JPH058085A - Flux for soldering - Google Patents

Flux for soldering

Info

Publication number
JPH058085A
JPH058085A JP3312706A JP31270691A JPH058085A JP H058085 A JPH058085 A JP H058085A JP 3312706 A JP3312706 A JP 3312706A JP 31270691 A JP31270691 A JP 31270691A JP H058085 A JPH058085 A JP H058085A
Authority
JP
Japan
Prior art keywords
flux
soldering
acid
containing compound
modified amine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP3312706A
Other languages
Japanese (ja)
Inventor
Masanori Takemoto
雅宣 竹本
Tatsuji Onishi
辰司 大西
Masami Aihara
正巳 相原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Harima Chemical Inc
Denso Corp
Original Assignee
Harima Chemical Inc
NipponDenso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Harima Chemical Inc, NipponDenso Co Ltd filed Critical Harima Chemical Inc
Publication of JPH058085A publication Critical patent/JPH058085A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/36Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/36Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
    • B23K35/3612Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents
    • B23K35/3615N-compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/36Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
    • B23K35/3612Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents
    • B23K35/3613Polymers, e.g. resins

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To provide the flux for soldering having a good water washing property and excellent printability even when this flux is applied to solder cream. CONSTITUTION:This flux for soldering consists of at least one kind among a vinyl group-contg. compd., a carboxyl group-contg. compd. and an epoxy group-contg. compd. and a modified amine compd. obtd. by the reaction of an amine compd. having active hydrogen as a flux base resin.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、はんだ付け等に使用さ
れるフラックスに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flux used for soldering and the like.

【0002】[0002]

【従来の技術】従来のはんだ付け用フラックスとして
は、はんだ付け後残留フラックスを洗浄するための洗浄
溶剤にフロン等を用いている。
2. Description of the Related Art As a conventional soldering flux, CFC or the like is used as a cleaning solvent for cleaning residual flux after soldering.

【0003】しかし、近年、フロン等による環境破壊が
大きな問題となり、フロン対策が重要な課題となってい
る。そのため、このフロン対策の方法の1つとして、水
洗浄による残留フラックスの洗浄への移行が考えられ、
水溶性フラックスの検討が、近年行われてきている。
However, in recent years, environmental damage caused by CFCs has become a big problem, and CFC countermeasures have become an important issue. Therefore, as one of the countermeasures against this CFC, it is considered that the residual flux is washed by washing with water.
Studies on water-soluble flux have been made in recent years.

【0004】この水溶性フラックスとしては、塩化亜
鉛,塩酸等から成る無機塩系のもの、アミンのハロゲン
化水素酸塩とグリセリン・ポリエチレングリコール等か
ら成る有機塩系のものなどが使用されている。
As the water-soluble flux, there are used inorganic salt-based fluxes such as zinc chloride and hydrochloric acid, and organic salt-based fluxes such as amine hydrohalides and glycerin / polyethylene glycol.

【0005】しかしこれらのフラックスは、金属表面の
酸化膜の除去作用である活性が強すぎてしまい、洗浄を
完全にできない場合には、腐食を引き起こすという問題
が生じてしまったり、さらには、これらのフラックスを
ハンダクリームに適用した場合には、粘性に欠けて良好
な印刷ができないという問題が生じてしまうために、新
規な水溶性フラックスが望まれている。
However, these fluxes have too strong an activity of removing the oxide film on the metal surface, and when cleaning cannot be performed completely, they cause a problem of causing corrosion. When the flux No. 2 is applied to solder cream, there is a problem in that the viscosity is lacking and good printing cannot be performed, so a new water-soluble flux is desired.

【0006】[0006]

【発明が解決しようとする課題】そこで、本発明は水洗
浄性が良好で、例えハンダクリームに適用した場合にお
いても印刷性に優れたハンダ付け用フラックスを提供す
ることを目的とする。
SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a soldering flux which has good washing properties with water and has excellent printability even when applied to a solder cream.

【0007】[0007]

【課題を解決するための手段】本発明は、ベース樹脂と
して、変性アミン化合物を使用したハンダ付け用フラッ
クスを提供するものである。
SUMMARY OF THE INVENTION The present invention provides a soldering flux using a modified amine compound as a base resin.

【0008】即ち、本発明は、ビニル基含有化合物・カ
ルボキシル基含有化合物・エポキシ基含有化合物のうち
の少なくとも1種と、活性水素を有するアミン化合物の
反応により得られる変性アミン化合物をフラックスベー
ス樹脂として使用することを特徴とするハンダ付け用フ
ラックスから成る。
That is, the present invention uses a modified amine compound obtained by reacting at least one of a vinyl group-containing compound, a carboxyl group-containing compound and an epoxy group-containing compound with an amine compound having active hydrogen as a flux base resin. It consists of a soldering flux which is characterized by being used.

【0009】本発明における変性アミン化合物に用いら
れる活性水素を有するアミン化合物としては、nプロピ
ルアミン・nヘキシルアミン・エチレンジアミン・トリ
メチレンジアミン・ヘキサメチレンジアミン・ジエチレ
ントリアミン・トリエチレンテトラミン・テトラエチレ
ンペンタミン・ペンタエチレンヘキサミン・モノエタノ
ールアミン・ジエタノールアミン・ファニレンジアミン
・ジアミノジフェニルメタン等が挙げられる。
The amine compound having active hydrogen used for the modified amine compound in the present invention includes n-propylamine, n-hexylamine, ethylenediamine, trimethylenediamine, hexamethylenediamine, diethylenetriamine, triethylenetetramine, tetraethylenepentamine, Examples include pentaethylenehexamine, monoethanolamine, diethanolamine, phenylenediamine, diaminodiphenylmethane and the like.

【0010】本発明における変性アミン化合物に用いら
れるビニル基含有化合物としては、各種(メタ)アクリ
ル酸エステル・酢酸ビニル・ビニルピロリドン・スチレ
ン・(メタ)アクリルアミド等が挙げられる。
Examples of the vinyl group-containing compound used in the modified amine compound in the present invention include various (meth) acrylic acid esters, vinyl acetate, vinylpyrrolidone, styrene and (meth) acrylamide.

【0011】本発明における変性アミン化合物に用いら
れるカルボキシル基含有化合物としては、酢酸・安息香
酸・コハク酸・マレイン酸・アジピン酸・乳酸・ヒドロ
キシピバリン酸・ジメチロールプロピオン酸・クエン酸
・リンゴ酸・グリセリン酸等が挙げられる。
Examples of the carboxyl group-containing compound used in the modified amine compound in the present invention include acetic acid, benzoic acid, succinic acid, maleic acid, adipic acid, lactic acid, hydroxypivalic acid, dimethylolpropionic acid, citric acid, malic acid, Examples thereof include glyceric acid.

【0012】本発明における変性アミン化合物に用いら
れるエポキシ基含有化合物としては、メチルグリシジル
エーテル・ブチルグリシジルエーテル・フェニルグリシ
ジルエーテル・グリシドール・ポリエチレングリコール
ジグリシジルエーテル・ネオペンチルグリコールグリシ
ジルエーテル・トリメチロールプロパントグリシジルエ
ーテル・グリセリンポリグリシジルエーテル・ソルビト
ールポリグリシジルエーテル・ビスフェノール型エポキ
シ樹脂・ノボラックフェノール型エポキシ樹脂・バーサ
ティック酸グリシジルエステル・フタル酸ジグリシジル
エステル・スチレンオキサイドが挙げられる。
The epoxy group-containing compound used in the modified amine compound in the present invention includes methyl glycidyl ether / butyl glycidyl ether / phenyl glycidyl ether / glycidol / polyethylene glycol diglycidyl ether / neopentyl glycol glycidyl ether / trimethylolpropand glycidyl. Examples thereof include ether, glycerin polyglycidyl ether, sorbitol polyglycidyl ether, bisphenol type epoxy resin, novolac phenol type epoxy resin, versatic acid glycidyl ester, phthalic acid diglycidyl ester, and styrene oxide.

【0013】本発明において用いられる変性アミン化合
物は、上記活性水素含有アミン化合物と上記ビニル基含
有化合物との付加反応により、上記カルボキシル基含有
化合物との縮合反応により、上記エポキシ基含有化合物
との付加反応により、又はこれらを組み合わせた反応に
より、容易に合成される。この変性アミン化合物は、そ
れ自身アミン性の活性を有する化合物である。この変性
アミン化合物において、水洗浄性を向上させるために1
分子中に2ケ以上の水酸基等親水基を結合させることが
望ましい。又、クリ−ムハンダに適用する場合の印刷性
を向上させるために分子量200以上の粘稠体とするこ
とが好ましい。変性アミン化合物の変性は、上記以外の
変性を併用してもかまわない。 本発明のハンダ付け用
フラックス中には、活性剤として一般に用いられている
エチルアミン・ジエチルアミン・トリエチルアミン・ア
ニリン等のハロゲン化水素酸類,安息香酸・コハク酸・
マレイン酸・アジピン酸・乳酸・ヒドロキシピバリン酸
・ジメチロールプロピオン酸・クエン酸・リンゴ酸・グ
リセリン酸等の有機酸類、ジフェニルグアニジン・トリ
エタノールアミン等アミン類が使用できる。又、溶剤と
しては、イソプロピルアルコール・ブチルカルビトール
等のアルコール類、酢酸エチル等のエステル類、トルエ
ン等の炭化水素類、メチルエチルケトン等のケトン類が
使用できる。その他添加剤は、一般に用いられているも
のが使用できる。
The modified amine compound used in the present invention is added to the epoxy group-containing compound by the addition reaction between the active hydrogen-containing amine compound and the vinyl group-containing compound and the condensation reaction with the carboxyl group-containing compound. It is easily synthesized by a reaction or a combination of these. This modified amine compound is a compound which itself has amine activity. In order to improve the water washability of this modified amine compound, 1
It is desirable to bond two or more hydrophilic groups such as hydroxyl groups in the molecule. Further, in order to improve printability when applied to cream solder, it is preferable to use a viscous material having a molecular weight of 200 or more. The modified amine compound may be modified together with modifications other than the above. In the soldering flux of the present invention, hydrohalic acids such as ethylamine, diethylamine, triethylamine, and aniline, which are generally used as activators, benzoic acid, succinic acid,
Organic acids such as maleic acid, adipic acid, lactic acid, hydroxypivalic acid, dimethylolpropionic acid, citric acid, malic acid and glyceric acid, and amines such as diphenylguanidine and triethanolamine can be used. As the solvent, alcohols such as isopropyl alcohol / butyl carbitol, esters such as ethyl acetate, hydrocarbons such as toluene, and ketones such as methyl ethyl ketone can be used. As the other additives, those generally used can be used.

【0014】また、ビニル基含有化合物,カルボキシル
基含有化合物およびエポキシ基含有化合物のうちの少な
くとも1種に対する、活性水素を有するアミン化合物の
割合が当量比に換算して、0.03〜1.0が好まし
い。
Further, the ratio of the amine compound having active hydrogen to at least one of the vinyl group-containing compound, the carboxyl group-containing compound and the epoxy group-containing compound is 0.03 to 1.0 in terms of an equivalent ratio. Is preferred.

【0015】これは、当量比が0.03より小の場合で
は、十分にアミンが変性することができず粘稠性及び水
洗浄性が不足する。また、1.0より大の場合では、ア
ミンの活性水素がなく、これ以上の反応を生じさせるこ
とができなくなるためである。
This is because when the equivalent ratio is less than 0.03, the amine cannot be sufficiently modified and the viscous property and water washability are insufficient. On the other hand, when it is larger than 1.0, there is no active hydrogen of the amine, and further reaction cannot be caused.

【0016】さらに、はんだ付け用フラックス中に本発
明のフラックスベース樹脂が1〜80重量%含有してい
ることが好ましい。これは、変性アミン化合物が1重量
%より小の場合には、粘稠性及び水洗浄性が不足し、8
0重量%より大の場合では、粘稠しすぎてフラックスの
作成が困難となってしまうのである。
Further, it is preferable that the flux base resin of the present invention is contained in the soldering flux in an amount of 1 to 80% by weight. This is because when the modified amine compound is less than 1% by weight, the viscous property and water washability are insufficient, and
If it is more than 0% by weight, it becomes too viscous and it becomes difficult to prepare a flux.

【0017】[0017]

【作用】本発明により、ベース樹脂として、水溶性付与
が容易で、ハンダ付け加熱後も良好な水溶性を保持した
変性アミン化合物を採用したので、フラックス自体の水
洗浄性をも向上させることができる。 また、変性アミ
ン化合物は、高分子量化が容易であるため、粘稠性を高
めることができる。そのため、本発明のフラックスを例
えばクリームハンダに適用した場合においても、十分な
粘稠性を有するため、良好な印刷性を得ることができ
る。
According to the present invention, since a modified amine compound that easily imparts water solubility and retains good water solubility even after heating by soldering is used as the base resin, it is possible to improve the water washability of the flux itself. it can. In addition, since the modified amine compound easily has a high molecular weight, it is possible to increase the viscosity. Therefore, even when the flux of the present invention is applied to, for example, cream solder, it has sufficient viscous properties, and good printability can be obtained.

【0018】[0018]

【発明の効果】本発明のフラックスを採用することによ
り、水洗浄性が優れているとともに、ハンダクリームに
適用した場合においても印刷性に優れたはんだ付けを可
能とすることができた。
By adopting the flux of the present invention, it is possible to perform soldering which is excellent in water washability and is also excellent in printability when applied to a solder cream.

【0019】[0019]

【実施例】水抜き管を備えた1l4ツ口フラスコに活性
水素を有するアミン化合物であるトリエチレンテトラミ
ン215gを仕込み、窒素雰囲気下攪拌加熱し100℃
に昇温した。次にカルボキシル基含有化合物であるジメ
チロールプロピン酸198g及びコハク酸87gを発熱
に注意しながら、分割して仕込む。加熱して反応水を抜
きながら220℃まで昇温して保持する。3時間後酸価
が1以下となったので反応を終えて、冷却してブチルカ
ルビトール298gを仕込んで希釈した。こうして固形
分60%の粘稠なフラックスのベース樹脂である変性ア
ミン溶液を得た。
[Examples] 215 g of triethylenetetramine, which is an amine compound having active hydrogen, was charged in a 1-necked four-necked flask equipped with a drainage tube, and the mixture was heated with stirring under a nitrogen atmosphere at 100 ° C.
The temperature was raised to. Next, 198 g of dimethylolpropynoic acid, which is a compound containing a carboxyl group, and 87 g of succinic acid are charged separately while paying attention to heat generation. While heating and removing the reaction water, the temperature is raised to 220 ° C. and maintained. After 3 hours, the acid value became 1 or less, so the reaction was terminated, the reaction mixture was cooled, and 298 g of butyl carbitol was charged and diluted. Thus, a modified amine solution which is a base resin of a viscous flux having a solid content of 60% was obtained.

【0020】この変性アミン溶液を55g・ジメチロー
ルプロピオン酸を10g・S−40(日本油脂(株)ノ
ニオン界面活性剤)を15g・ブチルカルビトールを2
0g4ツ口フラスコに仕込んで、140℃に加熱攪拌し
溶解して第1実施例のフラックスを作製した。
55 g of the modified amine solution, 10 g of dimethylolpropionic acid, 15 g of S-40 (Nonionic surfactant manufactured by NOF CORPORATION), and 2 g of butyl carbitol were added.
A 0 g 4-necked flask was charged, heated and stirred at 140 ° C. and dissolved to prepare the flux of the first example.

【0021】その後、このフラックス10.0wt%とハ
ンダ粉として63Sn−37Pbで粒径45〜63μm
のものを攪拌混合させることにより、ハンダクリームを
得た。そして、このハンダクリームにおける以下の試験
を行なった。
After that, 10.0 wt% of this flux and 63Sn-37Pb as a solder powder were used, and the particle size was 45 to 63 μm.
By mixing the above with stirring, a solder cream was obtained. Then, the following test was performed on this solder cream.

【0022】印刷性の評価として、第1実施例のハンダ
クリームを厚さ0.2mmのメタルマスクにてガラスエポキ
シ基板(150×160×1.6mm)に50枚連続印刷
した時のローリング性及び版抜け性を観察した。
As an evaluation of the printability, the rolling property and the rolling property when 50 sheets of the solder cream of the first embodiment were continuously printed on a glass epoxy substrate (150 × 160 × 1.6 mm) with a metal mask having a thickness of 0.2 mm were used. The bleeding property was observed.

【0023】ハンダボールの有無として、第1実施例の
ハンダクリームを0.8mmピッチのQFPに、厚さ0.2mm
のメタルマスクで印刷し、リフロー(IRリフローとし
て150〜160℃の加熱を60秒間行なった後、20
0〜230℃の加熱を30秒間行なうこと)後の10パ
ッド中のボール数を観察した。
As for the presence or absence of the solder balls, the solder cream of the first embodiment is applied to the QFP of 0.8 mm pitch and the thickness of 0.2 mm.
After printing with the metal mask of No. 2 and performing reflow (heating at 150 to 160 ° C. for 60 seconds as IR reflow, 20
The number of balls in 10 pads after heating (0 to 230 ° C. for 30 seconds) was observed.

【0024】水洗浄性として、第1実施例のクリームは
んだにより、はんだ付けした基板を蒸留水を用いて、6
0℃温水中に60秒浸漬後室温の水に30秒浸漬して洗
浄した後の状態を顕微鏡による目視によって観察した。
As the water-cleaning property, the board soldered with the cream solder of the first embodiment was distilled with distilled water.
The state after being immersed in 0 ° C. warm water for 60 seconds and then immersed in room temperature water for 30 seconds and washed was visually observed with a microscope.

【0025】絶縁抵抗性として、JIS2型くし型基板
を用いて、第1実施例のハンダクリームを塗布し上記の
リフロー後、水洗浄して試験片とする。その後、この試
験片を、40℃,温度95%の雰囲気中で20Vを10
0時間印加後、同様の雰囲気中で100Vを印加し、絶
縁抵抗を測定した。
As the insulation resistance, a JIS2 type comb substrate is used to apply the solder cream of the first embodiment, and after the reflow, the test piece is washed with water. After that, this test piece was subjected to 10 V at 20 V in an atmosphere of 40 ° C. and 95% temperature.
After applying for 0 hours, 100 V was applied in the same atmosphere, and the insulation resistance was measured.

【0026】上記の試験の結果を第1表に記載した。 (第2実施例)1l4ツ口フラスコに溶剤であるブチル
カルビトール333g・活性水素を有するアミン化合物
であるトリエチレンテトラミン181g・ハイドロキノ
ン0.5gを仕込み、空気雰囲気下攪拌加熱し100℃に
昇温した。100〜120℃に保持し発熱に注意しなが
ら、ビニル基含有化合物であるヒドロキシエチルアクリ
レート144gを1時間で滴下し、続いてビニル基含有
化合物であるアクリルアミド176gを1時間で分割添
加した。同温度に5時間保持して反応を終えて冷却し
た。こうして固形分60%の粘稠なフラックスのベース
樹脂である変性アミン溶液を得た。
The results of the above tests are listed in Table 1. (Second Example) 333 g of butyl carbitol, which is a solvent, 181 g of triethylenetetramine, which is an amine compound having active hydrogen, and 0.5 g of hydroquinone, are charged into a 1 4-necked flask, and the mixture is heated under stirring in an air atmosphere to 100 ° C. did. While maintaining the temperature at 100 to 120 ° C. and paying attention to heat generation, 144 g of hydroxyethyl acrylate, which is a vinyl group-containing compound, was added dropwise over 1 hour, and subsequently, 176 g of acrylamide, which is a vinyl group containing compound, was added portionwise over 1 hour. The temperature was maintained at the same temperature for 5 hours to complete the reaction, followed by cooling. Thus, a modified amine solution which is a base resin of a viscous flux having a solid content of 60% was obtained.

【0027】その後、この変性アミン溶液を55g・ジ
メチロールプロピオン酸を10g・S−40を15gブ
チルカルビトールを20g4ツ口フラスコに仕込んで、
140℃に加熱攪拌し溶解して第2実施例のフラックス
を作製した。
Thereafter, 55 g of this modified amine solution, 10 g of dimethylolpropionic acid, 15 g of S-40 and 20 g of butyl carbitol were charged into a 4-necked flask.
The flux of the second embodiment was prepared by heating and stirring at 140 ° C. and melting.

【0028】この第2実施例のフラックスを第1実施例
と同様の方法にて第2実施例のクリームハンダを得た
後、このクリームハンダのはんだ付け性について、第1
実施例と同様の試験を行ない、その結果を第1表に示し
た。
After obtaining the cream solder of the second embodiment using the flux of the second embodiment in the same manner as in the first embodiment, the solderability of this cream solder will be described first.
The same test as in the example was conducted, and the results are shown in Table 1.

【0029】(第3実施例)1l4ツ口フラスコに活性
水素を有するアミン化合物であるブチルカルビトール3
33g・トリエチレンテトラミン198gを仕込み、窒
素雰囲気下攪拌加熱し100℃に昇温した。100〜1
20℃に保持し発熱に注意しながら、エポキシ基含有化
合物であるグリシドール302gを2時間で滴下した。
同温度に2時間保持して反応を終えて冷却した。こうし
て固形分60%の粘稠なフラックスのベース樹脂である
変性アミン溶液を得た。 この変性アミン溶液を60g
・ジメチロールプロピオン酸を10g・S−40を15
g・ブチルカルビトールを15g4ツ口フラスコに仕込
んで、140℃に加熱攪拌し溶解して第3実施例のフラ
ックスを作製した。
(Third Example) Butyl carbitol 3 which is an amine compound having active hydrogen in an 11-necked four-necked flask.
33 g of triethylenetetramine (198 g) was charged, and the mixture was heated with stirring under a nitrogen atmosphere to 100 ° C. 100-1
While maintaining the temperature at 20 ° C. and paying attention to heat generation, 302 g of glycidol, which is an epoxy group-containing compound, was added dropwise over 2 hours.
The temperature was maintained for 2 hours, the reaction was completed, and the mixture was cooled. Thus, a modified amine solution which is a base resin of a viscous flux having a solid content of 60% was obtained. 60 g of this modified amine solution
・ 10g of dimethylolpropionic acid ・ 15 of S-40
15 g of g-butyl carbitol was placed in a four-necked flask, heated and stirred at 140 ° C., and dissolved to prepare a flux of the third example.

【0030】この第3実施例のフラックスを第1実施例
と同様の方法にて、第3実施例のクリームハンダを得た
後、このクリームハンダのハンダ付け性について、第1
実施例と同様の試験を行ない、その結果を第1表に示し
た。
After obtaining the cream solder of the third embodiment by using the flux of the third embodiment in the same manner as in the first embodiment, the solderability of this cream solder will be described as follows.
The same test as in the example was conducted, and the results are shown in Table 1.

【0031】(第4実施例)1l4ツ口フラスコに溶剤
であるブチルカルビトール333gと活性水素を有する
アミン化合物であるモノエタノールアミン34g・ジエ
タノールアミン118gを仕込み、窒素雰囲気下攪拌加
熱し100℃に昇温した。100〜120℃に保持し発
熱に注意しながら、エポキシ基含有物であるグリセリン
ジグリシジルエーテル348gを2時間で滴下した。同
温度に3時間保持して反応を終えて冷却した。こうして
固形分60%の粘稠なフラックスのベース樹脂である変
性アミン溶液を得た。
(Fourth Example) 333 g of butyl carbitol which is a solvent and 34 g of monoethanolamine and 118 g of diethanolamine which are amine compounds having active hydrogen are charged into a 11-necked four-necked flask and heated to 100 ° C. with stirring under a nitrogen atmosphere. Warmed. While maintaining the temperature at 100 to 120 ° C. and paying attention to heat generation, 348 g of glycerin diglycidyl ether containing an epoxy group was added dropwise over 2 hours. The temperature was maintained for 3 hours, the reaction was completed, and the mixture was cooled. Thus, a modified amine solution which is a base resin of a viscous flux having a solid content of 60% was obtained.

【0032】この変性アミン溶液を55g・ジメチロー
ルプロピオン酸を10g・S−40を15g・ブチルカ
ルビトールを20g4ツ口フラスコに仕込んで、140
℃に加熱攪拌し溶解して第4実施例のフラックスを作製
した。
55 g of this modified amine solution, 10 g of dimethylolpropionic acid, 15 g of S-40, and 20 g of butyl carbitol were charged into a four-necked flask, and 140
The flux of the fourth embodiment was produced by heating and stirring at 0 ° C. and melting.

【0033】この第4実施例のフラックスを第1実施例
と同様の方法にて、第4実施例のクリームハンダを得た
後、このクリームハンダのはんだ付け性について、第1
実施例と同様の試験を行ない、その結果を第1表に示し
た。
After obtaining the cream solder of the fourth embodiment using the flux of the fourth embodiment in the same manner as in the first embodiment, the solderability of the cream solder will be described as follows.
The same test as in the example was conducted, and the results are shown in Table 1.

【0034】(第1比較例)変性アミンの代わりに、変
性アミンの原料として使用したトリエチレンテトラミン
を用いた。トリエチレンテトラミンを75g・ジメチロ
ールプロピオン酸を10g・S−40を15g4ツ口フ
ラスコに仕込んで、140℃に加熱攪拌し溶解して第1
比較例のフラックスを作製した。
(First Comparative Example) Instead of the modified amine, triethylenetetramine used as a raw material of the modified amine was used. 75 g of triethylenetetramine, 10 g of dimethylolpropionic acid, and 15 g of S-40 were charged into a four-necked flask and heated to 140 ° C. with stirring to dissolve the mixture.
The flux of the comparative example was produced.

【0035】この第1比較例のフラックスを第1実施例
と同様の方法にて、第1比較例のクリームハンダを得た
後、このクリームハンダのはんだ付け性について、第1
実施例と同様の試験を行ない、その結果を第1表に示し
た。
The flux of the first comparative example was obtained in the same manner as in the first example to obtain the cream solder of the first comparative example.
The same test as in the example was conducted, and the results are shown in Table 1.

【0036】(第2比較例)変性アミンの代わりに、ポ
リエチレングリコール#600を用いた。ポリエチレン
グリコール#600を75g・ジメチロールプロピオン
酸を10g・S−40を15g4ツ口フラスコに仕込ん
で、140℃に加熱攪拌し溶解して第2比較例のフラッ
クスを作製した。
(Second Comparative Example) Polyethylene glycol # 600 was used in place of the modified amine. 75 g of polyethylene glycol # 600, 10 g of dimethylolpropionic acid, and 15 g of S-40 were charged in a four-necked flask, and heated and stirred at 140 ° C. to dissolve to prepare a flux of the second comparative example.

【0037】この第2比較例のフラックスを第1実施例
と同様の方法にて、第2比較例のクリームハンダを得た
後、このクリームハンダのはんだ付け性について、第1
実施例と同様の試験を行ない、その結果を第1表に示し
た。
The flux of the second comparative example was obtained in the same manner as in the first example to obtain the cream solder of the second comparative example.
The same test as in the example was conducted, and the results are shown in Table 1.

【0038】[0038]

【表1】 [Table 1]

【0039】以上のように、本発明の変性アミン化合物
をベース樹脂とするフラックスを用いると、良好な印刷
性及び洗浄性を発揮することができ、環境破壊を引き起
こしているフロン等を使用しないで、信頼性の高いハン
ダ付けが可能となる。
As described above, when the flux containing the modified amine compound of the present invention as the base resin is used, good printability and washability can be exhibited, and the use of CFCs or the like which cause environmental damage is not required. It enables highly reliable soldering.

【0040】前記実施例では、本発明のフラックスのベ
ース樹脂よりハンダクリームを得たが、本発明のベース
樹脂はハンダクリーム以外の他のはんだにも適応が可能
であり、例えは、フローソルダーのポストフラックスに
も適用可能である。
In the above embodiment, the solder cream was obtained from the base resin of the flux of the present invention. However, the base resin of the present invention can be applied to other solders other than the solder cream. It can also be applied to post flux.

【0041】なお、本発明のフラックスは、変性アミン
化合物の組成を選択することにより、水洗浄以外に各種
洗浄剤に適応することが可能である。
The flux of the present invention can be applied to various cleaning agents other than water cleaning by selecting the composition of the modified amine compound.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 相原 正巳 兵庫県加古川市野口町水足671番地の4 ハリマ化成株式会社内   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Masami Aihara             4 No. 671 Mizusui, Noguchi Town, Kakogawa City, Hyogo Prefecture             Harima Kasei Co., Ltd.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 ビニル基含有化合物,カルボキシル基含
有化合物およびエポキシ基含有化合物のうちの少なくと
も1種と、活性水素を有するアミン化合物の反応により
得られる変性アミン化合物をフラックスベース樹脂とす
ることを特徴とするはんだ付け用フラックス。
1. A flux base resin comprising a modified amine compound obtained by reacting at least one of a vinyl group-containing compound, a carboxyl group-containing compound and an epoxy group-containing compound with an amine compound having active hydrogen. Flux for soldering.
【請求項2】 ビニル基含有化合物,カルボキシル基含
有化合物およびエポキシ基含有化合物のうちの少なくと
も1種に対する、活性水素を有するアミン化合物の割合
が当量比に換算して、0.03〜1.0で反応させるこ
とによって得られる変性アミン化合物をフラックスベー
ス樹脂とすることを特徴とする請求項1記載のはんだ付
け用フラックス。
2. The ratio of the amine compound having active hydrogen to at least one of the vinyl group-containing compound, the carboxyl group-containing compound and the epoxy group-containing compound is 0.03 to 1.0 in terms of an equivalent ratio. The flux for soldering according to claim 1, wherein the modified amine compound obtained by the reaction in (1) is used as a flux base resin.
【請求項3】 前記フラックスベース樹脂が1〜80重
量%含有していることを特徴とする請求項1記載のはん
だ付け用フラックス。
3. The soldering flux according to claim 1, wherein the flux base resin contains 1 to 80% by weight.
JP3312706A 1990-11-30 1991-11-27 Flux for soldering Withdrawn JPH058085A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP33718390 1990-11-30
JP2-337183 1990-11-30

Publications (1)

Publication Number Publication Date
JPH058085A true JPH058085A (en) 1993-01-19

Family

ID=18306233

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3312706A Withdrawn JPH058085A (en) 1990-11-30 1991-11-27 Flux for soldering

Country Status (4)

Country Link
US (1) US5211763A (en)
EP (1) EP0488398A3 (en)
JP (1) JPH058085A (en)
KR (1) KR100201769B1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000061689A (en) * 1998-08-27 2000-02-29 Denso Corp Solder paste, soldering method, and surface-mounting type electronic device
US8900376B2 (en) 2004-07-21 2014-12-02 Nissan Chemical Industries, Ltd. Heat-resistant water-soluble flux composition for soldering
JP2015104731A (en) * 2013-11-28 2015-06-08 株式会社日本スペリア社 Soldering flux

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5296046A (en) * 1993-08-16 1994-03-22 Motorola, Inc. Subliming solder flux composition
KR100254927B1 (en) * 1994-12-07 2000-05-01 오까베 히로시 Flux for soldering, soldering paste and soldering method
JP3104606B2 (en) 1995-03-24 2000-10-30 株式会社デンソー Method of connecting substrate to connected material, connection structure thereof, and auxiliary material for connection
EP0831981B1 (en) * 1995-05-24 2007-03-14 Fry's Metals Inc. Epoxy-based, voc-free soldering flux
US5851311A (en) * 1996-03-29 1998-12-22 Sophia Systems Co., Ltd. Polymerizable flux composition for encapsulating the solder in situ
US6059894A (en) * 1998-04-08 2000-05-09 Hewlett-Packard Company High temperature flip chip joining flux that obviates the cleaning process
CN1153647C (en) * 1998-07-02 2004-06-16 松下电器产业株式会社 Solder powder and method for preparing same and solder paste
US6544842B1 (en) * 1999-05-01 2003-04-08 Micron Technology, Inc. Method of forming hemisphere grained silicon on a template on a semiconductor work object
JP3649087B2 (en) 1999-07-28 2005-05-18 株式会社デンソー Adhesive method and adhesive structure for thermoplastic resin material
TW527253B (en) * 1999-10-05 2003-04-11 Tdk Corp Soldering flux, soldering paste and soldering process
US6854633B1 (en) 2002-02-05 2005-02-15 Micron Technology, Inc. System with polymer masking flux for fabricating external contacts on semiconductor components
US6887319B2 (en) * 2002-04-16 2005-05-03 Senju Metal Industry Co., Ltd. Residue-free solder paste
US20030221748A1 (en) * 2002-05-30 2003-12-04 Fry's Metals, Inc. Solder paste flux system
WO2005118213A2 (en) * 2004-05-28 2005-12-15 P. Kay Metal, Inc. Solder paste and process
US20070284412A1 (en) * 2006-05-31 2007-12-13 Prakash Anna M Solder flux composition
US7767032B2 (en) 2006-06-30 2010-08-03 W.C. Heraeus Holding GmbH No-clean low-residue solder paste for semiconductor device applications
KR101397891B1 (en) * 2007-10-03 2014-05-20 히타치가세이가부시끼가이샤 Adhesive composition, electronic component-mounted substrate using the adhesive composition, and semiconductor device
US7956114B2 (en) * 2009-03-09 2011-06-07 Raytheon Company Water immiscible rosin mildly activated flux
US8887981B2 (en) 2013-03-15 2014-11-18 Raytheon Company Temporary adhesive for component bonding
WO2014171747A1 (en) * 2013-04-16 2014-10-23 씨제이제일제당(주) Microorganism having l-tryptophan productivity and method for production of l-tryptophan using same
CN104148826A (en) * 2014-08-13 2014-11-19 东莞市宝拓来金属有限公司 Halogen-free solder tin wire and scaling powder thereof

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2155307A (en) * 1935-11-02 1939-04-18 Kuppers Metallwerk Kom Ges Bon Soldering agent
GB911415A (en) * 1962-04-29 1962-11-28 Fry S Metal Foundries Ltd Improvements in solder wire
BE640425A (en) * 1962-12-07
US3171734A (en) * 1963-09-24 1965-03-02 Powder Melting Corp Brazing compositions having polyvinyl alcohol as a binder
US3697333A (en) * 1968-05-02 1972-10-10 Albert Hoeffleur Welding paste for resistance welding copper parts
US3791027A (en) * 1971-06-30 1974-02-12 Ibm Soldering method
US4077815A (en) * 1976-12-20 1978-03-07 International Business Machines Corporation Water soluble flux
US4360392A (en) * 1980-05-29 1982-11-23 International Standard Electric Corporation Solder flux composition
US4428780A (en) * 1983-02-07 1984-01-31 Lake Chemical Co. Solutions for use in bonding plates of storage batteries to connecting systems
US4988395A (en) * 1989-01-31 1991-01-29 Senju Metal Industry Co., Ltd. Water-soluble soldering flux and paste solder using the flux

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000061689A (en) * 1998-08-27 2000-02-29 Denso Corp Solder paste, soldering method, and surface-mounting type electronic device
US8900376B2 (en) 2004-07-21 2014-12-02 Nissan Chemical Industries, Ltd. Heat-resistant water-soluble flux composition for soldering
JP2015104731A (en) * 2013-11-28 2015-06-08 株式会社日本スペリア社 Soldering flux

Also Published As

Publication number Publication date
US5211763A (en) 1993-05-18
KR920009500A (en) 1992-06-25
EP0488398A2 (en) 1992-06-03
EP0488398A3 (en) 1992-10-21
KR100201769B1 (en) 1999-06-15

Similar Documents

Publication Publication Date Title
JPH058085A (en) Flux for soldering
JP2503099B2 (en) Flux for soldering
JP3026510B2 (en) Rosin-free, low-VOC, flux-free soldering flux and its use
JP2002239785A (en) Noncleaning flux corresponding to lead-free solder and solder composition containing the flux
WO2003026835A1 (en) Flux composition for solder, solder paste, and method of soldering
EP2692479B1 (en) Flux for soldering and solder paste composition
JPH1177377A (en) Flux composition
JP5916674B2 (en) Solder composition for jet dispenser
JP4780527B2 (en) Flux composition for soldering, cream solder composition, and electronic component
JP4186184B2 (en) Circuit board soldering flux and solder paste
JP2008030103A (en) Flux for cream solder, and cream solder
JP2015080814A (en) Flux for solder and solder paste
JPH0592296A (en) Corrosion inhibitor for flux or soldering paste
CN109570825A (en) A kind of Low-temperature halogen-free lead-free solder paste and preparation method thereof
TW458840B (en) Solder paste and soldering method of the same
JP2011104638A (en) Water-soluble flux, conductive paste, and bonded component
JP6342208B2 (en) Flux composition for soldering and electronic board using the same
JPS5877792A (en) Liquid flux for soldering
JP3273961B2 (en) Cream solder
US7052558B1 (en) Solder paste flux composition
JP6766196B2 (en) Method for manufacturing solder composition and electronic board
JP2021049581A (en) Solder composition and electronic substrate
JP6913122B2 (en) Method for manufacturing solder composition and electronic board
JP2725063B2 (en) Flux composition for soldering
JPH1043882A (en) Solder paste

Legal Events

Date Code Title Description
A300 Application deemed to be withdrawn because no request for examination was validly filed

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 19990204