged on the front surface of the substrate 1 and forms a film on the substrate 1 by side sputtering in an argon gas atmosphere.

In this embodiment, a strain gauge is provided on the film forming surface of the pallet 8 near the substrate holder 7 to hold the film thickness deposited and deposited on the holder mask of the pallet and the substrate holder. Can be sensed. The internal stress of the deposited film is 5 × 10 ¹¹
In the above case, the pallet and the holder mask of the substrate holder are blasted and washed with distilled water and acetone. As a result, the film adhered to the pallet and the holder mask of the substrate holder can be washed before the film is peeled off due to the internal stress of the film, so that the defect on the recording surface due to the film peeling does not increase.

As described above, the sputtering apparatus is composed of the substrate holder on which the substrate is fixed and the pallet that revolves around the substrate due to the circumferential difference between the substrate holder and the contact surface of the substrate holder held on the pallet. Or a structure in which a strain gauge is provided on the film formation surface of at least one of the pallet and the substrate holder held by the pallet, or both of them. It is possible to reduce the defect on the recording surface caused by the peeling of the film attached to the substrate holder, and it is possible to realize a sputtering sample holder device capable of producing a high quality disc.

In the first embodiment of the present invention, the contact surface of the substrate holder is coated with Teflon. However, at least one of the contact surfaces of the pallet and the substrate holder held by the pallet is covered. The same or better effect can be obtained if the contact surface is coated and a material having a low friction coefficient such as polyparaxylene or phosphazene resin is used as the material for coating the contact surface.

Further, in the second embodiment of the present invention, a strain gauge 9 using a resistance wire of nichrome is arranged on the film forming surface near the substrate holder 7 on the pallet 8. As described above, a strain gauge is provided on at least one film-forming surface of the pallet and the substrate holder held by the pallet, and the Cu-type such as Advance (58% Cu-42% Ni) is used. N
The same effect can be obtained if the resistance wire of i or a strain gauge such as a single crystal of silicon or germanium is used.

As described above, according to the present embodiment, the sputtering is composed of the substrate holder on which the substrate is fixed and the pallet that revolves around the substrate by the circumferential difference between the hole diameter provided in the pallet and the outer diameter of the substrate holder. An apparatus comprising a structure in which at least one of contact surfaces of the pallet and the substrate holder held by the pallet is coated with a material having a low friction coefficient, or the pallet and the pallet are held by the pallet. Further, the structure in which at least one film-forming surface of the substrate holder is provided with a strain gauge, or the structure in which both are provided, it is possible to reduce defects caused by peeling of the film adhering to the pallet or the substrate holder. ，
A sample holder device for sputtering capable of producing a high quality disc can be realized.

[0019]

As described above, the present invention is a sputtering apparatus comprising a substrate holder on which a substrate is fixed, and a pallet that revolves around the substrate by the circumferential difference between the hole diameter provided in the pallet and the outer diameter of the substrate holder. A structure having a structure in which at least one of the contact surfaces of the pallet and the substrate holder held by the pallet is coated with a material having a low coefficient of friction, or the pallet and the pallet held by the pallet With the configuration in which at least one film-forming surface of the substrate holder is provided with a strain gauge, or both are provided, it is possible to reduce the defect on the recording surface caused by the peeling of the film adhering to the pallet or the substrate holder. Realizes a sputtering sample holder device that can produce high quality discs Rukoto can.

[Brief description of drawings]

FIG. 1 is a front view of a sputtering sample holder device according to a first embodiment of the present invention.

FIG. 2 is an enlarged view of a substrate holder portion of the sputtering sample holder device according to the first embodiment of the present invention.

FIG. 3 is a front view of a sputtering sample holder device according to a second embodiment of the present invention.

FIG. 4 is a characteristic diagram showing a change in error rate with respect to the cumulative number of disks manufactured in the first embodiment of the present invention.

FIG. 5 is a front view of a conventional sputtering sample holder device.

FIG. 6 is an enlarged view of a substrate holder portion of a conventional sputtering sample holder device.

FIG. 7 is a side view of a conventional sputtering apparatus.

FIG. 8 is a characteristic diagram of a change in error rate with respect to the cumulative number of manufactured discs in a conventional sputtering sample holder device.

[Explanation of symbols]

1 substrate 2 substrate holder 3 pallets 4 Teflon coat layer 5 targets 7 Board holder 8 pallets 9 Strain gauge 10 pallets 11 board 12 board holder 13 pallets 14 Target 15 rotation motor 16 vacuum chamber

Claims (4)

[Claims] 1. A substrate holder for holding a substrate on a rotating disk, and the rotating disk for revolving the substrate by a circumferential difference between a hole diameter provided in the rotating disk and an outer diameter of the substrate holder. A sputtering sample holder having a structure in which at least one of contact surfaces of the rotating disk and the substrate holder held by the rotating disk is coated with a material having a low friction coefficient. apparatus. 2. Teflon, polyparaxylene or phosphazene resin is used as a material having a low friction coefficient for coating at least one of the contact surfaces of the rotating disk and the substrate holder held by the rotating disk. The sample holder device for sputtering according to claim 1. 3. A substrate holder for holding a substrate on a rotating disc, and a rotating disc for revolving the substrate by a circumferential difference between a hole diameter provided in the rotating disc and an outer diameter of the substrate holder. A sputtering sample holder device, comprising a structure in which a strain gauge is arranged on a film forming surface of at least one of the rotating disk and the substrate holder held by the rotating disk. 4. A strain gauge provided on at least one film forming surface of the rotating disk and the substrate holder held by the rotating disk is a Cu--Ni resistance wire, a nichrome resistance wire, or silicon or germanium. The sample holder device for sputtering according to claim 3, wherein the single crystal is used.