JPH01177505A - Manufacture of diffraction grating type polarizing plate - Google Patents

Manufacture of diffraction grating type polarizing plate

Info

Publication number
JPH01177505A
JPH01177505A JP232488A JP232488A JPH01177505A JP H01177505 A JPH01177505 A JP H01177505A JP 232488 A JP232488 A JP 232488A JP 232488 A JP232488 A JP 232488A JP H01177505 A JPH01177505 A JP H01177505A
Authority
JP
Japan
Prior art keywords
ion exchange
diffraction grating
width
polarizing plate
type polarizing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP232488A
Other languages
Japanese (ja)
Other versions
JPH0576001B2 (en
Inventor
Yutaka Urino
豊 賣野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP232488A priority Critical patent/JPH01177505A/en
Publication of JPH01177505A publication Critical patent/JPH01177505A/en
Publication of JPH0576001B2 publication Critical patent/JPH0576001B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a diffraction grating type polarizing plate having a high extinction ratio by equalizing the width of an area which has been brought to ion exchange and the width of an area which has not been brought to ion exchange. CONSTITUTION:Width S of a space of a mask 2 for ion exchange on a substrate 1 of the surface being parallel to an optical axis of a crystal having an optical anisotropy is made narrower than half of a period L of a diffraction grating by a distance 2d in which an ion turns in under a part of lines of both sides from a part of a space of the mask at the time of ion exchange. That is, width W of an area 3 which has been brought to ion exchange and width L-W of an area which has not been brought to ion exchange become equal. In the end, the mask 2 for ion exchange is eliminated and a dielectric film 4 of quartz, etc., is stuck onto the area 3 which has been brought to ion exchange. In such a way, a diffraction grating type polarizing plate having a high extinction ratio is obtained.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、光学的異方性を持つ結晶を用いた複屈折率偏
光板、特に偏光方向によって回折効率の異なる回折格子
型偏光板の製造方法に関する。
Detailed Description of the Invention (Industrial Application Field) The present invention is directed to the production of birefringent polarizing plates using crystals having optical anisotropy, especially diffraction grating type polarizing plates whose diffraction efficiency differs depending on the polarization direction. Regarding the method.

(従来の技術) 偏光素子特に偏光ビームスプリッタは、直交する偏光間
で光の伝搬方向を異ならしめることによって特定の偏光
を得る素子である。このような素子は、光フアイバ通信
用光源モジュールや光デイスク用光ヘッドなどに、光ア
イソレータや光サーキュレータを構成する部品として使
われている。
(Prior Art) A polarizing element, particularly a polarizing beam splitter, is an element that obtains a specific polarized light by changing the propagation direction of light between orthogonal polarized lights. Such elements are used as components of optical isolators and optical circulators in light source modules for optical fiber communications, optical heads for optical disks, and the like.

従来、偏光ビームスプリッタとしては、グラントムソン
プリズムやロッションプリズムなど、複屈折の大きな結
晶の光反射面における偏光による透過ないしは全反射の
違いを利用し光路を分離するもの、またはガラスなどの
等方性光学媒質でできた全反射プリズム反射面に誘電体
多層膜を設け、この誘電体多層膜の偏光による反射率の
違いを利用して、光を全反射ないしは透過させるものが
多く使用されている。しかしながら、これらの素子は大
型であること、生産性が低いこと、値段が高いことなど
の欠点がある。
Conventionally, polarizing beam splitters are those that separate optical paths by utilizing the difference in transmission or total reflection due to polarization on the light reflecting surface of a crystal with large birefringence, such as a Glan-Thompson prism or Rochon prism, or isotropic beam splitters such as glass. A dielectric multilayer film is provided on the reflective surface of a total reflection prism made of a polarized optical medium, and the difference in reflectance due to the polarization of this dielectric multilayer film is used to completely reflect or transmit light. . However, these devices have drawbacks such as large size, low productivity, and high cost.

回折格子型偏光板は光学的異方性をもつ結晶の光学軸と
平行な主面に、周期的なイオン交換領域を設け、かつ該
主面上にイオン交換を施した領域では厚くイオン交換を
施していない領域では薄く誘電体膜を形成したものであ
り、偏光による回折効率の違いを利用して光路を分離す
るものである。この回折格子型偏光板は従来の偏光素子
に比へて、小型であること、生産性が高いこと、安価で
あることなとの利点かある。例えは、ニオブ酸リチウム
のχ板またはY板の主面に周期的にプロ1ヘン交換を施
すと、プロトン交換を施した領域では波長1.3μn1
の異常光線に対する屈折率が約0.09増加し、常光線
に対する屈折率が約0゜04減少する。従って、プロト
ン交換を施した領域の誘電体膜厚を、プロトン交換を施
していない領域の誘電体膜厚に比べて厚くし、プロトン
交換を施した領域の常光線に対する屈折率の減少を相殺
することによって、常光線の1次以上の回折効率及び異
常光線の0次の回折効率を共に零にすることができ、偏
光子になる。
A diffraction grating type polarizing plate has periodic ion exchange regions on the main surface parallel to the optical axis of an optically anisotropic crystal, and thick ion exchange regions on the main surface. A thin dielectric film is formed in the untreated area, and the optical path is separated by utilizing the difference in diffraction efficiency due to polarization. This diffraction grating type polarizing plate has advantages over conventional polarizing elements in that it is compact, has high productivity, and is inexpensive. For example, if the main surface of a χ plate or a Y plate of lithium niobate is subjected to periodic proton exchange, the wavelength in the region subjected to proton exchange is 1.3 μn1.
The refractive index for extraordinary rays increases by about 0.09, and the refractive index for ordinary rays decreases by about 0.04. Therefore, the dielectric film thickness in the proton-exchanged region is made thicker than the dielectric film thickness in the non-proton-exchanged region to offset the decrease in the refractive index for ordinary rays in the proton-exchanged region. By doing so, both the first-order or higher-order diffraction efficiency of ordinary rays and the zero-order diffraction efficiency of extraordinary rays can be made zero, and the polarizer becomes a polarizer.

この回折格子型偏光板は、イオン交換をされた領域の幅
とイオン交換されていない領域の幅の差が大きくなると
消光比が劣化する。例えば、イオン交換された領域の幅
Wが回折格子の周期りの55%になると消光比の上限は
20dBになり、60%になると消光比の上限は14 
d Bになる。このため、高消光比の回折格子型偏光板
を製作するためにはイオン交換をされた領域の幅Wとさ
れていない領域幅L−Wをできるかぎり等しくすること
が重要である。通常、上記のような周期的なイオン交換
領域を形成する際には、第2図(a)に示すようなライ
ンアンドスペースの金属膜マスクなどで覆いをした後に
イオン交換を施す。しかし、第2図(b)に示すように
イオンがマスクのスペースの部分からライン部分の下へ
拡散する現象のため、イオン交換された領域の幅Wはマ
スクのスペースの幅Sより広くなり、このことがイオン
交換をされた領域の幅Wとイオン交換されていない領域
の幅L−Wの差による消光比の劣化の原因となっている
In this diffraction grating type polarizing plate, the extinction ratio deteriorates when the difference between the width of the ion-exchanged region and the width of the non-ion-exchanged region becomes large. For example, when the width W of the ion-exchanged region becomes 55% of the period of the diffraction grating, the upper limit of the extinction ratio becomes 20 dB, and when it becomes 60%, the upper limit of the extinction ratio becomes 14 dB.
d Become B. Therefore, in order to manufacture a diffraction grating type polarizing plate with a high extinction ratio, it is important to make the width W of the ion-exchanged region and the width L-W of the non-ion-exchanged region as equal as possible. Normally, when forming periodic ion exchange regions as described above, ion exchange is performed after covering with a line-and-space metal film mask as shown in FIG. 2(a). However, as shown in FIG. 2(b), due to the phenomenon that ions diffuse from the mask space part to below the line part, the width W of the ion-exchanged region becomes wider than the width S of the mask space. This causes deterioration of the extinction ratio due to the difference between the width W of the ion-exchanged region and the width L-W of the non-ion-exchanged region.

(発明の目的) 本発明の目的は、回折格子型偏光板の製造において、イ
オン交換をされた領域の幅とイオン交換されていない領
域の幅を等しくすることによって、高消光比の回折格子
型偏光板め製泊を可能にする製造技術を提供することに
ある。
(Object of the Invention) The object of the present invention is to produce a diffraction grating type polarizing plate with a high extinction ratio by making the width of the ion-exchanged region equal to the width of the non-ion exchanged region in the production of a diffraction grating type polarizing plate. The purpose of the present invention is to provide manufacturing technology that enables the production of polarizing plates.

(発明の構成) 本発明は、光学的異方性を持つ結晶板の主面に、周期を
有するイオン交換領域の光学的回折格子を形成し、かつ
該主面上にイオン交換を施した領域では厚く、イオン交
換を施していない領域では薄く誘電体膜を設けた回折格
子型偏光板の製造において、上記周期的イオン交換を行
うためのスペースアンドライン状のマスクのスペースの
幅を、イオンがマスクのスペースの部分から両側のライ
ンの部分の下に回り込む距離程度曲折格子の半周期の長
さより狭くすることを特徴とする回折格子型偏光板の製
造方法である。
(Structure of the Invention) The present invention provides an optical diffraction grating having periodic ion exchange regions formed on the main surface of a crystal plate having optical anisotropy, and a region on which ion exchange is performed on the main surface. In manufacturing a diffraction grating type polarizing plate, which has a thick dielectric film and a thin dielectric film in the area where ion exchange is not performed, the width of the space of the space-and-line mask for performing the periodic ion exchange is This method of manufacturing a diffraction grating type polarizing plate is characterized in that the distance extending from the space part of the mask to the line parts on both sides is made narrower than the length of a half period of the meandering grating.

(実施例) 以下、本発明の実施例について図面を参照して=5− 詳細に説明する。第1図は本発明によるイオン交換領域
の製作行程の概略図である。すなわち、まずニオブ酸リ
チウムなどの光学的異方性を持つ結晶の光学軸と平行な
面の基板1の上に、チタンなどの金属膜をスパッタリン
グなどを用いて一様に堆積させ、次に通常のフォトリソ
グラフィの技術などを用いて上記金属膜にスペースアン
ドラインのパターニングを行い、第1図(a)に示すよ
うなイオン交換用マスク2を製作する。本発明の特徴は
、このイオン交換用マスクのスペースの幅Sを、イオン
交換の際にイオンがマスクのスペースの部分から両側の
ラインの部分の下に回り込む距離2dだけ回折格子の周
期りの半分より狭くすることにある。これによって、そ
の後イオン交換を行うと第1図(b)に示すようにイオ
ン交換された領域3の―Wとイオン交換されていない領
域の幅L−Wが等しくなる。最後に、イオン交換用マス
ク2を除去しイオン交換された領域3上に石英などの誘
電体膜4を付けることによって、第1図(c)に示すよ
うな回折格子型偏光板が得られる。例えば、二オフ酸リ
チウムのX板の主面上に周期的にプロトン交換を施しプ
ロトン交換領域上に石英膜を付けて波長1,3μmの光
に対する回折格子型偏光板を製作する場合、プロトン交
換の深さTは約5μm、石英膜の厚さtは約300nm
必要である。我々は実験によって、プロトンがプロトン
交換用マスクのスペースの部分から両側のラインの部分
の下に回り込む距離dは両側合わせるとプロトン交換の
深さTの約150%であることを発見した。従ってこの
場合、プロトン交換用のマスクのスペースの幅Sを回折
格子の半周期の長さL/2より約7,5μm狭くするこ
とによって、プロトン交換された領域の幅Wとプロトン
交換されていない領域の幅L−Wを等しくすることがで
き、高消光比の回折格子型偏光板を製作することが可能
となる。
(Example) Hereinafter, an example of the present invention will be described in detail with reference to the drawings. FIG. 1 is a schematic diagram of the manufacturing process of an ion exchange region according to the present invention. That is, first, a metal film such as titanium is uniformly deposited on the substrate 1 on a plane parallel to the optical axis of a crystal having optical anisotropy such as lithium niobate using sputtering, and then Space-and-line patterning is performed on the metal film using the photolithography technique described above to produce an ion exchange mask 2 as shown in FIG. 1(a). The feature of the present invention is that the width S of the space of this ion exchange mask is set by half the period of the diffraction grating by the distance 2d that ions go around from the space part of the mask to below the line parts on both sides during ion exchange. The goal is to make it narrower. As a result, when ion exchange is performed thereafter, the width -W of the ion-exchanged region 3 becomes equal to the width L-W of the non-ion-exchanged region, as shown in FIG. 1(b). Finally, by removing the ion exchange mask 2 and attaching a dielectric film 4 made of quartz or the like on the ion exchanged region 3, a diffraction grating type polarizing plate as shown in FIG. 1(c) is obtained. For example, when manufacturing a diffraction grating type polarizing plate for light with a wavelength of 1.3 μm by periodically performing proton exchange on the main surface of a lithium diophate X plate and attaching a quartz film on the proton exchange region, the proton exchange The depth T is approximately 5 μm, and the thickness t of the quartz film is approximately 300 nm.
is necessary. Through experiments, we have found that the distance d that protons wrap around from the space of the proton exchange mask to the lines on both sides is approximately 150% of the proton exchange depth T when both sides are combined. Therefore, in this case, by making the width S of the space of the proton exchange mask approximately 7.5 μm narrower than the half-period length L/2 of the diffraction grating, the width W of the proton exchanged region The widths L-W of the regions can be made equal, and a diffraction grating type polarizing plate with a high extinction ratio can be manufactured.

(発明の効果) 以上に述べたように、本発明によれば高消光比の回折格
子型偏光板を製作することができる。
(Effects of the Invention) As described above, according to the present invention, a diffraction grating type polarizing plate with a high extinction ratio can be manufactured.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は回折格子型偏光板の本発明による製造方法の行
程説明図であり、第2図は回折格子型偏光板の従来の製
造方法の行程説明図である。 1・・・光学的異方性を持つ結晶基板、2・・・イオン
交換用マスク、3・・・イオン交換領域、4・・・誘電
体膜
FIG. 1 is a process explanatory diagram of a method of manufacturing a diffraction grating type polarizing plate according to the present invention, and FIG. 2 is a process explanatory diagram of a conventional manufacturing method of a diffraction grating type polarizing plate. DESCRIPTION OF SYMBOLS 1... Crystal substrate with optical anisotropy, 2... Ion exchange mask, 3... Ion exchange region, 4... Dielectric film

Claims (1)

【特許請求の範囲】[Claims] 光学的異方性を持つ結晶板の主面に、周期を有するイオ
ン交換領域の光学的回折格子を形成し、かつ該主面上に
イオン交換を施した領域では厚く、イオン交換を施して
いない領域では薄く誘電体膜を設けた回折格子型偏光板
の製造において、上記周期的イオン交換を行うためのス
ペースアンドライン状のマスクのスペースの幅を、イオ
ンがマスクのスペースの部分から両側のラインの部分の
下に回り込む距離程度回折格子の半周期の長さより狭く
することを特徴とする回折格子型偏光板の製造方法。
An optical diffraction grating of periodic ion-exchange regions is formed on the main surface of a crystal plate with optical anisotropy, and the regions on which ion exchange has been performed on the main surface are thick and no ion exchange has been performed. In manufacturing a diffraction grating type polarizing plate with a thin dielectric film, the width of the space of the space-and-line mask for performing the above-mentioned periodic ion exchange is determined so that the ions flow from the space of the mask to the lines on both sides. A method for manufacturing a diffraction grating type polarizing plate, characterized in that the distance that wraps around below the portion is narrower than the length of a half period of the diffraction grating.
JP232488A 1988-01-07 1988-01-07 Manufacture of diffraction grating type polarizing plate Granted JPH01177505A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP232488A JPH01177505A (en) 1988-01-07 1988-01-07 Manufacture of diffraction grating type polarizing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP232488A JPH01177505A (en) 1988-01-07 1988-01-07 Manufacture of diffraction grating type polarizing plate

Publications (2)

Publication Number Publication Date
JPH01177505A true JPH01177505A (en) 1989-07-13
JPH0576001B2 JPH0576001B2 (en) 1993-10-21

Family

ID=11526137

Family Applications (1)

Application Number Title Priority Date Filing Date
JP232488A Granted JPH01177505A (en) 1988-01-07 1988-01-07 Manufacture of diffraction grating type polarizing plate

Country Status (1)

Country Link
JP (1) JPH01177505A (en)

Also Published As

Publication number Publication date
JPH0576001B2 (en) 1993-10-21

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