JP2004061634A - Manufacturing method for functional element - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method for a functional element easily manufactured and doubly having very accurate functional parts. <P>SOLUTION: The manufacturing method for the functional element includes (1) a stage for forming a photocatalyst incorporating layer being a layer whose contact angle with liquid is made small by the action of a photocatalyst associated with energy radiation and incorporating at least the photocatalyst and binder on base material, (2) a stage for forming an exposure part for the first functional part by radiating energy in a pattern on the photocatalyst incorporating layer, (3) a stage for forming the first functional part at the exposure part for the first functional part, (4) a stage for forming an exposure part for the second functional part by radiating energy in a pattern to the periphery of the first functional part of the photocatalyst incorporating layer where the first functional part is formed, and (5) a stage for forming the second functional part at the exposure part for the second functional part so as to cover the 1st functional part. <P>COPYRIGHT: (C)2004,JPO

Description

【００６５】
ただし、ｎは２以上の整数であり、Ｒ^１，Ｒ^２はそれぞれ炭素数１〜１０の置換もしくは非置換のアルキル、アルケニル、アリールあるいはシアノアルキル基であり、モル比で全体の４０％以下がビニル、フェニル、ハロゲン化フェニルである。また、Ｒ^１、Ｒ^２がメチル基のものが表面エネルギーが最も小さくなるので好ましく、モル比でメチル基が６０％以上であることが好ましい。また、鎖末端もしくは側鎖には、分子鎖中に少なくとも１個以上の水酸基等の反応性基を有する。
【００６６】
また、上記のオルガノポリシロキサンとともに、ジメチルポリシロキサンのような架橋反応をしない安定なオルガノシリコン化合物をバインダに混合してもよい。
【００６７】
（分解物質）
上記第２の形態および第３の形態においては、さらにエネルギー照射による光触媒の作用により分解され、これにより光触媒含有層上の濡れ性を変化させることができる分解物質を光触媒含有層に含有させる必要がある。すなわち、バインダ自体に光触媒含有層上の濡れ性を変化させる機能が無い場合、およびそのような機能が不足している場合に、上述したような分解物質を添加して、上記光触媒含有層上の濡れ性の変化を起こさせる、もしくはそのような変化を補助させるようにするのである。
【００６８】
このような分解物質としては、光触媒の作用により分解し、かつ分解されることにより光触媒含有層表面の濡れ性を変化させる機能を有する界面活性剤を挙げることができる。具体的には、日光ケミカルズ（株）製ＮＩＫＫＯＬ　ＢＬ、ＢＣ、ＢＯ、ＢＢの各シリーズ等の炭化水素系、デュポン社製ＺＯＮＹＬ　ＦＳＮ、ＦＳＯ、旭硝子（株）製サーフロンＳ−１４１、１４５、大日本インキ化学工業（株）製メガファックＦ−１４１、１４４、ネオス（株）製フタージェントＦ−２００、Ｆ２５１、ダイキン工業（株）製ユニダインＤＳ−４０１、４０２、スリーエム（株）製フロラードＦＣ−１７０、１７６等のフッ素系あるいはシリコーン系の非イオン界面活性剤を挙げることかでき、また、カチオン系界面活性剤、アニオン系界面活性剤、両性界面活性剤を用いることもできる。
【００６９】
また、界面活性剤の他にも、ポリビニルアルコール、不飽和ポリエステル、アクリル樹脂、ポリエチレン、ジアリルフタレート、エチレンプロピレンジエンモノマー、エポキシ樹脂、フェノール樹脂、ポリウレタン、メラミン樹脂、ポリカーボネート、ポリ塩化ビニル、ポリアミド、ポリイミド、スチレンブタジエンゴム、クロロプレンゴム、ポリプロピレン、ポリブチレン、ポリスチレン、ポリ酢酸ビニル、ナイロン、ポリエステル、ポリブタジエン、ポリベンズイミダゾール、ポリアクリルニトリル、エピクロルヒドリン、ポリサルファイド、ポリイソプレン等のオリゴマー、ポリマー等を挙げることができる。
【００７０】
（フッ素の含有）
また、本実施態様においては、光触媒含有層がフッ素を含有し、さらにこの光触媒含有層表面のフッ素含有量が、光触媒含有層に対しエネルギーを照射した際に、上記光触媒の作用によりエネルギー照射前に比較して低下するように上記光触媒含有層が形成されていることが好ましい。
【００７１】
このような特徴を有する機能性素子においては、エネルギーをパターン照射することにより、後述するように容易にフッ素の含有量の少ない部分からなるパターンを形成することができる。ここで、フッ素は極めて低い表面エネルギーを有するものであり、このためフッ素を多く含有する物質の表面は、臨界表面張力がより小さくなる。したがって、フッ素の含有量の多い部分の表面の臨界表面張力に比較してフッ素の含有量の少ない部分の臨界表面張力は大きくなる。これはすなわち、フッ素含有量の少ない部分はフッ素含有量の多い部分に比較して親液性領域となっていることを意味する。よって、周囲の表面に比較してフッ素含有量の少ない部分からなるパターンを形成することは、撥液性域内に親液性領域のパターンを形成することとなる。
【００７２】
したがって、このような光触媒含有層を用いた場合は、エネルギーをパターン照射することにより、撥液性領域内に親液性領域のパターンを容易に形成することができるので、濡れ性の差によるパターンの形成が容易に可能となり、利用価値の高い機能性素子を製造することができる。よって、本実施態様においてフッ素の添加は、パターン精度を高めることができるという面で特に有効であるといえる。
【００７３】
上述したような、フッ素を含む光触媒含有層中に含まれるフッ素の含有量としては、エネルギーが照射されて形成されたフッ素含有量が低い親液性領域におけるフッ素含有量が、エネルギー照射されていない部分のフッ素含有量を１００とした場合に１０以下、好ましくは５以下、特に好ましくは１以下であることが好ましい。
【００７４】
このような範囲内とすることにより、エネルギー照射部分と未照射部分との親液性に大きな違いを生じさせることができる。したがって、このような光触媒含有層に機能性部を形成することにより、フッ素含有量が低下した親液性領域のみに正確に機能性部を形成することが可能となり、精度良く機能性素子を得ることができるからである。なお、この低下率は重量を基準としたものである。
【００７５】
このような光触媒含有層中のフッ素含有量の測定は、一般的に行われている種々の方法を用いることが可能であり、例えばＸ線光電子分光法（Ｘ−ｒａｙ　Ｐｈｏｔｏｅｌｅｃｔｒｏｎ　Ｓｐｅｃｔｒｏｓｃｏｐｙ，　ＥＳＣＡ（Ｅｌｅｃｔｒｏｎ　Ｓｐｅｃｔｒｏｓｃｏｐｙ　ｆｏｒ　Ｃｈｅｍｉｃａｌ　Ａｎａｌｙｓｉｓ）とも称される。）、蛍光Ｘ線分析法、質量分析法等の定量的に表面のフッ素の量を測定できる方法であれば特に限定されるものではない。
【００７６】
また、本実施態様においては、光触媒として上述したように二酸化チタンが好適に用いられるが、このように二酸化チタンを用いた場合の、光触媒含有層中に含まれるフッ素の含有量としては、Ｘ線光電子分光法で分析して定量化すると、チタン（Ｔｉ）元素を１００とした場合に、フッ素（Ｆ）元素が５００以上、このましくは８００以上、特に好ましくは１２００以上となる比率でフッ素（Ｆ）元素が光触媒含有層表面に含まれていることが好ましい。
【００７７】
フッ素（Ｆ）が光触媒含有層にこの程度含まれることにより、光触媒含有層上における臨界表面張力を十分低くすることが可能となることから表面における撥液性を確保でき、これによりエネルギーをパターン照射してフッ素含有量を減少させたパターン部分における表面の親液性領域との濡れ性の差異を大きくすることができ、最終的に得られる機能性素子の精度を向上させることができるからである。
【００７８】
さらに、このような機能性素子においては、エネルギーをパターン照射して形成される親インク領域におけるフッ素含有量が、チタン（Ｔｉ）元素を１００とした場合にフッ素（Ｆ）元素が５０以下、好ましくは２０以下、特に好ましくは１０以下となる比率で含まれていることが好ましい。
【００７９】
光触媒含有層中のフッ素の含有率をこの程度低減することができれば、機能性部を形成するためには十分な親液性を得ることができ、上記エネルギーが未照射である部分の撥液性との濡れ性の差異により、機能性部を精度良く形成することが可能となり、利用価値の高い機能性素子を得ることができる。
【００８０】
ｃ．光触媒含有層の基材上への形成方法
上記光触媒含有層は、光触媒、およびバインダを必要に応じて他の添加剤とともに溶剤中に分散して光触媒含有層形成用塗工液を調製し、この塗工液を上記基材上に塗布することにより光触媒含有層を形成することができる。使用する溶剤としては、エタノール、イソプロパノール等のアルコール系の有機溶剤が好ましい。塗布はスピンコート、スプレーコート、ディップコート、ロールコート、ビードコート等の公知の塗布方法により行うことができる。バインダとして紫外線硬化型の成分を含有している場合、紫外線を照射して硬化処理を行うことにより光触媒含有層を形成することができる。
【００８１】
上記、光触媒含有層形成用塗工液中の光触媒の含有量は、固形分の５〜６０重量％、好ましくは２０〜４０重量％の範囲で設定することができる。
【００８２】
このようにして得られた光触媒含有層の厚みは、０．０５〜１０μｍの範囲内であることが好ましい。
【００８３】
（２）第一機能性部用露光部形成工程
次に、第一機能性部用露光部を形成する工程について説明する。本実施態様においては、例えば図１（ｂ）に示すように、上記光触媒含有層を形成する工程により形成された光触媒含有層２表面に対して、例えばフォトマスク３を用いる方法等によりエネルギー４をパターン状に照射して、濡れ性の異なる部位からなる第一機能性部用露光部を形成する工程が行われる。なお、本実施態様でいう第一機能性部用露光部とは、一般的にエネルギー照射に伴う光触媒の作用により、濡れ性が低下した第一機能性部を形成する領域をいう。
【００８４】
以下、本実施態様に用いられるエネルギーとパターン照射の方法について説明する。
【００８５】
（エネルギー）
本実施態様の機能性素子の製造方法においては、エネルギーのパターン照射が行われるが、ここで用いられるエネルギーとしては、光触媒含有層に用いられている光触媒を励起することができるエネルギーであれば特に限定されるものではない。例えば、後述するパターン照射の項で詳述するように光と熱エネルギーの組合せ等であってもよいが、通常光が好適に用いられる。
【００８６】
本実施態様において用いられる光触媒は、そのバンドギャップによって触媒反応を生じさせる光の波長が異なる。例えば、硫化カドニウムであれば４９６ｎｍ、また酸化鉄であれば５３９ｎｍの可視光であり、二酸化チタンであれば３８８ｎｍの紫外光である。したがって、光であれば可視光であれ紫外光であれ本実施態様で用いることができる。しかしながら、上述したようにバンドギャップエネルギーが高いため光触媒として有効であり、かつ化学的にも安定で毒性もなく、入手も容易といった理由から光触媒としては二酸化チタンが好適に用いられる関係上、この二酸化チタンの触媒反応を生じさせる紫外光を含む光であることが好ましい。
【００８７】
このような紫外光を含む光源としては、例えば、水銀ランプ、メタルハライドランプ、キセノンランプ等を挙げることができる。このエネルギー照射に用いる光の波長は４００ｎｍ以下の範囲、好ましくは３８０ｎｍ以下の範囲から設定することができ、また、エネルギー照射に際しての光の照射量は、エネルギー照射された部位が光触媒の作用により親液性を発現するのに必要な照射量とすることができる。
【００８８】
（パターン照射）
本実施態様においては、このようなエネルギーをパターン状に照射する必要がある。パターン状に照射する方法としては、特に限定されるものではないが、通常フォトマスクを用いる方法により行われる。
【００８９】
このフォトマスクを用いる方法以外の方法としては、レーザ等を用いてエネルギーを描画照射するような方法でエネルギーのパターン照射を行っても良い。具体的には、エキシマ、ＹＡＧ等のレーザを用いてパターン状に描画照射する方法を挙げることができる。
【００９０】
また、本実施態様においては、光触媒を加熱しながらエネルギーのパターン照射を行うことが好ましい。光触媒を加熱することにより、感度を上昇させることが可能となり、効率的な濡れ性の変化を行うことができるからである。具体的には、３０℃〜８０℃の範囲内で加熱することが好ましい。
【００９１】
（３）第一機能性部形成工程
次に、上述した第一機能性部用露光部形成工程により、親液性領域とされた第一機能性部用露光部に第一機能性部を形成する工程について説明する。
【００９２】
例えば図１（ｃ）に示すように、第一機能性部６は、上述したように親液性領域とされた第一機能性部用露光部５に例として機能性部用組成物等を用いて形成される。この際、上述したように、エネルギー未照射部である光触媒含有層２上は、撥液性領域であり、エネルギー照射部である第一機能性部５上は親液性領域である。これにより、撥液性領域である光触媒含有層２上には、塗工液は付着せず、第一機能性部用露光部５のみに例えば機能性部用組成物等を用いて種々の機能性部を第一機能性部用露光部に形成することが可能となり、また第一機能性部用露光部５は、親液性であることから、塗工液により均一に機能性部を形成することが可能となるのである。この場合には、光触媒含有層上のエネルギー未照射部は、臨界表面張力が５０ｍＮ／ｍ以下、好ましくは３０ｍＮ／ｍ以下であることが望ましい。
【００９３】
ここで機能性とは、光学的（光選択吸収、反射性、偏光性、光選択透過性、非線形光学性、蛍光あるいはリン光等のルミネッセンス、フォトクロミック性等）、磁気的（硬磁性、軟磁性、非磁性、透磁性等）、電気・電子的（導電性、絶縁性、圧電性、焦電性、誘電性等）、化学的（吸着性、脱着性、触媒性、吸水性、イオン伝導性、酸化還元性、電気化学特性、エレクトロクロミック性等）、機械的（耐摩耗性等）、熱的（伝熱性、断熱性、赤外線放射性等）、生体機能的（生体適合性、抗血栓性等）のような各種の機能を意味するものである。
【００９４】
本発明に用いられる機能性部用組成物としては、上述したように機能性素子の機能、機能性素子の形成方法等によって大きく異なるものであるが、例えば、紫外線硬化型モノマー等に代表される溶剤で希釈されていない組成物や、溶剤で希釈した液体状の組成物等を用いることができる。また、機能性部用組成物としては粘度が低いほど短時間にパターンが形成できることから特に好ましい。ただし、溶剤で希釈した液体状組成物の場合には、パターン形成時に溶剤の揮発による粘度の上昇、表面張力の変化が起こるため、溶剤が低揮発性であることが望ましい。さらに、後述するように、この機能性部上に第二機能性部を形成することから、第一機能性部を形成する機能性部用組成物は、親液性であることが好ましい。これにより、第二機能性部を均一に第一機能性部上に形成することが可能となるからである。また、第一機能性部を形成後、その表面を親液性とするように親液性処理を施してもよい。これにより、第二機能性部を第一機能性部上に均一に形成することが可能となるからである。
【００９５】
本発明に用いられる機能性部用組成物としては、第一機能性部用露光部に付着等させて配置されることにより機能性部となるものであってもよく、また第一機能性部用露光部上に配置された後、薬剤により処理され、もしくは紫外線、熱等により処理された後に機能性部となるものであってもよい。この場合、機能性部用組成物の結着剤として、紫外線、熱、電子線等で効果する成分を含有している場合には、硬化処理を行うことにより素早く機能性部が形成できることから好ましい。
【００９６】
このような機能性素子の形成方法を具体的に説明すると、機能性部用組成物は、ディップコート、ロールコート、ブレードコート、スピンコート等の塗布手段、インクジェット等を含むノズル吐出手段等の手段を用いて機能性素子上に形成された親液性領域のパターン上に機能性部を形成する。中でもノズル吐出手段を用いることが好ましく、特にインクジェット法であることが好ましい。
【００９７】
本実施態様において、好ましい第一機能性部としては、光導波路のコア層、ハードコート材により保護されるマイクロレンズ、絶縁層により被覆される金属配線等が挙げられる。
【００９８】
（４）第二機能性部用露光部形成工程
次に、第一機能性部が形成された光触媒含有層上に、第二機能性部用露光部を形成する工程について説明する。本実施態様における第二機能性部用露光部を形成する工程は、例えば図１（ｄ）に示すように、フォトマスク３を用いて、第一機能性部の周囲の第二機能性部を形成するパターン状に、エネルギー４を照射する。このエネルギー照射により、上述したように、エネルギーを照射した第二機能性部用露光部が親液性領域とされる。
【００９９】
ここで、本実施態様における、第一機能性部の周囲とは、例えば図２に示すように、第二機能性部用露光部７が第一機能性部６の全ての周りを囲むものであるものや、図３または図４に示すように、第一機能性部６の一部の周りを囲むものであるものも含むものとする。また、図５に示すように、第一機能性部の両側に第二機能性部用露光部が形成されたものであってもよい。
【０１００】
なお、本工程におけるエネルギーやこのパターン照射、さらにはパターン形成等については、第一機能性部用露光部形成工程と同様であるので、ここでの説明は省略する。
【０１０１】
（５）第二機能性部形成工程
次に、第二機能性部用露光部に第二機能性部を形成する工程について説明する。例えば図１（ｅ）に示すように、上記工程により第一機能性部６の周囲の第二機能性部用露光部７が親液性領域とされていることから、この第二機能性部８を、第一機能性部６の周囲、かつ上記第一機能性部６を覆うように形成する。これにより、機能性部が二重に形成された機能性素子とすることが可能となるのである。この機能性部の種類や、形成方法は特に限定されるものではなく、第一機能性部形成工程で述べたものと同様であるので、ここでの説明は省略する。
【０１０２】
ここで、本実施態様における、第二機能性部としては、封止材、光導波路のクラッド層、マイクロレンズのハードコート材、金属配線を覆う絶縁層等が挙げられ、中でも封止材、光導波路のクラッド層であることが好ましい。
【０１０３】
まず、第二機能性部が封止材である場合には、第一機能性部形成工程で形成した第一機能性部を封止することができ、高精細なパターンで第一機能性部を封止することが可能となるからである。
【０１０４】
また、機能性素子が光導波路である場合には、第一機能性部をコア層、第二機能性部をクラッド層とすることが可能となり、光導波路を容易に、かつ高精細に製造することができるからである。
【０１０５】
２．第二実施態様
本発明の機能性素子の製造方法の、第二実施態様は、
（１）基材上に、少なくとも光触媒が含有された光触媒処理層を形成する工程と、
（２）上記光触媒処理層上に、エネルギー照射に伴う光触媒の作用により液体との接触角が低下する層である濡れ性変化層を形成する工程と、
（３）上記濡れ性変化層にパターン状にエネルギーを照射して第一機能性部用露光部を形成する工程と、
（４）上記第一機能性部用露光部に第一機能性部を形成する工程と、
（５）上記第一機能性部が形成された濡れ性変化層の第一機能性部の周囲に、パターン状にエネルギー照射して第二機能性部用露光部を形成する工程と、
（６）上記第一機能性部を覆うように上記第二機能性部用露光部に第二機能性部を形成する工程と
を有すること特徴とする方法である。
【０１０６】
本実施態様の例として、図６に示すように、まず基材１上に少なくとも光触媒が含有された光触媒処理層９を形成する（図６（ａ））。次に、その光触媒処理層９上にエネルギー照射に伴う光触媒の作用により、液体との接触角が低下する濡れ性変化層１０を形成する（図６（ｂ））。この濡れ性変化層１０に、フォトマスク３を用いて、第一機能性部を形成するパターン状に、エネルギー４を照射する（図６（ｃ））。ここで、エネルギーが照射された領域の濡れ性変化層は、親液性領域とされる。これにより、親液性領域とされた第一機能性部用露光部５上に、機能性部用組成物等を用いて第一機能性部６が形成される（図６（ｄ））。この際、エネルギー未照射領域の濡れ性変化層１０は、撥液性領域であることから、機能性部用組成物は付着せず、高精細なパターンの第一機能性部６を形成することが可能となるのである。さらに、この第一機能性部６が形成された濡れ性変化層１０の第一機能性部の周囲に、第二機能性部を形成するパターン状にフォトマスク３を用いてエネルギー４をパターン状に照射する（図６（ｅ））。これにより、上記と同様に第二機能性部用露光部７が親液性領域とされ、容易に機能性部用組成物等により、第二機能性部８を、第一機能性部の周囲、かつ第一機能性部を覆うように形成することが可能となるのである（図６（ｆ））。
【０１０７】
また、本実施態様においては、光触媒が濡れ性変化層中に含有されないことから、機能性部と光触媒が直接接触しない。これにより、経時的に機能性部が光触媒の影響を受ける可能性が低くなり、様々な用途に用いることが可能な機能性素子とすることが可能となるのである。
【０１０８】
以下、これらの第二実施態様の各工程について詳しく説明する。
【０１０９】
（１）光触媒処理層形成工程
まず、本実施態様の光触媒処理層形成工程について説明する。例えば図６（ａ）に示すように、本実施態様においては、基材１上に、光触媒処理層９が形成される。なお基材は、上記第一実施態様で述べたものと同様であるので、ここでの説明は省略する。
【０１１０】
本実施態様における光触媒処理層は、少なくとも光触媒を含有するものであり、バインダの有無を問わない点で上記第一実施態様における光触媒含有層と異なるものである。
【０１１１】
本実施態様において、光触媒処理層がバインダを有する場合は、上記第一実施態様で説明した光触媒含有層と同様であるので、ここでの説明は省略する。ただし、第二実施態様においては、光触媒処理層上の濡れ性は特に変化する必要がないことから、バインダ自体に光触媒が作用することによる濡れ性の変化が生じない場合であっても、第一実施態様のように分解物質を光触媒処理層に含有させる必要がない。また、バインダを有する場合の光触媒処理層の製造方法は、上述した第一実施態様と同様であるので、これについての説明も省略する。
【０１１２】
一方、バインダを有さない場合の光触媒含有層の形成方法としては、例えば、スパッタリング法、ＣＶＤ法、真空蒸着法等の真空製膜法を用いる方法を挙げることができる。真空製膜法により光触媒含有層を形成することにより、均一な膜でかつ光触媒のみを含有する光触媒含有層とすることが可能であり、これにより濡れ性変化層上の濡れ性を均一に変化させることが可能であり、かつ光触媒のみからなることから、バインダを用いる場合と比較して効率的に濡れ性変化層上の濡れ性を変化させることが可能となる。
【０１１３】
また、光触媒のみからなる光触媒含有層の他の形成方法としては、例えば光触媒が二酸化チタンの場合は、基体上に無定形チタニアを形成し、次いで焼成により結晶性チタニアに相変化させる方法等が挙げられる。ここで用いられる無定形チタニアとしては、例えば四塩化チタン、硫酸チタン等のチタンの無機塩の加水分解、脱水縮合、テトラエトキシチタン、テトライソプロポキシチタン、テトラ−ｎ−プロポキシチタン、テトラブトキシチタン、テトラメトキシチタン等の有機チタン化合物を酸存在下において加水分解、脱水縮合によって得ることができる。次いで、４００℃〜５００℃における焼成によってアナターゼ型チタニアに変性し、６００℃〜７００℃の焼成によってルチル型チタニアに変性することができる。
【０１１４】
（２）濡れ性変化層形成工程
次に、濡れ性変化層形成工程について説明する。本実施態様においては、例として図６（ｂ）に示すように、上述した光触媒処理層９上にエネルギー照射に伴う光触媒の作用により液体との接触角が低下する濡れ性変化層１０を形成する。これにより、濡れ性変化層中に光触媒を含有する必要がないことから、経時的に機能性部が光触媒の影響を受ける可能性を少なくすることができ、高品質な機能性素子とすることが可能となるのである。
【０１１５】
この濡れ性変化層は、光触媒処理層の作用により濡れ性が変化する層であれば特に限定されるものではいが、上記第一実施態様の光触媒処理層中のバインダと同様の材料で形成することが好ましい。なお、このように上記第一実施態様の光触媒含有層中のバインダと同様の材料で形成した場合の濡れ性変化層の材料および形成方法に関しては、上記第一実施態様と同様であるので、ここでの説明は省略する。
【０１１６】
本実施態様において、この濡れ性変化層の厚みは、光触媒による濡れ性の変化速度等の関係より、０．００１μｍから１μｍであることが好ましく、特に好ましくは０．０１〜０．１μｍの範囲内である。
【０１１７】
本発明において上述した成分の濡れ性変化層を用いることにより、隣接する光触媒処理層中の光触媒の作用により、上記成分の一部である有機基や添加剤の酸化、分解等の作用を用いて、エネルギー照射部分の濡れ性を変化させて親液性とし、エネルギー未照射部との濡れ性に大きな差を生じさせることができる。よって、各種機能性部用組成物等との受容性（親液性）および反撥性（撥液性）を高めることによって、利用価値の高い機能性素子とすることができる。
【０１１８】
本実施態様における濡れ性変化層は、エネルギー照射されていない部分における表面張力４０ｍＮ／ｍの液体との接触角を、エネルギー照射された部分における表面張力４０ｍＮ／ｍの液体との接触角より１°以上大きい接触角とすることが可能な層であることが好ましい。このように、少なくとも接触角の差が１°以上あれば、各種機能性部用組成物を親液性領域に沿って塗布することが容易となるからである。
【０１１９】
具体的には、エネルギー照射していない部分においては、表面張力４０ｍＮ／ｍの液体との接触角が１０°以上、好ましくは表面張力３０ｍＮ／ｍの液体との接触角が１０°以上、特に表面張力２０ｍＮ／ｍの液体との接触角が１０°以上であることが好ましい。これは、エネルギー照射していない部分は、本発明においては撥液性が要求される部分であることから、液体との接触角が小さい場合は、撥液性が十分でなく、各種機能性部用組成物等が残存する可能性が生じるため好ましくないからである。
【０１２０】
また、上記濡れ性変化層は、エネルギー照射すると液体との接触角が低下して、表面張力４０ｍＮ／ｍの液体との接触角が９度未満、好ましくは表面張力５０ｍＮ／ｍの液体との接触角が１０°以下、特に表面張力６０ｍＮ／ｍの液体との接触角が１０°以下となるような層であることが好ましい。エネルギー照射した部分の液体との接触角が高いと、この部分での各種機能性部用組成物等の広がりが劣る可能性があり、精度良く機能性部を形成することができない可能性があるからである。
【０１２１】
なお、この濡れ性変化層には、上記第一実施態様における光触媒含有層の説明中「フッ素の含有」の項で記載したものと同様にして同様のフッ素を含有させることができる。
【０１２２】
（３）第一機能性部用露光部形成工程
次に、第一機能性部用露光部形成工程について説明する。例えば図６（ｃ）に示すように、上述した濡れ性変化層１０上に、例としてフォトマスク３等を用いることによって、第一機能性部を形成するパターン状にエネルギー４を照射し、濡れ性が低下した第一機能性部用露光部５を形成する工程である。これにより、第一機能性部をこの親液性領域である第一機能性部用露光部上に形成することが可能となるのである。このエネルギーの照射や、照射方法、パターン形成方法等については、上述した第一実施態様と同様であるので、ここでの説明は省略する。
【０１２３】
（４）第一機能性部形成工程
次に、第一機能性部形成工程を説明する。この第一機能性部形成工程は、例えば図６（ｄ）に示すように、上述した工程により、親液性領域とされた第一機能性部用露光部５に第一機能性部６を形成する工程である。この機能性部の種類や、形成方法は特に限定されるものではなく、第一実施態様で述べたものと同様であるので、ここでの説明は省略する。
【０１２４】
（５）第二機能性部用露光部形成工程
次に、第二機能性部用露光部を形成する。この工程は、例として図６（ｅ）に示すように、上述した工程により形成された第一機能性部６の周囲であり、かつ第二機能性部を形成するパターン状に、例えばフォトマスク３等を用いてエネルギー４を照射する工程である。これにより、上述したように、第二機能性部用露光部を親液性領域とすることが可能となり、容易に第二機能性部を形成することが可能となるのである。この第二機能性部用露光部の形成工程については、第一実施態様と同様であるので、ここでの説明は省略する。
【０１２５】
（６）第二機能性部形成工程
次に、上述した工程で親液性領域とされた第二機能性部用露光部に第二機能性部を形成する。この工程は、例として図６（ｆ）に示すように、上記工程により親液性領域とされた第二機能性部用露光部７上、かつ第一機能性部を覆うように、例えば機能性部用組成物等を用いて第二機能性部８を形成する工程である。これにより、第一機能性部の周囲、かつ第一機能性部上に第二機能性部を容易に形成することが可能となり、高精細な機能性素子とすることが可能となるのである。
【０１２６】
この第二機能性部形成工程についても、第一実施態様と同様であるので、ここでの説明は省略する。
【０１２７】
３．第三実施態様
本発明の第三実施態様は、
（１）基材上に、少なくとも光触媒が含有された光触媒処理層を形成する工程と、
（２）上記光触媒処理層上に、エネルギー照射に伴う光触媒の作用により分解除去される層である分解除去層を形成する工程と、
（３）上記分解除去層にパターン状にエネルギーを照射して第一機能性部用露光部を形成する工程と、
（４）上記第一機能性部用露光部に第一機能性部を形成する工程と、
（５）上記第一機能性部が形成された分解除去層の第一機能性部の周囲に、パターン状にエネルギー照射して第二機能性部用露光部を形成する工程と、
（６）上記第一機能性部を覆うように上記第二機能性部用露光部に第二機能性部を形成する工程と
を有すること特徴とする機能性素子の製造方法を提供する。
【０１２８】
本実施態様は、例として図７に示すように、基材１上に少なくとも光触媒が含有された光触媒処理層９を形成する（図７（ａ））。次に、その光触媒処理層９上にエネルギー照射に伴う光触媒の影響により分解除去される分解除去層１１を形成する（図７（ｂ））。その分解除去層１１上に、第一機能性部を形成するパターン状に、フォトマスク３を用いてエネルギー４を照射する（図７（ｃ））。このエネルギー照射により、第一機能性部を形成する領域のみ分解除去層１１が分解除去される。ここで、この分解除去層１１の液体との接触角が、分解除去層１１が分解除去されて露出する光触媒処理層９の液体との接触角より大きいことが好ましい。これにより、第一機能性部の形成を分解除去層１１が分解除去された凹凸だけでなく、濡れ性の差も利用して、容易に行うことが可能となるからである。さらに、この分解除去層１１が分解除去された第一機能性部用露光部５に、第一機能性部６を形成する（図７（ｄ））。次に、第一機能性部が形成された分解除去層１１の、第二機能性部が形成される第一機能性部６の周囲に、フォトマスク３を用いてエネルギー４の照射をパターン状に行う（図７（ｅ））。これにより、エネルギー照射された第二機能性部用露光部７の分解除去層１１が分解除去され、凹凸が形成され、第二機能性部８を容易に形成することが可能となる（図７（ｆ））。
【０１２９】
以下、これらの各工程についてそれぞれ説明する。
【０１３０】
（１）光触媒処理層形成工程
まず、本実施態様の光触媒処理層形成工程について説明する。例えば図７（ａ）に示すように、本実施態様においては、基材１上に、光触媒処理層９が形成される。基材は、上記第一実施態様で述べたものと同様であるので、ここでの説明は省略する。また、光触媒処理層は、上記第二実施態様で述べたものと同様であるので、ここでの説明は省略する。
【０１３１】
（２）分解除去層形成工程
次に、分解除去層形成工程について説明する。本実施態様の分解除去層形成工程は、例えば図７（ｂ）に示すように、上記工程で形成された光触媒処理層上に分解除去層１１を形成する工程である。本実施態様で用いられる分解除去層は、エネルギー照射された際に光触媒処理層中の光触媒の作用により、エネルギー照射された部分の分解除去層が分解除去される層であれば、特に限定されるものではない。
【０１３２】
このように分解除去層は、エネルギー照射した部分が光触媒の作用により分解除去されることから、現像工程や洗浄工程を行うことなく分解除去層のある部分と無い部分からなるパターン、すなわち凹凸を有するパターンを形成することができる。
【０１３３】
なお、この分解除去層は、エネルギー照射による光触媒の作用により酸化分解され、気化等されることから、現像・洗浄工程等の特別な後処理なしに除去されるものであるが、分解除去層の材質によっては、洗浄工程等を行ってもよい。
【０１３４】
また、本実施態様に用いられる分解除去層は、凹凸を形成するのみならず、この分解除去層が、上記基材表面と比較して、液体との接触角が高いことが好ましい。これにより、分解除去層が分解除去され、基材が露出した領域を親液性領域、上記分解除去層が残存する領域を撥液性領域とすることが可能となり、種々のパターンを形成することが可能となるからである。
【０１３５】
ここで、上記エネルギー照射により分解除去層が分解除去されて露出する光触媒処理層からなる親液性領域と、エネルギー未照射部の分解除去層からなる撥液性領域との特性が、その後塗布する機能性部用組成物が有する表面張力と同等の表面張力の液体に対する接触角において、少なくとも１°以上、好ましくは５°以上、特に１０°以上異なる親液性領域および撥液性領域から形成されたパターンであることが好ましい。
【０１３６】
また、本実施態様の分解除去層表面の液体との接触角は、表面張力４０ｍＮ／ｍの液体との接触角が１０°以上、好ましくは表面張力３０ｍＮ／ｍの液体との接触角が１０°以上、特に表面張力２０ｍＮ／ｍの液体との接触角が１０°以上の値を示すことが好ましい。
【０１３７】
また、本実施態様においては、光触媒処理層が親液性であることが好ましく、具体的には、表面張力４０ｍＮ／ｍの液体との接触角として９°以下であることが好ましく、さらに好ましくは、表面張力４０ｍＮ／ｍの液体との接触角として５°以下、特に好ましくは１°以下であることである。
【０１３８】
分解除去層および光触媒処理層の濡れ性が、上記範囲内であることにより、光触媒処理層が露出した領域を親液性領域、分解除去層が残存する領域を撥液性領域とすることが可能となり、高精細なパターンの形成が容易となるからである。ここで、液体との接触角は、第一実施態様において説明した方法により測定した値である。
【０１３９】
本実施態様の分解除去層に用いることができる膜としては、具体的にはフッ素系や炭化水素系の撥液性を有する樹脂等による膜を挙げることができる。これらのフッ素系や炭化水素系の樹脂は、撥液性を有するものであれば、特に限定されるものではなく、これらの樹脂を溶媒に溶解させ、例としてスピンコート法等の一般的な成膜方法により形成することが可能である。
【０１４０】
また、本実施態様においては、機能性薄膜、すなわち、自己組織化単分子膜、ラングミュア−ブロケット膜、および交互吸着膜等を用いることにより、欠陥のない膜を形成することが可能であることから、このような成膜方法を用いることがより好ましいといえる。
【０１４１】
ここで、本実施態様に用いられる自己組織化単分子膜、ラングミュア−ブロケット膜、および交互吸着膜について具体的に説明する。
【０１４２】
（ｉ）自己組織化単分子膜
自己組織化単分子膜（Ｓｅｌｆ−Ａｓｓｅｍｂｌｅｄ　Ｍｏｎｏｌａｙｅｒ）の公式な定義の存在を発明者らは知らないが、一般的に自己組織化膜として認識されているものの解説文としては、例えばＡｂｒａｈａｍ　Ｕｌｍａｎによる総説“Ｆｏｒｍａｔｉｏｎ　ａｎｄ　Ｓｔｒｕｃｔｕｒｅ　ｏｆ　Ｓｅｌｆ−Ａｓｓｅｍｂｌｅｄ　Ｍｏｎｏｌａｙｅｒｓ”，　Ｃｈｅｍｉｃａｌ　Ｒｅｖｉｅｗ，　９６，　１５３３−１５５４　（１９９６）が優れている。本総説を参考にすれば、自己組織化単分子膜とは、適当な分子が適当な基材表面に吸着・結合（自己組織化）した結果生じた単分子層のことと言える。自己組織化膜形成能のある材料としては、例えば、脂肪酸などの界面活性剤分子、アルキルトリクロロシラン類やアルキルアルコキシド類などの有機ケイ素分子、アルカンチオール類などの有機イオウ分子、アルキルフォスフェート類などの有機リン酸分子などが挙げられる。分子構造の一般的な共通性は、比較的長いアルキル鎖を有し、片方の分子末端に基材表面と相互作用する官能基が存在することである。アルキル鎖の部分は分子同士が２次元的にパッキングする際の分子間力の源である。もっとも、ここに示した例は最も単純な構造であり、分子のもう一方の末端にアミノ基やカルボキシル基などの官能基を有するもの、アルキレン鎖の部分がオキシエチレン鎖のもの、フルオロカーボン鎖のもの、これらが複合したタイプの鎖のものなど様々な分子から成る自己組織化単分子膜が報告されている。また、複数の分子種から成る複合タイプの自己組織化単分子膜もある。また、最近では、デンドリマーに代表されるような粒子状で複数の官能基（官能基が一つの場合もある）を有する高分子や直鎖状（分岐構造のある場合もある）の高分子が一層基材表面に形成されたもの（後者はポリマーブラシと総称される）も自己組織化単分子膜と考えられる場合もあるようである。本実施態様は、これらも自己組織化単分子膜に含める。
【０１４３】
（ｉｉ）ラングミュア−ブロジェット膜
本実施態様に用いられるラングミュア−ブロジェット膜（Ｌａｎｇｍｕｉｒ−Ｂｌｏｄｇｅｔｔ　Ｆｉｌｍ）は、基材上に形成されてしまえば形態上は上述した自己組織化単分子膜との大きな相違はない。ラングミュア−ブロジェット膜の特徴はその形成方法とそれに起因する高度な２次元分子パッキング性（高配向性、高秩序性）にあると言える。すなわち、一般にラングミュア−ブロジェット膜形成分子は気液界面上に先ず展開され、その展開膜がトラフによって凝縮されて高度にパッキングした凝縮膜に変化する。実際は、これを適当な基材に移しとって用いる。ここに概略を示した手法により単分子膜から任意の分子層の多層膜まで形成することが可能である。また、低分子のみならず、高分子、コロイド粒子なども膜材料とすることができる。様々な材料を適用した最近の事例に関しては宮下徳治らの総説“ソフト系ナノデバイス創製のナノテクノロジーへの展望”　高分子　５０巻　９月号　６４４−６４７　（２００１）に詳しく述べられている。
【０１４４】
（ｉｉｉ）交互吸着膜
交互吸着膜（Ｌａｙｅｒ−ｂｙ−Ｌａｙｅｒ　Ｓｅｌｆ−Ａｓｓｅｍｂｌｅｄ　Ｆｉｌｍ）は、一般的には、最低２個の正または負の電荷を有する官能基を有する材料を逐次的に基材上に吸着・結合させて積層することにより形成される膜である。多数の官能基を有する材料の方が膜の強度や耐久性が増すなど利点が多いので、最近ではイオン性高分子（高分子電解質）を材料として用いることが多い。また、タンパク質や金属や酸化物などの表面電荷を有する粒子、いわゆる“コロイド粒子”も膜形成物質として多用される。さらに最近では、水素結合、配位結合、疎水性相互作用などのイオン結合よりも弱い相互作用を積極的に利用した膜も報告されている。比較的最近の交互吸着膜の事例については、静電的相互作用を駆動力にした材料系に少々偏っているがＰａｕｌａ　Ｔ．　Ｈａｍｍｏｎｄによる総説“Ｒｅｃｅｎｔ　Ｅｘｐｌｏｒａｔｉｏｎｓ　ｉｎ　Ｅｌｅｃｔｒｏｓｔａｔｉｃ　Ｍｕｌｔｉｌａｙｅｒ　Ｔｈｉｎ　Ｆｉｌｍ　Ａｓｓｅｍｂｌｙ”Ｃｕｒｒｅｎｔ　Ｏｐｉｎｉｏｎ　ｉｎ　Ｃｏｌｌｏｉｄ　＆　Ｉｎｔｅｒｆａｃｅ　Ｓｃｉｅｎｃｅ，　４，　４３０−４４２　（２０００）に詳しい。交互吸着膜は、最も単純なプロセスを例として説明すれば、正（負）電荷を有する材料の吸着−洗浄−負（正）電荷を有する材料の吸着−洗浄のサイクルを所定の回数繰り返すことにより形成される膜である。ラングミュア−ブロジェット膜のように展開−凝縮−移し取りの操作は全く必要ない。また、これら製法の違いより明らかなように、交互吸着膜はラングミュア−ブロジェット膜のような２次元的な高配向性・高秩序性は一般に有さない。しかし、交互吸着膜及びその作製法は、欠陥のない緻密な膜を容易に形成できること、微細な凹凸面やチューブ内面や球面などにも均一に成膜できることなど、従来の成膜法にない利点を数多く有している。
【０１４５】
また、分解除去層の膜厚としては、後述するエネルギー照射工程において照射されるエネルギーにより分解除去される程度の膜厚であれば特に限定されるものではない。具体的な膜厚としては、照射されるエネルギーの種類や分解除去層の材料等により大きく異なるものではあるが、一般的には、０．００１μｍ〜１μｍの範囲内、特に０．０１μｍ〜０．１μｍの範囲内とすることが好ましい。
【０１４６】
（３）第一機能性部用露光部形成工程
次に、第一機能性部用露光部形成工程を説明する。本実施態様においては、例として図７（ｃ）に示すように、第一機能性部を形成する領域に、例としてフォトマスク３を用いる等により、エネルギー４をパターン状に照射する。これにより、上述した分解除去層１１の第一機能性部用露光部５のみが分解除去され、凹凸を有するパターンを形成することが可能となるのである。また、上述したように、分解除去層１１が残存する領域が撥液性領域、分解除去層１１がエネルギー照射により除去されて、光触媒処理層９が露出した第一機能性部用露光部５が親液性領域であることが好ましく、この濡れ性の差を利用して、より容易に第一機能性部を形成することが可能となる。このエネルギー照射や、照射方法、パターン形成方法等については、上述した第一実施態様と同様であるので、ここでの説明は省略する。
【０１４７】
（４）第一機能性部形成工程
次に、第一機能性部形成工程を説明する。この第一機能性部形成工程は、例えば図７（ｄ）に示すように、上述した工程により、分解除去層が分解除去された光触媒処理層９上の第一機能性部用露光部５に第一機能性部６を形成する工程である。この機能性部の種類や、形成方法は特に限定されるものではなく、第一実施態様で述べたものと同様であるので、ここでの説明は省略する。
【０１４８】
なお、本実施態様における第一機能性部形成工程において、エネルギー照射部とエネルギー未照射部との特性の差が分解除去層の有無による凹凸のみである場合には、第一機能性部はノズル吐出法により形成することが好ましい。
【０１４９】
（５）第二機能性部用露光部形成工程
次に、第二機能性部用露光部を形成する。この工程は、例として図７（ｅ）に示すように、上述した工程により形成された第一機能性部６の周囲であり、かつ第二機能性部を形成するパターン状に、例えばフォトマスク３等を用いてエネルギー４を照射する工程である。これにより、上述したように、第二機能性部用露光部７の分解除去層１１を分解除去することが可能となり、容易に第二機能性部８を形成することが可能となるのである。この第二機能性部用露光部形成工程は、上記第一機能性部形成工程と同様であるので、ここでの説明は省略する。
【０１５０】
（６）第二機能性部形成工程
次に、上述した工程で分解除去層が分解除去された第二機能性部用露光部に第二機能性部を形成する。この工程は、例として図７（ｆ）に示すように、上記工程により分解除去層１１が分解除去されて、光触媒処理層９が露出した第二機能性部用露光部７上であり、また第一機能性部を覆うように、例えば機能性部用組成物等を用いて第二機能性部８を形成する工程である。これにより、第一機能性部の周囲、かつ第一機能性部上に第二機能性部を容易に形成することが可能となり、高精細な機能性素子とすることが可能となるのである。
【０１５１】
この第二機能性部形成工程については、第一実施態様と同様であるので、ここでの説明は省略する。
【０１５２】
Ｂ．機能性素子
次に、本発明の機能性素子について説明する。本発明の機能性素子は、３つの態様があり、第一の態様は、例として図８に示すように、基材１と、その基材１上に形成されたエネルギー照射に伴う光触媒の作用により、液体との接触角が低下する層であり、かつ少なくとも光触媒およびバインダを含有する光触媒含有層２と、その光触媒含有層２上にパターン状に形成された第一機能性部６と、その第一機能性部６の周囲であり、かつ第一機能性部６を覆うように第二機能性部８とを有する機能性素子である。ここで、光触媒含有層は、上記エネルギー照射により形成される親液性領域と、エネルギー未照射の撥液性領域との特性が、その後塗布する機能性部用組成物が有する表面張力と同等の表面張力の液体に対する接触角において、少なくとも１°以上、好ましくは５°以上、特に１０°以上異なる親液性領域および撥液性領域から形成されたパターンであることが好ましい。また、本実施態様の機能性素子における撥液性領域は、その特性が表面張力４０ｍＮ／ｍの液体との接触角として１０°以上であることが好ましく、特に表面張力３０ｍＮ／ｍの液体との接触角が１０°以上、中でも表面張力２０ｍＮ／ｍの液体との接触角が１０°以上であることが好ましい。
【０１５３】
さらに、本実施態様の機能性素子における親液性領域は、その特性が表面張力４０ｍＮ／ｍの液体との接触角として、９°以下であることが好ましく、特に表面張力５０ｍＮ／ｍの液体との接触角が１０°以下、中でも表面張力６０ｍＮ／ｍの液体との接触角が１０°以下であることが好ましい。
【０１５４】
これにより、光触媒含有層のエネルギー照射部の濡れ性と、光触媒含有層のエネルギー未照射部との濡れ性の差を利用して、機能性部を形成することが可能となることから、製造が容易であり、結果的に低コストで高精細なパターンを形成することが可能となるからである。
【０１５５】
第二の態様は、例として図９に示すように、基材１と、上記基材１上に形成された少なくとも光触媒が含有された光触媒処理層９と、上記光触媒処理層９上に形成されたエネルギー照射に伴う光触媒の作用により液体との接触角が低下する層である濡れ性変化層１０と、上記濡れ性変化層１０上にパターン状に形成された第一機能性部６と、上記第一機能性部６を覆うように形成された第二機能性部８とを有することを特徴とする機能性素子である。
【０１５６】
第二の態様においても、上記エネルギー照射により形成される親液性領域と、エネルギー未照射の撥液性領域との特性が、その後塗布する機能性部用組成物が有する表面張力と同等の表面張力の液体に対する接触角において、少なくとも１°以上、好ましくは５°以上、特に１０°以上異なる親液性領域および撥液性領域から形成されたパターンであることが好ましい。また、本実施態様の機能性素子における撥液性領域は、その特性が表面張力４０ｍＮ／ｍの液体との接触角として１０°以上であることが好ましく、特に表面張力３０ｍＮ／ｍの液体との接触角が１０°以上、中でも表面張力２０ｍＮ／ｍの液体との接触角が１０°以上であることが好ましい。
【０１５７】
さらに、本実施態様の機能性素子における親液性領域は、その特性が表面張力４０ｍＮ／ｍの液体との接触角として、９°以下であることが好ましく、特に表面張力５０ｍＮ／ｍの液体との接触角が１０°以下、中でも表面張力６０ｍＮ／ｍの液体との接触角が１０°以下であることが好ましい。
【０１５８】
これにより、第一の態様と同様に、濡れ性変化層のエネルギー照射部の濡れ性と、濡れ性変化層のエネルギー未照射部の濡れ性との差を利用して、機能性部を形成することが可能となることから、製造が容易であり、結果的に低コストで高精細なパターンを形成することが可能となるからである。さらに、第二の態様においては、濡れ性変化層に光触媒を含有される必要がないことから、機能性部と光触媒が直接接触せず、経時的に機能性部が光触媒の影響を受ける可能性を低くすることが可能であり、高品質な機能性素子とすることが可能となる。
【０１５９】
第三の態様は、図１０に示すように、基材１と、上記基材１上に形成された少なくとも光触媒が含有された光触媒処理層９と、上記光触媒処理層９上に形成されたエネルギー照射に伴う光触媒の作用により分解除去される層である分解除去層１１と、上記光触媒処理層９上の上記分解除去層１１が分解除去された領域に、パターン状に形成された第一機能性部６と、上記第一機能性部６の周囲であり、かつ上記光触媒処理層９上の上記分解除去層１１が分解除去された領域に、上記第一機能性部６を覆うように形成された第二機能性部８とを有することを特徴とする機能性素子である。ここで、分解除去層の液体との接触角は、分解除去層が分解除去されて露出する光触媒処理層の液体との接触角より大きいことが好ましい。これにより、分解除去層が残存する領域が撥液性領域、光触媒処理層が露出した領域を親液領域とされ、パターンの形成が容易となるからである。具体的には、分解除去層からなる撥液性領域は、その特性が表面張力４０ｍＮ／ｍの液体との接触角として１０°以上であることが好ましく、特に表面張力３０ｍＮ／ｍの液体との接触角が１０°以上、中でも表面張力２０ｍＮ／ｍの液体との接触角が１０°以上であることが好ましい。
【０１６０】
また、光触媒処理層からなる親液性領域は、具体的には、表面張力４０ｍＮ／ｍの液体との接触角として９°以下であることが好ましく、さらに好ましくは、表面張力４０ｍＮ／ｍの液体との接触角として５°以下、特に好ましくは１°以下であることである。また、上述した機能性素子の機能性部の機能性や、構成に関しては、上述した機能性素子の製造方法で説明したものと同様であるので、ここでの説明は省略する。
【０１６１】
本発明における第一機能性部と第二機能性部は同じ機能性部であってもよく、異なる機能性部であってもよいが、異なる機能性部であることが一般的な機能発現上は好ましいといえる。
【０１６２】
ここで、本発明の上記の機能性素子を具体的に用いた機能性素子としては、第二機能性部を封止材とする機能性素子が挙げられ、例えば図２に示すように、まず、光触媒含有層上２にパターン上に第一機能性部６を形成する。次にその第一機能性部６が形成された部位の周囲を取り囲むようにエネルギー照射を行い第二機能性部用露光部７を形成する。この第二機能性部用露光部７上、かつ第一機能性部６を覆うように封止材である第二機能性部を形成する。これにより、高精細な封止材で封止された機能性素子とすることが可能となるのである。
【０１６３】
また、上記の封止材の他に、第一機能性部がマイクロレンズであり、第二機能性部がそのマイクロレンズを保護するハードコート材である機能性素子や、第一機能性部が金属配線であり、第二機能性部がその金属配線を外部から遮蔽する絶縁層である機能性素子等が挙げられる。
【０１６４】
なお、本発明の機能性部、光触媒含有層、基材、エネルギー等の各構成および工程については、上述した機能性素子の製造方法の項で説明したものと同様であるので、ここでの説明は省略する。
【０１６５】
Ｃ．光導波路
また、本発明は上述した機能性素子を光導波路とすることが可能である。光導波路は、光を導波するコア層と、そのコア層を覆うように形成されるコア層より屈折率の小さいクラッド層とを有する構造である。このことから、本発明の機能性素子が光導波路として用いられる場合において、上記の機能性素子の第一機能性部としてコア層が用いられ、第二機能性部が上部クラッド層として用いられる。
【０１６６】
ここで、本発明の機能性素子には、上述したように３つの態様があり、上記機能性素子の第一の態様においては、例えば図８に示すように第一機能性部であるコア層６は、光触媒含有層２上に形成され、第二機能性部であるクラッド層８が、そのコア層６を覆うように形成される。また、上記機能性素子の第２の態様においては、例えば図７に示すように第一機能性部であるコア層６は、濡れ性変化層１０上に形成され、第二機能性部であるクラッド層８が、そのコア層６を覆うように形成される。さらに、第３の態様においては、例えば図８に示すように第一機能性部であるコア層６は、光触媒処理層９上に形成され、第二機能性部であるクラッド層８が、そのコア層６を覆うように形成される。このことから、上述したコア層と直接接触する光触媒含有層、濡れ性変化層、および光触媒含有層が本発明の光導波路において下部クラッド層として用いられる。これらの光導波路における各構成について説明する。
【０１６７】
まず、本発明の機能性素子が光導波路として用いられる場合にコア層が形成される部位である、光触媒含有層、濡れ性変化層、および光触媒処理層のいずれかである下部クラッド層について説明する。本発明の下部クラッド層は、上記の機能性素子の製造方法において説明した光触媒含有層、濡れ性変化層、および光触媒処理層と同様であり、ここでの説明は省略する。ここで、上述した層の中でも屈折率が１．１〜１．７の範囲内、中でも１．１〜１．５の範囲内であることが下部クラッド層としての機能性を果たす面から好ましい。さらに、後述するコア層と屈折率の差が０．０３以上あることが好ましい。
【０１６８】
次に、本発明の機能性素子の第一機能性部として形成されるコア層について説明する。本発明によれば、上記の機能性素子の項で述べたように、上述した上記クラッド層上に、エネルギー照射に伴う光触媒の作用により濡れ性が変化したパターンや凹凸が形成されたパターンを利用して、容易にコア層を形成することが可能である。このようなコア層を形成するための材料としては、ポリイミド、ポリカーボネート、ポリメタクリル酸メチル、ポリスチレン、酸化ケイ素等が挙げられる。これらの材料をスピンコート法やディップコート法等の各種コーティング法やインクジェット法等のノズル吐出法、蒸着法および無電解メッキ法等を材料の特性に応じて選択し、コア層を形成する。選択する材料の種類や混合比率により屈折率を制御することが可能である。
【０１６９】
ここでコア層の形状に関しては、通常コア層内を導波する光のモード等を考慮して決定する。導波光としては、一般に赤外光を用いることから、コア層の頂部から底部までの膜厚が、０．８〜３００μｍの範囲内、好ましくは１〜１００μｍの範囲内が好ましい。またコア層底部の幅は０．８〜３００μｍの範囲内、好ましくは１〜１００μｍの範囲内が好ましい。上記範囲内のコア層とすることにより、コア層内を滞りなく光が導波し、効率の良好な光導波路を得ることができるからである。また、コア層の屈折率が１．１〜１．７の範囲内、好ましくは１．４〜１．７の範囲内とすることが好ましい。
【０１７０】
次に、第二機能性部として、上記コア層が形成された周囲、かつコア層を覆うように上部クラッド層が形成される。本発明によれば、上記の機能性素子の項で述べたように、第二機能性部である上部クラッド層を形成する領域に、エネルギー照射に伴う光触媒の作用により、濡れ性の異なるパターンや凹凸を有するパターンを形成することが可能であり、容易に上部クラッド層を形成することが可能となるのである。本発明における上部クラッド層は、コア層表面を被覆するような形状であれば、特に限定はされない。
【０１７１】
また、光導波路における上部クラッド層の役割としては、光導波路の光伝送損失を抑制することの他に、外部からの応力等による悪影響の防止や、光導波路端面を切断して端面研磨する際、高い寸法精度の加工を可能とすること等を挙げることができる。
【０１７２】
本発明において上部クラッド層は、透明性を有する材料で形成されている場合と、不透明である場合とのいずれの態様であってもよい。
【０１７３】
上部クラッド層が透明性を有する材料で形成されている場合に用いられる材料としては、例えば、シリコン樹脂、ポリメタクリレート樹脂、ポリカーボネート樹脂、酸化珪素、ＵＶ硬化型エポキシ樹脂、エポキシ樹脂、フッ素化ポリイミド、ポリイミド、ポリカーボネイト―ＭＭＡ、重水素化ポリフルオロメタクリレート等を挙げることができる。
【０１７４】
これらの材料は例えば蒸着法等により付着させることも可能であるが、好ましい方法としては、スピンコート、スプレーコート、ディップコート、ロールコート、ビードコート等の各種コーティング法やインクジェットなどの吐出法等により、塗工液とした上記材料を塗布することによって上部クラッド層を形成する方法を挙げることができる。また選択する材料の種類や材料の混合比率によって屈折率を容易に変化させることができるため、コア層の屈折率に応じて屈折率差を制御した上部クラッド層の形成が可能である。
【０１７５】
本発明において上部クラッド層の屈折率は１．１〜１．７の範囲内、好ましくは１．４〜１．７の範囲内であることが好ましい。上部クラッド層の屈折率を上記範囲内とすることにより、光伝送損失の一要因である吸収損失を効果的に防止することができるからである。また、上部クラッド層とコア層との屈折率の差は、０．０３以上、特に０．０５以上であることが好ましい。上記範囲程度にコア層の屈折率がクラッド層の屈折率よりも高ければ、吸収損失による光伝送損失を効率よく防止でき伝送効率の良好な光導波路が製造できるからである。
【０１７６】
なお、本発明の基材、エネルギー等の各構成および工程については、上述した機能性素子の製造方法の項で説明したものと同様であるので、ここでの説明は省略する。
【０１７７】
なお、本発明は、上記実施形態に限定されるものではない。上記実施形態は、例示であり、本発明の特許請求の範囲に記載された技術的思想と実質的に同一な構成を有し、同様な作用効果を奏するものは、いかなるものであっても本発明の技術的範囲に包含される。
【０１７８】
例えば、上記説明においては、機能性素子の機能性部は二重構造を有するものであったが、本発明においては、機能性部を二重に有する機能性素子に限定されるものではなく、二重構造を有する機能性素子にさらに複数層の機能性部を同様にして形成した多重に機能性部を有する機能性素子も含まれるものとする。
【０１７９】
【実施例】
以下に実施例および比較例を示して、本発明をさらに具体的に説明する。
【０１８０】
［実施例１］
（１）光触媒含有層の形成
イソプロピルアルコール３０ｇとフルオロアルキルシランが主成分であるＭＦ−１６０Ｅ（トーケムプロダクツ（株）製）０．４ｇとトリメトキシメチルシラン（東芝シリコーン（株）製ＴＳＬ８１１３）３ｇと光触媒酸化チタン水分散体であるＳＴ−Ｋ０１（石原産業（株）製）２０ｇとを混合し１００℃で２０分間攪拌した。これをイソプロピルアルコールにより３倍に希釈し光触媒含有膜組成物とした。
【０１８１】
上記の組成物をガラス基板上に、スピンコーターにより塗布し、１５０℃で１０分間の乾燥処理により、透明な光触媒含有層（厚み０．２μｍ）を形成した。
【０１８２】
（２）第１機能性部用露光部の形成
光触媒含有層側層をフォトマスクを介して超高圧水銀灯（波長３６５ｎｍ）により７０ｍＷ／ｃｍ^２の照度で５０秒間露光し、光触媒含有層上に親液性領域からなる第１機能性部用露光部をパターン状に形成した。
【０１８３】
このとき、未露光部及び第１機能性部用露光部と表面張力４０ｍＮ／ｍの液体（純正化学株式会社製）との接触角を接触角測定器（協和界面科学（株）製ＣＡ−Ｚ型）を用いて測定（マイクロシリンジから液滴を滴下して３０秒後）した結果、それぞれ、６０°と７°であった。
【０１８４】
（３）光導波路コア層の形成
上記親液性の第１機能性部用露光部にポリメタクリル酸メチルのＮ−メチル−２ピロリドン溶液をディップコート法にて塗布し、これを２５０℃で３０分間乾燥硬化させた。
【０１８５】
（４）第２機能性部用露光部の形成
上記コア層を形成した基板にコア部の周囲にパターン状に上記２同様に露光し、第２機能性部用露光部を形成した。
【０１８６】
（５）光導波路クラッド層の形成
上記親液性の第２機能性部用露光部及び第１機能性部上にポリスチレンのシクロヘキサノン溶液をディップコート法にて塗布し、これを２５０℃で３０分間乾燥硬化させた。
【０１８７】
［実施例２］
（１）光触媒処理層の形成
イソプロピルアルコール３０ｇとトリメトキシメチルシラン（東芝シリコーン（株）製ＴＳＬ８１１３）３ｇと光触媒酸化チタン水分散体であるＳＴ−Ｋ０１（石原産業（株）製）２０ｇとを混合し１００℃で２０分間攪拌した。これをイソプロピルアルコールにより３倍に希釈し光触媒処理層用組成物とした。
【０１８８】
上記の組成物をガラス基板上に、スピンコーターにより塗布し、１５０℃で１０分間の乾燥処理により、透明な光触媒処理層（厚み０．２μｍ）を形成した。
【０１８９】
（２）分解除去層の形成
カチオン性高分子であるポリジアリルジメチルアンモニウムクロライド（ＰＤＤＡ、平均分子量１００，０００−２００，０００、アルドリッチ）、アニオン性高分子であるポリスチレンスルホン酸ナトリウム塩（ＰＳＳ、平均分子量７０，０００、アルドリッチ）を上記光触媒処理層上に交互吸着させ厚さを約２ｎｍとした。
【０１９０】
（３）第１機能性部用露光部の形成
上記基板をフォトマスクを介して超高圧水銀灯（波長３６５ｎｍ）により４０ｍＷ／ｃｍ^２の照度で１４０秒間露光し、分解除去層を分解除去し第１機能性部用露光部をパターン状に形成した。
【０１９１】
このとき、未露光部及び画素部形成部と表面張力４０ｍＮ／ｍの濡れ指数標準液（純正化学株式会社製）との接触角を接触角測定器（協和界面科学（株）製ＣＡ−Ｚ型）を用いて測定（マイクロシリンジから液滴を滴下して３０秒後）した結果、それぞれ、３４°と６°であった。
【０１９２】
（４）金属配線の形成
上記親液性の第１機能性部用露光部に銀コロイド溶液（濃度３０％）をディップコート法にて塗布し、これを５００℃で６０分間乾燥硬化させた。
【０１９３】
（５）第２機能性部用露光部の形成
上記金属配線を形成した基板に金属配線の周囲にパターン状に上記３同様に露光し、第２機能性部用露光部を形成した。
【０１９４】
（６）絶縁層の形成
トリメトキシメチルシラン（ＧＥ東芝シリコーン（株）製、ＴＳＬ８１１３）５ｇと０．５規定塩酸２．５ｇを混合し、８時間攪拌した。これをイソプロピルアルコールにより１０倍に希釈し絶縁層用組成物とした。
【０１９５】
上記絶縁層用組成物を上記親液性の第２機能性部用露光部及び第１機能性部上にディップコート法にて塗布し、これを４００℃で３０分間乾燥硬化させた。
【０１９６】
【発明の効果】
本発明によれば、光触媒含有層上のエネルギー照射が行われた部分の液体との接触角が低下することから、エネルギー照射が行われた第一機能性部用露光部が親液性領域とされ、エネルギー未照射部が撥液性領域とされる。この濡れ性の差を利用して第一機能性部を容易に形成することが可能となる。さらに、この第一機能性部が形成された周囲にエネルギーをパターン状に照射することにより、新たに親液性領域を形成することができ、この親液性領域とエネルギー未照射部の撥液性領域との濡れ性の差を利用して、容易に第一機能性部を覆うように、第二機能性部を形成することが可能となる。
【０１９７】
また、本発明はエネルギー照射した部分の濡れ性を変化させてパターンを形成するものであるので、特にエネルギー照射後の後処理も必要無く、濡れ性の変化した高精細なパターンを有するパターン形成体を得ることができ、このパターンに沿って機能性部を形成することにより、容易に高精細な二重構造の機能性素子を製造することができる。
【図面の簡単な説明】
【図１】本発明の機能性素子の製造方法の一例を示す図である。
【図２】本発明の第二機能性部用露光部の一例を示す図である。
【図３】本発明の第二機能性部用露光部の他の例を示す図である。
【図４】本発明の第二機能性部用露光部の他の例を示す図である。
【図５】本発明の第二機能性部用露光部の他の例を示す図である。
【図６】本発明の機能性素子の製造方法の他の例を示す図である。
【図７】本発明の機能性素子の製造方法の他の例を示す図である。
【図８】本発明の機能性素子の一例を示す図である。
【図９】本発明の機能性素子の他の例を示す図である。
【図１０】本発明の機能性素子の他の例を示す図である。
【符号の説明】
１　…　基材
２　…　光触媒含有層
３　…　フォトマスク
４　…　エネルギー
５　…　第一機能性部用露光部
６　…　第一機能性部
７　…　第二機能性部用露光部
８　…　第二機能性部
９　…　光触媒処理層
１０…　濡れ性変化層
１１…　分解除去層[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a method for manufacturing a functional element sealed with a sealing material or a functional element used for an optical waveguide or the like and having a highly accurate and easily manufactured functional portion in duplicate.
[0002]
[Prior art]
Conventionally, as a method of forming a high-definition pattern, pattern exposure is performed on a photoresist layer applied on a substrate, and after exposure, the photoresist is developed and further etched, or the photoresist has functionality. 2. Description of the Related Art There is known a method for manufacturing a functional element by a photolithography method in which a target pattern is directly formed by exposing a photoresist using a substance.
[0003]
Further, for example, the production of a functional element having a dual structure, such as a sealing material or an optical waveguide, having a functional part of another type on the functional part so as to cover the functional part, The formation of the second functional part after the formation of one functional part requires the pattern formation by the photolithography method to be performed twice, which requires many manufacturing steps, becomes complicated, and requires a high-precision device. There is a problem that costs are high. Further, it is difficult to adjust the position of the photomask when forming the second functional portion, and it is difficult to form a high-definition pattern. In addition, some of these methods require the use of a photoresist, development with a liquid developing solution after the exposure, and etching, so that it is necessary to treat a waste liquid. When a functional material is used as a material, there is a problem that the material is deteriorated by an alkali solution or the like used at the time of development.
[0004]
[Problems to be solved by the invention]
In view of the above, it is desired to provide a method for manufacturing a functional element which is easy to manufacture and has a double high-definition functional part.
[0005]
[Means for Solving the Problems]
The present invention provides, as set forth in claim 1,
(1) a step of forming a photocatalyst-containing layer on a substrate, which is a layer whose contact angle with a liquid is reduced by the action of a photocatalyst accompanying energy irradiation, and which contains at least a photocatalyst and a binder;
(2) a step of irradiating the photocatalyst-containing layer with energy in a pattern to form an exposed portion for a first functional portion;
(3) a step of forming a first functional part in the exposed part for the first functional part;
(4) a step of irradiating energy in a pattern around the first functional portion of the photocatalyst-containing layer having the first functional portion formed thereon to form an exposed portion for the second functional portion;
(5) forming a second functional part in the second functional part exposure part so as to cover the first functional part;
The present invention provides a method for manufacturing a functional element, comprising:
[0006]
According to the present invention, since the contact angle with the liquid in the portion where the energy irradiation on the photocatalyst-containing layer has been performed is reduced, the first functional portion exposed portion where the energy irradiation has been performed is the lyophilic region. Thus, the energy non-irradiated portion is set as a liquid repellent region. The first functional portion can be easily formed by utilizing the difference in wettability. Further, by irradiating energy in a pattern to the periphery where the first functional portion is formed, a new lyophilic region can be newly formed. The second functional portion can be formed so as to easily cover the first functional portion by utilizing the difference in wettability with the functional region.
[0007]
Further, since the present invention forms the pattern by changing the wettability of the energy-irradiated portion, there is no need for a post-treatment in particular after the energy irradiation, and the pattern-forming body having a high-definition pattern having a changed wettability. By forming the functional portion along this pattern, a high-definition functional element having a double structure can be easily manufactured.
[0008]
In the first aspect of the present invention, as described in the second aspect, the photocatalyst-containing layer is decomposed by the action of the photocatalyst due to energy irradiation, thereby changing the wettability on the photocatalyst-containing layer. It may contain decomposable substances that can be used. In the present invention, the change in the wettability of the photocatalyst-containing layer due to the action of the photocatalyst may be caused by the material of the binder. , The wettability of the surface may be changed in a pattern.
[0009]
Further, in the invention described in claim 1 or 2, as described in claim 3, the binder of the photocatalyst-containing layer is Y._nSix_(4-n)(Here, Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, X represents an alkoxyl group or a halogen, and n is an integer of 0 to 3.) It is preferably an organopolysiloxane which is one or more hydrolytic condensates or cohydrolytic condensates of the silicon compound to be produced. The binder contained in the photocatalyst-containing layer needs to have a binding energy that does not decompose by the action of the photocatalyst, and the binder itself is preferably one that greatly changes the wettability of the photocatalyst-containing layer by the action of the photocatalyst. Organopolysiloxanes are preferred.
[0010]
In the invention according to any one of the first to third aspects, as described in the fourth aspect, the photocatalyst-containing layer has a surface tension of 40 mN / m in a part where energy is not irradiated. It is preferable that the photocatalyst-containing layer has a contact angle of 1 ° or more with respect to a liquid having a surface tension of 40 mN / m at a portion irradiated with energy. As described above, the contact angle between the photocatalyst-containing layer and the liquid is reduced by irradiating the energy, but the difference in the contact angle between the unirradiated part and the liquid in the energy-irradiated part is not less than the above value. This makes it easier to form a functional part by utilizing the difference in wettability.
[0011]
Further, the present invention provides, as set forth in claim 5,
(1) forming a photocatalyst treatment layer containing at least a photocatalyst on a substrate;
(2) forming, on the photocatalyst treatment layer, a wettability changing layer that is a layer whose contact angle with a liquid is reduced by the action of a photocatalyst accompanying energy irradiation;
(3) a step of irradiating the pattern with energy to the wettability changing layer to form an exposed portion for the first functional portion;
(4) forming a first functional part in the first functional part exposure part;
(5) forming a second functional portion exposure portion by irradiating energy in a pattern around the first functional portion of the wettability changing layer on which the first functional portion is formed;
(6) forming a second functional part in the second functional part exposure part so as to cover the first functional part;
The present invention provides a method for manufacturing a functional element, comprising:
[0012]
According to the present invention, as in the first aspect of the present invention, since the contact angle with the liquid on the portion of the wettability variable layer where the energy irradiation has been performed is reduced, the first energy irradiation is performed. The exposed portion for one functional portion is a lyophilic region, and the first functional portion can be easily formed by utilizing the difference in wettability between the non-energy irradiated portion and the lyophobic region. Further, by irradiating energy around the first functional portion is formed, a lyophilic region can be formed around the first functional portion, and the lyophilic region and the energy non-irradiated portion can be formed. The second functional part can be formed so as to easily cover the first functional part by utilizing the difference in wettability with the liquid repellent region.
[0013]
In addition, since the pattern is formed by changing the wettability of the energy-irradiated portion, there is no need for post-treatment particularly after the energy irradiation, and a high-definition pattern-formed body having a changed wettability can be obtained. By forming the functional portion along this pattern, a high-definition functional element having a double structure can be easily manufactured.
[0014]
Furthermore, in the present invention, since the wettability changing layer is formed on the photocatalyst processing layer containing the photocatalyst, the functional portion of the wettability changing layer does not directly contact the photocatalyst processing layer. Therefore, there is little possibility that the functional part is affected by the photocatalyst treatment layer, and the functional part can be used as a functional element for various uses.
[0015]
According to the fifth aspect of the present invention, as described in the sixth aspect, the wettability changing layer is made of Y_nSix_(4-n)(Here, Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, X represents an alkoxyl group or a halogen, and n is an integer of 0 to 3.) It is preferably an organopolysiloxane which is one or more hydrolytic condensates or cohydrolytic condensates of the silicon compound to be produced. Similarly to the case described in claim 3, the binder contained in the wettability changing layer needs to have a binding energy that is not decomposed by the action of the photocatalyst, and changes the wettability under the influence of the photocatalyst treatment layer. Is preferred, and the above-mentioned organopolysiloxane is preferred.
[0016]
Further, in the invention described in claim 5 or claim 6, as described in claim 7, the wettability changing layer is made of a liquid having a surface tension of 40 mN / m in a portion not irradiated with energy. It is preferable that the wettability changing layer has a contact angle that is 1 ° or more larger than a contact angle with a liquid having a surface tension of 40 mN / m at a portion irradiated with energy. As described above, the contact angle between the wettability changing layer and the liquid is reduced by irradiating the energy. However, the difference in the contact angle between the energy unirradiated portion and the liquid in the energy irradiated portion is equal to or more than the above. This makes it easier to form a functional part by utilizing the difference in wettability.
[0017]
Further, the present invention provides, as described in claim 8,
(1) forming a photocatalyst treatment layer containing at least a photocatalyst on a substrate;
(2) forming a decomposition removal layer on the photocatalyst treatment layer, which is a layer that is decomposed and removed by the action of a photocatalyst accompanying energy irradiation;
(3) a step of irradiating the decomposition removal layer with energy in a pattern to form an exposed portion for a first functional portion;
(4) forming a first functional part in the first functional part exposure part;
(5) a step of irradiating energy in a pattern around the first functional portion of the decomposition removal layer in which the first functional portion is formed to form an exposed portion for the second functional portion;
(6) forming a second functional part in the second functional part exposure part so as to cover the first functional part;
The present invention provides a method for manufacturing a functional element, comprising:
[0018]
According to the present invention, since the decomposition removal layer is decomposed and removed to expose the photocatalyst treatment layer in the portion where the energy removal has been performed on the decomposition removal layer, and the energy non-irradiated portion remains in the decomposition removal layer. Irregularities are formed on the surface of the removal layer. The first functional portion can be easily formed in the recessed area where the energy irradiation has been performed by utilizing the recesses and projections. Furthermore, by irradiating energy to the periphery where the first functional portion is formed, a concave portion is further formed as an exposure portion for the second functional portion, and the functional portion is easily formed by using the unevenness. It is possible.
[0019]
In addition, since the pattern is formed by using the unevenness of the decomposition removal layer, a post-treatment is not particularly necessary after the energy irradiation, and a high-definition pattern formed body having unevenness can be obtained. By forming the functional portion along the line, a high-definition functional element having a double structure can be easily manufactured.
[0020]
In the invention described in claim 8, as described in claim 9, the decomposition removal layer is formed of a self-assembled monomolecular film, a Langmuir-Blodgett film, or an alternate adsorption film. Preferably, there is. This is because the decomposition and removal layer is formed of the above-described film, so that a relatively strong and defect-free film can be formed.
[0021]
Further, in the invention according to claim 8 or claim 9, as described in claim 10, the decomposition removal layer is in contact with a liquid having a surface tension of 40 mN / m in a portion where the decomposition removal layer remains. The decomposition removal layer preferably has an angle whose contact angle is 1 ° or more larger than the contact angle with a liquid having a surface tension of 40 mN / m in the photocatalyst treatment layer exposed by energy irradiation to decompose and remove the decomposition removal layer. . The difference in the contact angle between the portion where the decomposition removal layer remains and the exposed photocatalyst treatment layer where the energy is irradiated and the decomposition removal layer is decomposed and removed is not less than the above. The reason is that it is easier to form the functional portion by utilizing the difference in wettability.
[0022]
In the invention according to any one of the first to tenth aspects, as described in the eleventh aspect, the photocatalyst is made of titanium oxide (TiO 2).₂), Zinc oxide (ZnO), tin oxide (SnO)₂), Strontium titanate (SrTiO)₃), Tungsten oxide (WO₃), Bismuth oxide (Bi₂O₃), And iron oxide (Fe₂O₃) Is preferably one or two or more substances selected from the group consisting of titanium oxide (TiO 2) and titanium oxide (TiO 2).₂Is particularly preferred. This is because titanium dioxide has a high bandgap energy, is effective as a photocatalyst, is chemically stable, has no toxicity, and is easily available.
[0023]
In the invention according to any one of the first to twelfth aspects, as described in the thirteenth aspect, the energy irradiation is preferably performed while heating the photocatalyst. By heating the photocatalyst at the time of the energy irradiation, the effect of the photocatalyst can be further enhanced, and the functional element can be efficiently formed.
[0024]
In the present invention, as described in claim 14, the substrate, a layer formed on the substrate, the contact angle of the liquid decreases due to the action of the photocatalyst accompanying energy irradiation, and at least the photocatalyst and Having a photocatalyst containing layer containing a binder, a first functional part formed in a pattern on the photocatalyst containing layer, and a second functional part formed so as to cover the first functional part And a functional element characterized by the following.
[0025]
According to the present invention, the wettability of the energy irradiated portion of the photocatalyst-containing layer and the functional portion can be formed by utilizing the difference between the wettability of the non-irradiated portion, and therefore, the production is easy. As a result, a low-cost, high-definition functional element can be obtained.
[0026]
Further, in the present invention, as set forth in claim 15, a base material, a photocatalyst treatment layer containing at least a photocatalyst formed on the base material, and an energy irradiation formed on the photocatalyst treatment layer The wettability changing layer which is a layer in which the contact angle with the liquid decreases due to the action of the photocatalyst accompanying the first functional portion formed in a pattern on the wettability changing layer, and the first functional portion And a second functional portion formed so as to cover the functional element.
[0027]
According to the present invention, similarly to the invention described in claim 14, the functional part is formed by utilizing the difference between the wettability of the energy irradiated part of the wettability changing layer and the wettability of the energy non-irradiated part. Therefore, the manufacturing is easy, and as a result, a low-cost, high-definition functional element can be obtained. Furthermore, since it is not necessary to contain a photocatalyst in the wettability changing layer, the photocatalyst and the functional part do not directly contact, and it is possible to reduce the possibility that the functional part is affected by the photocatalyst over time. And a high-quality functional element.
[0028]
Further, according to the present invention, as described in claim 16, a base material, a photocatalyst treatment layer containing at least a photocatalyst formed on the base material, and energy irradiation formed on the photocatalyst treatment layer A decomposition removal layer that is a layer that is decomposed and removed by the action of a photocatalyst; a first functional portion formed in a pattern in a region on the photocatalyst treatment layer where the decomposition removal layer is decomposed and removed; Around the functional portion, and in a region where the decomposition removal layer on the photocatalyst treatment layer is decomposed and removed, having a second functional portion formed so as to cover the first functional portion. A functional element is provided.
[0029]
According to the present invention, since the decomposition removal layer is decomposed by the energy irradiation, it is possible to form the functional part by using the irregularities of the energy irradiation part and the non-irradiation part, thereby facilitating the production. As a result, a low-cost functional element can be obtained.
[0030]
Further, in the invention according to any one of claims 14 to 16, as described in claim 17, the second functional portion of the functional element is a sealing material. To provide a functional element. This is because the second functional portion formed in the above-described functional element is a sealing material, so that the functional element can be highly precisely sealed with the sealing material.
[0031]
Further, according to the present invention, as described in claim 18, the first functional portion of the functional element according to any one of claims 14 to 16 is a core layer, Provided is an optical waveguide, wherein the active portion is a clad layer.
[0032]
According to the present invention, the first functional part of the functional element as a core layer, by using the second functional part formed so as to cover the core layer as a cladding layer, the functional element, Since it is easy to manufacture and has a high-definition pattern, an optical waveguide having a high-definition pattern at low cost can be obtained.
[0033]
BEST MODE FOR CARRYING OUT THE INVENTION
The present invention relates to a method for manufacturing a functional element and a functional element. Hereinafter, these will be described separately.
[0034]
A. Method for manufacturing functional element
The method for producing a functional element of the present invention includes three embodiments. Hereinafter, these will be described for each embodiment.
[0035]
1. First embodiment
The first embodiment of the present invention comprises:
(1) a step of forming a photocatalyst-containing layer on a substrate, which is a layer whose contact angle with a liquid is reduced by the action of a photocatalyst accompanying energy irradiation, and which contains at least a photocatalyst and a binder;
(2) a step of irradiating the photocatalyst-containing layer with energy in a pattern to form an exposed portion for a first functional portion;
(3) a step of forming a first functional part in the exposed part for the first functional part;
(4) a step of irradiating energy in a pattern around the first functional portion of the photocatalyst-containing layer having the first functional portion formed thereon to form an exposed portion for the second functional portion;
(5) forming a second functional part in the second functional part exposure part so as to cover the first functional part;
A method for producing a functional element, comprising:
[0036]
In this embodiment, for example, as shown in FIG. 1, a photocatalyst-containing layer 2 having a reduced contact angle with a liquid is formed on a substrate 1 by the action of a photocatalyst accompanying energy irradiation (FIG. 1A). . Next, the photocatalyst containing layer 2 is irradiated with energy 4 using a photomask 3 in a pattern for forming a first functional portion (FIG. 1B). Here, the region on the photocatalyst-containing layer where the energy irradiation has been performed is a lyophilic region where the contact angle with the liquid is reduced, and the region of the energy non-irradiated portion is a lyophobic region. The first functional portion 6 is formed in the first functional portion exposure portion 5 which has been made a lyophilic region by this energy irradiation (FIG. 1C). At this time, since the photocatalyst-containing layer 2 not irradiated with energy adjacent to the exposed portion 5 for the first functional part is lyophobic, the first functional part is formed of the composition for the functional part or the like. Therefore, the first functional portion can be uniformly formed only on the exposed portion for the first functional portion without adhering to the photocatalyst containing layer 2 which is the liquid repellent region. Next, in the photocatalyst-containing layer on which the first functional portion 6 was formed in the above-described step, the photomask 3 was further used to form a pattern in such a manner that a second functional portion was formed around the first functional portion 6. Is irradiated with energy 4 (FIG. 1D). Thereby, similarly to the above, the exposed portion for the second functional portion irradiated with the energy is set as the lyophilic region. The second functional section 8 is formed on the second functional section exposure section 7 so as to cover the first functional section 6 (FIG. 1E). At this time, in the same manner as described above, by forming the second functional portion from the functional portion composition or the like, the second functional portion can be easily formed only on the exposed portion for the second functional portion. This makes it possible to easily manufacture a functional element having a double functional part. Hereinafter, these manufacturing methods will be described in detail.
[0037]
(1) Photocatalyst containing layer forming step
In the present embodiment, the photocatalyst-containing layer forming step is, for example, as shown in FIG. 1A, a layer on the base material 1 in which the contact angle with the liquid is reduced by the action of the photocatalyst accompanying the energy irradiation, This is a step of forming a photocatalyst containing layer 2 containing at least a photocatalyst and a binder. Each configuration of the photocatalyst containing layer step will be described.
[0038]
a. Base material
First, the substrate used in the present embodiment will be described. The substrate used in the present embodiment has a photocatalyst-containing layer formed on the substrate as shown in FIG. 1A, for example, and the material is not particularly limited. Various materials can be used. Specific examples include metals such as glass, aluminum, and alloys thereof, plastics, woven fabrics, and nonwoven fabrics.
[0039]
Further, the substrate may be subjected to a surface treatment for preventing alkali elution or imparting a gas barrier property or for other purposes, if necessary, in order to improve the adhesion between the substrate surface and the photocatalyst-containing layer. Alternatively, a primer layer may be formed on a substrate. Examples of such a primer layer include silane-based and titanium-based coupling agents.
[0040]
b. Photocatalyst containing layer
Next, the photocatalyst containing layer used in the present embodiment will be described.
[0041]
The photocatalyst-containing layer used in the present embodiment is a layer that is provided on a base material and changes in wettability such that the contact angle with a liquid is reduced by energy irradiation. Thus, by providing a photocatalyst-containing layer whose wettability changes so that the contact angle with the liquid is reduced by the energy irradiation, when the energy pattern irradiation or the like is performed, the wettability is easily changed, and Can be a lyophilic region having a small contact angle. For example, only a portion which becomes a functional portion by applying a coating liquid can be easily made a lyophilic region. Therefore, the functional portion can be efficiently manufactured by utilizing the difference in wettability, which is advantageous in cost. In this case, light including ultraviolet light is usually used as energy.
[0042]
Here, the lyophilic region is a region having a small contact angle with a liquid, and refers to a region having good wettability to various functional part compositions and the like. Further, the lyophobic region is a region having a large contact angle with a liquid, and is a region having poor wettability to various functional portion compositions and the like.
[0043]
In the photocatalyst-containing layer in this embodiment, the contact angle with a liquid having a surface tension of 40 mN / m in a portion not irradiated with energy is 1 ° or more than the contact angle with a liquid with a surface tension of 40 mN / m in a portion irradiated with energy. It is preferable that the layer has a large contact angle. As described above, if the difference in the contact angles is at least 1 ° or more, it becomes easy to apply the composition for various functional parts along the lyophilic region.
[0044]
Specifically, the contact angle with a liquid having a surface tension of 40 mN / m is 10 ° or more, preferably the contact angle with a liquid having a surface tension of 30 mN / m is 10 ° or more in a portion where the energy is not irradiated. The contact angle with a liquid having a tension of 20 mN / m is preferably 10 ° or more. This is because the portion that is not irradiated with energy is a portion that requires liquid repellency in the present invention. Therefore, when the contact angle with the liquid is small, the liquid repellency is not sufficient, and various functional parts are not provided. This is because there is a possibility that the composition for use or the like remains, which is not preferable.
[0045]
In addition, the contact angle between the photocatalyst-containing layer and the liquid having a surface tension of 40 mN / m is reduced to 9 ° or less, preferably the contact angle with the liquid having a surface tension of 50 mN / m, when the energy irradiation is performed. Is preferably a layer having a contact angle of 10 ° or less, particularly a liquid having a surface tension of 60 mN / m. When the contact angle with the liquid in the energy-irradiated portion is high, the spread of various functional portion compositions and the like in this portion may be inferior, and the functional portion may not be accurately formed. Because.
[0046]
In addition, the contact angle with the liquid referred to here is a contact angle with a liquid having various surface tensions measured using a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science Co., Ltd.) (from the micro syringe to the liquid). 30 seconds after dropping) and obtained from the results or as a graph. In this measurement, wetting index standard solutions manufactured by Junsei Chemical Co., Ltd. were used as liquids having various surface tensions.
[0047]
The photocatalyst containing layer in the present embodiment is composed of at least a photocatalyst and a binder. With such a layer, it becomes possible to increase the critical surface tension on the photocatalyst containing layer by the action of the photocatalyst by irradiating the pattern with energy, and it is possible to form a pattern having a different contact angle with the liquid. .
[0048]
In such a photocatalyst containing layer, the action mechanism of the photocatalyst represented by titanium oxide as described later is not necessarily clear, but the carrier generated by light irradiation is a direct reaction with a nearby compound, or It is considered that the reactive oxygen species generated in the presence of oxygen, water and water change the chemical structure of organic matter.
[0049]
In the photocatalyst-containing layer according to the present embodiment, the photocatalyst changes the wettability of the energy-irradiated portion by using an organic group that is a part of the binder or an action of oxidizing or decomposing a decomposed substance to be described later. Thus, it is possible to cause a large difference in wettability with an energy non-irradiated portion. Therefore, by improving the receptivity (lyophilic property) and repellency (liquid repellency) with various functional part compositions and the like, it is possible to obtain a functional element having good quality and advantageous in cost. it can.
[0050]
Hereinafter, a photocatalyst and a binder, which are essential components of such a photocatalyst-containing layer, will be described, and then other components will be described.
[0051]
(photocatalyst)
As the photocatalyst used in the present invention, for example, titanium oxide (TiO 2) which is known as an optical semiconductor is used.₂), Zinc oxide (ZnO), tin oxide (SnO)₂), Strontium titanate (SrTiO)₃), Tungsten oxide (WO₃), Bismuth oxide (Bi₂O₃), And iron oxide (Fe₂O₃), And one or more of them may be used in combination.
[0052]
In the present invention, titanium oxide is particularly preferably used because it has a high band gap energy, is chemically stable, has no toxicity, and is easily available. Titanium oxide includes anatase type and rutile type, and any of them can be used in the present invention, but anatase type titanium oxide is preferable. Anatase type titanium oxide has an excitation wavelength of 380 nm or less.
[0053]
Examples of such anatase-type titanium oxide include anatase-type titania sol of peptic hydrochloride type (STS-02 (average particle size: 7 nm) manufactured by Ishihara Sangyo Co., Ltd .; ST-K01 manufactured by Ishihara Sangyo Co., Ltd.); Glue-type anatase titania sol (TA-15 (average particle diameter: 12 nm) manufactured by Nissan Chemical Industries, Ltd.) and the like can be mentioned.
[0054]
The smaller the particle size of the photocatalyst is, the more effective the photocatalytic reaction takes place. It is preferable that the average particle size is 50 nm or less, and it is particularly preferable to use a photocatalyst of 20 nm or less. In addition, the smaller the particle size of the photocatalyst is, the smaller the surface roughness of the formed photocatalyst-containing layer is. It is preferable that the particle size of the photocatalyst exceeds 100 nm, the larger the center line average surface roughness of the photocatalyst-containing layer becomes. It is not preferable because the liquid repellency of the energy-irradiated portion of the containing layer is reduced and the lyophilic property of the energy-irradiated portion is insufficient.
[0055]
The content of the photocatalyst in the photocatalyst containing layer can be set in the range of 5 to 60% by weight, preferably 20 to 40% by weight.
[0056]
(Binder)
In the present embodiment, when the wettability on the photocatalyst-containing layer is changed by the action of the photocatalyst on the binder itself (first embodiment), it is decomposed by the action of the photocatalyst due to energy irradiation, whereby the photocatalyst-containing layer is decomposed. There are three forms: a case where the decomposition is performed by incorporating a decomposed substance capable of changing the above wettability into the photocatalyst-containing layer (second form), and a case where these are combined (third form). Can be divided. The binder used in the first embodiment and the third embodiment needs to have a function of changing the wettability on the photocatalyst-containing layer by the action of the photocatalyst. In the second embodiment, such a binder is used. No special function is required.
[0057]
Hereinafter, the binder used in the second embodiment, that is, the binder that does not particularly require the function of changing the wettability on the photocatalyst-containing layer by the action of the photocatalyst will be described. Next, the first embodiment and the third embodiment will be described. The binder used, that is, the binder having a function of changing the wettability on the photocatalyst-containing layer by the action of the photocatalyst will be described.
[0058]
The binder used in the second embodiment, which does not particularly require the function of changing the wettability on the photocatalyst-containing layer by the action of the photocatalyst, has such a high binding energy that the main skeleton is not decomposed by the photoexcitation of the photocatalyst. It is not particularly limited as long as it is one. Specific examples include polysiloxanes having no organic substituents or having some organic substituents, and these can be obtained by hydrolysis and polycondensation of tetramethoxysilane, tetraethoxysilane, and the like. .
[0059]
When such a binder is used, the photocatalyst is decomposed by the action of energy irradiation described below as an additive, and the photocatalyst-containing layer contains a decomposed substance that can change the wettability on the photocatalyst-containing layer. It is essential.
[0060]
Next, a binder used in the first and third embodiments and requiring a function of changing the wettability on the photocatalyst containing layer by the action of the photocatalyst will be described. Such a binder is preferably one having a high binding energy such that the main skeleton is not decomposed by the photoexcitation of the photocatalyst, and one having an organic substituent that is decomposed by the action of the photocatalyst. (1) Organopolysiloxane that exhibits high strength by hydrolyzing and polycondensing chloro or alkoxysilane by sol-gel reaction, etc. (2) Organopolysiloxane cross-linked with reactive silicone having excellent water repellency and oil repellency And the like.
[0061]
In the case of the above (1), the general formula:
Y_nSix_(4-n)
(Here, Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, X represents an alkoxyl group, an acetyl group or a halogen. N is an integer of 0 to 3. )
Is preferably an organopolysiloxane which is one or more hydrolytic condensates or cohydrolytic condensates of the silicon compound represented by Here, the carbon number of the group represented by Y is preferably in the range of 1 to 20, and the alkoxy group represented by X is preferably a methoxy group, an ethoxy group, a propoxy group, or a butoxy group. preferable.
[0062]
In addition, as the binder, a polysiloxane containing a fluoroalkyl group can be particularly preferably used. Specifically, one or more hydrocondensation products and co-hydrolysis condensates of the following fluoroalkylsilanes are preferably used. For example, those generally known as a fluorine-based silane coupling agent can be used.
CF₃(CF₂)₃CH₂CH₂Si (OCH₃)₃;
CF₃(CF₂)₅CH₂CH₂Si (OCH₃)₃;
CF₃(CF₂)₇CH₂CH₂Si (OCH₃)₃;
CF₃(CF₂)₉CH₂CH₂Si (OCH₃)₃;
(CF₃)₂CF (CF₂)₄CH₂CH₂Si (OCH₃)₃;
(CF₃)₂CF (CF₂)₆CH₂CH₂Si (OCH₃)₃;
(CF₃)₂CF (CF₂)₈CH₂CH₂Si (OCH₃)₃;
CF₃(C₆H₄) C₂H₄Si (OCH₃)₃;
CF₃(CF₂)₃(C₆H₄) C₂H₄Si (OCH₃)₃;
CF₃(CF₂)₅(C₆H₄) C₂H₄Si (OCH₃)₃;
CF₃(CF₂)₇(C₆H₄) C₂H₄Si (OCH₃)₃;
CF₃(CF₂)₃CH₂CH₂SiCH₃(OCH₃)₂;
CF₃(CF₂)₅CH₂CH₂SiCH₃(OCH₃)₂;
CF₃(CF₂)₇CH₂CH₂SiCH₃(OCH₃)₂;
CF₃(CF₂)₉CH₂CH₂SiCH₃(OCH₃)₂;
(CF₃)₂CF (CF₂)₄CH₂CH₂SiCH₃(OCH₃)₂;
(CF₃)₂CF (CF₂)₆CH₂CH₂Si CH₃(OCH₃)₂;
(CF₃)₂CF (CF₂)₈CH₂CH₂Si CH₃(OCH₃)₂;
CF₃(C₆H₄) C₂H₄SiCH₃(OCH₃)₂;
CF₃(CF₂)₃(C₆H₄) C₂H₄SiCH₃(OCH₃)₂;
CF₃(CF₂)₅(C₆H₄) C₂H₄SiCH₃(OCH₃)₂;
CF₃(CF₂)₇(C₆H₄) C₂H₄SiCH₃(OCH₃)₂;
CF₃(CF₂)₃CH₂CH₂Si (OCH₂CH₃)₃;
CF₃(CF₂)₅CH₂CH₂Si (OCH₂CH₃)₃;
CF₃(CF₂)₇CH₂CH₂Si (OCH₂CH₃)₃;
CF₃(CF₂)₉CH₂CH₂Si (OCH₂CH₃)₃;
CF₃(CF₂)₇SO₂N (C₂H₅) C₂H₄CH₂Si (OCH₃)₃
By using a polysiloxane containing a fluoroalkyl group as described above as a binder, the lyophobic property of the non-irradiated portion of the photocatalyst-containing layer is greatly improved, and a function of preventing adhesion of various functional portion compositions is exhibited. I do.
[0063]
Examples of the reactive silicone of the above (2) include compounds having a skeleton represented by the following general formula.
[0064]
Embedded image

[0065]
Here, n is an integer of 2 or more, and R¹, R²Is a substituted or unsubstituted alkyl, alkenyl, aryl or cyanoalkyl group having 1 to 10 carbon atoms, and the vinyl, phenyl or halogenated phenyl accounts for 40% or less of the whole in a molar ratio. Also, R¹, R²Is preferably a group having a methyl group since the surface energy is minimized, and the molar ratio of the methyl group is preferably 60% or more. Further, the chain terminal or the side chain has at least one or more reactive group such as a hydroxyl group in the molecular chain.
[0066]
In addition, a stable organosilicon compound that does not undergo a cross-linking reaction such as dimethylpolysiloxane may be mixed with the binder together with the above-mentioned organopolysiloxane.
[0067]
(Decomposition substances)
In the above-described second and third embodiments, it is necessary to cause the photocatalyst-containing layer to further contain a decomposed substance that is decomposed by the action of the photocatalyst due to energy irradiation and can thereby change the wettability on the photocatalyst-containing layer. is there. That is, when the binder itself has no function of changing the wettability on the photocatalyst-containing layer, and when such a function is insufficient, the above-described decomposed substance is added, and It causes a change in wettability or assists such a change.
[0068]
Examples of such a decomposed substance include a surfactant that is decomposed by the action of a photocatalyst and has a function of changing the wettability of the surface of the photocatalyst-containing layer by being decomposed. Specifically, hydrocarbons such as NIKKOL @ BL, BC, BO, and BB series manufactured by Nikko Chemicals Co., Ltd., ZONYL @ FSN, FSO manufactured by DuPont, Surflon S-141, 145 manufactured by Asahi Glass Co., Ltd., and Dainippon Japan Megafac F-141 and 144 manufactured by Ink Chemical Industry Co., Ltd., Futagent F-200 and F251 manufactured by Neos Co., Ltd., Unidyne DS-401 and 402 manufactured by Daikin Industries, Ltd., and Florad FC-170 manufactured by 3M Corporation. 176 and the like, and a fluorine-based or silicone-based nonionic surfactant can be mentioned, and a cationic surfactant, an anionic surfactant, and an amphoteric surfactant can also be used.
[0069]
In addition to the surfactant, polyvinyl alcohol, unsaturated polyester, acrylic resin, polyethylene, diallyl phthalate, ethylene propylene diene monomer, epoxy resin, phenol resin, polyurethane, melamine resin, polycarbonate, polyvinyl chloride, polyamide, polyimide And oligomers and polymers such as styrene-butadiene rubber, chloroprene rubber, polypropylene, polybutylene, polystyrene, polyvinyl acetate, nylon, polyester, polybutadiene, polybenzimidazole, polyacrylonitrile, epichlorohydrin, polysulfide, and polyisoprene.
[0070]
(Contains fluorine)
Further, in the present embodiment, the photocatalyst containing layer contains fluorine, furthermore, when the content of fluorine on the surface of the photocatalyst containing layer is irradiated with energy to the photocatalyst containing layer, the action of the photocatalyst before the energy irradiation. It is preferable that the photocatalyst-containing layer is formed so as to be lower in comparison.
[0071]
In a functional element having such characteristics, by irradiating a pattern with energy, a pattern including a portion having a small fluorine content can be easily formed as described later. Here, fluorine has an extremely low surface energy, so that the surface of a substance containing a large amount of fluorine has a smaller critical surface tension. Therefore, the critical surface tension of the portion having a low fluorine content is higher than the critical surface tension of the portion having a high fluorine content. This means that a portion having a low fluorine content is a lyophilic region as compared with a portion having a high fluorine content. Therefore, forming a pattern composed of a portion having a smaller fluorine content than the surrounding surface forms a pattern of a lyophilic region in the lyophobic region.
[0072]
Therefore, when such a photocatalyst-containing layer is used, the pattern of the lyophilic region can be easily formed in the lyophobic region by pattern irradiation with energy, so that the pattern due to the difference in wettability is obtained. Can be easily formed, and a highly useful functional element can be manufactured. Therefore, it can be said that the addition of fluorine in this embodiment is particularly effective in that the pattern accuracy can be improved.
[0073]
As described above, as the content of fluorine contained in the fluorine-containing photocatalyst containing layer, the fluorine content in the low lyophilic region where the fluorine content formed by irradiation with energy is low, the energy is not irradiated When the fluorine content of the portion is 100, it is preferably 10 or less, more preferably 5 or less, and particularly preferably 1 or less.
[0074]
By setting it in such a range, a large difference can be made in the lyophilicity between the energy-irradiated portion and the unirradiated portion. Therefore, by forming a functional part in such a photocatalyst containing layer, it becomes possible to accurately form a functional part only in a lyophilic region having a reduced fluorine content, and to obtain a functional element with high accuracy. Because you can do it. In addition, this reduction rate is based on weight.
[0075]
For the measurement of the fluorine content in the photocatalyst-containing layer, various methods generally used can be used. For example, X-ray photoelectron spectroscopy (X-ray Photoelectron Spectroscopy, ESCA (Electron Spectroscopy)) can be used. The method is not particularly limited as long as it is a method capable of quantitatively measuring the amount of fluorine on the surface, such as X-ray fluorescence analysis and mass spectrometry.
[0076]
In this embodiment, titanium dioxide is preferably used as the photocatalyst as described above. When titanium dioxide is used in this manner, the content of fluorine contained in the photocatalyst-containing layer may be an X-ray. When analyzed by photoelectron spectroscopy and quantified, when the titanium (Ti) element is taken as 100, the fluorine (F) element has a fluorine (F) element ratio of 500 or more, preferably 800 or more, and particularly preferably 1200 or more. It is preferable that the element F) is contained on the surface of the photocatalyst containing layer.
[0077]
When fluorine (F) is contained in the photocatalyst-containing layer to this extent, the critical surface tension on the photocatalyst-containing layer can be sufficiently reduced, so that the liquid repellency on the surface can be ensured. This is because the difference in wettability with the lyophilic region on the surface in the pattern portion in which the fluorine content has been reduced can be increased, and the accuracy of the functional element finally obtained can be improved. .
[0078]
Furthermore, in such a functional element, the fluorine content in the parent ink region formed by irradiating the energy with the pattern is 50 or less, preferably 100 or less, when the titanium (Ti) element is 100. Is preferably 20 or less, more preferably 10 or less.
[0079]
If the content of fluorine in the photocatalyst containing layer can be reduced to this extent, sufficient lyophilicity can be obtained to form a functional part, and the liquid repellency of the part where the above energy is not irradiated Due to the difference in wettability, the functional portion can be formed with high accuracy, and a functional element having high utility value can be obtained.
[0080]
c. Method for forming photocatalyst-containing layer on substrate
The photocatalyst-containing layer is prepared by dispersing a photocatalyst and a binder in a solvent together with other additives as necessary to prepare a coating solution for forming a photocatalyst-containing layer, and applying the coating solution on the base material. Thereby, a photocatalyst containing layer can be formed. As the solvent to be used, alcohol-based organic solvents such as ethanol and isopropanol are preferable. The coating can be performed by a known coating method such as spin coating, spray coating, dip coating, roll coating, and bead coating. When a UV-curable component is contained as a binder, a photocatalyst-containing layer can be formed by performing a curing treatment by irradiating ultraviolet rays.
[0081]
The content of the photocatalyst in the coating liquid for forming a photocatalyst-containing layer can be set in the range of 5 to 60% by weight, preferably 20 to 40% by weight of the solid content.
[0082]
The thickness of the photocatalyst-containing layer thus obtained is preferably in the range of 0.05 to 10 μm.
[0083]
(2) Step of forming exposed portion for first functional portion
Next, a step of forming an exposure section for the first functional section will be described. In this embodiment, for example, as shown in FIG. 1B, the energy 4 is applied to the surface of the photocatalyst-containing layer 2 formed by the step of forming the photocatalyst-containing layer by, for example, a method using a photomask 3. A step of irradiating in a pattern form to form an exposed portion for a first functional portion composed of portions having different wettability is performed. The exposed portion for the first functional portion in the present embodiment generally refers to a region for forming the first functional portion having reduced wettability due to the action of a photocatalyst accompanying energy irradiation.
[0084]
Hereinafter, the energy and the pattern irradiation method used in the present embodiment will be described.
[0085]
(energy)
In the method for manufacturing a functional element of the present embodiment, pattern irradiation of energy is performed. The energy used here is not particularly limited as long as the energy can excite the photocatalyst used in the photocatalyst containing layer. It is not limited. For example, as will be described in detail in the section of pattern irradiation described later, a combination of light and heat energy may be used, but ordinary light is preferably used.
[0086]
The photocatalyst used in the present embodiment has a different wavelength of light that causes a catalytic reaction depending on the band gap. For example, cadmium sulfide is visible light of 496 nm, iron oxide is 539 nm, and titanium dioxide is 388 nm of ultraviolet light. Therefore, any light, visible light or ultraviolet light, can be used in this embodiment. However, as described above, since the bandgap energy is high, it is effective as a photocatalyst, and titanium dioxide is preferably used as a photocatalyst because it is chemically stable, has no toxicity, and is easily available. The light preferably includes ultraviolet light that causes a catalytic reaction of titanium.
[0087]
As a light source including such ultraviolet light, for example, a mercury lamp, a metal halide lamp, a xenon lamp, and the like can be given. The wavelength of the light used for the energy irradiation can be set within a range of 400 nm or less, preferably 380 nm or less, and the irradiation amount of the light at the time of the energy irradiation is controlled by the action of the photocatalyst at the site where the energy irradiation is performed. The irradiation dose can be set to a value required for developing liquid properties.
[0088]
(Pattern irradiation)
In this embodiment, it is necessary to irradiate such energy in a pattern. The method of irradiating in a pattern is not particularly limited, but is usually performed by a method using a photomask.
[0089]
As a method other than the method using the photomask, energy pattern irradiation may be performed by a method of drawing and irradiating energy using a laser or the like. Specifically, there can be mentioned a method of drawing and irradiating a pattern in a pattern using a laser such as excimer or YAG.
[0090]
In this embodiment, it is preferable to perform the energy pattern irradiation while heating the photocatalyst. This is because, by heating the photocatalyst, the sensitivity can be increased, and the wettability can be changed efficiently. Specifically, it is preferable to heat within the range of 30 ° C to 80 ° C.
[0091]
(3) First functional part forming step
Next, a description will be given of a step of forming the first functional portion in the first functional portion exposure portion which has been made the lyophilic region by the above-described first functional portion exposure portion forming step.
[0092]
For example, as shown in FIG. 1 (c), the first functional part 6 is formed by applying a composition for a functional part or the like as an example to the first functional part exposure part 5 which is a lyophilic region as described above. It is formed using. At this time, as described above, the portion on the photocatalyst containing layer 2 which is the non-energy irradiated portion is a lyophobic region, and the portion on the first functional portion 5 which is an energy irradiated portion is a lyophilic region. As a result, the coating liquid does not adhere to the photocatalyst-containing layer 2 that is the liquid-repellent region, and various functions are performed only on the exposed portion 5 for the first functional portion using, for example, a composition for the functional portion. The functional part can be formed in the exposed part for the first functional part, and since the exposed part 5 for the first functional part is lyophilic, the functional part is uniformly formed by the coating liquid. It is possible to do. In this case, it is desirable that the unirradiated portion on the photocatalyst-containing layer has a critical surface tension of 50 mN / m or less, preferably 30 mN / m or less.
[0093]
Here, the functionalities include optical (light selective absorption, reflectivity, polarization, light selective transmittance, nonlinear optical properties, luminescence such as fluorescence or phosphorescence, photochromic properties, etc.) and magnetic (hard magnetic, soft magnetic) , Non-magnetic, magnetic permeability, etc., electric / electronic (conductive, insulating, piezoelectric, pyroelectric, dielectric, etc.), chemical (adsorbing, desorbing, catalytic, water absorbing, ionic conductivity) , Redox properties, electrochemical properties, electrochromic properties, etc.), mechanical properties (abrasion resistance properties, etc.), thermal properties (thermal conductivity, thermal insulation properties, infrared radiation properties, etc.), biofunctional properties (biocompatibility, antithrombotic properties, etc.) ) Means various functions.
[0094]
The composition for a functional part used in the present invention, as described above, varies greatly depending on the function of the functional element, the method for forming the functional element, and the like, and is represented by, for example, an ultraviolet-curable monomer and the like. A composition not diluted with a solvent, a liquid composition diluted with a solvent, or the like can be used. Further, as the composition for a functional part, a lower viscosity is particularly preferable because a pattern can be formed in a shorter time. However, in the case of a liquid composition diluted with a solvent, it is desirable that the solvent has low volatility, because the viscosity increases and the surface tension changes due to evaporation of the solvent during pattern formation. Further, as described later, since the second functional portion is formed on the functional portion, the composition for the functional portion forming the first functional portion is preferably lyophilic. Thereby, the second functional portion can be uniformly formed on the first functional portion. Further, after forming the first functional portion, a lyophilic treatment may be performed to make the surface lyophilic. Thereby, the second functional portion can be formed uniformly on the first functional portion.
[0095]
The functional part composition used in the present invention may be a functional part by being attached to the exposed part for the first functional part or the like, and may be a functional part, or the first functional part. After being placed on the exposure unit for use, it may be treated with a chemical, or may be treated with ultraviolet rays, heat, or the like to become a functional unit. In this case, when a component effective for ultraviolet rays, heat, electron beams and the like is contained as a binder of the functional part composition, it is preferable because the functional part can be quickly formed by performing a curing treatment. .
[0096]
When the method for forming such a functional element is specifically described, the composition for a functional part is formed by applying means such as dip coating, roll coating, blade coating, and spin coating, and means such as a nozzle discharging means including an ink jet. Is used to form a functional part on the pattern of the lyophilic region formed on the functional element. Among them, it is preferable to use a nozzle discharging means, and it is particularly preferable to use an inkjet method.
[0097]
In the present embodiment, preferable first functional portions include a core layer of an optical waveguide, a microlens protected by a hard coat material, a metal wiring covered with an insulating layer, and the like.
[0098]
(4) Step of forming exposed portion for second functional portion
Next, the step of forming the exposed portion for the second functional portion on the photocatalyst-containing layer on which the first functional portion is formed will be described. In the step of forming the exposure unit for the second functional unit according to the present embodiment, the second functional unit around the first functional unit is formed using a photomask 3 as shown in FIG. The energy 4 is applied to the pattern to be formed. Due to this energy irradiation, as described above, the exposed portion for the second functional portion irradiated with the energy is made a lyophilic region.
[0099]
Here, in the present embodiment, the periphery of the first functional unit means, for example, as shown in FIG. 2, the one in which the second functional unit exposure unit 7 surrounds the entire periphery of the first functional unit 6. Also, as shown in FIG. 3 or FIG. 4, one that surrounds a part of the first functional unit 6 is also included. Further, as shown in FIG. 5, an exposure unit for a second functional unit may be formed on both sides of the first functional unit.
[0100]
The energy in this step, the pattern irradiation, and the pattern formation are the same as those in the first functional section exposure section forming step, and thus description thereof will be omitted.
[0101]
(5) Second functional part forming step
Next, the step of forming the second functional part in the exposed part for the second functional part will be described. For example, as shown in FIG. 1 (e), the exposure unit 7 for the second functional unit around the first functional unit 6 is made to be a lyophilic region by the above-described process. 8 is formed so as to surround the first functional unit 6 and cover the first functional unit 6. This makes it possible to provide a functional element in which the functional portion is formed in a double manner. The type of the functional portion and the method of forming the functional portion are not particularly limited, and are the same as those described in the first functional portion forming step, and thus description thereof will be omitted.
[0102]
Here, in the present embodiment, examples of the second functional portion include a sealing material, a cladding layer of an optical waveguide, a hard coating material of a microlens, an insulating layer covering metal wiring, and the like. The cladding layer is preferably a waveguide cladding layer.
[0103]
First, when the second functional portion is a sealing material, the first functional portion formed in the first functional portion forming step can be sealed, and the first functional portion is formed in a high-definition pattern. This is because it is possible to seal
[0104]
Further, when the functional element is an optical waveguide, the first functional part can be a core layer and the second functional part can be a clad layer, so that the optical waveguide can be manufactured easily and with high definition. Because you can do it.
[0105]
2. Second embodiment
The second embodiment of the method for producing a functional element of the present invention,
(1) forming a photocatalyst treatment layer containing at least a photocatalyst on a substrate;
(2) forming, on the photocatalyst treatment layer, a wettability changing layer that is a layer whose contact angle with a liquid is reduced by the action of a photocatalyst accompanying energy irradiation;
(3) a step of irradiating the pattern with energy to the wettability changing layer to form an exposed portion for the first functional portion;
(4) forming a first functional part in the first functional part exposure part;
(5) forming a second functional portion exposure portion by irradiating energy in a pattern around the first functional portion of the wettability changing layer on which the first functional portion is formed;
(6) forming a second functional part in the second functional part exposure part so as to cover the first functional part;
It is a method characterized by having.
[0106]
As an example of the present embodiment, as shown in FIG. 6, first, a photocatalyst treatment layer 9 containing at least a photocatalyst is formed on a substrate 1 (FIG. 6A). Next, a wettability changing layer 10 whose contact angle with a liquid is reduced by the action of a photocatalyst accompanying energy irradiation is formed on the photocatalyst treatment layer 9 (FIG. 6B). The energy change 4 is applied to the wettability changing layer 10 using the photomask 3 in a pattern for forming the first functional portion (FIG. 6C). Here, the wettability changing layer in the region irradiated with the energy is a lyophilic region. As a result, the first functional portion 6 is formed on the exposed portion 5 for the first functional portion, which has been set as the lyophilic region, by using the composition for the functional portion or the like (FIG. 6D). In this case, since the wettability changing layer 10 in the energy non-irradiated area is a liquid repellent area, the functional part composition is not attached, and the first functional part 6 having a high-definition pattern is formed. It becomes possible. Further, the energy 4 is patterned around the first functional portion of the wettability changing layer 10 on which the first functional portion 6 is formed using the photomask 3 in a pattern for forming the second functional portion. (FIG. 6E). Thereby, the exposure part 7 for 2nd functional parts is made into a lyophilic area | region similarly to the above, and the 2nd functional part 8 is easily surrounding the 1st functional part by the composition for functional parts, etc. And it can be formed so as to cover the first functional portion (FIG. 6 (f)).
[0107]
Further, in the present embodiment, since the photocatalyst is not contained in the wettability changing layer, the functional part does not directly contact the photocatalyst. As a result, the possibility that the functional part is affected by the photocatalyst with time decreases, and a functional element that can be used for various applications can be obtained.
[0108]
Hereinafter, each step of the second embodiment will be described in detail.
[0109]
(1) Photocatalyst treatment layer forming step
First, the photocatalyst treatment layer forming step of the present embodiment will be described. For example, as shown in FIG. 6A, in the present embodiment, a photocatalyst treatment layer 9 is formed on a substrate 1. The substrate is the same as that described in the first embodiment, and a description thereof will not be repeated.
[0110]
The photocatalyst-treated layer in the present embodiment contains at least a photocatalyst, and differs from the photocatalyst-containing layer in the first embodiment in that the presence or absence of a binder does not matter.
[0111]
In this embodiment, when the photocatalyst treatment layer has a binder, it is the same as the photocatalyst-containing layer described in the first embodiment, and a description thereof will be omitted. However, in the second embodiment, since the wettability on the photocatalyst treatment layer does not need to be particularly changed, even if the wettability does not change due to the action of the photocatalyst on the binder itself, the first embodiment does not. It is not necessary to include a decomposed substance in the photocatalyst treatment layer as in the embodiment. In addition, since the method for manufacturing the photocatalyst treatment layer having a binder is the same as that of the first embodiment described above, description thereof will be omitted.
[0112]
On the other hand, examples of a method for forming the photocatalyst-containing layer having no binder include a method using a vacuum film forming method such as a sputtering method, a CVD method, and a vacuum evaporation method. By forming the photocatalyst containing layer by the vacuum film forming method, it is possible to form a uniform film and a photocatalyst containing layer containing only the photocatalyst, thereby uniformly changing the wettability on the wettability changing layer. It is possible to change the wettability on the wettability changing layer more efficiently than in the case of using a binder, because it is possible to use only a photocatalyst.
[0113]
Further, as another method for forming the photocatalyst-containing layer composed of only the photocatalyst, for example, when the photocatalyst is titanium dioxide, a method in which amorphous titania is formed on a substrate, and then the phase is changed to crystalline titania by calcination. Can be As the amorphous titania used here, for example, titanium tetrachloride, hydrolysis and dehydration condensation of inorganic salts of titanium such as titanium sulfate, tetraethoxytitanium, tetraisopropoxytitanium, tetra-n-propoxytitanium, tetrabutoxytitanium, An organic titanium compound such as tetramethoxytitanium can be obtained by hydrolysis and dehydration condensation in the presence of an acid. Next, it can be denatured to anatase type titania by baking at 400 ° C. to 500 ° C., and can be denatured to rutile type titania by baking at 600 ° C. to 700 ° C.
[0114]
(2) Step of forming wettability changing layer
Next, the wettability changing layer forming step will be described. In the present embodiment, as shown in FIG. 6B as an example, a wettability changing layer 10 whose contact angle with a liquid is reduced by the action of a photocatalyst accompanying energy irradiation is formed on the photocatalyst treatment layer 9 described above. . Thereby, since it is not necessary to contain a photocatalyst in the wettability changing layer, it is possible to reduce the possibility that the functional part is affected by the photocatalyst over time, and to obtain a high-quality functional element. It is possible.
[0115]
The wettability changing layer is not particularly limited as long as it is a layer whose wettability changes by the action of the photocatalyst treatment layer, but is formed of the same material as the binder in the photocatalyst treatment layer of the first embodiment. Is preferred. Since the material and the forming method of the wettability changing layer when formed with the same material as the binder in the photocatalyst containing layer of the first embodiment are the same as those of the first embodiment, The description in is omitted.
[0116]
In the present embodiment, the thickness of the wettability changing layer is preferably from 0.001 μm to 1 μm, particularly preferably in the range of 0.01 to 0.1 μm, in view of the change rate of the wettability by the photocatalyst. It is.
[0117]
By using the wettability changing layer of the above-mentioned component in the present invention, by the action of the photocatalyst in the adjacent photocatalyst treatment layer, the action of oxidation, decomposition and the like of an organic group and an additive which are a part of the above-mentioned component is used. In addition, the wettability of an energy-irradiated portion can be changed to make it lyophilic, and a large difference can be caused in wettability with an energy-unirradiated portion. Therefore, by increasing the receptivity (lyophilic property) and repellency (liquid repellency) with the composition for various functional parts and the like, a functional element having high utility value can be obtained.
[0118]
In the wettability changing layer in the present embodiment, the contact angle with the liquid having a surface tension of 40 mN / m in the portion not irradiated with the energy is 1 ° from the contact angle with the liquid with a surface tension of 40 mN / m in the portion irradiated with the energy. It is preferable that the layer has a large contact angle. As described above, if the difference in the contact angles is at least 1 ° or more, it becomes easy to apply the composition for various functional parts along the lyophilic region.
[0119]
Specifically, the contact angle with a liquid having a surface tension of 40 mN / m is 10 ° or more, preferably the contact angle with a liquid having a surface tension of 30 mN / m is 10 ° or more in a portion where the energy is not irradiated. The contact angle with a liquid having a tension of 20 mN / m is preferably 10 ° or more. This is because the portion that is not irradiated with energy is a portion that requires liquid repellency in the present invention. Therefore, when the contact angle with the liquid is small, the liquid repellency is not sufficient, and various functional parts are not provided. This is because there is a possibility that the composition for use or the like remains, which is not preferable.
[0120]
In addition, the contact angle between the wettability changing layer and the liquid having the surface tension of 40 mN / m is less than 9 degrees, preferably the contact angle with the liquid having a surface tension of 50 mN / m, when the energy irradiation is performed. The layer preferably has an angle of 10 ° or less, particularly a contact angle of 10 ° or less with a liquid having a surface tension of 60 mN / m. When the contact angle with the liquid in the energy-irradiated portion is high, the spread of various functional portion compositions and the like in this portion may be inferior, and the functional portion may not be accurately formed. Because.
[0121]
The wettability changing layer can contain the same fluorine in the same manner as that described in the section of “fluorine content” in the description of the photocatalyst-containing layer in the first embodiment.
[0122]
(3) Step of forming exposed portion for first functional portion
Next, the step of forming an exposed portion for the first functional portion will be described. For example, as shown in FIG. 6C, by applying a photomask 3 or the like as an example on the above-described wettability changing layer 10, the energy 4 is irradiated in a pattern shape for forming the first functional portion, and This is a step of forming the exposed portion 5 for the first functional portion having reduced properties. This makes it possible to form the first functional portion on the first functional portion exposure portion, which is the lyophilic region. The irradiation of the energy, the irradiation method, the pattern forming method, and the like are the same as those in the first embodiment described above, and thus the description thereof will be omitted.
[0123]
(4) First functional part forming step
Next, the first functional portion forming step will be described. In the first functional portion forming step, as shown in FIG. 6D, for example, the first functional portion 6 is provided to the first functional portion exposure portion 5 which has been made a lyophilic region by the above-described process. This is the step of forming. The type of the functional part and the forming method are not particularly limited, and are the same as those described in the first embodiment, and thus description thereof will be omitted.
[0124]
(5) Step of forming exposed portion for second functional portion
Next, an exposure unit for the second functional unit is formed. This step is, for example, as shown in FIG. 6E, around the first functional portion 6 formed by the above-described process and in a pattern for forming the second functional portion, for example, a photomask. This is a step of irradiating energy 4 using 3 or the like. Thereby, as described above, it becomes possible to make the exposure portion for the second functional portion a lyophilic region, and it is possible to easily form the second functional portion. The process of forming the exposure portion for the second functional portion is the same as that of the first embodiment, and the description is omitted here.
[0125]
(6) Second functional part forming step
Next, a second functional part is formed on the exposure part for the second functional part which has been made the lyophilic area in the above-described step. As shown in FIG. 6 (f) as an example, this step is performed, for example, so as to cover the first functional section on the second functional section exposure section 7 which has been made a lyophilic area by the above step. This is a step of forming the second functional part 8 using a composition for a natural part. This makes it possible to easily form the second functional part around the first functional part and on the first functional part, and to provide a high-definition functional element.
[0126]
This second functional portion forming step is also the same as that of the first embodiment, and thus the description thereof is omitted here.
[0127]
3. Third embodiment
A third embodiment of the present invention provides
(1) forming a photocatalyst treatment layer containing at least a photocatalyst on a substrate;
(2) forming a decomposition removal layer on the photocatalyst treatment layer, which is a layer that is decomposed and removed by the action of a photocatalyst accompanying energy irradiation;
(3) a step of irradiating the decomposition removal layer with energy in a pattern to form an exposed portion for a first functional portion;
(4) forming a first functional part in the first functional part exposure part;
(5) a step of irradiating energy in a pattern around the first functional portion of the decomposition removal layer in which the first functional portion is formed to form an exposed portion for the second functional portion;
(6) forming a second functional part in the second functional part exposure part so as to cover the first functional part;
The present invention provides a method for manufacturing a functional element, comprising:
[0128]
In the present embodiment, as shown in FIG. 7 as an example, a photocatalyst treatment layer 9 containing at least a photocatalyst is formed on a substrate 1 (FIG. 7A). Next, a decomposition removal layer 11 that is decomposed and removed by the influence of the photocatalyst accompanying the energy irradiation is formed on the photocatalyst treatment layer 9 (FIG. 7B). The energy 4 is irradiated on the decomposition removal layer 11 using the photomask 3 in a pattern for forming the first functional portion (FIG. 7C). By this energy irradiation, the decomposition removal layer 11 is decomposed and removed only in the region where the first functional portion is formed. Here, the contact angle of the decomposition removal layer 11 with the liquid is preferably larger than the contact angle of the photocatalyst treatment layer 9 with the liquid, which is exposed by the decomposition removal of the decomposition removal layer 11. Thereby, the first functional portion can be easily formed by utilizing not only the unevenness of the decomposition removal layer 11 decomposed and removed but also the difference in wettability. Further, the first functional portion 6 is formed on the first functional portion exposure portion 5 from which the decomposition removal layer 11 has been decomposed and removed (FIG. 7D). Next, irradiation of energy 4 using the photomask 3 in a pattern-like manner around the first functional portion 6 where the second functional portion is formed on the decomposition removal layer 11 where the first functional portion is formed is performed. (FIG. 7E). Thereby, the decomposed and removed layer 11 of the exposed part 7 for the second functional part irradiated with the energy is decomposed and removed, and irregularities are formed, so that the second functional part 8 can be easily formed (FIG. 7). (F)).
[0129]
Hereinafter, each of these steps will be described.
[0130]
(1) Photocatalyst treatment layer forming step
First, the photocatalyst treatment layer forming step of the present embodiment will be described. For example, as shown in FIG. 7A, in the present embodiment, a photocatalyst treatment layer 9 is formed on a substrate 1. The base material is the same as that described in the first embodiment, and a description thereof will be omitted. The photocatalyst treatment layer is the same as that described in the second embodiment, and a description thereof will not be repeated.
[0131]
(2) Decomposition removal layer forming step
Next, the decomposition removal layer forming step will be described. The decomposition removal layer forming step of this embodiment is a step of forming the decomposition removal layer 11 on the photocatalyst treatment layer formed in the above step, for example, as shown in FIG. 7B. The decomposition removal layer used in the present embodiment is not particularly limited as long as the decomposition removal layer of the part irradiated with energy is decomposed and removed by the action of the photocatalyst in the photocatalyst treatment layer when irradiated with energy. Not something.
[0132]
As described above, since the decomposed and removed layer is decomposed and removed by the action of the photocatalyst at the portion irradiated with energy, it has a pattern consisting of a portion with and without the decomposed and removed portion without performing a developing step or a washing step, that is, has a concavo-convex pattern. A pattern can be formed.
[0133]
In addition, since this decomposition removal layer is oxidized and decomposed by the action of a photocatalyst by energy irradiation and is vaporized, it is removed without a special post-treatment such as a development / washing step. Depending on the material, a washing step or the like may be performed.
[0134]
In addition, the decomposition removal layer used in the present embodiment not only forms irregularities, but also preferably has a higher contact angle with a liquid than the substrate surface. Thereby, the decomposition removal layer is decomposed and removed, and the region where the base material is exposed can be made a lyophilic region, and the region where the decomposition removal layer remains can be made a lyophobic region, thereby forming various patterns. This is because it becomes possible.
[0135]
Here, the characteristics of the lyophilic region composed of the photocatalyst treatment layer, which is exposed by the decomposition removal layer being decomposed and removed by the energy irradiation, and the lyophobic region composed of the decomposition removal layer of the energy non-irradiated portion are subsequently applied. It is formed from a lyophilic region and a lyophobic region that differ by at least 1 ° or more, preferably 5 ° or more, especially 10 ° or more in contact angle with a liquid having a surface tension equivalent to the surface tension of the functional part composition. It is preferable that the pattern is formed.
[0136]
The contact angle of the decomposition removal layer surface with the liquid in this embodiment is such that the contact angle with the liquid having a surface tension of 40 mN / m is 10 ° or more, preferably the contact angle with the liquid having a surface tension of 30 mN / m is 10 °. As described above, it is particularly preferable that the contact angle with a liquid having a surface tension of 20 mN / m shows a value of 10 ° or more.
[0137]
Further, in the present embodiment, the photocatalyst treatment layer is preferably lyophilic, and specifically, the contact angle with a liquid having a surface tension of 40 mN / m is preferably 9 ° or less, more preferably. The contact angle with a liquid having a surface tension of 40 mN / m is 5 ° or less, particularly preferably 1 ° or less.
[0138]
When the wettability of the decomposition removal layer and the photocatalyst treatment layer is within the above range, the region where the photocatalyst treatment layer is exposed can be a lyophilic region, and the region where the decomposition removal layer remains can be a lyophobic region. This makes it easy to form a high-definition pattern. Here, the contact angle with the liquid is a value measured by the method described in the first embodiment.
[0139]
Specific examples of the film that can be used for the decomposition removal layer of this embodiment include a film made of a fluorine-based or hydrocarbon-based liquid repellent resin. These fluorine-based and hydrocarbon-based resins are not particularly limited as long as they have liquid repellency, and these resins are dissolved in a solvent and, for example, a common resin such as spin coating is used. It can be formed by a film method.
[0140]
Further, in the present embodiment, a functional thin film, that is, a self-assembled monomolecular film, a Langmuir-Brocket film, and an alternately adsorbed film can be used to form a defect-free film. It can be said that such a film formation method is more preferable.
[0141]
Here, the self-assembled monolayer, the Langmuir-Brocket film, and the alternating adsorption film used in the present embodiment will be specifically described.
[0142]
(I) Self-assembled monolayer
Although the inventors do not know the existence of an official definition of a self-assembled monolayer (Self-Assembled @ Monolayer), a commentary on what is generally recognized as a self-assembled monolayer is, for example, a review by Abraham @ Ulman. “Formation and Structure of the Self-Assembled Monolayers”, Chemical Review, 96, 1533-1554 (1996) are excellent. With reference to this review, a self-assembled monolayer can be said to be a monolayer formed as a result of adsorption and binding (self-assembly) of appropriate molecules to an appropriate substrate surface. Materials capable of forming a self-assembled film include, for example, surfactant molecules such as fatty acids, organic silicon molecules such as alkyltrichlorosilanes and alkylalkoxides, organic sulfur molecules such as alkanethiols, and alkyl phosphates. Organic phosphoric acid molecule. A general commonality of molecular structures is that they have a relatively long alkyl chain, and a functional group that interacts with the substrate surface is present at one molecular end. The portion of the alkyl chain is a source of intermolecular force when the molecules are packed two-dimensionally. However, the example shown here is the simplest structure, having a functional group such as an amino group or a carboxyl group at the other end of the molecule, an alkylene chain having an oxyethylene chain, or a fluorocarbon chain. A self-assembled monolayer composed of various molecules, such as a complex-type chain, has been reported. There is also a composite self-assembled monolayer composed of a plurality of molecular species. Recently, a polymer having a plurality of functional groups (in some cases, one functional group) or a linear (in some cases having a branched structure) polymer in the form of particles, such as a dendrimer, has been developed. It seems that the one formed on the surface of the substrate (the latter is collectively referred to as a polymer brush) may be considered as a self-assembled monolayer. In the present embodiment, these are also included in the self-assembled monolayer.
[0143]
(Ii) Langmuir-Blodgett membrane
The Langmuir-Blodgett (Film) used in the present embodiment is not significantly different from the above-described self-assembled monolayer in terms of morphology, if formed on a substrate. The characteristics of the Langmuir-Blodgett film can be said to be its formation method and the resulting high two-dimensional molecular packing properties (high orientation and high ordering). That is, in general, Langmuir-Blodgett film-forming molecules are first developed on the gas-liquid interface, and the developed film is condensed by the trough and changes into a highly packed condensed film. In practice, this is transferred to a suitable substrate and used. It is possible to form from a monomolecular film to a multilayer film of an arbitrary molecular layer by the method outlined here. In addition, not only low molecules but also polymers, colloid particles, etc. can be used as the film material. A recent example of the application of various materials is described in detail in a review by Tokuharu Miyashita et al., "Prospects for Nanotechnology for Creating Soft Nanodevices", {Polymer} 50, September, 644-647 (2001).
[0144]
(Iii) Alternating adsorption membrane
An alternating adsorption film (Layer-by-Layer @ Self-Assembled @ Film) is generally formed by sequentially adsorbing and bonding at least two materials having a functional group having a positive or negative charge onto a substrate. This is a film formed by stacking. Since a material having a larger number of functional groups has more advantages such as an increase in the strength and durability of the membrane, an ionic polymer (polymer electrolyte) is often used recently as a material. Particles having a surface charge such as proteins, metals and oxides, so-called "colloidal particles" are also frequently used as film-forming substances. More recently, membranes have been reported that actively utilize weaker interactions than ionic bonds, such as hydrogen bonds, coordinate bonds, and hydrophobic interactions. In the case of a relatively recent alternately adsorbed film, although slightly biased toward a material system using electrostatic interaction as a driving force, Paula @ T. Review by Hammond, "Recent \ Explorations \ in \ Electrostatic \ Multilayer \ Thin \ Film \ Assembly" Current Current Opinion in Colloid & Interface Science, 4, 430-4. In the alternate adsorption film, taking the simplest process as an example, the cycle of adsorption-washing of a material having a positive (negative) charge-adsorption-washing of a material having a negative (positive) charge is repeated a predetermined number of times. It is a film to be formed. No development-condensation-transfer operation is required at all like a Langmuir-Blodgett membrane. Further, as is apparent from the difference between these production methods, the alternating adsorption film generally does not have a two-dimensional high orientation and high order unlike the Langmuir-Blodgett film. However, the alternate adsorption film and its manufacturing method have advantages over conventional film forming methods, such as being able to easily form a dense film without defects and being able to uniformly form a film on a fine uneven surface, a tube inner surface, a spherical surface, and the like. Have many.
[0145]
The thickness of the decomposition removal layer is not particularly limited as long as it is a thickness that can be decomposed and removed by the energy irradiated in the energy irradiation step described later. The specific film thickness varies greatly depending on the type of energy to be irradiated, the material of the decomposition removal layer, and the like, but is generally in the range of 0.001 μm to 1 μm, particularly 0.01 μm to 0.1 μm. It is preferable that the thickness be in the range of 1 μm.
[0146]
(3) Step of forming exposed portion for first functional portion
Next, the step of forming an exposed portion for the first functional portion will be described. In the present embodiment, as shown in FIG. 7C as an example, a region where the first functional portion is formed is irradiated with energy 4 in a pattern by using a photomask 3 as an example. As a result, only the exposed portion 5 for the first functional portion of the decomposition removal layer 11 described above is decomposed and removed, and a pattern having irregularities can be formed. Further, as described above, the region where the decomposition removal layer 11 remains is a lyophobic region, and the decomposition removal layer 11 is removed by energy irradiation, and the exposed portion 5 for the first functional part where the photocatalyst treatment layer 9 is exposed is formed. The first functional portion is preferably a lyophilic region, and the difference in wettability can be used to more easily form the first functional portion. The energy irradiation, irradiation method, pattern forming method, and the like are the same as those in the first embodiment described above, and thus description thereof will be omitted.
[0147]
(4) First functional part forming step
Next, the first functional portion forming step will be described. In the first functional part forming step, for example, as shown in FIG. 7D, the first functional part exposing part 5 on the photocatalyst processing layer 9 from which the decomposition removal layer has been decomposed and removed by the above-described step is formed. This is a step of forming the first functional unit 6. The type of the functional part and the forming method are not particularly limited, and are the same as those described in the first embodiment, and thus description thereof will be omitted.
[0148]
In the first functional portion forming step in the present embodiment, if the difference between the properties of the energy irradiated portion and the energy non-irradiated portion is only unevenness due to the presence or absence of the decomposition removal layer, the first functional portion is a nozzle. It is preferable to form by a discharge method.
[0149]
(5) Step of forming exposed portion for second functional portion
Next, an exposure unit for the second functional unit is formed. This step is, for example, as shown in FIG. 7E, around the first functional portion 6 formed by the above-described process and in a pattern shape forming the second functional portion, for example, a photomask. This is a step of irradiating energy 4 using 3 or the like. As a result, as described above, it is possible to decompose and remove the decomposed and removed layer 11 of the exposure part 7 for the second functional part, and it is possible to easily form the second functional part 8. The step of forming the exposed portion for the second functional part is the same as the step of forming the first functional part, and thus the description thereof is omitted.
[0150]
(6) Second functional part forming step
Next, a second functional part is formed on the exposed part for the second functional part from which the decomposition removal layer has been decomposed and removed in the above-described step. In this step, as shown in FIG. 7F, for example, the decomposition removal layer 11 is decomposed and removed by the above-described steps, and the photocatalyst treatment layer 9 is exposed on the exposed portion 7 for the second functional portion. In this step, the second functional portion 8 is formed so as to cover the first functional portion using, for example, a composition for a functional portion. This makes it possible to easily form the second functional part around the first functional part and on the first functional part, and to provide a high-definition functional element.
[0151]
This second functional portion forming step is the same as that of the first embodiment, and the description is omitted here.
[0152]
B. Functional element
Next, the functional element of the present invention will be described. The functional element of the present invention has three modes. In the first mode, as shown in FIG. 8 as an example, the action of a base material 1 and a photocatalyst associated with energy irradiation formed on the base material 1 A photocatalyst-containing layer 2 that is a layer having a reduced contact angle with a liquid and contains at least a photocatalyst and a binder; a first functional portion 6 formed in a pattern on the photocatalyst-containing layer 2; It is a functional element having a second functional part 8 surrounding the first functional part 6 and covering the first functional part 6. Here, the photocatalyst-containing layer has characteristics of the lyophilic region formed by the energy irradiation and the liquid-repellent region not irradiated with the energy, which are equivalent to the surface tension of the functional part composition to be subsequently applied. It is preferable that the pattern is formed of a lyophilic region and a lyophobic region that differ by at least 1 ° or more, preferably 5 ° or more, particularly 10 ° or more in contact angle with a liquid having a surface tension. The liquid-repellent region in the functional element of the present embodiment preferably has a characteristic of a contact angle of 10 ° or more with a liquid having a surface tension of 40 mN / m, particularly a liquid having a surface tension of 30 mN / m. It is preferable that the contact angle is 10 ° or more, especially, the contact angle with a liquid having a surface tension of 20 mN / m is 10 ° or more.
[0153]
Further, the lyophilic region in the functional element of the present embodiment preferably has a characteristic of a contact angle of 9 ° or less as a contact angle with a liquid having a surface tension of 40 mN / m, and particularly a liquid having a surface tension of 50 mN / m. Is preferably 10 ° or less, particularly preferably 10 ° or less with a liquid having a surface tension of 60 mN / m.
[0154]
This makes it possible to form a functional part by utilizing the difference between the wettability of the energy-irradiated part of the photocatalyst-containing layer and the wettability of the energy-irradiated part of the photocatalyst-containing layer. This is because it is easy, and as a result, a high-definition pattern can be formed at low cost.
[0155]
In the second embodiment, as shown in FIG. 9 as an example, a base material 1, a photocatalyst treatment layer 9 containing at least a photocatalyst formed on the base material 1, and a photocatalyst treatment layer 9 formed on the photocatalyst treatment layer 9 A wettability changing layer 10 whose contact angle with a liquid is reduced by the action of a photocatalyst accompanying the applied energy irradiation, a first functional portion 6 formed in a pattern on the wettability changing layer 10, And a second functional portion formed to cover the first functional portion.
[0156]
Also in the second embodiment, the characteristics of the lyophilic region formed by the energy irradiation and the lyophobic region not irradiated with the energy have the same surface tension as the surface tension of the functional part composition to be subsequently applied. It is preferable that the pattern is formed of a lyophilic region and a lyophobic region that differ by at least 1 ° or more, preferably 5 ° or more, particularly 10 ° or more in contact angle with a liquid having a tension. The liquid-repellent region of the functional element according to the present embodiment preferably has a contact angle of 10 ° or more with a liquid having a surface tension of 40 mN / m, and particularly has a contact angle with a liquid having a surface tension of 30 mN / m. It is preferable that the contact angle is 10 ° or more, especially, the contact angle with a liquid having a surface tension of 20 mN / m is 10 ° or more.
[0157]
Further, the lyophilic region in the functional element of the present embodiment preferably has a characteristic of a contact angle of 9 ° or less as a contact angle with a liquid having a surface tension of 40 mN / m, and particularly a liquid having a surface tension of 50 mN / m. Is preferably 10 ° or less, particularly preferably 10 ° or less with a liquid having a surface tension of 60 mN / m.
[0158]
Thereby, similarly to the first aspect, the functional portion is formed by utilizing the difference between the wettability of the energy irradiated portion of the wettability changing layer and the wettability of the energy non-irradiated portion of the wettability changing layer. This makes it easy to manufacture, and as a result, it is possible to form a high-definition pattern at low cost. Furthermore, in the second aspect, since the photocatalyst does not need to be contained in the wettability changing layer, the functional part and the photocatalyst do not directly contact, and the functional part may be affected by the photocatalyst over time. Can be reduced, and a high-quality functional element can be obtained.
[0159]
In the third embodiment, as shown in FIG. 10, a base material 1, a photocatalyst treatment layer 9 containing at least a photocatalyst formed on the base material 1, and an energy formed on the photocatalyst treatment layer 9. A first functional layer formed in a pattern in a decomposition removal layer 11 which is a layer which is decomposed and removed by the action of a photocatalyst accompanying irradiation, and a region on the photocatalyst treatment layer 9 where the decomposition removal layer 11 is decomposed and removed. A portion 6 and a region around the first functional portion 6 and on the photocatalytic treatment layer 9 where the decomposition removal layer 11 has been decomposed and removed is formed so as to cover the first functional portion 6. And a second functional section 8. Here, it is preferable that the contact angle of the decomposition removal layer with the liquid is larger than the contact angle of the photocatalyst treatment layer with the liquid that is exposed by the decomposition removal of the decomposition removal layer. This is because a region where the decomposition removal layer remains is a lyophobic region and a region where the photocatalyst treatment layer is exposed is a lyophilic region, which facilitates pattern formation. Specifically, the liquid-repellent region composed of the decomposition removal layer preferably has a characteristic of a contact angle of 10 ° or more with a liquid having a surface tension of 40 mN / m, and particularly has a contact angle with a liquid having a surface tension of 30 mN / m. It is preferable that the contact angle is 10 ° or more, especially, the contact angle with a liquid having a surface tension of 20 mN / m is 10 ° or more.
[0160]
In addition, the lyophilic region composed of the photocatalyst treatment layer has a contact angle with a liquid having a surface tension of 40 mN / m of preferably 9 ° or less, more preferably a liquid having a surface tension of 40 mN / m. Is 5 ° or less, particularly preferably 1 ° or less. In addition, the functionality and configuration of the functional unit of the above-described functional element are the same as those described in the above-described method of manufacturing the functional element, and thus description thereof will be omitted.
[0161]
The first functional part and the second functional part in the present invention may be the same functional part or may be different functional parts. Is preferred.
[0162]
Here, as a functional element specifically using the above functional element of the present invention, a functional element using the second functional portion as a sealing material may be mentioned. For example, as shown in FIG. Then, the first functional portion 6 is formed on the pattern on the photocatalyst containing layer 2. Next, energy irradiation is performed so as to surround the periphery of the portion where the first functional portion 6 is formed, thereby forming an exposure portion 7 for the second functional portion. A second functional part, which is a sealing material, is formed on the second functional part exposure part 7 and so as to cover the first functional part 6. This makes it possible to obtain a functional element sealed with a high-definition sealing material.
[0163]
Further, in addition to the sealing material, the first functional portion is a microlens, and the second functional portion is a functional element that is a hard coat material that protects the microlens, and the first functional portion is Functional elements and the like are metal wirings, and the second functional part is an insulating layer that shields the metal wirings from the outside.
[0164]
In addition, since each structure and process of the functional part, the photocatalyst containing layer, the base material, the energy, and the like of the present invention are the same as those described in the section of the above-described method for manufacturing a functional element, the description here will be omitted. Is omitted.
[0165]
C. Optical waveguide
Further, in the present invention, the above-described functional element can be an optical waveguide. The optical waveguide has a structure having a core layer for guiding light and a clad layer formed to cover the core layer and having a smaller refractive index than the core layer. For this reason, when the functional element of the present invention is used as an optical waveguide, the core layer is used as the first functional part of the functional element, and the second functional part is used as the upper clad layer.
[0166]
Here, the functional element of the present invention has three modes as described above. In the first mode of the functional element, for example, as shown in FIG. 6 is formed on the photocatalyst containing layer 2, and the cladding layer 8 as the second functional part is formed so as to cover the core layer 6. Further, in the second embodiment of the functional element, for example, as shown in FIG. 7, the core layer 6 which is the first functional part is formed on the wettability changing layer 10 and is the second functional part. Cladding layer 8 is formed so as to cover core layer 6. Further, in the third embodiment, for example, as shown in FIG. 8, the core layer 6 as the first functional part is formed on the photocatalyst treatment layer 9 and the clad layer 8 as the second functional part is It is formed so as to cover the core layer 6. For this reason, the photocatalyst-containing layer, the wettability changing layer, and the photocatalyst-containing layer that are in direct contact with the core layer are used as the lower cladding layer in the optical waveguide of the present invention. Each configuration in these optical waveguides will be described.
[0167]
First, the lower clad layer, which is one of the photocatalyst containing layer, the wettability changing layer, and the photocatalyst treatment layer, which is the portion where the core layer is formed when the functional element of the present invention is used as an optical waveguide, will be described. . The lower cladding layer of the present invention is the same as the photocatalyst-containing layer, the wettability changing layer, and the photocatalyst treatment layer described in the above-described method for producing a functional element, and a description thereof will be omitted. Here, among the above-mentioned layers, it is preferable that the refractive index be in the range of 1.1 to 1.7, especially in the range of 1.1 to 1.5, from the viewpoint of achieving the function as the lower cladding layer. Further, it is preferable that the difference between the refractive index and the core layer described later is 0.03 or more.
[0168]
Next, the core layer formed as the first functional portion of the functional element of the present invention will be described. According to the present invention, as described in the section of the functional element, a pattern in which wettability is changed by the action of a photocatalyst accompanying energy irradiation or a pattern in which unevenness is formed on the clad layer is used. Thus, the core layer can be easily formed. Examples of a material for forming such a core layer include polyimide, polycarbonate, polymethyl methacrylate, polystyrene, and silicon oxide. These materials are selected from various coating methods such as a spin coating method and a dip coating method, a nozzle discharge method such as an ink jet method, a vapor deposition method, an electroless plating method, and the like according to the characteristics of the material to form a core layer. It is possible to control the refractive index by selecting the type of material and the mixing ratio.
[0169]
Here, the shape of the core layer is usually determined in consideration of the mode of light guided in the core layer. Since infrared light is generally used as the guided light, the thickness from the top to the bottom of the core layer is preferably in the range of 0.8 to 300 μm, and more preferably in the range of 1 to 100 μm. The width of the bottom of the core layer is preferably in the range of 0.8 to 300 μm, and more preferably in the range of 1 to 100 μm. By setting the core layer within the above range, light is guided without interruption in the core layer, and an efficient optical waveguide can be obtained. Further, the refractive index of the core layer is preferably in the range of 1.1 to 1.7, and more preferably in the range of 1.4 to 1.7.
[0170]
Next, an upper clad layer is formed as a second functional part so as to surround the core layer and cover the core layer. According to the present invention, as described in the section of the functional element above, in the region where the upper clad layer is formed as the second functional portion, by the action of the photocatalyst accompanying the energy irradiation, a pattern having a different wettability, It is possible to form a pattern having irregularities, and it is possible to easily form the upper cladding layer. The upper cladding layer in the present invention is not particularly limited as long as it has a shape covering the surface of the core layer.
[0171]
The role of the upper cladding layer in the optical waveguide, in addition to suppressing the optical transmission loss of the optical waveguide, to prevent adverse effects due to external stress and the like, when cutting the end face of the optical waveguide and polishing the end face, For example, it is possible to perform processing with high dimensional accuracy.
[0172]
In the present invention, the upper clad layer may be in any of a case where it is formed of a material having transparency and a case where it is opaque.
[0173]
As the material used when the upper cladding layer is formed of a material having transparency, for example, silicon resin, polymethacrylate resin, polycarbonate resin, silicon oxide, UV-curable epoxy resin, epoxy resin, fluorinated polyimide, Examples thereof include polyimide, polycarbonate-MMA, and deuterated polyfluoromethacrylate.
[0174]
These materials can be deposited by, for example, a vapor deposition method.A preferable method is, for example, spin coating, spray coating, dip coating, roll coating, various coating methods such as bead coating, or an ejection method such as inkjet. A method of forming the upper clad layer by applying the above-mentioned material as a coating liquid. Further, since the refractive index can be easily changed depending on the kind of the selected material and the mixing ratio of the materials, it is possible to form the upper clad layer in which the refractive index difference is controlled according to the refractive index of the core layer.
[0175]
In the present invention, the refractive index of the upper cladding layer is preferably in the range of 1.1 to 1.7, and more preferably in the range of 1.4 to 1.7. By setting the refractive index of the upper cladding layer within the above range, absorption loss, which is one factor of optical transmission loss, can be effectively prevented. The difference in the refractive index between the upper cladding layer and the core layer is preferably 0.03 or more, particularly preferably 0.05 or more. If the refractive index of the core layer is higher than the refractive index of the cladding layer within the above range, optical transmission loss due to absorption loss can be efficiently prevented, and an optical waveguide having good transmission efficiency can be manufactured.
[0176]
In addition, since each structure and process of the base material, energy, and the like of the present invention are the same as those described in the section of the above-described method for manufacturing a functional element, description thereof will be omitted.
[0177]
Note that the present invention is not limited to the above embodiment. The above embodiment is an exemplification, and has substantially the same configuration as the technical idea described in the scope of the claims of the present invention. It is included in the technical scope of the invention.
[0178]
For example, in the above description, the functional part of the functional element has a double structure, but in the present invention, the functional part is not limited to the functional element having the functional part doubly, It is assumed that a functional element having multiple functional parts in which a plurality of functional parts are formed in the same manner as the functional element having a double structure is also included.
[0179]
【Example】
Hereinafter, the present invention will be described more specifically with reference to Examples and Comparative Examples.
[0180]
[Example 1]
(1) Formation of photocatalyst containing layer
30 g of isopropyl alcohol, 0.4 g of MF-160E (manufactured by Tochem Products Co., Ltd.) containing fluoroalkylsilane as main components, 3 g of trimethoxymethylsilane (TSL8113 manufactured by Toshiba Silicone Co., Ltd.), and an aqueous dispersion of titanium oxide photocatalyst. 20 g of a certain ST-K01 (manufactured by Ishihara Sangyo Co., Ltd.) was mixed and stirred at 100 ° C. for 20 minutes. This was diluted three times with isopropyl alcohol to obtain a photocatalyst-containing film composition.
[0181]
The above composition was applied on a glass substrate by a spin coater, and dried at 150 ° C. for 10 minutes to form a transparent photocatalyst-containing layer (0.2 μm in thickness).
[0182]
(2) Formation of exposed portion for first functional portion
The side layer of the photocatalyst containing layer was 70 mW / cm by a super high pressure mercury lamp (wavelength 365 nm) through a photomask.²Exposure was performed at an illuminance of 50 seconds for 50 seconds to form an exposed portion for a first functional portion composed of a lyophilic region in a pattern on the photocatalyst containing layer.
[0183]
At this time, the contact angle between the unexposed portion and the exposed portion for the first functional portion and the liquid having a surface tension of 40 mN / m (manufactured by Junsei Chemical Co., Ltd.) was measured using a contact angle measuring device (CA-Z manufactured by Kyowa Interface Science Co., Ltd.). (30 minutes after the droplet was dropped from the micro syringe) as a result of using the mold).
[0184]
(3) Formation of optical waveguide core layer
An N-methyl-2-pyrrolidone solution of poly (methyl methacrylate) was applied to the exposed portion for the first functional part having a lyophilic property by dip coating, and dried and cured at 250 ° C. for 30 minutes.
[0185]
(4) Formation of exposed portion for second functional portion
The substrate on which the core layer was formed was exposed around the core portion in a pattern in the same manner as in 2 above, thereby forming an exposure portion for the second functional portion.
[0186]
(5) Formation of optical waveguide cladding layer
A cyclohexanone solution of polystyrene was applied by dip coating on the lyophilic exposed portion for the second functional portion and the first functional portion, and dried and cured at 250 ° C. for 30 minutes.
[0187]
[Example 2]
(1) Formation of photocatalyst treatment layer
30 g of isopropyl alcohol, 3 g of trimethoxymethylsilane (TSL8113, manufactured by Toshiba Silicone Co., Ltd.) and 20 g of ST-K01 (manufactured by Ishihara Sangyo Co., Ltd.), which is an aqueous dispersion of titanium oxide photocatalyst, were mixed and stirred at 100 ° C. for 20 minutes. . This was diluted three times with isopropyl alcohol to obtain a composition for a photocatalyst treatment layer.
[0188]
The above composition was applied on a glass substrate by a spin coater, and dried at 150 ° C. for 10 minutes to form a transparent photocatalyst treatment layer (thickness 0.2 μm).
[0189]
(2) Formation of decomposition removal layer
Polydiallyldimethylammonium chloride (PDDA, average molecular weight 100,000-200,000, Aldrich) which is a cationic polymer, and polystyrenesulfonic acid sodium salt (PSS, average molecular weight 70,000, Aldrich) which is an anionic polymer are used. The film was alternately adsorbed on the photocatalyst treatment layer to a thickness of about 2 nm.
[0190]
(3) Formation of the exposed part for the first functional part
40 mW / cm of the above substrate by a super high pressure mercury lamp (wavelength 365 nm) through a photomask.²Exposure was performed for 140 seconds at an illuminance of, and the decomposition removal layer was decomposed and removed to form a first functional portion exposed portion in a pattern.
[0191]
At this time, the contact angle between the unexposed portion and the pixel portion forming portion and a wetting index standard solution (manufactured by Junsei Chemical Co., Ltd.) having a surface tension of 40 mN / m was measured using a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science Co., Ltd.). ) (30 seconds after dropping a droplet from the microsyringe), the result was 34 ° and 6 °, respectively.
[0192]
(4) Formation of metal wiring
A silver colloid solution (concentration: 30%) was applied to the lyophilic exposed portion for the first functional portion by a dip coating method, and dried and cured at 500 ° C. for 60 minutes.
[0193]
(5) Formation of exposure part for second functional part
The substrate on which the metal wiring was formed was exposed around the metal wiring in a pattern in the same manner as in 3 above, thereby forming an exposed portion for the second functional portion.
[0194]
(6) Formation of insulating layer
5 g of trimethoxymethylsilane (TSL8113, manufactured by GE Toshiba Silicone Co., Ltd.) and 2.5 g of 0.5 N hydrochloric acid were mixed and stirred for 8 hours. This was diluted 10-fold with isopropyl alcohol to obtain a composition for an insulating layer.
[0195]
The composition for an insulating layer was applied to the lyophilic exposed portion for the second functional portion and the first functional portion by a dip coating method, and dried and cured at 400 ° C. for 30 minutes.
[0196]
【The invention's effect】
According to the present invention, since the contact angle with the liquid in the portion where the energy irradiation on the photocatalyst-containing layer has been performed is reduced, the first functional portion exposed portion where the energy irradiation has been performed is the lyophilic region. Thus, the energy non-irradiated portion is set as a liquid repellent region. The first functional portion can be easily formed by utilizing the difference in wettability. Further, by irradiating energy in a pattern to the periphery where the first functional portion is formed, a new lyophilic region can be newly formed. The second functional portion can be formed so as to easily cover the first functional portion by utilizing the difference in wettability with the functional region.
[0197]
Further, since the present invention forms the pattern by changing the wettability of the energy-irradiated portion, there is no need for a post-treatment in particular after the energy irradiation, and the pattern-forming body having a high-definition pattern having a changed wettability. By forming the functional portion along this pattern, a high-definition functional element having a double structure can be easily manufactured.
[Brief description of the drawings]
FIG. 1 is a diagram illustrating an example of a method for manufacturing a functional element of the present invention.
FIG. 2 is a diagram illustrating an example of an exposure unit for a second functional unit according to the present invention.
FIG. 3 is a view showing another example of the exposure unit for the second functional unit of the present invention.
FIG. 4 is a view showing another example of the exposure unit for the second functional unit of the present invention.
FIG. 5 is a view showing another example of the exposure unit for the second functional unit of the present invention.
FIG. 6 is a view showing another example of the method for producing a functional element of the present invention.
FIG. 7 is a view showing another example of the method for producing a functional element of the present invention.
FIG. 8 is a diagram showing an example of the functional element of the present invention.
FIG. 9 is a view showing another example of the functional element of the present invention.
FIG. 10 is a view showing another example of the functional element of the present invention.
[Explanation of symbols]
1 ... Base material
2) Photocatalyst containing layer
3… Photo mask
4… Energy
5 ... Exposure section for first functional section
6… First functional department
7 ... Exposure section for second functional section
8… Second functional unit
9 ... Photocatalyst treatment layer
10 ... wettability changing layer
11 ... Decomposition removal layer

Claims (18)

(1) a step of forming a photocatalyst-containing layer on a substrate, which is a layer whose contact angle with a liquid is reduced by the action of a photocatalyst accompanying energy irradiation, and which contains at least a photocatalyst and a binder;
(2) a step of irradiating the photocatalyst-containing layer with energy in a pattern to form an exposed portion for a first functional portion;
(3) forming a first functional part in the first functional part exposure part;
(4) a step of irradiating energy in a pattern around the first functional part of the photocatalyst-containing layer on which the first functional part is formed to form an exposure part for the second functional part;
(5) forming a second functional portion on the second functional portion exposure portion so as to cover the first functional portion. 2. The functional element according to claim 1, wherein the photocatalyst-containing layer contains a decomposed substance that is decomposed by the action of a photocatalyst due to energy irradiation, thereby changing the wettability on the photocatalyst-containing layer. 3. Production method. The binder of the photocatalyst-containing layer is Y _n SiX _(4-n) (where Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, and X represents an alkoxyl group or a halogen. Wherein n is an integer from 0 to 3. One or more hydrolytic condensates or cohydrolytic condensates of the silicon compound represented by the formula (I): The method for producing a functional element according to claim 1 or 2. In the photocatalyst-containing layer, a contact angle with a liquid having a surface tension of 40 mN / m in a portion not irradiated with energy is larger than a contact angle with a liquid with a surface tension of 40 mN / m in a portion irradiated with energy by 1 ° or more. 4. The method for producing a functional element according to claim 1, wherein the photocatalyst-containing layer has a contact angle. (1) forming a photocatalyst treatment layer containing at least a photocatalyst on a substrate;
(2) forming, on the photocatalyst treatment layer, a wettability changing layer that is a layer whose contact angle with a liquid is reduced by the action of a photocatalyst accompanying energy irradiation;
(3) a step of irradiating the wettability changing layer with energy in a pattern to form an exposed portion for a first functional portion;
(4) forming a first functional part in the first functional part exposure part;
(5) a step of irradiating energy in a pattern around the first functional part of the wettability changing layer on which the first functional part is formed to form an exposure part for the second functional part;
(6) forming a second functional portion on the second functional portion exposure portion so as to cover the first functional portion. The wettability changing layer is composed of Y _n SiX _(4-n) (where Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, and X represents an alkoxyl group or a halogen. Wherein n is an integer from 0 to 3.) An organopolysiloxane which is one or more hydrolytic condensates or cohydrolytic condensates of a silicon compound represented by the formula: 6. The method for producing a functional element according to 5. In the wettability changing layer, a contact angle with a liquid having a surface tension of 40 mN / m in a portion not irradiated with energy is 1 ° or more than a contact angle with a liquid with a surface tension of 40 mN / m in a portion irradiated with energy. 7. The method according to claim 5, wherein the wettability changing layer has a large contact angle. (1) forming a photocatalyst treatment layer containing at least a photocatalyst on a substrate;
(2) forming a decomposition removal layer, which is a layer that is decomposed and removed by the action of a photocatalyst accompanying energy irradiation, on the photocatalyst treatment layer;
(3) a step of irradiating the decomposition removal layer with energy in a pattern to form an exposed portion for a first functional portion;
(4) forming a first functional part in the first functional part exposure part;
(5) forming a second functional portion exposure portion by irradiating energy in a pattern around the first functional portion of the decomposition removal layer in which the first functional portion is formed;
(6) forming a second functional portion on the second functional portion exposure portion so as to cover the first functional portion. 9. The method according to claim 8, wherein the decomposition removal layer is any one of a self-assembled monomolecular film, a Langmuir-Blodgett film, and an alternate adsorption film. The decomposition removal layer has a contact angle with a liquid having a surface tension of 40 mN / m in a portion where the decomposition removal layer remains, and a surface tension of 40 mN / m in the photocatalyst treatment layer exposed when energy is irradiated to decompose and remove the decomposition removal layer. The method for producing a functional element according to claim 8, wherein the layer is a decomposition removal layer having a contact angle larger than the contact angle with the liquid of m by 1 ° or more. The photocatalyst includes titanium oxide (TiO ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ), strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), bismuth oxide (Bi ₂ O ₃ ), and oxidized method for producing a functional element according to any one of claims of claims 1 to 10, characterized in that one or more substances selected from iron (Fe 2 _{O 3).} Method for producing a functional element according to claim 11, wherein the photocatalyst is titanium oxide (TiO _2). 13. The method for manufacturing a functional element according to claim 1, wherein the energy irradiation is performed while heating the photocatalyst. A substrate, a layer whose contact angle with a liquid is reduced by the action of a photocatalyst accompanying energy irradiation formed on the substrate, and a photocatalyst-containing layer containing at least a photocatalyst and a binder; and A functional element, comprising: a first functional part formed in a pattern shape on a second side; and a second functional part formed so as to cover the first functional part. A substrate, a photocatalyst treatment layer containing at least a photocatalyst formed on the substrate, and a layer formed on the photocatalyst treatment layer and having a contact angle with a liquid reduced by the action of the photocatalyst accompanying energy irradiation. A certain wettability changing layer, a first functional part formed in a pattern on the wettability changing layer, and a second functional part formed so as to cover the first functional part. Functional element characterized by. A base material, a photocatalyst treatment layer containing at least a photocatalyst formed on the base material, and a decomposition removal layer that is formed on the photocatalyst treatment layer and decomposed and removed by the action of the photocatalyst accompanying energy irradiation. A first functional portion formed in a pattern in a region where the decomposition removal layer is decomposed and removed on the photocatalyst treatment layer, and around the first functional portion, and on the photocatalyst treatment layer A functional element having a second functional portion formed so as to cover the first functional portion in a region where the decomposition removal layer is decomposed and removed. The functional element according to any one of claims 14 to 16, wherein the second functional part is a sealing material. 17. An optical waveguide, wherein the first functional part of the functional element according to claim 14 is a core layer, and the second functional part is a cladding layer.

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