JPH0582243B2 - - Google Patents
Info
- Publication number
- JPH0582243B2 JPH0582243B2 JP62100507A JP10050787A JPH0582243B2 JP H0582243 B2 JPH0582243 B2 JP H0582243B2 JP 62100507 A JP62100507 A JP 62100507A JP 10050787 A JP10050787 A JP 10050787A JP H0582243 B2 JPH0582243 B2 JP H0582243B2
- Authority
- JP
- Japan
- Prior art keywords
- tank
- processing
- processing liquid
- ejector
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000007788 liquid Substances 0.000 claims description 43
- 238000000034 method Methods 0.000 claims description 10
- 238000001914 filtration Methods 0.000 claims description 5
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000428 dust Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Filtration Of Liquid (AREA)
- Weting (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62100507A JPS63264115A (ja) | 1987-04-22 | 1987-04-22 | 処理液循環濾過方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62100507A JPS63264115A (ja) | 1987-04-22 | 1987-04-22 | 処理液循環濾過方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63264115A JPS63264115A (ja) | 1988-11-01 |
| JPH0582243B2 true JPH0582243B2 (enrdf_load_stackoverflow) | 1993-11-18 |
Family
ID=14275860
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62100507A Granted JPS63264115A (ja) | 1987-04-22 | 1987-04-22 | 処理液循環濾過方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63264115A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11610789B2 (en) | 2020-03-05 | 2023-03-21 | Kioxia Corporation | Semiconductor manufacturing apparatus and method of manufacturing semiconductor device |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04321216A (ja) * | 1991-01-16 | 1992-11-11 | Nec Yamagata Ltd | スピンコータ |
-
1987
- 1987-04-22 JP JP62100507A patent/JPS63264115A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11610789B2 (en) | 2020-03-05 | 2023-03-21 | Kioxia Corporation | Semiconductor manufacturing apparatus and method of manufacturing semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63264115A (ja) | 1988-11-01 |
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