JPH0590892A - Thin film type saw device - Google Patents

Thin film type saw device

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Publication number
JPH0590892A
JPH0590892A JP3246396A JP24639691A JPH0590892A JP H0590892 A JPH0590892 A JP H0590892A JP 3246396 A JP3246396 A JP 3246396A JP 24639691 A JP24639691 A JP 24639691A JP H0590892 A JPH0590892 A JP H0590892A
Authority
JP
Japan
Prior art keywords
saw
thin film
linbo
acoustic wave
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP3246396A
Other languages
Japanese (ja)
Inventor
Yoshihiko Shibata
佳彦 柴田
Kiyoshi Kaya
樹佳 嘉屋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP3246396A priority Critical patent/JPH0590892A/en
Publication of JPH0590892A publication Critical patent/JPH0590892A/en
Withdrawn legal-status Critical Current

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  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)

Abstract

PURPOSE:To provide a surface acoustic wave(SAW) device that can be used in an extremely broad frequency range (specially for high frequency wave) compared with the case of using a bulk monocrystal by using a thin LiNbO3 film having high SAW velocity for a SAW device. CONSTITUTION:A sapphire substrate, specially a sapphire substrate with ((006) surface), is used to preparte a substrate for a thin film type SAW device. On the substrate, the thin LiNbO3 film whose crystal axis is unidirectionally oriented is prepared so that surface acoustic wave whose propagation rate on the thin film ranges in 4500-6600m/s, or a surface acoustic wave device using higher harmonic waves is prepared.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は弾性表面波(Surfa
ce AcousticWave、以下SAWと呼ぶ)
フィルター、SAW共振子、SAWセンサーなどSAW
デバイスに関するものである。
BACKGROUND OF THE INVENTION The present invention relates to surface acoustic waves (Surfa).
ce Acoustic Wave, hereinafter referred to as SAW)
SAW such as filter, SAW resonator, SAW sensor
It is about devices.

【0002】[0002]

【従来の技術】LiNbO3 単結晶は高いキューリー温
度を有する強誘電体であり、その大きな電気機械結合定
数、電気光学効果、非線形光学効果などにおいて非常に
優れた性質を有しており、SAWデバイス用材料として
実用化される一方光学素子として有望視されている材料
である。
2. Description of the Related Art A LiNbO 3 single crystal is a ferroelectric substance having a high Curie temperature, and has very excellent properties such as large electromechanical coupling constant, electro-optic effect, and non-linear optical effect. It is a material that is put to practical use as a material for use on the one hand, but is promising as an optical element.

【0003】近年の半導体技術の進歩による電子部品の
集積化及び小型化に伴い、強誘電体素子、圧電体素子も
小型化、薄膜化が進みつつあり、LiNbO3 単結晶に
関しても薄膜化に対する需要は強く数多くの研究がなさ
れてきている。SAWフィルターにおける中心周波数は
SAWの伝搬特性と圧電体上に構成される櫛型電極パタ
ーン(Inter Digital Transduc
er、以下IDTと略する)によって決定される。SA
W速度VsとSAWフィルターの中心周波数F0
(1)式によって決定される。
With the recent progress in semiconductor technology and the integration and miniaturization of electronic components, ferroelectric elements and piezoelectric elements are becoming smaller and thinner, and the demand for thinning LiNbO 3 single crystals is increasing. Has been extensively researched. The center frequency of the SAW filter is the propagation characteristic of the SAW and the comb-shaped electrode pattern (Inter Digital Transduc) formed on the piezoelectric body.
er, hereinafter abbreviated as IDT). SA
The W speed Vs and the center frequency F 0 of the SAW filter are determined by the equation (1).

【0004】 F0 = Vs/λ (1) (λ;弾性表面波の波
長) 一般にλは大きくする事は比較的容易であるが、小さく
する事は極めて難しい。よって、Vsが大きい材料ほど
高周波化にも有利となり、広い周波数範囲のフィルター
となり得優れた素材と言える。LiNbO3 のバルク単
結晶はVs=3400〜4000m/sである事が知ら
れている。LiNbO3 薄膜に関しては、和佐らにより
LiNbO3 / Al2 3 でVs=4000m/sとい
う理論値(和佐ほか編”表面波デバイスとその応用”日
刊工業新聞社刊、p96, (1978)、Foster
らによりLiNbO3 / 溶融石英でVs=3500m/
s(N. F. Foster,J.Appl.hys.,
40,p420(1969))などの値が報告されてい
るが、いずれもLiNbO3 のバルク単結晶のVsを越
える物ではない。
F 0 = Vs / λ (1) (λ; wavelength of surface acoustic wave) Generally, it is relatively easy to increase λ, but it is extremely difficult to reduce λ. Therefore, it can be said that a material having a larger Vs is more advantageous for higher frequencies and can be a filter having a wide frequency range and is an excellent material. It is known that the bulk single crystal of LiNbO 3 has Vs = 3400 to 4000 m / s. As for the LiNbO 3 thin film, the theoretical value of Vs = 4000 m / s in LiNbO 3 / Al 2 O 3 by Wasa et al.
And LiNbO 3 / fused quartz Vs = 3500 m /
s (NF Foster, J. Appl. hys.,
40, p420 (1969)) and the like, but none of them exceeds Vs of the bulk single crystal of LiNbO 3 .

【0005】[0005]

【発明が解決しようとする課題】LiNbO3 のバルク
単結晶のVsを越える材料があれば極めて有用なSAW
デバイス用材料となると考えられる。
An extremely useful SAW if there is a material exceeding Vs of the bulk single crystal of LiNbO 3
It is considered to be a material for devices.

【0006】[0006]

【課題を解決するための手段】本発明はサファイア基板
上の結晶軸が一方向に配向したLiNbO3 薄膜上で伝
搬速度が5000〜6600m/sである弾性表面波、
またはそれらの高調波を用いる事を特徴とする弾性表面
波デバイス、特に基板がサファイア基板C面である事を
特徴とした弾性表面波デバイスに関する発明である。
The present invention relates to a surface acoustic wave having a propagation velocity of 5000 to 6600 m / s on a LiNbO 3 thin film in which crystal axes on a sapphire substrate are oriented in one direction,
Further, the present invention relates to a surface acoustic wave device characterized by using a harmonic wave thereof, particularly a surface acoustic wave device characterized in that the substrate is a sapphire substrate C surface.

【0007】発明者らが鋭意検討を進めた結果、結晶配
向性が良く、鉄などの不純物を含まないLiNbO3
膜を基板上に成膜すれば、LiNbO3 のバルク単結晶
のVsを越えるVsを持つLiNbO3 薄膜が得られる
事を見いだした。ここで用いるLiNbO3 薄膜はいか
なる成膜法により成膜した膜でも良いが、特に本発明に
達し易い合成法の一例を以下に記する。成膜方法にはレ
ーザーアブレーション法を採用し、レーザーはエキシマ
レーザー(ArF193nm)を用い、レーザー周波数
は5〜100Hz、レーザー出力は80から800mJ
とする。ターゲットにはNb2 5 及びLi2 CO5
原料とする焼結体(サイズ15mmΦ×1〜5mmt
を用い、ターゲットと基板間距離を1〜5cmとした。
酸素ガス雰囲気で、圧力範囲は0.0001〜0.00
3torrとし、基板温度は500〜850℃とした。
圧力範囲が0.0001〜0.003torrで合成し
た膜は着色する傾向にあるが、その場合には成膜後ただ
ちに600〜850℃で酸素ガス雰囲気(1torr以
上)で5分以上アニール処理を行えば無色の膜が得られ
るようである。また、これらの処理は膜の結晶性の向上
にも効果を示すようである。
As a result of intensive studies by the inventors, when a LiNbO 3 thin film having a good crystal orientation and containing no impurities such as iron is formed on a substrate, Vs exceeding the Vs of a bulk single crystal of LiNbO 3 is obtained. It was found that a LiNbO 3 thin film having The LiNbO 3 thin film used here may be a film formed by any film forming method, but an example of a synthesis method that is particularly easy to reach the present invention will be described below. A laser ablation method is adopted as a film forming method, an excimer laser (ArF 193 nm) is used as a laser, a laser frequency is 5 to 100 Hz, and a laser output is 80 to 800 mJ.
And The target is a sintered body made of Nb 2 O 5 and Li 2 CO 5 as raw materials (size 15 mmΦ × 1 to 5 mm t )
Was used, and the distance between the target and the substrate was set to 1 to 5 cm.
Oxygen gas atmosphere, pressure range 0.0001-0.00
The substrate temperature was 500 to 850 ° C.
The film synthesized in the pressure range of 0.0001 to 0.003 torr tends to be colored, but in that case, the film is annealed immediately at 600 to 850 ° C. in an oxygen gas atmosphere (1 torr or more) for 5 minutes or more. Then, it seems that a colorless film can be obtained. Also, these treatments seem to be effective in improving the crystallinity of the film.

【0008】[0008]

【実施例】次に、実施例により本発明をさらに詳細に説
明する。LiNbO3 薄膜の合成はレーザーアブレーシ
ョン法によって行った。図1に装置の概要を示す。焼結
体ターゲットにレーザー光を照射し酸素ガス雰囲気で基
板に成膜させた。成膜後すぐに酸素ガス雰囲気でアニー
ル処理を行う事により膜の結晶性を向上させた。以下合
成にあたって使用した条件を列記する。
EXAMPLES Next, the present invention will be described in more detail by way of examples. The LiNbO 3 thin film was synthesized by the laser ablation method. FIG. 1 shows an outline of the device. The sintered target was irradiated with laser light to form a film on the substrate in an oxygen gas atmosphere. The crystallinity of the film was improved by performing annealing treatment in an oxygen gas atmosphere immediately after the film formation. The conditions used in the synthesis are listed below.

【0009】 合成条件 単結晶基板 サファイアC面 基板温度 750℃ 導入ガス 酸素 反応圧力 0.001torr ターゲットのLi/Nb 2.0 レーザー出力 120mJ レーザー周波数 20Hz 成膜時間 20から180分 アニール条件 温度 750℃ 圧力 1.5torr 時間 15分 以上の条件を用い、LiNbO3 薄膜の合成を行った。
合成した膜にフォトリソグラフィープロセスによりID
Tを構成した。IDTは4種類有り、すべて正規型電極
で、電極指の対数は入力・出力ともに64対とし、波長
(λ)は6μm、8μm、10μm、12μmの4通り
とした。これらのIDTにより各サンプルのSAWフィ
ルター特性を評価し、Vsを求めた。その結果を表1に
まとめた。 結晶性の評価はX線ロッキングカーブの半
値幅をもって行っている。その際、発散スリット及び散
乱スリットには1/2°のものを用い、受光スリットに
は0.15mmのものを用いた。
Synthesis conditions Single crystal substrate Sapphire C surface Substrate temperature 750 ° C. Introduced gas Oxygen reaction pressure 0.001 torr Target Li / Nb 2.0 Laser output 120 mJ Laser frequency 20 Hz Film formation time 20 to 180 minutes Annealing condition Temperature 750 ° C. Pressure A LiNbO 3 thin film was synthesized under the condition of 1.5 torr time of 15 minutes or more.
ID on the synthesized film by photolithography process
Configured T. There are four types of IDTs, all of which are normal type electrodes, and the number of pairs of electrode fingers is 64 pairs for both input and output, and the wavelength (λ) is 4 μm, 8 μm, 10 μm, and 12 μm. The SAW filter characteristics of each sample were evaluated by these IDTs, and Vs was obtained. The results are summarized in Table 1. The crystallinity is evaluated with the half width of the X-ray rocking curve. At that time, divergence slits and scattering slits having 1/2 ° were used, and light receiving slits having 0.15 mm were used.

【0010】いずれのサンプルにおいてもモードが異な
るふたつの基本波が得られ、SAW速度Vs1及びVs
2はいずれも、5000m/ s以上であり、LiNbO
3 のバルク単結晶の4000m/sより大きかった。ま
た、Vs1及びVs2の奇数倍の速度を持つ高調波(特
に3次高調波)も同時に得られた。図2に表1のNo.
1(SAWの波長6μm)におけるSAWフィルター特
性を示す。
In each sample, two fundamental waves having different modes were obtained, and SAW velocities Vs1 and Vs were obtained.
2 is 5000 m / s or more, and LiNbO
It was larger than 4000 m / s of 3 bulk single crystals. In addition, harmonics (especially third-order harmonics) having a speed that is an odd multiple of Vs1 and Vs2 were obtained at the same time. No. 1 in Table 1 is shown in FIG.
1 shows the SAW filter characteristics at 1 (SAW wavelength 6 μm).

【0011】[0011]

【比較例】比較例として、LiNbO3 のバルク単結晶
を用い実施例と同様のIDTを形成しフィルター特性を
測定した。SAW速度は変化する事無く一定で3800
m/sでありLiNbO3 薄膜より常に遅かった。実施
例と同じ波長のSAW(6μm)を用いSAWフィルタ
ーを設計すると図3のような結果が得られた。図2と比
べるとLiNbO3 薄膜の方がSAW速度も速く高周波
にも適した良いSAW材料である事がわかる。
Comparative Example As a comparative example, a bulk single crystal of LiNbO 3 was used to form an IDT similar to that of the example and the filter characteristics were measured. SAW speed stays unchanged at 3800
m / s, which was always slower than the LiNbO 3 thin film. When a SAW filter was designed using SAW (6 μm) having the same wavelength as that of the example, the results shown in FIG. 3 were obtained. It can be seen from comparison with FIG. 2 that the LiNbO 3 thin film is a good SAW material having a high SAW speed and suitable for high frequencies.

【0012】[0012]

【表1】 [Table 1]

【0013】[0013]

【発明の効果】本発明によるSAW速度の速いLiNb
3 薄膜をSAWデバイスに用いる事により、バルク単
結晶を用いた場合より極めて周波数の広い範囲(特に高
周波)で使用可能なSAWデバイスを得ることができ
る。
EFFECT OF THE INVENTION LiNb having a high SAW speed according to the present invention
By using the O 3 thin film for the SAW device, it is possible to obtain a SAW device that can be used in an extremely wide range of frequencies (particularly high frequencies) as compared with the case of using a bulk single crystal.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に用いる合成装置の概略図である。FIG. 1 is a schematic view of a synthesizer used in the present invention.

【図2】LiNbO3薄膜のフィルター特性FIG. 2 Filter characteristics of LiNbO 3 thin film

【図3】LiNbO3 のバルク単結晶のフィルター特性FIG. 3 Filter characteristics of bulk single crystal of LiNbO 3

【符号の説明】[Explanation of symbols]

1 ArFエキシマレーザー 2 レンズ 3 ウインドウ 4 ターゲット 5 基板 6 膜厚測定装置 7 ガス導入口 1 ArF excimer laser 2 lens 3 window 4 target 5 substrate 6 film thickness measuring device 7 gas inlet

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 サファイア基板上の結晶軸が一方向に配
向したLiNbO3薄膜上で伝搬速度が5000〜66
00m/sである弾性表面波、またはそれらの高調波を
用いる事を特徴する弾性表面波デバイス。
1. A propagation velocity of 5000-66 on a LiNbO 3 thin film in which crystal axes are oriented in one direction on a sapphire substrate.
A surface acoustic wave device characterized by using a surface acoustic wave of 00 m / s or harmonics thereof.
JP3246396A 1991-09-26 1991-09-26 Thin film type saw device Withdrawn JPH0590892A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3246396A JPH0590892A (en) 1991-09-26 1991-09-26 Thin film type saw device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3246396A JPH0590892A (en) 1991-09-26 1991-09-26 Thin film type saw device

Publications (1)

Publication Number Publication Date
JPH0590892A true JPH0590892A (en) 1993-04-09

Family

ID=17147896

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3246396A Withdrawn JPH0590892A (en) 1991-09-26 1991-09-26 Thin film type saw device

Country Status (1)

Country Link
JP (1) JPH0590892A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998056109A1 (en) * 1997-06-02 1998-12-10 Asahi Kasei Kogyo Kabushiki Kaisha Elastic surface-wave device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998056109A1 (en) * 1997-06-02 1998-12-10 Asahi Kasei Kogyo Kabushiki Kaisha Elastic surface-wave device
US6259186B1 (en) 1997-06-02 2001-07-10 Asahi Kasei Kabushiki Kaisha Surface acoustic wave functional wave

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Effective date: 19981203