JPH0579976U - Substrate cleaning equipment - Google Patents

Abstract

(57) [Abstract] [Purpose] It is possible to convey substrates with different widths without performing operations such as moving the rollers, and moreover, it is possible to carry out continuously without stopping the device. A substrate cleaning apparatus is provided. A supporting roller 6 having a large roller 6a and a small roller 6b combined, and a holding roller 7 having the same diameter as the small roller 6b are attached to the rotary shaft 3. The inclination angle of the rotating shaft 3 is 0 ° at the conveyance start portion and the end portion, and 0 ° to 30 at the first inclination portion.
To 30 ° in the cleaning part and 30 ° to 0 ° in the second inclined part so that the substrate can be transported smoothly. Since the substrate 5 is brought into contact with the support roller 6 and positioned, it can be applied to other types of substrates regardless of the width of the substrate.

Description

[Detailed description of the device]

[0001]

[Industrial applications]

 The present invention relates to improvements in a device for cleaning a substrate.

[0002]

[Prior Art]

 In recent years, with the spread of electronic devices, a wide variety of substrates have been provided according to various electronic devices. Therefore, it is required to manufacture various substrates while maintaining high precision.

In manufacturing such a substrate, a cleaning process for cleaning the substrate is provided. In this cleaning step, a substrate cleaning device having a transfer section 1 and a cleaning means 2 is provided. As shown in FIG. 4, a plurality of rotating shafts 3 connected to the driving means M are arranged in the conveying unit 1, and a pair of rollers 4 are attached to each rotating shaft 3. The roller 4 is formed by combining a large roller 4a having a large diameter and a small roller 4b having a small diameter, and has a substantially T-shaped cross section. The small rollers 4b, 4b are arranged on the rotary shaft 3 so as to face each other, and the distance between the large rollers 4a, 4a, which is the width of the conveyance path, is substantially equal to the width of the substrate 5. Is installed as.

When the substrate 5 is placed between the pair of rollers 4 and 4 as described above, the side edge of the base plate, which coincides with the conveying direction, is on the side surface of the large roller 4a, and the lower surface near the side edge is small. It is supported by the roller 4b. Therefore, the substrate 5 is positioned in the transport path by the large roller 4a. Then, the substrate 5 is transported in the horizontal direction as the roller 4 rotates. At this time, the substrate 5 is cleaned by spraying cleaning water from the cleaning means 2 arranged above the transport section. The precision of the substrate is maintained by using pure water containing no impurities as the cleaning water.

[0005]

[Problems to be solved by the device]

 However, the conventional techniques have the following problems.

That is, due to the diversification of the types of substrates, the widths of the substrates are also varied. Therefore, in order to clean a variety of substrates by one transport unit 1, the rotation shaft 3 is elongated and the roller 4c is moved according to the width of the substrate 5 as shown by the broken line in FIG. This is done by doing so. However, since a large number of rollers 4 are arranged in accordance with the transport distance of the substrate 5, it is very troublesome to move all the rollers according to the substrate width, and the apparatus is stopped for a long time. This makes it impossible to continuously wash substrates having different widths, resulting in a decrease in manufacturing efficiency.

Further, when the width of the substrate does not match the width of the transport path, problems such as contact of the substrate with the roller and displacement of the substrate in the transport path in the left-right direction or in the rotation direction occur. Since high precision is required for the substrate, there is a high rate of defective products due to misalignment and other factors, which significantly reduces the product production rate.

The present invention is provided in order to solve the above-mentioned problems of the prior art, and an object thereof is to carry substrates with different widths without performing operations such as moving rollers. It is an object of the present invention to provide a highly efficient substrate cleaning apparatus which can be performed continuously without stopping the apparatus.

[0009]

[Means for Solving the Problems]

 According to another aspect of the present invention, in a substrate cleaning apparatus including a transport unit for transporting a substrate and a cleaning unit for cleaning a substrate on the transport unit, the transport unit is connected to a driving unit. And a supporting roller that is attached to the rotating shaft and that supports the substrate from the lower surface and the side surface of the side edge portion and that conveys the substrate, and a holding roller that holds a part of the lower surface of the substrate and conveys the substrate. Is provided, and the rotating shaft is provided so that the holding roller is directed upward with respect to the supporting roller.

According to a second aspect of the invention, the rotating shaft according to the first aspect is provided with angle adjusting means.

[0011]

[Action]

 The operation of the substrate cleaning apparatus having the above structure is as follows.

That is, according to the first aspect of the present invention, the rotation shaft is tilted, and the substrate is supported by the support roller below the tilt, so that the substrate can be transported in correspondence with substrates of various widths without causing positional displacement. can do. Therefore, the substrate can be transported regardless of the type, and cleaning can be performed without stopping the apparatus.

According to the second aspect of the invention, since the angle adjusting means is provided on the rotating shaft, it is possible to appropriately cope with the types of the base plate and the cleaning liquid.

[0014]

【Example】

 An embodiment of the substrate cleaning apparatus of the present invention will be described below with reference to the drawings. In this embodiment, the same members as those of the conventional technique are designated by the same reference numerals and the description thereof will be omitted.

That is, in the substrate cleaning apparatus of the present embodiment, as shown in FIG. 1, a large shaft 6a having a large diameter and a small roller 6b having a small diameter are combined with the rotary shaft 3 of the transport unit 1 to form a substantially T-shaped cross section. The supporting roller 6 formed in the above and a holding roller 7 having the same diameter as the small roller 6b of the supporting roller are attached at a constant interval. The transport unit 1 has such a rotating shaft as a unit including a transport start unit, a first slanting unit, a cleaning unit, a second slanting unit, and an end unit.

The rotary shaft 3 of each unit of the transport unit 1 is arranged so as to be inclined with the support roller 6 as a fulcrum so that the holding roller 7 side is upward. In each unit, the transport start portion has an inclination angle of 0 ° with respect to the horizontal direction, and the first inclination portion has a gentle inclination state from an inclination angle of 0 ° to 15 °, and performs the transport range and drainage required for direct cleaning. The cleaning part in the range is set to a constant inclination angle of 15 °, the second inclination part is set to a gentle inclination state from 15 ° to 0 °, and the end part is set to an inclination angle of 0 °.

In the first and second inclined portions, the inclination angle of each rotary shaft 3 is adjusted so that the substrate 5 on the conveyance path can be smoothly conveyed.

In the substrate cleaning apparatus of this embodiment having such a configuration, the substrate 5 is placed on the starting portion of the transport unit 1 and is transported in a fixed direction by the rotation of the support roller 6 and the holding roller 7. From the first inclined portion to the cleaning portion and the second inclined portion, since the rotary shaft 3 is inclined with the support roller 6 as a fulcrum, the side edge of the substrate 5 is below the inclination. It will surely contact the side surface. The lower surface of the substrate 5 is held by the small roller 6b and the holding roller 7. In this state, the substrate transported to the inclination angle of 15 ° is sprayed with the cleaning water in the cleaning range of the cleaning unit in which the inclination angle is maintained at 15 °. Further, after the completion of the spraying of the cleaning water, the water droplets of the cleaning water adhering to the substrate flow down along the slope in the draining range also maintained at the inclination angle of 15 ° to perform the draining. After that, the inclination angle of the substrate is gradually returned to 0 ° together with the angle of the rotating shaft 3 of the second inclined portion.

In such a substrate cleaning apparatus of the present embodiment, the rotating shaft 3 is inclined and the substrate 5 is always brought into contact with the support roller 6 to surely support the substrate, so that the substrate on the transfer unit is , Positioning is done securely without displacement in the left, right, or rotation directions. Further, at this time, since the lower surface of the substrate 5 is held by the small roller 6b and the holding roller 7, the substrate 5 can be always conveyed and washed in a stable state.

That is, since the substrate on the transport unit is positioned only by the supporting roller, it is possible to deal with various types of substrates regardless of the type of the width of the substrate, and the cleaning can be performed continuously. You can Therefore, in this embodiment, the manufacturing efficiency and the product production rate can be greatly improved.

It should be noted that the present invention is not limited to the above-described embodiments, and the specific shapes and mounting positions of the members can be changed as appropriate.

For example, the rotary shaft 3 is not limited to being provided in an inclined state, but the angle of the rotary shaft can be freely changed by providing an angle adjusting means on the rotary shaft. This is done, for example, by providing an angle adjusting device 9 on the holding portion 8 of the rotary shaft 3 or by providing the drive means M with an angle adjusting means as shown in FIG. This makes it possible to transfer the substrate horizontally to the cleaning unit and incline it in the cleaning range and the draining range each time, or to repeat the tilting and horizontal states several times in the cleaning range and the draining range. Becomes Further, a unit for cleaning and a unit for draining water are provided, and when a certain number of substrates are transported to these units, the angle adjusting device 9 or the like tilts them to perform cleaning or draining. You can Therefore, by providing the angle adjusting means, it is possible to appropriately adapt to the conditions such as the type of substrate and the cleaning liquid, and it is possible to achieve the optimum cleaning state according to the substrate.

Further, as shown in FIG. 3, the supporting roller 6 supports a small roller 6 a for holding the substrate 5 and a rotary roller 1 that supports a side edge portion of the substrate and rotates in the substrate transport direction. It can be divided into 0 and 0. As a result, the arrangement range of the small roller 6a and the holding roller 7 held from the lower surface of the substrate 5 is widened, so that it is possible to cope with more kinds of substrates. At this time, the rotating roller 10 supporting the substrate 5 is rotated to reduce the friction with the side edge of the substrate, and the burden on the substrate is reduced. As a result, even if the side edge portion of the substrate 5 and the rotating roller 10 come into contact with each other, dust is not generated at all, and the manufacturing can be performed with high accuracy.

Further, the number of the holding roller 7 attached to one rotating shaft 3 is not limited to one, and a plurality of holding rollers 7 can be provided to surely deal with a wide range of substrates.

Further, the inclination of the rotary shaft 3 is not limited to 15 ° and can be changed as appropriate. Further, the rotation shaft is tilted not only by using the support roller 6 as a fulcrum but also by using a driving means as a fulcrum, and by tilting the support roller 6 side with the end of the rotation shaft on the holding roller 7 side as a fulcrum. Etc. can be appropriately changed, and the same effect can be obtained.

By the way, since the positional deviation of the substrate can be corrected by bringing the substrate 5 into contact with the supporting roller 6, the inclination of the transport unit 1 is not limited to the cleaning. For example, even if the substrate placed on the transport unit is brought into contact with the supporting roller to correct the positional displacement and then the cleaning is performed again with the inclination angle set to 0 °, the substrate can be transported without causing the positional displacement. Furthermore, by correcting the positional deviation of the dried substrate after the cleaning is completed, the substrate can be reliably transported to the next step.

[0027]

[Effect of the device]

 According to the present invention, when cleaning a substrate to be transported, by tilting the rotary shaft on which the substrate transport roller is mounted and supporting it by one roller, various types of substrates can be supported regardless of the width of the substrate. The substrate can be continuously and smoothly cleaned. Further, the substrate can be transported without displacement in the left-right direction and the rotational direction, and without burdening the substrate, and cleaning can be performed with high accuracy maintained.

Therefore, at the time of cleaning the substrates, the substrates having different widths are transported without performing the operation such as the movement of the rollers and the cleaning is continuously performed without stopping the apparatus. It is possible to provide a substrate cleaning apparatus having excellent properties.

[Brief description of drawings]

FIG. 1 is a front view showing a transfer section of a substrate cleaning apparatus according to an embodiment of the present invention.

FIG. 2 is a front view showing a transfer section of a substrate cleaning apparatus provided with an angle adjusting device.

FIG. 3 is a front view showing a carrying section according to another embodiment.

FIG. 4 is an enlarged front view of essential parts showing a conventional substrate cleaning apparatus.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Conveyance part 2 ... Cleaning means 3 ... Rotating shaft 4 ... Roller 5 ... Substrate 6 ... Support roller 7 ... Holding roller 8 ... Holding part 9 ... Angle adjusting device 10 ... Rotating roller M ... Driving means

Claims (2)

[Scope of utility model registration request] 1. A substrate cleaning apparatus comprising: a transfer unit for transferring a substrate; and a cleaning unit for cleaning the substrate on the transfer unit, wherein the transfer unit has a rotating shaft connected to a driving unit. And a support roller attached to the rotary shaft for supporting the substrate from the lower surface and the side surface of the side edge portion for conveying the substrate, and a holding roller for holding a part of the lower surface of the substrate and conveying the substrate. A substrate cleaning apparatus characterized in that a rotation shaft is provided so that a holding roller is located above a roller. 2. The substrate cleaning apparatus according to claim 1, wherein the rotating shaft is provided with angle adjusting means.