JPH0574952B2 - - Google Patents

Info

Publication number
JPH0574952B2
JPH0574952B2 JP60039910A JP3991085A JPH0574952B2 JP H0574952 B2 JPH0574952 B2 JP H0574952B2 JP 60039910 A JP60039910 A JP 60039910A JP 3991085 A JP3991085 A JP 3991085A JP H0574952 B2 JPH0574952 B2 JP H0574952B2
Authority
JP
Japan
Prior art keywords
electrode
semiconductor
amorphous
silicone oil
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP60039910A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61198686A (ja
Inventor
Yoshihisa Oowada
Kazunaga Tsushimo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanegafuchi Chemical Industry Co Ltd filed Critical Kanegafuchi Chemical Industry Co Ltd
Priority to JP60039910A priority Critical patent/JPS61198686A/ja
Priority to EP86102335A priority patent/EP0193820A3/en
Publication of JPS61198686A publication Critical patent/JPS61198686A/ja
Publication of JPH0574952B2 publication Critical patent/JPH0574952B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0272Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers for lift-off processes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F19/00Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
    • H10F19/30Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules comprising thin-film photovoltaic cells
    • H10F19/31Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules comprising thin-film photovoltaic cells having multiple laterally adjacent thin-film photovoltaic cells deposited on the same substrate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/20Electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/20Electrodes
    • H10F77/206Electrodes for devices having potential barriers
    • H10F77/211Electrodes for devices having potential barriers for photovoltaic cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Photovoltaic Devices (AREA)
  • Light Receiving Elements (AREA)
JP60039910A 1985-02-27 1985-02-27 半導体装置の製法 Granted JPS61198686A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60039910A JPS61198686A (ja) 1985-02-27 1985-02-27 半導体装置の製法
EP86102335A EP0193820A3 (en) 1985-02-27 1986-02-22 Method for forming a thin film pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60039910A JPS61198686A (ja) 1985-02-27 1985-02-27 半導体装置の製法

Publications (2)

Publication Number Publication Date
JPS61198686A JPS61198686A (ja) 1986-09-03
JPH0574952B2 true JPH0574952B2 (enrdf_load_stackoverflow) 1993-10-19

Family

ID=12566102

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60039910A Granted JPS61198686A (ja) 1985-02-27 1985-02-27 半導体装置の製法

Country Status (1)

Country Link
JP (1) JPS61198686A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114427115A (zh) * 2022-04-01 2022-05-03 浙江大学杭州国际科创中心 一种碳化硅单晶片剥离方法及剥离装置
CN118824845B (zh) * 2024-09-18 2024-11-22 山东大学 一种碳化硅功率器件及其制备方法和应用

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5925279A (ja) * 1982-08-02 1984-02-09 Kyocera Corp 太陽電池の製造方法

Also Published As

Publication number Publication date
JPS61198686A (ja) 1986-09-03

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees