JPH0570922B2 - - Google Patents

Info

Publication number
JPH0570922B2
JPH0570922B2 JP58033973A JP3397383A JPH0570922B2 JP H0570922 B2 JPH0570922 B2 JP H0570922B2 JP 58033973 A JP58033973 A JP 58033973A JP 3397383 A JP3397383 A JP 3397383A JP H0570922 B2 JPH0570922 B2 JP H0570922B2
Authority
JP
Japan
Prior art keywords
magneto
coercive force
composition
recording medium
oersted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58033973A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59159510A (ja
Inventor
Yoshifumi Sakurai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP3397383A priority Critical patent/JPS59159510A/ja
Priority to DE3348424A priority patent/DE3348424C2/de
Priority to DE19833309483 priority patent/DE3309483C3/de
Publication of JPS59159510A publication Critical patent/JPS59159510A/ja
Priority to US06/783,052 priority patent/US4670353A/en
Publication of JPH0570922B2 publication Critical patent/JPH0570922B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/16—Layers for recording by changing the magnetic properties, e.g. for Curie-point-writing
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B11/00—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor
    • G11B11/10—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field
    • G11B11/105—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field using a beam of light or a magnetic field for recording by change of magnetisation and a beam of light for reproducing, i.e. magneto-optical, e.g. light-induced thermomagnetic recording, spin magnetisation recording, Kerr or Faraday effect reproducing
    • G11B11/10582—Record carriers characterised by the selection of the material or by the structure or form
    • G11B11/10586—Record carriers characterised by the selection of the material or by the structure or form characterised by the selection of the material

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Thin Magnetic Films (AREA)
JP3397383A 1982-03-17 1983-03-01 磁気光学記録媒体 Granted JPS59159510A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP3397383A JPS59159510A (ja) 1983-03-01 1983-03-01 磁気光学記録媒体
DE3348424A DE3348424C2 (de) 1982-03-17 1983-03-16 Verfahren zur Herstellung eines magnetooptischen Aufzeichnungsmaterials
DE19833309483 DE3309483C3 (de) 1982-03-17 1983-03-16 Magnetooptisches Aufzeichnungsmaterial und dessen Verwendung
US06/783,052 US4670353A (en) 1982-03-17 1985-10-01 Magnetooptical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3397383A JPS59159510A (ja) 1983-03-01 1983-03-01 磁気光学記録媒体

Publications (2)

Publication Number Publication Date
JPS59159510A JPS59159510A (ja) 1984-09-10
JPH0570922B2 true JPH0570922B2 (OSRAM) 1993-10-06

Family

ID=12401424

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3397383A Granted JPS59159510A (ja) 1982-03-17 1983-03-01 磁気光学記録媒体

Country Status (1)

Country Link
JP (1) JPS59159510A (OSRAM)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7137353B2 (en) 2002-09-30 2006-11-21 Tokyo Electron Limited Method and apparatus for an improved deposition shield in a plasma processing system
US7147749B2 (en) 2002-09-30 2006-12-12 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
US7163585B2 (en) 2002-09-30 2007-01-16 Tokyo Electron Limited Method and apparatus for an improved optical window deposition shield in a plasma processing system
US7166200B2 (en) 2002-09-30 2007-01-23 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate in a plasma processing system
US7166166B2 (en) 2002-09-30 2007-01-23 Tokyo Electron Limited Method and apparatus for an improved baffle plate in a plasma processing system
US7204912B2 (en) 2002-09-30 2007-04-17 Tokyo Electron Limited Method and apparatus for an improved bellows shield in a plasma processing system
US7282112B2 (en) 2002-09-30 2007-10-16 Tokyo Electron Limited Method and apparatus for an improved baffle plate in a plasma processing system
US7291566B2 (en) 2003-03-31 2007-11-06 Tokyo Electron Limited Barrier layer for a processing element and a method of forming the same
US7552521B2 (en) 2004-12-08 2009-06-30 Tokyo Electron Limited Method and apparatus for improved baffle plate
US7560376B2 (en) 2003-03-31 2009-07-14 Tokyo Electron Limited Method for adjoining adjacent coatings on a processing element
US7601242B2 (en) 2005-01-11 2009-10-13 Tokyo Electron Limited Plasma processing system and baffle assembly for use in plasma processing system
US8877002B2 (en) 2002-11-28 2014-11-04 Tokyo Electron Limited Internal member of a plasma processing vessel

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60189208A (ja) * 1984-03-09 1985-09-26 Nippon Hoso Kyokai <Nhk> 光磁気記録媒体
JPS6184004A (ja) * 1984-10-01 1986-04-28 Sumitomo Metal Mining Co Ltd 光磁気記録媒体
JPH0772946B2 (ja) * 1984-10-11 1995-08-02 株式会社日立製作所 光磁気記録媒体
DE3536210A1 (de) * 1984-10-11 1986-04-17 Hitachi, Ltd., Tokio/Tokyo Magnetooptisches aufzeichnungsmedium

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5231703A (en) * 1975-09-05 1977-03-10 Kokusai Denshin Denwa Co Ltd <Kdd> Magnetic thin film recording medium
JPS5873746A (ja) * 1981-10-27 1983-05-04 Kokusai Denshin Denwa Co Ltd <Kdd> 光磁気記録媒体
JPS58159252A (ja) * 1982-03-17 1983-09-21 Canon Inc 磁気光学記録媒体
JPS595450A (ja) * 1982-07-02 1984-01-12 Ricoh Co Ltd 光磁気記録媒体
JPS5988808A (ja) * 1982-11-15 1984-05-22 Ricoh Co Ltd 磁気記録媒体

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7282112B2 (en) 2002-09-30 2007-10-16 Tokyo Electron Limited Method and apparatus for an improved baffle plate in a plasma processing system
US7566379B2 (en) 2002-09-30 2009-07-28 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
US7163585B2 (en) 2002-09-30 2007-01-16 Tokyo Electron Limited Method and apparatus for an improved optical window deposition shield in a plasma processing system
US7166200B2 (en) 2002-09-30 2007-01-23 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate in a plasma processing system
US7166166B2 (en) 2002-09-30 2007-01-23 Tokyo Electron Limited Method and apparatus for an improved baffle plate in a plasma processing system
US7204912B2 (en) 2002-09-30 2007-04-17 Tokyo Electron Limited Method and apparatus for an improved bellows shield in a plasma processing system
US7566368B2 (en) 2002-09-30 2009-07-28 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate in a plasma processing system
US7137353B2 (en) 2002-09-30 2006-11-21 Tokyo Electron Limited Method and apparatus for an improved deposition shield in a plasma processing system
US7147749B2 (en) 2002-09-30 2006-12-12 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
US8877002B2 (en) 2002-11-28 2014-11-04 Tokyo Electron Limited Internal member of a plasma processing vessel
US7560376B2 (en) 2003-03-31 2009-07-14 Tokyo Electron Limited Method for adjoining adjacent coatings on a processing element
US7291566B2 (en) 2003-03-31 2007-11-06 Tokyo Electron Limited Barrier layer for a processing element and a method of forming the same
US7552521B2 (en) 2004-12-08 2009-06-30 Tokyo Electron Limited Method and apparatus for improved baffle plate
US7601242B2 (en) 2005-01-11 2009-10-13 Tokyo Electron Limited Plasma processing system and baffle assembly for use in plasma processing system

Also Published As

Publication number Publication date
JPS59159510A (ja) 1984-09-10

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