JPH0576001B2 - - Google Patents

Info

Publication number
JPH0576001B2
JPH0576001B2 JP232488A JP232488A JPH0576001B2 JP H0576001 B2 JPH0576001 B2 JP H0576001B2 JP 232488 A JP232488 A JP 232488A JP 232488 A JP232488 A JP 232488A JP H0576001 B2 JPH0576001 B2 JP H0576001B2
Authority
JP
Japan
Prior art keywords
diffraction grating
ion
polarizing plate
width
space
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP232488A
Other languages
Japanese (ja)
Other versions
JPH01177505A (en
Inventor
Yutaka Urino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP232488A priority Critical patent/JPH01177505A/en
Publication of JPH01177505A publication Critical patent/JPH01177505A/en
Publication of JPH0576001B2 publication Critical patent/JPH0576001B2/ja
Granted legal-status Critical Current

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  • Polarising Elements (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、光学的異方性を持つ結晶を用いた複
屈折率偏光板、特に偏光方向によつて回折効率の
異なる回折格子型偏光板の製造方法に関する。
Detailed Description of the Invention (Industrial Application Field) The present invention relates to a birefringence polarizing plate using a crystal with optical anisotropy, particularly a diffraction grating type polarizing plate whose diffraction efficiency differs depending on the polarization direction. Relating to a manufacturing method.

(従来の技術) 偏光素子特に偏光ビームスプリツタは、直交す
る偏光間で光の伝搬方向を異ならしめることによ
つて特定の偏光を得る素子である。このような素
子は、光フアイバ通信用光源モジユールや光デイ
スク用光ヘツドなどに、光アイソレータや光サー
キユレータを構成する部品として使われている。
(Prior Art) A polarizing element, particularly a polarizing beam splitter, is an element that obtains a specific polarized light by changing the propagation direction of light between orthogonal polarized lights. Such elements are used as components of optical isolators and optical circulators in light source modules for optical fiber communications, optical heads for optical disks, and the like.

従来、偏光ビームスプリツタとしては、グラン
トムソンプリズムやロツシヨンプリズムなど、複
屈折の大きな結晶の光反射面における偏光による
透過ないしは全反射の違いを利用し光路を分離す
るもの、またはガラスなどの等方性光学媒質でで
きた全反射プリズム反射面に誘電体多層膜を設
け、この誘電体多層膜の偏光による反射率の違い
を利用して、光を全反射ないしは透過させるもの
が多く使用されている。しかしながら、これらの
素子は大型であること、生産性が低いこと、値段
が高いことなどの欠点がある。
Conventional polarizing beam splitters include those that separate optical paths by utilizing the difference in transmission or total reflection due to polarization on the light reflecting surface of a crystal with large birefringence, such as a Glan-Thompson prism or a rotation prism, or those made of glass, etc. Totally reflective prisms made of a tropic optical medium A dielectric multilayer film is provided on the reflective surface, and the difference in reflectance due to polarization of this dielectric multilayer film is used to completely reflect or transmit light. There is. However, these devices have drawbacks such as large size, low productivity, and high cost.

回折格子型偏光板は光学的異方性をもつ結晶の
光学軸と平行な主面に、周期的なイオン交換領域
を設け、かつ該主面上にイオン交換を施した領域
では厚くイオン交換を施していない領域では薄く
誘電体膜を形成したものであり、偏光による回折
効率の違いを利用して光路を分離するものであ
る。この回折格子型偏光板は従来の偏光素子に比
べて、小型であること、生産性が高いこと、安価
であることなどの利点がある。例えば、ニオブ酸
リチウムのX板またはY板の主面に周期的にプロ
トン交換を施すと、プロトン交換を施した領域で
は波長1.3μmの異常光線に対する屈折率が約0.09
増加し、常光線に対する屈折率が約0.04減少す
る。従つて、プロトン交換を施した領域の誘電体
膜厚を、プロトン交換を施していない領域の誘電
体膜厚に比べて厚くし、プロトン交換を施した領
域の常光線に対する屈折率の減少を相殺すること
によつて、常光線の1次以上の回折効率及び異常
光線の0次の回折効率を共に零にすることがで
き、偏光子になる。
A diffraction grating type polarizing plate has periodic ion-exchange regions on the main surface parallel to the optical axis of an optically anisotropic crystal, and thick ion-exchange regions on the main surface. A thin dielectric film is formed in areas where no polarization is applied, and optical paths are separated by utilizing differences in diffraction efficiency due to polarization. This diffraction grating type polarizing plate has advantages over conventional polarizing elements, such as being smaller, having higher productivity, and being cheaper. For example, if proton exchange is performed periodically on the main surface of an X plate or a Y plate of lithium niobate, the refractive index for extraordinary rays with a wavelength of 1.3 μm will be approximately 0.09 in the proton exchanged region.
The refractive index for ordinary rays decreases by about 0.04. Therefore, the dielectric film thickness in the proton-exchanged region is made thicker than the dielectric film thickness in the non-proton-exchanged region to offset the decrease in the refractive index for ordinary rays in the proton-exchanged region. By doing so, both the first-order or higher-order diffraction efficiency of ordinary rays and the zero-order diffraction efficiency of extraordinary rays can be made zero, and the polarizer becomes a polarizer.

この回折格子型偏光板は、イオン交換をされた
領域の幅とイオン交換されていない領域の幅の差
が大きくなると消光比が劣化する。例えば、イオ
ン交換された領域の幅Wが回折格子の周期Lの55
%になると消光比の上限は20dBになり、60%に
なると消光比の上限は14dBになる。このため、
高消光比の回折格子型偏光板を製作するためには
イオン交換をされた領域の幅Wとされていない領
域幅L−Wをできるかぎり等しくすることが重要
である。通常、上記のような周期的なイオン交換
領域を形成する際には、第2図aに示すようなラ
インアンドスペースの金属膜マスクなどで覆いを
した後にイオン交換を施す。しかし、第2図bに
示すようにイオンがマスクのスペースの部分から
ライン部分の下へ拡散する現象のため、イオン交
換された領域の幅Wはマスクのスペースの幅Sよ
り広くなり、このことがイオン交換をされた領域
の幅Wとイオン交換されていない領域の幅L−W
の差による消光比の劣化の原因となつている。
In this diffraction grating type polarizing plate, the extinction ratio deteriorates when the difference between the width of the ion-exchanged region and the width of the non-ion-exchanged region becomes large. For example, the width W of the ion-exchanged region is 55 times the period L of the diffraction grating.
%, the upper limit of the extinction ratio is 20 dB, and when it becomes 60%, the upper limit of the extinction ratio is 14 dB. For this reason,
In order to manufacture a diffraction grating type polarizing plate with a high extinction ratio, it is important to make the width W of the ion-exchanged region and the width L-W of the non-ion-exchanged region as equal as possible. Normally, when forming periodic ion exchange regions as described above, ion exchange is performed after covering with a line-and-space metal film mask as shown in FIG. 2a. However, as shown in Figure 2b, due to the phenomenon that ions diffuse from the mask space part to below the line part, the width W of the ion-exchanged area becomes wider than the width S of the mask space. Width W of the area where ions have been exchanged and width L-W of the area where ions have not been exchanged
The difference in extinction ratio causes deterioration of the extinction ratio.

(発明の目的) 本発明の目的は、回折格子型偏光板の製造にお
いて、イオン交換をされた領域の幅とイオン交換
されていない領域の幅を等しくすることによつ
て、高消光比の回折格子型偏光板の製造を可能に
する製造技術を提供することにある。
(Object of the Invention) The object of the present invention is to produce a diffraction grating type polarizing plate by making the width of the ion-exchanged region equal to the width of the non-ion-exchanged region, thereby achieving a high extinction ratio diffraction ratio. An object of the present invention is to provide a manufacturing technology that enables the manufacturing of a grating type polarizing plate.

(発明の構成) 本発明は、光学的異方性を持つ結晶板の主面
に、周期を有するイオン交換領域の光学的回折格
子を形成し、かつ該主面上にイオン交換を施した
領域では厚く、イオン交換を施していない領域で
は薄く誘電体膜を設けた回折格子型偏光板の製造
において、上記周期的イオン交換を行うためのス
ペースアンドライン状のマスクのスペースの幅
を、イオンがマスクのスペースの部分から両側の
ラインの部分の下に回り込む距離程度回折格子の
半周期の長さより狭くすることを特徴とする回折
格子型偏光板の製造方法である。
(Structure of the Invention) The present invention provides an optical diffraction grating having periodic ion exchange regions formed on the main surface of a crystal plate having optical anisotropy, and a region on which ion exchange is performed on the main surface. In manufacturing a diffraction grating type polarizing plate, which has a thick dielectric film and a thin dielectric film in the area where ion exchange is not performed, the width of the space of the space-and-line mask for performing the periodic ion exchange is This method of manufacturing a diffraction grating type polarizing plate is characterized in that the distance extending from the space part of the mask to below the line parts on both sides is made narrower than the length of a half period of the diffraction grating.

(実施例) 以下、本発明の実施例について図面を参照して
詳細に説明する。第1図は本発明によるイオン交
換領域の製作行程の概略図である。すなわち、ま
ずニオブ酸リチウムなどの光学的異方性を持つ結
晶の光学軸と平行な面の基板1の上に、チタンな
どの金属膜をスパツタリングなどを用いて一様に
堆積させ、次に通常のフオトリソグラフイの技術
などを用いて上記金属膜にスペースアンドライン
のパターニングを行い、第1図aに示すようなイ
オン交換用マスク2を製作する。本発明の特徴
は、このイオン交換用マスクのスペースの幅S
を、イオン交換の際にイオンがマスクのスペース
の部分から両側のラインの部分の下に回り込む距
離に2dだけ回折格子の周期Lの半分より狭くす
ることにある。これによつて、その後イオン交換
を行うと第1図bに示すようにイオン交換された
領域3の幅Wとイオン交換されていない領域の幅
L−Wが等しくなる。最後に、イオン交換用マス
ク2を除去しイオン交換された領域3上に石英な
どの誘電体膜4を付けることによつて、第1図c
に示すような回折格子型偏光板が得られる。例え
ば、ニオブ酸リチウムのX板の主面上に周期的に
プロトン交換を施しプロトン交換領域上に石英膜
を付けて波長1.3μmの光に対する回折格子型偏光
板を製作する場合、プロトン交換の深さTは約
5μm、石英膜の厚さtは約300nm必要である。
我々は実験によつて、プロトンがプロトン交換用
マスクのスペースの部分から両側のラインの部分
の下に回り込む距離dは両側合わせるとプロトン
交換の深さTの約150%であることを発見した。
従つてこの場合、プロトン交換用のマスクのスペ
ースの幅Sを回折格子の半周期の長さL/2より
約7.5μm狭くすることによつて、プロトン交換さ
れた領域の幅Wとプロトン交換されていない領域
の幅L−Wを等しくすることができ、高消光比の
回折格子型偏光板を製作することが可能となる。
(Example) Hereinafter, an example of the present invention will be described in detail with reference to the drawings. FIG. 1 is a schematic diagram of the manufacturing process of an ion exchange region according to the present invention. That is, first, a metal film such as titanium is uniformly deposited on the substrate 1 on a plane parallel to the optical axis of a crystal having optical anisotropy such as lithium niobate using sputtering, and then Space-and-line patterning is performed on the metal film using the photolithography technique described above to produce an ion exchange mask 2 as shown in FIG. 1a. The feature of the present invention is that the width S of the space of this ion exchange mask is
is made narrower than half the period L of the diffraction grating by 2d to the distance at which ions wrap around from the space part of the mask to below the line parts on both sides during ion exchange. As a result, when ion exchange is performed thereafter, the width W of the ion-exchanged region 3 and the width L-W of the non-ion-exchanged region become equal, as shown in FIG. 1b. Finally, by removing the ion exchange mask 2 and attaching a dielectric film 4 such as quartz on the ion exchanged region 3, as shown in FIG.
A diffraction grating type polarizing plate as shown in is obtained. For example, when manufacturing a diffraction grating type polarizing plate for light with a wavelength of 1.3 μm by performing periodic proton exchange on the main surface of a lithium niobate X plate and attaching a quartz film on the proton exchange region, the proton exchange depth is The T is approx.
5 μm, and the thickness t of the quartz film is required to be approximately 300 nm.
Through experiments, we have found that the distance d that protons wrap around from the space of the proton exchange mask to the lines on both sides is about 150% of the proton exchange depth T when both sides are combined.
Therefore, in this case, by making the width S of the space of the proton exchange mask about 7.5 μm narrower than the half period length L/2 of the diffraction grating, the width W of the proton exchanged region and the width W of the proton exchanged region can be adjusted. It is possible to make the width L-W of the non-containing region equal, and it becomes possible to manufacture a diffraction grating type polarizing plate with a high extinction ratio.

(発明の効果) 以上に述べたように、本発明によれば高消光比
の回折格子型偏光板を製作することができる。
(Effects of the Invention) As described above, according to the present invention, a diffraction grating type polarizing plate with a high extinction ratio can be manufactured.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は回折格子型偏光板の本発明による製造
方法の行程説明図であり、第2図は回折格子型偏
光板の従来の製造方法の行程説明図である。 1……光学的異方性を持つ結晶基板、2……イ
オン交換用マスク、3……イオン交換領域、4…
…誘電体膜。
FIG. 1 is a process explanatory diagram of a method of manufacturing a diffraction grating type polarizing plate according to the present invention, and FIG. 2 is a process explanatory diagram of a conventional manufacturing method of a diffraction grating type polarizing plate. DESCRIPTION OF SYMBOLS 1...Crystal substrate with optical anisotropy, 2...Ion exchange mask, 3...Ion exchange region, 4...
...Dielectric film.

Claims (1)

【特許請求の範囲】[Claims] 1 光学的異方性を持つ結晶板の主面に、周期を
有するイオン交換領域の光学的回折格子を形成
し、かつ該主面上にイオン交換を施した領域では
厚く、イオン交換を施していない領域では薄く誘
電体膜を設けた回折格子型偏光板の製造におい
て、上記周期的イオン交換を行うためのスペース
アンドライン状のマスクのスペースの幅を、イオ
ンがマスクのスペースの部分から両側のラインの
部分の下に回り込む距離程度回折格子の半周期の
長さより狭くすることを特徴とする回折格子型偏
光板の製造方法。
1. An optical diffraction grating of periodic ion-exchange regions is formed on the main surface of a crystal plate with optical anisotropy, and the ion-exchanged regions on the main surface are thick and ion-exchanged. In the production of a diffraction grating type polarizing plate with a thin dielectric film, the width of the space of the space-and-line mask for performing the above-mentioned periodic ion exchange is adjusted so that ions move from the mask space to both sides. A method for manufacturing a diffraction grating type polarizing plate, characterized in that the distance that wraps around below the line portion is narrower than the length of a half period of the diffraction grating.
JP232488A 1988-01-07 1988-01-07 Manufacture of diffraction grating type polarizing plate Granted JPH01177505A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP232488A JPH01177505A (en) 1988-01-07 1988-01-07 Manufacture of diffraction grating type polarizing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP232488A JPH01177505A (en) 1988-01-07 1988-01-07 Manufacture of diffraction grating type polarizing plate

Publications (2)

Publication Number Publication Date
JPH01177505A JPH01177505A (en) 1989-07-13
JPH0576001B2 true JPH0576001B2 (en) 1993-10-21

Family

ID=11526137

Family Applications (1)

Application Number Title Priority Date Filing Date
JP232488A Granted JPH01177505A (en) 1988-01-07 1988-01-07 Manufacture of diffraction grating type polarizing plate

Country Status (1)

Country Link
JP (1) JPH01177505A (en)

Also Published As

Publication number Publication date
JPH01177505A (en) 1989-07-13

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