JPH0595071U - Thick film circuit board - Google Patents

Thick film circuit board

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Publication number
JPH0595071U
JPH0595071U JP3590792U JP3590792U JPH0595071U JP H0595071 U JPH0595071 U JP H0595071U JP 3590792 U JP3590792 U JP 3590792U JP 3590792 U JP3590792 U JP 3590792U JP H0595071 U JPH0595071 U JP H0595071U
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JP
Japan
Prior art keywords
electrode pad
thick film
circuit board
wiring pattern
conductor layer
Prior art date
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Pending
Application number
JP3590792U
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Japanese (ja)
Inventor
晃 井本
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Kyocera Corp
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Kyocera Corp
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Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP3590792U priority Critical patent/JPH0595071U/en
Publication of JPH0595071U publication Critical patent/JPH0595071U/en
Pending legal-status Critical Current

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  • Parts Printed On Printed Circuit Boards (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

(57)【要約】 【目的】外部に露出する特性検出用電極パッドの耐湿信
頼性を向上させた厚膜回路基板を提供する。 【構成】セラミック絶縁基板1上に、所望回路を構成す
る厚膜配線パターン2及び出力電極パッド4、特性検出
用電極パッド5を形成した厚膜回路基板において、前記
特性検出用電極パッド5が、導体層5a上に化学的に不
活性な導体層5bに被着して構成されている。
(57) [Abstract] [Purpose] To provide a thick film circuit board in which the humidity resistance of the characteristic detecting electrode pad exposed to the outside is improved. [Structure] In a thick film circuit board in which a thick film wiring pattern 2 which forms a desired circuit, an output electrode pad 4, and a characteristic detection electrode pad 5 are formed on a ceramic insulating substrate 1, the characteristic detection electrode pad 5 comprises: The conductor layer 5a is formed by depositing a chemically inert conductor layer 5b on the conductor layer 5a.

Description

【考案の詳細な説明】[Detailed description of the device]

【0001】[0001]

【産業上の利用分野】[Industrial applications]

本考案はセラミック絶縁基板に厚膜技法を用いて厚膜導体配線パターン、厚膜 抵抗体膜、各種電極パッドを形成した厚膜回路基板に関するものである。 The present invention relates to a thick film circuit board in which a thick film conductor wiring pattern, a thick film resistor film, and various electrode pads are formed on a ceramic insulating substrate by using a thick film technique.

【0002】[0002]

【従来の技術】[Prior Art]

一般に電子機器に使用される混成集積回路等に用いられる厚膜回路基板には、 電気的、機械的強度及び熱伝導性の点からアルミナを主成分としたセラミック基 板が利用され、その表面に銀、銀−パラジウムなどの銀系厚膜導体、銅などの銅 系銀系厚膜導体を形成されていた。このような厚膜回路基板は、厚膜技法を用い て抵抗体膜を形成することができるという大きな特徴を有しており、固体抵抗器 を用いることに比べて、基板の小型化、薄型化が可能になる。 For thick film circuit boards, which are generally used in hybrid integrated circuits used in electronic devices, a ceramic substrate composed mainly of alumina is used from the viewpoint of electrical, mechanical strength and thermal conductivity. A silver-based thick film conductor such as silver or silver-palladium, or a copper-based silver thick film conductor such as copper was formed. Such a thick film circuit board has a great feature that a resistor film can be formed by using a thick film technique, and is smaller and thinner than a solid-state resistor. Will be possible.

【0003】 ところが、所望回路が高密度化、高信頼性が要求されている分野に厚膜回路基 板を適用させようとすると、厚膜配線パターンの化学的活性度が大きな問題とな ってくる。高密度化された厚膜導体上に、湿気などが発生すると、配線パターン 間の短絡現象が発生する。特に、銀系厚膜導体で配線パターンを形成すると、銀 系材料は活性度が高いため、マイグレーョンが発生してしまい、パターン間の短 絡が発生する。However, when a thick film circuit board is applied to a field in which a desired circuit is required to have high density and high reliability, the chemical activity of the thick film wiring pattern becomes a big problem. come. When moisture or the like is generated on the densified thick film conductor, a short circuit phenomenon occurs between wiring patterns. In particular, when a wiring pattern is formed by a silver-based thick film conductor, the silver-based material has high activity, so that migration occurs and a short circuit between patterns occurs.

【0004】 この湿気を防止するために、配線パターンを形成した後に、ガラスなどの保護 膜を全面に形成することが行われていた。In order to prevent this moisture, a protective film such as glass has been formed over the entire surface after forming a wiring pattern.

【0005】 しかしながら、厚膜回路基板上に、抵抗体膜やその他の電子部品、例えば水晶 振動子などを搭載しなければならない場合には、抵抗体膜や、水晶振動子などの 特性を検出しながら、抵抗体膜をトリミングしたり、水晶振動子の振動電極の面 積調整をする必要があり、保護膜で覆われていない特性検出用装置の測定プロー ブと接続する特性検出用電極パッドを設けなくてはならなかった。However, when it is necessary to mount a resistor film or other electronic components such as a crystal oscillator on the thick film circuit board, the characteristics of the resistor film or the crystal oscillator are detected. However, it is necessary to trim the resistor film and adjust the surface area of the vibrating electrode of the crystal unit, and use the characteristic detection electrode pad that is connected to the measurement probe of the characteristic detection device that is not covered with the protective film. I had to set it up.

【0006】 一般に、抵抗体膜を有する厚膜回路基板の製造方法としては、セラミック基板 上に、銀系厚膜導体材料を用いて、配線パターン、特性検出用電極パッド、出力 電極パッド及び各種電子部品が搭載される電極パッドを印刷・乾燥し、次に、抵 抗体用厚膜導体材料を用いて、所定配線パターン間に抵抗体膜を印刷・乾燥し、 所定焼成条件で、セラミック基板上に、配線パターン、特性検出用電極パッド、 出力電極パッド、各種電子部品が搭載される電極パッドを焼きつけ、次に特性検 出用電極パッド及び出力電極パッドが露出するすように基板全面に保護膜を形成 していた。その後、特性検出用電極パッドに特性検出用装置の測定プローブを接 触させながら、抵抗体膜をレーザーなどによりトリミングして、抵抗体膜の抵抗 値などを所定値に調整していた。その後、各種電子部品を搭載用電極パッドに、 さらにリード端子を出力電極パッドに夫々半田接合していた。Generally, as a method of manufacturing a thick film circuit board having a resistor film, a wiring pattern, a characteristic detection electrode pad, an output electrode pad, and various electronic devices are formed on a ceramic substrate by using a silver-based thick film conductor material. The electrode pad on which the component is mounted is printed and dried, and then a resistor film is printed and dried between the prescribed wiring patterns using a thick film conductor material for antibodies, and the ceramic substrate is baked under prescribed firing conditions. , The wiring pattern, the characteristic detection electrode pad, the output electrode pad, and the electrode pad on which various electronic components are mounted are baked, and then a protective film is formed on the entire surface of the substrate so that the characteristic detection electrode pad and the output electrode pad are exposed. Had formed. After that, the resistance film was trimmed with a laser or the like while the measurement probe of the property detection device was in contact with the property detection electrode pad to adjust the resistance value of the resistance film to a predetermined value. After that, various electronic components were soldered to the mounting electrode pads and the lead terminals were soldered to the output electrode pads.

【0007】[0007]

【従来技術の問題点】[Problems of conventional technology]

ここで、配線パターンは保護膜で被覆されており、また、搭載用電極パッド及 び出力電極パッドは半田接合の半田層によって被覆されているため、外部からの 湿気などによって、配線パターン、搭載用電極パッド、出力電極パッドに上述の ようなマイグレーションなどが発生することがないが、特性検出用電極パッドに 関しては、外部に露出することになり、たとえマイグレーションの発生がない銅 系厚膜導体材料であっても、湿気などにより耐湿信頼性が大きく低下してしまう 。 Here, the wiring pattern is covered with a protective film, and the mounting electrode pads and output electrode pads are covered with the solder layer of the solder joints. The above-mentioned migration does not occur in the electrode pads and output electrode pads, but the characteristic detection electrode pads are exposed to the outside, and even copper-based thick film conductors in which migration does not occur. Even if it is a material, the humidity resistance will drop significantly due to humidity.

【0008】 本考案は上述の問題点に鑑みて案出されたものであり、その目的は、外部に露 出する特性検出用電極パッドの耐湿信頼性を向上させた厚膜回路基板を提供する ものである。The present invention has been devised in view of the above problems, and an object thereof is to provide a thick film circuit board in which the humidity resistance reliability of the characteristic detection electrode pad exposed to the outside is improved. It is a thing.

【0009】[0009]

【問題点を解決するための手段】[Means for solving problems]

本考案は、セラミック絶縁基板上に、所望回路を構成する厚膜配線パターン、 出力電極パッド及び特性検出用電極パッドを形成して成る厚膜回路基板において 、前記特性検出用電極パッドは、下地導体層と化学的に不活性な被覆導体層とで 形成されていることを特徴とする厚膜回路基板である。 The present invention relates to a thick film circuit board formed by forming a thick film wiring pattern, an output electrode pad and a characteristic detection electrode pad forming a desired circuit on a ceramic insulating substrate, wherein the characteristic detection electrode pad is a base conductor. The thick film circuit board is characterized in that it is formed of a layer and a chemically inactive coated conductor layer.

【0010】[0010]

【作用】[Action]

本考案では、厚膜回路基板で外部に露出してしまう特性検出用電極パッドが、 導体層上に化学的に不活性な導体層、例えば抵抗体膜と同一の酸化物又は珪化物 金属材料、又はメッキ層が被着して構成されているため、特性検出用電極パッド の下層となる導体層が湿気などによる化学的な変化、例えば腐蝕などが一切起こ ることがない。 In the present invention, the characteristic detecting electrode pad exposed to the outside in the thick film circuit board is a chemically inactive conductor layer on the conductor layer, for example, the same oxide or silicide metal material as the resistor film, Alternatively, since the plating layer is deposited, the conductor layer below the characteristic detection electrode pad will not undergo any chemical change due to moisture such as corrosion.

【0011】 従って、厚膜回路基板の配線パターン、各種電極パッドを構成する導体層、導 体材料が外部から完全に遮断できるため、湿気による腐蝕などを防止でき、耐湿 信頼性の高い厚膜回路基板となる。Therefore, since the wiring pattern of the thick film circuit board, the conductor layers forming the various electrode pads, and the conductor material can be completely shielded from the outside, corrosion due to moisture can be prevented, and a thick film circuit with high humidity resistance and high reliability can be prevented. It becomes the substrate.

【0012】[0012]

【実施例】【Example】

以下、本考案を図面に基づいて詳説する。図1は本考案の厚膜回路基板の部分 平面図であり、図2は図1中のA−A線断面を示す。尚、説明上、厚膜回路基板 の電子部品搭載用電極パッドに搭載される電子部品、出力電極パッドに接合され るリード端子は省略する。 Hereinafter, the present invention will be described in detail with reference to the drawings. FIG. 1 is a partial plan view of a thick film circuit board of the present invention, and FIG. 2 is a sectional view taken along line AA in FIG. For the sake of explanation, the electronic components mounted on the electronic component mounting electrode pads of the thick film circuit board and the lead terminals bonded to the output electrode pads are omitted.

【0013】 図中、1はセラミック基板であり、2は配線パターンであり、3は電子部品搭 載用電極パッドであり、4は出力電極パッドであり、5は特性検出用電極パッド であり、6は抵抗体膜であり、7は保護膜である。In the figure, 1 is a ceramic substrate, 2 is a wiring pattern, 3 is an electronic component mounting electrode pad, 4 is an output electrode pad, 5 is a characteristic detecting electrode pad, 6 is a resistor film, and 7 is a protective film.

【0014】 セラミック基板1は、アルミナセラミックなどからなり、矩形状となっている 。The ceramic substrate 1 is made of alumina ceramic or the like and has a rectangular shape.

【0015】 配線パターン2は、銀、銀−パラジウムなどの銀系導体材料、銅などの銅系導 体材料からなり、セラミック基板1上に所望回路に応じて所定形状に形成されて いる。The wiring pattern 2 is made of a silver-based conductor material such as silver or silver-palladium, or a copper-based conductor material such as copper, and is formed in a predetermined shape on the ceramic substrate 1 according to a desired circuit.

【0016】 電子部品搭載用電極パッド3、出力電極パッド4、特性検出用電極パッド5は 、配線パターン2と同一材料からなり、配線パターン2と接続するように、形成 されている。The electronic component mounting electrode pad 3, the output electrode pad 4, and the characteristic detecting electrode pad 5 are made of the same material as the wiring pattern 2 and are formed so as to be connected to the wiring pattern 2.

【0017】 抵抗体膜6は、酸化ルテニウム、硼化ランタン、珪化ランタンなどを導電性材 料を主成分として厚膜抵抗体ペーストを用いて、基板1上に形成される。尚、抵 抗体膜6の両端は、パターン2を介して特性検出用電極パッド5と接続されてい る。The resistor film 6 is formed on the substrate 1 by using a thick film resistor paste containing ruthenium oxide, lanthanum boride, lanthanum silicide, etc. as a main component of a conductive material. Both ends of the antibody film 6 are connected to the characteristic detecting electrode pads 5 via the pattern 2.

【0018】 保護膜7は、硼珪酸ガラスなどのガラスから成り、各電子部品搭載用電極パッド 3、出力電極パッド4、特性検出用電極パッド5を露出するように基板1の略全 面に形成されている。尚、図1において、点線で示した。The protective film 7 is made of glass such as borosilicate glass and is formed on substantially the entire surface of the substrate 1 so as to expose the electronic component mounting electrode pads 3, the output electrode pads 4, and the characteristic detection electrode pads 5. Has been done. In addition, in FIG. 1, it is shown by a dotted line.

【0019】 本考案の厚膜回路基板の特徴は、外部に露出する特性検出用電極パッド5が、 下地導体層5aと、化学的に不活性な被覆導体層5bとの多層構造となっている 。図1では、被覆導体層5bを一点鎖線で示した。A feature of the thick film circuit board of the present invention is that the characteristic detecting electrode pad 5 exposed to the outside has a multi-layer structure of a base conductor layer 5a and a chemically inactive coating conductor layer 5b. .. In FIG. 1, the coated conductor layer 5b is shown by a chain line.

【0020】 尚、他の各電子部品搭載用電極パッド3は電子部品を搭載する際の半田接合に より、搭載用電極パッド3の表面は半田によって覆われ、また出力電極パッド4 は、リード端子と接合する際の半田接合により、出力電極パッド4の表面は半田 によって覆われることになる。Each of the other electronic component mounting electrode pads 3 is covered with solder on the surface of the mounting electrode pad 3 by soldering when mounting the electronic component, and the output electrode pad 4 is a lead terminal. The surface of the output electrode pad 4 is covered with the solder due to the solder bonding at the time of bonding.

【0021】 これにより、電子部品が搭載され、リード端子が接合された厚膜回路基板にお いて、配線パターン2は保護膜7で覆われ、搭載用電極パッド3、出力電極パッ ド4は、半田によって覆われることになるので、外部からの湿気によって、配線 パターン2、搭載用電極パッド3、出力電極パッド4に、マイグレーションや腐 蝕などによる特性の変化を抑えることができる。また、特性検出用電極パッド5 も、表面が化学的に不活性な被覆導体層5bで覆われることになるのでマイグレ ーションや腐蝕などによる特性の変化を抑えることができ、結果として、高密度 の回路を形成しても、従来のように湿気による信頼性の低下が防止できる厚膜回 路基板となる。As a result, in the thick film circuit board on which the electronic components are mounted and the lead terminals are joined, the wiring pattern 2 is covered with the protective film 7, and the mounting electrode pad 3 and the output electrode pad 4 are Since the wiring pattern 2, the mounting electrode pad 3, and the output electrode pad 4 are covered with the solder, it is possible to suppress changes in characteristics of the wiring pattern 2, the mounting electrode pad 3, and the output electrode pad 4 due to migration or corrosion. Further, since the surface of the characteristic detecting electrode pad 5 is also covered with the chemically inactive coating conductor layer 5b, the characteristic change due to migration or corrosion can be suppressed, and as a result, high density Even if a circuit is formed, it will be a thick film circuit board that can prevent deterioration of reliability due to moisture as in the past.

【0022】 次に、本考案の厚膜回路基板の製造方法を説明する。Next, a method of manufacturing the thick film circuit board of the present invention will be described.

【0023】 先ず、所定形状のセラミック基板1を用意する。First, a ceramic substrate 1 having a predetermined shape is prepared.

【0024】 次に、セラミック基板1上に、所定回路に応じて、配線パターン2、搭載用電 極パッド3、出力電極パッド4、特性検出用電極パッド5の下地導体層5aを同 時に印刷形成する。具体的には、銀系厚膜導体ペーストや銅系厚膜導体ペースト をスクリーン印刷し乾燥する。ここで、銀系厚膜導体ペーストは、導体材料とし て銀粉末、銀−パラジウム粉末又は銀−白金粉末と、無機バインダーと、有機ビ ヒクルとを所定量混合してペーストとする。尚、銀系厚膜導体ペーストを用いた 際には、後述する焼きつけ工程において、酸化雰囲気で焼成することが望ましい 。Next, on the ceramic substrate 1, the wiring pattern 2, the mounting electrode pad 3, the output electrode pad 4, and the underlying conductor layer 5a of the characteristic detection electrode pad 5 are simultaneously printed and formed according to a predetermined circuit. To do. Specifically, a silver-based thick film conductor paste or a copper-based thick film conductor paste is screen-printed and dried. Here, the silver-based thick film conductor paste is prepared by mixing a predetermined amount of silver powder, silver-palladium powder or silver-platinum powder as a conductor material, an inorganic binder, and an organic vehicle. When the silver-based thick film conductor paste is used, it is desirable to fire it in an oxidizing atmosphere in the baking step described later.

【0025】 また、銅系厚膜導体ペーストは、導体材料として銅粉末と、無機バインダーと 、有機ビヒクルとを所定量混合してペーストとする。尚、銅系厚膜導体ペースト を用いた際には、後述する焼きつけ工程において、中性、還元性雰囲気で焼成す ることが望ましい。The copper-based thick film conductor paste is prepared by mixing a predetermined amount of copper powder as a conductor material, an inorganic binder, and an organic vehicle to form a paste. When the copper-based thick-film conductor paste is used, it is desirable that the copper-based thick-film conductor paste be fired in a neutral or reducing atmosphere in the baking step described later.

【0026】 次に、セラミック基板1の配線パターン2間に抵抗体膜6を印刷する。尚、こ の抵抗体膜6と同一材料を用いて、同一印刷工程で、特性検出用電極パッド5の 下地導体層5a上に被覆導体層5bを同時に印刷する。具体的には、厚膜抵抗体 ペーストをスクリーン印刷し乾燥する。ここで、厚膜抵抗体ペーストは、上述の 導体ペーストの材料によって、異なる材料を選択する必要がある。例えば導体ペ ーストによって、中性、酸化性雰囲気で焼きつける場合には、酸化性雰囲気でも 特性の変化がない酸化ルテニウムなどの金属酸化物粉末、無機バインダー、有機 ビヒクルを所定量混合してペーストとする。また、中性、還元性酸化性雰囲気で 焼きつける場合には、硼化ランタンなどの金属硼化物粉末や珪化タンタルなどの 金属珪化物粉末、無機バインダー、有機ビヒクルを所定量混合してペーストとす る。Next, the resistor film 6 is printed between the wiring patterns 2 on the ceramic substrate 1. In addition, the same material as that of the resistor film 6 is used to simultaneously print the covering conductor layer 5b on the underlying conductor layer 5a of the characteristic detecting electrode pad 5 in the same printing process. Specifically, a thick film resistor paste is screen-printed and dried. Here, it is necessary to select a different material for the thick film resistor paste, depending on the material of the above-mentioned conductor paste. For example, when baking with a conductive paste in a neutral or oxidizing atmosphere, metal oxide powder such as ruthenium oxide, which does not change its characteristics even in an oxidizing atmosphere, an inorganic binder, and an organic vehicle are mixed in a specified amount to form a paste. .. When baking in a neutral or reducing oxidizing atmosphere, a predetermined amount of a metal boride powder such as lanthanum boride or a metal silicide powder such as tantalum silicide, an inorganic binder and an organic vehicle are mixed to form a paste. ..

【0027】 次に、セラミック基板1上に形成した配線パターン2、搭載用電極パッド3、 出力電極パッド4、特性検出用電極パッド5、抵抗体膜6の印刷導体を焼きつけ る。具体的には、配線パターン2などを銀系厚膜導体ペースト、抵抗体膜6を酸 化ルテニウムなどの金属酸化物粉末の抵抗体厚膜ペーストで形成した場合には、 大気雰囲気で、800〜900℃で一体的に焼きつける。また、配線パターン2 などを銅系厚膜導体ペースト、抵抗体膜6を金属硼化物粉末、金属珪化物粉末の 厚膜抵抗体ペーストで形成した場合には、還元性雰囲気で、800〜900℃で 一体的に焼きつける。Next, the printed conductor of the wiring pattern 2, the mounting electrode pad 3, the output electrode pad 4, the characteristic detection electrode pad 5, and the resistor film 6 formed on the ceramic substrate 1 is printed. Specifically, when the wiring pattern 2 and the like are formed of a silver-based thick film conductor paste and the resistor film 6 is formed of a resistor thick film paste of a metal oxide powder such as ruthenium oxide, the temperature of 800 to 800 Bake integrally at 900 ° C. When the wiring pattern 2 and the like are formed of a copper-based thick film conductor paste and the resistor film 6 is formed of a metal boride powder or a metal silicide powder thick film resistor paste, the temperature is 800 to 900 ° C. in a reducing atmosphere. Bake together.

【0028】 尚、上述の工程で、先に配線パターン2などを印刷した後、抵抗体膜6を印刷 したが、その逆に形成しても構わない。また、焼きつけ工程は、配線パターン2 、抵抗体膜6を同時に焼きつけているが、先に配線パターン2などを焼きつけ、 その後、抵抗体膜6を焼きつけてもよいし、その逆に焼きつけても構わない。In the above process, the wiring pattern 2 and the like are first printed and then the resistor film 6 is printed, but the reverse process may be performed. In the baking process, the wiring pattern 2 and the resistor film 6 are baked at the same time, but the wiring pattern 2 and the like may be baked first, and then the resistor film 6 may be baked, or vice versa. Absent.

【0029】 次に、配線パターン2を覆うように保護膜7を形成する。具体的には、保護膜 は、シリカガラスなどの主成分とした無機物絶縁ペーストを用いて、搭載用電極 パッド3、出力電極パッド4、特性検出用電極パッド5のみが露出するように印 刷して、約500℃で焼成して形成する。また、無機物絶縁ペーストの他に、エ ポキシ等の熱硬化性樹脂、紫外線硬化型樹脂などを用いて構わない。Next, the protective film 7 is formed so as to cover the wiring pattern 2. Specifically, the protective film is printed using an inorganic insulating paste containing silica glass as a main component so that only the mounting electrode pad 3, the output electrode pad 4, and the characteristic detection electrode pad 5 are exposed. And is formed by firing at about 500 ° C. In addition to the inorganic insulating paste, a thermosetting resin such as epoxy or an ultraviolet curable resin may be used.

【0030】 次に、抵抗体膜6の調整を行う。具体的には、保護膜7を介して、レーザーを 照射して、抵抗体膜6の幅を所定抵抗値となるように消失する。この時、抵抗体 膜6の両端に接続される特性検出用電極パッド5に測定用プローブを接触させな がら行う。Next, the resistance film 6 is adjusted. Specifically, a laser beam is radiated through the protective film 7 so that the width of the resistor film 6 disappears to a predetermined resistance value. At this time, the measurement probe is brought into contact with the characteristic detection electrode pads 5 connected to both ends of the resistor film 6.

【0031】 次に、搭載用電極パッド3に、半導体素子、コンデンサなどの各種電子部品を 半田接合して、さらに出力電極パッド4にリード端子を保持して、半田接合する 。Next, various electronic components such as semiconductor elements and capacitors are soldered to the mounting electrode pad 3, and lead terminals are held on the output electrode pad 4 for soldering.

【0032】 このようして形成された厚膜回路基板において、特性検出用電極パッド5のみ が外部に露出しており、その他、即ち配線パターン2は保護膜7で覆われ、搭載 用電極パッド3及び出力電極パッド4は半田によって覆われることになる。しか も、特性検出用電極パッド5の表面は、化学的に不活性な被覆導体層5bに覆わ れているため、外部からの湿気などに対して、マイグレーションや腐蝕などが発 生しにくいため、結果として、所望回路の配線パターン2を高密度に形成しても 、耐湿性に優れた厚膜回路基板となる。In the thick film circuit board thus formed, only the characteristic detecting electrode pad 5 is exposed to the outside, and the other part, that is, the wiring pattern 2 is covered with the protective film 7, and the mounting electrode pad 3 The output electrode pad 4 is covered with solder. However, since the surface of the characteristic detection electrode pad 5 is covered with the chemically inactive coating conductor layer 5b, migration or corrosion is less likely to occur due to moisture from the outside. As a result, even if the wiring pattern 2 of the desired circuit is formed with high density, the thick film circuit board has excellent moisture resistance.

【0033】 上述の実施例では、特性検出用電極パッド5の被覆導体層5bを、抵抗体6と 同一材料で形成したが、厚膜抵抗体ペーストから形成される抵抗体のシート抵抗 が10KΩ/□の材料を用いた場合、被覆導体層5bの膜厚が10μm程度であ れば、10mΩ程度の抵抗値の増加にしかならず、実用上問題にならない程度で ある。In the above-mentioned embodiment, the covering conductor layer 5b of the characteristic detecting electrode pad 5 is formed of the same material as the resistor 6, but the sheet resistance of the resistor formed from the thick film resistor paste is 10 KΩ / When the material of □ is used and the film thickness of the coated conductor layer 5b is about 10 μm, the resistance value increases only by about 10 mΩ, which is not a practical problem.

【0034】 また、上述のように被覆導体層5bとして、厚膜抵抗体ペーストで形成する以 外に、メッキ層を形成してもよい。この時、特性検出用電極パッド5の下地導体 層5a上に、無電解メッキでNi層を約2μm形成し、さらに無電解メッキでA u層を約2μm形成しても構わない。Further, as described above, the coating conductor layer 5b may be formed by a plating layer instead of being formed by the thick film resistor paste. At this time, a Ni layer of about 2 μm may be formed on the underlying conductor layer 5a of the characteristic detecting electrode pad 5 by electroless plating, and an Au layer of about 2 μm may be further formed by electroless plating.

【0035】 何れにしても、厚膜抵抗体ペーストで形成した被覆導体層5b、メッキ層で形 成した被覆導体層5bは、湿気に対して変化のない不活性状態となるため、上述 したように、耐湿信頼性の向上に大きく寄与するものである。In any case, since the coated conductor layer 5b formed of the thick film resistor paste and the coated conductor layer 5b formed of the plated layer are in an inactive state that does not change with respect to moisture, they are as described above. In addition, it greatly contributes to the improvement of the moisture resistance reliability.

【0036】 実験例1 5mm角のアルミナセラミック基板(京セラ製A476)の表面に、銅系厚膜 導体ペースト(デュポン社製DP9153)で配線パターン2及び0.5mm角 の4つの特性検出用電極パッド5を印刷、焼成した。その後、特性検出用電極パ ッド5の表面に厚膜抵抗体ペースト(デュポン社製DP6402)を印刷、焼成 した。その後、無機物絶縁ペースト(デュポン社製QP507)で特性検出用電 極パッド5のみが露出するように印刷、焼成した。Experimental Example 1 On the surface of a 5 mm square alumina ceramic substrate (A476 made by Kyocera), a copper-based thick film conductor paste (DP9153 made by DuPont) was used for the wiring pattern 2 and four 0.5 mm square electrode pads for characteristic detection. 5 was printed and fired. Then, a thick film resistor paste (DP6402 manufactured by DuPont) was printed and baked on the surface of the characteristic detection electrode pad 5. Then, printing and firing were performed using an inorganic insulating paste (QP507 manufactured by DuPont) so that only the characteristic detection electrode pad 5 was exposed.

【0037】 このようにして得られた厚膜回路基板に、特性検出用電極パッド5と30μm の間隔となるように、リン青銅のシルード板を取り付け、温度120℃、相対湿 度100%の環境下に放置し、電極パッド5とシルード板との間に5Vの電圧を 印加して、500時間の耐湿試験を行った。その結果、試験前の絶縁抵抗が10 00MΩ以上であったが、試験後においても、絶縁抵抗の劣化が認められなかっ た。On the thick film circuit board thus obtained, a phosphor bronze shield plate was attached so that the distance between the characteristic detection electrode pad 5 and the characteristic detection electrode pad 5 was 30 μm, and the environment was 120 ° C. and 100% relative humidity. It was left to stand below, a voltage of 5 V was applied between the electrode pad 5 and the shield plate, and a moisture resistance test was conducted for 500 hours. As a result, the insulation resistance before the test was 1000 MΩ or more, but the insulation resistance was not deteriorated even after the test.

【0038】 実験例2 5mm角のアルミナセラミック基板(京セラ製A476)の表面に、銀系(銀 −パラジウム)厚膜導体ペーストで配線パターン2及び0.5mm角の4つの特 性検出用電極パッド5を印刷、焼成した。その後、無機物絶縁ペーストの代わり にエポキシ樹脂で保護膜7を形成して、熱硬化後、特性検出用電極パッド5の表 面をパラジウム活性、無電解Niメッキ、無電解Auメッキ処理を行い、上述の ように耐湿、絶縁抵抗試験を行った。Experimental Example 2 On the surface of a 5 mm square alumina ceramic substrate (A476 manufactured by Kyocera), a wiring pattern 2 and four characteristic detection electrode pads of 0.5 mm square were formed using a silver-based (silver-palladium) thick film conductor paste. 5 was printed and fired. After that, a protective film 7 is formed with an epoxy resin instead of the inorganic insulating paste, and after thermal curing, the surface of the characteristic detection electrode pad 5 is subjected to palladium activation, electroless Ni plating, and electroless Au plating, Moisture resistance and insulation resistance test were conducted.

【0039】 その結果、試験前の絶縁抵抗が1000MΩ以上であったが、試験後において も、絶縁抵抗の劣化が認められなかった。As a result, the insulation resistance before the test was 1000 MΩ or more, but the insulation resistance was not deteriorated even after the test.

【0040】 比較例 実験例1の厚膜回路基板において、特性検出用電極パッド5の表面に厚膜抵抗 体ペーストを被覆しない厚膜回路基板を作成して、同様の耐湿、絶縁抵抗試験を 行った。その結果、試験前の絶縁抵抗が1000MΩ以上であったものが、試験 後においては、絶縁抵抗が12MΩと低下した。Comparative Example In the thick film circuit board of Experimental Example 1, a thick film circuit board in which the surface of the characteristic detecting electrode pad 5 is not covered with the thick film resistor paste is prepared, and the same moisture resistance and insulation resistance tests are performed. It was As a result, the insulation resistance before the test was 1000 MΩ or more, but after the test, the insulation resistance decreased to 12 MΩ.

【0041】 尚、上述の実施例では、厚膜回路基板上に形成した抵抗体膜のトリミングに使 用される特性検出用電極パッドで説明したが、厚膜回路基板に水晶振動子を搭載 したり、またトリマー部品を搭載して、その特性を調整するための測定装置のプ ローブを接触させる特性検出用電極パッドなどに広く用いることができる。In the above-mentioned embodiment, the characteristic detection electrode pad used for trimming the resistor film formed on the thick film circuit board has been described, but a crystal oscillator is mounted on the thick film circuit board. Alternatively, it can be widely used for a characteristic detection electrode pad, etc., which is mounted with a trimmer component and is brought into contact with the probe of a measuring device for adjusting the characteristic thereof.

【0042】[0042]

【考案の効果】[Effect of the device]

以上のように本考案では、回路を構成する抵抗体膜や各種電子部品の特性を測 定する特性検出用電極パッドの表面が化学的に不活性な被覆導体層に被着されて いるため、回路を高密度にしても、マイグレーションが発生せず、また湿気によ る絶縁抵抗の変化がない耐湿信頼性に優れた厚膜回路基板となる。 As described above, in the present invention, the surface of the resistor film that constitutes the circuit and the characteristic detection electrode pad that measures the characteristics of various electronic components are coated on the chemically inactive coated conductor layer. A thick film circuit board that does not cause migration even if the circuit has a high density and does not change its insulation resistance due to moisture and has excellent moisture resistance reliability.

【図面の簡単な説明】[Brief description of drawings]

【図1】本考案の厚膜回路基板の部分平面図である。FIG. 1 is a partial plan view of a thick film circuit board according to the present invention.

【図2】図1中のA−A の部分断面図である。FIG. 2 is a partial cross-sectional view taken along the line AA in FIG.

【符号の説明】[Explanation of symbols]

1・・・セラミック基板 2・・・配線パターン 3・・・搭載用電極パッド 4・・・出力電極パッド 5・・・特性検出用電極パッド 5a・・・下地導体層 5b・・・被覆導体層 6・・・抵抗体膜 7・・・保護膜 DESCRIPTION OF SYMBOLS 1 ... Ceramic substrate 2 ... Wiring pattern 3 ... Mounting electrode pad 4 ... Output electrode pad 5 ... Characteristic detection electrode pad 5a ... Base conductor layer 5b ... Coated conductor layer 6 ... Resistor film 7 ... Protective film

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】 セラミック絶縁基板上に、所望回路を構
成する厚膜配線パターン、出力電極パッド及び特性検出
用電極パッドを形成して成る厚膜回路基板において、 前記特性検出用電極パッドは、下地導体層と化学的に不
活性な被覆導体層とで形成されていることを特徴とする
厚膜回路基板。
1. A thick film circuit board comprising a ceramic insulating substrate on which a thick film wiring pattern, an output electrode pad and a characteristic detecting electrode pad forming a desired circuit are formed, wherein the characteristic detecting electrode pad is a base layer. A thick film circuit board, comprising a conductor layer and a chemically inactive coated conductor layer.
JP3590792U 1992-05-28 1992-05-28 Thick film circuit board Pending JPH0595071U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3590792U JPH0595071U (en) 1992-05-28 1992-05-28 Thick film circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3590792U JPH0595071U (en) 1992-05-28 1992-05-28 Thick film circuit board

Publications (1)

Publication Number Publication Date
JPH0595071U true JPH0595071U (en) 1993-12-24

Family

ID=12455106

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3590792U Pending JPH0595071U (en) 1992-05-28 1992-05-28 Thick film circuit board

Country Status (1)

Country Link
JP (1) JPH0595071U (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002232104A (en) * 2001-01-31 2002-08-16 Kyocera Corp Wiring module
JP2004061629A (en) * 2002-07-25 2004-02-26 Dainippon Printing Co Ltd Manufacturing method for functional element
JP2004061634A (en) * 2002-07-25 2004-02-26 Dainippon Printing Co Ltd Manufacturing method for functional element
JP2006108449A (en) * 2004-10-06 2006-04-20 Nitto Denko Corp Wiring circuit board and its manufacturing method
JP2015220727A (en) * 2014-05-21 2015-12-07 三菱電機株式会社 Wilkinson divider and high frequency circuit
JPWO2016114121A1 (en) * 2015-01-13 2017-04-27 日本特殊陶業株式会社 Method for manufacturing ceramic substrate, ceramic substrate and silver-based conductor material

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002232104A (en) * 2001-01-31 2002-08-16 Kyocera Corp Wiring module
JP4574025B2 (en) * 2001-01-31 2010-11-04 京セラ株式会社 Wiring module
JP2004061629A (en) * 2002-07-25 2004-02-26 Dainippon Printing Co Ltd Manufacturing method for functional element
JP2004061634A (en) * 2002-07-25 2004-02-26 Dainippon Printing Co Ltd Manufacturing method for functional element
JP2006108449A (en) * 2004-10-06 2006-04-20 Nitto Denko Corp Wiring circuit board and its manufacturing method
JP4588405B2 (en) * 2004-10-06 2010-12-01 日東電工株式会社 Wiring circuit board and manufacturing method thereof
JP2015220727A (en) * 2014-05-21 2015-12-07 三菱電機株式会社 Wilkinson divider and high frequency circuit
JPWO2016114121A1 (en) * 2015-01-13 2017-04-27 日本特殊陶業株式会社 Method for manufacturing ceramic substrate, ceramic substrate and silver-based conductor material
JPWO2016114118A1 (en) * 2015-01-13 2017-04-27 日本特殊陶業株式会社 Circuit board and manufacturing method thereof
JPWO2016114119A1 (en) * 2015-01-13 2017-04-27 日本特殊陶業株式会社 Ceramic substrate and manufacturing method thereof

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