JPH0567028B2 - - Google Patents

Info

Publication number
JPH0567028B2
JPH0567028B2 JP60171834A JP17183485A JPH0567028B2 JP H0567028 B2 JPH0567028 B2 JP H0567028B2 JP 60171834 A JP60171834 A JP 60171834A JP 17183485 A JP17183485 A JP 17183485A JP H0567028 B2 JPH0567028 B2 JP H0567028B2
Authority
JP
Japan
Prior art keywords
developer
positive photoresist
photoresist
metal ions
surfactant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60171834A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6232452A (ja
Inventor
Hatsuyuki Tanaka
Hidekatsu Obara
Yoshuki Sato
Shingo Asaumi
Toshimasa Nakayama
Akira Yokota
Hisashi Nakane
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP60171834A priority Critical patent/JPS6232452A/ja
Priority to US06/892,646 priority patent/US4784937A/en
Publication of JPS6232452A publication Critical patent/JPS6232452A/ja
Publication of JPH0567028B2 publication Critical patent/JPH0567028B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/18—Diazo-type processes, e.g. thermal development, or agents therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60171834A 1985-08-06 1985-08-06 改良ポジ型ホトレジスト用現像液 Granted JPS6232452A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60171834A JPS6232452A (ja) 1985-08-06 1985-08-06 改良ポジ型ホトレジスト用現像液
US06/892,646 US4784937A (en) 1985-08-06 1986-08-04 Developing solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactant

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60171834A JPS6232452A (ja) 1985-08-06 1985-08-06 改良ポジ型ホトレジスト用現像液

Publications (2)

Publication Number Publication Date
JPS6232452A JPS6232452A (ja) 1987-02-12
JPH0567028B2 true JPH0567028B2 (Sortimente) 1993-09-24

Family

ID=15930615

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60171834A Granted JPS6232452A (ja) 1985-08-06 1985-08-06 改良ポジ型ホトレジスト用現像液

Country Status (1)

Country Link
JP (1) JPS6232452A (Sortimente)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6472154A (en) * 1987-09-12 1989-03-17 Tama Kagaku Kogyo Kk Positive type photoresist developing solution
JP4493393B2 (ja) * 2004-04-23 2010-06-30 東京応化工業株式会社 リソグラフィー用リンス液
KR102011879B1 (ko) * 2018-12-28 2019-08-20 영창케미칼 주식회사 극자외선 리소그래피용 공정액 및 이를 사용한 패턴 형성 방법

Also Published As

Publication number Publication date
JPS6232452A (ja) 1987-02-12

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term