JPH05698B2 - - Google Patents

Info

Publication number
JPH05698B2
JPH05698B2 JP58069216A JP6921683A JPH05698B2 JP H05698 B2 JPH05698 B2 JP H05698B2 JP 58069216 A JP58069216 A JP 58069216A JP 6921683 A JP6921683 A JP 6921683A JP H05698 B2 JPH05698 B2 JP H05698B2
Authority
JP
Japan
Prior art keywords
data
image
layout
document
image data
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58069216A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59195655A (ja
Inventor
Nobuo Tsumita
Shunsuke Mukasa
Juji Pponma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP58069216A priority Critical patent/JPS59195655A/ja
Publication of JPS59195655A publication Critical patent/JPS59195655A/ja
Publication of JPH05698B2 publication Critical patent/JPH05698B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Facsimile Scanning Arrangements (AREA)
JP58069216A 1983-04-21 1983-04-21 印刷製版用自動トリミングレイアウトシステム Granted JPS59195655A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58069216A JPS59195655A (ja) 1983-04-21 1983-04-21 印刷製版用自動トリミングレイアウトシステム

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58069216A JPS59195655A (ja) 1983-04-21 1983-04-21 印刷製版用自動トリミングレイアウトシステム

Publications (2)

Publication Number Publication Date
JPS59195655A JPS59195655A (ja) 1984-11-06
JPH05698B2 true JPH05698B2 (forum.php) 1993-01-06

Family

ID=13396300

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58069216A Granted JPS59195655A (ja) 1983-04-21 1983-04-21 印刷製版用自動トリミングレイアウトシステム

Country Status (1)

Country Link
JP (1) JPS59195655A (forum.php)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5724943A (en) * 1980-07-22 1982-02-09 Toppan Printing Co Ltd Image processing method and apparatus used for this

Also Published As

Publication number Publication date
JPS59195655A (ja) 1984-11-06

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